TWI853733B - Organic solvent regeneration system and operation method thereof - Google Patents
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Abstract
本發明提供一種有機溶劑再生系統,其包含有一個監控單元、一個進料單元、一個再生單元、一個回收單元以及一個出料單元,藉由該監控單元此技術特徵,將能建立起該有機溶劑再生系統整體所需對應之作業環境,並將一待處理液體經由本發明所揭露之有機溶劑再生系統後而得一再生液體,進而達到有機溶劑再生回收之顯著功效。The present invention provides an organic solvent regeneration system, which includes a monitoring unit, a feeding unit, a regeneration unit, a recovery unit and a discharging unit. By using the technical characteristics of the monitoring unit, the corresponding operating environment required by the organic solvent regeneration system as a whole can be established, and a liquid to be treated can be passed through the organic solvent regeneration system disclosed by the present invention to obtain a regenerated liquid, thereby achieving a significant effect of organic solvent regeneration and recovery.
Description
本發明係與有機溶劑再生技術相關,特別是指一種適用於電子半導體產業製程或者光電產業製程中所需之有機溶劑再生系統。The present invention relates to organic solvent regeneration technology, and in particular to an organic solvent regeneration system suitable for use in electronic semiconductor industry processes or optoelectronic industry processes.
目前所使用在電子半導體產業製程中或者光電產業製程中的有機溶劑回收系統,其一般常用於光阻剝離劑(PR Stripper)、或用於清洗溶劑、或用於粘結等有機溶劑為包含有NMP(即N-甲基吡咯烷酮,N-methyl-pyrrolidinone)化學成分在,然而,伴隨著其衍生之相關製程所勢必產生的廢料溶劑等後續處理或程序,則是一直持續困擾著各界。Organic solvent recovery systems currently used in electronic semiconductor industry processes or optoelectronic industry processes are generally used in photoresist strippers (PR strippers), cleaning solvents, or bonding solvents containing NMP (N-methyl-pyrrolidinone) chemical components. However, the subsequent treatment or procedures of waste solvents that are inevitably generated by the related processes have been a continuous problem for all parties.
因此,要如何符合當前聯合國永續發展目標(Sustainable Development Goals, SDGs)中之持續提升綠色製造能力,致使環境永續發展,實則本發明亟欲改善之方向。Therefore, how to meet the current United Nations Sustainable Development Goals (SDGs) of continuously improving green manufacturing capabilities to achieve environmental sustainability is actually the direction that the present invention urgently seeks to improve.
而為了要解決先前技術所述之問題,本發明係提供一種適用於電子半導體產業製程或者光電產業製程中所需之有機溶劑再生系統,藉由其包含有一個監控單元此技術特徵,將能建立起該有機溶劑再生系統整體所需對應之作業環境,並將一待處理液體經由本發明所揭露之有機溶劑再生系統後而得一再生液體,進而達到有機溶劑再生回收之顯著功效,更能預期地符合當前聯合國永續發展目標(Sustainable Development Goals, SDGs)中之持續提升綠色製造能力且致使環境永續發展微盡一份心力。In order to solve the problems described in the prior art, the present invention provides an organic solvent regeneration system suitable for use in electronic semiconductor industry processes or optoelectronic industry processes. By including a monitoring unit, the present invention can establish an operating environment corresponding to the entire organic solvent regeneration system, and obtain a regenerated liquid after a liquid to be treated passes through the organic solvent regeneration system disclosed in the present invention, thereby achieving a significant effect of organic solvent regeneration and recovery, and can also meet the current United Nations Sustainable Development Goals (SDGs) of continuously improving green manufacturing capabilities and contributing to environmental sustainability.
而為達成上述目的,本發明所提供之一種有機溶劑再生系統,其包含有一個監控單元、一個進料單元、一個再生單元、一個回收單元以及一個出料單元,該監控單元係各別電性連接並電性監控於該進料單元、該再生單元、該回收單元與該出料單元,且該再生單元係各別連通於該進料單元、該回收單元以及該出料單元,而該回收單元的另一端係可選擇性地連通於該進料單元;其中,該監控單元係更包含有一個真空模組以及一個溫控模組,使得該進料單元、該再生單元、該回收單元以及該出料單元係皆各自受到該監控單元之該真空模組或該溫控模組的電性控制。In order to achieve the above-mentioned purpose, the present invention provides an organic solvent regeneration system, which includes a monitoring unit, a feeding unit, a regeneration unit, a recovery unit and a discharging unit, wherein the monitoring unit is electrically connected to and electrically monitors the feeding unit, the regeneration unit, the recovery unit and the discharging unit, and the regeneration unit is connected to the feeding unit, the recovery unit and the discharging unit, respectively, and the other end of the recovery unit can be selectively connected to the feeding unit; wherein the monitoring unit further includes a vacuum module and a temperature control module, so that the feeding unit, the regeneration unit, the recovery unit and the discharging unit are all electrically controlled by the vacuum module or the temperature control module of the monitoring unit.
