UA93261C2 - Полимерная частичка, которая поглощает b ближнем инфракрасном диапазоне, способ ee получения, композиция для покрытия и негативная офсетная печатная форма - Google Patents

Полимерная частичка, которая поглощает b ближнем инфракрасном диапазоне, способ ee получения, композиция для покрытия и негативная офсетная печатная форма

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Publication number
UA93261C2
UA93261C2 UAA200901183A UAA200901183A UA93261C2 UA 93261 C2 UA93261 C2 UA 93261C2 UA A200901183 A UAA200901183 A UA A200901183A UA A200901183 A UAA200901183 A UA A200901183A UA 93261 C2 UA93261 C2 UA 93261C2
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UA
Ukraine
Prior art keywords
near infrared
negative
manufacture
coating composition
printing plate
Prior art date
Application number
UAA200901183A
Other languages
English (en)
Ukrainian (uk)
Inventor
Май T. Нгуен
Марк Андрэ Локас
Original Assignee
Американ Дай Copc Инк.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Американ Дай Copc Инк. filed Critical Американ Дай Copc Инк.
Publication of UA93261C2 publication Critical patent/UA93261C2/ru

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/285—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing a polyether chain in the alcohol moiety
    • C08F220/286—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing a polyether chain in the alcohol moiety and containing polyethylene oxide in the alcohol moiety, e.g. methoxy polyethylene glycol (meth)acrylate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1041—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by modification of the lithographic properties without removal or addition of material, e.g. by the mere generation of a lithographic pattern
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/38—Esters containing sulfur
    • C08F220/382—Esters containing sulfur and containing oxygen, e.g. 2-sulfoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/42—Nitriles
    • C08F220/44—Acrylonitrile
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • C08L33/16—Homopolymers or copolymers of esters containing halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C09D133/16—Homopolymers or copolymers of esters containing halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/32—Radiation-absorbing paints
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

Изобретение касается полимерных частичек с размером частичек приблизительно от 60 нм приблизительно до 1000 нм, которые содержат полимер, где полимер содержит гидрофобный каркас, сегмент, который поглощает в ближнем инфракрасном диапазоне, к которому присоединены хромофор, который поглощает в ближнем инфракрасном диапазоне, имеет пик поглощения приблизительно от 70 нм приблизительно до 1100 нм; и сегмент, прозрачный в ближнем инфракрасном диапазоне. Также описаны способы получения этих частичек. Также обеспечена композиция для покрытия, которая содержит вышеупомянутые полимерные частички, и реакционноспособный олигомер йодония. Изобретение также касается негативной офсетной печатной формы, которая содержит субстрат; гидрофильный нижний слой и в�
UAA200901183A 2006-08-24 2007-08-10 Полимерная частичка, которая поглощает b ближнем инфракрасном диапазоне, способ ee получения, композиция для покрытия и негативная офсетная печатная форма UA93261C2 (ru)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US82341506P 2006-08-24 2006-08-24

Publications (1)

Publication Number Publication Date
UA93261C2 true UA93261C2 (ru) 2011-01-25

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Application Number Title Priority Date Filing Date
UAA200901183A UA93261C2 (ru) 2006-08-24 2007-08-10 Полимерная частичка, которая поглощает b ближнем инфракрасном диапазоне, способ ee получения, композиция для покрытия и негативная офсетная печатная форма

Country Status (11)

