TWI868507B - Processing system - Google Patents
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- TWI868507B TWI868507B TW111141703A TW111141703A TWI868507B TW I868507 B TWI868507 B TW I868507B TW 111141703 A TW111141703 A TW 111141703A TW 111141703 A TW111141703 A TW 111141703A TW I868507 B TWI868507 B TW I868507B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q16/00—Equipment for precise positioning of tool or work into particular locations not otherwise provided for
- B23Q16/02—Indexing equipment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0023—Other grinding machines or devices grinding machines with a plurality of working posts
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B47/00—Drives or gearings; Equipment therefor
- B24B47/22—Equipment for exact control of the position of the grinding tool or work at the start of the grinding operation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
- B24B49/04—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent involving measurement of the workpiece at the place of grinding during grinding operation
- B24B49/045—Specially adapted gauging instruments
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
- B24B49/06—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent requiring comparison of the workpiece with standard gauging plugs, rings or the like
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B51/00—Arrangements for automatic control of a series of individual steps in grinding a workpiece
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0428—Apparatus for mechanical treatment or grinding or cutting
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Abstract
提供一種可精度佳且有效率地加工複數個工件之加工系統。 Provide a processing system that can process multiple workpieces with high precision and efficiency.
對工件W1、W2依序進行前磨削及精磨削之加工系統1係具備:分度台2,具備將工件W1、W2保持成可旋轉之夾盤3,使工件W1、W2按照粗磨削台ST2、中磨削台ST3、精磨削台ST4及校正台的順序移動;傾斜機構33,可調節夾盤3的傾斜;擺動式感測器72,測定精磨削前的工件W1、W2的形狀;固定式感測器8,在精磨削後的工件W1朝校正台搬送的期間,測定精磨削後的工件W1的形狀;及控制裝置9,依據精磨削前的工件W1、W2的形狀,控制進行精磨削之際的夾盤3之傾斜、即傾斜角,依據精磨削後的工件W1的形狀,在對工件W2精磨削之際補償傾斜角。 The processing system 1 for sequentially performing pre-grinding and fine grinding on the workpieces W1 and W2 comprises: a dividing table 2, which is provided with a chuck 3 for holding the workpieces W1 and W2 in a rotatable manner, so that the workpieces W1 and W2 move in the order of a rough grinding table ST2, a medium grinding table ST3, a fine grinding table ST4 and a calibration table; a tilting mechanism 33, which can adjust the tilt of the chuck 3; a swing sensor 72, which measures the workpiece before fine grinding. The shape of the workpieces W1 and W2; the fixed sensor 8 measures the shape of the workpiece W1 after fine grinding while the workpiece W1 after fine grinding is being transported to the correction table; and the control device 9 controls the inclination, i.e. the inclination angle, of the chuck 3 during fine grinding according to the shapes of the workpieces W1 and W2 before fine grinding, and compensates the inclination angle during fine grinding of the workpiece W2 according to the shape of the workpiece W1 after fine grinding.
Description
本發明係有關一種對複數個工件連續地磨削之加工系統。 The present invention relates to a processing system for continuously grinding multiple workpieces.
半導體製造領域中,在有關將矽晶圓等之半導體晶圓(以下,稱為「工件」)薄化且平坦地磨削方面,已知悉一種將旋轉的磨削砂輪的磨削面推抵於工件以進行工件的磨削之磨削裝置。 In the field of semiconductor manufacturing, in terms of grinding a semiconductor wafer such as a silicon wafer (hereinafter referred to as a "workpiece") to be thin and flat, a grinding device is known that grinds the workpiece by pushing the grinding surface of a rotating grinding wheel against the workpiece.
專利文獻1揭示一種按照粗磨削、精磨削及研磨的順序加工工件的磨削加工裝置。本裝置揭示在研磨台內擺動式的厚度感測器測定研磨後的工件的形狀,在研磨後的工件的形狀並非所期望的形狀之情況,於接著要加工之工件進行精磨削時,調整傾斜(tilt)機構的傾斜量。
[先前技術文獻] [Prior Art Literature]
[專利文獻] [Patent Literature]
[專利文獻1]日本特開2015-79457號公報 [Patent Document 1] Japanese Patent Publication No. 2015-79457
專利文獻1所記載的磨削加工裝置中,在對加
工後的工件的形狀進行測定時,於研磨墊退避後,因為厚度感測器有必要在研磨後的工件上進行掃描,所以在對複數個工件進行連續加工的情況,有處理量(throughput)惡化的問題。
In the grinding processing device described in
於是,為了精度佳且有效率地加工複數個工件而衍生出應解決之技術的課題,本發明以解決該課題為目的。 Therefore, in order to process multiple workpieces with high precision and efficiency, a technical problem that needs to be solved has arisen, and the purpose of this invention is to solve this problem.
