US3097083A - Polishing composition and process of forming same - Google Patents

Polishing composition and process of forming same Download PDF

Info

Publication number: US3097083A
Authority: US; United States
Prior art keywords: polishing; oxide; cerium; gelatinous; ceric
Prior art date: 1959-07-02
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

US824479A

Other languages

English (en)

Inventor

Walter L Silvernail

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

American Potash and Chemical Corp

Original Assignee

American Potash and Chemical Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1959-07-02

Filing date

1959-07-02

Publication date

1963-07-09

1959-07-02 Application filed by American Potash and Chemical Corp filed Critical American Potash and Chemical Corp

1959-07-02 Priority to US824479A priority Critical patent/US3097083A/en

1960-07-01 Priority to GB23134/60A priority patent/GB924047A/en

1960-07-01 Priority to DEA35031A priority patent/DE1292287B/de

1960-07-01 Priority to BE592540A priority patent/BE592540A/fr

1963-07-09 Application granted granted Critical

1963-07-09 Publication of US3097083A publication Critical patent/US3097083A/en

1980-07-09 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

238000005498 polishing Methods 0.000 title claims description 112
239000000203 mixture Substances 0.000 title claims description 86
238000000034 method Methods 0.000 title description 21
239000000463 material Substances 0.000 claims description 43
229910000420 cerium oxide Inorganic materials 0.000 claims description 33
BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 33
229910001404 rare earth metal oxide Inorganic materials 0.000 claims description 17
RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 13
229910001928 zirconium oxide Inorganic materials 0.000 claims description 13
DPUCLPLBKVSJIB-UHFFFAOYSA-N cerium;tetrahydrate Chemical compound O.O.O.O.[Ce] DPUCLPLBKVSJIB-UHFFFAOYSA-N 0.000 claims description 10
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 29
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 27
150000000703 Cerium Chemical class 0.000 description 25
XMPZTFVPEKAKFH-UHFFFAOYSA-P ceric ammonium nitrate Chemical compound [NH4+].[NH4+].[Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O XMPZTFVPEKAKFH-UHFFFAOYSA-P 0.000 description 22
239000000470 constituent Substances 0.000 description 18
KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 16
239000000376 reactant Substances 0.000 description 14
239000006185 dispersion Substances 0.000 description 13
JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 12
239000002002 slurry Substances 0.000 description 12
235000010339 sodium tetraborate Nutrition 0.000 description 11
CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 10
150000003839 salts Chemical class 0.000 description 10
239000011521 glass Substances 0.000 description 9
VZDYWEUILIUIDF-UHFFFAOYSA-J cerium(4+);disulfate Chemical compound [Ce+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O VZDYWEUILIUIDF-UHFFFAOYSA-J 0.000 description 8
229910000355 cerium(IV) sulfate Inorganic materials 0.000 description 8
239000000243 solution Substances 0.000 description 8
-1 hydroxyl ions Chemical class 0.000 description 7
NVIFVTYDZMXWGX-UHFFFAOYSA-N sodium metaborate Chemical compound [Na+].[O-]B=O NVIFVTYDZMXWGX-UHFFFAOYSA-N 0.000 description 7
229910021538 borax Inorganic materials 0.000 description 6
HSJPMRKMPBAUAU-UHFFFAOYSA-N cerium(3+);trinitrate Chemical compound [Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O HSJPMRKMPBAUAU-UHFFFAOYSA-N 0.000 description 6
UQGFMSUEHSUPRD-UHFFFAOYSA-N disodium;3,7-dioxido-2,4,6,8,9-pentaoxa-1,3,5,7-tetraborabicyclo[3.3.1]nonane Chemical compound [Na+].[Na+].O1B([O-])OB2OB([O-])OB1O2 UQGFMSUEHSUPRD-UHFFFAOYSA-N 0.000 description 6
STNGULMWFPMOCE-UHFFFAOYSA-N ethyl 4-butyl-3,5-dimethyl-1h-pyrrole-2-carboxylate Chemical compound CCCCC1=C(C)NC(C(=O)OCC)=C1C STNGULMWFPMOCE-UHFFFAOYSA-N 0.000 description 6
230000036571 hydration Effects 0.000 description 6
238000006703 hydration reaction Methods 0.000 description 6
238000002156 mixing Methods 0.000 description 6
239000004328 sodium tetraborate Substances 0.000 description 6
VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 5
239000000908 ammonium hydroxide Substances 0.000 description 5
BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 5
229910052921 ammonium sulfate Inorganic materials 0.000 description 5
235000011130 ammonium sulphate Nutrition 0.000 description 5
OZECDDHOAMNMQI-UHFFFAOYSA-H cerium(3+);trisulfate Chemical compound [Ce+3].[Ce+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O OZECDDHOAMNMQI-UHFFFAOYSA-H 0.000 description 5
229910000333 cerium(III) sulfate Inorganic materials 0.000 description 5
238000006243 chemical reaction Methods 0.000 description 5
CDMADVZSLOHIFP-UHFFFAOYSA-N disodium;3,7-dioxido-2,4,6,8,9-pentaoxa-1,3,5,7-tetraborabicyclo[3.3.1]nonane;decahydrate Chemical compound O.O.O.O.O.O.O.O.O.O.[Na+].[Na+].O1B([O-])OB2OB([O-])OB1O2 CDMADVZSLOHIFP-UHFFFAOYSA-N 0.000 description 5
229910000029 sodium carbonate Inorganic materials 0.000 description 5
239000001488 sodium phosphate Substances 0.000 description 5
RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 5
229910000406 trisodium phosphate Inorganic materials 0.000 description 5
235000019801 trisodium phosphate Nutrition 0.000 description 5
150000001875 compounds Chemical class 0.000 description 4
238000009472 formulation Methods 0.000 description 4
239000002244 precipitate Substances 0.000 description 4
235000017550 sodium carbonate Nutrition 0.000 description 4
229910052684 Cerium Inorganic materials 0.000 description 3
239000007864 aqueous solution Substances 0.000 description 3
230000015572 biosynthetic process Effects 0.000 description 3
239000007787 solid Substances 0.000 description 3
PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 description 2
UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
150000001450 anions Chemical class 0.000 description 2
PSFDQSOCUJVVGF-UHFFFAOYSA-N harman Chemical compound C12=CC=CC=C2NC2=C1C=CN=C2C PSFDQSOCUJVVGF-UHFFFAOYSA-N 0.000 description 2
239000004615 ingredient Substances 0.000 description 2
MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
230000014759 maintenance of location Effects 0.000 description 2
239000000126 substance Substances 0.000 description 2
238000012360 testing method Methods 0.000 description 2
BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
150000001447 alkali salts Chemical class 0.000 description 1
150000003863 ammonium salts Chemical class 0.000 description 1
238000000498 ball milling Methods 0.000 description 1
GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
QQZMWMKOWKGPQY-UHFFFAOYSA-N cerium(3+);trinitrate;hexahydrate Chemical compound O.O.O.O.O.O.[Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O QQZMWMKOWKGPQY-UHFFFAOYSA-N 0.000 description 1
238000007580 dry-mixing Methods 0.000 description 1
230000001747 exhibiting effect Effects 0.000 description 1
239000005357 flat glass Substances 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
229910044991 metal oxide Inorganic materials 0.000 description 1
150000004706 metal oxides Chemical class 0.000 description 1
238000012986 modification Methods 0.000 description 1
230000004048 modification Effects 0.000 description 1
QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
PLDDOISOJJCEMH-UHFFFAOYSA-N neodymium oxide Inorganic materials [O-2].[O-2].[O-2].[Nd+3].[Nd+3] PLDDOISOJJCEMH-UHFFFAOYSA-N 0.000 description 1
230000003287 optical effect Effects 0.000 description 1
MMKQUGHLEMYQSG-UHFFFAOYSA-N oxygen(2-);praseodymium(3+) Chemical compound [O-2].[O-2].[O-2].[Pr+3].[Pr+3] MMKQUGHLEMYQSG-UHFFFAOYSA-N 0.000 description 1
229940072033 potash Drugs 0.000 description 1
229910052700 potassium Inorganic materials 0.000 description 1
239000011591 potassium Substances 0.000 description 1
BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Substances [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 1
235000015320 potassium carbonate Nutrition 0.000 description 1
229910003447 praseodymium oxide Inorganic materials 0.000 description 1
239000000047 product Substances 0.000 description 1
230000000717 retained effect Effects 0.000 description 1
239000011734 sodium Substances 0.000 description 1
229910052708 sodium Inorganic materials 0.000 description 1
239000010421 standard material Substances 0.000 description 1
239000000725 suspension Substances 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1481—Pastes, optionally in the form of blocks or sticks
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions

Definitions

This invention relates to improved polishing compositions and methods of forming these compositions, the same being adapted for use in polishing glass or glass-like materials, such as ophthalmic lenses, television tubes, mirrors, plate glass, etc. More specifically, the invention is directed to new and improved polishing compositions and methods of preparing the same, which compositions exhibit increased polishing speeds, and as incidental added benefits, materially slower settling rates, and improved redispersion characteristics.
compositions including therein the combination of a polishing material and materials which combine to provide a gelatinous ceric hydroxide or other gelatinous material, the composition in slurry form exhibiting improved polishing and slurry retention characteristics.
Still a further object is to provide a new and improved polishing composition which may be prepared, stored and shipped as a dry mix, the composition including the combination of .a polishing materal, a soluble cerium salt and a soluble reactant which generates with the cerium salt a gelatinous or otherwise voluminous material.
the forming of the gelatinous eerie hydroxide in the presence 'of a suitable polishing material provides the polishing composition with an improved polishing speed rating, a much slower settling rate, and non-caking characteristics.
preparing the polishing composition several different procedures may be followed with the composition being particularly adapted for formulation as a dry mix which is of particular commercial importance.
the polishing grade rare earth oxide used contained about 40% cerium oxide, about 20% lanthanum oxide, and about 20% rare earth oxide mixture of principally neodymium and praseodymium oxide. 8 parts of this material were dispersed in 100 parts of water and a polishing speed of 9.6 was determined. The composition set forth above provided a polishing speed of 136.
Example III Constituents: Parts by weight Rouge (polishing grade) 5.0 Water 100.0 Ceric ammonium nitrate 3.3 Sodium hydroxide 1.0
a portion of the batch of polishing grade cerium oxide was dispersed in water on the basis of 5 parts cerium oxide for each 100 parts water and a polishing speed of 10.8 was determined.
the above-identified dry mix was prepared by blending together the listed constituents by dry ball-milling the mixture for one hour. Following blending, the composition was dispersed in water and the polishing speed of the dispersion formed on the basis of 10 parts mix for each 100 parts water was 14.5.
Example IV The procedure of Example IV was followed with the cerium oxide dispersed by itself in water providing a polishing speed of 10.0.
the dispersed and reacted dry mix provided a polishing speed of 16.2 on the basis of 11.0 parts mix (containing 5 parts cerium oxide) to 100 parts Water.
the foregoing examples well illustrate the material improvement obtained in polishing speeds by use of the polishing compositions of the present invention. It has also been found that a materially slower settling rate is present with the dispersed polishing compositions of the present invention.
the settling rate can be 50 times slower than the settling rate of a polishing material such as cerium oxide dispersed solely in water. The settling that does occur over a protracted period of nonuse of the polishing composition does not result in caking to an extent that redisp-osition of the slurry is difficult or excessively time consuming.
the slurry will very readily redisperse to the extent that the solids therein have settled out even following protracted periods of non-use.
Examples 1 through Ill deal with the immediate formation of a polishing composition slurry and, as stated above, the order of addition of the various constituents may vary.
the cerium oxide and ceric ammonium nitrate are combined with the water and stirred resulting in the solvating of the eerie ammonium nitrate and the dispersing of the insoluble cerium oxide.
the sodium hydroxide in solution form is then added to the dispersion and the reaction resulting in the formation of the gelatinous ceric hydroxide occurs immediately.
the result is that a uniform dispersion or slurry of the combined cerium oxide and gelatinous ceric hydroxide virtually instantaneously formed.
the order of addition may be varied resulting in initial mixing of the cerium oxide with the sodium hydroxide in solution followed by the addition of the ceric ammonium nitrate with the same results.
a desirable ratio is 5 parts polishing material to 1 part equivalent cerium oxide in the soluble cerium salt.
the broad preferred range for the various polishing compositions provides for the cerium salt being present in quantities sufficient to provide an equivalent cerium oxide to polishing material ratio the range of from about 1 to 10 to l to 3 by weight.
