TWI890843B - Polyorganosilsesquioxane, curable composition, cured product, hard coating film, transfer film, and adhesive sheet - Google Patents

Polyorganosilsesquioxane, curable composition, cured product, hard coating film, transfer film, and adhesive sheet

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TWI890843B
TWI890843B TW110131229A TW110131229A TWI890843B TW I890843 B TWI890843 B TW I890843B TW 110131229 A TW110131229 A TW 110131229A TW 110131229 A TW110131229 A TW 110131229A TW I890843 B TWI890843 B TW I890843B
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polyorganosilsesquioxane
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TW202219182A (en
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川原寛弘
足立知子
芝本明弘
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日商大賽璐股份有限公司
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    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
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    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J183/00Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
    • C09J183/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils

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Abstract

本發明提供一種可形成既具有作為聚有機矽倍半氧烷之特徵的高耐熱性,又具有高表面硬度及彎曲性之硬化物,且適宜作為硬塗膜之材料之聚有機矽倍半氧烷。本發明之聚有機矽倍半氧烷含有矽倍半氧烷,該矽倍半氧烷是含有選自由下述組成式(1)、組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷所組成之群中之至少一種之籠型矽倍半氧烷縮合2個以上而得之縮合物且分子量為8000以下。 ・式(1):[R 1SiO 3/2] 8[R 1SiO 2/2(OR c)] 1・式(2):[R 2SiO 3/2] 6[R 2SiO 2/2(OR c)] 2・式(3):[R 3SiO 3/2] 8[R 3SiO 2/2(OR c)] 2・式(4):[R 4SiO 3/2] 10[R 4SiO 2/2(OR c)] 2[式中之說明如本說明書所記載] The present invention provides a polyorganosilsesquioxane that can form a cured product having both high heat resistance and high surface hardness and flexibility, which is characteristic of polyorganosilsesquioxanes, and is suitable as a material for a hard coat film. The polyorganosilsesquioxane of the present invention contains a silsesquioxane, which is a condensate obtained by condensing two or more cage-type silsesquioxanes selected from the group consisting of cage-type silsesquioxanes represented by the following composition formula (1), composition formula (2), composition formula (3), and composition formula (4), and has a molecular weight of 8000 or less. Formula (1): [R 1 SiO 3/2 ] 8 [R 1 SiO 2/2 (OR c )] 1 Formula (2): [R 2 SiO 3/2 ] 6 [R 2 SiO 2/2 (OR c )] 2 Formula (3): [R 3 SiO 3/2 ] 8 [R 3 SiO 2/2 (OR c )] 2 Formula (4): [R 4 SiO 3/2 ] 10 [R 4 SiO 2/2 (OR c )] 2 [The explanations in the formulas are as described in this manual]

Description

聚有機矽倍半氧烷、硬化性組成物、硬化物、硬塗膜、轉印用膜、及接著片Polyorganosilsesquioxane, curable composition, cured product, hard coating film, transfer film, and adhesive sheet

本發明係關於一種聚有機矽倍半氧烷、以及含有該聚有機矽倍半氧烷之硬化性組成物及其硬化物、以及由該硬化物構成之硬塗膜。本發明係關於一種含有該硬化性組成物作為硬塗層之轉印用膜。又,本發明係關於一種含有該硬化性組成物作為接著劑層之接著片。本案主張在2020年8月28日於日本提出申請之特願2020-145085號之優先權,並將其內容援引於此。This invention relates to a polyorganosilsesquioxane, a curable composition containing the polyorganosilsesquioxane, a cured product thereof, and a hardcoat film formed from the cured product. This invention also relates to a transfer film containing the curable composition as a hardcoat layer. Furthermore, this invention relates to an adhesive sheet containing the curable composition as an adhesive layer. This application claims priority to Japanese Patent Application No. 2020-145085 filed in Japan on August 28, 2020, the contents of which are incorporated herein by reference.

聚有機矽倍半氧烷(矽倍半氧烷)係藉由使三官能性矽烷水解而獲得之網狀結構型聚合物或多面體團簇。作為矽倍半氧烷,已知有具有無規結構、梯型結構、籠型結構者。目前已知之分子量例如為3000以上之高分子量之矽倍半氧烷其大多數為具有無規結構或梯型結構者。此種高分子矽倍半氧烷例如記載於下述專利文獻1。Polyorganosilsesquioxanes (silsesquioxanes) are network-structured polymers or polyhedral clusters obtained by hydrolyzing trifunctional silanes. Silsesquioxanes are known to have random, ladder, and cage structures. Currently known high-molecular-weight silsesquioxanes, such as those with molecular weights of 3000 or greater, mostly have random or ladder structures. Such high-molecular-weight silsesquioxanes are described, for example, in Patent Document 1 below.

又,籠型結構之矽倍半氧烷係具有經矽氧烷鍵而三維地使環閉合之結構,且以氧化矽之立方體結構為中心,於各頂點具有有機官能基之物質之總稱。作為該立方體結構,已知主要有作為正六面體結構之八聚物矽倍半氧烷(T 8)、作為側錐五角柱結構之十聚物矽倍半氧烷(T 10)。此種籠型矽倍半氧烷例如記載於下述專利文獻2。 [先前技術文獻] [專利文獻] Cage-type silsesquioxanes are a general term for substances with a structure in which the rings are three-dimensionally closed via siloxane bonds, with a cubic structure of silicon oxide as the center and organic functional groups at each vertex. Known examples of this cubic structure include octameric silsesquioxane (T 8 ), which has a regular hexahedral structure, and decameric silsesquioxane (T 10 ), which has a pyramidal pentagonal structure. This cage-type silsesquioxane is described, for example, in Patent Document 2 below. [Prior Art Document] [Patent Document]

[專利文獻1]日本特開2013-35918號公報 [專利文獻2]日本特開2000-334881號公報 [Patent Document 1] Japanese Patent Application Publication No. 2013-35918 [Patent Document 2] Japanese Patent Application Publication No. 2000-334881

[發明所欲解決之課題][The problem that the invention aims to solve]

然而,由目前之高分子量聚有機矽倍半氧烷或籠型矽倍半氧烷所獲得之硬化物有硬度不足之傾向,彎折時之彎曲性亦有極限。因此,目前之該硬化物無法用於要求高硬度及高耐彎曲性之用途,故作為適於硬塗之材料之用途受限。又,目前之高分子矽倍半氧烷隨著分子量變大而難以溶解於有機溶劑等溶劑中,故存在難以加工成適於硬塗之材料等。However, the cured products obtained from currently available high-molecular-weight polysilsesquioxanes or cage-type silsesquioxanes tend to be insufficiently hard and have limited flexibility when bent. Consequently, these cured products cannot be used in applications requiring high hardness and high bending resistance, limiting their use as materials suitable for hard coatings. Furthermore, as the molecular weight of currently available high-molecular-weight silsesquioxanes increases, they become less soluble in organic solvents and other solvents, making them difficult to process into materials suitable for hard coatings.

因此,本發明之發明之目的在於提供一種聚有機矽倍半氧烷,其可製成既具有作為聚有機矽倍半氧烷之特徵的高耐熱性,又具有高表面硬度及耐彎曲性之硬化物,且適宜作為硬塗膜之材料。又,其目的在於提供一種為高分子量之聚有機矽倍半氧烷且具有於有機溶劑等溶劑中之高溶解性之聚有機矽倍半氧烷。Therefore, the present invention aims to provide a polyorganosilsesquioxane that can be produced into a cured product that combines the high heat resistance characteristic of polyorganosilsesquioxane with high surface hardness and flex resistance, and is suitable as a material for hardcoats. Furthermore, the present invention aims to provide a polyorganosilsesquioxane that has a high molecular weight and high solubility in solvents such as organic solvents.

又,本發明之發明目的在於提供一種含有該聚有機矽倍半氧烷之硬化性組成物。 進而,本發明之發明目的在於提供一種該硬化性組成物之硬化物、具有作為該硬化物之硬塗層之硬塗膜。 進而,本發明之另一發明目的在於提供一種具有含有該硬化性組成物之硬塗層之轉印膜。 又,本發明之另一發明目的在於提供一種具有含有該硬化性組成物之接著劑層之接著片。 [解決課題之技術手段] Another object of the present invention is to provide a curable composition containing the polyorganosilsesquioxane. Further, another object of the present invention is to provide a cured product of the curable composition, and a hardcoat film having a hardcoat layer serving as the cured product. Further, another object of the present invention is to provide a transfer film having a hardcoat layer containing the curable composition. Further, another object of the present invention is to provide an adhesive sheet having an adhesive layer containing the curable composition. [Technical Means for Solving the Problem]

本發明之發明人等發現,含有具有特定組成式之籠型矽倍半氧烷縮合2個以上而得之結構且分子量為8000以下之矽倍半氧烷的硬化性組成物之硬化物既具有高耐熱性又具有優異之表面硬度及耐彎曲性,作為硬塗膜或轉印用膜中之硬塗層、接著片中之接著劑層非常有用。又,亦發現,該矽倍半氧烷為高分子量且於有機溶劑等溶劑中具有高溶解性。本發明係基於該等知識見解而完成。The inventors of the present invention have discovered that a curable composition containing a silsesquioxane having a structure formed by condensing two or more cage-shaped silsesquioxanes of a specific formula and having a molecular weight of 8,000 or less exhibits both high heat resistance and excellent surface hardness and flex resistance, making the resulting cured product extremely useful as a hard coat layer in hard coat films or transfer films, or as an adhesive layer in adhesive sheets. Furthermore, the inventors discovered that the silsesquioxane has a high molecular weight and is highly soluble in solvents such as organic solvents. The present invention was completed based on this knowledge.

即,本發明提供一種聚有機矽倍半氧烷,其含有矽倍半氧烷,該矽倍半氧烷是含有選自由下述組成式(1)、組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷所組成之群中之至少一種之籠型矽倍半氧烷縮合2個以上而得之縮合物且分子量為8000以下。 ・式(1):[R 1SiO 3/2] 8[R 1SiO 2/2(OR c)] 1(式(1)中,R 1分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c表示碳數1~4之烷基或氫原子) ・式(2):[R 2SiO 3/2] 6[R 2SiO 2/2(OR c)] 2(式(2)中,R 2分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(3):[R 3SiO 3/2] 8[R 3SiO 2/2(OR c)] 2(式(3)中,R 3分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(4):[R 4SiO 3/2] 10[R 4SiO 2/2(OR c)] 2(式(4)中,R 4分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) That is, the present invention provides a polyorganosilsesquioxane containing a silsesquioxane, wherein the silsesquioxane is a condensate obtained by condensing two or more cage-type silsesquioxanes selected from the group consisting of cage-type silsesquioxanes represented by the following composition formula (1), composition formula (2), composition formula (3), and composition formula (4), and has a molecular weight of 8000 or less.・Formula (1): [R 1 SiO 3/2 ] 8 [R 1 SiO 2/2 (OR c )] 1 (In formula (1), R 1 is independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted arylalkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (2): [R 2 SiO 3/2 ] 6 [R 2 SiO 2/2 (OR c )] 2 (In formula (2), R 2 are each independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c are each independently an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (3): [R 3 SiO 3/2 ] 8 [R 3 SiO 2/2 (OR c )] 2 (In formula (3), R 3 are each independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c each independently represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (4): [R 4 SiO 3/2 ] 10 [R 4 SiO 2/2 (OR c )] 2 (In formula (4), R 4 each independently represents a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c each independently represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom)

又,本發明提供一種上述聚有機矽倍半氧烷,其中,上述含有聚合性官能基之基為下述式(1A) [式(1A)中,R 1A表示直鏈或支鏈狀之伸烷基] 所表示之基、下述式(1B) [式(1B)中,R 1B表示直鏈或支鏈狀之伸烷基] 所表示之基、下述式(1C) [式(1C)中,R 1C表示直鏈或支鏈狀之伸烷基] 所表示之基、或下述式(1D) [式(1D)中,R 1D表示直鏈或支鏈狀之伸烷基] 所表示之基。 Furthermore, the present invention provides the above-mentioned polyorganosilsesquioxane, wherein the above-mentioned group containing a polymerizable functional group is the following formula (1A): [In formula (1A), R 1A represents a linear or branched alkylene group] A group represented by the following formula (1B) [In formula (1B), R 1B represents a linear or branched alkylene group] A group represented by the following formula (1C): [In formula (1C), R 1C represents a linear or branched alkylene group], or a group represented by the following formula (1D) [In the formula (1D), R 1D represents a linear or branched alkylene group]

又,本發明提供一種上述聚有機矽倍半氧烷,其中,相對於上述組成式(1)中之R 1、組成式(2)中之R 2、組成式(3)中之R 3、及組成式(4)中之R 4整體,含有聚合性官能基之基之比率為30%以上。 The present invention also provides the above-mentioned polyorganosilsesquioxane, wherein the ratio of groups containing polymerizable functional groups relative to the total of R 1 in the above-mentioned composition formula (1), R 2 in the composition formula (2), R 3 in the composition formula (3), and R 4 in the composition formula (4) is 30% or more.

又,本發明提供一種上述聚有機矽倍半氧烷,其中,下述式(I)所表示之構成單元與下述式(II)所表示之構成單元之莫耳比[式(I)所表示之構成單元/式(II)所表示之構成單元]為1以上500以下。 [R aSiO 3/2]                (I) [式(I)中,R a表示含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子] [R bSiO 2/2(OR c)]        (II) [式(II)中,R b表示含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子;R c表示氫原子或碳數1~4之烷基] The present invention also provides the above-mentioned polyorganosilsesquioxane, wherein the molar ratio of the constituent units represented by the following formula (I) to the constituent units represented by the following formula (II) [constituent units represented by formula (I)/constituent units represented by formula (II)] is 1 to 500. [ RaSiO3 /2 ] (I) [In formula (I), Ra represents a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom] [ RbSiO2 /2 ( ORc )] (II) [In formula (II), Rb represents a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom; Rc represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms]

又,本發明提供一種數量平均分子量為2000~50000之上述聚有機矽倍半氧烷。The present invention also provides the polyorganosilsesquioxane having a number average molecular weight of 2,000 to 50,000.

又,本發明提供一種分子量分散度(重量平均分子量/數量平均分子量)為1.0~4.0之上述聚有機矽倍半氧烷。The present invention also provides the polyorganosilsesquioxane having a molecular weight dispersion (weight average molecular weight/number average molecular weight) of 1.0 to 4.0.

又,本發明提供一種含有上述聚有機矽倍半氧烷之硬化性組成物。The present invention also provides a curable composition containing the above-mentioned polyorganosilsesquioxane.

又,本發明提供一種進而含有硬化觸媒之上述硬化性組成物。The present invention also provides the above-mentioned curable composition further comprising a curing catalyst.

又,本發明提供一種上述硬化性組成物,其中,上述硬化觸媒為光或熱聚合起始劑。Furthermore, the present invention provides the aforementioned curable composition, wherein the curing catalyst is a photo- or thermal-polymerization initiator.

又,本發明提供一種上述硬化性組成物,其進而含有聚合穩定劑。The present invention also provides the aforementioned curable composition, which further contains a polymerization stabilizer.

又,本發明提供一種上述硬化性組成物,其為硬塗層形成用硬化性組成物。The present invention also provides the above-mentioned curable composition, which is a curable composition for forming a hard coating layer.

又,本發明提供一種上述硬化性組成物,其為接著劑用硬化性組成物。The present invention also provides the aforementioned curable composition, which is a curable composition for an adhesive.

又,本發明提供一種上述硬化性組成物之硬化物。Furthermore, the present invention provides a cured product of the curable composition.

又,本發明提供一種硬塗膜,其積層有基材、及形成於該基材之至少一表面之為上述硬化物之硬塗層。The present invention also provides a hard coating film comprising a substrate and a hard coating layer formed on at least one surface of the substrate, which is the hardened material.

又,本發明提供一種轉印用膜,其積層有基材、及位於形成於該基材之至少一表面之脫模層上之硬塗層,且該硬塗層為含有上述硬化性組成物之層。The present invention also provides a transfer film comprising a substrate and a hard coating layer formed on a release layer formed on at least one surface of the substrate, wherein the hard coating layer contains the above-mentioned curable composition.

又,本發明提供一種上述轉印用膜,其於上述硬塗層上依序進而積層增黏塗層(anchor coat layer)及接著劑層。The present invention also provides the transfer film described above, wherein an anchor coat layer and an adhesive layer are sequentially layered on the hard coat layer.

又,本發明提供一種上述轉印用膜,其進而含有至少一層之著色層。The present invention also provides the above-mentioned transfer film, which further comprises at least one colored layer.

又,本發明提供一種上述轉印用膜,其中,上述硬塗層之厚度為3~150 μm。The present invention also provides the transfer film, wherein the hard coating layer has a thickness of 3 to 150 μm.

又,本發明提供一種接著片,其具有基材及接著劑層,該接著劑層位於該基材上之至少一面,且為含有上述硬化性組成物之層。The present invention also provides an adhesive sheet comprising a substrate and an adhesive layer. The adhesive layer is located on at least one surface of the substrate and is a layer containing the aforementioned curable composition.

又,本發明提供一種接著片,其具有基材、增黏塗層及接著劑層,該增黏塗層及該接著劑層位於該基材上之至少一面,該增黏塗層含有矽烷偶合劑,該接著劑層為含有上述硬化性組成物之層;上述接著劑層設置於上述增黏塗層之表面上。 [發明之效果] The present invention also provides an adhesive sheet comprising a substrate, an adhesion-promoting coating layer, and an adhesive layer. The adhesion-promoting coating layer and the adhesive layer are located on at least one side of the substrate. The adhesion-promoting coating layer contains a silane coupling agent, and the adhesive layer is a layer containing the aforementioned curable composition. The adhesive layer is disposed on the surface of the adhesion-promoting coating layer. [Effects of the Invention]

由含有本發明之聚有機矽倍半氧烷之硬化性組成物所獲得之硬化物(例如硬塗層)具有高耐熱性,且具有高表面硬度及耐彎曲性。因此,藉由使用具有該硬塗層之硬塗膜或轉印用膜,可製造具有高表面硬度及耐彎曲性之成型品(製品)。又,本發明之聚有機矽倍半氧烷為高分子量聚有機矽倍半氧烷,且具有於有機溶劑等溶劑中之高溶解性。因此,含有本發明之聚有機矽倍半氧烷之硬塗膜或轉印用膜可減少溶劑之使用量,進而未硬化或半硬化之硬塗層不黏著而能夠捲取成卷狀來操作,可以卷對卷方式操作含有該硬塗層之膜,因此,品質方面與成本方面這兩方面均優異。進而,含有本發明之聚有機矽倍半氧烷作為必需成分之硬化性組成物由於可形成高耐熱性及可撓性優異之硬化物(接著材),故亦可較佳地用作接著劑(例如,積層半導體用硬化性組成物)。Cured products (e.g., hard coats) obtained from curable compositions containing the polyorganosilsesquioxane of the present invention exhibit high heat resistance, high surface hardness, and high flexural resistance. Therefore, using hard coat films or transfer films containing such hard coats enables the production of molded articles (products) with high surface hardness and flexural resistance. Furthermore, the polyorganosilsesquioxane of the present invention is a high molecular weight polyorganosilsesquioxane and has high solubility in solvents such as organic solvents. Therefore, hardcoat films or transfer films containing the polyorganosilsesquioxane of the present invention can reduce the amount of solvent used. Furthermore, the uncured or semi-cured hardcoat layer does not stick, allowing it to be rolled up and handled. This allows for roll-to-roll processing, resulting in excellent quality and cost. Furthermore, curable compositions containing the polyorganosilsesquioxane of the present invention as an essential component can form cured products (adhesives) with high heat resistance and excellent flexibility, making them ideal for use as adhesives (e.g., curable compositions for laminated semiconductors).

[聚有機矽倍半氧烷] 本發明之聚有機矽倍半氧烷含有矽倍半氧烷,該矽倍半氧烷(以下有時稱為「本發明之縮合矽倍半氧烷」)是含有選自由下述組成式(1)、組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷所組成之群中之至少一種之籠型矽倍半氧烷縮合2個以上而得之縮合物且分子量為8000以下(較佳為1500~7500,更佳為1800~7000,進而較佳為2000~6500)。 ・式(1):[R 1SiO 3/2] 8[R 1SiO 2/2(OR c)] 1(式(1)中,R 1分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c表示碳數1~4之烷基或氫原子) ・式(2):[R 2SiO 3/2] 6[R 2SiO 2/2(OR c)] 2(式(2)中,R 2分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(3):[R 3SiO 3/2] 8[R 3SiO 2/2(OR c)] 2(式(3)中,R 3分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(4):[R 4SiO 3/2] 10[R 4SiO 2/2(OR c)] 2(式(4)中,R 4分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) [Polyorganic silsesquioxane] The polyorganic silsesquioxane of the present invention contains silsesquioxane. The silsesquioxane (hereinafter sometimes referred to as "condensed silsesquioxane of the present invention") is a condensate obtained by condensing two or more cage-type silsesquioxanes selected from the group consisting of cage-type silsesquioxanes represented by the following composition formula (1), composition formula (2), composition formula (3) and composition formula (4), and has a molecular weight of 8000 or less (preferably 1500-7500, more preferably 1800-7000, and even more preferably 2000-6500).・Formula (1): [R 1 SiO 3/2 ] 8 [R 1 SiO 2/2 (OR c )] 1 (In formula (1), R 1 is independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted arylalkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (2): [R 2 SiO 3/2 ] 6 [R 2 SiO 2/2 (OR c )] 2 (In formula (2), R 2 are each independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c are each independently an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (3): [R 3 SiO 3/2 ] 8 [R 3 SiO 2/2 (OR c )] 2 (In formula (3), R 3 are each independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c each independently represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (4): [R 4 SiO 3/2 ] 10 [R 4 SiO 2/2 (OR c )] 2 (In formula (4), R 4 each independently represents a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c each independently represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom)

組成式(1)中之[R 1SiO 3/2]所表示之構成單元、組成式(2)中之[R 2SiO 3/2]所表示之構成單元、組成式(3)中之[R 3SiO 3/2]所表示之構成單元、及組成式(4)中之[R 4SiO 3/2]所表示之構成單元包含於下述式(I)所表示之構成單元(以下,於本說明書中有時稱為「T3體」)。 [R aSiO 3/2]                (I) The constituent unit represented by [R 1 SiO 3/2 ] in the composition formula (1), the constituent unit represented by [R 2 SiO 3/2 ] in the composition formula (2), the constituent unit represented by [R 3 SiO 3/2 ] in the composition formula (3), and the constituent unit represented by [R 4 SiO 3/2 ] in the composition formula (4) are included in the constituent unit represented by the following formula (I) (hereinafter sometimes referred to as "T3 form" in this specification). [R a SiO 3/2 ] (I)

又,組成式(1)中之[R 1SiO 2/2(OR c)]所表示之構成單元、組成式(2)中之[R 2SiO 2/2(OR c)]所表示之構成單元、組成式(3)中之[R 3SiO 2/2(OR c)]所表示之構成單元、及組成式(4)中之[R 4SiO 2/2(OR c)]所表示之構成單元包含於下述式(II)所表示之構成單元(以下,於本說明書中有時稱為「T2體」)。 [R bSiO 2/2(OR c)]        (II) Furthermore, the constituent unit represented by [R 1 SiO 2/2 (OR c )] in the composition formula (1), the constituent unit represented by [R 2 SiO 2/2 (OR c )] in the composition formula (2), the constituent unit represented by [R 3 SiO 2/2 (OR c )] in the composition formula (3), and the constituent unit represented by [R 4 SiO 2/2 (OR c )] in the composition formula (4) are included in the constituent unit represented by the following formula (II) (hereinafter sometimes referred to as "T2 body" in this specification). [R b SiO 2/2 (OR c )] (II)

上述式(I)中之R a、及式(II)中之R b表示含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子。又,上述式(II)中,R c表示碳數1~4之烷基或氫原子。 In the above formula (I), R a and R b in the above formula (II) represent a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom. Furthermore, in the above formula (II), R c represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom.

若進一步詳細記載上述式(I)所表示之構成單元,則以下述式(I')表示。又,若進一步詳細記載上述式(II)所表示之構成單元,則以下述式(II')表示。下述式(I')所表示之結構中示出之與矽原子鍵結之3個氧原子分別與另一矽原子(未示於式(I')中之矽原子)鍵結。另一方面,下述式(II')所表示之結構中示出之位於矽原子上及下之2個氧原子分別與另一矽原子(未示於式(II')中之矽原子)鍵結。即,上述T3體及T2體均為藉由對應之水解性三官能矽烷化合物之水解及縮合反應所形成之矽倍半氧烷構成單元(即所謂T單元)。 If the structural unit represented by the above formula (I) is further described in detail, it is represented by the following formula (I'). Furthermore, if the structural unit represented by the above formula (II) is further described in detail, it is represented by the following formula (II'). In the structure represented by the following formula (I'), the three oxygen atoms bonded to a silicon atom are each bonded to another silicon atom (a silicon atom not shown in formula (I')). On the other hand, in the structure represented by the following formula (II'), the two oxygen atoms located above and below the silicon atom are each bonded to another silicon atom (a silicon atom not shown in formula (II')). That is, the T3 form and the T2 form are both silsesquioxane constituent units (so-called T units) formed by the hydrolysis and condensation reaction of the corresponding hydrolyzable trifunctional silane compounds.

上述式(I')中之R a、式(II')中之R b及R c為與上述相同之基。式(II)中,R c中之烷基通常係源於形成作為本發明之聚有機矽倍半氧烷之原料使用之水解性矽烷化合物中之烷氧基(例如,作為下述式(A)~(C)中之X 1~X 3之烷氧基等)的烷基。 Ra in formula (I'), Rb , and Rc in formula (II') are the same groups as described above. The alkyl group in Rc in formula (II) is typically derived from an alkyl group that forms an alkoxy group in a hydrolyzable silane compound used as a raw material for the polyorganosilsesquioxane of the present invention (e.g., the alkoxy groups X1 to X3 in formulas (A) to (C) below).

上述組成式(1)所表示之籠型矽倍半氧烷係8個[R 1SiO 3/2]所表示之構成單元(T3體)與1個[R 1SiO 2/2(OR c)]所表示之構成單元(T2體)經由矽氧烷鍵(Si-O-Si)相互鍵結而形成籠型結構的矽倍半氧烷。上述組成式(1)所表示之籠型矽倍半氧烷之具體結構只要滿足上述組成式(1),便無特別限定,例如可列舉下述式(1')所表示之籠型矽倍半氧烷等。 The cage-type silsesquioxane represented by the above composition formula (1) is a silsesquioxane having a cage-type structure formed by eight structural units represented by [R 1 SiO 3/2 ] (T3 form) and one structural unit represented by [R 1 SiO 2/2 (OR c )] (T2 form) mutually bonding via siloxane bonds (Si-O-Si). The specific structure of the cage-type silsesquioxane represented by the above composition formula (1) is not particularly limited as long as it satisfies the above composition formula (1). For example, the cage-type silsesquioxane represented by the following formula (1') can be cited.

式(1')中,R 1a~R 1i分別獨立為與組成式(1)中之R 1相同含義。式(1')中之R c亦與組成式(1)中之R c含義相同。 In formula (1'), R 1a to R 1i each independently have the same meaning as R 1 in formula (1). R c in formula (1') also has the same meaning as R c in formula (1).

上述組成式(2)所表示之籠型矽倍半氧烷係6個[R 2SiO 3/2]所表示之構成單元(T3體)與2個[R 2SiO 2/2(OR c)]所表示之構成單元(T2體)經由矽氧烷鍵(Si-O-Si)相互鍵結而形成籠型結構之矽倍半氧烷。上述組成式(2)所表示之籠型矽倍半氧烷之具體結構只要滿足上述組成式(2),便無特別限定,例如可列舉下述式(2')或(2'')所表示之籠型矽倍半氧烷等。 The cage-type silsesquioxane represented by the above composition formula (2) is a silsesquioxane having a cage-type structure formed by six structural units represented by [R 2 SiO 3/2 ] (T3 form) and two structural units represented by [R 2 SiO 2/2 (OR c )] (T2 form) mutually bonding via siloxane bonds (Si-O-Si). The specific structure of the cage-type silsesquioxane represented by the above composition formula (2) is not particularly limited as long as it satisfies the above composition formula (2). For example, the cage-type silsesquioxane represented by the following formula (2') or (2'') can be cited.

式(2')中之R 2a~R 2h、式(2'')中之R 2i~R 2p分別獨立為與組成式(2)中之R 2相同含義。式(2')、(2'')中之R c亦分別獨立為與組成式(2)中之R c相同含義。 R 2a to R 2h in formula (2') and R 2i to R 2p in formula (2'') each independently have the same meaning as R 2 in formula (2). R c in formulas (2') and (2'') also each independently have the same meaning as R c in formula (2).

上述組成式(3)所表示之籠型矽倍半氧烷係8個[R 3SiO 3/2]所表示之構成單元(T3體)與2個[R 3SiO 2/2(OR c)]所表示之構成單元(T2體)經由矽氧烷鍵(Si-O-Si)相互鍵結而形成籠型結構之矽倍半氧烷。上述組成式(3)所表示之籠型矽倍半氧烷之具體結構只要滿足上述組成式(3),便無特別限定,例如可列舉下述式(3')、(3'')或(3''')所表示之籠型矽倍半氧烷。 The cage-type silsesquioxane represented by the above composition formula (3) is a silsesquioxane having a cage-type structure formed by eight constituent units represented by [R 3 SiO 3/2 ] (T3 form) and two constituent units represented by [R 3 SiO 2/2 (OR c )] (T2 form) mutually bonding via siloxane bonds (Si-O-Si). The specific structure of the cage-type silsesquioxane represented by the above composition formula (3) is not particularly limited as long as it satisfies the above composition formula (3). For example, the cage-type silsesquioxane represented by the following formula (3'), (3'') or (3''') can be cited.

式(3')中之R 3a~R 3j、式(3'')中之R 3k~R 3t、式(3''')中之R 3u~R 3z、R 3aa~R 3dd分別獨立為與組成式(3)中之R 3相同含義。式(3')、(3'')、式(3''')中之R c亦分別獨立為與組成式(3)中之R c相同含義。 R 3a to R 3j in formula (3'), R 3k to R 3t in formula (3''), R 3u to R 3z , and R 3aa to R 3dd in formula (3''') each independently have the same meaning as R 3 in formula (3). R c in formulas (3'), (3''), and (3''') also each independently have the same meaning as R c in formula (3).

上述組成式(4)所表示之籠型矽倍半氧烷係10個[R 4SiO 3/2]所表示之構成單元(T3體)與2個[R 4SiO 2/2(OR c)]所表示之構成單元(T2體)經由矽氧烷鍵(Si-O-Si)相互鍵結而形成籠型結構之矽倍半氧烷。上述組成式(4)所表示之籠型矽倍半氧烷之具體結構只要滿足組成式(4),便無特別限定,例如可列舉下述式(4')或(4'')所表示之籠型矽倍半氧烷。 The cage-type silsesquioxane represented by the above composition formula (4) is a silsesquioxane having a cage-type structure formed by ten constituent units represented by [R 4 SiO 3/2 ] (T3 form) and two constituent units represented by [R 4 SiO 2/2 (OR c )] (T2 form) mutually bonding via siloxane bonds (Si-O-Si). The specific structure of the cage-type silsesquioxane represented by the above composition formula (4) is not particularly limited as long as it satisfies the composition formula (4). For example, the cage-type silsesquioxane represented by the following formula (4') or (4'') can be cited.

式(4')中之R 4a~R 4l、式(4'')中之R 4m~R 4x分別獨立為與組成式(4)中之R 4相同含義。式(4')、(4'')中之R c亦分別獨立為與組成式(4)中之R c相同含義。 R 4a to R 4l in formula (4') and R 4m to R 4x in formula (4'') each independently have the same meaning as R 4 in formula (4). R c in formulas (4') and (4'') also each independently have the same meaning as R c in formula (4).

本發明之縮合矽倍半氧烷亦可於無損本發明之發明效果之範圍內包含除上述組成式(1)、組成式(2)、組成式(3)及組成式(4)以外之組成式所表示之籠型矽倍半氧烷。作為除上述組成式(1)、組成式(2)、組成式(3)及組成式(4)以外之組成式,例如可列舉以下之組成式(5)~(8)。 ・式(5):[R 5SiO 3/2] 6[R 5SiO 2/2(OR c)] 3(式(5)中,R 5分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(6):[R 6SiO 3/2] 8[R 6SiO 2/2(OR c)] 3(式(6)中,R 6分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(7):[R 7SiO 3/2] 10[R 7SiO 2/2(OR c)] 1(式(7)中,R 7分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c表示碳數1~4之烷基或氫原子) ・式(8):[R 8SiO 3/2] 12[R 8SiO 2/2(OR c)] 1(式(8)中,R 8分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c表示碳數1~4之烷基或氫原子) The condensed silsesquioxane of the present invention may also include cage-type silsesquioxanes represented by composition formulas other than the above-mentioned composition formulas (1), (2), (3), and (4), within the scope that does not impair the effects of the present invention. Examples of composition formulas other than the above-mentioned composition formulas (1), (2), (3), and (4) include the following composition formulas (5) to (8).・Formula (5): [R 5 SiO 3/2 ] 6 [R 5 SiO 2/2 (OR c )] 3 (In formula (5), R 5 is independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted arylalkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c is independently an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (6): [R 6 SiO 3/2 ] 8 [R 6 SiO 2/2 (OR c )] 3 (In formula (6), R 6 are each independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c are each independently an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (7): [R 7 SiO 3/2 ] 10 [R 7 SiO 2/2 (OR c )] 1 (In formula (7), R 7 are each independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (8): [R 8 SiO 3/2 ] 12 [R 8 SiO 2/2 (OR c )] 1 (In formula (8), R 8 are independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom)

本發明之縮合矽倍半氧烷亦包含混合存在上述組成式(1)~(8)所表示之籠型矽倍半氧烷者。即,本發明之縮合矽倍半氧烷可為包含選自由上述組成式(1)、組成式(2)、組成式(3)、組成式(4)、組成式(5)、組成式(6)、組成式(7)、及組成式(8)所表示之籠型矽倍半氧烷所組成之群中之至少一種之籠型矽倍半氧烷縮合2個以上而得之縮合物。The condensed silsesquioxane of the present invention also includes a mixture of the cage-type silsesquioxanes represented by the above-mentioned composition formulas (1) to (8). That is, the condensed silsesquioxane of the present invention may be a condensate obtained by condensing two or more cage-type silsesquioxanes selected from the group consisting of the cage-type silsesquioxanes represented by the above-mentioned composition formulas (1), (2), (3), (4), (5), (6), (7), and (8).

再者,即便於包含如上述組成式(5)、組成式(6)所示具有3個-OR c所表示之羥基之籠型矽倍半氧烷之情形時,其中之2個進行縮合之情形亦包含於本發明之本發明之縮合矽倍半氧烷。又,當上述組成式(5)、組成式(6)之3個-OR c所表示之羥基全部縮合時,只要無損本發明之發明效果,便亦認為包含於本發明之縮合矽倍半氧烷。 Furthermore, even when a cage-type silsesquioxane having three hydroxyl groups represented by -OR c as shown in the above-mentioned composition formula (5) and composition formula (6) is included, the case where two of them are condensed is also included in the condensed silsesquioxane of the present invention. Furthermore, when all of the three hydroxyl groups represented by -OR c in the above-mentioned composition formula (5) and composition formula (6) are condensed, as long as the effect of the invention is not impaired, it is also considered to be included in the condensed silsesquioxane of the present invention.

上述含有聚合性官能基之基中之「陽離子聚合性官能基」只要為具有陽離子聚合性者,便無特別限定,例如可列舉:環氧基、氧環丁基、乙烯醚基、乙烯基苯基等。 上述含有聚合性官能基之基中之「自由基聚合性官能基」只要為具有自由基聚合性者,便無特別限定,例如可列舉:(甲基)丙烯醯氧基、(甲基)丙烯醯胺基、乙烯基、乙烯基硫基等。 作為聚合性官能基,基於硬化物之表面硬度(例如4H以上)之觀點,較佳為環氧基、(甲基)丙烯醯氧基等,更佳為環氧基。 The "cationically polymerizable functional group" in the aforementioned group containing a polymerizable functional group is not particularly limited as long as it is cationic polymerizable. Examples thereof include an epoxy group, an oxobutyl group, a vinyl ether group, and a vinylphenyl group. The "radical polymerizable functional group" in the aforementioned group containing a polymerizable functional group is not particularly limited as long as it is radical polymerizable. Examples thereof include a (meth)acryloyloxy group, a (meth)acrylamide group, a vinyl group, and a vinylthio group. From the perspective of achieving a surface hardness of the cured product (e.g., 4H or higher), epoxy groups and (meth)acryloyloxy groups are preferred, with epoxy groups being more preferred.

作為上述組成式(1)中之R 1、式(1')中之R 1a~R 1i、組成式(2)中之R 2、式(2')中之R 2a~R 2h、式(2'')中之R 2i~R 2p、組成式(3)中之R 3、式(3')中之R 3a~R 3j、式(3'')中之R 3k~R 3t、式(3''')中之R 3u~R 3z、R 3aa~R 3dd、組成式(4)中之R 4、式(4')中之R 4a~R 4l、式(4'')中之R 4m~R 4x、組成式(5)中之R 5、組成式(6)中之R 6、組成式(7)中之R 7、組成式(8)中之R 8、式(I)中之R a、及式(II)中之R b中之含有聚合性官能基之基,並無特別限定,較佳為含環氧基之基,基於硬化性組成物之硬化性、硬化物之表面硬度或耐熱性之觀點,較佳為下述式(1A)所表示之基、式(1B)所表示之基、式(1C)所表示之基、式(1D)所表示之基,更佳為下述式(1A)所表示之基、式(1C)所表示之基,進而較佳為下述式(1A)所表示之基。 As R 1 in the above-mentioned composition formula (1), R 1a to R 1i in the formula (1'), R 2 in the composition formula (2), R 2a to R 2h in the formula (2'), R 2i to R 2p in the formula (2''), R 3 in the composition formula (3), R 3a to R 3j in the formula (3'), R 3k to R 3t in the formula (3''), R 3u to R 3z and R 3aa to R 3dd in the formula (3'''), R 4 in the composition formula (4), R 4a to R 4l in the formula (4'), R 4m to R 4x in the formula (4''), and R 5 in the composition formula (5) The group containing a polymerizable functional group in R 6 in formula (6), R 7 in formula (7), R 8 in formula (8), Ra in formula (I), and R b in formula (II) is not particularly limited, but is preferably a group containing an epoxy group. From the viewpoint of the curability of the curable composition, the surface hardness or heat resistance of the cured product, it is preferably a group represented by the following formula (1A), a group represented by formula (1B), a group represented by formula (1C), or a group represented by formula (1D). More preferably, it is a group represented by the following formula (1A) or a group represented by formula (1C). Still more preferably, it is a group represented by the following formula (1A).

上述式(1A)中,R 1A表示直鏈或支鏈狀之伸烷基。作為直鏈或支鏈狀之伸烷基,例如可列舉:亞甲基、甲基亞甲基、二甲基亞甲基、伸乙基、伸丙基、三亞甲基、四亞甲基、五亞甲基、六亞甲基、十亞甲基等碳數1~10之直鏈或支鏈狀之伸烷基。其中,基於硬化物之表面硬度或硬化性之觀點,R 1A較佳為碳數1~4之直鏈狀之伸烷基、碳數3或4之支鏈狀之伸烷基,更佳為伸乙基、三亞甲基、伸丙基,進而較佳為伸乙基、三亞甲基。 In the above formula (1A), R 1A represents a linear or branched alkylene group. Examples of the linear or branched alkylene group include a linear or branched alkylene group having 1 to 10 carbon atoms, such as methylene, methylmethylene, dimethylmethylene, ethylene, propylene, trimethylene, tetramethylene, pentamethylene, hexamethylene, and decamethylene. From the perspective of the surface hardness and hardenability of the cured product, R 1A is preferably a linear alkylene group having 1 to 4 carbon atoms or a branched alkylene group having 3 or 4 carbon atoms, more preferably an ethylene group, trimethylene group, or propylene group, and even more preferably an ethylene group or trimethylene group.

上述式(1B)中,R 1B表示直鏈或支鏈狀之伸烷基,可例示與R 1A相同之基。其中,基於硬化物之表面硬度或硬化性之觀點,R 1B較佳為碳數1~4之直鏈狀之伸烷基、碳數3或4之支鏈狀之伸烷基,更佳為伸乙基、三亞甲基、伸丙基,進而較佳為伸乙基、三亞甲基。 In the above formula (1B), R 1B represents a linear or branched alkylene group, and examples thereof include the same groups as for R 1A . From the perspective of the surface hardness and curability of the cured product, R 1B is preferably a linear alkylene group having 1 to 4 carbon atoms or a branched alkylene group having 3 or 4 carbon atoms, more preferably an ethylene group, a trimethylene group, or a propylene group, and even more preferably an ethylene group or a trimethylene group.