為達成上述目的,本發明的加工系統,係對工件依序進行前磨削及精磨削,該加工系統具備:分度台,具備可將前述工件保持可旋轉之夾盤,使前述工件至少依前磨削台、精磨削台及校正台的順序移動;傾斜機構,可調節前述夾盤的傾斜;第1感測器,測定精磨削前之前述工件的形狀;第2感測器,在精磨削後的前述工件朝前述校正台搬送的期間,測定精磨削後之前述工件的形狀;及控制裝置,依據精磨削前之前述工件的形狀,於進行精磨削之際控制前述夾盤之傾斜、即傾斜角,依據精磨削後的前述工件的形狀,於對下一個工件精磨削之際,補償前述傾斜角。 To achieve the above-mentioned purpose, the processing system of the present invention sequentially performs pre-grinding and fine grinding on the workpiece. The processing system comprises: a dividing table having a chuck that can hold the workpiece and rotate, so that the workpiece moves at least in the order of a pre-grinding table, a fine grinding table and a correction table; a tilting mechanism that can adjust the tilt of the chuck; a first sensor that measures the shape of the workpiece before fine grinding; ; a second sensor, which measures the shape of the workpiece after fine grinding while the workpiece after fine grinding is being transported to the correction table; and a control device, which controls the tilt, i.e., the tilt angle, of the chuck during fine grinding according to the shape of the workpiece before fine grinding, and compensates for the tilt angle when fine grinding the next workpiece according to the shape of the workpiece after fine grinding.
本發明可精度佳且有效率地加工複數個工件。 The present invention can process multiple workpieces with high precision and efficiency.
1:加工系統 1: Processing system
1a:機架 1a: Rack
2:分度台 2: Indexing table
2a:旋轉軸 2a: Rotation axis
3:夾盤 3: Clamp
3a:旋轉軸 3a: Rotation axis
31:旋轉台 31: Rotating table
32:吸附體 32: Adsorbent
33:傾斜機構 33: Tilt mechanism
34:傾斜台 34: Tilt platform
35:固定支持部 35: Fixed support part
36:第1可動支持部 36: 1st movable support part
37:第2可動支持部 37: Second movable support unit
41:第1臂
41:
42:第1料架 42: 1st rack
43:第2臂 43: Second Arm
44:第2料架 44: 2nd rack
5:粗磨削裝置 5: Rough grinding device
51:粗磨削砂輪 51: Rough grinding wheel
52:第1主軸 52: 1st main axis
53:第1主軸進給機構 53: 1st spindle feed mechanism
6:中磨削裝置 6: Middle grinding device
61:第2主軸 61: Second main axis
62:第2主軸進給機構 62: Second spindle feed mechanism
7:精磨削裝置 7: Fine grinding device
71:精磨削砂輪 71: Fine grinding wheel
72:擺動式感測器 72: Oscillating sensor
73:臂 73: Arm
74:感測頭 74:Sensor head
75:驅動軸 75: Drive shaft
8:固定式感測器 8: Fixed sensor
9:控制裝置 9: Control device
D:旋轉方向 D: Rotation direction
O:中心 O: Center
P1:外周位置 P1: Peripheral position
R:旋轉軌道 R: Rotating track
ST1:校正台 ST1: Calibration table
ST2:粗磨削台 ST2: Rough grinding table
ST3:中磨削台 ST3: Middle grinding table
ST4:精磨削台 ST4: Fine grinding table
W:工件 W: Workpiece
W1:工件 W1: Workpiece
W2:工件 W2: Workpiece
[圖1]係顯示本發明一實施形態的加工系統之平面圖。 [Figure 1] is a plan view showing a processing system of an embodiment of the present invention.
[圖2]係顯示夾盤、擺動式厚度感測器及傾斜機構的位置關係之平面圖。 [Figure 2] is a plan view showing the positional relationship between the chuck, swing-type thickness sensor, and tilt mechanism.
[圖3]係顯示固定式厚度感測器的設置位置之示意圖。 [Figure 3] is a schematic diagram showing the installation location of the fixed thickness sensor.
[圖4]係顯示在工件上的固定式厚度感測器的測定點的位置關係之示意圖。 [Figure 4] is a schematic diagram showing the positional relationship of the measuring points of the fixed thickness sensor on the workpiece.
[圖5]係顯示對第1片的工件進行加工的順序之示意圖。 [Figure 5] is a schematic diagram showing the processing sequence for the first workpiece.
[圖6]係顯示第1片的工件的外周部的精磨削前後的形狀之圖表。 [Figure 6] is a graph showing the shape of the outer periphery of the first workpiece before and after fine grinding.
[圖7]係顯示在各工件的精磨削時的各可動支持部之升降量的表格。 [Figure 7] is a table showing the lifting amount of each movable support part during the fine grinding of each workpiece.
[圖8]係顯示對第2片的工件進行加工的順序之示意圖。 [Figure 8] is a schematic diagram showing the processing sequence for the second workpiece.