the pH of the polishing composition dispersion may vary considerably although it has been found preferable that the pH be about 5 when the dispersion is initially formed with ceric type salts, or about 8 when formed with oerous type salts. In the examples given, this can be controlled by the quantity of sodium hydroxide or other precipitant used.
a polishing composition consisting of at least one polishing material selected from the group consisting of red rouge, zirconium oxide, cerium oxide and rare earth oxide combined with a gelatinous ceric hydroxide.
a polishing composition consisting essentially of a dispersion of at least one polishing material selected from the group consisting of red rouge, zirconium oxide, cerium oxide and rare earth oxide combined with a gelatinous ceric hydroxide.
a polishing composition consisting essentially of cerium oxide combined with a gelatinous ceric hydroxide.
a polishing composition consisting essentially of rare earth oxide combined with a gelatinous ceric hydroxide.
a polishing composition consisting essentially of a dry mix of at least one polishing material selected from the group consisting of red rouge, zirconium oxide, cerium oxide and rare earth oxide combined with a cerium salt selected from the group consisting of ceric ammonium sulfate, ceric ammonium nitrate, ceric sulfate, cerous nitrate and cerou-s sulfate and a reactant selected from the group consisting of sodium hydroxide, potassium hydroxide, ammonium hydroxide, sodium metaborate, sodium tetraborate, sodium tetraborate pentahydrate, sodium tetraborate decahydr-ate, sodium carbonate and trisodium phosphate which generates with said cerium salt a gelatinous material upon hydration of said mix.
the method of preparing a polishing composition which exhibits improved polishing speed comprising combining at least one polishing material selected from the group consisting of red rouge, zirconium oxide, cerium oxide and rare earth oxide with a cerium salt selected from the group consisting of ceric ammonium sulfate, ceric ammonium nitrate, ceric sulfate, cerous nitrate and cerous sulfate, and dispersing the resulting mixture in .an aqueous solution of a reactant generating hydroxyl ions therein, said reactant being selected from the group consisting of sodium hydroxide, potassium hydroxide, ammonium hydroxide, sodium metaborate, sodium tetraborate, sodium tetraborate pentahyd-rate, sodium tetraborate decahydrate, sodium carbonate and trisodium phosphate and said cerium salt being present in quantities sufficient to provide an equivalent cerium oxide to polishing material ratio within the range from about 1 to 10 to l
the method of preparing a polishing composition which exhibits improved polishing speed comprising dry blending at least one polishing material selected from the group consisting of red rouge, zirconium oxide, cerium oxide and rare earth oxide, a dry cerium salt selected from the group consisting of ceric ammonium sulfate, ceric ammonium nitrate, ceric sulfate, cerous nitrate and cerous sulfate and a dry material which is capable of generating hydroxyl ions upon hydration, and subsequently forming a gelatinous dispersion of the dry blend by adding water thereto, said dry material being selected from the group consisting of sodium hydnoxide, potassium hydroxide, ammonium hydroxide, sodium metaborate, sodium tetraborate, sodium tetraborate pentahydrate, sodium tetraborate decahydr ate, sodium carbonate and trisodium phosphate.
a polishing material selected from the group consisting of red rouge, zircon
the method of preparing a polishing composition which exhibits improved polishing speed comprising dry blending at least one polishing material selected from the group consisting of red rouge, zirconium oxide, cerium oxide and rare earth oxide, a dry cerium salt selected from the group consisting of ceric ammonium sulfate, ceric ammonium nitrate, ceric sulfate, cerous nitrate and cerous sulfate and a dry material which is capable of generating hydroxyl ions upon hydration, and subsequently forming a gelatinous dispersion of the-dry blend by adding Water thereto, said dry material being selected from the group consisting of sodium hydroxide, potassium hydroxide, ammonium hydroxide, sodium metaborate, sodium tetraborate, sodium tetraborate pentahydrate, sodium tetraborate decahydrate, so
cerium salt being present in quantities suflicient to provide an equivalent cerium oxide to polishing material ratio within the range of from about 1 to 10 to 1 to 3 by weight.
a glass polishing composition consisting essentially I of water, cerium oxide and chemically active cerium References Cited in the file of this patent UNITED STATES PATENTS 2,383,500 Polan Aug. 28, 1945 2,554,070 Stead May 22, 1951 2,744,001 Harman et a1. May 1, 1956 2,816,824 Wilansky Dec. 17, 1957 2,865,725 Schroeder Dec. 23, 1958

