US20060260948A2 - Method for electrodeposition of bronzes - Google Patents

Method for electrodeposition of bronzes Download PDF

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Publication number
US20060260948A2
US20060260948A2 US11/105,947 US10594705A US2006260948A2 US 20060260948 A2 US20060260948 A2 US 20060260948A2 US 10594705 A US10594705 A US 10594705A US 2006260948 A2 US2006260948 A2 US 2006260948A2
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US
United States
Prior art keywords
electrolyte
thioether
concentration
wetting agent
thiobis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US11/105,947
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English (en)
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US20050263403A1 (en
Inventor
Katrin Zschintzsch
Joachim Heyer
Marlies Kleinfeld
Stefan Schafer
Ortud Steinius
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MacDermid Enthone Inc
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Enthone Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Enthone Inc filed Critical Enthone Inc
Priority to US11/105,947 priority Critical patent/US20060260948A2/en
Publication of US20050263403A1 publication Critical patent/US20050263403A1/en
Priority to TW095113445A priority patent/TWI391534B/zh
Priority to JP2008506756A priority patent/JP2008537017A/ja
Priority to PCT/US2006/014141 priority patent/WO2006113473A1/fr
Priority to KR1020077026291A priority patent/KR101361431B1/ko
Priority to CN2006800208357A priority patent/CN101194049B/zh
Priority to EP06750231.0A priority patent/EP1874982B1/fr
Publication of US20060260948A2 publication Critical patent/US20060260948A2/en
Abandoned legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/58Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/60Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin

Definitions

  • This invention concerns a method for electrodeposition of bronzes, with which the substrate to be coated is plated in an acid electrolyte that contains at least tin and copper ions, an alkylsulfonic acid and a wetting agent, and the preparation of such an electrolyte.
  • acid electrolytes and methods for deposition of qualitatively high grade tin or tin alloys with a higher deposition rate are known from EP 1 111 097 A2 and US 6,176,996 B1. These are electrolytes that contain at least two divalent metal salts of an organic sulfonic acid and from which are deposited solderable and corrosion resistant coatings that can be used, for example, as substitutes for lead-containing solderable coatings in electronics for manufacture of circuit boards, etc.
  • bronze coatings are used in the jewelry industry as a substitute for expensive silver or allergy-triggering nickel.
  • methods for electrodeposition of bronzes are also gaining importance in some technical fields, for example in electronics for coating electronic components or in mechanical engineering and/or in process technology for coating bearing overlays and friction layers.
  • chiefly white bronzes or the so-called "false bronzes,” whose copper content can be kept quite low due to process conditions, are deposited as nickel substitutes.
  • the invention is based on the task of providing a method for deposition of bronzes that, in contrast to the methods known from the prior art, enables uniform deposition of at least tin and copper side by side from an acid electrolyte at considerably higher deposition rates. Moreover, with this method firmly bonding and pore-free bronze coatings with high copper contents as well as various decorative and mechanical properties are said to be deposited.
  • an acid electrolyte that can have a high content of divalent copper ions, is stable with respect to oxidation-caused sludge formation, and is both economical and environmentally friendly when used over a long period of time, is to be made available.
  • the task is solved in accordance with the invention by a method of the kind mentioned at the start, which is characterized by the fact that an aromatic, nonionic wetting agent is added to the electrolyte.
  • a method for electrodeposition of bronzes is made available, where an anode of a copper-tin alloy and a cathode are connected to the substrate that is to be coated by means of an electrolyte, and coating takes place by passing a direct current through them.
  • an electrolyte that is usable in particular for this method and the coatings that are obtainable by this method are made available.
  • the disadvantages known in the prior art are remedied with the offering of a new electrolyte composition and in this way considerably better deposition results are achieved.
  • the conduct of the method is made to be simpler and more economical.
  • This, too, is chiefly based on the advantageous composition of the electrolyte.
  • the method is carried out at room temperature, or between 17 and 25 C, and the substrate to be coated is plated in a highly acid environment at a pH ⁇ 1.
  • the electrolyte is particularly stable in this temperature range.
  • there are no longer any costs for heating the electrolyte and the plated substrates also do not have to be cooled very much, with large expenditures of time and money.
  • deposition rates of 0.25 ⁇ m/min at a current density of 1 A/dm 2 are achieved due to, among other things, the pH value and the advantageous addition of at least one aromatic non-ionic wetting agent.
  • this rate can be raised up to 7 A/dm 2 in rack operation and even up to 120 A/dm 2 for continuous plants.
  • usable current densities in a range from 0.1-120 A/dm 2 are reached in each case according to plant type.
  • the wetting of the surfaces to be plated is considerably improved in particular through the addition of at least one nonionic wetting agent to the electrolyte.
  • nonionic wetting agent that is used is that because of the advantageous wetting properties the electrolyte and/or the substrate in the electrolyte need to be agitated only a little or even not at all, in order to achieve the desired deposition results, so that additional devices for agitation of the electrolyte can be omitted.
  • aromatic nonionic wetting agent because of the advantageous use of the aromatic nonionic wetting agent, electrolyte residues drain from the plated substrate better when it is removed from the electrolyte, which leads to reduced entrainment losses and thus to lower process costs.
