TWI889713B - 漫散器、其形成方法、全像漫散器、及相關微影裝置 - Google Patents

漫散器、其形成方法、全像漫散器、及相關微影裝置

Info

Publication number
TWI889713B
TWI889713B TW109134893A TW109134893A TWI889713B TW I889713 B TWI889713 B TW I889713B TW 109134893 A TW109134893 A TW 109134893A TW 109134893 A TW109134893 A TW 109134893A TW I889713 B TWI889713 B TW I889713B
Authority
TW
Taiwan
Prior art keywords
diffuser
layer
scattering
radiation
substance
Prior art date
Application number
TW109134893A
Other languages
English (en)
Chinese (zh)
Other versions
TW202129400A (zh
Inventor
約斯特 安德烈 克魯基斯特
安得列 倪祺佩洛
華特 裘普 安捷倫
廉晋
保羅 亞歷山卓 維莫倫
哈里爾 高凱 耶亨
Original Assignee
荷蘭商Ａｓｍｌ荷蘭公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 荷蘭商Ａｓｍｌ荷蘭公司 filed Critical 荷蘭商Ａｓｍｌ荷蘭公司
Publication of TW202129400A publication Critical patent/TW202129400A/zh
Application granted granted Critical
Publication of TWI889713B publication Critical patent/TWI889713B/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/0236—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element
    • G02B5/0247—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element by means of voids or pores
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/0252—Diffusing elements; Afocal elements characterised by the diffusing properties using holographic or diffractive means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G02B5/1871—Transmissive phase gratings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW109134893A 2019-10-11 2020-10-08 漫散器、其形成方法、全像漫散器、及相關微影裝置 TWI889713B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP19202644.1 2019-10-11
EP19202644 2019-10-11

Publications (2)

Publication Number Publication Date
TW202129400A TW202129400A (zh) 2021-08-01
TWI889713B true TWI889713B (zh) 2025-07-11

Family

ID=68280796

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109134893A TWI889713B (zh) 2019-10-11 2020-10-08 漫散器、其形成方法、全像漫散器、及相關微影裝置

Country Status (4)

Country Link
KR (1) KR102961042B1 (fr)
CN (1) CN114556167B (fr)
TW (1) TWI889713B (fr)
WO (1) WO2021069231A1 (fr)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200745619A (en) * 2006-03-29 2007-12-16 Oji Paper Co Light diffuser, manufacturing method of light diffuser, surface-emitting device, display device and illuminance device
TW200933251A (en) * 2007-12-14 2009-08-01 3M Innovative Properties Co Optical article
US20090268273A1 (en) * 2008-04-23 2009-10-29 Ravenbrick Llc Glare Management of Reflective and Thermoreflective Surfaces
CN101706086A (zh) * 2009-11-27 2010-05-12 丹阳博昱科技有限公司 光学膜及其生产方法
CN203282812U (zh) * 2013-05-30 2013-11-13 合肥京东方光电科技有限公司 一种印刷版、散射膜层及显示装置
US20150323711A1 (en) * 2012-11-30 2015-11-12 Sharp Kabushiki Kaisha Scatterer substrate
WO2016086204A1 (fr) * 2014-11-26 2016-06-02 Jaiswal Supriya Matériaux, composants, et procédés d'utilisation avec un rayonnement ultraviolet extrême en lithographie et dans d'autres applications

Family Cites Families (9)

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Publication number Priority date Publication date Assignee Title
GB0030675D0 (en) * 2000-12-15 2001-01-31 Rue De Int Ltd Methods of creating high efficiency diffuse back-reflectors based on embossed surface relief
US20030118750A1 (en) * 2001-12-14 2003-06-26 Eastman Kodak Company Microvoided light diffuser containing optical contact layer
US6958860B2 (en) * 2002-10-07 2005-10-25 Eastman Kodak Company Voided polymer film containing layered particulates
WO2004090490A1 (fr) * 2003-04-11 2004-10-21 Carl Zeiss Smt Ag Diffuseur, source de front d'onde, capteur de front d'onde et systeme d'eclairage par projection
CN103430553B (zh) * 2011-03-14 2016-08-31 杜比实验室特许公司 显示装置和产生图像的方法
ITPD20130075A1 (it) * 2013-03-25 2014-09-26 Automotive Lighting Italia Spa Dispositivo di illuminazione e/o segnalazione per veicoli e relativo metodo di realizzazione
WO2017207512A2 (fr) 2016-06-03 2017-12-07 Asml Netherlands B.V. Dispositif de formation de motifs
AU2016307053A1 (en) * 2015-08-07 2018-03-01 Rolic Technologies AG Azimuthally modulated scattering device
JP6809824B2 (ja) * 2016-07-04 2021-01-06 日東電工株式会社 光学積層体の製造方法、および光学積層体中間体

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200745619A (en) * 2006-03-29 2007-12-16 Oji Paper Co Light diffuser, manufacturing method of light diffuser, surface-emitting device, display device and illuminance device
TW200933251A (en) * 2007-12-14 2009-08-01 3M Innovative Properties Co Optical article
US20090268273A1 (en) * 2008-04-23 2009-10-29 Ravenbrick Llc Glare Management of Reflective and Thermoreflective Surfaces
CN101706086A (zh) * 2009-11-27 2010-05-12 丹阳博昱科技有限公司 光学膜及其生产方法
US20150323711A1 (en) * 2012-11-30 2015-11-12 Sharp Kabushiki Kaisha Scatterer substrate
CN203282812U (zh) * 2013-05-30 2013-11-13 合肥京东方光电科技有限公司 一种印刷版、散射膜层及显示装置
WO2016086204A1 (fr) * 2014-11-26 2016-06-02 Jaiswal Supriya Matériaux, composants, et procédés d'utilisation avec un rayonnement ultraviolet extrême en lithographie et dans d'autres applications

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
期刊 Mark van de Kerkhof, Robbert Jan Voogd, Ad Schasfoort, Evert Westerhuis, et al. Diffuser concepts for in-situ wavefront measurements of EUV projection optics. Proc. of SPIE Vol. 10583. 19 March 2018 105830S-1~105830S-10 *

Also Published As

Publication number Publication date
KR102961042B1 (ko) 2026-05-08
CN114556167A (zh) 2022-05-27
KR20220079853A (ko) 2022-06-14
CN114556167B (zh) 2025-05-16
WO2021069231A1 (fr) 2021-04-15
TW202129400A (zh) 2021-08-01

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