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Organic Chemistry (AREA)
Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)

US824479A 1959-07-02 1959-07-02 Polishing composition and process of forming same Expired - Lifetime US3097083A (en)

Priority Applications (4)

Application Number	Priority Date	Filing Date	Title
US824479A US3097083A (en)	1959-07-02	1959-07-02	Polishing composition and process of forming same
GB23134/60A GB924047A (en)	1959-07-02	1960-07-01	Abrasive polishing compositions and process of forming same
DEA35031A DE1292287B (de)	1959-07-02	1960-07-01	Poliermittel fuer Glas oder glasaehnliche Materialien
BE592540A BE592540A (fr)	1959-07-02	1960-07-01	Composition de polissage et procédé pour la préparer.

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US824479A US3097083A (en)	1959-07-02	1959-07-02	Polishing composition and process of forming same

Publications (1)

Publication Number	Publication Date
US3097083A true US3097083A (en)	1963-07-09

Family

ID=25241504

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
US824479A Expired - Lifetime US3097083A (en)	1959-07-02	1959-07-02	Polishing composition and process of forming same

Country Status (4)

Country	Link
US (1)	US3097083A (fr)
BE (1)	BE592540A (fr)
DE (1)	DE1292287B (fr)
GB (1)	GB924047A (fr)

Cited By (26)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3240580A (en) *	1961-04-03	1966-03-15	Libbey Owens Ford Glass Co	Glass polishing compositions of rare earth nitrates
US3310495A (en) *	1961-09-09	1967-03-21	Nippon Sheet Glass Co Ltd	Process for polishing glass
US3317294A (en) *	1964-07-16	1967-05-02	Libbey Owens Ford Glass Co	Glass polishing composition comprising a water-soluble zinc salt
US3317293A (en) *	1964-04-20	1967-05-02	Libbey Owens Ford Glass Co	Rare earth chlorides in a glass polishing composition
US3328141A (en) *	1966-02-28	1967-06-27	Tizon Chemical Corp	Process for polishing crystalline silicon
US3388981A (en) *	1966-09-30	1968-06-18	Pittsburgh Plate Glass Co	Method of making glass polishing composition
US3388982A (en) *	1967-08-23	1968-06-18	Pittsburgh Plate Glass Co	Glass polishing composition containing an inorganic barium salt
US3388508A (en) *	1967-08-23	1968-06-18	Pittsburgh Plate Glass Co	Glass polishing composition containing dissolved zirconium and zirconium oxide
US3388980A (en) *	1965-12-21	1968-06-18	Pittsburgh Plate Glass Co	Method of making glass polishing composition
US4282012A (en) *	1978-05-04	1981-08-04	Lobachev Viktor A	Composition for the manufacture of abrasive tools
FR2545830A1 (fr) *	1983-05-13	1984-11-16	Rhone Poulenc Spec Chim	Nouvelle composition de polissage a base de cerium et son procede de fabrication
FR2604443A1 (fr) *	1986-09-26	1988-04-01	Rhone Poulenc Chimie	Composition de polissage a base de cerium destinee au polissage des verres organiques
EP0320338A1 (fr) *	1987-12-09	1989-06-14	Rhone-Poulenc Chimie	Composition de polissage perfectionnée à base de cérium et son procédé de préparation
US20020106977A1 (en) *	1999-06-24	2002-08-08	Micron Technology, Inc.	Fixed-abrasive chemical-mechanical planarization of titanium nitride
US20040065022A1 (en) *	2001-02-20	2004-04-08	Youichi Machii	Polishing compound and method for polishing substrate
US20120045972A1 (en) *	2009-04-15	2012-02-23	Rhodia (China) Co., Ltd.	A cerium-based particle composition and the preparation thereof
US20120324800A1 (en) *	2010-11-22	2012-12-27	Tomohiro Iwano	Method for producing abrasive grains, method for producing slurry, and method for producing polishing liquid
US9881801B2 (en)	2010-11-22	2018-01-30	Hitachi Chemical Company, Ltd.	Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate
US9932497B2 (en)	2012-05-22	2018-04-03	Hitachi Chemical Company, Ltd.	Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
US9982177B2 (en)	2010-03-12	2018-05-29	Hitachi Chemical Company, Ltd	Slurry, polishing fluid set, polishing fluid, and substrate polishing method using same
US9988573B2 (en)	2010-11-22	2018-06-05	Hitachi Chemical Company, Ltd.	Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate
US10196542B2 (en)	2012-02-21	2019-02-05	Hitachi Chemical Company, Ltd	Abrasive, abrasive set, and method for abrading substrate
US10549399B2 (en)	2012-05-22	2020-02-04	Hitachi Chemcial Company, Ltd.	Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
US10557058B2 (en)	2012-02-21	2020-02-11	Hitachi Chemical Company, Ltd.	Polishing agent, polishing agent set, and substrate polishing method
US10557059B2 (en)	2012-05-22	2020-02-11	Hitachi Chemical Company, Ltd.	Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
