US3483100A - Tin plating baths - Google Patents
Tin plating baths Download PDFInfo
- Publication number
- US3483100A US3483100A US666983A US3483100DA US3483100A US 3483100 A US3483100 A US 3483100A US 666983 A US666983 A US 666983A US 3483100D A US3483100D A US 3483100DA US 3483100 A US3483100 A US 3483100A
- Authority
- US
- United States
- Prior art keywords
- tin
- group
- brightener
- baths
- bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 title description 13
- 238000007747 plating Methods 0.000 title description 12
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 11
- 239000003792 electrolyte Substances 0.000 description 9
- 239000001257 hydrogen Substances 0.000 description 9
- 229910052739 hydrogen Inorganic materials 0.000 description 9
- 125000000217 alkyl group Chemical group 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 7
- 239000002253 acid Substances 0.000 description 6
- 150000002431 hydrogen Chemical group 0.000 description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 4
- -1 aliphatic aldehyde Chemical class 0.000 description 4
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 4
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 4
- 150000002894 organic compounds Chemical class 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 150000001728 carbonyl compounds Chemical class 0.000 description 3
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 125000000623 heterocyclic group Chemical group 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- BWHOZHOGCMHOBV-UHFFFAOYSA-N Benzalacetone Natural products CC(=O)C=CC1=CC=CC=C1 BWHOZHOGCMHOBV-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 125000003282 alkyl amino group Chemical group 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 239000007859 condensation product Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 229940015043 glyoxal Drugs 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 2
- RNVCVTLRINQCPJ-UHFFFAOYSA-N o-toluidine Chemical compound CC1=CC=CC=C1N RNVCVTLRINQCPJ-UHFFFAOYSA-N 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 229910021653 sulphate ion Inorganic materials 0.000 description 2
- 229910001432 tin ion Inorganic materials 0.000 description 2
- BWHOZHOGCMHOBV-BQYQJAHWSA-N trans-benzylideneacetone Chemical compound CC(=O)\C=C\C1=CC=CC=C1 BWHOZHOGCMHOBV-BQYQJAHWSA-N 0.000 description 2
- 229940117958 vinyl acetate Drugs 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- MNFZZNNFORDXSV-UHFFFAOYSA-N 4-(diethylamino)benzaldehyde Chemical compound CCN(CC)C1=CC=C(C=O)C=C1 MNFZZNNFORDXSV-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- JXLHNMVSKXFWAO-UHFFFAOYSA-N azane;7-fluoro-2,1,3-benzoxadiazole-4-sulfonic acid Chemical compound N.OS(=O)(=O)C1=CC=C(F)C2=NON=C12 JXLHNMVSKXFWAO-UHFFFAOYSA-N 0.000 description 1
- WRUAHXANJKHFIL-UHFFFAOYSA-N benzene-1,3-disulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC(S(O)(=O)=O)=C1 WRUAHXANJKHFIL-UHFFFAOYSA-N 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 229940075397 calomel Drugs 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- ZOMNIUBKTOKEHS-UHFFFAOYSA-L dimercury dichloride Chemical compound Cl[Hg][Hg]Cl ZOMNIUBKTOKEHS-UHFFFAOYSA-L 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 229960000587 glutaral Drugs 0.000 description 1
- MTNDZQHUAFNZQY-UHFFFAOYSA-N imidazoline Chemical compound C1CN=CN1 MTNDZQHUAFNZQY-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 235000019645 odor Nutrition 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- AYEFIAVHMUFQPZ-UHFFFAOYSA-N propane-1,2-diol;prop-2-enoic acid Chemical compound CC(O)CO.OC(=O)C=C AYEFIAVHMUFQPZ-UHFFFAOYSA-N 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- FAKFSJNVVCGEEI-UHFFFAOYSA-J tin(4+);disulfate Chemical compound [Sn+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O FAKFSJNVVCGEEI-UHFFFAOYSA-J 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/30—Electroplating: Baths therefor from solutions of tin
- C25D3/32—Electroplating: Baths therefor from solutions of tin characterised by the organic bath constituents used
Definitions
- R and R being hydrogen, alkyl or phenyl or 0R wherein R is alkyl where at least one hydrogen has been replaced by amino, alkylamino or hydroxyl groups or a secondary brightener of the formula n being 0-5 and possibly one or more hydrogen atoms in the CH group being replaced by hydroxyl groups.
- these secondary brighteners are glyoxal, vinylacetate and N-vinyl carbazole.
- the invention relates to an acid tin-plating bath containing sulphate, sulphonate or fluoborate anions and brighteners by means of which bright tin deposits can be obtained.