  • the proposed method is therefore advantageously economical and environmentally friendly compared to the cyanide processes.
  • anionic and/or aliphatic nonionic wetting agent that is known from the prior art is also optionally possible, provided these wetting agents support or even enhance the advantageous effects of the aromatic nonionic wetting agent.
  • polyethylene glycols and/or anionic surfactants are preferably added to the electrolyte as anionic and/or aliphatic nonionic wetting agents.
  • Additional exemplary aliphatic nonionic wetting agents include aliphatic fatty alcohol ethoxylates.
  • substituted dithioglycols act advantageously as wetting agents and brighteners. Therefore, certain embodiments of the invention include substituted dithioglycols, such as, for example, those selected from the group consisting of: (1) Thiobis(diethyleneglycol) represented by H-(OCH 2 CH 2 ) 2 -S-(CH 2 CH 2 O) 2 -H, (2) Thiobis(hexaethylene glycol), (3) Thiobis(pentadecaglycelol) represented by H-(OCH 2 CH(OH)CH 2 ) 15 -S-(CH 2 CH(OH)CH 2 O) 15 -H, (4) Thiobis(icosaethyleneglycol) represented by H-(OCH 2 CH 2 ) 20 -S-(CH 2 CH 2 O) 20 -H, (5) Thiobis(pentacontaethyleneglycol), (6) 4,10-dioxa-7-thiatridecane-2,12-diol represented by:
  • the method in accordance with the invention is characterized in particular by the special composition of the electrolyte. It contains essentially tin and copper ions, an alkylsulfonic acid and an aromatic nonionic wetting agent.
  • stabilizers and/or complexing agents, anionic and/or nonionic, aliphatic and/or substituted dithioglycol wetting agents, oxidation inhibitors, brighteners, and other metal salts can optionally be contained in the electrolyte.
  • the metals that are primarily added to the electrolyte for deposition of bronzes in accordance with the invention – tin and copper – can first and foremost be in the form of salts of alkylsulfonic acids, preferably as methanesulfonates, or as salts of mineral acids, preferably as sulfates.
  • Tin methanesulfonate is especially preferably used as tin salt in the electrolyte preferably in an amount of 5-195 g/L of electrolyte, preferably 11-175 g/L of electrolyte. This corresponds to a use of 2-75 g/L, preferably 4-57 g/L divalent tin ions.
  • Copper methanesulfonate is especially preferably used in the electrolyte as the copper salt, which is advantageously added to the electrolyte in an amount of 8-280 g/L of electrolyte, preferably 16-260 g/L of electrolyte. This corresponds to the use of 2-70 g/L, preferably 4-65 g/L divalent copper ions.
  • an acid preferably a mineral and/or an alkylsulfonic acid
  • an acid is added to the electrolyte in amounts of 140-382 g/L of electrolyte, preferably 175-245 g/L of electrolyte.
  • methanesulfonic acid turned out to be especially advantageous, since for one thing this produces advantageous solubility of metal salts and for another, because of its acid strength, it produces or facilitates the adjustment of the pH needed for the process.
  • methanesulfonic acid has the advantageous property of contributing considerably to the stability of the bath.
  • At least one additional metal and/or chloride is added to the electrolyte.
  • the metals are in the form of their soluble salts.
  • the addition of zinc and/or bismuth has a considerable effect on the properties of the deposited coatings.
  • the metals zinc and/or bismuth added to the electrolyte can namely be in the form of salts of alkylsulfonic acids, preferably as methanesulfonates or as salts of mineral acids, preferably as sulfates.
  • Zinc sulfate is especially preferably uses in the electrolytes as zinc salt, and is advantageously added in an amount of 0-25 g/L of electrolyte, preferably 15-20 g/L of electrolyte.
  • Bismuth methane sulfate is especially preferably used in the electrolyte as bismuth salt and is advantageously added to the electrolyte in an amount of 0-5 g/L of electrolyte, preferably 0.05-0.2 g/L of electrolyte.
  • additives for example stabilizers and/or complexing agents, oxidation inhibitors and brighteners, that are usually used in acid electrolytes for deposition of tin alloys can be added to the electrolyte.
  • Gluconates are advantageously added to the electrolyte and stabilizers and/or complexing agents.
  • the concentration of the stabilizers and/or complexing agents is 0-50 g/L of electrolyte, preferably 20-30 g/L of electrolyte.
  • Compounds from the class of the dihydroxybenzenes, for example mono- or polyhydroxyphenyl compounds like pyrocatechol or phenolsulfonic acid are preferably used as oxidation inhibitors.