而透過本發明所揭露之有機溶劑再生系統的該監控單元各別電性監控該進料單元、該再生單元、該回收單元與該出料單元此技術特徵,如此一來,將能建立起該有機溶劑再生系統整體所需對應之作業環境(即包含真空度或溫度等),並將一待處理液體經由本發明所揭露之有機溶劑再生系統等工序後而得一再生液體(例如:含有NMP(即N-甲基吡咯烷酮,N-methyl-pyrrolidinone)或OEL Clean-01等再生有機溶劑液體),進而達到有機溶劑再生回收之顯著功效,甚至更能進一步再次提供電子半導體產業製程或者光電產業製程中所需之用於光阻剝離劑、或用於清洗溶劑、或用於粘結等作為再生有機溶劑。The monitoring unit of the organic solvent regeneration system disclosed in the present invention electrically monitors the feed unit, the regeneration unit, the recovery unit and the discharge unit. In this way, the corresponding operating environment (including vacuum degree or temperature, etc.) required by the organic solvent regeneration system as a whole can be established, and a liquid to be treated can be subjected to the processes of the organic solvent regeneration system disclosed in the present invention to obtain a regenerated liquid (for example, containing NMP (i.e., N-methyl-pyrrolidinone) or OEL). Clean-01 and other regenerated organic solvent liquids), thereby achieving a significant effect of organic solvent regeneration and recovery, and even further providing the photoresist stripping agent, cleaning solvent, or bonding agent required in the electronic semiconductor industry process or the optoelectronic industry process.
綜前所述,本發明係更提供之一種有機溶劑再生系統的操作方法,其包含有以下步驟:In summary, the present invention further provides an operating method of an organic solvent regeneration system, which comprises the following steps:
步驟A、建議起始作業環境,係將一待處理液體放置在該進料單元中,且經電性啟動該監控單元之該真空模組與該溫控模組,使整體作業環境維持於一預定起始作業真空度以及一預定起始作業溫度。Step A, recommending a starting operating environment, is to place a liquid to be processed in the feed unit, and electrically activate the vacuum module and the temperature control module of the monitoring unit so that the overall operating environment is maintained at a predetermined starting operating vacuum degree and a predetermined starting operating temperature.
步驟B、第一過濾工序,係藉由該監控單元各別以電性控制該進料單元與該再生單元,使放置在該進料單元中的該待處理液體得以被傳輸至該再生單元中,且經電性啟動該監控單元之該真空模組與該溫控模組,使得該再生單元中符合該第一過濾工序所需之作業真空度與作業溫度,進而讓該待處理液體逐漸地將其多餘之水氣予以過濾排除。Step B, the first filtering process, is to electrically control the feed unit and the regeneration unit through the monitoring unit, so that the liquid to be treated placed in the feed unit can be transferred to the regeneration unit, and the vacuum module and the temperature control module of the monitoring unit are electrically activated, so that the operating vacuum degree and operating temperature required by the first filtering process are met in the regeneration unit, thereby allowing the liquid to be treated to gradually filter out its excess water vapor.
步驟C、雜質液體分離工序,係經電性啟動該監控單元之該真空模組與該溫控模組,使得該再生單元中符合於該雜質液體分離工序所需之作業真空度與作業溫度,進而讓該待處理液體逐漸地將其多餘之其他雜質液體予以過濾排除。Step C, the impurity liquid separation process, is to electrically activate the vacuum module and the temperature control module of the monitoring unit so that the regeneration unit meets the operating vacuum and operating temperature required for the impurity liquid separation process, thereby allowing the liquid to be treated to gradually filter out the excess impurities.
步驟D、再生液體回收工序,係藉由該監控單元各別以電性控制該再生單元、該回收單元與該出料單元,使該再生單元中之一再生液體得以被傳輸至該回收單元中,且使該再生單元中之一雜質液體得以被傳輸至該出料單元中。In step D, the regeneration liquid recovery process, the monitoring unit electrically controls the regeneration unit, the recovery unit and the discharge unit respectively, so that a regeneration liquid in the regeneration unit can be transferred to the recovery unit, and an impurity liquid in the regeneration unit can be transferred to the discharge unit.