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US3240580A (en) *	1961-04-03	1966-03-15	Libbey Owens Ford Glass Co	Glass polishing compositions of rare earth nitrates
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US3317294A (en) *	1964-07-16	1967-05-02	Libbey Owens Ford Glass Co	Glass polishing composition comprising a water-soluble zinc salt
US3388980A (en) *	1965-12-21	1968-06-18	Pittsburgh Plate Glass Co	Method of making glass polishing composition
US3328141A (en) *	1966-02-28	1967-06-27	Tizon Chemical Corp	Process for polishing crystalline silicon
US3388981A (en) *	1966-09-30	1968-06-18	Pittsburgh Plate Glass Co	Method of making glass polishing composition
US3388982A (en) *	1967-08-23	1968-06-18	Pittsburgh Plate Glass Co	Glass polishing composition containing an inorganic barium salt
US3388508A (en) *	1967-08-23	1968-06-18	Pittsburgh Plate Glass Co	Glass polishing composition containing dissolved zirconium and zirconium oxide
US4282012A (en) *	1978-05-04	1981-08-04	Lobachev Viktor A	Composition for the manufacture of abrasive tools
FR2545830A1 (fr) *	1983-05-13	1984-11-16	Rhone Poulenc Spec Chim	Nouvelle composition de polissage a base de cerium et son procede de fabrication
EP0126675A1 (fr) *	1983-05-13	1984-11-28	Rhone-Poulenc Chimie	Composition de polissage à base de cérium et son procédé de fabrication
AU571518B2 (en) *	1983-05-13	1988-04-21	Rhone-Poulenc Specialites Chimiques	Polishing compositions based on rare earths
FR2604443A1 (fr) *	1986-09-26	1988-04-01	Rhone Poulenc Chimie	Composition de polissage a base de cerium destinee au polissage des verres organiques
EP0266233A1 (fr) *	1986-09-26	1988-05-04	Rhone-Poulenc Chimie	Procédé de polissage de verres organiques avec une composition de polissage à base de cérium
AU601495B2 (en) *	1986-09-26	1990-09-13	Rhone-Poulenc Chimie	Polishing composition for organic glasses
EP0320338A1 (fr) *	1987-12-09	1989-06-14	Rhone-Poulenc Chimie	Composition de polissage perfectionnée à base de cérium et son procédé de préparation
FR2624519A1 (fr) *	1987-12-09	1989-06-16	Rhone Poulenc Chimie	Composition de polissage perfectionnee a base de cerium et son procede de preparation
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US7402094B2 (en)	1999-06-24	2008-07-22	Micron Technology, Inc.	Fixed-abrasive chemical-mechanical planarization of titanium nitride
US20040065022A1 (en) *	2001-02-20	2004-04-08	Youichi Machii	Polishing compound and method for polishing substrate
US6786945B2 (en) *	2001-02-20	2004-09-07	Hitachi Chemical Co., Ltd.	Polishing compound and method for polishing substrate
US8727833B2 (en) *	2009-04-15	2014-05-20	Rhodia (China) Co., Ltd.	Cerium-based particle composition and the preparation thereof
US20120045972A1 (en) *	2009-04-15	2012-02-23	Rhodia (China) Co., Ltd.	A cerium-based particle composition and the preparation thereof
US9982177B2 (en)	2010-03-12	2018-05-29	Hitachi Chemical Company, Ltd	Slurry, polishing fluid set, polishing fluid, and substrate polishing method using same
US10703947B2 (en)	2010-03-12	2020-07-07	Hitachi Chemical Company, Ltd.	Slurry, polishing fluid set, polishing fluid, and substrate polishing method using same
US20120324800A1 (en) *	2010-11-22	2012-12-27	Tomohiro Iwano	Method for producing abrasive grains, method for producing slurry, and method for producing polishing liquid
US9039796B2 (en) *	2010-11-22	2015-05-26	Hitachi Chemical Company, Ltd.	Method for producing abrasive grains, method for producing slurry, and method for producing polishing liquid
US9881801B2 (en)	2010-11-22	2018-01-30	Hitachi Chemical Company, Ltd.	Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate
US9881802B2 (en)	2010-11-22	2018-01-30	Hitachi Chemical Company, Ltd	Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate
US10825687B2 (en)	2010-11-22	2020-11-03	Hitachi Chemical Company, Ltd.	Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate
US9988573B2 (en)	2010-11-22	2018-06-05	Hitachi Chemical Company, Ltd.	Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate
US10557058B2 (en)	2012-02-21	2020-02-11	Hitachi Chemical Company, Ltd.	Polishing agent, polishing agent set, and substrate polishing method
US10196542B2 (en)	2012-02-21	2019-02-05	Hitachi Chemical Company, Ltd	Abrasive, abrasive set, and method for abrading substrate
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US10557059B2 (en)	2012-05-22	2020-02-11	Hitachi Chemical Company, Ltd.	Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
US9932497B2 (en)	2012-05-22	2018-04-03	Hitachi Chemical Company, Ltd.	Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
CN118027820A (zh) *	2022-11-01	2024-05-14	中国科学院大连化学物理研究所	一种氢氧化铈和氧化铈的混合抛光液及制备和应用