[圖9]係顯示第2片的工件的外周部的精磨削前後的形狀之圖表。 [Figure 9] is a graph showing the shape of the outer periphery of the second workpiece before and after fine grinding.
針對本發明一實施形態,依據圖面作說明。此外,在以下,於提及構成要素的數、數值、量、範圍等之情況,除非特別明示的情況及在原理上清楚限定為特定的數的情況,否則不被其特定的數所限定,可為特定的數以上或以下。 An embodiment of the present invention is described based on the drawings. In addition, in the following, when referring to the number, value, amount, range, etc. of the constituent elements, unless otherwise specifically stated or clearly limited to a specific number in principle, it is not limited to the specific number and can be greater than or less than the specific number.
又,於提及構成要素等的形狀、位置關係時,除非特別明示的情況及在原理上認為明顯非那樣的情況等,否則實質上包含與其形狀等近似或類似者等。 Furthermore, when referring to the shape or positional relationship of constituent elements, unless otherwise specifically stated or it is considered to be obviously not the case in principle, the term substantially includes those that are similar or similar to the shape, etc.
又,為使特徴容易瞭解,圖式或有將特徴的部分放大等而誇大的情況,構成要素的尺寸比例等未必與實 際相同。又,為使構成要素的剖面構造容易瞭解,剖面圖中或有省略一部分的構成要素之剖面線的情況。 In addition, in order to make the features easier to understand, the drawings may exaggerate the features by enlarging them, and the size ratios of the components may not be the same as the actual ones. In addition, in order to make the cross-sectional structure of the components easier to understand, the cross-sectional drawings may omit the hatching of some components.
圖1係顯示加工系統1基本的構成之平面圖。加工系統1係對工件W連續進行複數個磨削工程。此外,加工系統1亦可僅進行磨削加工或研磨加工任一者,亦可在磨削加工後進行研磨加工。
FIG1 is a plan view showing the basic structure of the
在加工系統1,設有校正台ST1、粗磨削台ST2、中磨削台ST3及精磨削台ST4等4個台。此外,在比精磨削台ST4還上游側依序加工工件W的台(前磨削台)數並未受限於粗磨削台ST2及中磨削台ST3等2個,亦可為1或3個以上。
In the
加工系統1具備可繞旋轉軸2a轉動的分度台2、及以分度台2的旋轉軸2a為中心的同心圓上以等間隔分離配置的4個夾盤3。透過分度台2旋轉,夾盤3係可按校正台ST1、粗磨削台ST2、中磨削台ST3、精磨削台ST4的順序移動。
The
夾盤3係於旋轉台31的上面埋設著由氧化鋁等之多孔質材料構成的吸附體32。4個夾盤3的各吸附體32的表面(吸附面)藉由加工前的自體研磨(SELF GRINDING)分別形成一樣。夾盤3具備通過內部在表面延伸之未圖示的管路。管路係經由未圖示的旋轉接頭連接於真空源、壓縮空氣源或供水源。當真空源起動時,載置在夾盤3的工件W被吸附保持於夾盤3。又,當壓縮空氣源或供水源起動時,工件W與夾盤3之吸附被解除。
The
旋轉台31係連接於未圖示的夾盤主軸。夾盤主軸係構成為可繞與旋轉台31垂直的旋轉軸旋轉驅動。
The
如圖2所示,夾盤3係被可將夾盤3的旋轉軸3a(通過工件W的中心O之垂直軸)傾斜的傾斜機構33所支持。傾斜機構33具備傾斜台34、固定支持部35、第1可動支持部36及第2可動支持部37。
As shown in FIG. 2 , the
傾斜台34在俯視下係形成大致三角形狀。傾斜台34借設於分度台2與夾盤3之間,支持著旋轉台31。
The tilting table 34 is roughly triangular in shape when viewed from above. The tilting table 34 is disposed between the indexing table 2 and the
固定支持部35、第1可動支持部36及第2可動支持部37,係在傾斜台34上於以夾盤3的旋轉軸3a為中心的同心圓上等間隔分離配置。固定支持部35係將分度台2與傾斜台34結合的螺栓。
The fixed
第1可動支持部36相對於固定支持部35配置在夾盤3的旋轉方向D的上游側。又,第2可動支持部37相對於固定支持部35配置在夾盤3的旋轉方向D的下游側。第1可動支持部36及第2可動支持部37分別構成為透過以馬達使在分度台2與傾斜台34之間沿著鉛直方向配置之滾珠螺桿旋轉,以令傾斜台34可獨立地對分度台2升降。