申請人首先在此說明,於整篇說明書中,包括以下介紹的實施例以及申請專利範圍的各請求項中,有關方向性的名詞皆以本案[圖示簡單說明]中所列各圖式的方向為基準。其次,在以下將要介紹之實施例及圖式中,相同之元件標號,代表相同或近似之元件或其結構特徵。而且,有關本發明的詳細構造、特點、組裝或使用、製造等方式,將於後續的實施方式詳細說明中予以描述,然,在本發明領域中具有通常知識者應能瞭解,該等詳細說明及本發明所列舉的實施例,係僅用於支持說明本發明實能據以實現,並非用以限制本發明之申請專利範圍。The applicant first explains that throughout the entire specification, including the embodiments introduced below and the various claims in the scope of the patent application, directional terms are based on the directions of the various figures listed in the [Simple Description of the Figures] of this case. Secondly, in the embodiments and figures to be introduced below, the same component numbers represent the same or similar components or their structural features. Moreover, the detailed structure, features, assembly or use, manufacturing, etc. of the present invention will be described in the subsequent detailed description of the implementation method. However, those with ordinary knowledge in the field of the present invention should understand that such detailed descriptions and the embodiments listed in the present invention are only used to support and illustrate that the present invention can be implemented, and are not used to limit the scope of the patent application of the present invention.
請先參閱圖1至圖3,為本發明較佳實施例所揭露之一種適用於電子半導體產業製程或者光電產業製程中所需之有機溶劑再生系統1,係包含有一個監控單元10、一個進料單元20(例如:大型進料容器或桶槽,但並非以此用以限制本發明之申請專利範圍)、一個再生單元30(例如:再生用容器或桶槽,但並非以此用以限制本發明之申請專利範圍)、一個回收單元40(例如:大型回收容器或桶槽,但並非以此用以限制本發明之申請專利範圍)以及一個出料單元50(例如:大型出料容器或桶槽,但並非以此用以限制本發明之申請專利範圍),該監控單元10係用以各別電性連接並電性監控於該進料單元20、該再生單元30、該回收單元40以及該出料單元50,且該再生單元30係各別連通於該進料單元20、該回收單元40以及該出料單元50,其中,該監控單元10係包含有一真空模組11以及一溫控模組13,使該進料單元20、該再生單元30、該回收單元40以及該出料單元50係皆各自受到該監控單元10之該真空模組11或該溫控模組13的電性控制,進而各別產生作業時所需對應之真空度及其作業溫度。較佳地,由於本發明較佳實施例所揭露之適用於電子半導體產業製程或者光電產業製程中所需的該有機溶劑再生系統1整體容積率相較於先前技術之下,已可顯著地適地適宜客製化裝設在現有電子半導體產業或光電產業等廠區中,進而達到廠區容積率之善用功效以及適度地增加廠區產能需求功效。Please refer to FIG. 1 to FIG. 3, which are preferred embodiments of the present invention, and disclose an organic
以上為本發明較佳實施例所揭露之有機溶劑再生系統1及其各子構件的技術特徵,其後,將繼續揭露本發明較佳實施例之有機溶劑再生系統1所包含的主要操作方法之步驟及其所對應欲達成之功效在於:The above are the technical features of the organic
步驟A、建立起始作業環境;請一併參閱圖1、圖2,將欲進行再生之待處理液體(例如:一般已經用於光阻剝離劑、或用於清洗溶劑、或用於粘結等有機溶劑為包含有NMP(即N-甲基吡咯烷酮,N-methyl-pyrrolidinone)化學成分等待處理液體)放置在該有機溶劑再生系統1之進料單元20中,接著,係經電性啟動該監控單元10之該真空模組11與該溫控模組13,使該有機溶劑再生系統1整體作業環境維持於一個預定起始作業真空度以及一個預定起始作業溫度,其中,本發明較佳實施例所揭露的該預定起始作業真空度係設定維持於0.045 Bar,且該預定起始作業溫度係設定維持於攝氏80℃,如此一來,將讓欲進行再生之待處理液體放置在本發明所揭露之有機溶劑再生系統1的該進料單元20中時,得以達到維持在一個穩定的起始作業環境中進行作業工序之功效。而值得一提的是,於本步驟A中,該有機溶劑再生系統1整體的該預定起始作業真空度係可介於0.035 Bar至0.055 Bar之間,而較佳地該預定起始作業真空度係介於0.04 Bar至0.05 Bar之間;此外,該有機溶劑再生系統1整體的該預定起始作業溫度係可介於攝氏70℃至90℃之間,而較佳地該預定起始作業溫度係介於攝氏75℃至85℃之間。Step A, establish the initial working environment; please refer to Figure 1 and Figure 2, place the liquid to be treated (for example, the organic solvent generally used for photoresist stripping agent, cleaning solvent, or bonding, which contains NMP (i.e. N-methyl-pyrrolidinone) chemical components) in the organic In the