Also Published As

Publication number	Publication date
BE592540A (fr)	1960-10-02
DE1292287B (de)	1969-04-10
GB924047A (en)	1963-04-18

Publication	Publication Date	Title
US3097083A (en)	1963-07-09	Polishing composition and process of forming same
US4529410A (en)	1985-07-16	Rare earth polishing compositions
US3715842A (en)	1973-02-13	Silica polishing compositions having a reduced tendency to scratch silicon and germanium surfaces
US4786325A (en)	1988-11-22	Cerium/rare earth polishing compositions
US5904159A (en)	1999-05-18	Polishing slurries and a process for the production thereof
US4242842A (en)	1981-01-06	Precision polishing suspension and method for making same
KR0141694B1 (ko)	1998-06-15	연마제 조성물
US5766279A (en)	1998-06-16	Polishing agent, method for producing the same and method for polishing
JPH0781132B2 (ja)	1995-08-30	研磨剤組成物
CN105800661A (zh)	2016-07-27	一种氧化铈水热制备方法及其cmp抛光应用
JPH0376782A (ja)	1991-04-02	金属表面を研磨する方法およびそのための組成物
WO1995006690A1 (fr)	1995-03-09	Compositions de polissage activees
US2607658A (en)	1952-08-19	Aluminum chlorhydroxy and borate gels
US4226623A (en)	1980-10-07	Method for polishing a single crystal or gadolinium gallium garnet
US4244835A (en)	1981-01-13	Method of dispersing alpha alumina monohydrate
JPS61132515A (ja)	1986-06-20	物質の製法
US4055509A (en)	1977-10-25	Method for increasing the water dispersibility of alpha alumina monohydrate
US4115166A (en)	1978-09-19	Coated ammonium perchlorate
US2720464A (en)	1955-10-11	Method of preparing cold-water-soluble powdered cellulose ethers
EP0031204B1 (fr)	1984-06-06	Procédé de polissage de matières minérales et organiques
CA1258959A (fr)	1989-09-05	Bouillies utiles de carbonate de cobalt
US3222148A (en)	1965-12-07	Tetragonal zirconium oxide containing calcium oxide
US3962115A (en)	1976-06-08	Treatment of optical brightening agents
US2807591A (en)	1957-09-24	Water-soluble gums of improved water solubility and method of producing same
US2816824A (en)	1957-12-17	Cerium oxide polishing composition