US3418155A - Electron discharge control - Google Patents
Electron discharge control Download PDFInfo
- Publication number
- US3418155A US3418155A US491603A US49160365A US3418155A US 3418155 A US3418155 A US 3418155A US 491603 A US491603 A US 491603A US 49160365 A US49160365 A US 49160365A US 3418155 A US3418155 A US 3418155A
- Authority
- US
- United States
- Prior art keywords
- window
- electron
- pressure
- chamber
- energy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/301—Arrangements enabling beams to pass between regions of different pressure
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
- G21K5/10—Irradiation devices with provision for relative movement of beam source and object to be irradiated
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
- H01J33/02—Details
- H01J33/04—Windows
Definitions
- ABSTRACT OF THE DISCLOSURE Method for irradiating a substance comprising transmitting an electron beam from a zone of lesser pressure through a first electron window, through an expanding zone to a second electron Window and through the latter to the surface to be irradiated.
- the zone between the first and second electron windows contains a gaseous medium which is maintained at an average density that is substantially below that of air at 1 atmosphere pressure.
- This invention relates to an improved electron-discharge device and to a method for eifectively spreading an electron beam issuing from such device while minimizing loss of average beam energy and current.
- the enclosed zone between the primary and secondary electron Windows is substantially gas-evacuated. Since the vacuum pulled will be at most a partial one, some gas will, of course, be left in the zone.
- This embodiment provides even less interference to electron flo'w in that it provides an even smaller loss of average energy through collision with gas molecules and the resultant scattering.
- the use of a vacuum chamber introduces the requirement of providing support for the secondary window which in order to be compatible with beam spreading will be greater in area than the window through which electrons emerge from the gas-evacuated emission zone. Reduced pressure operation also necessitates complex pressure controls and gas-tight construction.
- Dose profile studies are made with and without the helium-charged chamber under the same conditions as employed in Example 1 except that the workpiece is stationary.
- the data points are determined by exposing to the beam a radiation-sensitive sheet material (Cellophane300 MSC BlueDupont) the light transmission' characteristics of which undergo change relatable to radiation dosage. This material is subjected to radiation until measurable change is provided in regions of high and low energy absorption. These changes are determined by spectrophotometer and the data obtained is normalized to provide coincidence of peak intensities.
- FIGURE 2 of the drawings The results of these studies are graphically illustrated in FIGURE 2 of the drawings.
- Example 7 An electron-discharge device is operated as in Example 1 except that the electron-distribution chamber is substantially gas-evacuated and sealed, the electron window through which the beam exits from the electron-distribution chamber being supported within said chamber at a plurality of sites intermediate the periphery thereof with a metal grid.
- the electron beam is concentrated in a smaller area when passing through the first window. If the electron'distribution chamber is operated at atmospheric pressure, the window through which electrons exit this chamber can be replaced much easier than changing the window to the gasevacuated electron-emission zone.
- a method for irradiating a substance which comprises transmitting a beam of high-energy electrons from a zone of lesser pressure through a first electron window to said substance in a zone of greater pressure, the improvement which comprises interposing between said substance and said first electron window, enclosure means and a second electron window transversely disposed in relation to the longitudinal axis of said beam and presenting to said beam a greater surface area than said first electron window, said second electron window and said enclosure means describing an enclosed zone extending from said first window to said second window that gradually increases in cross sectional area in approaching said second window, and in said enclosed zone maintaining a gaseous medium at a pressure such that its average density is substantially below that of air at 1 atmosphere pressure.