  • the concentration of oxidation inhibitors is 0-5 g/L of electrolyte.
  • the electrolyte contains hydroquinone as oxidation inhibitor.
  • the conduct of the method in accordance with the invention enables the deposition of bronzes onto various substrates.
  • all of the usual methods for making electronic components can be used.
  • especially hard and wear-resistant bronze coatings can be deposited on materials like bearings, etc., to the method in accordance with the invention.
  • the method in accordance with the invention is advantageously also used in the fields of decorative coating of, for example, fixtures and jewelry, etc., where the deposition of multi-component alloys that contain tin, copper, zinc and bismuth is particularly advantageous in these areas.
  • a really special advantage is that the so-called "true" bronzes that have a copper content >60% can be deposited with the method in accordance with the invention, where the copper content can be up to 95 wt% in each according to the desired properties.
  • the ratio of the amount of copper to the amount of tin in the electrolyte has a considerable effect of properties like hardness and color of the bronze coatings. For instance, at a tin/copper ratio of 40/60 silver-colored coatings, the so-called white bronzes, which are relatively soft, are deposited. At a tin/copper ratio of 20/80 yellow gold colored coatings result, the so-called yellow bronzes, and at a tin/copper ratio of 10/90 red gold colored coatings are formed, the so-called red bronzes.
  • the electrolyte contains brighteners from the class of the aromatic carbonyl compounds and/or á,â-unsaturated carbonyl compounds.
  • the concentration of brighteners is 0-5 g/L of electrolyte.
  • Electrolyte composition :
  • the base electrolyte of the highly acid electrolyte in accordance with the invention contains essentially (per liter of electrolyte) 2-75 g divalent tin, 2-70 g divalent copper, 2-40 g of an aromatic nonionic wetting agent, and 140-382 g of a mineral and/or alkylsulfonic acid.
  • electrolyte per liter of electrolyte: 0-10 g of an anionic and/or aliphatic nonionic wetting agent, 0-50 g of a stabilizer and/or complexing agent, 0-5 g of an oxidation inhibitor, 0-5 g of a brightener 0-5 trivalent bismuth 0-25 g divalent zinc.
  • the electrolyte is prepared by varying the individual components, as given below as a matter of example. Additional information about the corresponding process conditions as well as other properties of the individual coatings can be seen in Table 1.
  • Example 1 (red bronze) 4 g/L Sn 2+ 18 g/L Cu 2+ 286 g/L methanesulfonic acid 3 g/L aromatic nonionic wetting agent 0.4 g/l aliphatic nonionic wetting agent 2 g/L oxidation inhibitor 20 mg/L complexing agent
  • Example 2a (yellow bronze) 4 g/L Sn 2+ 18 g/L Cu 2+ 240 g/L methanesulfonic acid 32.2 g/L aromatic nonionic wetting agent 2 g/L oxidation inhibitor 25 mg/L stabilizer/complexing agent
  • Example 2b (yellow bronze) 4 g/L Sn 2+ 18 g/L Cu 2+ 286 g/L methanesulfonic acid 32.2 g/L aromatic nonionic wetting agent 6 mg/L brightener 2 g/L oxidation inhibitor 50 mg/L stabilizer/complexing agent
  • Example 3 (white bronze) 5 g/L Sn 2+ 10 g/L Cu 2+ 240 g/L methanesulfonic acid 32.2 g/L aromatic nonionic wetting agent 6 mg/L brightener 2 g/L oxidation inhibitor 25 mg/L stabilizer/complexing agent
  • Example 4 (matte white bronze) 18 g/L Sn 2+ 2 g/L Cu 2+ 258 g/L methanesulfonic acid 9 g/L aromatic nonionic wetting agent
  • Example 5 (high ductility) 4 g/L Sn 2+ 18 g/L Cu 2+ 238 g/L methanesulfonic acid 32.2 g/L aromatic nonionic wetting agent 3 mg/L brightener 2 g/L oxidation inhibitor 25 mg/L stabilizer/complexing agent 20 g/L ZnSO 4
  • Example 6 (hardness) 4 g/L Sn 2+ 18 g/L Cu 2+ 238 g/L methanesulfonic acid 32.2 g/L aromatic nonionic wetting agent 2 g/L oxidation inhibitor 25 mg/L stabilizer/complexing agent 0.1 g/L Bi 3+
  • Example 7 (yellow bronze) 14.5 g/L Sn 2+ 65.5 g/L Cu 2+ 382 g/L methanesulfonic acid 32.2 g/L aromatic nonionic wetting agent 4 g/L oxidation inhibitor 25 mg/L stabilizer/complexing agent 20 g/L ZnSO 4
  • Example 8 (yellow bronze) 2 g/L Sn 2+ 8 g/L Cu 2+ 400 g/L methanesulfonic acid 2.5 g/L aromatic nonionic wetting agent 1 g/L fatty alcohol ethoxylate 4 g/L oxidation inhibitor
  • Example 9 (white bronze) 4 g/L Sn 2+ 8 g/L Cu 2+ 400 g/L methanesulfonic acid 1 g/L aromatic nonionic wetting agent 40 mg/L substituted dithioglycol 4 g/L oxidation inhibitor