上述式(1C)中,R 1C表示直鏈或支鏈狀之伸烷基,可例示與R 1A相同之基。其中,基於硬化物之表面硬度或硬化性之觀點,R 1C較佳為碳數1~4之直鏈狀之伸烷基、碳數3或4之支鏈狀之伸烷基,更佳為伸乙基、三亞甲基、伸丙基,進而較佳為伸乙基、三亞甲基。 In the above formula (1C), R 1C represents a linear or branched alkylene group, and examples thereof include the same groups as for R 1A . From the perspective of the surface hardness and curability of the cured product, R 1C is preferably a linear alkylene group having 1 to 4 carbon atoms or a branched alkylene group having 3 or 4 carbon atoms, more preferably an ethylene group, a trimethylene group, or a propylene group, and even more preferably an ethylene group or a trimethylene group.

上述式(1D)中,R 1D表示直鏈或支鏈狀之伸烷基,可例示與R 1A相同之基。其中,基於硬化物之表面硬度或硬化性之觀點,R 1D較佳為碳數1~4之直鏈狀之伸烷基、碳數3或4之支鏈狀之伸烷基,更佳為伸乙基、三亞甲基、伸丙基,進而較佳為伸乙基、三亞甲基。 In the above formula (1D), R 1D represents a linear or branched alkylene group, and examples thereof include the same groups as for R 1A . From the perspective of the surface hardness and curability of the cured product, R 1D is preferably a linear alkylene group having 1 to 4 carbon atoms or a branched alkylene group having 3 or 4 carbon atoms, more preferably an ethylene group, a trimethylene group, or a propylene group, and even more preferably an ethylene group or a trimethylene group.

作為上述組成式(1)中之R 1、式(1')中之R 1a~R 1i、組成式(2)中之R 2、式(2')中之R 2a~R 2h、式(2'')中之R 2i~R 2p、組成式(3)中之R 3、式(3')中之R 3a~R 3j、式(3'')中之R 3k~R 3t、式(3''')中之R 3u~R 3z、R 3aa~R 3dd、組成式(4)中之R 4、式(4')中之R 4a~R 4l、式(4'')中之R 4m~R 4x、組成式(5)中之R 5、組成式(6)中之R 6、組成式(7)中之R 7、組成式(8)中之R 8、式(I)中之R a、及式(II)中之R b中之含有聚合性官能基之基,較佳為含環氧基之基,更佳為上述式(1A)所表示之基且R 1A為伸乙基之基[其中,為2-(3',4'-環氧環己基)乙基]。 As R 1 in the above-mentioned composition formula (1), R 1a to R 1i in the formula (1'), R 2 in the composition formula (2), R 2a to R 2h in the formula (2'), R 2i to R 2p in the formula (2''), R 3 in the composition formula (3), R 3a to R 3j in the formula (3'), R 3k to R 3t in the formula (3''), R 3u to R 3z and R 3aa to R 3dd in the formula (3'''), R 4 in the composition formula (4), R 4a to R 4l in the formula (4'), R 4m to R 4x in the formula (4''), and R 5 in the composition formula (5) The group containing a polymerizable functional group in R 6 in formula (6), R 7 in formula (7), R 8 in formula (8), Ra in formula (I), and R b in formula (II) is preferably a group containing an epoxy group, and more preferably a group represented by the above formula (1A) in which R 1A is an ethylene group [wherein, 2-(3',4'-epoxycyclohexyl)ethyl].

作為上述組成式(1)中之R 1、式(1')中之R 1a~R 1i、組成式(2)中之R 2、式(2')中之R 2a~R 2h、式(2'')中之R 2i~R 2p、組成式(3)中之R 3、式(3')中之R 3a~R 3j、式(3'')中之R 3k~R 3t、式(3''')中之R 3u~R 3z、R 3aa~R 3dd、組成式(4)中之R 4、式(4')中之R 4a~R 4l、式(4'')中之R 4m~R 4x、組成式(5)中之R 5、組成式(6)中之R 6、組成式(7)中之R 7、組成式(8)中之R 8、式(I)中之R a、及式(II)中之R b之經取代或未經取代之芳基中之芳基,例如可列舉苯基、甲苯基、萘基等。 As R 1 in the above-mentioned composition formula (1), R 1a to R 1i in the formula (1'), R 2 in the composition formula (2), R 2a to R 2h in the formula (2'), R 2i to R 2p in the formula (2''), R 3 in the composition formula (3), R 3a to R 3j in the formula (3'), R 3k to R 3t in the formula (3''), R 3u to R 3z and R 3aa to R 3dd in the formula (3'''), R 4 in the composition formula (4), R 4a to R 4l in the formula (4'), R 4m to R 4x in the formula (4''), and R 5 in the composition formula (5) The aryl group in the substituted or unsubstituted aryl group of R 6 in formula (6), R 7 in formula (7), R 8 in formula (8), Ra in formula (I), and R b in formula (II) can be exemplified by phenyl, tolyl, naphthyl, and the like.

作為上述組成式(1)中之R 1、式(1')中之R 1a~R 1i、組成式(2)中之R 2、式(2')中之R 2a~R 2h、式(2'')中之R 2i~R 2p、組成式(3)中之R 3、式(3')中之R 3a~R 3j、式(3'')中之R 3k~R 3t、式(3''')中之R 3u~R 3z、R 3aa~R 3dd、組成式(4)中之R 4、式(4')中之R 4a~R 4l、式(4'')中之R 4m~R 4x、組成式(5)中之R 5、組成式(6)中之R 6、組成式(7)中之R 7、組成式(8)中之R 8、式(I)中之R a、及式(II)中之R b之經取代或未經取代之芳烷基中之上述芳烷基,例如可列舉苄基、苯乙基等。 As R 1 in the above-mentioned composition formula (1), R 1a to R 1i in the formula (1'), R 2 in the composition formula (2), R 2a to R 2h in the formula (2'), R 2i to R 2p in the formula (2''), R 3 in the composition formula (3), R 3a to R 3j in the formula (3'), R 3k to R 3t in the formula (3''), R 3u to R 3z and R 3aa to R 3dd in the formula (3'''), R 4 in the composition formula (4), R 4a to R 4l in the formula (4'), R 4m to R 4x in the formula (4''), and R 5 in the composition formula (5) , R 6 in formula (6), R 7 in formula (7), R 8 in formula (8), Ra in formula (I), and R b in formula (II) The above-mentioned arylalkyl groups in the substituted or unsubstituted arylalkyl groups include, for example, benzyl and phenethyl.

作為上述組成式(1)中之R 1、式(1')中之R 1a~R 1i、組成式(2)中之R 2、式(2')中之R 2a~R 2h、式(2'')中之R 2i~R 2p、組成式(3)中之R 3、式(3')中之R 3a~R 3j、式(3'')中之R 3k~R 3t、式(3''')中之R 3u~R 3z、R 3aa~R 3dd、組成式(4)中之R 4、式(4')中之R 4a~R 4l、式(4'')中之R 4m~R 4x、組成式(5)中之R 5、組成式(6)中之R 6、組成式(7)中之R 7、組成式(8)中之R 8、式(I)中之R a、及式(II)中之R b之經取代或未經取代之環烷基中之環烷基,例如可列舉:環丁基、環戊基、環己基等。 As R 1 in the above-mentioned composition formula (1), R 1a to R 1i in the formula (1'), R 2 in the composition formula (2), R 2a to R 2h in the formula (2'), R 2i to R 2p in the formula (2''), R 3 in the composition formula (3), R 3a to R 3j in the formula (3'), R 3k to R 3t in the formula (3''), R 3u to R 3z and R 3aa to R 3dd in the formula (3'''), R 4 in the composition formula (4), R 4a to R 4l in the formula (4'), R 4m to R 4x in the formula (4''), and R 5 in the composition formula (5) , R 6 in formula (6), R 7 in formula (7), R 8 in formula (8), Ra in formula (I), and R b in formula (II) are substituted or unsubstituted cycloalkyl groups, for example, cyclobutyl, cyclopentyl, cyclohexyl, etc.

作為上述組成式(1)中之R 1、式(1')中之R 1a~R 1i、組成式(2)中之R 2、式(2')中之R 2a~R 2h、式(2'')中之R 2i~R 2p、組成式(3)中之R 3、式(3')中之R 3a~R 3j、式(3'')中之R 3k~R 3t、式(3''')中之R 3u~R 3z、R 3aa~R 3dd、組成式(4)中之R 4、式(4')中之R 4a~R 4l、式(4'')中之R 4m~R 4x、組成式(5)中之R 5、組成式(6)中之R 6、組成式(7)中之R 7、組成式(8)中之R 8、式(I)中之R a、及式(II)中之R b之經取代或未經取代之烷基中之烷基,例如可列舉:甲基、乙基、丙基、正丁基、異丙基、異丁基、第二丁基、第三丁基、異戊基等直鏈或支鏈狀之烷基。 As R 1 in the above-mentioned composition formula (1), R 1a to R 1i in the formula (1'), R 2 in the composition formula (2), R 2a to R 2h in the formula (2'), R 2i to R 2p in the formula (2''), R 3 in the composition formula (3), R 3a to R 3j in the formula (3'), R 3k to R 3t in the formula (3''), R 3u to R 3z and R 3aa to R 3dd in the formula (3'''), R 4 in the composition formula (4), R 4a to R 4l in the formula (4'), R 4m to R 4x in the formula (4''), and R 5 in the composition formula (5) The alkyl group in the substituted or unsubstituted alkyl groups of R 6 in formula (6), R 7 in formula (7), R 8 in formula (8), Ra in formula (I), and R b in formula (II) can be, for example, a linear or branched alkyl group such as methyl, ethyl, propyl, n-butyl, isopropyl, isobutyl, sec-butyl, tert-butyl, and isopentyl.

作為上述組成式(1)中之R 1、式(1')中之R 1a~R 1i、組成式(2)中之R 2、式(2')中之R 2a~R 2h、式(2'')中之R 2i~R 2p、組成式(3)中之R 3、式(3')中之R 3a~R 3j、式(3'')中之R 3k~R 3t、式(3''')中之R 3u~R 3z、R 3aa~R 3dd、組成式(4)中之R 4、式(4')中之R 4a~R 4l、式(4'')中之R 4m~R 4x、及式(I)中之R a、組成式(5)中之R 5、組成式(6)中之R 6、組成式(7)中之R 7、組成式(8)中之R 8、及式(II)中之R b之經取代或未經取代之烯基中之烯基,例如可列舉:乙烯基、烯丙基、異丙烯基等直鏈或支鏈狀之烯基。 As R 1 in the above-mentioned composition formula (1), R 1a to R 1i in the formula (1'), R 2 in the composition formula (2), R 2a to R 2h in the formula (2'), R 2i to R 2p in the formula (2''), R 3 in the composition formula (3), R 3a to R 3j in the formula (3'), R 3k to R 3t in the formula (3''), R 3u to R 3z , R 3aa to R 3dd in the formula (3'''), R 4 in the composition formula (4), R 4a to R 4l in the formula (4'), R 4m to R 4x in the formula (4''), and Ra in the formula (I), R in the composition formula (5) 5. The alkenyl group in the substituted or unsubstituted alkenyl groups of R 6 in formula (6), R 7 in formula (7), R 8 in formula (8), and R b in formula (II) may include, for example, straight-chain or branched alkenyl groups such as vinyl, allyl, and isopropenyl.

上述組成式(1)中之R 1中之含有聚合性官能基之基之個數較佳為3~9,更佳為5~9,進而較佳為7~9,進而更佳為9(全部為含有聚合性官能基之基)。上述組成式(2)中之R 2中之含有聚合性官能基之基之個數較佳為3~8,更佳為5~8,進而較佳為7~8,進而更佳為8(全部為含有聚合性官能基之基)。上述組成式(3)中之R 3中之含有聚合性官能基之基之個數較佳為3~10,更佳為5~10,進而較佳為7~10,進而更佳為10(全部為含有聚合性官能基之基)。上述組成式(4)中之R 4中之含有聚合性官能基之基之個數較佳為3~12,更佳為5~12,進而較佳為7~12,進而更佳為12(全部為含有聚合性官能基之基)。該等含有聚合性官能基之基之個數基於製成硬化性組成物時之硬化性、硬化物之表面硬度之觀點,較多者為宜。 The number of groups containing a polymerizable functional group in R 1 in the above composition formula (1) is preferably 3 to 9, more preferably 5 to 9, further preferably 7 to 9, further more preferably 9 (all of which are groups containing a polymerizable functional group). The number of groups containing a polymerizable functional group in R 2 in the above composition formula (2) is preferably 3 to 8, more preferably 5 to 8, further preferably 7 to 8, further more preferably 8 (all of which are groups containing a polymerizable functional group). The number of groups containing a polymerizable functional group in R 3 in the above composition formula (3) is preferably 3 to 10, more preferably 5 to 10, further preferably 7 to 10, further more preferably 10 (all of which are groups containing a polymerizable functional group). The number of groups containing polymerizable functional groups in R₄ in the above composition formula (4) is preferably 3 to 12, more preferably 5 to 12, further preferably 7 to 12, further more preferably 12 (all of which are groups containing polymerizable functional groups). The number of groups containing polymerizable functional groups is preferably larger from the viewpoint of the curability of the curable composition and the surface hardness of the cured product.

又,於本發明之聚有機矽倍半氧烷中,相對於上述組成式(1)中之R 1、組成式(2)中之R 2、組成式(3)中之R 3、及組成式(4)中之R 4之整體,含有聚合性官能基之基(例如含環氧基之基)之比率(含有聚合性官能基之基之個數/R 1~R 4整體之個數)例如為30%以上,較佳為50%以上,更佳為80%以上。上述含有聚合性官能基之基之比率基於製成硬化性組成物時之硬化性、硬化物之表面硬度之觀點,較多者為宜,較佳為上述值以上。 Furthermore, in the polyorganosilsesquioxane of the present invention, the ratio of groups containing polymerizable functional groups (e.g., groups containing epoxy groups) to the total of R 1 in the above-mentioned composition formula (1), R 2 in the composition formula (2), R 3 in the composition formula (3), and R 4 in the composition formula (4)) (the number of groups containing polymerizable functional groups/the total number of R 1 to R 4 ) is, for example, 30% or more, preferably 50% or more, and more preferably 80% or more. The ratio of groups containing polymerizable functional groups is preferably higher from the viewpoint of the curability of the curable composition and the surface hardness of the cured product, and is preferably higher than the above value.

關於本發明之聚有機矽倍半氧烷,上述式(I)所表示之構成單元(T3體)與上述式(II)所表示之構成單元(T2體)之莫耳比[式(I)所表示之構成單元/式(II)所表示之構成單元;T3體/T2體]例如為1以上500以下。再者,上述式(I)所表示之構成單元及式(II)所表示之構成單元包含構成上述組成式(1)、組成式(2)、組成式(3)、及組成式(4)所表示之籠型矽倍半氧烷之T3體與T2體,進而包含該等以外之全部矽倍半氧烷(完全籠型矽倍半氧烷、梯型矽倍半氧烷、無規型矽倍半氧烷等)之T3體與T2體。Regarding the polyorganosilsesquioxane of the present invention, the molar ratio of the constituent unit (T3 form) represented by the above formula (I) to the constituent unit (T2 form) represented by the above formula (II) [constituent unit represented by formula (I)/constituent unit represented by formula (II); T3 form/T2 form] is, for example, not less than 1 and not more than 500. Furthermore, the constituent unit represented by the above formula (I) and the constituent unit represented by the above formula (II) include the T3 form and T2 form of the cage-type silsesquioxane represented by the above composition formula (1), composition formula (2), composition formula (3), and composition formula (4), and further include the T3 form and T2 form of all silsesquioxanes other than these (complete cage-type silsesquioxane, ladder-type silsesquioxane, random silsesquioxane, etc.).

上述比率[T3體/T2體]之下限值如上所述為1,較佳為2,更佳為3,更佳為4,更佳為6,更佳為7,更佳為8,更佳為8,更佳為10,更佳為20,進而較佳為40。藉由將上述比率[T3體/T2體]設為1以上,製成未硬化或半硬化之硬塗層時之表面容易變得不黏著,耐黏連性提昇,容易捲取成卷狀,可較佳地用作具有耐彎曲性之硬塗層之成分,又,硬化物或硬塗層之表面硬度或接著性顯著提昇。另一方面,上述比率[T3體/T2體]之上限值較佳為500,更佳為400,更佳為300,更佳為100,更佳為50,更佳為40,更佳為30,更佳為25,更佳為20,更佳為18,進而較佳為18。藉由將上述比率[T3體/T2體]設為500以下,與硬化性組成物中之其他成分之相容性提昇,黏度亦得到抑制,因此容易操作,且容易塗佈成硬塗層。As described above, the lower limit of the ratio [T3 body/T2 body] is 1, preferably 2, more preferably 3, more preferably 4, more preferably 6, more preferably 7, more preferably 8, more preferably 8, more preferably 10, more preferably 20, and further preferably 40. By setting the ratio [T3 body/T2 body] to 1 or greater, the surface of an uncured or semi-cured hard coat layer becomes less sticky, the blocking resistance is improved, and the material can be easily wound into a roll, making it suitable for use as a component of a hard coat layer having flex resistance. Furthermore, the surface hardness and adhesion of the cured product or hard coat layer are significantly improved. On the other hand, the upper limit of the ratio [T3 body/T2 body] is preferably 500, more preferably 400, more preferably 300, more preferably 100, more preferably 50, more preferably 40, more preferably 30, more preferably 25, more preferably 20, more preferably 18, and further preferably 18. By setting the ratio [T3 body/T2 body] to 500 or less, compatibility with other components in the curable composition is improved and viscosity is suppressed, thereby facilitating handling and coating as a hard coating layer.

本發明之聚有機矽倍半氧烷除具有上述矽倍半氧烷構成單元[RSiO 3/2](T單元)以外,亦可進而包含選自由[(R) 3SiO 1/2]所表示之構成單元(即所謂M單元)、[(R) 2SiO 2/2]所表示之構成單元(即所謂D單元)、及[SiO 4/2]所表示之構成單元(即所謂Q單元)所組成之群中之至少1種矽氧烷構成單元。再者,作為上述式(I)所表示之構成單元以外之矽倍半氧烷構成單元,此外還可列舉[HSiO 3/2]所表示之構成單元。再者,上述式中之R表示氫原子或一價之有機基。 In addition to the aforementioned silsesquioxane constituent units [RSiO 3/2 ] (T units), the polyorganosilsesquioxane of the present invention may further include at least one siloxane constituent unit selected from the group consisting of constituent units represented by [(R) 3 SiO 1/2 ] (i.e., M units), constituent units represented by [(R) 2 SiO 2/2 ] (i.e., D units), and constituent units represented by [SiO 4/2 ] (i.e., Q units). Furthermore, as silsesquioxane constituent units other than the constituent units represented by formula (I), constituent units represented by [HSiO 3/2 ] may also be exemplified. Furthermore, R in the aforementioned formula represents a hydrogen atom or a monovalent organic group.

本發明之聚有機矽倍半氧烷中之上述比率[T3體/T2體]例如可藉由 29Si-NMR圖譜測定來求出。 29Si-NMR圖譜中,上述式(I)所表示之構成單元(T3體)中之矽原子與上述式(II)所表示之構成單元(T2體)中之矽原子於不同之位置(化學位移)顯現訊號(波峰),因此,藉由算出該等各個波峰之積分比,來求出上述比率[T3體/T2體]。上述式(I)所表示之結構(T3體)中之矽原子之訊號出現於-64~-70 ppm,上述式(II)所表示之結構(T2體)中之矽原子之訊號出現於-54~-60 ppm。因此,此時藉由算出-64~-70 ppm之訊號(T3體)與-54~-60 ppm之訊號(T2體)之積分比,可求出上述比率[T3體/T2體]。 The ratio [T3 form/T2 form] in the polyorganosilsesquioxane of the present invention can be determined, for example, by 29Si -NMR spectroscopy. In the 29Si -NMR spectrum, the silicon atoms in the structural unit represented by formula (I) (T3 form) and the silicon atoms in the structural unit represented by formula (II) (T2 form) exhibit signals (peaks) at different positions (chemical shifts). Therefore, the ratio [T3 form/T2 form] is determined by calculating the integral ratio of these peaks. The signal for the silicon atoms in the structure represented by formula (I) (T3 form) appears at -64 to -70 ppm, while the signal for the silicon atoms in the structure represented by formula (II) (T2 form) appears at -54 to -60 ppm. Therefore, the ratio [T3 body/T2 body] can be obtained by calculating the integral ratio of the signal between -64 and -70 ppm (T3 body) and the signal between -54 and -60 ppm (T2 body).

本發明之聚有機矽倍半氧烷之 29Si-NMR圖譜例如可藉由下述裝置及條件進行測定。 測定裝置:「Brucker AVANCE(600 MHz)」(Brucker公司製造) 溶劑:氘氯仿 累計次數:8000次 測定溫度:25℃ 樣品:聚有機矽倍半氧烷/乙醯丙酮鉻(III)/氘氯仿(1%四甲基矽烷)=2.0:0.10:4.0(重量比) The 29 Si-NMR spectrum of the polyorganosilsesquioxane of the present invention can be measured, for example, using the following apparatus and conditions. Measuring apparatus: "Brucker AVANCE (600 MHz)" (manufactured by Brucker Corporation) Solvent: Deuterated chloroform Accumulated times: 8000 Measurement temperature: 25°C Sample: Polyorganosilsesquioxane/chromium(III) acetylacetonate/deuterated chloroform (1% tetramethylsilane) = 2.0:0.10:4.0 (weight ratio)

本發明之聚有機矽倍半氧烷之上述比率[T3體/T2體]為1以上500以下意味著於本發明之聚有機矽倍半氧烷中,T2體之存在量與T3體同等或者相對較少,進一步進行矽烷醇之水解、縮合反應。The ratio [T3 form/T2 form] of 1 to 500 in the polyorganosilsesquioxane of the present invention means that the amount of the T2 form in the polyorganosilsesquioxane of the present invention is equal to or relatively less than the T3 form, allowing the hydrolysis and condensation reactions of the silanol to proceed.

本發明之聚有機矽倍半氧烷中之各矽倍半氧烷構成單元之比率能夠藉由用以形成該等構成單元之原料(水解性三官能矽烷)之組成來適當調整。The ratio of the silsesquioxane constituent units in the polyorganosilsesquioxane of the present invention can be appropriately adjusted by adjusting the composition of the raw materials (hydrolyzable trifunctional silane) used to form the constituent units.

所謂選自由上述組成式(1)、組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷所組成之群中之至少一種縮合2個以上而得之縮合物即本發明之縮合矽倍半氧烷,係指上述組成式(1)、組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷中,1種時縮合2個以上(例如2~5,較佳為2~3,更佳為2)、或者2種以上時縮合2個以上(例如2~5,較佳為2~3,更佳為2)而得者。此處,「縮合」係指上述組成式(1)、組成式(2)、組成式(3)及組成式(4)中之-OR c所表示之羥基(-OR c為烷氧基時經水解形成之羥基)彼此脫水而形成矽氧烷鍵(Si-O-Si)。 The condensate obtained by condensing two or more of at least one of the cage-type silsesquioxanes represented by the above-mentioned composition formula (1), composition formula (2), composition formula (3) and composition formula (4) is the condensed silsesquioxane of the present invention, which refers to the condensation of two or more (for example, 2 to 5, preferably 2 to 3, and more preferably 2) of one of the cage-type silsesquioxanes represented by the above-mentioned composition formula (1), composition formula (2), composition formula (3) and composition formula (4) or the condensation of two or more (for example, 2 to 5, preferably 2 to 3, and more preferably 2) of two or more of the cage-type silsesquioxanes represented by the above-mentioned composition formula (1), composition formula (2), composition formula (3) and composition formula (4). Here, "condensation" refers to the dehydration of the hydroxyl groups represented by -OR c in the above-mentioned formulas (1), (2), (3), and (4) (hydroxyl groups formed by hydrolysis when -OR c is an alkoxy group) to form siloxane bonds (Si-O-Si).

上述組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷由於分子內具有2個-OR c所表示之基,故該等縮合而成之本發明之聚有機矽倍半氧烷具有該等籠型結構呈直線狀連接而成之結構。 Since the cage-type silsesquioxanes represented by the above-mentioned composition formula (2), composition formula (3) and composition formula (4) have two groups represented by -OR c in the molecule, the polyorganosilsesquioxane of the present invention formed by condensing these cage-type structures has a structure in which these cage-type structures are connected in a straight line.

上述組成式(1)所表示之籠型矽倍半氧烷由於分子內僅具有1個-OR c所表示之基,故於上述籠型結構呈直線狀連接而成之結構之末端部進行縮合。 Since the cage-type silsesquioxane represented by the above composition formula (1) has only one group represented by -OR c in the molecule, condensation occurs at the terminal portion of the structure in which the cage-type structure is connected in a straight line.

又,本發明之縮合矽倍半氧烷亦可為不具有源自上述組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷之籠型結構,而使上述組成式(1)所表示之籠型矽倍半氧烷縮合2個而得者。Furthermore, the condensed silsesquioxane of the present invention may be obtained by condensing two cage-type silsesquioxanes represented by the above-mentioned composition formula (1) without the cage-type structure derived from the cage-type silsesquioxanes represented by the above-mentioned composition formula (2), composition formula (3), and composition formula (4).

關於本發明之縮合矽倍半氧烷,源自上述組成式(1)、組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷的各籠型構成單元之縮合形態並無特別限定,可為無規型,亦可為嵌段型。Regarding the condensed silsesquioxane of the present invention, the condensation form of each cage-type constituent unit derived from the cage-type silsesquioxane represented by the above-mentioned composition formula (1), composition formula (2), composition formula (3) and composition formula (4) is not particularly limited and can be random or block type.

例如,於本發明之縮合矽倍半氧烷包含源自上述式(2')所表示之籠型矽倍半氧烷之籠型結構之情形時,分子內具有下述式(2a)所表示之籠型矽倍半氧烷結構之重複結構。 For example, when the condensed silsesquioxane of the present invention includes a cage-type structure derived from the cage-type silsesquioxane represented by the above formula (2'), the molecule has a repeating structure of the cage-type silsesquioxane structure represented by the following formula (2a).

上述式(2a)中之各標號與上述式(2')含義相同。 又,於本發明之縮合矽倍半氧烷包含源自上述式(2'')所表示之籠型矽倍半氧烷之籠型結構之情形時,分子內具有下述式(2b)所表示之籠型矽倍半氧烷結構之重複結構。 The symbols in the above formula (2a) have the same meanings as those in the above formula (2'). Furthermore, when the condensed silsesquioxane of the present invention comprises a cage-type structure derived from the cage-type silsesquioxane represented by the above formula (2''), the molecule has a repeating structure of the cage-type silsesquioxane structure represented by the following formula (2b).

上述式(2b)中之各標號與上述式(2'')含義相同。 例如,於本發明之縮合矽倍半氧烷包含源自上述式(3')所表示之籠型矽倍半氧烷之籠型結構之情形時,分子內具有下述式(3a)所表示之籠型矽倍半氧烷結構之重複結構。 The symbols in the above formula (2b) have the same meanings as those in the above formula (2''). For example, when the condensed silsesquioxane of the present invention includes a cage-type structure derived from the cage-type silsesquioxane represented by the above formula (3'), the molecule has a repeating structure of the cage-type silsesquioxane structure represented by the following formula (3a).

上述式(3a)中之各標號與上述式(3')含義相同。 又,於本發明之縮合矽倍半氧烷包含源自上述式(3'')所表示之籠型矽倍半氧烷之籠型結構之情形時,分子內具有下述式(3b)所表示之籠型矽倍半氧烷結構之重複結構。 The symbols in the above formula (3a) have the same meanings as those in the above formula (3'). Furthermore, when the condensed silsesquioxane of the present invention comprises a cage-type structure derived from the cage-type silsesquioxane represented by the above formula (3''), the molecule has a repeating structure of the cage-type silsesquioxane structure represented by the following formula (3b).

上述式(3b)中之各標號與上述式(3'')含義相同。 又,於本發明之縮合矽倍半氧烷包含源自上述式(3''')所表示之籠型矽倍半氧烷之籠型結構之情形時,分子內具有下述式(3c)所表示之籠型矽倍半氧烷結構之重複結構。 The symbols in the above formula (3b) have the same meanings as those in the above formula (3''). Furthermore, when the condensed silsesquioxane of the present invention comprises a cage-type structure derived from the cage-type silsesquioxane represented by the above formula (3'''), the molecule has a repeating structure of the cage-type silsesquioxane structure represented by the following formula (3c).

上述式(3c)中之各標號與上述式(3''')含義相同。 例如,於本發明之縮合矽倍半氧烷包含源自上述式(4')所表示之籠型矽倍半氧烷之籠型結構之情形時,分子內具有下述式(4a)所表示之籠型矽倍半氧烷結構之重複結構。 The symbols in the above formula (3c) have the same meanings as those in the above formula (3'''). For example, when the condensed silsesquioxane of the present invention includes a cage-type structure derived from the cage-type silsesquioxane represented by the above formula (4'), the molecule has a repeating structure of the cage-type silsesquioxane structure represented by the following formula (4a).

上述式(4a)中之各標號與上述式(4')含義相同。 又,於本發明之縮合矽倍半氧烷包含源自上述式(4'')所表示之籠型矽倍半氧烷之籠型結構之情形時,分子內具有下述式(4b)所表示之籠型矽倍半氧烷結構之重複結構。 The symbols in the above formula (4a) have the same meanings as those in the above formula (4'). Furthermore, when the condensed silsesquioxane of the present invention comprises a cage-type structure derived from the cage-type silsesquioxane represented by the above formula (4''), the molecule has a repeating structure of the cage-type silsesquioxane structure represented by the following formula (4b).

上述式(4b)中之各標號與上述(4'')含義相同。 例如,於本發明之縮合矽倍半氧烷包含源自上述式(1')所表示之籠型矽倍半氧烷之籠型結構之情形時,於其兩端或一末端具有下述式(1a)所表示之籠型矽倍半氧烷結構及/或下述式(1b)所表示之籠型矽倍半氧烷結構。 The reference numerals in the above formula (4b) have the same meanings as those in the above formula (4''). For example, when the condensed silsesquioxane of the present invention includes a cage-type structure derived from the cage-type silsesquioxane represented by the above formula (1'), the cage-type silsesquioxane structure represented by the following formula (1a) and/or the cage-type silsesquioxane structure represented by the following formula (1b) may be present at both ends or at one end.

上述式(1a)中之各標號與上述(1')含義相同。 上述式(1b)中之R 1j~R 1r與上述(1')中之R 1a~R 1i含義相同。 The symbols in the above formula (1a) have the same meanings as in the above formula (1'). R 1j to R 1r in the above formula (1b) have the same meanings as R 1a to R 1i in the above formula (1').

本發明之縮合矽倍半氧烷例如包含:2個組成式(1)所表示之籠型矽倍半氧烷之縮合物等1種時之2個以上之縮合物、及上述組成式(1)所表示之籠型矽倍半氧烷與上述組成式(2)所表示之籠型矽倍半氧烷縮合而得者等不同種類之2種以上之縮合物。其中,本發明之縮合矽倍半氧烷較佳為1個上述組成式(1)所表示之籠型矽倍半氧烷與另一上述組成式(1)所表示之籠型矽倍半氧烷之縮合物、或1個上述組成式(1)所表示之籠型矽倍半氧烷與組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷中之任一種之縮合物。The condensed silsesquioxanes of the present invention include, for example, two or more condensates of one type, such as a condensate of two cage-type silsesquioxanes represented by the composition formula (1), and two or more condensates of different types, such as a condensate of a cage-type silsesquioxane represented by the composition formula (1) and a cage-type silsesquioxane represented by the composition formula (2). Among them, the condensed silsesquioxane of the present invention is preferably a condensation product of one cage-type silsesquioxane represented by the above-mentioned composition formula (1) and another cage-type silsesquioxane represented by the above-mentioned composition formula (1), or a condensation product of one cage-type silsesquioxane represented by the above-mentioned composition formula (1) and any one of the cage-type silsesquioxanes represented by the composition formula (2), the composition formula (3) and the composition formula (4).

本發明之縮合矽倍半氧烷中,作為1個上述組成式(1)所表示之籠型矽倍半氧烷與1個上述組成式(2)所表示之籠型矽倍半氧烷之縮合物的矽倍半氧烷例如可列舉:上述式(1')中之-OR c所表示之基與上述式(2')中之2個-OR c所表示之基中之1個縮合而形成之下述式(1a-2a)所表示之縮合矽倍半氧烷。再者,式(1a-2b)中之取代基(R 1a~R 1i及R 2a~R 2h)與式(1a)及式(2b)中之基相同。 Among the condensed silsesquioxanes of the present invention, examples of silsesquioxanes that are condensates of one cage-type silsesquioxane represented by the above-mentioned composition formula (1) and one cage-type silsesquioxane represented by the above-mentioned composition formula (2) include: a condensed silsesquioxane represented by the following formula (1a-2a) formed by condensing the group represented by -OR c in the above-mentioned formula (1') with one of the two groups represented by -OR c in the above-mentioned formula (2'). Furthermore, the substituents (R 1a to R 1i and R 2a to R 2h ) in the formulas (1a-2b) are the same as those in the formulas (1a) and (2b).

本發明之縮合矽倍半氧烷中,作為1個上述組成式(1)所表示之籠型矽倍半氧烷與另一上述組成式(1)所表示之籠型矽倍半氧烷之縮合物的矽倍半氧烷例如可列舉:2個上述式(1')中之-OR c所表示之基彼此縮合而形成之下述式(1a-1b)所表示之縮合矽倍半氧烷。再者,式(1a-1b)中之取代基(R 1a~R 1r)與式(1a)及式(1b)中之基相同。 Among the condensed silsesquioxanes of the present invention, examples of silsesquioxanes that are condensates of one cage-type silsesquioxane represented by the above-mentioned composition formula (1) and another cage-type silsesquioxane represented by the above-mentioned composition formula (1) include: condensed silsesquioxanes represented by the following formulas (1a-1b) formed by condensing two groups represented by -OR c in the above-mentioned formula (1'). Furthermore, the substituents (R 1a to R 1r ) in formulas (1a-1b) are the same as those in formulas (1a) and (1b).

本發明之縮合矽倍半氧烷中,作為1個上述組成式(2)所表示之籠型矽倍半氧烷與另一上述組成式(2)所表示之籠型矽倍半氧烷之縮合物的矽倍半氧烷例如可列舉:2個上述式(2')中之-OR c所表示之基彼此縮合而形成之下述式(2a-2a)所表示之縮合矽倍半氧烷。再者,式(2a-2a)中之取代基(R 2a~R 2h)與式(2a)中之基相同。 Among the condensed silsesquioxanes of the present invention, examples of silsesquioxanes that are condensates of one cage-type silsesquioxane represented by the above-mentioned composition formula (2) and another cage-type silsesquioxane represented by the above-mentioned composition formula (2) include: a condensed silsesquioxane represented by the following formula (2a-2a) formed by condensing two groups represented by -OR c in the above-mentioned formula (2'). Furthermore, the substituents (R 2a to R 2h ) in formula (2a-2a) are the same as those in formula (2a).

本發明之聚有機矽倍半氧烷除本發明之縮合矽倍半氧烷以外,還可包含正六面體結構等氧化矽之立體結構完全未裂解之籠型(結構)矽倍半氧烷(即,完全籠型矽倍半氧烷)、及例如上述組成式(1)、組成式(2)、組成式(3)、組成式(4)等所表示之籠型矽倍半氧烷未經縮合者(即,不完全籠型矽倍半氧烷)等單體籠型矽倍半氧烷。再者,於本說明書中,將上述完全籠型倍半矽氧烷與不完全籠型倍半矽氧烷之兩者合併稱為單體籠型倍半矽氧烷。本發明之聚有機矽倍半氧烷中之單體籠型矽倍半氧烷之含量相對於本發明之聚有機矽倍半氧烷總量,例如為5重量%以上,較佳為10重量%以上,更佳為20重量%以上,例如為50重量%以下,較佳為40重量%以下,更佳為20重量%以下。若上述單體籠型矽倍半氧烷之含量處於上述範圍,則可使製成硬化物時之表面硬度進一步提昇。 In addition to the condensed silsesquioxanes of the present invention, the polyorganosilsesquioxanes of the present invention may also include cage-type silsesquioxanes (i.e., complete cage-type silsesquioxanes) in which the stereostructure of silicon oxide, such as a regular hexahedral structure, is completely undecomposed, and cage-type silsesquioxanes such as those represented by the above-mentioned composition formula (1), composition formula (2), composition formula (3), and composition formula (4) that are not condensed (i.e., incomplete cage-type silsesquioxanes). In this specification, the above-mentioned complete cage-type silsesquioxanes and incomplete cage-type silsesquioxanes are collectively referred to as monomer cage-type silsesquioxanes. The content of the cage-type silsesquioxane monomer in the polyorganosilsesquioxane of the present invention is, for example, 5% by weight or more, preferably 10% by weight or more, and more preferably 20% by weight or more, and for example, 50% by weight or less, preferably 40% by weight or less, and more preferably 20% by weight or less, relative to the total weight of the polyorganosilsesquioxane of the present invention. If the content of the cage-type silsesquioxane monomer is within the above range, the surface hardness of the resulting cured product can be further improved.

本發明之聚有機矽倍半氧烷亦可具有本發明之縮合矽倍半氧烷以外之籠型矽倍半氧烷。又,本發明之聚有機矽倍半氧烷除籠型矽倍半氧烷以外還可具有梯型或無規型等之矽倍半氧烷結構。又,亦可將該等矽倍半氧烷結構之2個以上加以組合而具有。The polyorganosilsesquioxane of the present invention may also have cage-type silsesquioxanes other than the condensed silsesquioxanes of the present invention. Furthermore, the polyorganosilsesquioxane of the present invention may have ladder-type or random-type silsesquioxane structures in addition to cage-type silsesquioxanes. Furthermore, the polyorganosilsesquioxane of the present invention may have a combination of two or more of these silsesquioxane structures.

本發明之聚有機矽倍半氧烷中之本發明之縮合矽倍半氧烷之含量相對於本發明之聚有機矽倍半氧烷總量,為20重量%以上(較佳為25~90重量%,更佳為30~80重量%,進而較佳為40~70重量%)。籠型矽倍半氧烷之含量相對於本發明之聚有機矽倍半氧烷總量,例如含有40~99.5重量%,較佳為含有45~98重量%,更佳為含有50~96重量%。The content of the condensed silsesquioxane of the present invention in the polyorganosilsesquioxane of the present invention is 20% by weight or greater (preferably 25-90% by weight, more preferably 30-80% by weight, and even more preferably 40-70% by weight) relative to the total weight of the polyorganosilsesquioxane of the present invention. The content of the cage-type silsesquioxane is, for example, 40-99.5% by weight, preferably 45-98% by weight, and even more preferably 50-96% by weight relative to the total weight of the polyorganosilsesquioxane of the present invention.

本發明之聚有機矽倍半氧烷之基於凝膠滲透層析法之標準聚苯乙烯換算之數量平均分子量(Mn)例如為2000~50000,較佳為2500~40000,更佳為3000~30000。藉由將數量平均分子量設為2000以上,製成未硬化或半硬化之硬塗層時之表面容易變得不黏著,耐黏連性提昇,容易捲取成卷狀。因此,藉由將數量平均分子量設為2000以上,可較佳地用作模內射出成型轉印用膜之硬塗層之成分,又,硬化物之耐熱性、耐擦傷性、接著性進一步提昇。另一方面,藉由將數量平均分子量設為50000以下,與硬化性組成物中之其他成分之相容性提昇,進一步提昇硬化物之耐熱性。The polyorganosilsesquioxane of the present invention has a number average molecular weight (Mn) calculated based on standard polystyrene as determined by gel permeation chromatography, for example, from 2,000 to 50,000, preferably from 2,500 to 40,000, and even more preferably from 3,000 to 30,000. A number average molecular weight of 2,000 or greater makes the surface of an uncured or semi-cured hard coat less sticky, improving blocking resistance and making it easier to roll up. Therefore, a number average molecular weight of 2,000 or greater makes it ideal for use as a component of a hard coat for transfer films used in in-mold injection molding, further enhancing the heat resistance, scratch resistance, and adhesive properties of the cured product. On the other hand, by setting the number average molecular weight to 50,000 or less, the compatibility with other components in the curable composition is improved, further improving the heat resistance of the cured product.

本發明之聚有機矽倍半氧烷之基於凝膠滲透層析法之標準聚苯乙烯換算之分子量分散度(Mw/Mn)例如為1.0~4.0,較佳為1.1~3.0,更佳為1.2~2.5。藉由將分子量分散度設為4.0以下,對溶劑之溶解性變良好,硬化物之表面硬度或接著性進一步提昇。另一方面,藉由將分子量分散度設為1.1以上,有容易成為液狀,操作性提昇之傾向。The molecular weight dispersion (Mw/Mn) of the polyorganosilsesquioxane of the present invention, as measured by gel permeation chromatography, is, for example, 1.0 to 4.0, preferably 1.1 to 3.0, and even more preferably 1.2 to 2.5. A molecular weight dispersion of 4.0 or less improves solubility in solvents, further enhancing the surface hardness and adhesion of the cured product. On the other hand, a molecular weight dispersion of 1.1 or greater facilitates liquidification, tending to improve workability.