Country Link
US (1) US7723010B2 (ru)
EP (1) EP2054454B1 (ru)
JP (1) JP5593068B2 (ru)
KR (1) KR101312760B1 (ru)
CN (1) CN101484484B (ru)
BR (1) BRPI0716670B1 (ru)
CA (1) CA2661147C (ru)
RU (1) RU2434024C2 (ru)
TW (1) TWI385184B (ru)
UA (1) UA93261C2 (ru)
WO (1) WO2008022431A1 (ru)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI409280B (zh) * 2007-07-31 2013-09-21 American Dye Source Inc 聚合物染料、塗覆層組合物及熱微影印刷板
CA2768722C (en) 2009-09-15 2014-12-09 Mylan Group Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates
RU2487882C1 (ru) 2009-10-29 2013-07-20 Майлан Груп Галлотанниновые соединения в композициях для покрытия литографических печатных форм
TWI523768B (zh) 2010-04-20 2016-03-01 米蘭集團公司 用於平版印刷的組成物
JP5740234B2 (ja) * 2010-07-30 2015-06-24 富士フイルム株式会社 平版印刷版原版及びそれに用いる新規なベタイン含有ポリマー
JP5578994B2 (ja) * 2010-08-27 2014-08-27 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、並びにそれを用いたレジスト膜及びパターン形成方法
JP5593447B2 (ja) 2010-09-14 2014-09-24 マイラン・グループ ポジティブワーキング感熱平板印刷基板用の近赤外線感光被覆用組成物のための共重合体
JP6312803B2 (ja) 2013-04-10 2018-04-18 マイラン・グループ 積層基板を含む平版印刷版
WO2016182367A1 (ko) * 2015-05-12 2016-11-17 코오롱인더스트리 주식회사 폴리머 비드, 폴리머 비드의 제조방법 및 이를 이용한 광학용 필름
CN106699930A (zh) * 2016-12-01 2017-05-24 沈阳化工研究院有限公司 一种油品标记聚合物及制备方法和应用
EP3632696B1 (en) * 2017-05-31 2023-04-26 FUJIFILM Corporation Lithographic printing plate precursor, production method for lithographic printing plate, polymer particles, and composition
CN108610461B (zh) * 2018-04-12 2020-10-20 南京邮电大学 一种近红外二区成像造影剂及其制备方法和用途
JP7357070B2 (ja) * 2019-04-24 2023-10-05 イー インク コーポレイション 電気泳動粒子、媒体、およびディスプレイならびにそれらの生成のためのプロセス
US11714354B2 (en) 2020-03-25 2023-08-01 Eastman Kodak Company Lithographic printing plate precursor and method of use
CN111925469B (zh) * 2020-08-19 2021-04-06 上海金成高分子材料有限公司 一种高纯水制备专用树脂的方法
US12436459B2 (en) 2021-04-01 2025-10-07 Eastman Kodak Company Lithographic printing plate precursor and method of use
US12222645B2 (en) 2022-03-03 2025-02-11 Eastman Kodak Company Lithographic printing plate precursor and method of use