- Acid tin-plating baths which contain as brightener a condensation product of an aliphatic aldehyde and an organic compound having a basic nitrogen-containing group, for example a reaction product of acetaldehyde and o-toluidine. These brighteners become resinous very soon, however, so that the bath has only a short stability.
- acid tin-plating baths which contain as brightener an aromatic or heterocyclic aldehyde. These baths have the disadvantage, however, that they produce bright deposits only in a very limited current density range, only between about 5 and 20 A/sq. dm. This means that strongly profiled workpieces having sharp edges and small perforations, the electrolytic coating of which involves current density variations of a factor of even as low as 100, cannot be coated with a thin layer of uniform thickness and brightness. The current density variations are considerably larger if the electrolytic coating process is carried out in a drum.
- CHO, -COOH, -CH OH, --R or OR is a corresponding nonsaturated ketone.
- These baths moreover contain formalin, imidazolin or derivatives and mixtures thereof.
- a number of organic compounds have been found which, when added instead of formalin together with a brightener to an electrolyte tin-plating bath, have the advantage that they have a larger brightening effect on the tin obtained and that they do not have disagreeable odors.
- the usable com pounds can be found in a few chemical classes which are chemically not at all related to each other. However, the applicant has found a common electrochemical criterion which the said compounds must satisfy.
- a non-ionic surface-active substance to a solution of sulfuric acid, an aryl sulphonate or a fluo borate, the overvoltage for the separation of hydrogen at a cathode of tin is raised.
- the cell containing a platinum anode and a tin cathode; the EMF is measured between the tin cathode and the platinum anode or an auxiliary calomel electrode provided in the cell, a small quantity of the substance to be tested being added to the electrolyte liquid. If the EMF decreases after addition of X the substance, the latter suits the purpose of the invention.
- R reprsents a hydrogen atom, an alkyl group or a phenyl group and R OH
- n a value 0, 1, 2, 3, 4 or 5, while in the CH groups one or more hydrogen atoms are allowed to be replaced by OH groups.
- each of the symbols R R and R represents a hydrogen atom, an aromatic, heterocyclic or aliphatic group or a similar group which may be entirely or partly hydrated and which may have substituents which cannot be ionized or cannot be reduced in this medium
- R represents hydrogen, an alkyl group or an esterified carboxyl group, or where the combination represents a ring system, on the understanding that the group C:C-- has a purely non-saturated character.
- a further improvement is obtained by the use of the last-mentioned baths, i.e. a larger brightness and an even larger current density range if instead of formalin such a compound which is capable of reducing the overvoltage for the evolution of hydrogen at a tin cathode, is added to the tin-plating bath.
- Lissapol N is a non-ionic wetting agent which consists of a condensation product of polyoxyethylene and alkylphenol.
- tin ion anions selected from the group consisting of sulfate, organic sulfonate and fluoborate ions, at non-ionic surface active agent and an olefinically unsaturated organic carbonyl primary brightener and as a secondary brightener a polymerizable organic compound capable of reducing the overvoltage for the evolution of hydrogen at a tin cathode
- said polymerizable organic compound is selected from the group consisting of a compound of the formula wherein R is a member of the group consisting of hydrogen, alkyl and phenyl, R is a member selected from the group consisting of 011 and N R3 and R4 being selected from the group consisting of phenyl, hydrogen, alkyl and 0R wherein R is alkyl wherein at least one hydrogen atom has been replaced by a member selected from the group consisting of amino