再者,本發明之聚有機矽倍半氧烷之數量平均分子量、分子量分散度可藉由GPC測定求出。又,本發明之聚有機矽倍半氧烷中之上述單體籠型矽倍半氧烷及縮合矽倍半氧烷之含量可根據GPC測定中之對應波峰之區域值之面積比求出。GPC測定可藉由下述裝置及條件進行測定。 測定裝置:商品名「GPC Semi-Micro System」(島津製作所(股)公司製造) 檢測器:RI檢測器(昭光Science(股)製造) 管柱:KF-G4A(保護管柱)、KF-602、及KF-603(昭光Science(股)公司製造) 流速:0.6 mL/min 測定溫度:40℃ 測定時間:13 min 注入量:20 μL 析出液:THF、樣品濃度0.1~0.2重量% 分子量:標準聚苯乙烯換算 Furthermore, the number average molecular weight and molecular weight dispersion of the polyorganosilsesquioxane of the present invention can be determined by GPC measurement. Furthermore, the content of the aforementioned monomeric cage-type silsesquioxane and condensed silsesquioxane in the polyorganosilsesquioxane of the present invention can be determined based on the area ratio of the corresponding peaks in the GPC measurement. GPC measurement can be performed using the following apparatus and conditions. Measurement Apparatus: GPC Semi-Micro System (Shimadzu Corporation) Detector: RI detector (Shoko Scientific Co., Ltd.) Columns: KF-G4A (guard column), KF-602, and KF-603 (Shoko Scientific Co., Ltd.) Flow Rate: 0.6 mL/min Measurement Temperature: 40°C Measurement Time: 13 min Injection Volume: 20 μL Eluent: THF, Sample Concentration: 0.1–0.2 wt% Molecular Weight: Standard Polystyrene Equivalent

本發明之聚有機矽倍半氧烷於空氣環境下之5%重量減少溫度(T d5)並無特別限定,較佳為330℃以上(例如330~450℃),更佳為340℃以上,進而較佳為350℃以上。藉由5%重量減少溫度為330℃以上,有硬化物之耐熱性進一步提昇之傾向。本發明之聚有機矽倍半氧烷為上述比率[T3體/T2體]為1以上500以下且數量平均分子量為2000~50000、分子量分散度為1.0~4.0,藉此其硬化物之5%重量減少溫度成為330℃以上。再者,5%重量減少溫度為耐熱性之指標,其係以一定之升溫速度進行加熱時,與加熱前重量相比減少5%時之溫度。上述5%重量減少溫度可藉由TGA(熱重量分析),於空氣環境下以升溫速度5℃/分鐘之條件進行測定。 The 5% weight loss temperature ( Td5 ) of the polyorganosilsesquioxane of the present invention in an air environment is not particularly limited, but is preferably 330°C or higher (e.g., 330-450°C), more preferably 340°C or higher, and even more preferably 350°C or higher. A 5% weight loss temperature of 330°C or higher tends to further improve the heat resistance of the cured product. The polyorganosilsesquioxane of the present invention has a ratio [T3 form/T2 form] of 1 to 500, a number average molecular weight of 2,000 to 50,000, and a molecular weight dispersion of 1.0 to 4.0, thereby achieving a 5% weight loss temperature of 330°C or higher. Furthermore, the 5% weight loss temperature is an indicator of heat resistance. It is the temperature at which the weight of the material decreases by 5% compared to the pre-heating weight when heated at a certain heating rate. This 5% weight loss temperature can be measured by TGA (thermogravimetric analysis) in an air environment at a heating rate of 5°C/minute.

本發明之聚有機矽倍半氧烷可藉由公知或慣用之聚矽氧烷之製造方法進行製造,並無特別限定,例如可藉由使1種或2種以上之水解性矽烷化合物水解及縮合之方法進行製造。其中,關於上述水解性矽烷化合物,必須使用水解性三官能矽烷化合物(下述式(A)所表示之化合物)作為必需之水解性矽烷化合物。The polyorganosilsesquioxane of the present invention can be produced by any known or commonly used polysiloxane production method, without particular limitation. For example, it can be produced by hydrolyzing and condensing one or more hydrolyzable silane compounds. The hydrolyzable silane compound must be a hydrolyzable trifunctional silane compound (a compound represented by the following formula (A)).

更具體而言,例如,藉由使用來形成本發明之聚有機矽倍半氧烷中之矽倍半氧烷構成單元(T單元)的水解性矽烷化合物即下述式(a)所表示之化合物、視需要進而使下述式(b)所表示之化合物、下述式(c)所表示之化合物進行水解及縮合之方法,而生成上述組成式(1)、組成式(2)、組成式(3)及/或組成式(4)所表示之籠型矽倍半氧烷,藉由進一步之水解及縮合反應,可製造含有本發明之縮合矽倍半氧烷之本發明之聚有機矽倍半氧烷,該本發明之縮合矽倍半氧烷係上述組成式(1)、組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷中,1種時縮合2個以上、或2種以上時縮合2個以上而得。 More specifically, for example, by using a hydrolyzable silane compound for forming the silsesquioxane constituent unit (T unit) in the polyorganosilsesquioxane of the present invention, i.e., a compound represented by the following formula (a), and optionally further hydrolyzing and condensing a compound represented by the following formula (b) and a compound represented by the following formula (c), the above-mentioned composition formula (1), composition formula (2), composition formula (3) and/or composition formula (4) are generated. The cage-type silsesquioxane represented by formula (4) can be subjected to further hydrolysis and condensation reactions to produce the polyorganosilsesquioxane of the present invention containing the condensed silsesquioxane of the present invention. The condensed silsesquioxane of the present invention is obtained by condensing two or more of one type of cage-type silsesquioxane represented by formula (1), formula (2), formula (3) and formula (4), or condensing two or more of two types of cage-type silsesquioxane represented by formula (4).

上述式(A)所表示之化合物為形成本發明之縮合矽倍半氧烷中之[R ASiO 3/2]或[R ASiO 2/2(OR c)]所表示之構成單元之化合物。式(A)中之R A與上述組成式(1)中之R 1、組成式(2)中之R 2、組成式(3)中之R 3、組成式(4)中之R 4(即,籠型矽倍半氧烷中之取代基)同樣地表示含有聚合性官能基之基。關於式(A)中之R A,作為其含有聚合性官能基之基,較佳為上述式(1A)所表示之基、上述式(1B)所表示之基、上述式(1C)所表示之基、上述式(1D)所表示之基,更佳為上述式(1A)所表示之基、上述式(1C)所表示之基,進而較佳為上述式(1A)所表示之基,進而更佳為上述式(1A)所表示之基且R 1A為伸乙基之基[其中,為2-(3',4'-環氧環己基)乙基]。 The compound represented by the above formula (A) is a compound that forms the constituent unit represented by [ RASiO3 /2 ] or [ RASiO2 /2 ( ORc )] in the condensed silsesquioxane of the present invention. RA in formula (A) represents a group containing a polymerizable functional group, similarly to R1 in the above composition formula ( 1 ), R2 in the composition formula (2), R3 in the composition formula (3), and R4 in the composition formula (4) (i.e., the substituent in the cage-type silsesquioxane). Regarding RA in formula (A), as the group containing a polymerizable functional group, preferably, the group represented by the above-mentioned formula (1A), the group represented by the above-mentioned formula (1B), the group represented by the above-mentioned formula (1C), or the group represented by the above-mentioned formula (1D), more preferably, the group represented by the above-mentioned formula (1A) or the group represented by the above-mentioned formula (1C), further preferably, the group represented by the above-mentioned formula (1A), further preferably, the group represented by the above-mentioned formula (1A) wherein RA is an ethylene group [in which case, 2-(3',4'-epoxycyclohexyl)ethyl] is present.

上述式(A)中之X 1表示烷氧基或鹵素原子。作為X 1中之烷氧基,例如可列舉:甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基等碳數1~4之烷氧基等。又,作為X 1中之鹵素原子,例如可列舉:氟原子、氯原子、溴原子、碘原子等。其中,X 1較佳為烷氧基,更佳為甲氧基、乙氧基。再者,3個X 1可分別相同,亦可不同。 In the above formula (A), X1 represents an alkoxy group or a halogen atom. Examples of the alkoxy group in X1 include alkoxy groups having 1 to 4 carbon atoms, such as methoxy, ethoxy, propoxy, isopropoxy, butoxy, and isobutoxy. Examples of the halogen atom in X1 include fluorine, chlorine, bromine, and iodine. Among them, X1 is preferably an alkoxy group, and more preferably a methoxy or ethoxy group. Furthermore, the three X1 groups may be the same or different.

上述式(B)所表示之化合物係形成本發明之縮合矽倍半氧烷中之[R BSiO 3/2]或[R BSiO 2/2(OR c)]所表示之構成單元之化合物。式(B)中,R B表示經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、或經取代或未經取代之烯基。式(B)中,R B較佳為經取代或未經取代之芳基、經取代或未經取代之烷基、經取代或未經取代之烯基,更佳為經取代或未經取代之芳基,進而較佳為苯基。 The compound represented by formula (B) above forms the constituent unit represented by [ RBSiO3 /2 ] or [ RBSiO2 /2 ( ORc )] in the condensed silsesquioxane of the present invention. In formula (B), RB represents a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted alkenyl group. In formula (B), RB is preferably a substituted or unsubstituted aryl group, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted alkenyl group, more preferably a substituted or unsubstituted aryl group, and even more preferably a phenyl group.

上述式(B)中之X 2表示烷氧基或鹵素原子。作為X 2之具體例,可列舉作為X 1所例示者。其中,X 2較佳為烷氧基,更佳為甲氧基、乙氧基。再者,3個X 2可分別相同,亦可不同。 In the above formula (B), X₂ represents an alkoxy group or a halogen atom. Specific examples of X₂ include those exemplified for X₁ . Among them, X₂ is preferably an alkoxy group, more preferably a methoxy group or an ethoxy group. Furthermore, the three X₂ groups may be the same or different.

上述式(C)所表示之化合物係形成本發明之縮合矽倍半氧烷中之[HSiO 3/2]或[HSiO 2/2(OR c)]所表示之構成單元之化合物。上述式(C)中,X 3表示烷氧基或鹵素原子。作為X 3之具體例,可列舉作為X 1所例示者。其中,X 3較佳為烷氧基,更佳為甲氧基、乙氧基。再者,3個X 3可分別相同,亦可不同。 The compound represented by formula (C) above forms a constituent unit represented by [HSiO 3/2 ] or [HSiO 2/2 (OR c )] in the condensed silsesquioxane of the present invention. In formula (C), X 3 represents an alkoxy group or a halogen atom. Specific examples of X 3 include those exemplified for X 1. Among them, X 3 is preferably an alkoxy group, more preferably a methoxy group or an ethoxy group. Furthermore, the three X 3 groups may be the same or different.

作為上述水解性矽烷化合物,亦可併用上述式(A)~(C)所表示之化合物以外之水解性矽烷化合物。例如可列舉上述式(A)~(C)所表示之化合物以外之水解性三官能矽烷化合物、形成M單元之水解性單官能矽烷化合物、形成D單元之水解性二官能矽烷化合物、形成Q單元之水解性四官能矽烷化合物等。As the hydrolyzable silane compound, a hydrolyzable silane compound other than the compounds represented by formulas (A) to (C) above may be used in combination. Examples thereof include hydrolyzable trifunctional silane compounds other than the compounds represented by formulas (A) to (C) above, hydrolyzable monofunctional silane compounds forming M units, hydrolyzable difunctional silane compounds forming D units, and hydrolyzable tetrafunctional silane compounds forming Q units.

上述水解性矽烷化合物之使用量或組成可根據所需之本發明之聚有機矽倍半氧烷之結構來適當進行調整。例如,上述式(A)所表示之化合物之使用量並無特別限定,相對於所使用之水解性矽烷化合物之總量(100莫耳%),較佳為30~100莫耳%,更佳為55~100莫耳%,更佳為65~100莫耳%,進而較佳為80~99莫耳%。The amount or composition of the hydrolyzable silane compound can be appropriately adjusted based on the desired structure of the polyorganosilsesquioxane of the present invention. For example, the amount of the compound represented by formula (A) is not particularly limited, but is preferably 30-100 mol%, more preferably 55-100 mol%, even more preferably 65-100 mol%, and even more preferably 80-99 mol%, relative to the total amount of the hydrolyzable silane compound used (100 mol%).

又,上述式(B)所表示之化合物之使用量並無特別限定,相對於所使用之水解性矽烷化合物之總量(100莫耳%),較佳為0~70莫耳%,更佳為0~60莫耳%,進而較佳為0~40莫耳%,進而更佳為1~15莫耳%。The amount of the compound represented by formula (B) used is not particularly limited, but is preferably 0 to 70 mol%, more preferably 0 to 60 mol%, further preferably 0 to 40 mol%, and further preferably 1 to 15 mol%, relative to the total amount of the hydrolyzable silane compound used (100 mol%).

進而,式(A)所表示之化合物與式(B)所表示之化合物相對於所使用之水解性矽烷化合物之總量(100莫耳%)的比率(總量之比率)並無特別限定,較佳為60~100莫耳%,更佳為70~100莫耳%,進而較佳為80~100莫耳%。Furthermore, the ratio (total amount ratio) of the compound represented by formula (A) to the compound represented by formula (B) relative to the total amount (100 mol%) of the hydrolyzable silane compound used is not particularly limited, but is preferably 60 to 100 mol%, more preferably 70 to 100 mol%, and even more preferably 80 to 100 mol%.

又,於併用2種以上作為上述水解性矽烷化合物之情形時,該等水解性矽烷化合物之水解及縮合反應既可同時進行,亦可逐次進行。於逐次進行上述反應之情形時,進行反應之順序並無特別限定。When two or more hydrolyzable silane compounds are used in combination, the hydrolysis and condensation reactions of these hydrolyzable silane compounds can be carried out simultaneously or sequentially. When the reactions are carried out sequentially, the order of the reactions is not particularly limited.

上述水解性矽烷化合物之水解及縮合反應可以1階段進行,亦可分成2階段以上來進行,為了效率良好地製造本發明之聚有機矽倍半氧烷,較佳為以2階段以上(較佳為2階段)進行水解及縮合反應。以下,對以2階段進行水解性矽烷化合物之水解及縮合反應之態樣進行說明,但本發明之聚有機矽倍半氧烷之製造方法並不限定於其。The hydrolysis and condensation reaction of the hydrolyzable silane compound can be carried out in a single stage or in two or more stages. To efficiently produce the polyorganosilsesquioxane of the present invention, the hydrolysis and condensation reaction is preferably carried out in two or more stages (preferably two stages). The following describes an embodiment of the hydrolysis and condensation reaction of the hydrolyzable silane compound carried out in two stages, but the method for producing the polyorganosilsesquioxane of the present invention is not limited thereto.

於以2階段進行本發明之水解及縮合反應之情形時,較佳為於第1階段之水解及縮合反應中,獲得上述比率[T3體/T2體]為1以上且未達20、數量平均分子量例如為1000~3000之聚有機矽倍半氧烷(以下稱為「中間物聚有機矽倍半氧烷」),於第2階段使該中間物聚有機矽倍半氧烷進一步進行水解及縮合反應,藉此可獲得本發明之聚有機矽倍半氧烷。When the hydrolysis and condensation reaction of the present invention is carried out in two stages, it is preferred that in the first stage of the hydrolysis and condensation reaction, a polyorganosilsesquioxane having a ratio [T3 form/T2 form] of 1 or greater and less than 20 and a number average molecular weight of, for example, 1000 to 3000 (hereinafter referred to as the "intermediate polyorganosilsesquioxane") is obtained. In the second stage, the intermediate polyorganosilsesquioxane is further subjected to a hydrolysis and condensation reaction to obtain the polyorganosilsesquioxane of the present invention.

第1階段之水解及縮合反應既可於溶劑之存在下進行,亦可於未存在下進行。其中,較佳為於溶劑之存在下進行。作為上述溶劑,例如可列舉:苯、甲苯、二甲苯、乙基苯等芳香族烴;二乙醚、二甲氧基乙烷、四氫呋喃、二烷等醚;丙酮、甲基乙基酮、甲基異丁基酮等酮;乙酸甲酯、乙酸乙酯、乙酸異丙酯、乙酸丁酯等酯;N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等醯胺;乙腈、丙腈、苯甲腈等腈;甲醇、乙醇、異丙醇、丁醇等醇等。其中,上述溶劑較佳為酮、醚。再者,溶劑既可單獨使用1種,亦可組合2種以上使用。The hydrolysis and condensation reaction in the first stage can be carried out in the presence of a solvent or in the absence of a solvent. It is preferably carried out in the presence of a solvent. Examples of the solvent include aromatic hydrocarbons such as benzene, toluene, xylene, and ethylbenzene; diethyl ether, dimethoxyethane, tetrahydrofuran, dimethoxyethane, and dimethoxyethane. Examples of the solvent include ethers such as alkane; ketones such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; esters such as methyl acetate, ethyl acetate, isopropyl acetate, and butyl acetate; amides such as N,N-dimethylformamide and N,N-dimethylacetamide; nitriles such as acetonitrile, propionitrile, and benzonitrile; and alcohols such as methanol, ethanol, isopropyl alcohol, and butanol. Among these solvents, ketones and ethers are preferred. The solvents may be used alone or in combination of two or more.

第1階段之水解及縮合反應中之溶劑之使用量並無特別限定,可根據所需之反應時間等,在相對於水解性矽烷化合物之總量100重量份為0~2000重量份之範圍內適當調整。The amount of solvent used in the hydrolysis and condensation reaction of the first stage is not particularly limited and can be appropriately adjusted within the range of 0 to 2000 parts by weight relative to 100 parts by weight of the total amount of the hydrolyzable silane compound, depending on the desired reaction time, etc.

第1階段之水解及縮合反應較佳為於觸媒及水之存在下進行。上述觸媒可為酸觸媒,亦可為鹼觸媒,為了抑制環氧基等聚合性官能基之分解,較佳為鹼觸媒。作為上述酸觸媒,例如可列舉:鹽酸、硫酸、硝酸、磷酸、硼酸等無機酸;磷酸酯;乙酸、甲酸、三氟乙酸等羧酸;甲磺酸、三氟甲磺酸、對甲苯磺酸等磺酸;活性白土等固體酸;氯化鐵等路易斯酸等。作為上述鹼觸媒,例如可列舉:氫氧化鋰、氫氧化鈉、氫氧化鉀、氫氧化銫等鹼金屬之氫氧化物;氫氧化鎂、氫氧化鈣、氫氧化鋇等鹼土類金屬之氫氧化物;碳酸鋰、碳酸鈉、碳酸鉀、碳酸銫等鹼金屬之碳酸鹽;碳酸鎂等鹼土類金屬之碳酸鹽;碳酸氫鋰、碳酸氫鈉、碳酸氫鈉、碳酸氫鉀、碳酸氫銫等鹼金屬之碳酸氫鹽;乙酸鋰、乙酸鈉、乙酸鉀、乙酸銫等鹼金屬之有機酸鹽(例如乙酸鹽);乙酸鎂等鹼土類金屬之有機酸鹽(例如乙酸鹽);甲醇鋰、甲醇鈉、乙醇鈉、異丙醇鈉、乙醇鉀、第三丁醇鉀等鹼金屬之烷醇鹽;苯氧化鈉等鹼金屬之酚鹽;三乙胺、N-甲基哌啶、1,8-二吖雙環[5.4.0]十一-7-烯、1,5-二吖雙環[4.3.0]壬-5-烯等胺類(三級胺等);吡啶、2,2'-聯吡啶、1,10-啡啉等含氮芳香族雜環化合物等。再者,觸媒可單獨使用1種,亦可組合2種以上使用。又,觸媒可以溶解或分散於水或溶劑等中之狀態使用。The hydrolysis and condensation reactions in the first stage are preferably carried out in the presence of a catalyst and water. The catalyst can be either an acid catalyst or a base catalyst. Base catalysts are preferred to inhibit the decomposition of polymerizable functional groups such as epoxy groups. Examples of acid catalysts include: inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, and boric acid; phosphate esters; carboxylic acids such as acetic acid, formic acid, and trifluoroacetic acid; sulfonic acids such as methanesulfonic acid, trifluoromethanesulfonic acid, and p-toluenesulfonic acid; solid acids such as activated clay; and Lewis acids such as ferric chloride. Examples of the alkaline catalyst include: hydroxides of alkaline metals such as lithium hydroxide, sodium hydroxide, potassium hydroxide, and cesium hydroxide; hydroxides of alkaline earth metals such as magnesium hydroxide, calcium hydroxide, and barium hydroxide; carbonates of alkaline earth metals such as lithium carbonate, sodium carbonate, potassium carbonate, and cesium carbonate; carbonates of alkaline earth metals such as magnesium carbonate; bicarbonates of alkaline metals such as lithium bicarbonate, sodium bicarbonate, sodium bicarbonate, potassium bicarbonate, and cesium bicarbonate; organic acid salts of alkaline metals such as lithium acetate, sodium acetate, potassium acetate, and cesium acetate (e.g. Acetate); organic acid salts of alkaline earth metals such as magnesium acetate (e.g., acetate); alkali metal alkoxides such as lithium methoxide, sodium methoxide, sodium ethoxide, sodium isopropoxide, potassium ethoxide, and potassium tert-butoxide; alkali metal phenoxides such as sodium phenoxide; amines (such as tertiary amines) such as triethylamine, N-methylpiperidine, 1,8-diazabicyclo[5.4.0]undec-7-ene, and 1,5-diazabicyclo[4.3.0]non-5-ene; and nitrogen-containing aromatic heterocyclic compounds such as pyridine, 2,2'-bipyridine, and 1,10-phenanthroline. The catalyst may be used alone or in combination of two or more. Furthermore, the catalyst can be used in a state of being dissolved or dispersed in water or a solvent.

第1階段之水解及縮合反應中之上述觸媒之使用量並無特別限定,可在相對於水解性矽烷化合物之總量1莫耳為0.002~0.200莫耳之範圍內適當進行調整。The amount of the catalyst used in the hydrolysis and condensation reaction of the first stage is not particularly limited and can be appropriately adjusted within the range of 0.002 to 0.200 mol per 1 mol of the total amount of the hydrolyzable silane compound.

第1階段之水解及縮合反應時之水之使用量並無特別限定,可在相對於水解性矽烷化合物之總量1莫耳為0.5~20莫耳之範圍內適當進行調整。The amount of water used in the hydrolysis and condensation reaction of the first stage is not particularly limited and can be appropriately adjusted within the range of 0.5 to 20 mol relative to 1 mol of the total amount of the hydrolyzable silane compound.

第1階段之水解及縮合反應中之上述水之添加方法並無特別限定,可一次性地添加所使用之水之總量(全部使用量),亦可逐次添加。逐次添加時,既可連續地添加,亦可間歇地添加。The method for adding the water in the first stage of the hydrolysis and condensation reaction is not particularly limited. The total amount of water used (the entire amount used) may be added all at once, or it may be added incrementally. In the case of incremental addition, it may be added continuously or intermittently.

作為第1階段之水解及縮合反應之反應條件,重要的是選擇如中間物聚有機矽倍半氧烷之上述比率[T3體/T2體]成為1以上且未達20之反應條件。第1階段之水解及縮合反應之反應溫度並無特別限定,較佳為40~100℃,更佳為45~80℃。藉由將反應溫度控制為上述範圍,有能夠更有效率地將上述比率[T3體/T2體]控制為1以上且未達20之傾向。又,第1階段之水解及縮合反應之反應時間並無特別限定,較佳為0.1~10小時,更佳為1.5~8小時。又,第1階段之水解及縮合反應既可在常壓下進行,亦可在加壓下或減壓下進行。再者,進行第1階段之水解及縮合反應時之環境並無特別限定,例如為氮氣環境、氬氣環境等非活性氣體環境下、空氣下等氧存在下等均可,較佳為非活性氣體環境下。As for the reaction conditions for the first-stage hydrolysis and condensation reaction, it is important to select reaction conditions such that the ratio [T3 form/T2 form] of the intermediate polyorganosilsesquioxane is 1 or greater and less than 20. The reaction temperature for the first-stage hydrolysis and condensation reaction is not particularly limited, but is preferably 40-100°C, more preferably 45-80°C. By controlling the reaction temperature within this range, the ratio [T3 form/T2 form] tends to be more efficiently controlled to 1 or greater and less than 20. Furthermore, the reaction time for the first-stage hydrolysis and condensation reaction is not particularly limited, but is preferably 0.1-10 hours, more preferably 1.5-8 hours. The hydrolysis and condensation reactions in the first stage can be carried out under normal pressure, elevated pressure, or reduced pressure. Furthermore, the environment in which the hydrolysis and condensation reactions in the first stage are carried out is not particularly limited. Examples include an inert gas environment such as nitrogen or argon, or an environment in the presence of oxygen such as air. An inert gas environment is preferred.

藉由上述第1階段之水解及縮合反應,可獲得中間物聚有機矽倍半氧烷。上述第1階段之水解及縮合反應結束後,較佳為進行觸媒之中和以抑制環氧基之開環等聚合性官能基之分解。又,可將中間物聚有機矽倍半氧烷例如藉由水洗、酸洗淨、鹼洗淨、過濾、濃縮、蒸餾、萃取、晶析、再結晶、管柱層析等分離手段、或將該等組合之分離手段等進行分離純化。又,可將含有中間物聚有機矽倍半氧烷之反應溶液供於第1階段之水解及縮合反應。The intermediate polyorganosilsesquioxane can be obtained through the hydrolysis and condensation reaction in the first stage. After the hydrolysis and condensation reaction in the first stage, it is preferably neutralized with a catalyst to inhibit the decomposition of polymerizable functional groups, such as epoxy ring opening. The intermediate polyorganosilsesquioxane can be isolated and purified by separation methods such as water washing, acid washing, alkaline washing, filtration, concentration, distillation, extraction, crystallization, recrystallization, column chromatography, or a combination of these separation methods. The reaction solution containing the intermediate polyorganosilsesquioxane can be subjected to the hydrolysis and condensation reaction in the first stage.

藉由將利用第1階段之水解及縮合反應而獲得之中間物聚有機矽倍半氧烷供於第2階段之水解及縮合反應,可製造本發明之聚有機矽倍半氧烷。 第2階段之水解及縮合反應既可於溶劑之存在下進行,亦可於未存在下進行。於溶劑之存在下進行第2階段之水解及縮合反應之情形時,可使用第1階段之水解及縮合反應中所列舉之溶劑。作為第2階段之水解及縮合反應之溶劑,可直接使用含有第1階段之水解及縮合反應之反應溶劑、萃取溶劑等之中間物聚有機矽倍半氧烷、或亦可使用將一部分或全部蒸餾去除所得者。又,於含有中間物聚有機矽倍半氧烷之反應溶液中添加沸點高於第1階段之水解及縮合反應所使用之溶劑的高沸點溶劑,繼而進行加熱、蒸餾去除,藉此亦可替換溶劑進行。再者,溶劑既可單獨使用1種,亦可組合2種以上使用。 The polyorganosilsesquioxane of the present invention can be produced by subjecting the intermediate polyorganosilsesquioxane obtained in the first-stage hydrolysis and condensation reaction to the second-stage hydrolysis and condensation reaction. The second-stage hydrolysis and condensation reaction can be carried out in the presence or absence of a solvent. When the second-stage hydrolysis and condensation reaction is carried out in the presence of a solvent, the solvents listed for the first-stage hydrolysis and condensation reaction can be used. The solvent for the second-stage hydrolysis and condensation reaction can be the intermediate polyorganosilsesquioxane containing the reaction solvent or extraction solvent used in the first-stage hydrolysis and condensation reaction, either directly or after partial or complete distillation. Alternatively, the solvent can be replaced by adding a higher-boiling-point solvent than the solvent used in the first-stage hydrolysis and condensation reaction to the reaction solution containing the intermediate polyorganosilsesquioxane, followed by heating and distillation. Furthermore, the solvent may be used alone or in combination of two or more.

於第2階段之水解及縮合反應中使用溶劑之情形時,其使用量並無特別限定,可根據所需之反應時間等,在相對於中間物聚有機矽倍半氧烷100重量份為0~2000重量份之範圍內適當調整。When a solvent is used in the hydrolysis and condensation reaction of the second stage, its amount is not particularly limited and can be appropriately adjusted within the range of 0 to 2000 parts by weight relative to 100 parts by weight of the intermediate polyorganosilsesquioxane, depending on the desired reaction time and other factors.

第2階段之水解及縮合反應較佳為於觸媒及水之存在下進行。上述觸媒可使用第1階段之水解及縮合反應中所列舉之觸媒,為了抑制環氧基等聚合性官能基之分解,較佳為鹼觸媒,進而較佳為氫氧化鈉、氫氧化鉀、氫氧化銫等鹼金屬之氫氧化物;碳酸鋰、碳酸鈉、碳酸鉀、碳酸銫等鹼金屬之碳酸鹽。再者,觸媒既可單獨使用1種,亦可組合2種以上使用。又,觸媒可以溶解或分散於水或溶劑等中之狀態使用。又,可將第1階段之水解及縮合反應所使用之觸媒直接用於第2階段之水解及縮合反應。The hydrolysis and condensation reaction in the second stage is preferably carried out in the presence of a catalyst and water. The catalysts listed for the hydrolysis and condensation reaction in the first stage can be used. To inhibit the decomposition of polymerizable functional groups such as epoxy groups, alkaline catalysts are preferred, particularly alkaline metal hydroxides such as sodium hydroxide, potassium hydroxide, and cesium hydroxide; and alkaline metal carbonates such as lithium carbonate, sodium carbonate, potassium carbonate, and cesium carbonate. The catalysts may be used singly or in combination. The catalysts may be dissolved or dispersed in water or a solvent. Furthermore, the catalyst used in the hydrolysis and condensation reaction in the first stage can be directly used in the hydrolysis and condensation reaction in the second stage.

第2階段之水解及縮合反應中之上述觸媒之使用量並無特別限定,可在相對於中間物聚有機矽倍半氧烷(1000000 ppm)較佳為0.01~10000 ppm、更佳為0.1~1000 ppm之範圍內適當進行調整。The amount of the catalyst used in the hydrolysis and condensation reaction of the second stage is not particularly limited and can be appropriately adjusted within a range of preferably 0.01 to 10,000 ppm, more preferably 0.1 to 1,000 ppm, relative to the intermediate polyorganosilsesquioxane (1,000,000 ppm).

第2階段之水解及縮合反應時之水之使用量並無特別限定,可在相對於中間物聚有機矽倍半氧烷(1000000 ppm)較佳為10~100000 ppm、更佳為100~20000 ppm之範圍內適當進行調整。若水之使用量多於100000 ppm,則有聚有機矽倍半氧烷之比率[T3體/T2體]或數量平均分子量不易控制在規定範圍內之傾向。The amount of water used in the second-stage hydrolysis and condensation reaction is not particularly limited and can be appropriately adjusted within a range of preferably 10-100,000 ppm, more preferably 100-20,000 ppm, relative to the intermediate polyorganosilsesquioxane (1,000,000 ppm). If the amount of water used exceeds 100,000 ppm, it may be difficult to control the polyorganosilsesquioxane ratio (T3 form/T2 form) or number average molecular weight within the specified range.

第2階段之水解及縮合反應中之上述水之添加方法並無特別限定,可一次性地添加所使用之水之總量(全部使用量),亦可逐次添加。逐次添加時,既可連續地添加,亦可間歇地添加。又,可直接使用第1階段之水解及縮合反應所使用之水,或者亦可使用將一部分蒸餾去除後剩餘之水。The method for adding the water in the second-stage hydrolysis and condensation reaction is not particularly limited. The total amount of water used (the entire amount) may be added all at once, or it may be added incrementally. Incremental addition may be continuous or intermittent. Furthermore, the water used in the first-stage hydrolysis and condensation reaction may be used directly, or the water remaining after a portion of the distillation reaction has been removed may be used.

作為第2階段之水解及縮合反應之反應條件,重要的是選擇如本發明之聚有機矽倍半氧烷之上述比率[T3體/T2體]成為20以上500以下、數量平均分子量成為2000~50000之反應條件。第2階段之水解及縮合反應之反應溫度視所使用之觸媒而變動,並無特別限定,較佳為5~200℃,更佳為30~150℃,進而較佳為80~120℃。藉由將反應溫度控制在上述範圍內,有可將上述比率[T3體/T2體]、數量平均分子量更有效率地控制在所需範圍之傾向。又,第2階段之水解及縮合反應之反應時間並無特別限定,較佳為0.5~1000小時,更佳為1~500小時,進而較佳為5~200小時。 又,於上述反應溫度之範圍內一面進行水解及縮合反應一面適時地進行採樣,在檢測上述比率[T3體/T2體]、數量平均分子量之同時進行反應,藉此亦可獲得具有所需之比率[T3體/T2體]、數量平均分子量之本發明之聚有機矽倍半氧烷。 As for the reaction conditions for the second-stage hydrolysis and condensation reaction, it is important to select reaction conditions such that the ratio [T3 form/T2 form] of the polyorganosilsesquioxane of the present invention is 20 to 500, and the number average molecular weight is 2,000 to 50,000. The reaction temperature for the second-stage hydrolysis and condensation reaction varies depending on the catalyst used and is not particularly limited, but is preferably 5 to 200°C, more preferably 30 to 150°C, and even more preferably 80 to 120°C. By controlling the reaction temperature within this range, the ratio [T3 form/T2 form] and number average molecular weight can be more efficiently controlled within the desired range. The reaction time of the second-stage hydrolysis and condensation reaction is not particularly limited, but is preferably 0.5 to 1000 hours, more preferably 1 to 500 hours, and even more preferably 5 to 200 hours. Also, by allowing the hydrolysis and condensation reactions to proceed within the aforementioned reaction temperature range while sampling is performed at appropriate intervals, and the reaction is conducted while measuring the aforementioned ratio [T3 form/T2 form] and number average molecular weight, the polyorganosilsesquioxane of the present invention having the desired ratio [T3 form/T2 form] and number average molecular weight can be obtained.

第2階段之水解及縮合反應既可在常壓下進行,亦可在加壓下或減壓下進行。再者,進行第2階段之水解及縮合反應時之環境並無特別限定,例如為氮氣環境、氬氣環境等非活性氣體環境下、空氣下等氧存在下等均可,較佳為非活性氣體環境下。The hydrolysis and condensation reaction in the second stage can be carried out under normal pressure, elevated pressure, or reduced pressure. Furthermore, the environment in which the hydrolysis and condensation reaction in the second stage is carried out is not particularly limited; for example, it can be carried out in an inert gas environment such as nitrogen or argon, or in the presence of oxygen such as air. An inert gas environment is preferred.

藉由上述第2階段之水解及縮合反應,可獲得本發明之聚有機矽倍半氧烷。上述第2階段之水解及縮合反應結束後,較佳為進行觸媒之中和以抑制環氧基之開環等聚合性官能基之分解。又,可將本發明之聚有機矽倍半氧烷例如藉由水洗、酸洗淨、鹼洗淨、過濾、濃縮、蒸餾、萃取、晶析、再結晶、管柱層析等分離手段、或將該等組合之分離手段等進行分離純化。The polyorganosilsesquioxane of the present invention can be obtained through the hydrolysis and condensation reaction in the second stage. After the hydrolysis and condensation reaction in the second stage, it is preferably neutralized with a catalyst to inhibit the decomposition of polymerizable functional groups, such as epoxy ring opening. Furthermore, the polyorganosilsesquioxane of the present invention can be isolated and purified by separation methods such as water washing, acid washing, alkaline washing, filtration, concentration, distillation, extraction, crystallization, recrystallization, column chromatography, or a combination of these separation methods.

本發明之聚有機矽倍半氧烷由於含有2個以上之籠型矽倍半氧烷呈直鏈狀縮合之結構之縮合矽倍半氧烷,故認為與以往之聚有機矽倍半氧烷相比,有具有優異之硬化性之傾向。因此,含有本發明之聚有機矽倍半氧烷之硬化性組成物之硬化物具有高表面硬度且耐熱性優異。又,本發明之聚有機矽倍半氧烷於有機溶劑等溶劑中之溶解性優異。「2個以上之籠型矽倍半氧烷呈直鏈狀縮合」意指2個以上之上述組成式(1)、組成式(2)、組成式(3)、及/或組成式(4)所表示之籠型矽倍半氧烷串聯縮合而非三維縮合,結果形成直鏈狀之縮合物。又,即便於本發明之聚有機矽倍半氧烷包含如上述組成式(5)、組成式(6)所示具有3個-OR c所表示之羥基的籠型矽倍半氧烷之情形時,當其中之2個縮合時,相當於「2個以上之籠型矽倍半氧烷呈直鏈狀縮合」。再者,上述機制只不過為推定,不應解釋為本案發明被限定於該等機制。 The polyorganosilsesquioxane of the present invention, which contains a linear condensation structure of two or more cage-type silsesquioxanes, is believed to exhibit superior curability compared to conventional polyorganosilsesquioxanes. Consequently, a cured product of a curable composition containing the polyorganosilsesquioxane of the present invention exhibits high surface hardness and excellent heat resistance. Furthermore, the polyorganosilsesquioxane of the present invention exhibits excellent solubility in solvents such as organic solvents. "Two or more cage-type silsesquioxanes are condensed in a linear chain" means that two or more cage-type silsesquioxanes represented by the above-mentioned composition formula (1), composition formula (2), composition formula (3), and/or composition formula (4) are condensed in series rather than three-dimensionally, resulting in a linear condensation compound. In addition, even if the polyorganosilsesquioxane of the present invention includes a cage-type silsesquioxane having three hydroxyl groups represented by -OR c as shown in the above-mentioned composition formula (5) and composition formula (6), when two of them are condensed, it is equivalent to "two or more cage-type silsesquioxanes are condensed in a linear chain." Furthermore, the above-mentioned mechanism is only a presumption and should not be interpreted as the invention of this case being limited to such mechanism.

[硬化性組成物] 本發明之硬化性組成物為含有上述本發明之聚有機矽倍半氧烷作為必需成分之硬化性組成物(硬化性樹脂組成物)。如下所述,本發明之硬化性組成物亦可進而含有硬化觸媒(例如光陽離子聚合起始劑、自由基聚合性起始劑)或表面調整劑或者表面改質劑、聚合穩定劑、矽烷偶合劑等其他成分。本發明之硬化性組成物可視其用途,用作硬塗層形成用硬化性組成物或接著劑用硬化性組成物(例如積層半導體用硬化性組成物)。於本發明之硬化性組成物中,本發明之聚有機矽倍半氧烷既可單獨使用1種,亦可組合2種以上使用。 [Curing Composition] The curable composition of the present invention is a curable composition (curable resin composition) containing the aforementioned polyorganosilsesquioxane of the present invention as an essential component. As described below, the curable composition of the present invention may further contain other components such as a curing catalyst (e.g., a photopolymerization initiator or a free radical polymerization initiator), a surface conditioner or modifier, a polymerization stabilizer, or a silane coupling agent. Depending on the intended use, the curable composition of the present invention can be used as a curable composition for forming a hard coat layer or as a curable composition for an adhesive (e.g., a curable composition for laminated semiconductors). The polyorganosilsesquioxane of the present invention may be used alone or in combination of two or more.

本發明之硬化性組成物中之本發明之聚有機矽倍半氧烷之含量(摻合量)並無特別限定,相對於溶劑除外之硬化性組成物之總量(100重量%),較佳為70重量%以上且未達100重量%,更佳為80~99.8重量%,進而較佳為90~99.5重量%。藉由將本發明之聚有機矽倍半氧烷之含量設為70重量%以上,有硬化物之表面硬度或接著性進一步提昇之傾向。另一方面,藉由將本發明之聚有機矽倍半氧烷之含量設為未達100重量%,可含有硬化觸媒,藉此有能夠更有效率地進行硬化性組成物之硬化之傾向。The content (blend amount) of the polyorganosilsesquioxane of the present invention in the curable composition of the present invention is not particularly limited. However, relative to the total weight of the curable composition excluding the solvent (100 weight%), it is preferably 70 weight% or greater but less than 100 weight%, more preferably 80 to 99.8 weight%, and even more preferably 90 to 99.5 weight%. A polyorganosilsesquioxane content of 70 weight% or greater tends to further improve the surface hardness and adhesion of the cured product. Furthermore, a polyorganosilsesquioxane content of less than 100 weight% allows for the inclusion of a curing catalyst, which tends to enable more efficient curing of the curable composition.

相對於本發明之硬化性組成物中含有之陽離子硬化性化合物或自由基硬化性化合物之總量(100重量%),本發明之聚有機矽倍半氧烷之比率並無特別限定,較佳為70~100重量%,更佳為75~98重量%,進而較佳為80~95重量%。藉由將本發明之聚有機矽倍半氧烷之含量設為70重量%以上,有硬化物之表面硬度或接著性進一步提昇之傾向。The ratio of the polyorganosilsesquioxane of the present invention relative to the total amount of the cationic curing compound or radical curing compound (100 weight%) in the curable composition of the present invention is not particularly limited, but is preferably 70-100 weight%, more preferably 75-98 weight%, and even more preferably 80-95 weight%. By setting the polyorganosilsesquioxane content of the present invention to 70 weight% or greater, the surface hardness and adhesion of the cured product tend to be further improved.