步驟B、第一過濾工序;請一併參閱圖1、圖2,承前所述,接著,係藉由該有機溶劑再生系統1之監控單元10各別以電性控制該進料單元20與該再生單元30,使放置在該有機溶劑再生系統1之進料單元20中的待處理液體得以被傳輸至該再生單元30中,此時,再次經電性啟動該監控單元10之該真空模組11與該溫控模組13,使得該再生單元30中符合於一第一過濾工序所需的作業環境,而本發明較佳實施例所揭露之有機溶劑再生系統1的該再生單元30之第一過濾工序所需的作業真空度係設定維持於0.05 Bar,且該第一過濾工序所需之作業溫度係自攝氏80℃逐漸調升至攝氏120℃,如此一來,將讓位於該再生單元30中的該待處理液體藉由本步驟B之第一過濾工序逐漸地將其多餘之水氣過濾排除,進而達到如蒸餾工序般可用以去除多餘水氣之功效。而值得一提的是,於本步驟B中,該有機溶劑再生系統1之再生單元30的該第一過濾工序所需之作業真空度係可介於0.04 Bar至0.06 Bar之間,而較佳地作業真空度係介於0.045 Bar至0.055 Bar之間;此外,該有機溶劑再生系統1之再生單元30的該第一過濾工序所需之作業溫度係可介於攝氏110℃至130℃之間,而較佳地作業溫度係介於攝氏115℃至125℃之間。Step B, first filtering process; please refer to FIG. 1 and FIG. 2 together. As mentioned above, the
步驟C,雜質液體分離工序;請一併參閱圖1、圖2,承前所述,接著,係經電性控制該有機溶劑再生系統1之監控單元10的該真空模組11與該溫控模組13,使得該再生單元30中符合於一雜質液體分離工序所需的作業環境,而本發明較佳實施例所揭露之有機溶劑再生系統1的該再生單元30之雜質液體分離工序所需之作業真空度係設定維持於0.05 Bar,且該雜質液體分離工序所需之作業溫度係自攝氏120℃逐漸調升至攝氏150℃,如此一來,將讓位於該再生單元30中的該待處理液體藉由本步驟C之雜質液體分離工序逐漸地將其多餘之其他雜質液體過濾排除,進而達到如蒸餾工序般可用以排除多餘雜質液體之功效。而值得一提的是,於本步驟C中,該有機溶劑再生系統1之再生單元30的該雜質液體分離工序所需之作業真空度係可介於0.04 Bar至0.06 Bar之間,而較佳地作業真空度係介於0.045 Bar至0.055 Bar之間;此外,該有機溶劑再生系統1之再生單元30的該雜質液體分離工序所需之作業溫度介於攝氏140℃至160℃之間,而較佳地作業溫度介於攝氏145℃至155℃之間。Step C, impurity liquid separation process; please refer to FIG. 1 and FIG. 2 together. As mentioned above, the
步驟D,再生液體回收工序;請一併參閱圖1、圖2,承前所述,接著,係再次藉由該有機溶劑再生系統1之監控單元10各別以電性控制該再生單元30、回收單元40與該出料單元50,使得放置在該有機溶劑再生系統1之再生單元30中且經步驟B之第一過濾工序與步驟C之雜質液體分離工序後所得之再生液體得以被傳輸至該回收單元40中,並且使得經步驟B之第一過濾工序與步驟C之雜質液體分離工序後所得之雜質液體得以被傳輸至該出料單元50中,如此一來,將讓被傳輸至該回收單元40中的該再生液體藉由本步驟D之再生液體回收工序進而達到有機溶劑再生回收之顯著功效,甚至更能進一步再次提供電子半導體產業製程或者光電產業製程中所需之用於光阻剝離劑、或用於清洗溶劑、或用於粘結等作為再生有機溶劑,更能預期地符合當前聯合國永續發展目標(Sustainable Development Goals, SDGs)中之持續提升綠色製造能力且致使環境永續發展微盡一份心力;此外,更讓被傳輸至該出料單元50中的該雜質液體得以被妥善安置並靜待後續習知處理工序。Step D, regeneration liquid recovery process; please refer to FIG. 1 and FIG. 2 together. As mentioned above, the
而值得一提的是,於前述步驟D中,位於該有機溶劑再生系統1之回收單元40中的該再生液體為包含有NMP(即N-甲基吡咯烷酮,N-methyl-pyrrolidinone)或OEL Clean-01等再生有機溶劑液體;此外,該有機溶劑再生系統1之回收單元40與該出料單元50所需的作業真空度係可介於0.04 Bar至0.06 Bar之間,而較佳地作業真空度係介於0.045 Bar至0 Bar之間;此外,該有機溶劑再生系統1之回收單元40所需之作業溫度係介於攝氏130℃至160℃之間,而較佳地作業溫度係介於攝氏135℃至155℃之間;此外,該有機溶劑再生系統1之出料單元50係更包含有一冷卻模組(圖中未示),用以提供被傳輸至該出料單元50中的該雜質液體得以先經降溫冷卻至一預定溫度後,始被妥善安置並靜待後續習知處理工序。而更值得一提的是,於前述步驟D中,請再一併參閱圖1至圖3,藉由該有機溶劑再生系統1之回收單元40的另一端係可選擇性地連通於該進料單元20此技術特徵,如此一來,該監控單元10係可將被傳輸至該回收單元40中的該再生液體,再次經前述所提之步驟B之第一過濾工序以及步驟C之雜質液體分離工序後始被傳輸至該回收單元40中,進而達到經精密萃取、多重汲取所需之再生液體的功效。It is worth mentioning that in the aforementioned step D, the regeneration liquid in the