The first
回到圖1,在校正台ST1,第1臂41從收容著加工前的工件W的第1料架(rack)42取出工件W,搬送到位在校正台ST1內的夾盤3。工件W被預先進行使其朝向和既定方向一致的放樣(setting out)。又,第2臂43從位在校正台ST1內的夾盤3接取加工後的工件W,搬送到供收容加工後的工件W之第2料架44。
Returning to Figure 1, on the calibration table ST1, the
在粗磨削台ST2,設有粗磨削裝置5。粗磨削裝置5具備後述之粗磨削砂輪51、在下端安裝粗磨削砂輪51且將粗磨削砂輪51支持成可旋轉的第1主軸52、及使第1主軸52沿著鉛直方向升降的第1主軸進給機構53。粗磨削砂輪51,例如使用#8000的杯型砂輪。又,在粗磨削裝置5,設有於粗磨削加工中測定工件W的厚度之未圖示的厚度感測器。
A
在中磨削台ST3,設有中磨削裝置6。中磨削裝置6具備未圖示的中磨削砂輪、在下端安裝中磨削砂輪且將中磨削砂輪支持成可旋轉的第2主軸61、及使第2主軸61沿著鉛直方向升降的第2主軸進給機構62。中磨削砂輪,例如使用#8000的杯型砂輪。又,在中磨削裝置6,設有在中磨削加工中測定工件W的厚度之未圖示的厚度感測器。
The middle grinding table ST3 is provided with a
在精磨削台ST4,設有精磨削裝置7。精磨削裝置7具備精磨削砂輪71、在下端安裝精磨削砂輪71且將精磨削砂輪71支持成可繞沿著鉛直方向設定的旋轉軸旋轉之未圖示的第3主軸、及使第3主軸沿著鉛直方向升降之未圖示的第3主軸進給機構。精磨削砂輪71係例如為#8000的杯型砂輪。又,在精磨削裝置7,設有在精磨削加工中測定工件W的厚度之未圖示的厚度感測器。
A finishing
在精磨削台ST4,設有擺動式的厚度感測器72。擺動式感測器72係測定精磨削前的工件W的厚度(膜厚),測定其形狀。擺動式感測器72係能以非接觸方式検出膜厚之光學式的感測器,如圖2所示,在臂73的先端安裝
有感測頭74,臂73的基端連接於分度台2外的驅動軸75。臂73為能以驅動軸75為支點沿著水平面擺動,感測頭74構成為可從工件W的外周位置P1移動到與工件W的中心O重疊的位置。
A swinging
回到圖1,在加工系統1,設有固定式的厚度感測器8。固定式感測器8係以非接觸方式測定精磨削後的工件W的厚度(膜厚),測定其形狀。固定式感測器8,例如係分光干渉式的膜厚測定器。固定式感測器8係於分度台2的旋轉方向,在校正台ST1的上游側及下游側分別各設置1台。此乃在將加工後的工件W從精磨削台ST4搬送到校正台ST1時,在分度台2的旋轉機構之關係上,有分度台2在圖1紙面上順時針旋轉的情況和逆時針旋轉的情況,為了對應分度台2的各旋轉方向,在校正台ST1的上游側及下游側分別各設置1台固定式感測器8。
Returning to FIG. 1 , a fixed
如圖3所示,固定式感測器8係固定於被架設在加工系統1內的機架1a且設置於分度台2的上方。固定式感測器8測定工件W的厚度之測定點,從俯視觀察時,係設定在工件W的中心O的旋轉軌道R上。此外,在圖3,僅例示設在校正台ST1與精磨削台ST4之間的固定式感測器8,將設在校正台ST1與粗磨削台ST2之間的固定式感測器8省略。
As shown in FIG3 , the fixed
圖4係顯示在工件W上的固定式感測器8的測定點的位置關係之示意圖。此外,圖4中,例示在設定成分度台2的旋轉數為20deg/秒、夾盤3的旋轉數為400rpm及
固定式感測器8的取樣周期為4毫秒之情況下的固定式感測器8的測定點之位置關係。因為工件W在固定式感測器8正下一邊旋轉一邊通過,所以固定式感測器8的測定點之軌跡係包含工件W的中心O在內的工件W整面擴展。此外,固定式感測器8的測定點之軌跡係依分度台2的旋轉數、夾盤3的旋轉數及固定式感測器8的取樣周期而可適宜變更。
FIG4 is a schematic diagram showing the positional relationship of the measuring point of the fixed
此外,固定式感測器8若為在將加工後的工件W從精磨削台ST4往校正台ST1搬送的期間可測定工件W的厚度,則未受限於配置在校正台ST1的上游側及下游側,例如,亦可分別配置在精磨削台ST4的上游側及下游側。
In addition, if the fixed
加工系統1的動作係被控制裝置9所控制。控制裝置9係對構成加工裝置1之構成要素分別作控制。控制裝置9,例如係藉由CPU、記憶體等所構成。此外,控制裝置9的功能可透過使用軟體作控制而實現,亦可透過使用硬體並作動而實現。
The operation of the
控制裝置9係以精磨削後的工件W和所期望的形狀大約一致的方式,依據擺動式感測器72所計測之精磨削前的工件W的厚度,驅動傾斜機構33使夾盤3的旋轉軸3a對精磨削砂輪71的旋轉軸傾斜。以下,將夾盤3的旋轉軸3a相對於精磨削砂輪71的旋轉軸之角度稱為「傾斜角」。
The
其次,針對將2片的工件W依序加工成大致平坦的順序作說明。以下,在區別2片的工件W的情況,賦予符號W1、W2作區別。此外,工件W的目標形狀未受限於大致平坦者。 Next, the procedure for processing two pieces of workpieces W into a roughly flat state is described. In the following, the two pieces of workpieces W are distinguished by the symbols W1 and W2. In addition, the target shape of the workpiece W is not limited to a roughly flat one.