本發明之硬化性組成物較佳為進而含有硬化觸媒。其中,基於能夠進一步縮短直至不黏著為止之硬化時間之方面,較佳為含有光或熱聚合起始劑作為硬化觸媒,更佳為含有陽離子聚合起始劑或自由基聚合起始劑。再者,本發明之硬化性組成物中,硬化觸媒既可單獨使用1種,亦可組合2種以上使用。The curable composition of the present invention preferably further contains a curing catalyst. In order to further shorten the curing time until the material becomes non-sticky, it is preferred to include a photo- or thermal-polymerization initiator as the curing catalyst, and more preferably, a cationic polymerization initiator or a free-radical polymerization initiator. Furthermore, the curable composition of the present invention may contain a single curing catalyst or a combination of two or more.

上述陽離子聚合起始劑為能夠使本發明之聚有機矽倍半氧烷等陽離子硬化性化合物之陽離子聚合反應開始或促進之化合物。上述陽離子聚合起始劑並無特別限定,例如可列舉光陽離子聚合起始劑(光酸產生劑)、熱陽離子聚合起始劑(熱酸產生劑)等。The cationic polymerization initiator is a compound capable of initiating or accelerating the cationic polymerization reaction of the cationic-curable compound, such as the polyorganosilsesquioxane, of the present invention. The cationic polymerization initiator is not particularly limited, and examples thereof include photo-catalytic polymerization initiators (photoacid generators) and thermal cationic polymerization initiators (thermal acid generators).

作為上述光陽離子聚合起始劑,可使用公知或慣用之光陽離子聚合起始劑,例如可列舉:鋶鹽(鋶離子與陰離子之鹽)、錪鹽(錪離子與陰離子之鹽)、硒鹽(硒離子與陰離子之鹽)、銨鹽(銨離子與陰離子之鹽)、鏻鹽(鏻離子與陰離子之鹽)、過渡金屬錯合物離子與陰離子之鹽等。該等可單獨使用或組合2種以上使用。As the photocatalytic polymerization initiator, known or commonly used photocatalytic polymerization initiators can be used, such as coronium salts (salts of coronium ions and anions), iodonium salts (salts of iodonium ions and anions), selenium salts (salts of selenium ions and anions), ammonium salts (salts of ammonium ions and anions), phosphonium salts (salts of phosphonium ions and anions), and salts of transition metal complex ions and anions. These salts can be used alone or in combination of two or more.

作為上述鋶鹽,例如可列舉:[4-(4-聯苯基硫基)苯基]-4-聯苯基苯基鋶三(五氟乙基)三氟磷酸鹽、三苯基鋶鹽、三對甲苯鋶鹽、三鄰甲苯鋶鹽、三(4-甲氧基苯基)鋶鹽、1-萘基二苯基鋶鹽、2-萘基二苯基鋶鹽、三(4-氟苯基)鋶鹽、三-1-萘基鋶鹽、三-2-萘基鋶鹽、三(4-羥基苯基)鋶鹽、二苯基[4-(苯硫基)苯基]鋶鹽、4-(對甲苯硫基)苯基二(對苯基)鋶鹽等三芳基鋶鹽;二苯基苯甲醯甲基鋶鹽、二苯基4-硝基苯甲醯甲基鋶鹽、二苯基苄基鋶鹽、二苯基甲基鋶鹽等二芳基鋶鹽;苯基甲基苄基鋶鹽、4-羥基苯基甲基苄基鋶鹽、4-甲氧基苯基甲基苄基鋶鹽等單芳基鋶鹽;二甲基苯甲醯甲基鋶鹽、苯甲醯甲基四氫噻吩鎓鹽(phenacyl tetrahydro thiophenium salt)、二甲基苄基鋶鹽等三烷基鋶鹽等。Examples of the coronium salt include [4-(4-biphenylthio)phenyl]-4-biphenylphenyl coronium tris(pentafluoroethyl)trifluorophosphate, triphenyl coronium salt, tri-p-toluene coronium salt, tri-o-toluene coronium salt, tris(4-methoxyphenyl) coronium salt, 1-naphthyldiphenyl coronium salt, 2-naphthyldiphenyl coronium salt, tris(4-fluorophenyl) coronium salt, tris-1-naphthyl coronium salt, tris-2-naphthyl coronium salt, tris(4-hydroxyphenyl) coronium salt, diphenyl[4-(phenylthio) [0014] triaryl stearyl salts such as [(4-(p-tolylthio)phenyl) stearyl salt, 4-(p-phenylthio)phenyl di(p-phenyl) stearyl salt; diaryl stearyl salts such as diphenylbenzylmethyl stearyl salt, diphenyl 4-nitrobenzylmethyl stearyl salt, diphenylbenzyl stearyl salt, diphenylmethyl stearyl salt; monoaryl stearyl salts such as phenylmethylbenzyl stearyl salt, 4-hydroxyphenylmethylbenzyl stearyl salt, 4-methoxyphenylmethylbenzyl stearyl salt; trialkyl stearyl salts such as dimethylbenzylmethyl stearyl salt, phenacyl tetrahydro thiophenium salt, dimethylbenzyl stearyl salt, etc.

作為上述二苯基[4-(苯硫基)苯基]鋶鹽,例如可使用二苯基[4-(苯硫基)苯基]鋶六氟銻酸鹽、二苯基[4-(苯硫基)苯基]鋶六氟磷酸鹽等。Examples of the diphenyl[4-(phenylthio)phenyl]copperium salt include diphenyl[4-(phenylthio)phenyl]copperium hexafluoroantimonate and diphenyl[4-(phenylthio)phenyl]copperium hexafluorophosphate.

作為上述錪鹽,例如可列舉:商品名「UV9380C」(邁圖高新材料日本有限公司製造,雙(4-十二烷基苯基)錪=六氟銻酸鹽45%烷基環氧丙基醚溶液)、商品名「RHODORSIL PHOTOINITIATOR 2074」(Rhodia Japan(股)製造,四(五氟苯基)硼酸鹽=[(1-甲基乙基)苯基](甲基苯基)錪)、商品名「WPI-124」(和光純藥工業(股)公司製造)、二苯基錪鹽、二對甲苯錪鹽、雙(4-十二烷基苯基)錪鹽、雙(4-甲氧基苯基)錪鹽等。Examples of the iodine salts include: "UV9380C" (manufactured by Maitu Advanced Materials Japan Co., Ltd., bis(4-dodecylphenyl)iodine = 45% alkyl epoxypropyl ether solution of hexafluoroantimony), "RHODORSIL PHOTOINITIATOR 2074" (manufactured by Rhodia Japan Co., Ltd., tetrakis(pentafluorophenyl)borate = [(1-methylethyl)phenyl](methylphenyl)iodine), "WPI-124" (manufactured by Wako Junyaku Industries Co., Ltd.), diphenyliodine, di-p-tolueneiodine, bis(4-dodecylphenyl)iodine, and bis(4-methoxyphenyl)iodine.

作為上述硒鹽,例如可列舉:三苯基硒鹽、三對甲苯硒鹽、三鄰甲苯硒鹽、三(4-甲氧基苯基)硒鹽、1-萘基二苯基硒鹽等三芳基硒鹽;二苯基苯甲醯甲基硒鹽、二苯基苄基硒鹽、二苯基甲基硒鹽等二芳基硒鹽;苯基甲基苄基硒鹽等單芳基硒鹽;二甲基苯甲醯甲基硒鹽等三烷基硒鹽等。Examples of the selenium salts include triaryl selenium salts such as triphenylselenium salt, tri-p-toluene selenium salt, tri-o-toluene selenium salt, tri(4-methoxyphenyl)selenium salt, and 1-naphthyldiphenylselenium salt; diaryl selenium salts such as diphenylbenzylmethylselenium salt, diphenylbenzylselenium salt, and diphenylmethylselenium salt; monoaryl selenium salts such as phenylmethylbenzylselenium salt; and trialkyl selenium salts such as dimethylbenzylmethylselenium salt.

作為上述銨鹽,例如可列舉:四甲基銨鹽、乙基三甲基銨鹽、二乙基二甲基銨鹽、三乙基甲基銨鹽、四乙基銨鹽、三甲基正丙基銨鹽、三甲基正丁基銨鹽等四烷基銨鹽;N,N-二甲基吡咯啶鎓鹽、N-乙基-N-甲基吡咯啶鎓鹽等吡咯啶鎓鹽(pyrrolidinium salt);N,N'-二甲基咪唑啉鎓鹽、N,N'-二乙基咪唑啉鎓鹽等咪唑啉鎓鹽(imidazolinium salt);N,N'-二甲基四氫嘧啶鎓鹽、N,N'-二乙基四氫嘧啶鎓鹽等四氫嘧啶鎓鹽(tetrahydro pyrimidinium salt);N,N-二甲基啉鎓鹽、N,N-二乙基啉鎓鹽等啉鎓鹽(morpholinium salt);N,N-二甲基哌啶鎓鹽、N,N-二乙基哌啶鎓鹽等哌啶鎓鹽(piperidinium salt);N-甲基吡啶鎓鹽、N-乙基吡啶鎓鹽等吡啶鎓鹽(pyridinium salt);N,N'-二甲基咪唑鎓鹽等咪唑鎓鹽(imidazolium salt);N-甲基喹啉鎓鹽等喹啉鎓鹽(quinolium salt);N-甲基異喹啉鎓鹽等異喹啉鎓鹽;苄基苯并噻唑鎓鹽等噻唑鎓鹽(thiazonium salt);苄基吖啶鎓鹽等吖啶鎓鹽(acridinium)等。Examples of the ammonium salt include tetraalkylammonium salts such as tetramethylammonium salt, ethyltrimethylammonium salt, diethyldimethylammonium salt, triethylmethylammonium salt, tetraethylammonium salt, trimethyl-n-propylammonium salt, and trimethyl-n-butylammonium salt; pyrrolidinium salts such as N,N-dimethylpyrrolidinium salt and N-ethyl-N-methylpyrrolidinium salt; imidazolinium salts such as N,N'-dimethylimidazolinium salt and N,N'-diethylimidazolinium salt; tetrahydropyrimidinium salt); N,N'-dimethyl tetrahydropyrimidinium salt, N,N'-diethyl tetrahydropyrimidinium salt, etc. tetrahydropyrimidinium salt; N,N-dimethyl Phonium salt, N,N-diethyl Phonium salts, etc. Morpholinium salt; piperidinium salts such as N,N-dimethylpiperidinium salt and N,N-diethylpiperidinium salt; pyridinium salts such as N-methylpyridinium salt and N-ethylpyridinium salt; imidazolium salts such as N,N'-dimethylimidazolium salt; quinolium salts such as N-methylquinolinium salt; isoquinolinium salts such as N-methylisoquinolinium salt; thiazolium salts such as benzylbenzothiazolium salt; acridinium salts such as benzylacridinium salt, etc.

作為上述鏻鹽,例如可列舉:四苯基鏻鹽、四對甲苯鏻鹽、四(2-甲氧基苯基)鏻鹽等四芳基鏻鹽;三苯基苄基鏻鹽等三芳基鏻鹽;三乙基苄鏻鹽、三丁基苄鏻鹽、四乙基鏻鹽、四丁基鏻鹽、三乙基苯甲醯甲基鏻鹽等四烷基鏻鹽等。Examples of the phosphonium salt include tetraarylphosphonium salts such as tetraphenylphosphonium salt, tetra-p-toluenephosphonium salt, and tetrakis(2-methoxyphenyl)phosphonium salt; triarylphosphonium salts such as triphenylbenzylphosphonium salt; and tetraalkylphosphonium salts such as triethylbenzylphosphonium salt, tributylbenzylphosphonium salt, tetraethylphosphonium salt, tetrabutylphosphonium salt, and triethylbenzylmethylphosphonium salt.

作為上述過渡金屬錯合物離子之鹽,例如可列舉:(η5-環戊二烯基)(η6-甲苯)Cr +、(η5-環戊二烯基)(η6-二甲苯)Cr +等鉻錯合物陽離子之鹽;(η5-環戊二烯基)(η6-甲苯)Fe +、(η5-環戊二烯基)(η6-二甲苯)Fe +等鐵錯合物陽離子之鹽等。 Examples of the salts of the transition metal complex ions include salts of chromium complex cations such as (η5-cyclopentadienyl)(η6-toluene)Cr + and (η5-cyclopentadienyl)(η6-xylene)Cr + ; and salts of iron complex cations such as (η5-cyclopentadienyl)(η6-toluene)Fe + and (η5-cyclopentadienyl)(η6-xylene)Fe + .

作為構成上述鹽之陰離子,例如可列舉:SbF 6 -、PF 6 -、BF 4 -、(CF 3CF 2) 3PF 3 -、(CF 3CF 2CF 2) 3PF 3 -、(C 6F 5) 4B -、(C 6F 5) 4Ga -、磺酸根陰離子(三氟甲磺酸根陰離子、五氟乙磺酸根陰離子、九氟丁磺酸根陰離子、甲磺酸根陰離子、苯磺酸根陰離子、對甲苯磺酸根陰離子等)、(CF 3SO 2) 3C -、(CF 3SO 2) 2N -、過鹵酸根離子、鹵化磺酸根離子、硫酸根離子、碳酸根離子、鋁酸根離子、六氟鉍酸根離子、羧酸根離子、芳基硼酸根離子、硫氰酸根離子、硝酸根離子等。 Examples of anions constituting the above - mentioned salts include SbF6- , PF6- , BF4- , ( CF3CF2 ) 3PF3- , ( CF3CF2CF2 ) 3PF3- , ( C6F5 ) 4B- , ( C6F5 ) 4Ga- , sulfonate anions (trifluoromethanesulfonate anion, pentafluoroethanesulfonate anion, nonafluorobutanesulfonate anion, methanesulfonate anion, benzenesulfonate anion, p - toluenesulfonate anion , etc. ) , ( CF3SO2 ) 3C- , ( CF3SO2 ) 2N- , perhalide ions, halogenated sulfonate ions, sulfate ions, carbonate ions, aluminate ions, hexafluorobismuth ions, carboxylate ions, aryl borate ions, thiocyanate ions, nitrate ions, etc.

作為上述熱陽離子聚合起始劑,例如可列舉:芳基鋶鹽、芳基錪鹽、芳烴-離子錯合物、四級銨鹽、鋁螯合物、三氟化硼胺錯合物等。Examples of the thermal cationic polymerization initiator include aryl stibnium salts, aryl iodonium salts, aromatic hydrocarbon-ion complexes, quaternary ammonium salts, aluminum chelates, and boron trifluoride-amine complexes.

作為上述芳基鋶鹽,例如可列舉六氟銻酸鹽等。於本發明之硬化性組成物中,例如可使用:商品名「SP-66」、「SP-77」(以上由ADEKA(股)製造);商品名「San-Aid SI-60L」、「San-Aid SI-80L」、「San-Aid SI-100L」、「San-Aid SI-150L」(以上由三新化學工業(股)公司製造)等市售品。作為上述鋁螯合物,例如可列舉:乙醯乙酸乙基鋁二異丙酯、三(乙醯乙酸乙酯)合鋁(Tris(ethyl acetoacetato)aluminum)等。又,作為上述三氟化硼胺錯合物,例如可列舉:三氟化硼單乙基胺錯合物、三氟化硼咪唑錯合物、三氟化硼哌啶錯合物等。Examples of the aforementioned aryl antimony salts include hexafluoroantimony salts. Commercially available products such as "SP-66" and "SP-77" (produced by ADEKA Co., Ltd.) and "San-Aid SI-60L," "San-Aid SI-80L," "San-Aid SI-100L," and "San-Aid SI-150L" (produced by Sanshin Chemical Industries Co., Ltd.) can be used in the curable composition of the present invention. Examples of the aforementioned aluminum chelates include ethylaluminum diisopropyl acetoacetate and tris(ethyl acetoacetate)aluminum. Examples of the boron trifluoride amine complex include boron trifluoride monoethylamine complex, boron trifluoride imidazole complex, and boron trifluoride piperidine complex.

上述自由基聚合起始劑為能夠使本發明之聚有機矽倍半氧烷等之自由基硬化性化合物之自由基聚合反應開始或促進之化合物。作為上述自由基聚合起始劑,例如可列舉光自由基聚合起始劑、熱自由基聚合起始劑等。The free radical polymerization initiator is a compound capable of initiating or accelerating the free radical polymerization reaction of the radical curable compound, such as the polyorganosilsesquioxane, of the present invention. Examples of the free radical polymerization initiator include photo-radical polymerization initiators and thermal-radical polymerization initiators.

作為上述光自由基聚合起始劑,例如可列舉:二苯甲酮、苯乙酮二苯乙二酮、二苯乙二酮二甲基酮、安息香、安息香甲醚、安息香乙醚、安息香異丙醚、二甲氧基苯乙酮、二甲氧基苯基苯乙酮、二乙氧基苯乙酮、二苯基二硫醚、鄰苯甲醯苯甲酸甲酯、4-二甲基胺基苯甲酸乙酯(日本化藥(股)製造,商品名「kayacure EPA」等)、2,4-二乙基-9-氧硫𠮿(日本化藥(股)製造,商品名「kayacure DETX」等)、2-甲基-1-[4-(甲基)苯基]-2-啉基丙酮-1(Ciba-Geigy(股)製造,商品名「Irgacure 907」等)、1-羥基環己基苯基酮(Ciba-Geigy(股)製造,商品名「Irgacure 184」等)、2-二甲基胺基-2-(4-啉基)苯甲醯基-1-苯基丙烷等之2-胺基-2-苯甲醯基-1-苯基烷烴化合物、四(第三丁基過氧基羰基)二苯甲酮、二苯乙二酮、2-羥基-2-甲基-1-苯基-丙烷-1-酮、4,4-雙二乙基胺基二苯甲酮等胺基苯衍生物、2,2'-雙(2-氯苯基)-4,5,4',5'-四苯基-1,2'-聯咪唑(保土谷化學(股)製造,商品名「B-CIM」等)等咪唑化合物、2,6-雙(三氯甲基)-4-(4-甲氧基萘-1-基)-1,3,5-三等鹵甲基化三化合物、2-三氯甲基-5-(2-苯并呋喃-2-基-乙烯基)-1,3,4-二唑等鹵甲基二唑化合物等。又,視需要可添加光敏劑。Examples of the photoradical polymerization initiator include benzophenone, acetophenone dibenzoyldione, dibenzoyldione dimethyl ketone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, dimethoxyacetophenone, dimethoxyphenylacetophenone, diethoxyacetophenone, diphenyl disulfide, methyl o-benzoylbenzoate, ethyl 4-dimethylaminobenzoate (produced by Nippon Kayaku Co., Ltd., trade name "Kayacure EPA"), 2,4-diethyl-9-sulfuronium, (Nippon Kayaku Co., Ltd., trade name "kayacure DETX", etc.), 2-methyl-1-[4-(methyl)phenyl]-2- Linoacetone-1 (manufactured by Ciba-Geigy Co., Ltd., trade name "Irgacure 907", etc.), 1-hydroxycyclohexylphenyl ketone (manufactured by Ciba-Geigy Co., Ltd., trade name "Irgacure 184", etc.), 2-dimethylamino-2-(4- 2-amino-2-benzyl-1-phenylalkane compounds such as 1-phenyl-2-oxo-1-phenylpropane, tetra(tert-butylperoxycarbonyl)benzophenone, diphenylethylenedione, 2-hydroxy-2-methyl-1-phenyl-propane-1-one, aminobenzene derivatives such as 4,4-bisdiethylaminobenzophenone, imidazole compounds such as 2,2'-bis(2-chlorophenyl)-4,5,4',5'-tetraphenyl-1,2'-biimidazole (produced by Hodogaya Chemical Co., Ltd., trade name "B-CIM"), 2,6-bis(trichloromethyl)-4-(4-methoxynaphthalen-1-yl)-1,3,5-triazol-1-one, Isohalogenated trimethylol Compound, 2-trichloromethyl-5-(2-benzofuran-2-yl-vinyl)-1,3,4- oxadiazole and other halogenated methyl A photosensitizer may be added as needed.

作為熱自由基聚合起始劑,例如可列舉:氫過氧化物、二烷基過氧化物、過氧酯、二醯基過氧化物、過氧化二碳酸酯、過氧縮酮、酮過氧化物等(具體而言,為苯甲醯基過氧化物、過氧化(-2-乙基己酸)第三丁酯、2,5-二甲基-2,5-二(2-乙基己醯基)過氧己烷、過氧化苯甲酸第三丁酯、第三丁基過氧化物、異丙苯氫過氧化物、雙異苯丙基過氧化物、二第三丁基過氧化物、2,5-二甲基-2,5-二丁基過氧己烷、2,4-二氯苯甲醯基過氧化物、1,4-二(2-第三丁基過氧基異丙基)苯、1,1-雙(第三丁基過氧基)-3,3,5-三甲基環己烷、甲基乙基酮過氧化物、過氧化(2-乙基己酸)-1,1,3,3-四甲基丁酯等)等有機過氧化物類。Examples of thermal radical polymerization initiators include hydroperoxides, dialkyl peroxides, peroxyesters, diacyl peroxides, peroxydicarbonates, peroxyketals, and ketone peroxides (specifically, benzoyl peroxide, tert-butyl peroxy(2-ethylhexanoate), 2,5-dimethyl-2,5-di(2-ethylhexanoyl)peroxyhexane, tert-butyl peroxybenzoate, tert-butyl peroxide, and isopropylbenzene hydroperoxide). , diisophenylpropyl peroxide, di-tert-butyl peroxide, 2,5-dimethyl-2,5-dibutylperoxyhexane, 2,4-dichlorobenzyl peroxide, 1,4-bis(2-tert-butylperoxyisopropyl)benzene, 1,1-bis(tert-butylperoxy)-3,3,5-trimethylcyclohexane, methyl ethyl ketone peroxide, 1,1,3,3-tetramethylbutyl peroxy(2-ethylhexanoate), etc.) and other organic peroxides.

關於本發明之硬化性組成物中之上述硬化觸媒之含量(摻合量),相對於本發明之聚有機矽倍半氧烷及下述其他陽離子硬化性化合物之總量100重量份,較佳為0.01~3.0重量份,更佳為0.05~3.0重量份,進而較佳為0.1~1.0重量份(例如為0.3~1.0重量份)。藉由將硬化觸媒之含量設為0.01重量份以上,可使硬化反應有效率且充分地進行,有硬化物之表面硬度或接著性進一步提昇之傾向。另一方面,藉由將硬化觸媒之含量設為3.0重量份以下,有硬化性組成物之保存性進一步提昇,或抑制硬化物之著色之傾向。The content (incorporation amount) of the curing catalyst in the curable composition of the present invention is preferably 0.01 to 3.0 parts by weight, more preferably 0.05 to 3.0 parts by weight, and even more preferably 0.1 to 1.0 parts by weight (e.g., 0.3 to 1.0 parts by weight), relative to 100 parts by weight of the total amount of the polyorganosilsesquioxane and other cationic curable compounds described below. By setting the curing catalyst content to 0.01 parts by weight or greater, the curing reaction proceeds efficiently and fully, tending to further improve the surface hardness and adhesion of the cured product. On the other hand, by setting the curing catalyst content to 3.0 parts by weight or less, the shelf life of the curable composition is further improved, or discoloration of the cured product is tended to be suppressed.

本發明之硬化性組成物亦可進而含有本發明之聚有機矽倍半氧烷以外之陽離子硬化性化合物(有時稱為「其他陽離子硬化性化合物」)及/或本發明之聚有機矽倍半氧烷以外之自由基硬化性化合物(有時稱為「其他自由基硬化性化合物」)。作為其他陽離子硬化性化合物,可使用公知或慣用之陽離子硬化性化合物,可列舉:本發明之聚有機矽倍半氧烷以外之環氧化合物、氧環丁烷化合物、乙烯醚化合物等。再者,於本發明之硬化性組成物中,其他陽離子硬化性化合物既可單獨使用1種,亦可組合2種以上。The curable composition of the present invention may further contain a cationic-curing compound other than the polyorganosilsesquioxane of the present invention (sometimes referred to as "other cationic-curing compound") and/or a radical-curing compound other than the polyorganosilsesquioxane of the present invention (sometimes referred to as "other radical-curing compound"). Other cationic-curing compounds can be used, including known or commonly used cationic-curing compounds other than the polyorganosilsesquioxane of the present invention, such as epoxy compounds, cyclobutane compounds, and vinyl ether compounds. Furthermore, in the curable composition of the present invention, the other cationic-curing compound may be used alone or in combination of two or more.

作為上述環氧化合物,可使用分子內具有1個以上之環氧基(環氧乙烷環)之公知或慣用之化合物,並無特別限定,例如可列舉脂環式環氧化合物(脂環式環氧樹脂)、芳香族環氧化合物(芳香族環氧樹脂)、脂肪族環氧化合物(脂肪族環氧樹脂)等。As the epoxy compound, any known or commonly used compound having one or more epoxy groups (ethylene oxide rings) in the molecule can be used without particular limitation. Examples thereof include aliphatic epoxy compounds (aliphatic epoxy resins), aromatic epoxy compounds (aromatic epoxy resins), and aliphatic epoxy compounds (aliphatic epoxy resins).

作為上述脂環式環氧化合物,可列舉分子內具有1個以上脂環與1個以上環氧基之公知或慣用之化合物,並無特別限定,例如可列舉:(1)分子內具有構成脂環之鄰接之2個碳原子與氧原子所構成之環氧基(稱為「脂環環氧基」)之化合物;(2)脂環上以單鍵直接鍵結有環氧基之化合物;(3)分子內具有脂環及環氧丙基醚基之化合物(環氧丙基醚型環氧化合物)等。As the above-mentioned alicyclic epoxy compounds, there can be cited known or commonly used compounds having one or more alicyclic rings and one or more epoxy groups in the molecule, without particular limitation. For example, there can be cited: (1) compounds having an epoxy group (referred to as "alicyclic epoxy group") formed by two adjacent carbon atoms and an oxygen atom constituting the alicyclic ring in the molecule; (2) compounds having an epoxy group directly bonded to the alicyclic ring via a single bond; (3) compounds having an alicyclic ring and an epoxypropyl ether group in the molecule (epoxypropyl ether type epoxy compound), etc.

作為上述(1)分子內具有脂環環氧基之化合物,可列舉下述式(i)所表示之化合物。 Examples of the compound having an alicyclic oxy group in the molecule of the above-mentioned (1) include the compound represented by the following formula (i).

上述式(i)中,Y表示單鍵或連結基(具有1個以上之原子之二價基)。作為上述連結基,例如可列舉:二價烴基、碳-碳雙鍵之一部分或全部經環氧化之伸烯基(alkenylene group)、羰基、醚鍵、酯鍵、碳酸酯基、醯胺基、該等連結複數個而成之基等。In formula (i), Y represents a single bond or a linking group (a divalent group having one or more atoms). Examples of the linking group include a divalent hydrocarbon group, an alkenylene group in which a portion or all of a carbon-carbon double bond is epoxidized, a carbonyl group, an ether bond, an ester bond, a carbonate group, an amide group, and groups formed by linking multiples of these groups.

作為上述二價烴基,可列舉碳數1~18之直鏈或支鏈狀之伸烷基、二價之脂環式烴基等。作為碳數1~18之直鏈或支鏈狀之伸烷基,例如可列舉:亞甲基、甲基亞甲基、二甲基亞甲基、伸乙基、伸丙基、三亞甲基等。作為上述二價之脂環式烴基,例如可列舉:1,2-伸環戊基、1,3-伸環戊基、亞環戊基、1,2-伸環己基、1,3-伸環己基、1,4-伸環己基、亞環己基等二價之伸環烷基(包括亞環烷基)等。Examples of the aforementioned divalent alkyl groups include linear or branched alkylene groups having 1 to 18 carbon atoms and divalent alicyclic alkyl groups. Examples of linear or branched alkylene groups having 1 to 18 carbon atoms include methylene, methylmethylene, dimethylmethylene, ethylene, propylene, and trimethylene. Examples of the aforementioned divalent alicyclic alkyl groups include divalent cycloalkylene groups (including cycloalkylene groups) such as 1,2-cyclopentylene, 1,3-cyclopentylene, cyclopentylene, 1,2-cyclohexylene, 1,3-cyclohexylene, 1,4-cyclohexylene, and cyclohexylene.

作為上述碳-碳雙鍵之一部分或全部經環氧化之伸烯基(有時稱為「環氧化伸烯基」)中之伸烯基,例如可列舉:伸乙烯基、伸丙烯基、1-伸丁烯基、2-伸丁烯基、伸丁二烯基、伸戊烯基、伸己烯基、伸庚烯基、伸辛烯基等碳數2~8之直鏈或支鏈狀之伸烯基等。作為上述環氧化伸烯基,較佳為碳-碳雙鍵全部經環氧化之伸烯基,更佳為碳-碳雙鍵全部經環氧化之碳數2~4之伸烯基。Examples of the alkenylene group in the aforementioned alkenylene group in which a portion or all of the carbon-carbon double bonds are epoxidized (sometimes referred to as an "epoxidized alkenylene group") include straight-chain or branched alkenylene groups having 2 to 8 carbon atoms, such as ethenylene, propenylene, 1-butenylene, 2-butenylene, butadienylene, pentenylene, hexenylene, heptenylene, and octenylene. The epoxidized alkenylene group is preferably an alkenylene group in which all of the carbon-carbon double bonds are epoxidized, and more preferably an alkenylene group having 2 to 4 carbon atoms in which all of the carbon-carbon double bonds are epoxidized.

作為上述式(i)所表示之脂環式環氧化合物之代表例,可列舉(3,4,3',4'-二環氧基)聯環己烷、下述式(i-1)~(i-10)所表示之化合物等。再者,下述式(i-5)、(i-7)中之l、m分別表示1~30之整數。下述式(i-5)中,R'為碳數1~8之伸烷基,其中,較佳為亞甲基、伸乙基、伸丙基、伸異丙基等碳數1~3之直鏈或支鏈狀之伸烷基。下述式(i-9)、(i-10)中之n1~n6分別表示1~30之整數。又,作為上述式(i)所表示之脂環式環氧化合物,此外還可列舉例如2,2-雙(3,4-環氧環己基)丙烷、1,2-雙(3,4-環氧環己基)乙烷、2,3-雙(3,4-環氧環己基)環氧乙烷、雙(3,4-環氧環己基甲基)醚等。 Representative examples of alicyclic epoxy compounds represented by formula (i) include (3,4,3',4'-bicyclooxy)bicyclohexane and compounds represented by formulas (i-1) to (i-10) below. Furthermore, in formulas (i-5) and (i-7) below, l and m each represent an integer from 1 to 30. In formula (i-5) below, R' represents an alkylene group having 1 to 8 carbon atoms, preferably a linear or branched alkylene group having 1 to 3 carbon atoms, such as a methylene group, an ethylene group, a propylene group, or an isopropylene group. In formulas (i-9) and (i-10) below, n1 to n6 each represent an integer from 1 to 30. Examples of the aliphatic epoxy compound represented by the above formula (i) include 2,2-bis(3,4-epoxyepoxyhexyl)propane, 1,2-bis(3,4-epoxyepoxyhexyl)ethane, 2,3-bis(3,4-epoxyepoxyhexyl)ethylene oxide, and bis(3,4-epoxyepoxyhexyl methyl)ether.

作為上述(2)脂環上以單鍵直接鍵結有環氧基之化合物,例如可列舉下述式(ii)所表示之化合物等。 Examples of the compound (2) in which an epoxide group is directly bonded to the aliphatic ring via a single bond include the compound represented by the following formula (ii).

式(ii)中,R''為自p元醇之結構式去除p個羥基(-OH)而得之基(p價之有機基),p、n分別表示自然數。作為p元醇[R''(OH) p],可列舉2,2-雙(羥基甲基)-1-丁醇等多元醇(碳數1~15之醇等)等。p較佳為1~6,n較佳為1~30。於p為2以上時,各()內(外側之括弧內)之基中之n可相同亦可不同。作為上述式(ii)所表示之化合物,具體可列舉:2,2-雙(羥基甲基)-1-丁醇之1,2-環氧基-4-(2-環氧乙烷基)環己烷加成物[例如商品名「EHPE3150」(Daicel(股)製造)等]等。 In formula (ii), R'' is a group (a p-valent organic group) obtained by removing p hydroxyl groups (-OH) from the structural formula of a p-valent alcohol, and p and n each represent a natural number. Examples of the p-valent alcohol [R''(OH) p ] include polyols (such as alcohols having 1 to 15 carbon atoms) such as 2,2-bis(hydroxymethyl)-1-butanol. p is preferably 1 to 6, and n is preferably 1 to 30. When p is 2 or greater, n in each group within (inside the parentheses) may be the same or different. Specific examples of the compound represented by the above formula (ii) include 1,2-epoxy-4-(2-epoxyethylene)cyclohexane adducts of 2,2-bis(hydroxymethyl)-1-butanol [e.g., trade name "EHPE3150" (manufactured by Daicel Co., Ltd.)].

作為上述之(3)分子內具有脂環及環氧丙基醚基之化合物,例如可列舉脂環式醇(例如脂環式多元醇)之環氧丙基醚。更詳細而言,例如可列舉:將2,2-雙[4-(2,3-環氧丙氧基)環己基]丙烷、2,2-雙[3,5-二甲基-4-(2,3-環氧丙氧基)環己基]丙烷等雙酚A型環氧化合物氫化而得之化合物(氫化雙酚A型環氧化合物);將雙[鄰,鄰-(2,3-環氧丙氧基)環己基]甲烷、雙[鄰,對-(2,3-環氧丙氧基)環己基]甲烷、雙[對,對-(2,3-環氧丙氧基)環己基]甲烷、雙[3,5-二甲基-4-(2,3-環氧丙氧基)環己基]甲烷等雙酚F型環氧化合物氫化而得之化合物(氫化雙酚F型環氧化合物);氫化聯苯酚型環氧化合物;氫化苯酚酚醛清漆型環氧化合物;氫化甲酚酚醛清漆型環氧化合物;雙酚A之氫化甲酚酚醛清漆型環氧化合物;氫化萘型環氧化合物;由三苯酚甲烷獲得之環氧化合物之氫化環氧化合物;下述芳香族環氧化合物之氫化環氧化合物等。Examples of the compound having alicyclic and glycidyl ether groups in the molecule of (3) above include glycidyl ethers of alicyclic alcohols (e.g. alicyclic polyols). More specifically, for example, compounds obtained by hydrogenating bisphenol A type epoxides such as 2,2-bis[4-(2,3-epoxypropoxy)cyclohexyl]propane and 2,2-bis[3,5-dimethyl-4-(2,3-epoxypropoxy)cyclohexyl]propane (hydrogenated bisphenol A type epoxides); compounds obtained by hydrogenating bis[o,o-(2,3-epoxypropoxy)cyclohexyl]methane, bis[o,p-(2,3-epoxypropoxy)cyclohexyl]methane, bis[p,p-(2,3-epoxypropoxy)cyclohexyl]methane Compounds obtained by hydrogenating bisphenol F-type epoxides such as bis[3,5-dimethyl-4-(2,3-epoxypropoxy)epoxyhexyl]methane (hydrogenated bisphenol F-type epoxides); hydrogenated diphenol-type epoxides; hydrogenated phenol novolac-type epoxides; hydrogenated cresol novolac-type epoxides; hydrogenated cresol novolac-type epoxides of bisphenol A; hydrogenated naphthalene-type epoxides; hydrogenated epoxides of epoxides obtained from trisphenol methane; hydrogenated epoxides of the following aromatic epoxides, etc.

作為上述芳香族環氧化合物,例如可列舉:由雙酚類與表鹵醇之縮合反應獲得之表雙型(epi-bis-type)環氧丙基醚型環氧樹脂;藉由使該等表雙型環氧丙基醚型環氧樹脂與上述雙酚類進一步加成反應而獲得之高分子量表雙型環氧丙基醚型環氧樹脂;藉由使酚類與醛進行縮合反應而獲得多元醇類,使該多元醇類進而與表鹵醇進行縮合反應而獲得之酚醛清漆-烷基型環氧丙基醚型環氧樹脂;於茀環之9位上鍵結有2個苯酚骨架且在自該等苯酚骨架之羥基去除氫原子後之氧原子上分別直接鍵結或經由伸烷氧基鍵結有環氧丙基之環氧化合物等。Examples of the aromatic epoxy compounds include: epi-bis-type epoxy resins obtained by the condensation reaction of diphenols and epihalogen alcohols; high molecular weight epi-bis-type epoxy resins obtained by further addition reaction of these epi-bis-type epoxy resins with the above-mentioned diphenols; and high molecular weight epi-bis-type epoxy resins obtained by further addition reaction of phenols with bisphenols. Novolac-alkyl type epoxy resins obtained by condensing aldehydes to obtain polyols, which are then condensed with epihalogen alcohols to obtain epoxy resins; epoxy compounds having two phenol skeletons bonded to the 9-position of the phenol ring and epoxypropyl groups bonded directly or via an alkoxy group to the oxygen atoms after removing the hydrogen atoms from the hydroxyl groups of the phenol skeletons.

作為上述脂肪族環氧化合物,例如可列舉:q元之不具有環狀結構之醇(q為自然數)之環氧丙基醚;一元或多元羧酸之環氧丙酯;環氧化亞麻仁油、環氧化大豆油、環氧化蓖麻油等具有雙鍵之油脂之環氧化物;環氧化聚丁二烯等聚烯烴(包含聚二烯烴)之環氧化物等。Examples of the aforementioned aliphatic epoxy compounds include: epoxypropyl ethers of q-membered alcohols (q is a natural number) that do not have a cyclic structure; epoxypropyl esters of mono- or polycarboxylic acids; epoxides of oils and fats having double bonds, such as epoxidized linseed oil, epoxidized soybean oil, and epoxidized castor oil; and epoxides of polyolefins (including polydienes) such as epoxidized polybutadiene.

作為上述氧雜環丁烷化合物,可列舉分子內具有1個以上之氧環丁烷環之公知或慣用之化合物。作為上述乙烯醚化合物,可列舉分子內具有1個以上之乙烯醚基之公知或慣用之化合物。Examples of the aforementioned cyclohexane compounds include known or commonly used compounds having one or more cyclohexane rings in the molecule. Examples of the aforementioned vinyl ether compounds include known or commonly used compounds having one or more vinyl ether groups in the molecule.

作為其他自由基硬化性化合物,可使用公知或慣用之自由基硬化性化合物,並無特別限定,例如可列舉本發明之聚有機矽倍半氧烷以外之(甲基)丙烯酸化合物。作為上述(甲基)丙烯酸化合物,可列舉分子內具有1個以上之(甲基)丙烯酸基之公知或慣用之化合物。As other radical-curing compounds, known or commonly used radical-curing compounds can be used without particular limitation. Examples include (meth)acrylic compounds other than the polyorganosilsesquioxane of the present invention. Examples of such (meth)acrylic compounds include known or commonly used compounds having one or more (meth)acrylic groups in the molecule.

本發明之硬化性組成物中之其他陽離子硬化性化合物及/或其他自由基硬化性化合物之含量(摻合量)並無特別限定,相對於本發明之聚有機矽倍半氧烷、其他陽離子硬化性化合物及其他自由基硬化性化合物之總量(100重量%;陽離子硬化性化合物與自由基硬化性化合物之總量),較佳為50重量%以下(例如0~50重量%),更佳為30重量%以下(例如0~30重量%),進而較佳為10重量%以下。The content (incorporation amount) of other cationic curing compounds and/or other radical curing compounds in the curable composition of the present invention is not particularly limited. However, relative to the total amount of the polyorganosilsesquioxane, other cationic curing compounds, and other radical curing compounds of the present invention (100 weight percent; the total amount of the cationic curing compounds and radical curing compounds), it is preferably 50 weight percent or less (e.g., 0-50 weight percent), more preferably 30 weight percent or less (e.g., 0-30 weight percent), and even more preferably 10 weight percent or less.

本發明之硬化性組成物亦可進而含有聚合穩定劑。聚合穩定劑係具有如下作用之化合物:藉由捕獲陽離子而抑制陽離子聚合之進行,聚合穩定劑之陽離子之捕獲能力會飽和,於失活之階段使聚合進行。藉由使本發明之硬化性組成物含有聚合穩定劑,在進行塗佈、乾燥而形成接著劑層之後,可長期抑制聚合之進行,在謀求接著性之時間點進行加熱,藉此可形成表現優異之接著性且保存穩定性優異之接著劑層。於本發明之硬化性組成物為接著劑用硬化性組成物之情形時,較佳為含有聚合穩定劑。The curable composition of the present invention may further contain a polymerization stabilizer. A polymerization stabilizer is a compound that inhibits the progress of cationic polymerization by capturing cations. The cation-capturing capacity of the polymerization stabilizer is saturated, allowing polymerization to proceed during the deactivated phase. By including a polymerization stabilizer in the curable composition of the present invention, polymerization can be suppressed for a long period after coating and drying to form an adhesive layer. This allows heating at the desired adhesion point, resulting in an adhesive layer exhibiting excellent adhesion and maintaining excellent stability. When the curable composition of the present invention is a curable composition for adhesives, it preferably contains a polymerization stabilizer.