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE723556A (ru) * 1967-11-21 1969-04-16
DE69411242T2 (de) 1993-04-20 1999-03-25 Asahi Kasei Kogyo K.K., Osaka Lithographische druckplatte sowie verfahren zu ihrer herstellung
DE19536805A1 (de) 1995-10-02 1997-04-03 Basf Lacke & Farben Zur Herstellung von Flexodruckplatten durch digitale Informationsübertragung geeignetes mehrschichtiges Aufzeichnungselement
EP0770495B1 (en) 1995-10-24 2002-06-19 Agfa-Gevaert A method for making a lithographic printing plate involving on press development
US6261740B1 (en) 1997-09-02 2001-07-17 Kodak Polychrome Graphics, Llc Processless, laser imageable lithographic printing plate
US6340722B1 (en) * 1998-09-04 2002-01-22 The University Of Akron Polymerization, compatibilized blending, and particle size control of powder coatings in a supercritical fluid
US6124425A (en) * 1999-03-18 2000-09-26 American Dye Source, Inc. Thermally reactive near infrared absorption polymer coatings, method of preparing and methods of use
US6132933A (en) * 1999-07-30 2000-10-17 American Dye Source, Inc. Thermal waterless lithographic printing plates
JP2001270919A (ja) 2000-01-17 2001-10-02 Toyo Gosei Kogyo Kk 高分子化合物及びその製造方法並びに感光性組成物及びパターン形成方法
US6506533B1 (en) * 2000-06-07 2003-01-14 Kodak Polychrome Graphics Llc Polymers and their use in imagable products and image-forming methods
US6558872B1 (en) * 2000-09-09 2003-05-06 Kodak Polychrome Graphics Llc Relation to the manufacture of masks and electronic parts
JP2002097384A (ja) * 2000-09-21 2002-04-02 Fuji Photo Film Co Ltd 高分子色素及びその製造方法
US6777155B2 (en) * 2000-10-03 2004-08-17 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate
EP1226976B1 (en) 2001-01-24 2006-11-02 Fuji Photo Film Co., Ltd. Hydrophilic polymer having silane coupling group terminal and lithographic printing plate base
JP2002251008A (ja) 2001-02-23 2002-09-06 Fuji Photo Film Co Ltd 画像記録材料
US6582882B2 (en) 2001-04-04 2003-06-24 Kodak Polychrome Graphics Llc Imageable element comprising graft polymer
US6899994B2 (en) 2001-04-04 2005-05-31 Kodak Polychrome Graphics Llc On-press developable IR sensitive printing plates using binder resins having polyethylene oxide segments
US6846614B2 (en) 2002-02-04 2005-01-25 Kodak Polychrome Graphics Llc On-press developable IR sensitive printing plates
EP1344644B1 (en) 2002-03-13 2007-07-25 FUJIFILM Corporation Lithographic printing plate precursor
US7659046B2 (en) 2002-04-10 2010-02-09 Eastman Kodak Company Water-developable infrared-sensitive printing plate
US6983694B2 (en) 2002-04-26 2006-01-10 Agfa Gevaert Negative-working thermal lithographic printing plate precursor comprising a smooth aluminum support
EP1356926B1 (en) * 2002-04-26 2008-01-16 Agfa Graphics N.V. Negative-working thermal lithographic printing plate precursor comprising a smooth aluminum support.
JP2004012706A (ja) 2002-06-05 2004-01-15 Fuji Photo Film Co Ltd 平版印刷版原版
US6969575B2 (en) 2002-08-29 2005-11-29 Fuji Photo Film Co., Ltd. On-press developable lithographic printing plate precursor
US6953652B2 (en) 2003-01-27 2005-10-11 Agfa-Gevaert Heat-sensitive lithographic printing plate precursor
US7001704B2 (en) 2003-01-29 2006-02-21 Fuji Photo Film Co., Ltd. Presensitized lithographic plate comprising microcapsules
US7368215B2 (en) * 2003-05-12 2008-05-06 Eastman Kodak Company On-press developable IR sensitive printing plates containing an onium salt initiator system
US6889994B1 (en) 2003-06-30 2005-05-10 Jason Birkenbaugh Trailer pulling apparatus
US7070902B2 (en) * 2003-08-26 2006-07-04 Eastman Kodak Company Imageable elements containing cyanoacrylate polymer particles
CN101454277B (zh) * 2006-05-17 2014-02-19 美洲染料资源公司 用于平版印刷版涂料的材料、含这些材料的平版印刷版和涂料以及制备方法和用途

Also Published As

Publication number Publication date
BRPI0716670B1 (pt) 2019-09-10
US7723010B2 (en) 2010-05-25
JP2010501650A (ja) 2010-01-21
HK1131630A1 (en) 2010-01-29
KR20090055568A (ko) 2009-06-02
CA2661147A1 (en) 2008-02-28
BRPI0716670A2 (pt) 2013-10-15
WO2008022431A1 (en) 2008-02-28
US20080171286A1 (en) 2008-07-17
EP2054454A4 (en) 2012-02-08
TW200906868A (en) 2009-02-16
CA2661147C (en) 2013-02-05
CN101484484B (zh) 2012-10-10
KR101312760B1 (ko) 2013-09-30
TWI385184B (zh) 2013-02-11
RU2434024C2 (ru) 2011-11-20
EP2054454B1 (en) 2017-11-08
EP2054454A1 (en) 2009-05-06
JP5593068B2 (ja) 2014-09-17
RU2009110493A (ru) 2010-09-27
CN101484484A (zh) 2009-07-15

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