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
US11/105,947 2005-04-14 2005-04-14 Method for electrodeposition of bronzes Abandoned US20060260948A2 (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
US11/105,947 US20060260948A2 (en) 2005-04-14 2005-04-14 Method for electrodeposition of bronzes
TW095113445A TWI391534B (zh) 2005-04-14 2006-04-14 青銅之電沈積方法
JP2008506756A JP2008537017A (ja) 2005-04-14 2006-04-14 ブロンズの電着方法
PCT/US2006/014141 WO2006113473A1 (fr) 2005-04-14 2006-04-14 Methode d'electrodeposition de bronzes
KR1020077026291A KR101361431B1 (ko) 2005-04-14 2006-04-14 청동의 전기침착 방법
CN2006800208357A CN101194049B (zh) 2005-04-14 2006-04-14 电沉积青铜的方法
EP06750231.0A EP1874982B1 (fr) 2005-04-14 2006-04-14 Methode d'electrodeposition de bronzes

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP02022718.7 2002-10-11
US11/105,947 US20060260948A2 (en) 2005-04-14 2005-04-14 Method for electrodeposition of bronzes

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US20050263403A1 US20050263403A1 (en) 2005-12-01
US20060260948A2 true US20060260948A2 (en) 2006-11-23

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US (1) US20060260948A2 (fr)
EP (1) EP1874982B1 (fr)
JP (1) JP2008537017A (fr)
KR (1) KR101361431B1 (fr)
CN (1) CN101194049B (fr)
TW (1) TWI391534B (fr)
WO (1) WO2006113473A1 (fr)

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US20060137991A1 (en) * 2002-10-11 2006-06-29 Enthone Inc Method for bronze galvanic coating
WO2012022689A1 (fr) * 2010-08-17 2012-02-23 Umicore Galvanotechnik Gmbh Electrolyte et procédé de dépôt de couches en alliage de cuivre-étain
US8426241B2 (en) 2010-09-09 2013-04-23 International Business Machines Corporation Structure and method of fabricating a CZTS photovoltaic device by electrodeposition
WO2015084778A1 (fr) * 2013-12-05 2015-06-11 Honeywell International Inc. Solution de méthanesulfonate stanneux à ph ajusté
US10155894B2 (en) 2014-07-07 2018-12-18 Honeywell International Inc. Thermal interface material with ion scavenger
US10287471B2 (en) 2014-12-05 2019-05-14 Honeywell International Inc. High performance thermal interface materials with low thermal impedance
US10312177B2 (en) 2015-11-17 2019-06-04 Honeywell International Inc. Thermal interface materials including a coloring agent
US10428256B2 (en) 2017-10-23 2019-10-01 Honeywell International Inc. Releasable thermal gel
US10501671B2 (en) 2016-07-26 2019-12-10 Honeywell International Inc. Gel-type thermal interface material
EP3310945B1 (fr) * 2015-06-16 2020-09-02 3M Innovative Properties Company Bronze de placage sur feuilles de polymère
US10781349B2 (en) 2016-03-08 2020-09-22 Honeywell International Inc. Thermal interface material including crosslinker and multiple fillers
US11041103B2 (en) 2017-09-08 2021-06-22 Honeywell International Inc. Silicone-free thermal gel
US11072706B2 (en) 2018-02-15 2021-07-27 Honeywell International Inc. Gel-type thermal interface material
US11373921B2 (en) 2019-04-23 2022-06-28 Honeywell International Inc. Gel-type thermal interface material with low pre-curing viscosity and elastic properties post-curing

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DE102004041701A1 (de) * 2004-08-28 2006-03-02 Enthone Inc., West Haven Verfahren zur elektrolytischen Abscheidung von Metallen
US7296370B2 (en) * 2004-09-24 2007-11-20 Jarden Zinc Products, Inc. Electroplated metals with silvery-white appearance and method of making
ATE516388T1 (de) * 2006-05-24 2011-07-15 Atotech Deutschland Gmbh Metallplattierungszusammensetzung und verfahren zur ablagerung von kupfer-zink-blech zur herstellung einer dünnfilm-solarzelle
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JP6101510B2 (ja) * 2013-02-18 2017-03-22 株式会社シミズ 非シアン銅−錫合金めっき浴
US8945978B2 (en) * 2013-06-28 2015-02-03 Sunpower Corporation Formation of metal structures in solar cells
JP6048712B2 (ja) * 2014-08-08 2016-12-21 奥野製薬工業株式会社 銅−スズ合金めっき浴
US20160298249A1 (en) * 2014-09-30 2016-10-13 Rohm And Haas Electronic Materials Llc Cyanide-free electroplating baths for white bronze based on copper (i) ions
KR102426521B1 (ko) * 2015-04-20 2022-07-27 아토테크 도이칠란트 게엠베하 운트 콤파니 카게 전해 구리 도금 배쓰 조성물 및 그 사용 방법
CN108103540B (zh) * 2018-01-24 2020-01-07 永星化工(上海)有限公司 锡合金电镀液
CN112236548B (zh) * 2018-07-27 2022-03-04 三菱综合材料株式会社 锡合金镀液
JP6645609B2 (ja) 2018-07-27 2020-02-14 三菱マテリアル株式会社 錫合金めっき液