作為上述聚合穩定劑,例如可列舉:癸二酸雙(2,2,6,6-四甲基-4-哌啶基)酯、聚([6-(1,1,3,3-四甲基丁基)亞胺基-1,3,5-三-2,4-二基][(2,2,6,6-四甲基-4-哌啶基)亞胺基]六亞甲基[(2,2,6,6-四甲基-4-哌啶基)亞胺基])、1,2,3,4-丁烷四羧酸四(2,2,6,6-四甲基-4-哌啶基)酯、苯甲酸2,2,6,6-四甲基-4-哌啶基酯、(混合2,2,6,6-四甲基-4-哌啶基/十三烷基)-1,2,3,4-丁烷四羧酸酯、3,9-雙(2,3-二第三丁基-4-甲基苯氧基)-2,4,8,10-四氧雜-3,9-二磷雜螺[5.5]十一烷、混合(2,2,6,6-四甲基-4-哌啶基/β,β,β',β'-四甲基-3-9-[2,4,8,10-四氧雜螺[5.5]十一烷]二乙基)-1,2,3,4-丁烷四羧酸酯、聚([6-N-啉基-1,3,5-三-2,4-二基][(2,2,6,6-四甲基-4-哌啶基)亞胺基]六亞甲基[(2,2,6,6-四甲基-4-哌啶基)亞胺基])、[N-(2,2,6,6-四甲基-4-哌啶基)-2-甲基-2-(2,2,6,6-四甲基-4-哌啶基)亞胺基]丙醯胺、商品名「LA-77」、「LA-67」、「LA-57」(以上由ADEKA(股)製造)、商品名「TINUVIN123」、「TINUVIN152」(以上由Ciba Japan(股)公司製造)等受阻胺(hindered amine)系化合物;或(4-羥基苯基)二甲基鋶甲基亞硫酸鹽(例如商品名「San-Aid SI助劑」,三新化學工業(股)公司製造)等鋶硫酸鹽系化合物、商品名「Adekastab PEP-36」(ADEKA(股)製造)等亞磷酸鹽系化合物等。其中,基於更不易產生接著劑於乾燥過程中之局部硬化,硬化物對被接著體之接著性更優異之觀點,較佳為鋶硫酸鹽系化合物、亞磷酸鹽系化合物。Examples of the polymerization stabilizer include bis(2,2,6,6-tetramethyl-4-piperidinyl) sebacate, poly([6-(1,1,3,3-tetramethylbutyl)imino-1,3,5-trimethylol]- -2,4-diyl][(2,2,6,6-tetramethyl-4-piperidinyl)imino]hexamethylene[(2,2,6,6-tetramethyl-4-piperidinyl)imino]), 1,2,3,4-butanetetracarboxylic acid tetra(2,2,6,6-tetramethyl-4-piperidinyl) ester, 2,2,6,6-tetramethyl-4-piperidinyl benzoate, (mixed 2,2,6,6-tetramethyl-4-piperidinyl/tridecyl)-1,2,3, 4-Butane tetracarboxylate, 3,9-bis(2,3-di-tert-butyl-4-methylphenoxy)-2,4,8,10-tetraoxo-3,9-diphosphaspiro[5.5]undecane, mixed (2,2,6,6-tetramethyl-4-piperidinyl/β,β,β',β'-tetramethyl-3-9-[2,4,8,10-tetraoxospiro[5.5]undecane]diethyl)-1,2,3,4-butane tetracarboxylate, poly([6-N- 1,3,5-triazine Hindered amine compounds such as [(2,2,6,6-tetramethyl-4-piperidinyl)imino]hexamethylene[(2,2,6,6-tetramethyl-4-piperidinyl)imino]propionamide, [N-(2,2,6,6-tetramethyl-4-piperidinyl)-2-methyl-2-(2,2,6,6-tetramethyl-4-piperidinyl)imino]propionamide, trade names "LA-77", "LA-67", "LA-57" (all manufactured by ADEKA Co., Ltd.), trade names "TINUVIN123", "TINUVIN152" (all manufactured by Ciba Japan Co., Ltd.); or (4-hydroxyphenyl)dimethylsulfonium methylsulfite (for example, trade name "San-Aid Copper sulfate compounds such as "SI Additive" (manufactured by San Hsin Chemical Industries, Ltd.) and phosphite compounds such as "Adekastab PEP-36" (manufactured by ADEKA Co., Ltd.) are preferred. Copper sulfate compounds and phosphite compounds are preferred because they are less likely to cause localized curing of the adhesive during drying, resulting in better adhesion of the cured product to the substrate.

上述聚合穩定劑既可單獨使用1種,亦可組合2種以上使用。於本發明之接著劑用硬化性組成物中,尤以含有2種以上之聚合穩定劑為佳。藉此,有接著劑用硬化性組成物之保存穩定性顯著優異,更不易產生接著劑於乾燥過程中之局部硬化,硬化物對被接著體之接著性更進一步優異之傾向。作為上述2種以上之聚合穩定劑,較佳為至少含有鋶硫酸鹽系化合物、亞磷酸鹽系化合物。The above-mentioned polymerization stabilizers may be used singly or in combination. In the curable adhesive composition of the present invention, it is particularly preferred to contain two or more polymerization stabilizers. This results in significantly improved storage stability of the curable adhesive composition, reduces the likelihood of localized curing of the adhesive during drying, and tends to further improve the adhesion of the cured product to the adherend. The two or more polymerization stabilizers preferably contain at least a cobalt sulfate compound and a phosphite compound.

於本發明之硬化性組成物含有上述聚合穩定劑之情形時,其含量(摻合量)並無特別限定,相對於本發明之聚有機矽倍半氧烷(含有其他陽離子硬化性化合物時,為聚有機矽倍半氧烷與其他陽離子硬化性化合物之總量)100重量份,較佳為0.005重量份以上,且較佳為0.01~10重量份,進而較佳為0.02~1重量份。當上述含量為0.005重量份以上時,有更難產生接著劑於乾燥過程中之局部硬化,硬化物對被接著體之接著性更優異之傾向。於使用2種以上之聚合穩定劑之情形時,聚合穩定劑之總量相對於本發明之聚有機矽倍半氧烷(含有其他陽離子硬化性化合物時,為聚有機矽倍半氧烷與其他陽離子硬化性化合物之總量)100重量份,較佳為0.1~10重量份,更佳為0.2~1重量份。When the curable composition of the present invention contains the aforementioned polymerization stabilizer, its content (incorporation amount) is not particularly limited. However, it is preferably 0.005 parts by weight or greater, more preferably 0.01 to 10 parts by weight, and even more preferably 0.02 to 1 part by weight, relative to 100 parts by weight of the polyorganosilsesquioxane of the present invention (or, if other cationic curing compounds are included, the total amount of the polyorganosilsesquioxane and other cationic curing compounds). A content of 0.005 parts by weight or greater reduces the likelihood of localized curing of the adhesive during drying, resulting in a tendency for the cured product to exhibit superior adhesion to the substrate. When two or more polymerization stabilizers are used, the total amount of the polymerization stabilizers is preferably 0.1 to 10 parts by weight, more preferably 0.2 to 1 part by weight, based on 100 parts by weight of the polyorganosilsesquioxane of the present invention (or the total amount of the polyorganosilsesquioxane and other cationic curable compounds when the polyorganosilsesquioxane contains other cationic curable compounds).

於本發明之硬化性組成物含有上述聚合穩定劑及硬化觸媒之情形時,聚合穩定劑之含量(摻合量)並無特別限定,相對於硬化觸媒100重量份,較佳為1重量份以上,更佳為3~200重量份,進而較佳為5~150重量份。當上述含量為1重量份以上時,有更難產生接著劑於乾燥過程中之局部硬化,硬化物對被接著體之接著性更優異之傾向。於使用2種以上之聚合穩定劑之情形時,聚合穩定劑之總量相對於硬化觸媒100重量份,較佳為100~200重量份,更佳為110~150重量份。When the curable composition of the present invention contains the aforementioned polymerization stabilizer and a curing catalyst, the content (incorporation amount) of the polymerization stabilizer is not particularly limited. It is preferably 1 part by weight or greater, more preferably 3 to 200 parts by weight, and even more preferably 5 to 150 parts by weight, per 100 parts by weight of the curing catalyst. When the content is 1 part by weight or greater, localized curing of the adhesive during drying is less likely to occur, and the cured product tends to exhibit superior adhesion to the substrate. When two or more polymerization stabilizers are used, the total amount of the polymerization stabilizers is preferably 100 to 200 parts by weight, more preferably 110 to 150 parts by weight, per 100 parts by weight of the curing catalyst.

本發明之硬化性組成物較佳為可進而含有溶劑。溶劑例如可列舉水、有機溶劑等,只要為可將本發明之聚有機矽倍半氧烷及視需要使用之添加物溶解,且不抑制聚合者,便無特別限制。The curable composition of the present invention preferably further contains a solvent. Examples of the solvent include water and organic solvents. There are no particular limitations on the solvent as long as it can dissolve the polyorganosilsesquioxane of the present invention and any additives used as needed and does not inhibit polymerization.

溶劑較佳為使用1種或2種以上之沸點(1大氣壓時)為170℃以下之溶劑(例如甲苯、乙酸丁酯、甲基異丁基酮、二甲苯、1,3,5-三甲苯、丙二醇單甲醚、丙二醇單甲醚乙酸酯、環己酮等)。The solvent is preferably one or more solvents having a boiling point (at 1 atmosphere) of 170°C or lower (e.g., toluene, butyl acetate, methyl isobutyl ketone, xylene, 1,3,5-trimethylbenzene, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, cyclohexanone, etc.).

溶劑根據硬化性組成物之用途適量使用即可。溶劑之使用量以本發明之硬化性組成物所含之不揮發分之濃度計,例如為30~80重量%左右,較佳為40~70重量%,更佳為50~60重量%。若溶劑之使用量過量,則有硬化性組成物之黏度降低而難以形成適度膜厚之層之傾向。另一方面,若溶劑之使用量過少,則有硬化性組成物之黏度變得過高而難以均勻塗佈之傾向。The solvent should be used in an appropriate amount depending on the intended use of the curable composition. The amount of solvent used is, for example, approximately 30-80% by weight, preferably 40-70% by weight, and even more preferably 50-60% by weight, based on the non-volatile content of the curable composition of the present invention. Excessive amounts of solvent can reduce the viscosity of the curable composition, making it difficult to form a film of appropriate thickness. On the other hand, insufficient amounts of solvent can increase the viscosity of the curable composition, making uniform coating difficult.

本發明之硬化性組成物可進而含有以下慣用之添加劑作為其他任意之成分:沈澱氧化矽、濕式氧化矽、發煙氧化矽(fumed silica)、煅燒氧化矽、氧化鈦、氧化鋁、玻璃、石英、鋁矽酸、氧化鐵、氧化鋅、碳酸鈣、碳黑、碳化矽、氮化矽、氮化硼等無機填充劑;將該等填充劑藉由有機鹵矽烷(halosilane)、有機烷氧基矽烷、有機矽氮烷等有機矽化合物進行處理而得之無機填充劑;聚矽氧樹脂、環氧樹脂、氟樹脂等有機樹脂微粉末;銀、銅等導電性金屬粉末等填充劑、硬化助劑、穩定劑、難燃劑、難燃助劑、補強材料、成核劑、潤滑劑、蠟、塑化劑、脫模劑、耐衝擊改良劑、色相改良劑、透明化劑、流變調整劑、加工性改良劑、著色劑、抗靜電劑、分散劑、表面調整劑、表面改質劑、消光劑、消沫劑、抑泡劑、消泡劑、抗菌劑、防腐劑、黏度調整劑、增黏劑、光敏劑、發泡劑等。該等添加劑可單獨使用,或組合2種以上使用。The curable composition of the present invention may further contain the following conventional additives as other optional components: inorganic fillers such as precipitated silica, wet silica, fumed silica, calcined silica, titanium oxide, aluminum oxide, glass, quartz, aluminosilicate, iron oxide, zinc oxide, calcium carbonate, carbon black, silicon carbide, silicon nitride, and boron nitride; inorganic fillers obtained by treating such fillers with organic silicon compounds such as halosilane, organic alkoxysilane, and organic silazane; organic resin fine powders such as polysiloxane, epoxy resin, and fluororesin; silver, copper, etc. Fillers such as conductive metal powder, hardening aids, stabilizers, flame retardants, flame retardant additives, reinforcing materials, nucleating agents, lubricants, waxes, plasticizers, mold release agents, impact modifiers, hue modifiers, transparent agents, rheology modifiers, processability modifiers, colorants, antistatic agents, dispersants, surface conditioners, surface modifiers, matting agents, defoamers, foam suppressants, antifoaming agents, antimicrobial agents, preservatives, viscosity modifiers, thickeners, photosensitizers, and foaming agents. These additives may be used alone or in combination of two or more.

本發明之硬化性組成物並無特別限定,可藉由將上述各成分於室溫下或視需要加熱,同時進行攪拌、混合來製備。再者,本發明之硬化性組成物可以將預先混合各成分而得者直接使用之單液系組成物之形式使用,例如亦可以將分別保管之2種以上之成分於使用前以規定比率進行混合而使用之多液系(例如2液系)組成物之形式使用。The curable composition of the present invention is not particularly limited and can be prepared by stirring and mixing the aforementioned components at room temperature or, if necessary, while heating. Furthermore, the curable composition of the present invention can be used as a single-liquid composition, where the components are pre-mixed and used directly, or as a multi-liquid (e.g., two-liquid) composition, where two or more components, stored separately, are mixed at a predetermined ratio before use.

本發明之硬化性組成物並無特別限定,較佳為於常溫(約25℃)為液體。更具體而言,關於本發明之硬化性組成物,作為稀釋成溶劑20%之液[例如甲基異丁基酮之比率為20重量%之硬化性組成物(溶液)]於25℃時之黏度,較佳為300~20000 mPa・s,更佳為500~10000 mPa・s,進而較佳為1000~8000 mPa・s。藉由將上述黏度設為300 mPa・s以上,有硬化物之耐熱性進一步提昇之傾向。另一方面,藉由將上述黏度設為20000 mPa・s以下,有硬化性組成物之製備或操作較為容易,又,硬化物中不易殘存氣泡之傾向。再者,本發明之硬化性組成物之黏度係使用黏度計(商品名「MCR301」,AntonPaar公司製造),以擺動角5%、頻率0.1~100(1/s)、溫度:25℃之條件進行測定。The curable composition of the present invention is not particularly limited, but is preferably a liquid at room temperature (approximately 25°C). More specifically, the viscosity of the curable composition of the present invention, diluted to a 20% solvent (e.g., a curable composition (solution) containing 20% by weight of methyl isobutyl ketone), at 25°C is preferably 300 to 20,000 mPa·s, more preferably 500 to 10,000 mPa·s, and even more preferably 1,000 to 8,000 mPa·s. A viscosity of 300 mPa·s or greater tends to further improve the heat resistance of the cured product. On the other hand, setting the viscosity below 20,000 mPa·s makes the preparation and handling of the curable composition easier, and also reduces the likelihood of air bubbles remaining in the cured product. The viscosity of the curable composition of the present invention was measured using a viscometer (trade name "MCR301," manufactured by Anton Paar) at a swing angle of 5%, a frequency of 0.1 to 100 (1/s), and a temperature of 25°C.

[硬化物] 藉由使本發明之硬化性組成物中之陽離子硬化性化合物或自由基硬化性化合物進行聚合反應,可使該硬化性組成物硬化,能夠獲得硬化物(有時稱為「本發明之硬化物」)。硬化方法可自周知之方法中適當選擇,並無特別限定,例如可列舉活性能量線之照射及/或進行加熱之方法。作為上述活性能量線,例如可使用紅外線、可見光線、紫外線、X射線、電子束、α射線、β射線、γ射線等之任一種。其中,基於操作性優異之方面,較佳為紫外線。 [Cured Product] The curable composition of the present invention can be cured by polymerizing the cationic curable compound or radical curable compound, thereby obtaining a cured product (sometimes referred to as the "cured product of the present invention"). The curing method can be appropriately selected from known methods and is not particularly limited. Examples include irradiation with active energy rays and/or heating. Examples of the active energy rays include infrared rays, visible light, ultraviolet rays, X-rays, electron beams, α-rays, β-rays, and γ-rays. Ultraviolet rays are preferred due to their superior workability.

關於藉由照射活性能量線而使本發明之硬化性組成物硬化時之條件(活性能量線之照射條件等),可根據所照射之活性能量線之種類或能量、硬化物之形狀或尺寸等來適當進行調整,並無特別限定,於照射紫外線之情形時,例如較佳為設為1~1000 mJ/cm 2左右。再者,活性能量線之照射時,例如可使用高壓水銀燈、超高壓水銀燈、氙氣燈、碳弧、金屬鹵素燈、太陽光、LED燈、雷射等。活性能量線之照射後,可進一步實施加熱處理(退火、熟化)而進一步進行硬化反應。 The conditions for curing the curable composition of the present invention by irradiating it with active energy rays (active energy ray irradiation conditions, etc.) can be appropriately adjusted depending on the type and energy of the active energy rays irradiated, the shape and size of the cured product, and are not particularly limited. In the case of ultraviolet irradiation, for example, the irradiation intensity is preferably set to approximately 1 to 1000 mJ/ cm² . Furthermore, active energy ray irradiation can be performed using, for example, high-pressure mercury lamps, ultra-high-pressure mercury lamps, xenon lamps, carbon arcs, metal halogen lamps, solar light, LED lamps, lasers, and the like. After irradiation with active energy rays, a heat treatment (annealing, aging) can be performed to further promote the curing reaction.

另一方面,使本發明之硬化性組成物藉由加熱而硬化時之條件並無特別限定,例如較佳為30~200℃,更佳為50~190℃。硬化時間可適當設定。On the other hand, the conditions for curing the curable composition of the present invention by heating are not particularly limited, but are preferably 30 to 200° C., more preferably 50 to 190° C. The curing time can be appropriately set.

如上所述,本發明之硬化性組成物藉由使其硬化而能夠形成具有高表面硬度及耐熱性且耐彎曲性及加工性優異之硬化物。因此,本發明之硬化性組成物可作為用以形成硬塗膜中之硬塗層之「硬塗層形成用硬化性組成物」(有時稱為「硬塗液」或「硬塗劑」等)或積層半導體用接著劑來適宜使用。使用本發明之硬化性組成物作為硬塗層形成用硬化性組成物且具有由該組成物形成之硬塗層的硬塗膜可維持高硬度及高耐熱性且具有可撓性,適合以卷對卷方式進行製造或加工。又,於使用本發明之硬化性組成物作為接著性用硬化性組成物之情形時,可以低溫進行硬化,可形成耐龜裂性、耐熱性、對被接著體之接著性及密接性優異之硬化物,因此,即便賦予冷熱衝擊,接著層亦不會產生龜裂或剝離,可形成具可靠性之裝置。As described above, the curable composition of the present invention, upon curing, can form a cured product having high surface hardness and heat resistance, as well as excellent flex resistance and workability. Therefore, the curable composition of the present invention is suitable for use as a "hardcoat-forming curable composition" (sometimes referred to as a "hardcoat liquid" or "hardcoat agent") for forming a hardcoat layer in a hardcoat film, or as an adhesive for laminated semiconductors. Hardcoat films having a hardcoat layer formed using the curable composition of the present invention can maintain high hardness and heat resistance while maintaining flexibility, making them suitable for roll-to-roll production or processing. Furthermore, when the curable composition of the present invention is used as a curable adhesive composition, it can be cured at low temperatures, resulting in a cured product with excellent crack resistance, heat resistance, and adhesion and tightness to the adherend. Therefore, even when subjected to thermal shock, the adhesive layer will not crack or peel, resulting in a reliable device.

又,本發明之硬化性組成物在設置於基材上之脫模層上進行塗佈、乾燥而得之未硬化或半硬化之硬塗層之表面變得不黏著,耐黏連性提昇,因此,能夠捲取成卷狀來操作,進而,藉由將該硬塗層轉印於成型品表面並使之硬化,可形成具有高表面硬度之硬塗層。因此,本發明之硬化性組成物亦可作為用以形成耐彎曲性優異之硬塗層的硬塗層形成用硬化性組成物來適宜使用。Furthermore, the curable composition of the present invention is applied to a release layer provided on a substrate and dried, resulting in an uncured or semi-cured hard coating layer with a non-stick surface and improved blocking resistance. This allows the hard coating to be rolled up for handling. Furthermore, by transferring this hard coating layer to the surface of a molded article and curing it, a hard coating layer with high surface hardness can be formed. Therefore, the curable composition of the present invention can also be suitably used as a hard coating composition for forming a hard coating layer with excellent flex resistance.

[硬塗膜] 本發明之硬塗膜為積層有基材、及形成於該基材之至少一表面之硬塗層而成者,且上述硬塗層為由本發明之硬化性組成物(硬塗層形成用硬化性組成物)所形成之硬塗層(本發明之硬化性組成物之硬化物層)。圖9係表示本發明之硬塗膜之一實施方式之示意圖(剖面圖)。1表示硬塗膜,11表示硬塗層,12表示基材。 [Hard Coat] The hard coat of the present invention is composed of a substrate and a hard coat layer formed on at least one surface of the substrate. The hard coat layer is formed from the hardenable composition of the present invention (the hardenable composition for forming the hard coat) (the hardened layer of the hardenable composition of the present invention). Figure 9 is a schematic diagram (cross-sectional view) showing one embodiment of the hard coat of the present invention. Reference numeral 1 represents the hard coat, reference numeral 11 represents the hard coat layer, and reference numeral 12 represents the substrate.

再者,本發明之硬塗膜中之硬塗層可僅形成於上述基材之一表面(單面),亦可形成於兩表面(兩面)。Furthermore, the hard coating layer in the hard coating film of the present invention may be formed on only one surface (single surface) of the substrate or on both surfaces (double surfaces).

又,本發明之硬塗膜中之硬塗層可僅形成於上述基材之各表面之一部分,亦可形成於整個面。Furthermore, the hard coating layer in the hard coating film of the present invention may be formed on only a portion of each surface of the substrate or on the entire surface.

本發明之硬塗膜中之基材為硬塗膜之基材,且係指構成硬塗層以外之部分。作為上述基材,可使用塑膠基材、金屬基材、陶瓷基材、半導體基材、玻璃基材、紙基材、木基材(木製基材)、表面為塗裝表面之基材等公知或慣用之基材,並無特別限定。其中,較佳為塑膠基材(由塑膠材料構成之基材)。The substrate in the hard coat film of the present invention is the substrate of the hard coat film and refers to the portion other than the hard coat layer. Such substrates can be any known or commonly used substrate, including plastic substrates, metal substrates, ceramic substrates, semiconductor substrates, glass substrates, paper substrates, wood substrates (wooden substrates), and substrates with painted surfaces, without particular limitation. Among these, plastic substrates (substrates composed of plastic materials) are preferred.

構成上述塑膠基材之塑膠材料並無特別限定,例如可列舉:聚對苯二甲酸乙二酯(PET)、聚萘二甲酸乙二酯(PEN)等聚酯;聚醯亞胺;聚碳酸酯;聚醯胺;聚縮醛;聚伸苯醚;聚苯硫醚;聚醚碸;聚醚醚酮;降莰烯系單體之均聚物(加成聚合物或開環聚合物等)、降莰烯與乙烯之共聚物等降莰烯系單體與烯烴系單體之共聚物(加成聚合物或開環聚合物等環狀烯烴共聚物等)、該等之衍生物等環狀聚烯烴;乙烯系聚合物(例如聚甲基丙烯酸甲酯(PMMA)等丙烯酸系樹脂、聚苯乙烯、聚氯乙烯、丙烯腈-苯乙烯-丁二烯樹脂(ABS樹脂)等);亞乙烯基系聚合物(例如聚偏二氯乙烯等);三乙醯纖維素(TAC)等纖維素系樹脂;環氧樹脂;酚系樹脂;三聚氰胺樹脂;尿素樹脂;順丁烯二醯亞胺樹脂;聚矽氧等各種塑膠材料。再者,上述塑膠基材可為僅由1種塑膠材料構成者,亦可為由2種以上之塑膠材料構成者。The plastic material constituting the above-mentioned plastic substrate is not particularly limited, and examples thereof include: polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN); polyimide; polycarbonate; polyamide; polyacetal; polyphenylene ether; polyphenylene sulfide; polyether sulfone; polyether ether ketone; homopolymers of norbornene monomers (addition polymers or ring-opening polymers, etc.), copolymers of norbornene monomers and olefin monomers (cyclic olefins such as addition polymers or ring-opening polymers, etc.); Various plastic materials may be used, including cyclic polyolefins such as propylene glycol copolymers, and their derivatives; vinyl polymers (e.g., acrylic resins such as polymethyl methacrylate (PMMA), polystyrene, polyvinyl chloride, acrylonitrile-styrene-butadiene resin (ABS resin)); vinylidene polymers (e.g., polyvinylidene chloride); cellulose resins such as triacetyl cellulose (TAC); epoxy resins; phenolic resins; melamine resins; urea resins; cis-butylene imide resins; and silicones. Furthermore, the plastic substrate may be composed of only one plastic material or two or more plastic materials.

其中,作為上述塑膠基材,於旨在獲得透明性優異之硬塗膜作為本發明之硬塗膜之情形時,較佳為使用透明性優異之基材(透明基材),更佳為聚酯膜(例如PET、PEN)、環狀聚烯烴膜、聚碳酸酯膜、TAC膜、PMMA膜。Among them, when the purpose is to obtain a hard coating film with excellent transparency as the hard coating film of the present invention, it is preferred to use a substrate with excellent transparency (transparent substrate), and more preferably a polyester film (such as PET, PEN), a cyclic polyolefin film, a polycarbonate film, a TAC film, or a PMMA film.

上述塑膠基材亦可視需要含有抗氧化劑、紫外線吸收劑、耐光穩定劑、熱穩定劑、結晶成核劑、難燃劑、難燃助劑、填充劑、塑化劑、耐衝擊性改良劑、補強劑、分散劑、抗靜電劑、發泡劑、抗菌劑等其他添加劑。再者,添加劑既可單獨使用1種,亦可組合2種以上使用。The plastic substrate may also contain other additives, such as antioxidants, UV absorbers, light stabilizers, heat stabilizers, crystallization nucleating agents, flame retardants, flame retardant additives, fillers, plasticizers, impact resistance improvers, reinforcing agents, dispersants, antistatic agents, foaming agents, and antimicrobial agents, as needed. These additives may be used singly or in combination.

上述塑膠基材既可具有單層構成,亦可具有多層(積層)構成,其構成(結構)並無特別限定。例如,上述塑膠基材亦可為於塑膠膜之至少一表面形成有本發明之硬塗層以外之層(有時稱為「其他層」)即具有「塑膠膜/其他層」或「其他層/塑膠膜/其他層」等積層構成之塑膠基材。作為上述其他層,例如可列舉本發明之硬塗層以外之硬塗層等。再者,作為構成上述其他層之材料,例如可列舉上述塑膠材料等。The plastic substrate may have a single layer or a multilayer (laminated) structure, and its composition (structure) is not particularly limited. For example, the plastic substrate may have a layer other than the hard coat layer of the present invention formed on at least one surface of the plastic film (sometimes referred to as an "other layer"), i.e., a laminated structure such as "plastic film/other layer" or "other layer/plastic film/other layer." Examples of the other layer include hard coat layers other than the hard coat layer of the present invention. Furthermore, examples of the materials comprising the other layer include the aforementioned plastic materials.

亦可對上述塑膠基材之表面之一部分或全部實施粗化處理、易接著處理、抗靜電處理、噴砂處理(砂無光澤(sand matt)處理)、電暈放電處理、電漿處理、化學蝕刻處理、水無光澤(water matt)處理、火焰處理、酸處理、鹼處理、氧化處理、紫外線照射處理、矽烷偶合劑處理等公知或慣用之表面處理。再者,上述塑膠基材可為未延伸膜,亦可為延伸膜。The surface of the plastic substrate may be partially or entirely roughened, treated for adhesion, treated with an antistatic agent, sandblasted (sand matt treated), treated with a corona discharge treatment, treated with a plasma treatment, treated with a chemical etching treatment, treated with a water matt, flame treated, treated with an acid, treated with an alkali, oxidized, treated with ultraviolet light, or treated with a silane coupling agent, among other known or commonly used surface treatments. Furthermore, the plastic substrate may be either an unstretched film or a stretched film.

上述塑膠基材例如可藉由如下公知或慣用之方法進行製造:將上述塑膠材料成形為膜狀而製成塑膠基材(塑膠膜)之方法;視需要進一步於上述塑膠膜上形成適當之層(例如上述其他層等),或對上述塑膠膜實施適當之表面處理之方法等。再者,上述塑膠基材亦可使用市售品。The plastic substrate can be manufactured by, for example, the following known or commonly used methods: forming the plastic material into a film to form a plastic substrate (plastic film); optionally forming appropriate layers (such as the aforementioned other layers) on the plastic film; or performing appropriate surface treatment on the plastic film. Commercially available plastic substrates may also be used.

上述基材之厚度並無特別限定,例如可自0.01~10000 μm之範圍內適當選擇。The thickness of the substrate is not particularly limited and can be appropriately selected from the range of 0.01 to 10000 μm, for example.

本發明之硬塗膜中之硬塗層為構成本發明之硬塗膜中之至少一表面層之層,且該層(硬化物層)係藉由硬化物(樹脂硬化物)所形成,該硬化物(樹脂硬化物)係藉由使本發明之硬化性組成物(硬塗層形成用硬化性組成物)硬化而獲得。The hard coat layer of the hard coat film of the present invention constitutes at least one surface layer of the hard coat film of the present invention. This layer (cured material layer) is formed by a curing material (cured resin material) obtained by curing the curable composition of the present invention (curable composition for forming the hard coat layer).

本發明之硬塗層之厚度(於基材之兩面具有硬塗層時為各硬塗層之厚度)並無特別限定,較佳為1~200 μm,更佳為3~150 μm。即便本發明之硬塗層較薄(例如厚度5 μm以下)時,亦能夠維持表面之高硬度(例如,使鉛筆硬度為3H以上)。又,即便本發明之硬塗層較厚(例如厚度50 μm以上)時,亦不易發生因硬化收縮等所引起之龜裂產生等不良情況,因此,仍可藉由厚膜化而顯著提高鉛筆硬度(例如,使鉛筆硬度為9H以上)。The thickness of the hard coat layer of the present invention (the thickness of each hard coat layer when the hard coat layer is provided on both surfaces of the substrate) is not particularly limited, but is preferably 1 to 200 μm, more preferably 3 to 150 μm. Even when the hard coat layer of the present invention is thin (e.g., 5 μm or less), it can maintain a high surface hardness (e.g., a pencil hardness of 3H or higher). Furthermore, even when the hard coat layer of the present invention is thick (e.g., 50 μm or greater), it is less susceptible to problems such as cracking caused by curing shrinkage. Therefore, by thickening the film, pencil hardness can be significantly improved (e.g., a pencil hardness of 9H or higher).

硬塗層之霧度並無特別限定,於厚度50 μm時,較佳為1.5%以下,更佳為1.0%以下。再者,霧度之下限並無特別限定,例如為0.1%。藉由將霧度設為1.0%以下,例如有適用於要求非常高之透明性之用途(例如觸控面板等顯示器之表面保護片等)之傾向。本發明之硬塗層之霧度可依據JIS K7136進行測定。The haze of the hard coat layer is not particularly limited; however, at a thickness of 50 μm, it is preferably 1.5% or less, and more preferably 1.0% or less. Furthermore, the lower limit of the haze is not particularly limited, but may be, for example, 0.1%. By setting the haze to 1.0% or less, the hard coat layer may be suitable for applications requiring very high transparency, such as surface protection sheets for touch panels and other displays. The haze of the hard coat layer of the present invention can be measured in accordance with JIS K7136.

硬塗層之全光線穿透率並無特別限定,於厚度50 μm時,較佳為85%以上,更佳為90%以上。再者,全光線穿透率之上限並無特別限定,例如為99%。藉由將全光線穿透率設為85%以上,例如有適用於要求非常高之透明性之用途(例如觸控面板等顯示器之表面保護片等)之傾向。本發明之硬塗層之全光線穿透率可依據JIS K7361-1進行測定。The total light transmittance of the hard coat layer is not particularly limited; however, at a thickness of 50 μm, it is preferably 85% or greater, and more preferably 90% or greater. Furthermore, the upper limit of the total light transmittance is not particularly limited, and may be, for example, 99%. A total light transmittance of 85% or greater may be suitable for applications requiring extremely high transparency, such as surface protection sheets for touch panels and other displays. The total light transmittance of the hard coat layer of the present invention can be measured in accordance with JIS K7361-1.

本發明之硬塗膜進而亦可於本發明之硬塗層表面具有表面保護膜。藉由使本發明之硬塗膜具有表面保護膜,有硬塗膜之沖切加工性進一步提昇之傾向。於如此具有表面保護膜之情形時,例如即便為硬塗層之硬度非常高,沖切加工時容易產生來自基材之剝離或龜裂者,亦不會產生此種問題而可使用湯姆森刀片(Thomson blade)進行沖切加工。上述表面保護膜可使用公知或慣用之表面保護膜。The hard coat film of the present invention may also have a surface protective film on its surface. This tends to further improve the hard coat film's punching processability. With this surface protective film, even if the hard coat layer is very hard and prone to peeling or cracking from the substrate during punching, this problem can be eliminated, allowing punching using a Thomson blade. The surface protective film can be any known or commonly used surface protective film.

本發明之硬塗膜可依據公知或慣用之硬塗膜之製造方法進行製造,其製造方法並無特別限定,例如可藉由在上述基材之至少一表面塗佈本發明之硬化性組成物(硬塗層形成用硬化性組成物),視需要將溶劑以乾燥方式去除後,使該硬化性組成物(硬化性組成物層)硬化來製造。使硬化性組成物硬化時之條件並無特別限定,例如可自上述形成硬化物時之條件中適當選擇。The hard coat film of the present invention can be produced according to known or commonly used hard coat film production methods, and the production method is not particularly limited. For example, the hard coat film can be produced by applying the hardenable composition of the present invention (hardenable composition for forming a hard coat layer) to at least one surface of the substrate, optionally removing the solvent by drying, and then curing the hardenable composition (hardenable composition layer). The conditions for curing the hardenable composition are not particularly limited and can be appropriately selected from the conditions for forming the hardened material described above.

本發明之硬塗膜中之本發明之硬塗層由於係由能夠形成耐彎曲性及加工性優異之硬化物之本發明之硬化性組成物(硬塗層形成用硬化性組成物)所形成之硬塗層,故本發明之硬塗膜能夠以卷對卷方式進行製造。藉由以卷對卷方式製造本發明之硬塗膜,可顯著提高其生產性。作為以卷對卷方式製造本發明之硬塗膜之方法,可採用公知或慣用之卷對卷方式之製造方法,並無特別限定,例如可列舉包括如下步驟(步驟A~C)作為必需步驟,且連續地實施該等步驟(步驟A~C)之方法等:步驟A,將捲繞成卷狀之基材捲出;步驟B,於捲出之基材之至少一表面塗佈本發明之硬化性組成物(硬塗層形成用硬化性組成物),繼而,視需要將溶劑以乾燥方式去除後使該硬化性組成物(硬化性組成物層)硬化,藉此形成本發明之硬塗層;及步驟C,其後將所獲得之硬塗膜再次捲取成捲筒。再者,該方法亦可包含步驟A~C以外之步驟。Because the hard coat layer of the hard coat film of the present invention is formed from the hardening composition of the present invention (hard coat layer-forming hardening composition) capable of forming a cured product with excellent flex resistance and workability, the hard coat film of the present invention can be manufactured using a roll-to-roll process. By using a roll-to-roll process to manufacture the hard coat film of the present invention, its productivity can be significantly improved. As a method for producing the hard coating film of the present invention in a roll-to-roll manner, a well-known or commonly used roll-to-roll manufacturing method can be adopted without particular limitation. For example, a method including the following steps (steps A to C) as necessary steps and performing these steps (steps A to C) continuously can be cited: step A, unwinding the rolled substrate; step B. Applying the hardenable composition of the present invention (hardenable composition for forming a hard coat layer) to at least one surface of the unrolled substrate. Subsequently, the solvent is optionally removed by drying, and the hardenable composition (hardenable composition layer) is cured to form the hard coat layer of the present invention. And C. The resulting hard coat film is then rewound into a roll. Furthermore, the method may include steps other than steps A-C.

本發明之硬塗膜之厚度並無特別限定,可自1~10000 μm之範圍內適當選擇。The thickness of the hard coating film of the present invention is not particularly limited and can be appropriately selected from the range of 1 to 10,000 μm.

本發明之硬塗膜之硬塗層表面之鉛筆硬度較佳為4H以上,更佳為5H以上,進而較佳為6H以上。再者,鉛筆硬度可依據JIS K5600-5-4中記載之方法進行評價。The pencil hardness of the hard coating layer of the hard coating film of the present invention is preferably 4H or higher, more preferably 5H or higher, and even more preferably 6H or higher. Furthermore, pencil hardness can be evaluated according to the method described in JIS K5600-5-4.

本發明之硬塗膜之霧度並無特別限定,較佳為1.5%以下,更佳為1.0%以下。再者,霧度之下限並無特別限定,例如為0.1%。藉由將霧度設為1.0%以下,例如有適用於要求非常高之透明性之用途(例如觸控面板等顯示器之表面保護片等)之傾向。本發明之硬塗膜之霧度例如藉由使用上述透明基材作為基材,可容易地控制在上述範圍內。再者,霧度可依據JIS K7136進行測定。The haze of the hard coat film of the present invention is not particularly limited, but is preferably 1.5% or less, and more preferably 1.0% or less. Furthermore, the lower limit of the haze is not particularly limited, but is, for example, 0.1%. By setting the haze to 1.0% or less, the hard coat film tends to be suitable for applications requiring very high transparency, such as surface protection sheets for touch panels and other displays. The haze of the hard coat film of the present invention can be easily controlled within the above range by using the aforementioned transparent substrate as the substrate. Furthermore, the haze can be measured in accordance with JIS K7136.

本發明之硬塗膜之全光線穿透率並無特別限定,較佳為85%以上,更佳為90%以上。再者,全光線穿透率之上限並無特別限定,例如為99%。藉由將全光線穿透率設為90%以上,例如有適用於要求非常高之透明性之用途(例如觸控面板等顯示器之表面保護片等)之傾向。本發明之硬塗膜之全光線穿透率例如藉由使用上述透明基材作為基材,可容易地控制在上述範圍內。再者,全光線穿透率可依據JIS K7361-1進行測定。The total light transmittance of the hard coat film of the present invention is not particularly limited, but is preferably 85% or greater, and more preferably 90% or greater. Furthermore, the upper limit of the total light transmittance is not particularly limited, and may be, for example, 99%. By setting the total light transmittance to 90% or greater, it tends to be suitable for applications requiring very high transparency, such as surface protective sheets for displays such as touch panels. The total light transmittance of the hard coat film of the present invention can be easily controlled within the above range, for example, by using the above-mentioned transparent substrate as the substrate. Furthermore, the total light transmittance can be measured in accordance with JIS K7361-1.

本發明之硬塗膜由於既可維持高硬度及高耐熱性又具有可撓性,能夠以卷對卷方式進行製造或加工,因此具有高品質,生產性亦優異。於在本發明之硬塗層表面具有表面保護膜之情形時,沖切加工性亦優異。因此,可較佳地用於要求此種特性之所有用途。本發明之硬塗膜例如既可用作各種製品中之表面保護膜、各種製品之構件或零件中之表面保護膜等,亦可用作各種製品或者其構件或零件之構成材料。作為上述製品,例如可列舉:液晶顯示器、有機EL顯示器等顯示裝置;觸控面板等輸入裝置;太陽電池;各種家電製品;各種電氣、電子製品;可攜式電子終端(例如遊戲機、個人電腦、輸入板、智慧型手機、行動電話等)之各種電氣、電子製品;各種光學機器等。又,作為將本發明之硬塗膜用作各種製品或者其構件或零件之構成材料之態樣,例如可列舉使用於觸控面板中之硬塗膜及透明導電膜之積層體等之態樣等。The hard coat film of the present invention maintains high hardness and heat resistance while remaining flexible, enabling roll-to-roll manufacturing or processing. This results in high quality and excellent productivity. When a surface protective film is applied to the surface of the hard coat layer of the present invention, punching processability is also excellent. Therefore, it is ideally suited for all applications requiring these properties. For example, the hard coat film of the present invention can be used as a surface protective film for various products, as a surface protective film for components or parts of various products, and as a component material for various products or their components or parts. Examples of these products include: display devices such as liquid crystal displays and organic EL displays; input devices such as touch panels; solar cells; various home appliances; various electrical and electronic products; various electrical and electronic products such as portable electronic terminals (e.g., game consoles, personal computers, tablets, smartphones, mobile phones); and various optical devices. Furthermore, examples of using the hard coat film of the present invention as a component material for various products or their components or parts include a laminate of a hard coat film and a transparent conductive film for use in touch panels.