<第1片的工件> <1st piece of workpiece>
在校正台ST1,第1臂41將工件W1從第1料架42取出並移送到夾盤3。然後,當真空源起動時,工件W1與夾盤3之間被供給負壓,工件W1即被吸附保持於夾盤3。
On the correction table ST1, the
其次,分度台2旋轉,夾盤3朝粗磨削台ST2移動。
Next, the indexing table 2 rotates and the
夾盤3移動至粗磨削台ST2,對工件W1進行粗磨削加工。於粗磨削加工中,如圖5(a)所示,在使粗磨削砂輪51及夾盤3分別旋轉的狀態下將粗磨削砂輪51的磨削面推抵於工件W1以進行工件W1的粗磨削。當工件W1達到所期望的厚度時,如圖5(b)所示,粗磨削裝置5係使粗磨削砂輪51及夾盤3的旋轉停止,使粗磨削砂輪51往上方退避,結束粗磨削。
The
其次,分度台2旋轉,夾盤3朝中磨削台ST3移動。在中磨削台ST3對工件W1進行中磨削加工。於中磨削加工中,在使中磨削砂輪及夾盤3分別旋轉的狀態下,將中磨削砂輪的磨削面推抵於工件W1以進行工件W1的中磨削。當工件W達到所期望的厚度時,中磨削裝置6係使中磨削砂輪及夾盤3的旋轉停止,使中磨削砂輪往上方退避,結束中磨削。
Next, the indexing table 2 rotates, and the
其次,分度台2旋轉,夾盤3朝精磨削台ST4移動。然後,臂73以驅動軸75為支點擺動,如圖5(c)所示,感測頭74從工件W的外周位置P1掃描到與工件W1的中心O重疊的位置。藉此,測定精磨削前的工件W1的形狀。圖6
顯示第1片的精磨削前的工件W的形狀。
Next, the indexing table 2 rotates and the
其次,如圖5(d)所示,因應精磨削前的工件W1的形狀使夾盤3的旋轉軸3a傾斜。
Next, as shown in FIG5(d), the
具體言之,控制裝置9係調用(invoke)和擺動式感測器72所測定之精磨削前的工件W1的形狀與磨削後的工件W1的目標形狀之差分一致的精磨削時的工件W1的磨削量及實現其磨削量的傾斜角。然後,控制裝置9係調用和傾斜角對應之第1可動支持部36及第2可動支持部37的各升降量,使第1可動支持部36及第2可動支持部37分別升降。藉此,傾斜台34以固定支持部35為基準使夾盤3的旋轉軸3a對精磨削砂輪71的旋轉軸傾斜。
Specifically, the
在控制裝置9預先記憶有藉由實驗等所取得之,精磨削時的工件W1的磨削量與傾斜角之關係,及實現其傾斜角的第1可動支持部36及第2可動支持部37的各升降量。圖7(a)顯示第1片的精磨削前的工件W1中之第1可動支持部36及第2可動支持部37的各升降量。此外,升降量係正(+)對應上升量,負(-)對應降下量。亦即,圖7(a)係例示在使第1可動支持部36升降3μm,使第2可動支持部37降下1.5μm的情況。
The
其次,如圖5(e)所示,對工件W1進行精磨削加工。具體言之,於精磨削加工中,在使精磨削砂輪71及夾盤3分別旋轉的狀態下,將精磨削砂輪71的磨削面推抵於工件W1以進行工件W1的精磨削。當工件W達到所期望的厚度時,精磨削裝置7係使精磨削砂輪71及夾盤3的旋轉停
止,使精磨削砂輪71往上方退避,結束精磨削。
Next, as shown in FIG. 5(e), the workpiece W1 is subjected to fine grinding. Specifically, during the fine grinding, the grinding surface of the
其次,在分度台2旋轉,夾盤3朝校正台ST1移動,且工件W1與夾盤3之吸附被解除後,第2臂43將工件W1從夾盤3取出並移送到第2料架44。
Next, when the indexing table 2 rotates, the
此處,在分度台2旋轉,夾盤3朝校正台ST1移動期間,如圖5(f)所示,固定式感測器8測定在工件W整面的複數個測定點的工件W1之膜厚,測定工件W1的形狀。工件W1上之固定式感測器8的測定點,例如設定成200點。從俯視觀察時,固定式感測器8的測定點是設定在夾盤3的中心O的旋轉軌道R上。藉此,固定式感測器8係可於工件W1繞旋轉軸3a自轉的狀態下且工件W1返回校正台ST1之中途,在未使工件W1的磨削加工的處理量(throughput)降低下進行工件W1的膜厚測定及形狀測定。圖6顯示第1片的精磨削後的工件W的形狀。
Here, while the indexing table 2 rotates and the
其次,控制裝置9係將固定式感測器8所測定之精磨削加工後的工件W1的形狀與所期望的目標形狀作比較。在精磨削加工後的工件W1的形狀與所期望的目標形狀不一致的情況,以和精磨削加工後的工件W1的形狀與所期望的目標形狀之差分一致之方式記憶要加在精磨削時的傾斜角之補償角。此外,在控制裝置9預先記憶著藉由實驗等所取得之精磨削加工後的工件W1的形狀及所期望的目標形狀的差分與緩和此差分的補償角之關係,及實現傾斜機構33的補償角之第1可動支持部36及第2可動支持部37的各升降量(補償升降量)。
Next, the
