US3028491A - Apparatus for producing and shaping a beam of charged particles - Google Patents

Apparatus for producing and shaping a beam of charged particles Download PDF

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Publication number
US3028491A
US3028491A US822000A US82200059A US3028491A US 3028491 A US3028491 A US 3028491A US 822000 A US822000 A US 822000A US 82200059 A US82200059 A US 82200059A US 3028491 A US3028491 A US 3028491A
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Prior art keywords
lens
charged particles
producing
axis
intensity
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Expired - Lifetime
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US822000A
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English (en)
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Schleich Fritz
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Carl Zeiss AG
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Carl Zeiss AG
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    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B3/00—Apparatus for testing the eyes; Instruments for examining the eyes
    • A61B3/10—Objective types, i.e. instruments for examining the eyes independent of the patients' perceptions or reactions
    • A61B3/13—Ophthalmic microscopes
    • A61B3/135—Slit-lamp microscopes
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B3/00—Apparatus for testing the eyes; Instruments for examining the eyes
    • A61B3/10—Objective types, i.e. instruments for examining the eyes independent of the patients' perceptions or reactions
    • A61B3/16—Objective types, i.e. instruments for examining the eyes independent of the patients' perceptions or reactions for measuring intraocular pressure, e.g. tonometers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S164/00—Metal founding
    • Y10S164/05—Electron beam