[轉印用膜] 本發明之轉印用膜(轉印用硬塗膜)為具有基材、且在形成於該基材之至少一表面之脫模層上具有未硬化或半硬化之硬塗層的膜,且上述未硬化或半硬化之硬塗層為含有本發明之硬化性組成物(硬塗層形成用硬化性組成物(以下有時稱為「本發明之硬塗劑」)之層。此處,未硬化係指本發明之硬塗層形成用硬化性組成物(硬塗劑)所含之本發明之聚有機矽倍半氧烷之聚合性官能基未發生聚合反應的狀態。又,半硬化係指該聚合性官能基之一部分發生聚合反應且殘存有未反應之聚合性官能基之狀態。再者,本說明書中,有時將由本發明之硬化性組成物(硬塗劑)形成之未硬化或半硬化之硬塗層簡稱為「硬塗層」,將轉印於成型品並硬化而得之硬塗層稱為「硬化硬塗層」。圖10係表示本發明之轉印用膜之一實施方式之示意圖(剖面圖)。2表示轉印用膜,21表示基材,22表示脫模層,23表示硬塗層(未硬化或半硬化之硬塗層),24表示增黏塗層,25表示著色層,26表示接著劑層。 [Transfer Film] The transfer film (transfer hard coat film) of the present invention comprises a substrate and an uncured or semi-cured hard coat layer formed on a release layer formed on at least one surface of the substrate. The uncured or semi-cured hard coat layer comprises the curable composition of the present invention (curable composition for forming a hard coat layer (hereinafter sometimes referred to as the "hard coat of the present invention"). Here, "uncured" refers to a state in which the polymerizable functional groups of the polyorganosilsesquioxane of the present invention contained in the curable composition for forming a hard coat layer (hard coat) of the present invention have not yet undergone polymerization. "Semi-cured" refers to a state in which a portion of the polymerizable functional groups have undergone polymerization. A state in which a polymerization reaction has occurred and unreacted polymerizable functional groups remain. Furthermore, in this specification, an uncured or semi-cured hard coat layer formed from the curable composition (hard coat) of the present invention is sometimes referred to simply as a "hard coat layer," while a hard coat layer transferred to a molded article and cured is referred to as a "cured hard coat layer." Figure 10 is a schematic diagram (cross-sectional view) showing one embodiment of the transfer film of the present invention. Reference numeral 2 denotes a transfer film, reference numeral 21 denotes a substrate, reference numeral 22 denotes a release layer, reference numeral 23 denotes a hard coat layer (uncured or semi-cured hard coat layer), reference numeral 24 denotes an adhesion promoter layer, reference numeral 25 denotes a coloring layer, and reference numeral 26 denotes an adhesive layer.

本發明之轉印用膜中之基材為轉印用膜之基材,且係指構成含有本發明之硬塗層之轉印層以外的部分。此處,轉印層係於本發明之轉印用膜中除形成有脫模層之基材以外之層,且係指轉印於成型品表面之部分。The substrate in the transfer film of the present invention is the base material of the transfer film and refers to the portion of the film other than the transfer layer comprising the hard coat layer of the present invention. Herein, the transfer layer refers to the layer of the transfer film of the present invention other than the base material on which the release layer is formed and refers to the portion that is transferred to the surface of the molded article.

作為上述基材,可使用上述硬塗膜所列舉之基材,其中尤以塑膠基材(塑膠膜)作為基材為佳。上述基材之厚度例如可自0.01~10000 μm之範圍內適當選擇,基於成型性或形狀追隨性、操作性等觀點,較佳為2~250 μm,更佳為5~100 μm,進而較佳為20~100 μm。The substrate mentioned above for the hard coat film can be used, with plastic substrates (plastic films) being particularly preferred. The thickness of the substrate can be appropriately selected from the range of 0.01 to 10,000 μm, with a preferred thickness of 2 to 250 μm, more preferably 5 to 100 μm, and even more preferably 20 to 100 μm, based on considerations such as formability, shape conformability, and operability.

本發明之轉印用膜中之脫模層係構成本發明之轉印用膜中之基材之至少一表面層的層,且該層係用以使轉印層自基材容易剝離而設置。藉由設置脫模層,可將轉印層自轉印用膜確實且容易地轉印至被轉印體(成型品),可確實地剝離基材。The release layer in the transfer film of this invention forms at least one surface layer of the substrate in the transfer film and is provided to facilitate the release of the transfer layer from the substrate. The release layer ensures reliable and easy transfer of the transfer layer from the transfer film to the transfer target (molded article), allowing for reliable release of the substrate.

於本發明之轉印用膜中,脫模層與硬塗層之剝離強度並無特別限定,較佳為30~500 mN/24 mm,更佳為40~300 mN/24 mm,進而較佳為50~200 mN/24 mm。藉由使剝離強度處於該範圍,有通常之操作時硬塗層不會剝離,在轉印至成型品之同時可容易地剝離硬塗層之傾向。本發明之硬塗層與脫模層之剝離強度可依據JIS Z0237進行測定。In the transfer film of the present invention, the peel strength between the release layer and the hard coat layer is not particularly limited, but is preferably 30 to 500 mN/24 mm, more preferably 40 to 300 mN/24 mm, and even more preferably 50 to 200 mN/24 mm. By maintaining the peel strength within this range, the hard coat layer does not peel during normal handling, and tends to be easily peeled during transfer to a molded article. The peel strength of the hard coat layer and the release layer of the present invention can be measured in accordance with JIS Z0237.

再者,本發明之轉印膜中之脫模層可僅形成於上述基材之一表面(單面),亦可形成於兩表面(兩面)。又,本發明之轉印用膜中之脫模層可僅形成於上述基材之各表面之一部分,亦可形成於整個面。Furthermore, the release layer in the transfer film of the present invention may be formed on only one surface (single side) or both surfaces (double sides) of the substrate. Furthermore, the release layer in the transfer film of the present invention may be formed on only a portion of each surface of the substrate or on the entire surface.

作為形成脫模層之成分,可無特別限制地使用公知公用之脫模劑,例如可使用選自不飽和酯系樹脂、環氧系樹脂、環氧-三聚氰胺系樹脂、胺基醇酸系樹脂、丙烯酸系樹脂、三聚氰胺系樹脂、矽系樹脂、氟系樹脂、纖維素系樹脂、尿素樹脂系樹脂、聚烯烴系樹脂、石蠟系樹脂、環烯烴系樹脂中之至少一種。基於在轉印層中本發明之硬塗層與和其接觸之上述脫模層之剝離性之觀點,上述脫模層較佳為三聚氰胺系樹脂、環烯烴系樹脂,更佳為2-降莰烯-乙烯共聚物等環烯烴共聚物樹脂(COC樹脂)。As a component forming the release layer, a publicly known release agent can be used without particular limitation. For example, at least one selected from unsaturated ester resins, epoxy resins, epoxy-melamine resins, aminoalkyd resins, acrylic resins, melamine resins, silicone resins, fluororesins, cellulose resins, urea resins, polyolefin resins, wax resins, and cycloolefin resins can be used. From the perspective of the releasability of the hard coating layer of the present invention and the release layer in contact therewith in the transfer layer, the release layer is preferably a melamine-based resin or a cycloolefin-based resin, and more preferably a cycloolefin copolymer resin (COC resin) such as a 2-norbornene-ethylene copolymer.

將脫模層形成於基材表面之方法亦可無特別限制地使用公知公用之脫模處理法。例如可將上述樹脂分散或溶解於溶劑(例如甲醇、丁醇等醇類、甲苯、二甲苯等芳香族烴、四氫呋喃等),利用棒式塗佈、邁耶棒式塗佈、凹版塗佈、輥塗等公知之塗佈方法進行塗佈、乾燥,在80~200℃下進行加熱,藉此可形成脫模層。脫模層之厚度亦無特別限定,通常可自0.01~5 μm、較佳為0.1~3.0 μm之範圍內進行選擇。The release layer can be formed on the substrate surface using any known release treatment method without particular limitation. For example, the aforementioned resin can be dispersed or dissolved in a solvent (e.g., alcohols such as methanol and butanol, aromatic hydrocarbons such as toluene and xylene, tetrahydrofuran, etc.), applied using a known coating method such as rod coating, Mayer bar coating, gravure coating, or roll coating, dried, and heated at 80-200°C to form the release layer. The thickness of the release layer is also not particularly limited, but can generally be selected from a range of 0.01-5 μm, preferably 0.1-3.0 μm.

本發明之轉印用膜中之硬塗層為構成上述脫模層中之至少一表面層之層,且為使本發明之硬化性組成物(硬塗劑)乾燥而得之未硬化層、或經局部硬化而得之半硬化層。半硬化之硬塗層可藉由將未硬化之硬塗層利用上述活性能量線照射或加熱以使硬化局部進行而形成。本發明之未硬化或半硬化之硬塗層具有手指接觸表面時不會附著樹脂之低黏性及優異之耐黏連性,能夠捲繞成卷狀進行操作。The hard coat layer in the transfer film of the present invention constitutes at least one surface layer of the release layer and is an uncured layer obtained by drying the curable composition (hard coat) of the present invention, or a semi-cured layer obtained by partial curing. The semi-cured hard coat layer can be formed by irradiating the uncured hard coat layer with the aforementioned active energy rays or heating it to partially cure it. The uncured or semi-cured hard coat layer of the present invention has low viscosity, preventing the resin from sticking to the surface when touched by fingers, and has excellent anti-blocking properties, allowing it to be rolled up for easy handling.

再者,本發明之轉印用膜中之硬塗層可僅形成於上述基材之一脫模層(單面),亦可形成於兩脫模層(兩面)。又,本發明之轉印用膜中之本發明之硬塗層可僅形成於上述脫模層之各表面之一部分,亦可形成於整個面。Furthermore, the hard coating layer in the transfer film of the present invention may be formed on only one release layer (one side) of the substrate, or on both release layers (both sides). Furthermore, the hard coating layer in the transfer film of the present invention may be formed on only a portion of each surface of the release layer, or on the entire surface.

於本發明之轉印用膜之脫模層上積層硬塗層之方法並無特別限定,可列舉如下方法:利用公知之方法於脫模層上塗佈本發明之硬化性組成物(硬塗劑)並使之乾燥而形成未硬化之硬塗層;或者進而對未硬化之硬塗層進行活性能量線照射或加熱而形成半硬化之硬塗層。本發明之硬化性組成物(硬塗劑)之塗佈方法可無限制地使用公知之塗佈方法,例如可列舉棒式塗佈機塗佈、邁耶棒塗佈、氣刀塗佈、凹版塗佈、膠版印刷、軟版印刷、網版印刷等。形成硬塗層時之加熱溫度並無特別限定,較佳為可自50~200℃適當選擇。加熱時間亦無特別限定,較佳為可自1~60分鐘適當選擇。對硬塗層照射活性能量線之條件並無特別限定,例如能夠自上述形成硬化物時之條件適當選擇。The method for depositing the hard coating layer on the release layer of the transfer film of the present invention is not particularly limited. Examples of such methods include coating the curable composition (hard coating agent) of the present invention on the release layer using a known method and drying the hard coating layer to form an uncured hard coating layer; or further irradiating the uncured hard coating layer with active energy rays or heating the hard coating layer to form a semi-cured hard coating layer. The curable composition (hard coat) of the present invention can be applied using any known coating method, including, without limitation, rod coater coating, Mayer bar coating, air knife coating, gravure coating, offset printing, flexographic printing, and screen printing. The heating temperature for forming the hard coat is not particularly limited but can be suitably selected from 50 to 200°C. The heating time is also not particularly limited but can be suitably selected from 1 to 60 minutes. The conditions for irradiating the hard coat with active energy rays are not particularly limited and can be suitably selected from the conditions for forming the cured product described above.

本發明之轉印用膜中之硬塗層之厚度(於基材之兩面具有硬塗層之情形時,為各硬塗層之厚度)並無特別限定,較佳為1~200 μm,更佳為3~150 μm。即便硬塗層較薄(例如厚度5 μm以下)時,亦可維持表面之高硬度(例如使鉛筆硬度為5H以上)。又,即便硬塗層較厚(例如厚度50 μm以上)時,亦不易發生因硬化收縮等所引起之龜裂產生等不良情況,因此,仍可藉由厚膜化而顯著提高鉛筆硬度(例如使鉛筆硬度為9H以上)。The thickness of the hard coat layer in the transfer film of the present invention (when a hard coat layer is provided on both sides of the substrate, the thickness of each hard coat layer) is not particularly limited, but is preferably 1 to 200 μm, more preferably 3 to 150 μm. Even with a thin hard coat layer (e.g., 5 μm or less), high surface hardness (e.g., a pencil hardness of 5H or higher) can be maintained. Furthermore, even with a thicker hard coat layer (e.g., 50 μm or greater), problems such as cracking caused by curing shrinkage are less likely to occur. Therefore, thicker films can significantly increase pencil hardness (e.g., a pencil hardness of 9H or higher).

本發明之轉印用膜中之硬塗層之霧度並無特別限定,於厚度50 μm時,較佳為1.5%以下,更佳為1.0%以下。再者,霧度之下限並無特別限定,例如為0.1%。藉由將霧度設為1.0%以下,例如於使用本發明之轉印用膜作為加飾膜之情形時,能夠鮮明地轉印花紋、圖樣等,故較佳。本發明之硬塗層之霧度可依據JIS K7136進行測定。The haze of the hard coat layer in the transfer film of the present invention is not particularly limited. At a thickness of 50 μm, it is preferably 1.5% or less, and more preferably 1.0% or less. Furthermore, the lower limit of the haze is not particularly limited, but is, for example, 0.1%. A haze of 1.0% or less is preferred, as it allows for clear transfer of patterns and designs, for example, when the transfer film of the present invention is used as a decorative film. The haze of the hard coat layer of the present invention can be measured in accordance with JIS K7136.

本發明之轉印用膜中之硬塗層之全光線穿透率並無特別限定,於厚度50 μm時,較佳為85%以上,更佳為90%以上。再者,全光線穿透率之上限並無特別限定,例如為99%。藉由將全光線穿透率設為85%以上,例如於使用本發明之轉印用膜作為加飾膜之情形時,能夠鮮明地轉印花紋、圖樣等,故較佳。本發明之硬塗層之全光線穿透率可依據JIS K7361-1進行測定。The total light transmittance of the hard coat layer in the transfer film of the present invention is not particularly limited. At a thickness of 50 μm, it is preferably 85% or greater, and more preferably 90% or greater. Furthermore, the upper limit of the total light transmittance is not particularly limited, but may be 99% for example. A total light transmittance of 85% or greater is preferred, for example, when the transfer film of the present invention is used as a decorative film, as it enables clear transfer of patterns and designs. The total light transmittance of the hard coat layer of the present invention can be measured in accordance with JIS K7361-1.

本發明之轉印用膜較佳為於硬塗層上依序進而積層增黏塗層及接著劑層。進而,於使用本發明之轉印用膜作為加飾膜之情形時,積層至少一層之著色層。著色層之積層位置並無特別限定,較佳為於增黏塗層與接著劑層之間積層1層或2層以上之態樣。The transfer film of the present invention preferably has an adhesion-promoting coating layer and an adhesive layer sequentially deposited on a hard coat layer. Furthermore, when the transfer film of the present invention is used as a decorative film, at least one coloring layer is deposited. While the location of the coloring layer is not particularly limited, it is preferably deposited as one or two or more layers between the adhesion-promoting coating layer and the adhesive layer.

本發明之轉印用膜中之增黏塗層係用以使硬塗層與接著劑層或著色層等之密接性提昇而設置。增黏塗層較佳為透明或半透明之層,以使著色層之花紋、圖樣等鮮明地轉印,可使用酚樹脂、醇酸樹脂、三聚氰胺系樹脂(例如甲基化三聚氰胺樹脂、丁基化三聚氰胺樹脂、甲醚化三聚氰胺樹脂、丁醚化三聚氰胺樹脂、甲基丁基混合醚化三聚氰胺樹脂等)、環氧系樹脂(例如雙酚A型環氧樹脂、雙酚F型環氧樹脂、多官能環氧樹脂、可撓性環氧樹脂、溴化環氧樹脂、環氧丙酯型環氧樹脂、高分子型環氧樹脂、聯苯型環氧樹脂等)、尿素樹脂、不飽和聚酯樹脂、胺酯(urethane)系樹脂[例如可藉由具有2個以上異氰酸基之聚異氰酸酯化合物(O=C=N-R-N=C=O)與具有2個以上羥基之多元醇化合物(HO-R'-OH)、聚胺(H 2N-R''-NH 2)、或水等具有活性氫(-NH 2,-NH,-CONH-等)之化合物等之反應而獲得之胺酯樹脂]、熱硬化性聚醯亞胺、聚矽氧樹脂等熱硬化性樹脂;或氯乙烯-乙酸乙烯酯共聚物樹脂、丙烯酸樹脂(例如丙烯酸多元醇系樹脂等)、氯化橡膠、聚醯胺樹脂、硝化棉樹脂、環狀聚烯烴系樹脂等熱塑性樹脂等中之單獨1種、或2種以上之混合物,較佳為環氧系樹脂。 The adhesion-enhancing coating layer in the transfer film of the present invention is provided to enhance the adhesion between the hard coating layer and the adhesive layer or the coloring layer. The adhesion-enhancing coating layer is preferably a transparent or translucent layer so that the patterns and designs of the coloring layer can be transferred clearly. Phenolic resins, alkyd resins, melamine resins (such as methylated melamine resins, butylated melamine resins, methylated melamine resins, butylated melamine resins, methylbutyl mixed etherified melamine resins, etc.), epoxy resins (such as bisphenol A epoxy resins, bisphenol F epoxy resins, multifunctional epoxy resins) can be used. Resins, flexible epoxy resins, brominated epoxy resins, epoxy propyl type epoxy resins, high molecular weight epoxy resins, biphenyl type epoxy resins, etc.), urea resins, unsaturated polyester resins, urethane resins [for example, polyisocyanate compounds (O=C=NRN=C=O) with two or more isocyanate groups and polyol compounds (HO-R'-OH) with two or more hydroxyl groups, polyamines (H 2 N-R''-NH 2 ), or water and compounds having active hydrogen (-NH 2 , -NH, -CONH-, etc.)], thermosetting resins such as thermosetting polyimide and polysilicone resins; or thermoplastic resins such as vinyl chloride-vinyl acetate copolymer resins, acrylic resins (such as acrylic polyol resins), chlorinated rubber, polyamide resins, nitrocellulose resins, cyclic polyolefin resins, etc., either alone or as a mixture of two or more thereof, preferably epoxy resins.

上述增黏塗層用樹脂亦可在無損本發明之效果之範圍內進而含有蠟、氧化矽、塑化劑、調平劑、界面活性劑、分散劑、消泡劑、紫外線吸收劑、紫外線穩定劑、抗氧化劑等慣用之添加劑作為其他任意之成分。該等添加劑可單獨使用1種,或組合2種以上使用。The above-mentioned adhesion-enhancing coating resin may further contain conventional additives such as wax, silica, plasticizer, leveling agent, surfactant, dispersant, defoaming agent, UV absorber, UV stabilizer, antioxidant, etc. as other optional ingredients within a range that does not impair the effectiveness of the present invention. These additives may be used alone or in combination of two or more.

增黏塗層可將使上述樹脂溶解於溶劑而得之塗佈液利用棒式塗佈、邁耶棒式塗佈、凹版塗佈、輥塗等公知之塗佈方法塗佈於本發明之硬塗層上並進行乾燥,視需要進行加熱而形成。形成增黏塗層時進行加熱時之溫度並無特別限定,較佳為可自50~200℃適當選擇。加熱時間亦無特別限定,較佳為可自10秒~60分鐘適當選擇。The tackifying coating layer can be formed by applying a coating solution obtained by dissolving the above-mentioned resin in a solvent onto the hard coating layer of the present invention using a known coating method such as rod coating, Mayer bar coating, gravure coating, or roller coating, followed by drying and, if necessary, heating. The temperature for heating the tackifying coating layer is not particularly limited, but is preferably selected from 50 to 200°C. The heating time is also not particularly limited, but is preferably selected from 10 seconds to 60 minutes.

增黏塗層之厚度通常為0.1~20 μm左右,較佳為0.5~5 μm之範圍。The thickness of the adhesion-promoting coating is usually around 0.1 to 20 μm, preferably in the range of 0.5 to 5 μm.

本發明之增黏塗層可使用市售之增黏塗佈劑來形成。作為市售之增黏塗佈劑,例如可列舉:K468HP Anchor(東洋油墨股份有限公司製造之環氧樹脂系增黏塗佈劑)、TM-VMAC(大日精化工業股份有限公司製造之丙烯酸多元醇樹脂系增黏塗佈劑)等。The adhesion-enhancing coating of the present invention can be formed using a commercially available adhesion-enhancing coating agent. Examples of commercially available adhesion-enhancing coating agents include K468HP Anchor (an epoxy resin-based adhesion-enhancing coating agent manufactured by Toyo Ink Co., Ltd.) and TM-VMAC (an acrylic polyol resin-based adhesion-enhancing coating agent manufactured by Dainichi Seika Co., Ltd.).

本發明之轉印用膜中之接著劑層係用以將轉印層(包含硬塗層、視需要積層之增黏塗層、及著色層)接著性良好地轉印至成型品而設置。作為接著劑層,可列舉由感熱接著劑或加壓接著劑等構成者,於本發明中,較佳為視需要藉由加熱及加壓,而對成型品表現密接性之熱密封層。作為接著劑層所使用之樹脂,例如可使用丙烯酸樹脂、氯乙烯系樹脂、乙酸乙烯酯系樹脂、氯乙烯-乙酸乙烯酯系共聚樹脂、苯乙烯-丙烯酸系共聚樹脂、聚酯系樹脂、聚醯胺系樹脂等樹脂中之單獨1種或2種以上之混合物,較佳為丙烯酸系樹脂、氯乙烯-乙酸乙烯酯系共聚樹脂。The adhesive layer in the transfer film of the present invention is used to ensure good adhesion between the transfer layer (including the hard coat layer, the optional adhesion-promoting coat layer, and the coloring layer) and the molded article. Examples of adhesive layers include those composed of heat-sensitive adhesives and pressurized adhesives. In the present invention, a heat sealant layer is preferred, which can achieve close adhesion to the molded article by applying heat and pressure, as required. As the resin used for the adhesive layer, for example, acrylic resin, vinyl chloride resin, vinyl acetate resin, vinyl chloride-vinyl acetate copolymer, styrene-acrylic copolymer, polyester resin, polyamide resin, etc. can be used alone or as a mixture of two or more resins. Acrylic resin and vinyl chloride-vinyl acetate copolymer are preferred.

作為本發明之接著劑層所使用之丙烯酸系樹脂,例如可列舉:聚(甲基)丙烯酸甲酯、聚(甲基)丙烯酸乙酯、聚(甲基)丙烯酸丁酯、(甲基)丙烯酸甲酯-(甲基)丙烯酸丁酯共聚物、(甲基)丙烯酸甲酯-苯乙烯共聚物等丙烯酸系樹脂;經氟等改質之改質丙烯酸樹脂,該等可以1種或以2種以上之混合物之形式使用。此外,亦可使用使(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸辛酯等(甲基)丙烯酸烷基酯與(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丁酯、(甲基)丙烯酸2-羥基-3-苯氧基丙酯等分子中具有羥基之(甲基)丙烯酸酯共聚而獲得之丙烯酸多元醇酯。又,作為氯乙烯-乙酸乙烯酯系共聚物樹脂,通常可使用乙酸乙烯酯含量為5~20質量%左右、平均聚合度350~900左右者。亦可視需要使氯乙烯-乙酸乙烯酯系共聚物樹脂進而與順丁烯二酸、反丁烯二酸等羧酸進行共聚。此外,作為副成分之樹脂,亦可視需要適當混合其他樹脂,例如熱塑性聚酯系樹脂、熱塑性胺酯系樹脂、氯化聚乙烯、氯化聚丙烯等氯化聚烯烴系樹脂等樹脂。Examples of acrylic resins used in the adhesive layer of the present invention include polymethyl (meth)acrylate, polyethyl (meth)acrylate, polybutyl (meth)acrylate, methyl (meth)acrylate-butyl (meth)acrylate copolymers, and methyl (meth)acrylate-styrene copolymers. Modified acrylic resins modified with fluorine or the like may be used alone or as a mixture of two or more. Furthermore, acrylic polyol esters obtained by copolymerizing alkyl (meth)acrylates such as methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, and octyl (meth)acrylate with (meth)acrylates having a hydroxyl group in the molecule such as 2-hydroxyethyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, and 2-hydroxy-3-phenoxypropyl (meth)acrylate may also be used. As the vinyl chloride-vinyl acetate copolymer resin, those having a vinyl acetate content of approximately 5 to 20% by mass and an average degree of polymerization of approximately 350 to 900 are generally used. Optionally, the vinyl chloride-vinyl acetate copolymer resin may be further copolymerized with a carboxylic acid such as maleic acid or fumaric acid. Furthermore, as auxiliary resin components, other resins, such as thermoplastic polyester resins, thermoplastic urethane resins, and chlorinated polyolefin resins such as chlorinated polyethylene and chlorinated polypropylene, may be appropriately blended as needed.

接著劑層可將上述樹脂之1種或2種以上之溶液或乳液等製成可塗佈之形態者利用棒式塗佈、邁耶棒式塗佈、凹版塗佈、輥塗等公知之塗佈方法進行塗佈、乾燥,並視需要進行加熱而形成。形成接著劑層時進行加熱時之溫度較佳為可自50~200℃適當選擇。加熱時間較佳為可自10秒~60分鐘適當選擇。The adhesive layer can be formed by applying a solution or emulsion of one or more of the above-mentioned resins in a coatable form using a known coating method such as rod coating, Mayer bar coating, gravure coating, or roll coating, followed by drying and, if necessary, heating. The heating temperature for forming the adhesive layer is preferably selected from 50 to 200°C. The heating time is preferably selected from 10 seconds to 60 minutes.

基於可使轉印用膜接著性良好且有效率地轉印至成型品之方面,接著劑層之厚度較佳為0.1~10 μm左右,更佳為0.5~5 μm。In order to ensure good adhesion of the transfer film and efficient transfer to the molded article, the thickness of the adhesive layer is preferably about 0.1 to 10 μm, more preferably 0.5 to 5 μm.

接著劑層中可摻合:二苯甲酮系化合物、苯并三唑系化合物、草醯苯胺(oxanilide)系化合物、氰基丙烯酸酯系化合物、水楊酸酯系化合物等有機系紫外線吸收劑;或如鋅、鈦、鈰、錫、鐵等之氧化物般無機系的具有紫外線吸收能力之微粒子添加劑。又,作為添加劑,亦可視需要適當使用著色顏料、白色顏料、體質顏料、填充劑、抗靜電劑、抗氧化劑、螢光增白劑等。The adhesive layer may contain organic UV absorbers such as benzophenone compounds, benzotriazole compounds, oxanilide compounds, cyanoacrylate compounds, and salicylate compounds; or inorganic UV-absorbing microparticle additives such as oxides of zinc, titanium, arsenic, tin, and iron. Additionally, additives such as coloring pigments, white pigments, textured pigments, fillers, antistatic agents, antioxidants, and fluorescent whitening agents may be used as needed.

上述接著劑亦可使用市售品。作為市售之接著劑,例如可列舉:K588HP Adhesive gloss A varnish(東洋油墨股份有限公司製造之氯乙烯-乙酸乙烯酯共聚樹脂系接著劑)、PSHP780(東洋油墨股份有限公司製造之丙烯酸系樹脂系接著劑)等。Commercially available adhesives may also be used. Examples of commercially available adhesives include K588HP Adhesive Gloss A Varnish (a vinyl chloride-vinyl acetate copolymer adhesive manufactured by Toyo Ink Co., Ltd.) and PSHP780 (an acrylic resin adhesive manufactured by Toyo Ink Co., Ltd.).

本發明之轉印膜中之著色層係於製成用以將圖樣層及/或隱蔽層轉印至成型品之加飾膜時所設置者。此處,圖樣層係用以表現花紋或文字等及圖案狀之圖樣所設置之層,隱蔽層通常為整面滿版(solid)層,該層係用以掩蔽射出樹脂等之著色等而設置。隱蔽層有時設置於圖樣層之內側以使圖樣層之圖樣明顯,此外還會僅由隱蔽層形成裝飾層。The coloring layer in the transfer film of this invention is applied when creating a decorative film used to transfer a pattern layer and/or concealing layer to a molded article. Here, the pattern layer is used to express patterns, text, and other graphic designs, while the concealing layer is typically a solid layer used to mask the coloring of injection molding resins. The concealing layer is sometimes placed inside the pattern layer to highlight the pattern layer's design, and sometimes the decorative layer consists solely of the concealing layer.

本發明之圖樣層係為了表現花紋或文字等及圖案狀之圖樣而設置之層。圖樣層之圖樣任意,例如可列舉由木紋、石紋、布紋、粒紋、幾何花紋、文字等構成之圖樣。The pattern layer of the present invention is provided for displaying patterns, text, and other graphic designs. The pattern layer can be any pattern, for example, patterns consisting of wood grain, stone grain, cloth grain, grain pattern, geometric patterns, text, etc.

著色層通常係於上述硬塗層或增黏塗層上印刷油墨並藉由凹版印刷、膠版印刷、絲網印刷、自轉印片之轉印印刷、昇華轉印印刷、噴墨印刷等公知之印刷法而形成,藉此可形成於硬塗層與接著劑層之間、或增黏塗層與接著劑層之間。著色層之厚度基於設計性之觀點,較佳為3~40 μm,更佳為10~30 μm。The coloring layer is typically formed by printing ink onto the hardcoat or adhesion-enhancing layer using known printing methods such as gravure printing, offset printing, screen printing, transfer printing from a transfer sheet, sublimation transfer printing, and inkjet printing. This layer can be formed between the hardcoat and adhesive layer, or between the adhesion-enhancing layer and adhesive layer. The thickness of the coloring layer is preferably 3-40 μm, more preferably 10-30 μm, based on design considerations.

作為用於形成著色層之印刷油墨之黏合劑樹脂,可較佳地列舉聚酯系樹脂、聚胺酯系樹脂、丙烯酸系樹脂、乙酸乙烯酯系樹脂、氯乙烯-乙酸乙烯酯系共聚物樹脂、纖維素系樹脂等,較佳為僅以丙烯酸系樹脂為主成分、或以丙烯酸系樹脂與氯乙烯-乙酸乙烯酯系共聚物樹脂之混合物為主成分。該等之中,將丙烯酸系樹脂、氯乙烯-乙酸乙烯酯系共聚物樹脂或其他丙烯酸系樹脂混合時,印刷適應性、成形適應性變得更良好,故較佳。此處,作為丙烯酸系樹脂,可列舉:聚(甲基)丙烯酸甲酯、聚(甲基)丙烯酸乙酯、聚(甲基)丙烯酸丁酯、(甲基)丙烯酸甲酯-(甲基)丙烯酸丁酯共聚物、(甲基)丙烯酸甲酯-苯乙烯共聚物等丙烯酸系樹脂、經氟等改質之改質丙烯酸樹脂,可以該等中之1種或以2種以上之混合物之形式使用。此外,亦可使用使(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸辛酯等(甲基)丙烯酸烷基酯與(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丁酯、(甲基)丙烯酸2-羥基-3-苯氧基丙酯等分子中具有羥基之(甲基)丙烯酸酯進行共聚而獲得之丙烯酸多元醇酯。又,作為氯乙烯-乙酸乙烯酯系共聚物樹脂,通常使用乙酸乙烯酯含量為5~20質量%左右、平均聚合度350~900左右者。亦可視需要使氯乙烯-乙酸乙烯酯系共聚物樹脂進而與順丁烯二酸、反丁烯二酸等羧酸進行共聚。丙烯酸系樹脂與氯乙烯-乙酸乙烯酯系共聚物樹脂之混合比為丙烯酸系樹脂/氯乙烯-乙酸乙烯酯系共聚物樹脂=1/9~9/1(質量比)左右。此外,作為副成分之樹脂,可視需要適當混合其他樹脂,例如熱塑性聚酯系樹脂、熱塑性胺酯系樹脂、氯化聚乙烯、氯化聚丙烯等氯化聚烯烴系樹脂等樹脂。Preferred binder resins for printing inks used to form the color layer include polyester resins, polyurethane resins, acrylic resins, vinyl acetate resins, vinyl chloride-vinyl acetate copolymer resins, and cellulose resins. Preferred binders are those containing only acrylic resins as the main component, or mixtures of acrylic resins and vinyl chloride-vinyl acetate copolymer resins as the main component. Among these, blends of acrylic resins, vinyl chloride-vinyl acetate copolymer resins, and other acrylic resins are preferred because they offer improved printability and molding properties. Examples of acrylic resins include polymethyl (meth)acrylate, polyethyl (meth)acrylate, polybutyl (meth)acrylate, methyl (meth)acrylate-butyl (meth)acrylate copolymers, methyl (meth)acrylate-styrene copolymers, and modified acrylic resins modified with fluorine or the like. These resins may be used alone or as a mixture of two or more. Furthermore, acrylic polyol esters obtained by copolymerizing alkyl (meth)acrylates such as methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, and octyl (meth)acrylate with (meth)acrylates having a hydroxyl group in the molecule such as 2-hydroxyethyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, and 2-hydroxy-3-phenoxypropyl (meth)acrylate may also be used. Furthermore, vinyl chloride-vinyl acetate copolymer resins generally have a vinyl acetate content of approximately 5-20% by mass and an average degree of polymerization of approximately 350-900. Optionally, vinyl chloride-vinyl acetate copolymer resins may be further copolymerized with carboxylic acids such as maleic acid and fumaric acid. The mixing ratio of acrylic resin to vinyl chloride-vinyl acetate copolymer resin is approximately 1/9 to 9/1 (mass ratio): acrylic resin/vinyl chloride-vinyl acetate copolymer resin. Furthermore, other resins may be mixed as auxiliary resins, such as thermoplastic polyester resins, thermoplastic urethane resins, and chlorinated polyolefin resins such as chlorinated polyethylene and chlorinated polypropylene.

作為上述著色層所使用之著色劑,可使用由鋁、鉻、鎳、錫、鈦、磷化鐵、銅、金、銀、黃銅等金屬、合金、或金屬化合物之鱗片狀箔粉構成之金屬顏料;由雲母狀氧化鐵、二氧化鈦被覆雲母、二氧化鈦被覆氧氯化鉍、氧氯化鉍、二氧化鈦被覆滑石、魚鱗箔、著色二氧化鈦被覆雲母、鹼性碳酸鉛等之箔粉構成之珠光(pearl)顏料;鋁酸鍶、鋁酸鈣、鋁酸鋇、硫化鋅、硫化鈣等螢光顏料;二氧化鈦、鋅白、三氧化二銻等白色無機顏料;鋅白、紅丹、朱紅、群青、鈷藍、鈦黃、黃鉛、碳黑等無機顏料;異吲哚啉酮黃、漢薩黃A、喹吖酮紅、永固紅(permanent red)4R、酞青藍、陰丹士林藍RS、苯胺黑等有機顏料(亦包含染料)中之1種或混合2種以上使用。As the coloring agent used for the coloring layer, metallic pigments can be used, which are composed of scaly foil powder of metals, alloys, or metal compounds such as aluminum, chromium, nickel, tin, titanium, iron phosphide, copper, gold, silver, and brass; and pigments composed of mica-like iron oxide, titanium dioxide-coated mica, titanium dioxide-coated bismuth oxychloride, bismuth oxychloride, titanium dioxide-coated talc, fish scale foil, colored titanium dioxide-coated mica, alkaline Pearlescent pigments made from lead carbonate and other foil powders; fluorescent pigments such as strontium aluminate, calcium aluminate, barium aluminate, zinc sulfide, and calcium sulfide; white inorganic pigments such as titanium dioxide, zinc white, and antimony trioxide; inorganic pigments such as zinc white, red lead, vermilion, ultramarine, cobalt blue, titanium yellow, yellow lead, and carbon black; and organic pigments (including dyes) such as isoindolinone yellow, Hansa Yellow A, quinacridone red, permanent red 4R, phthalocyanine blue, indanthrene blue RS, and aniline black, one or a mixture of two or more.

此種著色層係用以對本發明之轉印用膜賦予設計性而設置之層,為了提昇設計性,亦可進而形成金屬薄膜層等。金屬薄膜層之形成可使用鋁、鉻、金、銀、銅等金屬,利用真空蒸鍍、濺鍍等方法進行製膜。該金屬薄膜層可設置於整個面,亦可局部設置成圖案狀。This coloring layer is used to add design to the transfer film of the present invention. To enhance design, a metal thin film layer may also be formed. Metal thin films can be formed using methods such as vacuum evaporation and sputtering using aluminum, chromium, gold, silver, and copper. The metal thin film layer can be applied across the entire surface or partially patterned.

用於形成著色層之印刷油墨除上述成分以外,還可適當添加沈澱防止劑、硬化觸媒、紫外線吸收劑、抗氧化劑、調平劑、增黏劑、消泡劑、潤滑劑等。印刷油墨可以將上述成分溶解或分散於常用溶劑之態樣提供。溶劑只要為使黏合劑樹脂溶解或分散者即可,可使用有機溶劑及/或水。作為有機溶劑,可列舉:甲苯、二甲苯等烴類、丙酮、甲基乙基酮等酮類、乙酸乙酯、乙酸賽璐蘇、丁基賽璐蘇乙酸酯等酯類、醇類。In addition to the above ingredients, printing inks used to form the coloring layer may also contain appropriate additives such as anti-precipitants, curing catalysts, UV absorbers, antioxidants, leveling agents, thickeners, defoamers, and lubricants. Printing inks can be provided by dissolving or dispersing the above ingredients in a common solvent. Any solvent capable of dissolving or dispersing the binder resin can be used, and organic solvents and/or water can be used. Examples of organic solvents include hydrocarbons such as toluene and xylene, ketones such as acetone and methyl ethyl ketone, esters such as ethyl acetate, celluloic acid, and butyl celluloic acid acetate, and alcohols.

本發明之轉印用膜除積層有上述基材、脫模層、硬塗層、增黏塗層、接著劑層、著色層以外,視需要還以任意之順序積層低反射層、抗靜電層、紫外線吸收層、近紅外線阻斷層、電磁波吸收層等。The transfer film of the present invention is laminated with the aforementioned substrate, release layer, hard coat layer, adhesion promoter layer, adhesive layer, and coloring layer, and optionally further laminated with a low-reflection layer, antistatic layer, ultraviolet absorption layer, near-infrared blocking layer, and electromagnetic wave absorption layer in any order.

本發明之轉印用膜之厚度並無特別限定,可自1~10000 μm之範圍內適當選擇,基於成型性或形狀追隨性、操作性等觀點,較佳為2~250 μm,更佳為5~150 μm,進而較佳為25~150 μm。The thickness of the transfer film of the present invention is not particularly limited and can be appropriately selected from the range of 1 to 10,000 μm. Based on the viewpoints of formability, shape tracking, and operability, it is preferably 2 to 250 μm, more preferably 5 to 150 μm, and even more preferably 25 to 150 μm.

本發明之轉印用膜之硬塗層由於不黏著且耐黏連性優異,能夠捲取成卷狀進行操作,故適宜用作模內射出成型之轉印用膜。例如,於由固定模具與可動模具組成之模具內,用搬送輥等連續地搬送本發明之轉印用膜,使基材膜側與固定模具面接觸,適當地調整位置後,使可動模具移動來鎖模。然後,將預先經熱熔融之熱塑性樹脂於高溫高壓下自轉印用膜之轉印層側射出填充至模具內,急速冷卻後打開模具,便可取出本發明之硬塗層被轉印至最表面之成型品(模內成型品)。The hard coating layer of the transfer film of the present invention is non-sticky and has excellent adhesion resistance, allowing it to be rolled up for handling, making it suitable for use as a transfer film for in-mold injection molding. For example, within a mold consisting of a fixed mold and a movable mold, the transfer film of the present invention is continuously transported using a conveyor roller, etc., so that the substrate film side contacts the fixed mold surface. After appropriately adjusting the position, the movable mold is moved to lock the mold. Then, a pre-molded thermoplastic resin is injected from the transfer layer side of the transfer film under high temperature and high pressure to fill the mold. After rapid cooling, the mold is opened, and the molded product (in-mold molded product) with the hard coating layer of the present invention transferred to the outermost surface can be removed.

於上述成型品之本發明之硬塗層為未硬化或半硬化之情形時,可對該硬塗層照射活性能量線及/或進行加熱而使硬塗層硬化。對硬塗層照射活性能量線及/或進行加熱時之條件並無特別限定,例如能夠自上述形成硬化物時之條件中適當選擇。If the hard coat layer of the molded article of the present invention is uncured or semi-cured, the hard coat layer can be cured by irradiating the hard coat layer with active energy rays and/or heating the hard coat layer. The conditions for irradiating the hard coat layer with active energy rays and/or heating the hard coat layer are not particularly limited and can be appropriately selected from the conditions for forming a cured article described above.