根據圖6,精磨削後的工件W1的形狀與大致平坦的目標形狀相比,外周部(圖表中以虛線的橢圓圍住的部分)凹陷而局部薄了2μm左右。於是,控制裝置9係調用工件W1的外周部會變厚2μm左右那樣的補償角,並且如圖7(b)的圖示,調用和該補償角對應之使第1可動支持部36降下0.3μm,使第2可動支持部37降下0.2μm的補償升降量。此外,在精磨削加工後的工件W1的形狀與所期望的目標形狀一致的情況,補償角及補償升降量均為零。
According to FIG6, the shape of the workpiece W1 after fine grinding is concave and partially thinner by about 2μm in the outer periphery (the part surrounded by the dotted ellipse in the figure) compared to the roughly flat target shape. Therefore, the
<第2片的工件> <Workpiece of the second piece>
其次,對第1片的工件W1進行粗磨削加工,與中磨削加工同樣地,對第2片的工件W2進行粗磨削加工、中磨削加工。之後,分度台2旋轉,夾盤3朝精磨削台ST4移動。
Next, the first workpiece W1 is subjected to rough grinding, and similarly to the intermediate grinding, the second workpiece W2 is subjected to rough grinding and intermediate grinding. Afterwards, the indexing table 2 rotates, and the
於精磨削台ST4中,首先,臂73以驅動軸75為支點在水平面上擺動,如圖8(a)所示,感測頭74從工件W2的外周位置P1掃描到與工件W的中心O重疊的位置。藉此,測定精磨削前的工件W2的形狀。圖9顯示第2片的精磨削前的工件W的形狀。此外,因為各夾盤3的吸附面係藉由加工前的自體研磨分別被形成一樣,所以假設在圖9例示之第2片的工件W2係呈與第1片的工件W1大致同樣的形狀。
In the fine grinding table ST4, first, the
其次,如圖8(b)所示,依據因應精磨削前的工件W2的形狀之傾斜角及藉由第1片的工件W1的加工結果所算出之補償角,使夾盤3傾斜。
Next, as shown in FIG8(b), the
具體言之,控制裝置9係調用和擺動式感測器
72所測定之精磨削前的工件W2的形狀與磨削後的工件W2的目標形狀之差分一致之精磨削時的工件W2的磨削量及實現其磨削量的傾斜機構33之傾斜角。接著,控制裝置9係因應所調用的傾斜角而算出第1可動支持部36及第2可動支持部37的各升降量。
Specifically, the
又,控制裝置9係調用和藉由第1片的工件W1的加工結果所得之補償角對應的第1可動支持部36及第2可動支持部37的各補償升降量。然後,控制裝置9分別針對第1可動支持部36及第2可動支持部37,於升降量加上補償升降量而算出補償後升降量。然後,使第1可動支持部36及第2可動支持部37因應於補償後升降量而升降。藉此,傾斜台34以固定支持部35為基準使夾盤3的旋轉軸3a對精磨削砂輪71的旋轉軸傾斜。圖7(c)顯示第2片的精磨削前的工件W2中的第1可動支持部36及第2可動支持部37的各補償後升降量。具體言之,圖7(c)的補償後升降量係於圖7(a)的升降量加上圖7(b)的補償升降量,意味著使第1可動支持部36升降2.7μm且使第2可動支持部37降下1.7μm的情況。
Furthermore, the
其次,如圖8(c)所示,對工件W2進行精磨削加工。具體言之,於精磨削加工中,在使精磨削砂輪71及夾盤3分別旋轉的狀態下,將精磨削砂輪71的磨削面推抵於工件W2以進行工件W1的精磨削。當工件W達到所期望的厚度時,精磨削裝置7係使精磨削砂輪71及夾盤3的旋轉停止,使精磨削砂輪71往上方退避,結束精磨削。
Next, as shown in FIG8(c), the workpiece W2 is subjected to fine grinding. Specifically, during the fine grinding, the grinding surface of the
其次,在分度台2旋轉,夾盤3朝校正台ST1移
動,且工件W2與夾盤3之吸附被解除後,第2臂43將工件W2從夾盤3取出並移送到第2料架44。
Next, when the indexing table 2 rotates, the
此處,在分度台2旋轉,夾盤3朝校正台ST1移動之際,如圖8(d)所示,固定式感測器8測定在工件W2整面的複數個測定點中的工件W2之膜厚,測定工件W2的形狀。圖9顯示第2片的精磨削後的工件W2的形狀。根據圖9,得知精磨削後的工件W1的形狀和大致平坦的目標形狀約略一致。
Here, when the indexing table 2 rotates and the
此外,關於第3片以後的工件W,亦可應用從第1片的工件W1的精磨削結果可獲得之補償角,亦可應用從之前的工件W的精磨削結果可獲得之補償角。在後者的情況,可考慮精磨削砂輪71的摩耗等以適切地更新傾斜角。