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US4565608A (en) * 1983-11-02 1986-01-21 Degussa Aktiengesellschaft Alkaline cyanide bath for electrolytic deposition of copper-tin-alloy coatings
US5443714A (en) * 1989-10-19 1995-08-22 Blasberg Oberflachentechnik, Gmbh Process and electrolyte for depositing lead and lead-containing layers
US5176957A (en) * 1989-12-05 1993-01-05 Sumitomo Rubber Industries, Ltd. Bead wire for tire, rubber-coated bead wire for tire and tire using the same
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US20060137991A1 (en) * 2002-10-11 2006-06-29 Enthone Inc Method for bronze galvanic coating
WO2012022689A1 (fr) * 2010-08-17 2012-02-23 Umicore Galvanotechnik Gmbh Electrolyte et procédé de dépôt de couches en alliage de cuivre-étain
US8426241B2 (en) 2010-09-09 2013-04-23 International Business Machines Corporation Structure and method of fabricating a CZTS photovoltaic device by electrodeposition
US8790956B2 (en) 2010-09-09 2014-07-29 International Business Machines Corporation Structure and method of fabricating a CZTS photovoltaic device by electrodeposition
US9041141B2 (en) 2010-09-09 2015-05-26 International Business Machines Corporation Structure and method of fabricating a CZTS photovoltaic device by electrodeposition
WO2015084778A1 (fr) * 2013-12-05 2015-06-11 Honeywell International Inc. Solution de méthanesulfonate stanneux à ph ajusté
US10174433B2 (en) 2013-12-05 2019-01-08 Honeywell International Inc. Stannous methanesulfonate solution with adjusted pH
US10428257B2 (en) 2014-07-07 2019-10-01 Honeywell International Inc. Thermal interface material with ion scavenger
US10155894B2 (en) 2014-07-07 2018-12-18 Honeywell International Inc. Thermal interface material with ion scavenger
US10287471B2 (en) 2014-12-05 2019-05-14 Honeywell International Inc. High performance thermal interface materials with low thermal impedance
EP3310945B1 (fr) * 2015-06-16 2020-09-02 3M Innovative Properties Company Bronze de placage sur feuilles de polymère
US11293111B2 (en) 2015-06-16 2022-04-05 3M Innovative Properties Company Plating bronze on polymer sheets
US10312177B2 (en) 2015-11-17 2019-06-04 Honeywell International Inc. Thermal interface materials including a coloring agent
US10781349B2 (en) 2016-03-08 2020-09-22 Honeywell International Inc. Thermal interface material including crosslinker and multiple fillers
US10501671B2 (en) 2016-07-26 2019-12-10 Honeywell International Inc. Gel-type thermal interface material
US11041103B2 (en) 2017-09-08 2021-06-22 Honeywell International Inc. Silicone-free thermal gel
US10428256B2 (en) 2017-10-23 2019-10-01 Honeywell International Inc. Releasable thermal gel
US11072706B2 (en) 2018-02-15 2021-07-27 Honeywell International Inc. Gel-type thermal interface material
US11373921B2 (en) 2019-04-23 2022-06-28 Honeywell International Inc. Gel-type thermal interface material with low pre-curing viscosity and elastic properties post-curing

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US20050263403A1 (en) 2005-12-01
WO2006113473A1 (fr) 2006-10-26
CN101194049A (zh) 2008-06-04
TW200702498A (en) 2007-01-16
TWI391534B (zh) 2013-04-01
CN101194049B (zh) 2011-12-07
JP2008537017A (ja) 2008-09-11
KR20070120600A (ko) 2007-12-24
EP1874982A4 (fr) 2011-07-27
EP1874982A1 (fr) 2008-01-09
KR101361431B1 (ko) 2014-02-10
EP1874982B1 (fr) 2014-05-07

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