本發明之轉印用膜之轉印層被轉印至成型品之後,於成型品之最表面形成本發明之硬化硬塗層,因此,可使成型品表面之鉛筆硬度非常高,較佳為5H以上,更佳為6H以上。再者,鉛筆硬度可依據JIS K5600-5-4中記載之方法進行評價。After the transfer layer of the transfer film of the present invention is transferred to a molded article, a hardened hardcoat of the present invention is formed on the outermost surface of the molded article. This allows the surface of the molded article to have a very high pencil hardness, preferably 5H or higher, more preferably 6H or higher. Pencil hardness can be evaluated according to the method described in JIS K5600-5-4.

使用本發明之轉印用膜藉由模內射出成型法所製造之成型品(模內成型品)由於表面硬度非常高,圖樣、花紋被鮮明地轉印,故可較佳地用於要求此種特性之所有成型品。本發明之轉印用膜例如適宜用於汽車之儀錶盤等車內外飾件、家電製品之殼體等要求高表面硬度及耐擦傷性、設計性、耐久性之各種外裝成型品。Molded articles (in-mold molded articles) produced using the transfer film of this invention via in-mold injection molding exhibit exceptionally high surface hardness, allowing for vivid transfer of designs and patterns. This makes it ideal for all molded articles requiring these properties. For example, the transfer film of this invention is suitable for various exterior molded articles requiring high surface hardness, scratch resistance, design, and durability, such as automotive dashboards and other interior and exterior trims, and home appliance housings.

[接著片] 藉由使用本發明之硬化性組成物(接著性用硬化性組成物、積層半導體用硬化性組成物),可獲得於基材之至少一面具有由本發明之硬化性組成物形成之接著劑層之接著片。圖11係本發明之接著片之一實施方式之示意圖(剖面圖)。3表示接著片,31表示接著劑層,32表示基材,33表示增黏塗層。 [Adhesive Sheet] Using the curable composition of the present invention (curable composition for adhesive, curable composition for laminated semiconductors) yields an adhesive sheet having an adhesive layer formed from the curable composition of the present invention on at least one side of a substrate. Figure 11 is a schematic diagram (cross-sectional view) of one embodiment of the adhesive sheet of the present invention. Reference numeral 3 represents the adhesive sheet, reference numeral 31 represents the adhesive layer, reference numeral 32 represents the substrate, and reference numeral 33 represents the adhesion-promoting coating layer.

上述接著片例如可藉由將本發明之硬化性組成物(接著性用硬化性組成物、積層半導體用硬化性組成物)塗佈於基材,進而視需要進行乾燥來獲得。塗佈方法並無特別限定,可使用周知慣用之手段。又,乾燥之手段或條件亦無特別限定,條件可設定為儘可能去除溶劑等揮發成分之條件,且可使用周知慣用之手段。於本發明之硬化性組成物含有相對於Celloxide 2021P(Daicel(股)製造)100重量份添加1重量份而獲得之組成物於130℃之熱硬化時間為3.5分鐘以上的聚合起始劑之情形時,藉由進行加熱乾燥,可抑制硬化反應之進行且迅速地去除溶劑等揮發分,從而形成接著劑層。如此獲得之接著劑層具有如下特性:於未達50℃時不具有接著性,藉由在能夠抑制對半導體晶片等電子零件之損傷的溫度進行加熱而表現接著性,其後迅速地硬化。上述接著片不僅包含片狀,還包含膜狀、帶狀、板狀等類似片狀之形態。The aforementioned adhesive sheet can be obtained, for example, by applying the curable composition of the present invention (curable composition for adhesives, curable composition for laminated semiconductors) to a substrate and then drying it as needed. The coating method is not particularly limited, and conventional methods can be used. Furthermore, the drying method and conditions are not particularly limited; the conditions can be set to remove volatile components such as solvents as much as possible, and conventional methods can be used. When the curable composition of the present invention contains a polymerization initiator whose curing time at 130°C is 3.5 minutes or longer when 1 part by weight of Celloxide 2021P (manufactured by Daicel Co., Ltd.) is added to 100 parts by weight, heat drying can suppress the progress of the curing reaction and rapidly remove volatile components such as solvents, thereby forming an adhesive layer. The adhesive layer thus obtained has the following characteristics: it has no adhesive properties below 50°C, exhibits adhesive properties by heating to a temperature that can suppress damage to electronic components such as semiconductor chips, and then rapidly cures. The above-mentioned adhesive sheet includes not only sheets but also sheet-like forms such as films, tapes, and plates.

上述接著片可為僅於基材之單面側具有接著劑層之單面接著片,亦可為於基材之兩面側具有接著劑層之雙面接著片。於上述接著片為雙面接著片之情形時,至少一接著劑層為由本發明之硬化性組成物形成之接著劑層即可,另一者可為該接著劑層,亦可為該接著劑層以外之接著劑層(其他接著劑層)。The adhesive sheet may be a single-sided adhesive sheet having an adhesive layer on only one side of the substrate, or a double-sided adhesive sheet having adhesive layers on both sides of the substrate. In the case of a double-sided adhesive sheet, at least one adhesive layer may be an adhesive layer formed from the curable composition of the present invention; the other adhesive layer may be the aforementioned adhesive layer or an adhesive layer other than the aforementioned adhesive layer (an additional adhesive layer).

本發明之接著片中之基材可使用周知慣用之基材(用於接著片之基材),並無特別限定,例如可列舉:塑膠基材、金屬基材、陶瓷基材、半導體基材、玻璃基材、紙基材、木基材、表面為塗裝表面之基材等。又,本發明之接著片中之基材可為所謂剝離襯墊。再者,本發明之接著片可為僅具有1層基材者,亦可為具有2層以上者。又,上述基材之厚度並無特別限定,例如可自1~10000 μm之範圍內適當選擇。The substrate used in the adhesive sheet of the present invention can be any commonly used substrate (substrate used for adhesive sheets) without particular limitation. Examples include plastic substrates, metal substrates, ceramic substrates, semiconductor substrates, glass substrates, paper substrates, wood substrates, and substrates with painted surfaces. Furthermore, the substrate used in the adhesive sheet of the present invention can be a so-called peelable liner. Furthermore, the adhesive sheet of the present invention can have only one substrate layer or two or more layers. The thickness of the substrate is not particularly limited and can be appropriately selected from a range of 1 to 10,000 μm, for example.

上述接著片可為僅具有1層由本發明之硬化性組成物形成之接著劑層者,亦可為具有2層以上之該接著劑層者。又,上述接著片中之接著劑層之厚度並無特別限定,例如可自0.1~10000 μm之範圍內適當選擇。The adhesive sheet may have only one adhesive layer formed from the curable composition of the present invention, or may have two or more adhesive layers. The thickness of the adhesive layer in the adhesive sheet is not particularly limited and can be appropriately selected, for example, from a range of 0.1 to 10,000 μm.

又,作為上述接著片之另一態樣,藉由使用矽烷偶合劑及本發明之聚有機矽倍半氧烷,可獲得耐龜裂性、耐熱性、對被接著體之接著性及密接性優異之接著片。具體而言,於基材之至少一面具有含有矽烷偶合劑之增黏塗層、及由含有本發明之聚有機矽倍半氧烷之硬化性組成物所形成之接著劑層,且該接著劑層設置於上述增黏塗層之表面上的接著片,其耐龜裂性、耐熱性、對被接著體之接著性及密接性優異。Another aspect of the aforementioned adhesive sheet is the use of a silane coupling agent and the polyorganosilsesquioxane of the present invention to achieve an adhesive sheet with excellent crack resistance, heat resistance, and excellent adhesion and tightness to the substrate. Specifically, the adhesive sheet comprises an adhesion-promoting coating layer containing a silane coupling agent and an adhesive layer formed from a curable composition containing the polyorganosilsesquioxane of the present invention on at least one side of a substrate, with the adhesive layer disposed on the surface of the adhesion-promoting coating. The adhesive sheet exhibits excellent crack resistance, heat resistance, and excellent adhesion and tightness to the substrate.

又,於上述接著片之另一態樣中,接著片可為僅具有1層上述增黏塗層者,亦可為具有2層以上之增黏塗層者。又,增黏塗層之厚度例如可自0.001~10000 μm之範圍內適當選擇。In another embodiment of the adhesive sheet, the adhesive sheet may have only one layer of the above-mentioned adhesion-promoting coating layer, or may have two or more layers of the adhesion-promoting coating layer. The thickness of the adhesion-promoting coating layer may be appropriately selected from the range of 0.001 to 10,000 μm, for example.

上述接著片亦可為除具有基材、接著劑層、及增黏塗層以外,還可具有其他層(例如中間層、底塗層等)者。The adhesive sheet may also have other layers (such as an intermediate layer, a primer layer, etc.) in addition to the base material, the adhesive layer, and the adhesion-promoting coating layer.

藉由使用上述接著片,可獲得於接著片之接著劑層貼附有被接著層(被接著體)的積層物。並且,於使用上述接著片所獲得之該積層物為半導體晶片之三維積層體之情形時,相較於以往之半導體,為高積體且更省電力,故若使用該積層物,則可提昇封裝密度並且提供更小型且高性能之電子機器。By using the aforementioned bonding sheet, a laminate can be obtained in which a bonded layer (bond) is attached to an adhesive layer of the bonding sheet. Furthermore, when the laminate obtained using the aforementioned bonding sheet is a three-dimensional laminate of semiconductor chips, it is more highly integrated and more energy-efficient than conventional semiconductors. Therefore, the use of this laminate can increase packaging density and provide smaller, higher-performance electronic devices.

本說明書中所揭示之各種態樣可與本說明書中所揭示之其他任何特徵進行組合。 各實施方式中之各構成及其等之組合等為一例,可於不脫離本發明之主旨之範圍內適當進行構成之附加、省略、置換、及其他變更。本發明僅由申請專利範圍限定,而不受實施方式限定。 [實施例] The various aspects disclosed in this specification may be combined with any other features disclosed in this specification. The various components and their combinations in the various embodiments are merely examples, and additions, omissions, substitutions, and other modifications may be made as appropriate without departing from the spirit of the present invention. The present invention is limited only by the scope of the patent application and not by the embodiments. [Examples]

以下,基於實施例,更詳細地說明本發明,但本發明並不限定於該等實施例。The present invention is described in more detail below based on embodiments, but the present invention is not limited to these embodiments.

產物之數量平均分子量、分子量分散度之測定係按以下之GPC條件進行測定。又,產物中之單體籠型矽倍半氧烷、縮合矽倍半氧烷之含量係根據GPC測定中之對應波峰之區域值之面積比求得。又,產物中之T2體與T3體之比率[T3體/T2體]之測定係藉由利用Brucker公司製造之NMR(600 MHz)進行之 29Si-NMR圖譜測定來實施。 The number average molecular weight and molecular weight dispersion of the product were determined using the following GPC conditions. The content of monomeric cage-type silsesquioxane and condensed silsesquioxane in the product was determined based on the area ratio of the corresponding peaks in the GPC measurement. Furthermore, the ratio of the T2 isomer to the T3 isomer [T3 isomer/T2 isomer] in the product was determined using 29 Si-NMR spectroscopy using a Brucker NMR (600 MHz).

[GPC條件] 測定裝置:商品名「GPC Semi-Micro system」(島津製作所(股)公司製造) 檢測器:RI檢測器(昭光Science(股)公司製造) 管柱:KF-G4A(保護管柱)、KF-602、及KF-603(昭光Science(股)公司製造) 流速:0.6 mL/min 測定溫度:40℃ 測定時間:13 min 注入量:20 μL 析出液:THF、樣品濃度0.1~0.2重量% 分子量:標準聚苯乙烯換算 [GPC Conditions] Measurement Apparatus: Trade Name "GPC Semi-Micro System" (Shimadzu Corporation) Detector: RI Detector (Shoko Scientific Co., Ltd.) Columns: KF-G4A (guard column), KF-602, and KF-603 (Shoko Scientific Co., Ltd.) Flow Rate: 0.6 mL/min Measurement Temperature: 40°C Measurement Time: 13 min Injection Volume: 20 μL Eluent: THF, Sample Concentration: 0.1-0.2 wt% Molecular Weight: Standard Polystyrene Equivalent

又,UPLC-MS係藉由以下之裝置及條件進行。 [UPLC條件] 測定裝置:ACQUITY UPLC H-Class(Waters公司製造) 檢測器、檢測條件:下述MS條件 管柱:ACQUITY UPLC HSS PFP 2.1×100 mm×1.8 μm 流動相A:5 mM甲酸銨水溶液 流動相B:乙腈/THF=6/4 洗浄溶劑:乙腈/THF=6/4 流速:0.35 mL/min 樣品溫度:10℃ 管柱溫度:40℃ 注入量:2.0 μL UPLC-MS was performed using the following apparatus and conditions. [UPLC Conditions] Analyzer: ACQUITY UPLC H-Class (Waters Corporation) Detector and Detection Conditions: MS conditions described below Column: ACQUITY UPLC HSS PFP 2.1 × 100 mm × 1.8 μm Mobile Phase A: 5 mM Ammonium Formate in Water Mobile Phase B: Acetonitrile/THF = 6/4 Washing Solvent: Acetonitrile/THF = 6/4 Flow Rate: 0.35 mL/min Sample Temperature: 10°C Column Temperature: 40°C Injection Volume: 2.0 μL

[MS條件] 測定裝置:Xevo-G2XS QTOFMS(Waters公司製造) 離子化模式:ESI+(敏感度模式) 測定方法:MSE 毛細管電壓:3.2 kV 錐孔電壓:30 V 源補償電壓:80 V 脫溶劑氣體:1000 L/hr(200℃) 錐孔氣體:50 L/hr 離子源加熱器:80℃ 掃描範圍:m/z=100~3000 掃描時間:0.4 sec 碰撞能量:30~50 eV(MSE高能量) 鎖定質量:亮氨酸腦啡肽(Leucine Enkephalin) [MS Conditions] Measurement Apparatus: Xevo-G2XS QTOFMS (Waters Corporation) Ionization Mode: ESI+ (Sensitivity Mode) Measurement Method: MS Capillary Voltage: 3.2 kV Conical Voltage: 30 V Source Compensation Voltage: 80 V Desolvent Gas: 1000 L/hr (200°C) Conical Gas: 50 L/hr Ion Source Heater: 80°C Scan Range: m/z = 100–3000 Scan Time: 0.4 sec Collision Energy: 30–50 eV (MSE High Energy) Target Mass: Leucine Enkephalin

實施例 1 :本發明之含環氧基之聚有機矽倍半氧烷之製造( 1 於安裝有溫度計、攪拌裝置、回流冷凝器、及氮氣導入管、迪安-斯塔克管之1000毫升燒瓶(反應容器)中,於氮氣氣流下添加2-(3,4-環氧環己基)乙基三甲氧基矽烷277.2毫莫耳(68.30 g)、苯基三甲氧基矽烷3.0毫莫耳(0.56 g)、及丙酮275.4 g,並升溫至50℃。向如此獲得之混合物中歷時5分鐘添加5%碳酸鉀水溶液7.74 g(以碳酸鉀計為2.8毫莫耳)後,歷時20分鐘添加水2800.0毫莫耳(50.40 g)。再者,添加期間,不使溫度顯著上升。其後,保持為50℃,於氮氣氣流下進行5小時縮聚反應。 其後,添加甲基異丁基酮230.5 g,於減壓下使溫度自50℃升溫至90℃,進行蒸餾去除直至系統內之丙酮(0.0%)、甲基異丁基酮(30.32%)、水(0.23%)。其後,保持90℃攪拌11小時,添加甲基異丁基酮273.2 g,用水273.2 g水洗5次,使導電率為1.5 uS/cm以下進行濃縮,獲得無色透明之液體61.1 g。對產物進行分析,結果數量平均分子量為4736、分子量分散度為2.54、單體籠型矽倍半氧烷(滯留時間7.6~8.3分鐘)之含量為6.7%、縮合籠型矽倍半氧烷(滯留時間4.9~7.6分鐘)之含量為93.3%,[T3體/T2體]為46.5。 將 29Si-NMR圖譜示於圖1,將GPC圖示於圖2。 Example 1 : Preparation of the epoxy-containing polyorganosilsesquioxane of the present invention ( 1 ) In a 1000 ml flask (reaction vessel) equipped with a thermometer, a stirrer, a reflux condenser, a nitrogen inlet tube, and a Dean-Stark tube, 277.2 mmol (68.30 g) of 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3.0 mmol (0.56 g) of phenyltrimethoxysilane, and 275.4 g of acetone were added under a nitrogen flow, and the temperature was raised to 50°C. To the mixture thus obtained, 7.74 g (2.8 mmol as potassium carbonate) of a 5% aqueous solution was added over a period of 5 minutes, and then 2800.0 mmol (50.40 g) of water was added over a period of 20 minutes. During the addition, the temperature was not allowed to rise significantly. The polycondensation reaction was then carried out for 5 hours, maintained at 50°C, under a nitrogen stream. 230.5 g of methyl isobutyl ketone was then added, and the temperature was raised from 50°C to 90°C under reduced pressure. Distillation was performed to remove acetone (0.0%), methyl isobutyl ketone (30.32%), and water (0.23%) from the system. The temperature was then maintained at 90°C with stirring for 11 hours. 273.2 g of methyl isobutyl ketone was then added, and the mixture was washed five times with 273.2 g of water until the conductivity was below 1.5 μS/cm. The mixture was then concentrated to obtain 61.1 g of a colorless, transparent liquid. Analysis of the product revealed a number-average molecular weight of 4736, a molecular weight dispersity of 2.54, a monomeric cage-type silsesquioxane content of 6.7% (retention time 7.6-8.3 minutes), a condensed cage-type silsesquioxane content of 93.3% (retention time 4.9-7.6 minutes), and a [T3 isomer/T2 isomer] ratio of 46.5. The 29 Si-NMR spectrum is shown in Figure 1, and the GPC chart is shown in Figure 2.

將實施例1中獲得之含環氧基之聚有機矽倍半氧烷以上述UPLC-MS條件進行測定。將滯留時間3.86分鐘及1.81分鐘時檢測到之MS圖譜分別示於圖3、圖4。根據圖5所示之分子式C 144H 234O 45Si 18(Z=2)之MS模擬圖、圖6所示之分子式C 128H 210O 41Si 16(Z=2)之MS模擬圖之比較,能夠分別鑑定出滯留時間3.86分鐘之波峰之矽倍半氧烷為組成式(1)(全部R 1為2-(3',4'-環氧環己基)乙基)所表示之籠型矽倍半氧烷縮合2個而得之縮合矽倍半氧烷、滯留時間1.81分鐘之波峰之矽倍半氧烷為組成式(1)(全部R 1為2-(3',4'-環氧環己基)乙基)所表示之籠型矽倍半氧烷與組成式(2)(全部R 2為2-(3',4'-環氧環己基)乙基)所表示之籠型矽倍半氧烷縮合而得之縮合矽倍半氧烷。以下表示滯留時間3.86分鐘及1.81分鐘之波峰之縮合矽倍半氧烷之推定結構。 ・滯留時間3.86分鐘之波峰之矽倍半氧烷 The epoxy-containing polyorganosilsesquioxane obtained in Example 1 was analyzed using the aforementioned UPLC-MS conditions. The MS spectra detected at retention times of 3.86 minutes and 1.81 minutes are shown in Figures 3 and 4, respectively. According to the comparison of the MS simulation diagram of the molecular formula C 144 H 234 O 45 Si 18 (Z=2) shown in FIG5 and the MS simulation diagram of the molecular formula C 128 H 210 O 41 Si 16 (Z=2) shown in FIG6, it can be respectively identified that the silsesquioxane with the peak at the retention time of 3.86 minutes is the condensed silsesquioxane obtained by condensing two cage-type silsesquioxanes represented by the composition formula (1) (all R 1 is 2-(3',4'-epoxycyclohexyl)ethyl), and the silsesquioxane with the peak at the retention time of 1.81 minutes is the composition formula (1) (all R Condensed silsesquioxane obtained by condensing a cage-type silsesquioxane represented by formula ( 1) (wherein R 2 is 2-(3',4'-epoxycyclohexyl)ethyl) with a cage-type silsesquioxane represented by formula (2) (wherein all R 2 are 2-(3',4'-epoxycyclohexyl)ethyl). The following shows the estimated structure of the condensed silsesquioxane with peaks at retention times of 3.86 minutes and 1.81 minutes. Silsesquioxane with a peak at a retention time of 3.86 minutes

上述式中之全部R 1為2-(3',4'-環氧環己基)乙基。 ・滯留時間1.81分鐘之波峰之矽倍半氧烷 上述式中之全部R 1及R 2為2-(3',4'-環氧環己基)乙基。 All R1 in the above formula is 2-(3',4'-epoxycyclohexyl)ethyl. ・Silsesquioxane with a peak retention time of 1.81 minutes In the above formula, all R 1 and R 2 are 2-(3',4'-epoxycyclohexyl)ethyl.

實施例 2 :本發明之含環氧基之聚有機矽倍半氧烷之製造( 2 於安裝有溫度計、攪拌裝置、回流冷凝器、及氮氣導入管、迪安-斯塔克管之1000毫升燒瓶(反應容器)中,於氮氣氣流下添加2-(3,4-環氧環己基)乙基三甲氧基矽烷277.2毫莫耳(68.30 g)、苯基三甲氧基矽烷3.0毫莫耳(0.56 g)、及丙酮275.4 g,並升溫至50℃。向如此獲得之混合物中歷時5分鐘添加5%碳酸鉀水溶液7.74 g(以碳酸鉀計為2.8毫莫耳)後,歷時20分鐘添加水2800.0毫莫耳(50.40 g)。再者,添加期間,不使溫度顯著上升。其後,保持50℃,於氮氣氣流下進行5小時縮聚反應。 其後,添加甲基異丁基酮230.5 g,於減壓下使溫度自50℃升溫至90℃,進行蒸餾去除直至系統內之丙酮(0.0%)、甲基異丁基酮(20.58%)、水(0.35%)。其後,保持90℃攪拌42小時,添加甲基異丁基酮273.2 g,用水273.2 g水洗6次,使導電率為1.5uS/cm以下進行濃縮,獲得無色透明之液體50.0 g。對產物進行分析,結果數量平均分子量為9843、分子量分散度為2.89、單體籠型矽倍半氧烷(滯留時間7.6~8.3分)之含量為1.9%、縮合矽倍半氧烷(滯留時間4.7~7.6分鐘)之含量為98.1%,[T3體/T2體]為196.2。 將 29Si-NMR圖譜示於圖7,將GPC圖示於圖8。 Example 2 : Preparation of the epoxy-containing polyorganosilsesquioxane of the present invention ( 2 ) In a 1000 ml flask (reaction vessel) equipped with a thermometer, a stirring device, a reflux condenser, a nitrogen inlet tube, and a Dean-Stark tube, 277.2 mmol (68.30 g) of 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3.0 mmol (0.56 g) of phenyltrimethoxysilane, and 275.4 g of acetone were added under a nitrogen flow, and the temperature was raised to 50°C. To the mixture thus obtained, 7.74 g (2.8 mmol as potassium carbonate) of a 5% aqueous solution was added over a period of 5 minutes, and then 2800.0 mmol (50.40 g) of water was added over a period of 20 minutes. During the addition, the temperature was not allowed to rise significantly. The polycondensation reaction was then carried out for 5 hours, maintained at 50°C, under a nitrogen stream. 230.5 g of methyl isobutyl ketone was then added, and the temperature was raised from 50°C to 90°C under reduced pressure. Acetone (0.0%), methyl isobutyl ketone (20.58%), and water (0.35%) were removed by distillation until the system remained at 90°C with stirring for 42 hours. 273.2 g of methyl isobutyl ketone was then added, and the mixture was washed six times with 273.2 g of water until the conductivity was below 1.5 μS/cm. The mixture was then concentrated to obtain 50.0 g of a colorless, transparent liquid. Analysis of the product revealed a number-average molecular weight of 9843, a molecular weight dispersity of 2.89, a content of 1.9% for monomeric cage-type silsesquioxane (retention time 7.6-8.3 minutes), a content of 98.1% for condensed silsesquioxane (retention time 4.7-7.6 minutes), and a [T3 isomer/T2 isomer] ratio of 196.2. The 29 Si-NMR spectrum is shown in Figure 7, and the GPC chart is shown in Figure 8.

比較例 1 :含環氧基之聚有機矽倍半氧烷之製造於安裝有溫度計、攪拌裝置、回流冷凝器、及氮氣導入管、迪安-斯塔克管之1000毫升燒瓶(反應容器)中,於氮氣氣流下添加苯基三甲氧基矽烷3.0毫莫耳(0.56 g)、及丙酮275.4 g,並升溫至50℃。向如此獲得之混合物中歷時5分鐘添加5%碳酸鉀水溶液7.74 g(以碳酸鉀計為2.8毫莫耳)後,歷時20分鐘添加水2800.0毫莫耳(50.40 g)。又,在開始滴加碳酸鉀之同時,開始滴加2-(3,4-環氧環己基)乙基三甲氧基矽烷277.2毫莫耳(68.30 g),2小時後結束滴加。再者,添加期間,不使溫度顯著上升。其後,保持50℃,於氮氣氣流下進行5小時縮聚反應。 其後,添加甲基異丁基酮230.5 g,用水(273.2 g)水洗6次。使導電率為1.5 uS/cm以下進行濃縮,獲得白濁之液體50.0 g。 Comparative Example 1 : Preparation of Epoxy-Group-Containing Polyorganosilsesquioxane: In a 1000 ml flask (reaction vessel) equipped with a thermometer, a stirrer, a reflux condenser, a nitrogen inlet, and a Dean-Stark tube, 3.0 mmol (0.56 g) of phenyltrimethoxysilane and 275.4 g of acetone were added under a nitrogen flow, and the temperature was raised to 50°C. To the resulting mixture, 7.74 g (2.8 mmol as potassium carbonate) of a 5% aqueous solution of potassium carbonate was added over 5 minutes, followed by 2800.0 mmol (50.40 g) of water over 20 minutes. Simultaneously with the start of the dropwise addition of potassium carbonate, 277.2 mmol (68.30 g) of 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane was added dropwise, and the addition was terminated after two hours. During the addition, the temperature was not allowed to rise significantly. Polycondensation was then carried out under a nitrogen stream at 50°C for five hours. Subsequently, 230.5 g of methyl isobutyl ketone was added, and the mixture was washed six times with water (273.2 g). Concentration was performed until the conductivity was below 1.5 μS/cm, yielding 50.0 g of a turbid white liquid.

[溶劑溶解性之評價] 向上述實施例、比較例中獲得之產物50~60 g中添加丙酮或氯仿2 L,對溶劑溶解性進行評價。將完全溶解而成為澄清之溶液之情形評價為「完全溶解」,將一部分未溶解而白濁之情形評價為「白濁」。將結果示於表1。 [Evaluation of Solvent Solubility] Solvent solubility was evaluated by adding 2 L of acetone or chloroform to 50-60 g of the products obtained in the Examples and Comparative Examples above. Complete dissolution, resulting in a clear solution, was evaluated as "completely dissolved," while partial insolubility, resulting in a turbid solution, was evaluated as "turbid." The results are shown in Table 1.

[表1] (表1) 樣品 丙酮 氯仿 實施例1 完全溶解 完全溶解 實施例2 完全溶解 完全溶解 比較例1 白濁 白濁 [Table 1] (Table 1) Sample acetone Chloroform Example 1 Completely dissolved Completely dissolved Example 2 Completely dissolved Completely dissolved Comparative example 1 White turbidity White turbidity

參考例 1 :硬塗膜之製造製作實施例1中獲得之含環氧基之聚有機矽倍半氧烷100重量份、甲基異丁基酮(關東化學(股)公司製造)20重量份、及硬化觸媒1([二苯基[4-(苯硫基)苯基]鋶三(五氟乙基)三氟磷酸鹽])1重量份之混合溶液,將其用作硬塗液(硬化性組成物)。 將上述獲得之硬塗液以硬化後之硬塗層之厚度成為5 μm之方式使用線棒塗佈器流延塗佈於PET膜(商品名「KEB03W」,杜邦帝人薄膜(股)公司製造)上之後,於70℃之烘箱內放置(預烘烤)10分鐘,繼而照射紫外線(照射條件(照射量):312 mJ/cm 2、照射強度:80 W/cm 2)。最後於80℃進行2小時熱處理(熟化),藉此使上述硬塗液之塗佈膜硬化,製作具有硬塗層之硬塗膜。 Reference Example 1 : Preparation of a Hard Coat Film: A mixed solution of 100 parts by weight of the epoxy-containing polyorganosilsesquioxane obtained in Example 1, 20 parts by weight of methyl isobutyl ketone (manufactured by Kanto Chemical Co., Ltd.), and 1 part by weight of curing catalyst 1 (diphenyl[4-(phenylthio)phenyl]aluminum tris(pentafluoroethyl)trifluorophosphate) was prepared to serve as a hard coating solution (curable composition). The hard coating liquid obtained above was cast onto a PET film (trade name "KEB03W", manufactured by DuPont Teijin Films) using a wire bar coater, achieving a 5 μm thick hard coating layer after curing. The film was then placed in a 70°C oven (pre-baked) for 10 minutes and then irradiated with UV light (irradiation conditions (dose): 312 mJ/ cm² , irradiation intensity: 80 W/ cm² ). Finally, the film was heat-treated (cured) at 80°C for 2 hours to cure the hard coating liquid, producing a hard coating film with a hard coating layer.

對於上述獲得之硬塗膜,利用以下之方法進行各種評價。 (1)霧度及全光線穿透率 使用HAZE METER(日本電色工業(股)製造,NDH-300A),對上述獲得之硬塗膜之霧度及全光線穿透率進行測定。 The hard coating film obtained above was evaluated in various ways using the following methods. (1) Haze and total light transmittance The haze and total light transmittance of the hard coating film obtained above were measured using a HAZE METER (manufactured by Nippon Denshoku Industries Co., Ltd., NDH-300A).

(2)表面硬度(鉛筆硬度) 依據JIS K5600-5-4,對上述獲得之硬塗膜之硬塗層表面之鉛筆硬度進行評價。 (2) Surface hardness (pencil hardness) The pencil hardness of the hard coating layer surface of the hard coating film obtained above was evaluated in accordance with JIS K5600-5-4.

(3)耐熱性(5%重量減少溫度(T d5)) 除使用玻璃板代替PET膜以外,使用切割器,將利用與上述相同之方法獲得之硬塗膜之硬塗層切削出約5 mg,將其作為樣品。使用示差熱重量分析裝置(Seiko Instruments(股)製造,TG/DTA6300),以下述條件測定上述樣品之5%重量減少溫度。 測定溫度範圍:25~550℃ 升溫速度:10℃/分鐘 氣體環境:氮氣 (3) Heat resistance (5% weight loss temperature ( Td5 )) A sample of approximately 5 mg of the hard coat layer of the hard coat film obtained by the same method as above was cut using a cutter, except that a glass plate was used instead of the PET film. The sample was measured using a differential thermogravimetric analyzer (TG/DTA6300, manufactured by Seiko Instruments Co., Ltd.) under the following conditions to determine the 5% weight loss temperature of the sample. Measurement temperature range: 25-550°C Heating rate: 10°C/min Gas atmosphere: Nitrogen

(4)耐擦傷性 以負載1000 g/cm 2使#0000鋼絲絨於上述獲得之硬塗膜之硬塗層表面往返100次,對有無硬塗層表面產生之劃痕及其條數進行確認,按以下之基準對耐擦傷性進行評價。 ◎(耐擦傷性極佳):劃痕條數為0條 ○(耐擦傷性良好):劃痕條數為1~10條 ×(耐擦傷性不良):劃痕條數超過10條 (4) Abrasion resistance: A #0000 steel wool was moved back and forth 100 times on the hard coating surface of the hard coating film obtained above at a load of 1000 g/ cm2 . The presence and number of scratches on the hard coating surface were determined, and the abrasion resistance was evaluated according to the following criteria. ◎ (Excellent abrasion resistance): 0 scratches ○ (Good abrasion resistance): 1 to 10 scratches × (Poor abrasion resistance): More than 10 scratches

(5)耐彎曲性(圓筒形心軸法);依據心軸試驗 使用圓筒形心軸,依據JIS K5600-5-1對上述獲得之硬塗膜之耐彎曲性進行評價。 (5) Bending resistance (cylindrical mandrel method); mandrel test Using a cylindrical mandrel, the bending resistance of the hard coating film obtained above was evaluated in accordance with JIS K5600-5-1.