In addition, for the workpiece W after the third piece, the compensation angle obtained from the finishing grinding result of the first piece of workpiece W1 can also be applied, and the compensation angle obtained from the finishing grinding result of the previous workpiece W can also be applied. In the latter case, the bevel angle can be appropriately updated by considering the wear of the finishing
如此,本發明的加工系統1係對工件W1、W2依序進行前磨削及精磨削,該加工系統1構成為具備:分度台2,具備將工件W1、W2保持成可旋轉之夾盤3,使工件W1、W2按照粗磨削台ST2、中磨削台ST3、精磨削台ST4及校正台ST1的順序移動;傾斜機構33,可調節夾盤3的傾斜;擺動式感測器72,測定精磨削前的工件W1、W2的形狀;固定式感測器8,在精磨削後的工件W1朝校正台ST1搬送的期間,測定精磨削後的工件W1的形狀;控制裝置9,控制在依據精磨削前的工件W1、W2的形狀作精磨削之際的夾盤3的傾斜、即傾斜角,依據精磨削後的工件W1的形狀,在對工件W2進行精磨削之際補償傾斜角。
Thus, the
根據該構成,固定式感測器8快速測定精磨削後的第1片的工件W1的形狀,控制裝置9以可將精磨削後的工件W1的形狀加工成所期望的目標形狀之方式算出精磨削時的補償角,透過在從精磨削前的第2片的工件W2的形狀算出的傾斜角加上和第1片的工件W1的精磨削結果對應的補償角的狀態下,對第2片的工件W2進行精磨削,可有效率且高精度地加工工件W2。
According to this configuration, the fixed
又,本發明的加工系統1構成為,控制裝置9依據精磨削前的工件W1的形狀,以精磨削後的工件W1的形狀會與工件W1的目標形狀約略一致之方式算出傾斜角,依據精磨削前的工件W2的形狀,以精磨削後的工件W2的形狀會與工件W2的目標形狀約略一致之方式算出傾斜角。
Furthermore, the
根據該構成,可將精磨削後的工件W1、W2的形狀精度佳地加工成所期望的目標形狀。 According to this structure, the workpieces W1 and W2 after fine grinding can be processed into the desired target shape with high accuracy.
又,本發明的加工系統1構成為,以控制裝置9依據精磨削後的工件W1的形狀,精磨削後的工件W1的形狀與工件W1的目標形狀會約略一致之方式算出補償角。
Furthermore, the
根據該構成,因應和精磨削後的工件W1的形狀與目標形狀之差分一致的精磨削砂輪71的磨削量,設定對工件W2精磨削之際的補償角,因而可更精確加工工件W2的形狀。
According to this structure, the compensation angle during the finish grinding of the workpiece W2 is set according to the grinding amount of the
又,本發明的加工系統1構成為,固定式感測器8被安裝於跨設在分度台2的上方之機架1a。
Furthermore, the
根據該構成,於工件W1通過固定式感測器8下方之際,固定式感測器8可測定工件W1的形狀,故而可將工件W1的形狀測定所需的時間最小化。
According to this structure, when the workpiece W1 passes under the fixed
又,從俯視觀察時,本發明的加工系統1構成為,固定式感測器8配置在工件W1的中心O通過的旋轉軌道R上。
Furthermore, when viewed from above, the
根據該構成,透過將固定式感測器8的測定點設定在從俯視觀察時之工件W1的中心O的旋轉軌道R上,可在未使工件W的磨削加工的處理量之下進行工件W的形狀測定。
According to this configuration, by setting the measurement point of the fixed
此外,本發明係可在未悖離本發明的精神下,進行除了上述以外的各種改變,而且,本發明當然可及於該改變者。 In addition, the present invention can be modified in various ways other than those mentioned above without departing from the spirit of the present invention, and the present invention is of course applicable to such modifications.