Definitions

  • This invention relates to the production of beams of charged particles and, more particularly, relates to apparatus for producing and shaping beams of high energy charged particles into an impinging beam of high intensity across a sharply defined cross section.
  • the focussing lens has been an axially symmetrical lens.
  • the lens aberrations and, particularly the spherical aberration of an axially symmetrical lens makes it very difiicult to focus a beam having a large focal aperture.
  • focussing such a beam with an axia y symmetrical lens one obtains an -irnpinging beam which has a nonuniform intensity dis- 'tribution throughout the beam cross section.
  • the object of this invention to provide an apparatus for producing and focussing a beam of charged particles having a large focal aperture which will have a uniformly high intensity throughout the beam cross section taken at the work piece and which will have a sharply defined peripheral edge at which the beam intensity will decrease sharply.
  • a cathode, an associated control grid and an anode for producing a beam of charged particles having a large focal aperture Such apparatus will produce high beam energy with tolerable cathode emission current density levels.
  • a cylindrical lens is positioned to focus the beam upon the surface of material to be worked thereby.
  • the cylindrical lens is corrected for aberrations and has a. large angular field of view which can encompass the relatively large emitting surface of the cathode of the beam producing system.
  • the focussing of the beam en-. ergy distributed over. a large angular field by an aberration-corrected cylindrical lens provides a beam impinging upon the material having a substantially rectangular plot of energy intensity across the cross section.
  • a linearly developed cathode that is, a cathode having a dimension along one axis greater than the dimension along a co-ordinate axis.
  • a cathode it is possible to utilize a larger emitting cathode surface than is the case with round cathodes.
  • a line focus will be formed on the material instead of the round focal point usually associated with beam working apparatus.
  • a line focus is not directly useable in certain applications as: for example, the drilling of round holes in the material to be worked.
  • the cylindrical lens is preferably an electromagnetic cylindrical lens.
  • Such a lens has the advantage of permitting ease of variation in the length of beam focal line by merely changing the coil current.
  • the diameter of the bore can be varied by variation of field current in the magnetic lens.
  • control overthe diameter of the bore over a predetermined range is afforded.
  • the use of a cylindrical lens in combination with a rotating magnetic field requires relatively complex beam control apparatus.
  • the axis of the cylindrical lenses are arranged at right angles, one to the other. Such arrangement will allow production of a beam of more suitable cross sectional shape.
  • FIGURE 1 is a diagrammatic view of one embodiment of the apparatus in accordance with this invention.
  • FIGURE 2 is a top view of a doublet cylindrical lens
  • FIGURE 3 is a cross sectional view of the impinging beam or" charged particles
  • FIGURE 3a is a curve of the intensity distribution along the X axis of FIGURE 3 with intensity plotted along the axis of ordinates against distance plotted along the axis of abscissa;
  • FIGURE 3b shows the intensity distribution along the Y axis of FIGURE 3 with intensity plotted along the axis of ordinates against distance plotted along the axis of abscissa;
  • FIGURE 4 is a cross sectional view of the. beam of charged particles produced by two cylindrical lenses arranged with the primary axis perpendicular one to the ot er;
  • FIGURE 5 is a top view of a 4-fold cylindrical lens.
  • the beam is produced by a system composed of a cathode 1, a control grid 2 and an anode 3.
  • the cathode may be made of any conventional material but is preferably a linearly developed cathode, that is, its extension perpendicular to the plane of the drawing is greater than its extension in the plane of the drawing.
  • the cylindrical lenses 4 and 5 for focussing the beam are arranged between the anode 3 and the workpiece material 7 upon which the beam is to be focussed.
  • a lens 6 is provided to generate a rotating field to rotate the beam.
  • the beam of charged particles 8 is focused by the cylindrical lenses 4 and 5 to have. its smallest cross sectional area in the plane of the working piece 7.
  • the cylindrical lenses 4 and 5 are corrected with a respect to aberration by appropriate shaping of the pole shoes and/ or by mounting specially shaped ferromagnetic members which influence the distibution of the magnetic field in the air gap between the poles. Such corrective steps are known to the art.
  • each of the cylindrical lenses is comprised of 4-pole pieces 9, 18, 16 and 17 each of which is developed as an equilateral hyperbole surrounded respectively by electromagnetic coils 10, 15, 13 and 14.
  • the magnetic field closes through the central aperture of the lens (through which the beam of charged particles passes) and through the ferromagnetic ring 11 joining the poles.
  • the entire lens is contained within a container 12 of nonmagnetic material. It has been found advisable to embed the pole pieces and the coil of the lens in a potting compound 19 such as synthetic resin to prevent displacement of the pole pieces from their desired position during operation.
  • the cylindrical lenses are developed with the coils thereof lying in a plane perpendicular to the axis of a beam of charged particles.
  • electro-static cylindrical lenses instead of the electro magnetic cylindrical lenses shown in the drawing.
  • electrostatic lenses makes it necessary to apply very high voltages to the electrodes in order to focus particles of high velocity.
  • FIGURE 3 The beam focussed by only one cylindrical lens upon the surface of the material to be worked is shown in FIGURE 3.
  • the cross section 20 of the focus beam will extend along a line.
  • the intensity distribution within the cross sectional area, illustrated by curve 21 in FIGURE 3a and curve 22 in FIGURE 3b for the X and Y coordinates respectively is almost rectangular in shape.
  • the high intensity is substantially constant across the beam and the beam peripheral edges are defined by a sharp drop in intensity.
  • the elliptical outline of the beam focussed upon the surface makes it diidcult to suitably control drilling by such beam.
  • a rotating field generated by lens 6 to rotate the focussed beam about its center of area. Rotation of the beam will produce a working beam having an effective cross section which is round, illustrated by broken line in FIGURE 3. Variation of the diameter thereof within predetermined limits can be eliected conveniently by adjustment of the coil current in the cylindrical lens.
  • FIG- URE l In some applications control of the rotating held in combination with the control of the cylindrical lens is complicated. In such applications it is often preferable to employ two cylindrical lenses 4 and 5 as shown in FIG- URE l.
  • the major axis of cylindrical lens 5 is perpendicular to the axis of lens 4.
  • the beam will be focussed successively by the two cylindrical lenses to give a cross section 23, FIGURE 4, of clover leaf outline.
  • additional cylindrical lenses may be employed to shape the beam to more nearly circular cross sectional shape. In such applications it is possible to dispense with the rotating field lens during working of the material including the drilling or round holes in the material.
  • the cylindricallenses 4 and 5 may be combined into a single compound lens as is shown in FIGURE 5.
  • the lens 24 comprises 8 poles with eight associated electromagnetic coils. Each of the pole pieces is developed as an equilateral hyperbole and the remaining structure is the same as set forth in the explanation of the cylindrical lens shown in Fl URE 2.
  • the apparatus in accordance with this invention allows the focussing of a high intensity beam of charged particles having a sharply defined cross sectional outline.
  • the energy is derived from a charge particle emission system having a large focal aperture.
  • the beam may be controlled by pulses during working of the material in manner known to the art without deleteriously afiecting the focussing thereof.
  • Apparatus for producing and shaping a high intensity beam of charged particles for working material comprising a beam producing system consisting of a cathode, a control grid, and an anode, said beam producing system generating a beam of charged particles of large focal aperture, and an electromagnetic cylindrical lens posl tioned between said anode and said material to focus said beam on said material in an impinging beam of high intensity with a sharply defined periphery at which the beam intensity decreases sharply, said cylindrical lens being corrected for aberrations.
  • the beam producing system comprises a linearly extending cathode aligned with the main axis of the cylindrical lens.
  • a combination in accordance with claim 1 which includes a second cylindrical lens positioned adjacent said first lens with the main axis thereof perpendicular to the main axis of the first cylindrical lens.
  • a combination in accordance with claim 1 which includes a lens system comprising four pole pieces symmetrically spaced about an aperture through which the beam is directed.
  • a combination in accordance with clairnl which includes a lens system comprising eight pole pieces symmetrically spaced about an aperture through which the beam is directed.
  • a combination in accordance with claim 1 which includes means for producing a rotating magnetic field across the axis of said beam and perpendicular thereto to rotate said beam about its axis.