1:有機溶劑再生系統 10:監控單元 11:真空模組 13:溫控模組 20:進料單元 30:再生單元 40:回收單元 50:出料單元 1: Organic solvent regeneration system 10: Monitoring unit 11: Vacuum module 13: Temperature control module 20: Feeding unit 30: Regeneration unit 40: Recovery unit 50: Discharging unit
圖1係為本發明較佳實施例之平面示意圖,主要係揭露一種適用於電子半導體產業製程或者光電產業製程中所需之有機溶劑再生系統的整體實際布局。 圖2係為圖1之有機溶劑再生系統的主要系統方塊圖。 圖3係為類似圖2之有機溶劑再生系統的另一主要系統方塊圖,主要係揭露該有機溶劑再生系統之一回收單元的另一端係可選擇性地連通於一進料單元。 FIG. 1 is a schematic plan view of a preferred embodiment of the present invention, which mainly discloses an overall practical layout of an organic solvent regeneration system suitable for electronic semiconductor industry processes or optoelectronic industry processes. FIG. 2 is a main system block diagram of the organic solvent regeneration system of FIG. 1. FIG. 3 is another main system block diagram of the organic solvent regeneration system similar to FIG. 2, which mainly discloses that the other end of a recovery unit of the organic solvent regeneration system can be selectively connected to a feed unit.
1:有機溶劑再生系統 1: Organic solvent regeneration system
10:監控單元 10: Monitoring unit
11:真空模組 11: Vacuum module
13:溫控模組 13: Temperature control module
20:進料單元 20: Feeding unit
30:再生單元 30: Regeneration unit
40:回收單元 40: Recycling unit
50:出料單元 50: Discharging unit
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| TW112140920A TWI853733B (en) | 2023-10-25 | 2023-10-25 | Organic solvent regeneration system and operation method thereof |
| KR1020240085042A KR20250060074A (en) | 2023-10-25 | 2024-06-28 | Organic solvent regeneration system and its operating method |
| KR2020250001166U KR20250001208U (en) | 2023-10-25 | 2025-07-01 | Organic solvent regeneration system |
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| TW201834015A (en) * | 2017-02-01 | 2018-09-16 | 日商富士軟片股份有限公司 | Method for producing chemical liquid and manufacturing device for chemical liquid |
| TWM599316U (en) * | 2020-04-20 | 2020-08-01 | 華通電腦股份有限公司 | Chemical liquid recovering device |
| CN218248559U (en) * | 2022-08-15 | 2023-01-10 | 上海通周机械设备工程有限公司 | Intelligent automatic distillation type solvent recovery equipment |
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| TW201834015A (en) * | 2017-02-01 | 2018-09-16 | 日商富士軟片股份有限公司 | Method for producing chemical liquid and manufacturing device for chemical liquid |
| TWM599316U (en) * | 2020-04-20 | 2020-08-01 | 華通電腦股份有限公司 | Chemical liquid recovering device |
| CN218248559U (en) * | 2022-08-15 | 2023-01-10 | 上海通周机械设备工程有限公司 | Intelligent automatic distillation type solvent recovery equipment |
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