例如,上述的實施形態,雖以傾斜機構33使夾盤3連同旋轉軸3a一起傾斜的構成為例作了說明,但是傾斜機構33亦可為在未讓旋轉軸3a傾斜之下僅使夾盤3傾斜的構成。
For example, in the above-mentioned embodiment, although the
1:加工系統 1: Processing system
1a:機架 1a: Rack
2:分度台 2: Indexing table
2a:旋轉軸 2a: Rotation axis
3:夾盤 3: Clamp
31:旋轉台 31: Rotating table
32:吸附體 32: Adsorbent
41:第1臂
41:
42:第1料架 42: 1st rack
43:第2臂 43: Second Arm
44:第2料架 44: 2nd rack
5:粗磨削裝置 5: Rough grinding device
52:第1主軸 52: 1st main axis
53:第1主軸進給機構 53: 1st spindle feed mechanism
6:中磨削裝置 6: Middle grinding device
61:第2主軸 61: Second main axis
62:第2主軸進給機構 62: Second spindle feed mechanism
7:精磨削裝置 7: Fine grinding device
71:精磨削砂輪 71: Fine grinding wheel
72:擺動式感測器 72: Oscillating sensor
74:感測頭 74:Sensor head
8:固定式感測器 8: Fixed sensor
9:控制裝置 9: Control device
R:旋轉軌道 R: Rotating track
ST1:校正台 ST1: Calibration table
ST2:粗磨削台 ST2: Rough grinding table
ST3:中磨削台 ST3: Middle grinding table
ST4:精磨削台 ST4: Fine grinding table
W:工件 W: Workpiece
Claims (5)
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|---|---|---|---|
| JPJP2022-034894 | 2022-03-08 | ||
| JP2022034894A JP7802577B2 (en) | 2022-03-08 | 2022-03-08 | Processing System |
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| TW202335787A TW202335787A (en) | 2023-09-16 |
| TWI868507B true TWI868507B (en) | 2025-01-01 |
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| TW111141703A TWI868507B (en) | 2022-03-08 | 2022-10-31 | Processing system |
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| JP (1) | JP7802577B2 (en) |
| KR (2) | KR20230132364A (en) |
| CN (1) | CN116728192A (en) |
| TW (1) | TWI868507B (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008264913A (en) * | 2007-04-18 | 2008-11-06 | Disco Abrasive Syst Ltd | Grinding equipment |
| JP2016201422A (en) * | 2015-04-08 | 2016-12-01 | 株式会社東京精密 | Workpiece processing device |
| JP2020093381A (en) * | 2018-12-07 | 2020-06-18 | 株式会社ディスコ | Disc-shaped workpiece processing method |
| WO2020129714A1 (en) * | 2018-12-19 | 2020-06-25 | 東京エレクトロン株式会社 | Substrate processing apparatus and substrate processing method |
| TW202120251A (en) * | 2019-07-17 | 2021-06-01 | 日商東京威力科創股份有限公司 | Substrate machining device, substrate processing system, and substrate processing method |
| JP2021130150A (en) * | 2020-02-18 | 2021-09-09 | 株式会社東京精密 | Processing system |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015079457A (en) | 2013-10-18 | 2015-04-23 | キヤノンマーケティングジャパン株式会社 | Image processor, control method of image processor, and program |
| JP6494377B2 (en) * | 2015-03-31 | 2019-04-03 | 株式会社東京精密 | Work processing equipment |
| JP6814661B2 (en) * | 2017-02-27 | 2021-01-20 | 株式会社東京精密 | Grinding device |
| JP7551321B2 (en) * | 2020-03-27 | 2024-09-17 | 株式会社東京精密 | Processing Equipment |
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- 2022-03-08 JP JP2022034894A patent/JP7802577B2/en active Active
- 2022-10-31 TW TW111141703A patent/TWI868507B/en active
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Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008264913A (en) * | 2007-04-18 | 2008-11-06 | Disco Abrasive Syst Ltd | Grinding equipment |
| JP2016201422A (en) * | 2015-04-08 | 2016-12-01 | 株式会社東京精密 | Workpiece processing device |
| JP2020093381A (en) * | 2018-12-07 | 2020-06-18 | 株式会社ディスコ | Disc-shaped workpiece processing method |
| WO2020129714A1 (en) * | 2018-12-19 | 2020-06-25 | 東京エレクトロン株式会社 | Substrate processing apparatus and substrate processing method |
| TW202120251A (en) * | 2019-07-17 | 2021-06-01 | 日商東京威力科創股份有限公司 | Substrate machining device, substrate processing system, and substrate processing method |
| JP2021130150A (en) * | 2020-02-18 | 2021-09-09 | 株式会社東京精密 | Processing system |
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| Publication number | Publication date |
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| JP7802577B2 (en) | 2026-01-20 |
| TW202335787A (en) | 2023-09-16 |
| KR20260049475A (en) | 2026-04-14 |
| CN116728192A (en) | 2023-09-12 |
| JP2023130555A (en) | 2023-09-21 |
| KR20230132364A (en) | 2023-09-15 |
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