以下,記載與本發明相關之發明變化。 [附記1]一種聚有機矽倍半氧烷,其含有矽倍半氧烷,該矽倍半氧烷是含有選自由下述組成式(1)、組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷所組成之群中之至少一種之籠型矽倍半氧烷縮合2個以上而得之縮合物且分子量為8000以下。 ・式(1):[R 1SiO 3/2] 8[R 1SiO 2/2(OR c)] 1(式(1)中,R 1分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c表示碳數1~4之烷基或氫原子) ・式(2):[R 2SiO 3/2] 6[R 2SiO 2/2(OR c)] 2(式(2)中,R 2分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(3):[R 3SiO 3/2] 8[R 3SiO 2/2(OR c)] 2(式(3)中,R 3分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(4):[R 4SiO 3/2] 10[R 4SiO 2/2(OR c)] 2(式(4)中,R 4分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) [附記2]如附記1中記載之聚有機矽倍半氧烷,其中,上述矽倍半氧烷係選自由下述組成式(5)~(8)所表示之籠型矽倍半氧烷所組成之群中之至少一種進而縮合而得之縮合物。 ・式(5):[R 5SiO 3/2] 6[R 5SiO 2/2(OR c)] 3(式(5)中,R 5分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(6):[R 6SiO 3/2] 8[R 6SiO 2/2(OR c)] 3(式(6)中,R 6分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(7):[R 7SiO 3/2] 10[R 7SiO 2/2(OR c)] 1(式(7)中,R 7分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c表示碳數1~4之烷基或氫原子) ・式(8):[R 8SiO 3/2] 12[R 8SiO 2/2(OR c)] 1(式(8)中,R 8分別獨立為含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有聚合性官能基之基;R c表示碳數1~4之烷基或氫原子) [附記3]如附記1或2中記載之聚有機矽倍半氧烷,其中,上述含有聚合性官能基之基為陽離子聚合性官能基(較佳為環氧基、氧環丁基、乙烯醚基、或乙烯基苯基)。 [附記4]如附記1至3中任一項記載之聚有機矽倍半氧烷,其中,上述含有聚合性官能基之基為自由基聚合性官能基(較佳為(甲基)丙烯醯氧基、(甲基)丙烯醯胺基、乙烯基、或乙烯基硫基)。 [附記5]如附記1至4中任一項記載之聚有機矽倍半氧烷,其中,上述聚合性官能基為環氧基、或(甲基)丙烯醯氧基。 [附記6]如附記1至5中任一項記載之聚有機矽倍半氧烷,其中,上述含有聚合性官能基之基為下述式(1A) [式(1A)中,R 1A表示直鏈或支鏈狀之伸烷基] 所表示之基、下述式(1B) [式(1B)中,R 1B表示直鏈或支鏈狀之伸烷基] 所表示之基、下述式(1C) [式(1C)中,R 1C表示直鏈或支鏈狀之伸烷基] 所表示之基、或下述式(1D) [式(1D)中,R 1D表示直鏈或支鏈狀之伸烷基] 所表示之基。 [附記7]如附記6記載之聚有機矽倍半氧烷,其中,上述式(1A)、(1B)、(1C)、及(1D)中,R 1A、R 1B、R 1C、及R 1D分別為碳數1~4之直鏈狀之伸烷基、或碳數3或4之支鏈狀之伸烷基(較佳為伸乙基、三亞甲基、或伸丙基,更佳為伸乙基、或三亞甲基)。 [附記8]如附記1至7中任一項記載之聚有機矽倍半氧烷,其中,上述組成式(1)中,R 1中之含有聚合性官能基之基之個數為3~9(較佳為5~9,更佳為7~9,進而較佳為9)。 [附記9]如附記1至8中任一項記載之聚有機矽倍半氧烷,其中,上述組成式(2)中,R 2中之含有聚合性官能基之基之個數為3~8(較佳為5~8,更佳為7~8,進而較佳為8)。 [附記10]如附記1至9中任一項記載之聚有機矽倍半氧烷,其中,上述組成式(3)中,R 3中之含有聚合性官能基之基之個數為3~10(較佳為5~10,更佳為7~10,進而較佳為10)。 [附記11]如附記1至10中任一項記載之聚有機矽倍半氧烷,其中,上述組成式(4)中,R 4中之含有聚合性官能基之基之個數較佳為3~12(較佳為5~12,更佳為7~12,進而較佳為12)。 [附記12]如附記1至11中任一項記載之聚有機矽倍半氧烷,其中,相對於上述組成式(1)中之R 1、組成式(2)中之R 2、組成式(3)中之R 3、及組成式(4)中之R 4之整體,含有聚合性官能基之基之比率為30%以上(較佳為50%以上,更佳為80%以上)。 [附記13]如附記1至12中任一項記載之聚有機矽倍半氧烷,其中,下述式(I)所表示之構成單元(T3體)與下述式(II)所表示之構成單元(T2體)之莫耳比[式(I)所表示之構成單元/式(II)所表示之構成單元;T3體/T2體]為1以上(較佳為2以上,更佳為3以上,更佳為4以上,更佳為6以上,更佳為7以上,更佳為8以上,更佳為10以上,更佳為15以上,進而較佳為20以上)。 [R aSiO 3/2]                (I) [式(I)中,R a表示含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子] [R bSiO 2/2(OR c)]        (II) [式(II)中,R b表示含有聚合性官能基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、或者經取代或未經取代之烯基;R c表示氫原子或碳數1~4之烷基] [附記14]如附記13記載之聚有機矽倍半氧烷,其中,上述(T3體)與(T2體)之莫耳比[T3體/T2體]為500以下(較佳為400以下,更佳為300以下,更佳為100以下,更佳為50以下,更佳為40以下,更佳為30以下,進而較佳為25以下)。 [附記15]如附記1至14中任一項記載之聚有機矽倍半氧烷,其為上述組成式(1)、組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷中,1種時縮合2~5(較佳為2~3,更佳為2)、或者2種以上時縮合2~5(較佳為2~3,更佳為2)而得者。 [附記16]如附記1至15中任一項記載之聚有機矽倍半氧烷,其含有單體籠型矽倍半氧烷。 [附記17]如附記1至16中任一項記載之聚有機矽倍半氧烷,其中,單體籠型矽倍半氧烷之含量相對於上述聚有機矽倍半氧烷總量為5重量%以上(較佳為10重量%以上,更佳為20重量%以上)。 [附記18]如附記17中記載之聚有機矽倍半氧烷,其中,上述單體籠型矽倍半氧烷之含量相對於上述聚有機矽倍半氧烷總量為50重量%以下(較佳為40重量%以下,更佳為20重量%以下)。 [附記19]如附記1至18中任一項記載之聚有機矽倍半氧烷,其中,上述聚有機矽倍半氧烷中之縮合矽倍半氧烷之含量相對於上述聚有機矽倍半氧烷總量為20重量%以上(較佳為25~90重量%,更佳為30~80重量%,進而較佳為40~70重量%)。 [附記20]如附記19中記載之聚有機矽倍半氧烷,其中,上述縮合矽倍半氧烷之基於凝膠滲透層析法之標準聚苯乙烯換算之數量平均分子量(Mn)為2000~50000(較佳為2500~40000,更佳為3000~30000)。 [附記21]如附記1至20中任一項記載之聚有機矽倍半氧烷,其中,基於凝膠滲透層析法之標準聚苯乙烯換算之數量平均分子量(Mn)為2000~50000(較佳為2500~40000,更佳為3000~30000)。 [附記22]如附記1至21中任一項記載之聚有機矽倍半氧烷,其中,基於凝膠滲透層析法之標準聚苯乙烯換算之分子量分散度(Mw/Mn)為1.0~4.0(較佳為1.1~3.0,更佳為1.2~2.5)。 [附記23]如附記1至22中任一項記載之聚有機矽倍半氧烷,其中,空氣環境下之5%重量減少溫度(T d5)為330℃以上(例如為330~450℃,較佳為340℃以上,進而較佳為350℃以上)。 [附記24]一種硬化性組成物,其含有附記1至23中任一項記載之聚有機矽倍半氧烷。 [附記25]如附記24中記載之硬化性組成物,其中,聚有機矽倍半氧烷之含量相對於溶劑除外之硬化性組成物之總量(100重量%)為70重量~100重量%(較佳為80~99.8重量%,進而較佳為90~99.5重量%)。 [附記26]如附記22或23中記載之硬化性組成物,其中,相對於陽離子硬化性化合物或自由基硬化性化合物之總量(100重量%),上述聚有機矽倍半氧烷之比率為70~100重量%(較佳為75~98重量%,更佳為80~95重量%)。 [附記27]如附記24至26中任一項記載之硬化性組成物,其含有硬化觸媒。 [附記28]如附記27記載之硬化性組成物,其含有光聚合起始劑或熱聚合起始劑作為上述硬化觸媒。 [附記29]如附記27或28中記載之硬化性組成物,其含有陽離子聚合起始劑或自由基聚合起始劑作為上述硬化觸媒。 [附記30]如附記29記載之硬化性組成物,其中,上述陽離子聚合起始劑為光陽離子聚合起始劑、或熱陽離子聚合起始劑。 [附記31]如附記30記載之硬化性組成物,其中,上述光陽離子聚合起始劑係選自由鋶鹽、錪鹽、硒鹽、銨鹽、鏻鹽、及過渡金屬錯合物離子與陰離子之鹽所組成之群中之一種以上之光陽離子聚合起始劑。 [附記32]如附記30記載之硬化性組成物,其中,上述熱陽離子聚合起始劑係選自由芳基鋶鹽、芳基錪鹽、芳烴-離子錯合物、四級銨鹽、鋁螯合物、及三氟化硼胺錯合物所組成之群中之一種以上之化合物。 [附記33]如附記29記載之硬化性組成物,其中,上述自由基聚合起始劑為光自由基聚合起始劑、熱自由基聚合起始劑。 [附記34]如附記33記載之硬化性組成物,其中,上述光自由基聚合起始劑係選自由2-胺基-2-苯甲醯-1-苯基烷烴化合物、咪唑化合物、鹵甲基化三化合物、及鹵甲基二唑化合物所組成之群中之1種以上之光自由基聚合起始劑。 [附記35]如附記33記載之硬化性組成物,其中,上述熱自由基聚合起始劑為有機過氧化物類。 [附記36]如附記27至35中任一項記載之硬化性組成物,其含有上述聚有機矽倍半氧烷以外之其他陽離子硬化性化合物及/或上述聚有機矽倍半氧烷以外之其他自由基硬化性化合物。 [附記37]如附記36記載之硬化性組成物,其中,上述硬化觸媒之含量相對於上述聚有機矽倍半氧烷及上述其他之陽離子硬化性化合物之總量100重量份為0.01~3.0重量份(較佳為0.05~3.0重量份,更佳為0.1~1.0重量份,進而較佳為0.3~1.0重量份)。 [附記38]如附記36或37中記載之硬化性組成物,其中,上述其他陽離子硬化性化合物包含上述聚有機矽倍半氧烷以外之環氧化合物、氧環丁烷化合物、或乙烯醚化合物。 [附記39]如附記38記載之硬化性組成物,其中,上述環氧化合物為脂環式環氧化合物、芳香族環氧化合物、或脂肪族環氧化合物。 [附記40]如附記36至39中任一項記載之硬化性組成物,其含有上述聚有機矽倍半氧烷以外之(甲基)丙烯酸化合物作為上述其他自由基硬化性化合物。 [附記41]如附記36至40中任一項記載之硬化性組成物,其中,上述其他陽離子硬化性化合物及/或上述其他自由基硬化性化合物之含量(摻合量)相對於上述聚有機矽倍半氧烷、上述其他陽離子硬化性化合物、及上述其他自由基硬化性化合物之總量為50重量%以下(較佳為30重量%以下,更佳為10重量%以下)。 [附記42]如附記24至41中任一項記載之硬化性組成物,其含有聚合穩定劑。 [附記43]如附記42記載之硬化性組成物,其中,上述聚合穩定劑為選自由受阻胺系化合物、鋶硫酸鹽系化合物、及亞磷酸鹽系化合物所組成之群中之1種以上之聚合穩定劑。 [附記44]如附記42或43中記載之硬化性組成物,其中,上述聚合穩定劑之含量相對於上述聚有機矽倍半氧烷100重量份為0.005重量份以上(較佳為0.01~10重量份,進而較佳為0.02~1重量份)。 [附記45]如附記42至44中任一項記載之硬化性組成物,其含有上述聚合穩定劑及硬化觸媒,聚合穩定劑之含量相對於硬化觸媒100重量份為1重量份以上(較佳為3~200重量份,更佳為5~150重量份)。 [附記44]如附記24至45中任一項記載之硬化性組成物,其含有溶劑。 [附記45]如附記44記載之硬化性組成物,其中,上述溶劑之沸點為170℃以下。 [附記46]如附記44或45中記載之硬化性組成物,其中,上述溶劑之使用量以上述硬化性組成物所含之不揮發分之濃度計為30~80重量%(較佳為40~70重量%,更佳為50~60重量%)。 [附記47]如附記24至46中任一項記載之硬化性組成物,其於常溫(約25℃)為液體。 [附記48]如附記24至47中任一項記載之硬化性組成物,其於25℃之黏度為300~20000 mPa・s(較佳為500~10000 mPa・s,更佳為1000~8000 mPa・s)。 [附記49]如附記24至48中任一項記載之硬化性組成物,其為硬塗層形成用硬化性組成物。 [附記50]如附記24至48中任一項記載之硬化性組成物,其為接著劑用硬化性組成物。 [附記51]一種硬化物,其為附記24至50中任一項記載之硬化性組成物之硬化物。 [附記52]一種硬塗膜,其積層有基材、及為附記51記載之硬化物之硬塗層。 [附記53]如附記52記載之硬塗膜,其中,上述基材為塑膠基材、金屬基材、陶瓷基材、半導體基材、玻璃基材、紙基材、木基材、或表面為塗裝表面之基材。 [附記54]如附記52或53中記載之硬塗膜,其中,上述基材之厚度為0.01~10000 μm。 [附記55]如附記52至54中任一項記載之硬塗膜,其中,上述硬塗層之厚度為1~200 μm(較佳為3~150 μm)。 [附記56]如附記52至55中任一項記載之硬塗膜,其中,上述硬塗層之厚度為50 μm時之霧度為1.5%以下(較佳為1.0%以下)。 [附記57]如附記52至56中任一項記載之硬塗膜,其中,上述硬塗層之厚度為50 μm時之霧度為0.1%以上。 [附記58]如附記52至57中任一項記載之硬塗膜,其中,上述硬塗層之厚度為50 μm時之全光線穿透率為85%以上(較佳為90%以上)。 [附記59]如附記52至58中任一項記載之硬塗膜,其於上述硬塗層表面具有表面保護膜。 [附記60]如附記52至59中任一項記載之硬塗膜,其厚度為1~10000 μm。 [附記61]一種轉印用膜,其積層有基材、及位於形成於該基材之至少一表面之脫模層上之硬塗層,該硬塗層為含有附記49記載之硬化性組成物之層。 [附記62]如附記61記載之轉印用膜,其中,上述脫模層與上述硬塗層之剝離強度為30~500 mN/24 mm(較佳為40~300 mN/24 mm,更佳為50~200 mN/24 mm)。 [附記63]如附記61或62中記載之轉印用膜,其於上述硬塗層上依序進而積層增黏塗層及接著劑層。 [附記64]如附記63記載之轉印用膜,其中,上述增黏塗層之厚度為0.1~20 μm(較佳為0.5~5 μm)之範圍。 [附記65]如附記61至64中任一項記載之轉印用膜,其中,接著劑層之厚度為0.1~10 μm(較佳為0.5~5 μm)。 [附記66]如附記61至65中任一項記載之轉印用膜,其進而含有至少一層之著色層。 [附記67]如附記66記載之轉印用膜,其中,上述著色層係於製成用以將圖樣層及/或隱蔽層轉印至成型品之加飾膜時所設置者。 [附記68]一種接著片,其具有基材及接著劑層,該接著劑層位於該基材之至少一面,且為含有附記50記載之硬化性組成物之層。 [附記69]一種附記50記載之硬化性組成物之用途,其用於具有基材、及位於該基材之至少一面之接著劑層之接著片中之接著劑層。 [附記70]一種接著片,其具有基材、增黏塗層及接著劑層,該增黏塗層及該接著劑層位於該基材之至少一面,該增黏塗層含有矽烷偶合劑,該接著劑層為含有附記50記載之硬化性組成物之層;上述接著劑層設置於上述增黏塗層之表面上。 [附記71]一種附記22至48中任一項記載之硬化性組成物之用途,其用作硬塗層形成用硬化性組成物。 [附記72]一種附記22至48中任一項記載之硬化性組成物之用途,其用作接著劑用硬化性組成物。 [附記73]一種附記51記載之硬化物之用途,其用於具有基材與硬塗層之硬塗膜中之硬塗層。 [附記74]一種附記49記載之硬化性組成物之用途,其用於具有基材、且在形成於該基材之至少一表面之脫模層上形成有硬塗層之轉印用膜中之硬塗層。 [附記75]一種附記50記載之硬化性組成物之用途,其用於具有基材、增黏塗層及接著劑層的接著片中之接著劑層,該增黏塗層及該接著劑層位於該基材之至少一面,該增黏塗層含有矽烷偶合劑,且該接著劑層設置於該增黏塗層之表面上。 [產業上之可利用性] The following describes variations of the invention related to the present invention. [Supplementary Note 1] A polyorganosilsesquioxane comprising a silsesquioxane, wherein the silsesquioxane is a condensate obtained by condensing two or more cage-type silsesquioxanes selected from the group consisting of cage-type silsesquioxanes represented by the following composition formula (1), composition formula (2), composition formula (3), and composition formula (4), and has a molecular weight of 8000 or less.・Formula (1): [R 1 SiO 3/2 ] 8 [R 1 SiO 2/2 (OR c )] 1 (In formula (1), R 1 is independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted arylalkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (2): [R 2 SiO 3/2 ] 6 [R 2 SiO 2/2 (OR c )] 2 (In formula (2), R 2 are each independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c are each independently an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (3): [R 3 SiO 3/2 ] 8 [R 3 SiO 2/2 (OR c )] 2 (In formula (3), R 3 are each independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c each independently represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (4): [R 4 SiO 3/2 ] 10 [R 4 SiO 2/2 (OR c )] 2 (In formula (4), R 4 each independently represents a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c each independently represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) [Supplementary Note 2] The polyorganosilsesquioxane as described in Supplementary Note 1, wherein the silsesquioxane is a condensate obtained by condensing at least one of the cage-type silsesquioxanes represented by the following composition formulas (5) to (8).・Formula (5): [R 5 SiO 3/2 ] 6 [R 5 SiO 2/2 (OR c )] 3 (In formula (5), R 5 is independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted arylalkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c is independently an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (6): [R 6 SiO 3/2 ] 8 [R 6 SiO 2/2 (OR c )] 3 (In formula (6), R 6 are each independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c are each independently an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (7): [R 7 SiO 3/2 ] 10 [R 7 SiO 2/2 (OR c )] 1 (In formula (7), R 7 are each independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (8): [R 8 SiO 3/2 ] 12 [R 8 SiO 2/2 (OR c )] 1 (In formula (8), R 8 are independently a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing a polymerizable functional group; R c represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) [Supplementary Note 3] The polyorganosilsesquioxane as described in Supplementary Note 1 or 2, wherein the group containing a polymerizable functional group is a cationic polymerizable functional group (preferably an epoxy group, an oxobutyl group, a vinyl ether group, or a vinylphenyl group). [Supplementary Note 4] The polyorganosilsesquioxane according to any one of Supplementary Notes 1 to 3, wherein the group containing a polymerizable functional group is a free radical polymerizable functional group (preferably a (meth)acryloxy group, a (meth)acrylamide group, a vinyl group, or a vinylthio group). [Supplementary Note 5] The polyorganosilsesquioxane according to any one of Supplementary Notes 1 to 4, wherein the polymerizable functional group is an epoxy group or a (meth)acryloxy group. [Supplementary Note 6] The polyorganosilsesquioxane according to any one of Supplementary Notes 1 to 5, wherein the group containing a polymerizable functional group is of the following formula (1A): [In formula (1A), R 1A represents a linear or branched alkylene group] A group represented by the following formula (1B) [In formula (1B), R 1B represents a linear or branched alkylene group] A group represented by the following formula (1C): [In formula (1C), R 1C represents a linear or branched alkylene group], or a group represented by the following formula (1D) [In formula (1D), R 1D represents a linear or branched alkylene group] A group represented by [Supplementary Note 7] The polyorganosilsesquioxane described in Supplementary Note 6, wherein in the above formulas (1A), (1B), (1C), and (1D), R 1A , R 1B , R 1C , and R 1D are each a linear alkylene group having 1 to 4 carbon atoms, or a branched alkylene group having 3 or 4 carbon atoms (preferably an ethylene group, a trimethylene group, or a propylene group, more preferably an ethylene group or a trimethylene group). [Supplementary Note 8] The polyorganosilsesquioxane according to any one of Supplementary Notes 1 to 7, wherein, in the above-mentioned composition formula (1), the number of groups containing polymerizable functional groups in R 1 is 3 to 9 (preferably 5 to 9, more preferably 7 to 9, and further preferably 9). [Supplementary Note 9] The polyorganosilsesquioxane according to any one of Supplementary Notes 1 to 8, wherein, in the above-mentioned composition formula (2), the number of groups containing polymerizable functional groups in R 2 is 3 to 8 (preferably 5 to 8, more preferably 7 to 8, and further preferably 8). [Supplementary Note 10] The polyorganosilsesquioxane according to any one of Supplementary Notes 1 to 9, wherein, in the above-mentioned composition formula (3), the number of groups containing polymerizable functional groups in R 3 is 3 to 10 (preferably 5 to 10, more preferably 7 to 10, and further preferably 10). [Supplementary Note 11] The polyorganosilsesquioxane according to any one of Supplementary Notes 1 to 10, wherein, in the above-mentioned composition formula (4), the number of groups containing polymerizable functional groups in R 4 is preferably 3 to 12 (preferably 5 to 12, more preferably 7 to 12, and further preferably 12). [Supplementary Note 12] The polyorganosilsesquioxane according to any one of Supplementary Notes 1 to 11, wherein the ratio of the group containing a polymerizable functional group relative to the total of R 1 in the above-mentioned composition formula (1), R 2 in the composition formula (2), R 3 in the composition formula (3), and R 4 in the composition formula (4) is 30% or more (preferably 50% or more, and more preferably 80% or more). [Supplement 13] The polyorganosilsesquioxane according to any one of Supplements 1 to 12, wherein the molar ratio of the constitutional unit represented by the following formula (I) (T3 form) to the constitutional unit represented by the following formula (II) (T2 form) [constituent unit represented by formula (I)/constituent unit represented by formula (II); T3 form/T2 form] is 1 or more (preferably 2 or more, more preferably 3 or more, more preferably 4 or more, more preferably 6 or more, more preferably 7 or more, more preferably 8 or more, more preferably 10 or more, more preferably 15 or more, and further preferably 20 or more). [R a SiO 3/2 ] (I) [In formula (I), R a represents a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom] [R b SiO 2/2 (OR c )] (II) [In formula (II), R b represents a group containing a polymerizable functional group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted alkenyl group; R c represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms] [Supplement 14] The polyorganosilsesquioxane as described in Supplement 13, wherein the molar ratio of the (T3 form) to the (T2 form) [T3 form/T2 form] is 500 or less (preferably 400 or less, more preferably 300 or less, more preferably 100 or less, more preferably 50 or less, more preferably 40 or less, more preferably 30 or less, and further preferably 25 or less). [Supplement 15] The polyorganosilsesquioxane as described in any one of Supplements 1 to 14, which is obtained by condensing 2 to 5 (preferably 2 to 3, more preferably 2) of one of the cage-type silsesquioxanes represented by the above-mentioned composition formula (1), composition formula (2), composition formula (3), and composition formula (4) or condensing 2 to 5 (preferably 2 to 3, more preferably 2) of two or more of the cage-type silsesquioxanes represented by the above-mentioned composition formula (1), composition formula (2), composition formula (3), and composition formula (4). [Supplementary Note 16] The polyorganosilsesquioxane according to any one of Supplementary Notes 1 to 15, comprising a cage-type silsesquioxane monomer. [Supplementary Note 17] The polyorganosilsesquioxane according to any one of Supplementary Notes 1 to 16, wherein the content of the cage-type silsesquioxane monomer is 5% by weight or greater (preferably 10% by weight or greater, more preferably 20% by weight or greater) relative to the total weight of the polyorganosilsesquioxane. [Supplementary Note 18] The polyorganosilsesquioxane according to Supplementary Note 17, wherein the content of the cage-type silsesquioxane monomer is 50% by weight or less (preferably 40% by weight or less, more preferably 20% by weight or less) relative to the total weight of the polyorganosilsesquioxane. [Supplementary Note 19] The polyorganosilsesquioxane according to any one of Supplementary Notes 1 to 18, wherein the content of the condensed silsesquioxane in the polyorganosilsesquioxane is 20% by weight or greater (preferably 25 to 90% by weight, more preferably 30 to 80% by weight, and even more preferably 40 to 70% by weight) relative to the total weight of the polyorganosilsesquioxane. [Supplementary Note 20] The polyorganosilsesquioxane according to Supplementary Note 19, wherein the condensed silsesquioxane has a number average molecular weight (Mn) of 2,000 to 50,000 (preferably 2,500 to 40,000, and even more preferably 3,000 to 30,000) based on standard polystyrene as determined by gel permeation chromatography. [Supplementary Note 21] The polyorganosilsesquioxane according to any one of Supplementary Notes 1 to 20, wherein the number average molecular weight (Mn) is 2,000 to 50,000 (preferably 2,500 to 40,000, more preferably 3,000 to 30,000) based on standard polystyrene conversion by gel permeation chromatography. [Supplementary Note 22] The polyorganosilsesquioxane according to any one of Supplementary Notes 1 to 21, wherein the molecular weight dispersion (Mw/Mn) is 1.0 to 4.0 (preferably 1.1 to 3.0, more preferably 1.2 to 2.5) based on standard polystyrene conversion by gel permeation chromatography. [Supplementary Note 23] The polyorganosilsesquioxane according to any one of Supplementary Notes 1 to 22, wherein the 5% weight loss temperature ( Td5 ) in an air environment is 330°C or higher (e.g., 330-450°C, preferably 340°C or higher, and more preferably 350°C or higher). [Supplementary Note 24] A curable composition comprising the polyorganosilsesquioxane according to any one of Supplementary Notes 1 to 23. [Supplementary Note 25] The curable composition according to Supplementary Note 24, wherein the content of the polyorganosilsesquioxane is 70% by weight to 100% by weight (preferably 80% by weight to 99.8% by weight, and more preferably 90% by weight to 99.5% by weight) relative to the total weight of the curable composition excluding the solvent (100% by weight). [Supplementary Note 26] The curable composition according to Supplementary Note 22 or 23, wherein the ratio of the polyorganosilsesquioxane is 70-100% by weight (preferably 75-98% by weight, more preferably 80-95% by weight) relative to the total amount of the cationic curable compound or the radical curable compound (100% by weight). [Supplementary Note 27] The curable composition according to any one of Supplementary Notes 24 to 26, comprising a curing catalyst. [Supplementary Note 28] The curable composition according to Supplementary Note 27, comprising a photopolymerization initiator or a thermal polymerization initiator as the curing catalyst. [Supplementary Note 29] The curable composition according to Supplementary Note 27 or 28, comprising a cationic polymerization initiator or a radical polymerization initiator as the curing catalyst. [Supplementary Note 30] The curable composition according to Supplementary Note 29, wherein the cationic polymerization initiator is a photo-catalytic polymerization initiator or a thermal-catalytic polymerization initiator. [Supplementary Note 31] The curable composition according to Supplementary Note 30, wherein the photo-catalytic polymerization initiator is one or more selected from the group consisting of salts of coronium, iodonium, selenium, ammonium, phosphonium, and salts of transition metal complex ions and anions. [Note 32] The curable composition as described in Note 30, wherein the thermal cationic polymerization initiator is one or more compounds selected from the group consisting of aryl stibnium salts, aryl iodonium salts, aromatic hydrocarbon-ion complexes, quaternary ammonium salts, aluminum chelates, and boron trifluoride amine complexes. [Note 33] The curable composition as described in Note 29, wherein the free radical polymerization initiator is a photo-free radical polymerization initiator or a thermal free radical polymerization initiator. [Note 34] The curable composition as described in Note 33, wherein the photo-free radical polymerization initiator is selected from the group consisting of 2-amino-2-benzoyl-1-phenylalkane compounds, imidazole compounds, halogenated trimethylol compounds, Compounds, and halogenated methyl One or more photoradical polymerization initiators selected from the group consisting of oxadiazole compounds. [Supplementary Note 35] The curable composition according to Supplementary Note 33, wherein the thermal radical polymerization initiator is an organic peroxide. [Supplementary Note 36] The curable composition according to any one of Supplementary Notes 27 to 35, comprising a cationic curable compound other than the polyorganosilsesquioxane and/or a radical curable compound other than the polyorganosilsesquioxane. [Supplementary Note 37] The curable composition according to Supplementary Note 36, wherein the content of the curing catalyst is 0.01 to 3.0 parts by weight (preferably 0.05 to 3.0 parts by weight, more preferably 0.1 to 1.0 parts by weight, and even more preferably 0.3 to 1.0 parts by weight) based on 100 parts by weight of the total amount of the polyorganosilsesquioxane and the other cationic curable compound. [Supplementary Note 38] The curable composition according to Supplementary Note 36 or 37, wherein the other cationic curable compound comprises an epoxy compound, an oxetane compound, or a vinyl ether compound other than the polyorganosilsesquioxane. [Supplementary Note 39] The curable composition according to Supplementary Note 38, wherein the epoxy compound is an aliphatic epoxy compound, an aromatic epoxy compound, or an aliphatic epoxy compound. [Supplementary Note 40] The curable composition according to any one of Supplementary Notes 36 to 39, comprising a (meth)acrylic compound other than the polyorganosilsesquioxane as the other radical-curable compound. [Supplementary Note 41] The curable composition according to any one of Supplementary Notes 36 to 40, wherein the content (blend amount) of the other cationic curable compound and/or the other radical-curable compound is 50% by weight or less (preferably 30% by weight or less, and more preferably 10% by weight or less) relative to the total amount of the polyorganosilsesquioxane, the other cationic curable compound, and the other radical-curable compound. [Supplement 42] The curable composition according to any one of Supplements 24 to 41, comprising a polymerization stabilizer. [Supplement 43] The curable composition according to Supplement 42, wherein the polymerization stabilizer is one or more selected from the group consisting of hindered amine compounds, cobalt sulfate compounds, and phosphite compounds. [Supplement 44] The curable composition according to Supplement 42 or 43, wherein the content of the polymerization stabilizer is 0.005 parts by weight or more (preferably 0.01 to 10 parts by weight, and more preferably 0.02 to 1 part by weight) per 100 parts by weight of the polyorganosilsesquioxane. [Supplementary Note 45] The curable composition according to any one of Supplementary Notes 42 to 44, comprising the aforementioned polymerization stabilizer and a curing catalyst, wherein the content of the polymerization stabilizer is at least 1 part by weight (preferably 3 to 200 parts by weight, more preferably 5 to 150 parts by weight) per 100 parts by weight of the curing catalyst. [Supplementary Note 44] The curable composition according to any one of Supplementary Notes 24 to 45, comprising a solvent. [Supplementary Note 45] The curable composition according to Supplementary Note 44, wherein the boiling point of the solvent is 170°C or less. [Supplementary Note 46] The curable composition according to Supplementary Note 44 or 45, wherein the amount of the solvent used is 30 to 80% by weight (preferably 40 to 70% by weight, more preferably 50 to 60% by weight), based on the concentration of the non-volatile matter in the curable composition. [Supplementary Note 47] The curable composition according to any one of Supplementary Notes 24 to 46, which is a liquid at room temperature (approximately 25°C). [Supplementary Note 48] The curable composition according to any one of Supplementary Notes 24 to 47, which has a viscosity at 25°C of 300 to 20,000 mPa·s (preferably 500 to 10,000 mPa·s, more preferably 1,000 to 8,000 mPa·s). [Supplement 49] The curable composition according to any one of Supplements 24 to 48, which is a curable composition for forming a hard coat layer. [Supplement 50] The curable composition according to any one of Supplements 24 to 48, which is a curable composition for use as an adhesive. [Supplement 51] A cured product, which is a cured product of the curable composition according to any one of Supplements 24 to 50. [Supplement 52] A hard coat film comprising a substrate and a hard coat layer comprising the cured product according to Supplement 51. [Supplement 53] The hard coat film according to Supplement 52, wherein the substrate is a plastic substrate, a metal substrate, a ceramic substrate, a semiconductor substrate, a glass substrate, a paper substrate, a wood substrate, or a substrate having a painted surface. [Supplementary Note 54] The hard coat film according to Supplementary Note 52 or 53, wherein the thickness of the substrate is 0.01 to 10,000 μm. [Supplementary Note 55] The hard coat film according to any one of Supplementary Notes 52 to 54, wherein the thickness of the hard coat layer is 1 to 200 μm (preferably 3 to 150 μm). [Supplementary Note 56] The hard coat film according to any one of Supplementary Notes 52 to 55, wherein the haze value when the hard coat layer has a thickness of 50 μm is 1.5% or less (preferably 1.0% or less). [Supplementary Note 57] The hard coat film according to any one of Supplementary Notes 52 to 56, wherein the haze value when the hard coat layer has a thickness of 50 μm is 0.1% or more. [Supplementary Note 58] The hard coat film according to any one of Supplementary Notes 52 to 57, wherein the total light transmittance of the hard coat layer is 85% or greater (preferably 90% or greater) when the thickness is 50 μm. [Supplementary Note 59] The hard coat film according to any one of Supplementary Notes 52 to 58, wherein the hard coat layer has a surface protective film on the surface. [Supplementary Note 60] The hard coat film according to any one of Supplementary Notes 52 to 59, wherein the thickness is 1 to 10,000 μm. [Supplementary Note 61] A transfer film comprising a substrate and a hard coat layer formed on at least one surface of the substrate, the hard coat layer being a layer containing the curable composition according to Supplementary Note 49. [Supplementary Note 62] The transfer film according to Supplementary Note 61, wherein the peel strength between the release layer and the hard coat layer is 30 to 500 mN/24 mm (preferably 40 to 300 mN/24 mm, more preferably 50 to 200 mN/24 mm). [Supplementary Note 63] The transfer film according to Supplementary Note 61 or 62, further comprising an adhesion-enhancing coating layer and an adhesive layer sequentially deposited on the hard coat layer. [Supplementary Note 64] The transfer film according to Supplementary Note 63, wherein the adhesion-enhancing coating layer has a thickness in the range of 0.1 to 20 μm (preferably 0.5 to 5 μm). [Supplementary Note 65] The transfer film according to any one of Supplementary Notes 61 to 64, wherein the thickness of the adhesive layer is 0.1 to 10 μm (preferably 0.5 to 5 μm). [Supplementary Note 66] The transfer film according to any one of Supplementary Notes 61 to 65, further comprising at least one coloring layer. [Supplementary Note 67] The transfer film according to Supplementary Note 66, wherein the coloring layer is provided when forming a decorative film for transferring a pattern layer and/or a concealing layer to a molded article. [Supplementary Note 68] An adhesive sheet comprising a substrate and an adhesive layer, wherein the adhesive layer is located on at least one side of the substrate and is a layer comprising the curable composition according to Supplementary Note 50. [Supplementary Note 69] Use of the curable composition according to Supplementary Note 50, wherein the adhesive layer is used in an adhesive sheet comprising a substrate and an adhesive layer located on at least one side of the substrate. [Supplementary Note 70] A adhesive sheet comprising a substrate, an adhesion-promoting coating layer, and an adhesive layer, wherein the adhesion-promoting coating layer and the adhesive layer are located on at least one side of the substrate, the adhesion-promoting coating layer containing a silane coupling agent, and the adhesive layer being a layer containing the curable composition according to Supplementary Note 50; the adhesive layer is disposed on the surface of the adhesion-promoting coating layer. [Supplementary Note 71] Use of the curable composition according to any one of Supplementary Notes 22 to 48, wherein the curable composition is used as a curable composition for forming a hard coat layer. [Supplementary Note 72] Use of the curable composition according to any one of Supplementary Notes 22 to 48 as a curable adhesive composition. [Supplementary Note 73] Use of the cured product according to Supplementary Note 51 as a hard coat layer in a hard coat film comprising a substrate and a hard coat layer. [Supplementary Note 74] Use of the curable composition according to Supplementary Note 49 as a hard coat layer in a transfer film comprising a substrate and a hard coat layer formed on a release layer formed on at least one surface of the substrate. [Supplement 75] A use of the curable composition according to Supplement 50, wherein the adhesive layer is used in an adhesive sheet comprising a substrate, an adhesion-promoting coating, and an adhesive layer, wherein the adhesion-promoting coating and the adhesive layer are located on at least one side of the substrate, the adhesion-promoting coating contains a silane coupling agent, and the adhesive layer is disposed on a surface of the adhesion-promoting coating. [Industrial Applicability]

本發明之聚有機矽倍半氧烷能夠用作硬塗膜、或接著片原料。The polyorganosilsesquioxane of the present invention can be used as a hard coating film or adhesive sheet material.

1:硬塗膜 11:硬塗層 12:基材 2:轉印用膜 21:基材 22:脫模層 23:硬塗層(未硬化或半硬化之硬塗層) 24:增黏塗層 25:著色層 26:接著劑層 3:接著片 31:接著劑層 32:基材 33:增黏塗層 1: Hardcoat 11: Hardcoat 12: Substrate 2: Transfer film 21: Substrate 22: Release layer 23: Hardcoat (uncured or semi-cured) 24: Adhesion-enhancing layer 25: Coloring layer 26: Adhesive layer 3: Adhesive sheet 31: Adhesive layer 32: Substrate 33: Adhesion-enhancing layer

[圖1]係實施例1中獲得之本發明之含環氧基之縮合矽倍半氧烷之 29Si-NMR圖譜。 [圖2]係實施例1中獲得之本發明之含環氧基之縮合矽倍半氧烷之GPC圖。 [圖3]係實施例1中獲得之本發明之含環氧基之縮合矽倍半氧烷之UPLC-MS圖。 [圖4]係實施例1中獲得之本發明之含環氧基之縮合矽倍半氧烷之UPLC-MS圖。 [圖5]係分子式C 144H 234O 45Si 18(Z=2)之MS模擬圖。 [圖6]係分子式C 128H 210O 41Si 16(Z=2)之MS模擬圖。 [圖7]係實施例2中獲得之本發明之含環氧基之縮合矽倍半氧烷之 29Si-NMR圖譜。 [圖8]係實施例2中獲得之本發明之含環氧基之縮合矽倍半氧烷之GPC圖。 [圖9]係表示本發明之硬塗膜之一實施方式之示意圖(剖面圖)。 [圖10]係表示本發明之轉印用膜之一實施方式之示意圖(剖面圖)。 [圖11]係表示本發明之接著片之一實施方式之示意圖(剖面圖)。 [Figure 1] is a 29Si -NMR spectrum of the epoxy-containing condensed silsesquioxane of the present invention obtained in Example 1. [Figure 2] is a GPC chart of the epoxy-containing condensed silsesquioxane of the present invention obtained in Example 1. [Figure 3] is a UPLC-MS chart of the epoxy-containing condensed silsesquioxane of the present invention obtained in Example 1. [Figure 4] is a UPLC-MS chart of the epoxy-containing condensed silsesquioxane of the present invention obtained in Example 1. [Figure 5] is a MS simulation chart of the molecular formula C 144 H 234 O 45 Si 18 (Z=2). Figure 6 is a MS simulation chart of the molecular formula C₁₂₈H₁₁₀O₄₁₁₁₁₁₁₁ (Z= 2 ). Figure 7 is a 29Si - NMR spectrum of the epoxy-containing condensed silsesquioxane of the present invention obtained in Example 2. Figure 8 is a GPC chart of the epoxy-containing condensed silsesquioxane of the present invention obtained in Example 2. Figure 9 is a schematic diagram (cross-sectional view) showing one embodiment of the hard coat film of the present invention. Figure 10 is a schematic diagram (cross-sectional view) showing one embodiment of the transfer film of the present invention. Figure 11 is a schematic diagram (cross-sectional view) showing one embodiment of the adhesive sheet of the present invention.

Claims (20)

一種聚有機矽倍半氧烷,其含有縮合矽倍半氧烷,該縮合矽倍半氧烷是含有選自由下述組成式(1)、組成式(2)、組成式(3)及組成式(4)所表示之籠型矽倍半氧烷所組成之群中之至少一種之籠型矽倍半氧烷縮合2個以上而得之縮合物且分子量為8000以下, 單體籠型矽倍半氧烷之含量相對於聚有機矽倍半氧烷總量為5重量%以上, 上述縮合矽倍半氧烷之含量相對於聚有機矽倍半氧烷總量為20重量%以上; ・式(1):[R 1SiO 3/2] 8[R 1SiO 2/2(OR c)] 1(式(1)中,R 1分別獨立為含有環氧基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有環氧基之基;R c表示碳數1~4之烷基或氫原子) ・式(2):[R 2SiO 3/2] 6[R 2SiO 2/2(OR c)] 2(式(2)中,R 2分別獨立為含有環氧基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有環氧基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(3):[R 3SiO 3/2] 8[R 3SiO 2/2(OR c)] 2(式(3)中,R 3分別獨立為含有環氧基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有環氧基之基;R c分別獨立表示碳數1~4之烷基或氫原子) ・式(4):[R 4SiO 3/2] 10[R 4SiO 2/2(OR c)] 2(式(4)中,R 4分別獨立為含有環氧基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子,且至少一個為含有環氧基之基;R c分別獨立表示碳數1~4之烷基或氫原子)。 A polyorganosilsesquioxane comprising a condensed silsesquioxane, wherein the condensed silsesquioxane is a condensate obtained by condensing two or more cage-type silsesquioxanes selected from the group consisting of cage-type silsesquioxanes represented by the following composition formula (1), composition formula (2), composition formula (3), and composition formula (4), and has a molecular weight of 8000 or less, wherein the content of the monomer cage-type silsesquioxane is 5% by weight or more relative to the total amount of the polyorganosilsesquioxane, and the content of the condensed silsesquioxane is 20% by weight or more relative to the total amount of the polyorganosilsesquioxane; Formula (1): [R 1 SiO 3/2 ] 8 [R 1 SiO 2/2 (OR c )] 1 (In formula (1), R 1 is independently a group containing an epoxy group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing an epoxy group; R c represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (2): [R 2 SiO 3/2 ] 6 [R 2 SiO 2/2 (OR c )] 2 (In formula (2), R 2 is independently a group containing an epoxy group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is a group containing an epoxy group; R c each independently represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (3): [R 3 SiO 3/2 ] 8 [R 3 SiO 2/2 (OR c )] 2 (In formula (3), R 3 each independently represents an epoxy group-containing group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is an epoxy group-containing group; R c each independently represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom) ・Formula (4): [R 4 SiO 3/2 ] 10 [R 4 SiO 2/2 (OR c )] 2 (In formula (4), R 4 are each independently an epoxy-containing group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom, and at least one of them is an epoxy-containing group; R c each independently represents an alkyl group having 1 to 4 carbon atoms or a hydrogen atom). 如請求項1之聚有機矽倍半氧烷,其中,上述含有環氧基之基為下述式(1A) [式(1A)中,R 1A表示直鏈或支鏈狀之伸烷基] 所表示之基、下述式(1B) [式(1B)中,R 1B表示直鏈或支鏈狀之伸烷基] 所表示之基、下述式(1C) [式(1C)中,R 1C表示直鏈或支鏈狀之伸烷基] 所表示之基、或下述式(1D) [式(1D)中,R 1D表示直鏈或支鏈狀之伸烷基] 所表示之基。 The polyorganosilsesquioxane of claim 1, wherein the epoxy group is represented by the following formula (1A): [In formula (1A), R 1A represents a linear or branched alkylene group] A group represented by the following formula (1B) [In formula (1B), R 1B represents a linear or branched alkylene group] A group represented by the following formula (1C): [In formula (1C), R 1C represents a linear or branched alkylene group], or a group represented by the following formula (1D) [In the formula (1D), R 1D represents a linear or branched alkylene group] 如請求項1或2之聚有機矽倍半氧烷,其中,相對於上述組成式(1)中之R 1、組成式(2)中之R 2、組成式(3)中之R 3、及組成式(4)中之R 4之整體,含有環氧基之基之比率為30%以上。 The polyorganosilsesquioxane of claim 1 or 2, wherein the ratio of the groups containing epoxy groups relative to the total of R 1 in the above-mentioned composition formula (1), R 2 in the composition formula (2), R 3 in the composition formula (3), and R 4 in the composition formula (4) is 30% or more. 如請求項1或2之聚有機矽倍半氧烷,其中,下述式(I) [R aSiO 3/2]                (I) [式(I)中,R a表示含有環氧基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子] 所表示之構成單元與下述式(II) [R bSiO 2/2(OR c)]       (II) [式(II)中,R b表示含有環氧基之基、經取代或未經取代之芳基、經取代或未經取代之芳烷基、經取代或未經取代之環烷基、經取代或未經取代之烷基、經取代或未經取代之烯基、或氫原子;R c表示氫原子或碳數1~4之烷基] 所表示之構成單元之莫耳比[式(I)所表示之構成單元/式(II)所表示之構成單元]為1以上500以下。 The polyorganosilsesquioxane of claim 1 or 2, wherein the constituent unit represented by the following formula (I) [ RaSiO3 /2 ] (I) [in formula (I), Ra represents an epoxy-containing group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom] and the following formula (II) [ RbSiO2 /2 ( ORc )] (II) [in formula (II), Rb represents an epoxy-containing group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom; Rc represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms] The molar ratio of the constituent units represented by formula (I)/constituent units represented by formula (II)] is 1 or more and 500 or less. 如請求項1或2之聚有機矽倍半氧烷,其數量平均分子量為2000~50000。The polyorganosilsesquioxane of claim 1 or 2, wherein the number average molecular weight is 2,000 to 50,000. 如請求項1或2之聚有機矽倍半氧烷,其分子量分散度(重量平均分子量/數量平均分子量)為1.0~4.0。For the polyorganosilsesquioxane of claim 1 or 2, its molecular weight dispersion (weight average molecular weight/number average molecular weight) is 1.0 to 4.0. 一種硬化性組成物,其含有請求項1至6中任一項之聚有機矽倍半氧烷。A curable composition comprising the polyorganosilsesquioxane according to any one of claims 1 to 6. 如請求項7之硬化性組成物,其進而含有硬化觸媒。The hardening composition of claim 7 further comprises a hardening catalyst. 如請求項8之硬化性組成物,其中,上述硬化觸媒為光或熱聚合起始劑。The curable composition of claim 8, wherein the curing catalyst is a photo- or thermal-polymerization initiator. 如請求項7之硬化性組成物,其進而含有聚合穩定劑。The hardening composition of claim 7 further comprises a polymeric stabilizer. 如請求項7之硬化性組成物,其為硬塗層形成用硬化性組成物。The hardening composition of claim 7 is a hardening composition for forming a hard coating layer. 如請求項7之硬化性組成物,其為接著劑用硬化性組成物。The hardening composition of claim 7, which is a hardening composition for adhesives. 一種硬化物,其為請求項7至12中任一項之硬化性組成物之硬化物。A cured product, which is a cured product of the curable composition according to any one of claims 7 to 12. 一種硬塗膜,其積層有基材、及為請求項13之硬化物之硬塗層。A hard coating film comprises a substrate and a hard coating layer which is a cured product according to claim 13. 一種轉印用膜,其積層有基材、及位於形成於該基材之至少一表面之脫模層上之硬塗層,該硬塗層為含有請求項11之硬化性組成物之層。A transfer film comprises a substrate and a hard coating layer formed on a release layer formed on at least one surface of the substrate, wherein the hard coating layer is a layer containing the curable composition of claim 11. 如請求項15之轉印用膜,其於上述硬塗層上依序進而積層增黏塗層(anchor coat layer)及接著劑層。The transfer film of claim 15 further comprises an anchor coat layer and an adhesive layer sequentially deposited on the hard coat layer. 如請求項15之轉印用膜,其進而含有至少一層之著色層。The transfer film of claim 15 further comprises at least one colored layer. 如請求項15之轉印用膜,其中,上述硬塗層之厚度為3~150 μm。The transfer film of claim 15, wherein the thickness of the hard coating layer is 3 to 150 μm. 一種接著片,其具有基材及接著劑層,該接著劑層位於該基材上之至少一面,且為含有請求項12之硬化性組成物之層。A bonding sheet comprises a substrate and an adhesive layer, wherein the adhesive layer is located on at least one side of the substrate and is a layer containing the curable composition of claim 12. 一種接著片,其具有基材、增黏塗層及接著劑層,該增黏塗層及該接著劑層位於該基材上之至少一面,該增黏塗層含有矽烷偶合劑,該接著劑層為含有請求項12之硬化性組成物之層;上述接著劑層設置於上述增黏塗層之表面上。A bonding sheet comprising a substrate, an adhesion-promoting coating layer, and an adhesive layer, wherein the adhesion-promoting coating layer and the adhesive layer are located on at least one side of the substrate, the adhesion-promoting coating layer contains a silane coupling agent, and the adhesive layer is a layer containing the curable composition of claim 12; the adhesive layer is disposed on a surface of the adhesion-promoting coating layer.
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TW202219182A (en) 2022-05-16
WO2022044969A1 (en) 2022-03-03

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