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  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Medical Informatics (AREA)
  • Biophysics (AREA)
  • Ophthalmology & Optometry (AREA)
  • Engineering & Computer Science (AREA)
  • Biomedical Technology (AREA)
  • Heart & Thoracic Surgery (AREA)
  • Physics & Mathematics (AREA)
  • Molecular Biology (AREA)
  • Surgery (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Laser Beam Processing (AREA)
US822000A 1958-06-20 1959-06-22 Apparatus for producing and shaping a beam of charged particles Expired - Lifetime US3028491A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEZ6718A DE1064168B (de) 1958-06-20 1958-06-20 Einrichtung zur Erzeugung und Formung eines Ladungstraegerstrahles

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US3028491A true US3028491A (en) 1962-04-03

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US (1) US3028491A (de)
CH (1) CH372116A (de)
DE (1) DE1064168B (de)
FR (1) FR1227633A (de)
GB (1) GB852725A (de)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3191028A (en) * 1963-04-22 1965-06-22 Albert V Crewe Scanning electron microscope
US3210171A (en) * 1960-09-12 1965-10-05 Sylvania Electric Prod Method of supplying heat of fusion to glass-to-glass seal
US3340377A (en) * 1962-07-12 1967-09-05 Jeol Ltd Method of treating material by a charged beam
US3482136A (en) * 1966-04-13 1969-12-02 High Voltage Engineering Corp Charged particle beam spreader system including three in-line quadrapole magnetic lenses
US3621327A (en) * 1969-12-29 1971-11-16 Ford Motor Co Method of controlling the intensity of an electron beam
US3732426A (en) * 1970-07-30 1973-05-08 Nihona Denshi Kk X-ray source for generating an x-ray beam having selectable sectional shapes
US4736106A (en) * 1986-10-08 1988-04-05 Michigan State University Method and apparatus for uniform charged particle irradiation of a surface
US4767930A (en) * 1987-03-31 1988-08-30 Siemens Medical Laboratories, Inc. Method and apparatus for enlarging a charged particle beam
US5021670A (en) * 1989-01-24 1991-06-04 Ict Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh Multipole element
US5589726A (en) * 1993-12-21 1996-12-31 Hughes Aircraft Company Arc lamp with external magnetic means

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2164125A1 (de) * 1971-12-23 1973-06-28 Air Liquide Arbeitskanone fuer schweissung mittels elektronenbombardement
DE3428802A1 (de) * 1984-08-04 1986-02-13 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zur steuerung des fokussierungszustandes eines abgelenkten elektronenstrahls

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB739068A (en) * 1952-08-09 1955-10-26 Emi Ltd Improvements in or relating to cathode ray tube arrangements
US2883569A (en) * 1956-01-24 1959-04-21 Herman F Kaiser Magnetic quadrupole focusing system
US2915662A (en) * 1956-08-24 1959-12-01 Nat Video Corp Centering arrangement and method for beams of cathode ray tubes
US2919381A (en) * 1956-07-25 1959-12-29 Farrand Optical Co Inc Electron lens

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE712434C (de) * 1938-01-26 1941-10-18 Siemens & Halske Akt Ges Verfahren zur Herstellung von reinen Oberflaechenfiltern und Ultrafiltern
DE903017C (de) * 1951-01-31 1954-02-01 Sueddeutsche Lab G M B H Herstellung kleiner Kugeln aus hochschmelzbaren Materialien

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB739068A (en) * 1952-08-09 1955-10-26 Emi Ltd Improvements in or relating to cathode ray tube arrangements
US2883569A (en) * 1956-01-24 1959-04-21 Herman F Kaiser Magnetic quadrupole focusing system
US2919381A (en) * 1956-07-25 1959-12-29 Farrand Optical Co Inc Electron lens
US2915662A (en) * 1956-08-24 1959-12-01 Nat Video Corp Centering arrangement and method for beams of cathode ray tubes

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3210171A (en) * 1960-09-12 1965-10-05 Sylvania Electric Prod Method of supplying heat of fusion to glass-to-glass seal
US3340377A (en) * 1962-07-12 1967-09-05 Jeol Ltd Method of treating material by a charged beam
US3191028A (en) * 1963-04-22 1965-06-22 Albert V Crewe Scanning electron microscope
US3482136A (en) * 1966-04-13 1969-12-02 High Voltage Engineering Corp Charged particle beam spreader system including three in-line quadrapole magnetic lenses
US3621327A (en) * 1969-12-29 1971-11-16 Ford Motor Co Method of controlling the intensity of an electron beam
US3732426A (en) * 1970-07-30 1973-05-08 Nihona Denshi Kk X-ray source for generating an x-ray beam having selectable sectional shapes
US4736106A (en) * 1986-10-08 1988-04-05 Michigan State University Method and apparatus for uniform charged particle irradiation of a surface
US4767930A (en) * 1987-03-31 1988-08-30 Siemens Medical Laboratories, Inc. Method and apparatus for enlarging a charged particle beam
US5021670A (en) * 1989-01-24 1991-06-04 Ict Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh Multipole element
US5589726A (en) * 1993-12-21 1996-12-31 Hughes Aircraft Company Arc lamp with external magnetic means

Also Published As

Publication number Publication date
FR1227633A (fr) 1960-08-22
GB852725A (en) 1960-11-02
CH372116A (de) 1963-09-30
DE1064168B (de) 1959-08-27

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