- An electron-discharge device comprising a housing having an aperture, an electron-emission means within said housing and spaced apart from said aperture, and a metal electron window closing said aperture, essentially defining with said housing an essentially gas-tight emission chamber containing said emission means, and providing exit means from said housing through which a stream of high-energy electrons pass when said emis sion chamber is substantially gas-evacuated and a difference of electrical potential is provided between said emission means and said metal window sufficient to initiate said stream, presenting a greater surface area to an electron beam passing through said first electron window than that presented by said first electron window and a second electron window spaced apart from said first electron window opposite said emission means, enclosure means extending from said first electron window to said second electron window and with said first electron window and said second electron window defining a ubstantially gas-tight electron-distribution chamber, and conduit means communicating with said chamber through which gas may be introduced into and withdrawn from said chamber, said second electron window presenting a significantly greater surface area to said beam than 10 said first electron
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Polyesters Or Polycarbonates (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US491603A US3418155A (en) | 1965-09-30 | 1965-09-30 | Electron discharge control |
| GB35514/66A GB1109023A (en) | 1965-09-30 | 1966-08-09 | Electron discharge device |
| FR93352A FR1509813A (fr) | 1965-09-30 | 1967-02-01 | Procédé et dispositif de contrôle de décharge électronique |
| BE694780D BE694780A (fr) | 1965-09-30 | 1967-02-28 | Controle de decharge d'electrons. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US491603A US3418155A (en) | 1965-09-30 | 1965-09-30 | Electron discharge control |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3418155A true US3418155A (en) | 1968-12-24 |
Family
ID=23952904
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US491603A Expired - Lifetime US3418155A (en) | 1965-09-30 | 1965-09-30 | Electron discharge control |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US3418155A (fr) |
| BE (1) | BE694780A (fr) |
| GB (1) | GB1109023A (fr) |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3624391A (en) * | 1969-04-16 | 1971-11-30 | Ti Group Services Ltd | Window structure for electron beam irradiation |
| US3807052A (en) * | 1972-06-26 | 1974-04-30 | Union Carbide Corp | Apparatus for irradiation of a moving product in an inert atmosphere |
| US4022925A (en) * | 1974-07-20 | 1977-05-10 | Polymer-Physik Gmbh & Co. Kg | Process for coating metal surfaces with synthetic resins |
| US4143468A (en) * | 1974-04-22 | 1979-03-13 | Novotny Jerome L | Inert atmosphere chamber |
| US4184956A (en) * | 1977-09-16 | 1980-01-22 | C.G.R. MeV, Inc. | Apparatus for treating waste-waters and sludges, comprising an irradiation system using accelerated charged particles |
| US4324813A (en) * | 1979-06-01 | 1982-04-13 | Volkswagenwerk Aktiengesellschaft | Method and apparatus for curing lacquer layers with high-energy electrons |
| US4362965A (en) * | 1980-12-29 | 1982-12-07 | The United States Of America As Represented By The Secretary Of The Army | Composite/laminated window for electron-beam guns |
| EP0069989A1 (fr) * | 1981-07-13 | 1983-01-19 | Inter-Probe, Inc. | Appareil pour le transfert d'énergie |
| WO2001016991A1 (fr) * | 1999-08-31 | 2001-03-08 | 3M Innovative Properties Company | Dispositif a faisceaux d'electrons ayant une faible trajectoire de faisceaux de perte |
| EP1100109A1 (fr) * | 1999-11-12 | 2001-05-16 | Ushiodenki Kabushiki Kaisha | Procédé de traitement par irradiation avec un faisceau d'électrons |
| US6657212B2 (en) * | 1999-11-29 | 2003-12-02 | Ushiodenki Kabushiki Kaisha | Electron beam measurement method and electron beam irradiation processing device |
| US20110062347A1 (en) * | 2008-05-12 | 2011-03-17 | Japan Ae Power Systems Corporation | Electron beam irradiation apparatus for sterilizing sheet material |
| EP2204839A3 (fr) * | 1997-01-02 | 2012-09-12 | Hitachi Zosen Corporation | Accélérateur de faisceaux d'électrons |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4345545A (en) * | 1980-07-28 | 1982-08-24 | The Carborundum Company | Apparatus for electron curing of resin coated webs |
| DE3439190A1 (de) * | 1984-10-26 | 1986-04-30 | Polymer-Physik GmbH & Co KG, 7400 Tübingen | Niederenergetischer elektronenstrahler mit hoher leistung zur entschwefelung und/oder denitrierung von rauchgasen |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2617953A (en) * | 1949-06-28 | 1952-11-11 | Electronized Chem Corp | Window structure for cathode-ray tubes |
| US2724059A (en) * | 1952-08-21 | 1955-11-15 | High Voltage Engineering Corp | Method of and apparatus for increasing uniformity of ionization in material irradiated by cathode rays |
| US2820165A (en) * | 1951-07-13 | 1958-01-14 | High Voltage Engineering Corp | Means for cooling the windows of acceleration tubes for electrostatic generators |
| US3188229A (en) * | 1961-10-03 | 1965-06-08 | Du Pont | Process of adhering an organic coating to a substrate |
-
1965
- 1965-09-30 US US491603A patent/US3418155A/en not_active Expired - Lifetime
-
1966
- 1966-08-09 GB GB35514/66A patent/GB1109023A/en not_active Expired
-
1967
- 1967-02-28 BE BE694780D patent/BE694780A/fr not_active IP Right Cessation
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2617953A (en) * | 1949-06-28 | 1952-11-11 | Electronized Chem Corp | Window structure for cathode-ray tubes |
| US2820165A (en) * | 1951-07-13 | 1958-01-14 | High Voltage Engineering Corp | Means for cooling the windows of acceleration tubes for electrostatic generators |
| US2724059A (en) * | 1952-08-21 | 1955-11-15 | High Voltage Engineering Corp | Method of and apparatus for increasing uniformity of ionization in material irradiated by cathode rays |
| US3188229A (en) * | 1961-10-03 | 1965-06-08 | Du Pont | Process of adhering an organic coating to a substrate |
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3624391A (en) * | 1969-04-16 | 1971-11-30 | Ti Group Services Ltd | Window structure for electron beam irradiation |
| US3807052A (en) * | 1972-06-26 | 1974-04-30 | Union Carbide Corp | Apparatus for irradiation of a moving product in an inert atmosphere |
| US4143468A (en) * | 1974-04-22 | 1979-03-13 | Novotny Jerome L | Inert atmosphere chamber |
| US4022925A (en) * | 1974-07-20 | 1977-05-10 | Polymer-Physik Gmbh & Co. Kg | Process for coating metal surfaces with synthetic resins |
| US4184956A (en) * | 1977-09-16 | 1980-01-22 | C.G.R. MeV, Inc. | Apparatus for treating waste-waters and sludges, comprising an irradiation system using accelerated charged particles |
| US4324813A (en) * | 1979-06-01 | 1982-04-13 | Volkswagenwerk Aktiengesellschaft | Method and apparatus for curing lacquer layers with high-energy electrons |
| US4377839A (en) * | 1980-01-14 | 1983-03-22 | Inter-Probe, Inc. | Energy transfer apparatus |
| US4362965A (en) * | 1980-12-29 | 1982-12-07 | The United States Of America As Represented By The Secretary Of The Army | Composite/laminated window for electron-beam guns |
| EP0069989A1 (fr) * | 1981-07-13 | 1983-01-19 | Inter-Probe, Inc. | Appareil pour le transfert d'énergie |
| EP2204839A3 (fr) * | 1997-01-02 | 2012-09-12 | Hitachi Zosen Corporation | Accélérateur de faisceaux d'électrons |
| WO2001016991A1 (fr) * | 1999-08-31 | 2001-03-08 | 3M Innovative Properties Company | Dispositif a faisceaux d'electrons ayant une faible trajectoire de faisceaux de perte |
| US6749903B2 (en) | 1999-08-31 | 2004-06-15 | 3M Innovative Properties Company | Electron beam apparatus having a low loss beam path |
| EP1100109A1 (fr) * | 1999-11-12 | 2001-05-16 | Ushiodenki Kabushiki Kaisha | Procédé de traitement par irradiation avec un faisceau d'électrons |
| US6657212B2 (en) * | 1999-11-29 | 2003-12-02 | Ushiodenki Kabushiki Kaisha | Electron beam measurement method and electron beam irradiation processing device |
| US20110062347A1 (en) * | 2008-05-12 | 2011-03-17 | Japan Ae Power Systems Corporation | Electron beam irradiation apparatus for sterilizing sheet material |
| US8344332B2 (en) * | 2008-05-12 | 2013-01-01 | Hitachi, Ltd. | Electron beam irradiation apparatus for sterilizing sheet material |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1109023A (en) | 1968-04-10 |
| BE694780A (fr) | 1967-07-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AS | Assignment |
Owner name: ENERGY SCIENCES INC., 8 GILL ST., WOBURN, MA Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:FORD MOTOR COMPANY;REEL/FRAME:004270/0674 Effective date: 19840227 |