- a carbonyl compound selected from the group consisting of aromatic and heterocyclic ring containing aldehydes wherein the carbonyl group is directly attached to one of said rings and a, B olefinically unsaturated carbonyl compounds; said carbonyl compounds being free of ionizable and reducible substituents, nitrogen containing substituents and compounds hydrolyzable in said bath to said carbonyl com- References Cited pound.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL666612936A NL151449B (nl) | 1966-09-14 | 1966-09-14 | Werkwijze voor de bereiding van een zuur bad voor het elektrolytisch neerslaan van tin. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3483100A true US3483100A (en) | 1969-12-09 |
Family
ID=19797659
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US666983A Expired - Lifetime US3483100A (en) | 1966-09-14 | 1967-09-11 | Tin plating baths |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3483100A (de) |
| AT (1) | AT278462B (de) |
| BE (1) | BE703841A (de) |
| CH (1) | CH519581A (de) |
| FR (1) | FR1536736A (de) |
| GB (1) | GB1199634A (de) |
| NL (1) | NL151449B (de) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3755096A (en) * | 1971-07-01 | 1973-08-28 | M & T Chemicals Inc | Bright acid tin plating |
| FR2428686A1 (fr) * | 1978-06-16 | 1980-01-11 | M & T Chemicals Inc | Nouveau bain de depot electrolytique d'etain brillant |
| US5814202A (en) * | 1997-10-14 | 1998-09-29 | Usx Corporation | Electrolytic tin plating process with reduced sludge production |
| US20090098398A1 (en) * | 2006-04-14 | 2009-04-16 | C. Uyemura & Co., Ltd. | Tin electroplating bath, tin plating film, tin electroplating method, and electronic device component |
| US8440065B1 (en) * | 2009-06-07 | 2013-05-14 | Technic, Inc. | Electrolyte composition, method, and improved apparatus for high speed tin-silver electroplating |
| US20150122661A1 (en) * | 2013-11-05 | 2015-05-07 | Rohm And Haas Electronic Materials Llc | Plating bath and method |
| CN106222710A (zh) * | 2016-08-29 | 2016-12-14 | 昆明理工大学 | 一种酸性半光亮镀锡溶液及其制备方法 |
| CN115058762A (zh) * | 2022-08-11 | 2022-09-16 | 深圳市板明科技股份有限公司 | 一种电镀锡工艺用锡沉降剂及其使用方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL6501841A (de) * | 1965-02-13 | 1966-08-15 | ||
| US3361652A (en) * | 1963-08-28 | 1968-01-02 | Max Schlotter Dr Ing | Electrodeposition of bright tin |
-
1966
- 1966-09-14 NL NL666612936A patent/NL151449B/xx not_active IP Right Cessation
-
1967
- 1967-09-11 US US666983A patent/US3483100A/en not_active Expired - Lifetime
- 1967-09-11 AT AT828767A patent/AT278462B/de not_active IP Right Cessation
- 1967-09-11 CH CH1263867A patent/CH519581A/de not_active IP Right Cessation
- 1967-09-13 BE BE703841D patent/BE703841A/xx not_active IP Right Cessation
- 1967-09-13 FR FR120832A patent/FR1536736A/fr not_active Expired
- 1967-09-14 GB GB42001/67A patent/GB1199634A/en not_active Expired
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3361652A (en) * | 1963-08-28 | 1968-01-02 | Max Schlotter Dr Ing | Electrodeposition of bright tin |
| NL6501841A (de) * | 1965-02-13 | 1966-08-15 |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3755096A (en) * | 1971-07-01 | 1973-08-28 | M & T Chemicals Inc | Bright acid tin plating |
| FR2428686A1 (fr) * | 1978-06-16 | 1980-01-11 | M & T Chemicals Inc | Nouveau bain de depot electrolytique d'etain brillant |
| US5814202A (en) * | 1997-10-14 | 1998-09-29 | Usx Corporation | Electrolytic tin plating process with reduced sludge production |
| US20090098398A1 (en) * | 2006-04-14 | 2009-04-16 | C. Uyemura & Co., Ltd. | Tin electroplating bath, tin plating film, tin electroplating method, and electronic device component |
| US8440066B2 (en) * | 2006-04-14 | 2013-05-14 | C. Uyemura & Co., Ltd. | Tin electroplating bath, tin plating film, tin electroplating method, and electronic device component |
| US8440065B1 (en) * | 2009-06-07 | 2013-05-14 | Technic, Inc. | Electrolyte composition, method, and improved apparatus for high speed tin-silver electroplating |
| US20150122661A1 (en) * | 2013-11-05 | 2015-05-07 | Rohm And Haas Electronic Materials Llc | Plating bath and method |
| CN106222710A (zh) * | 2016-08-29 | 2016-12-14 | 昆明理工大学 | 一种酸性半光亮镀锡溶液及其制备方法 |
| CN115058762A (zh) * | 2022-08-11 | 2022-09-16 | 深圳市板明科技股份有限公司 | 一种电镀锡工艺用锡沉降剂及其使用方法 |
| CN115058762B (zh) * | 2022-08-11 | 2022-11-08 | 深圳市板明科技股份有限公司 | 一种电镀锡工艺用锡沉降剂及其使用方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| BE703841A (de) | 1968-03-13 |
| DE1621127A1 (de) | 1971-05-13 |
| AT278462B (de) | 1970-02-10 |
| DE1621127B2 (de) | 1972-11-09 |
| NL151449B (nl) | 1976-11-15 |
| NL6612936A (de) | 1968-03-15 |
| GB1199634A (en) | 1970-07-22 |
| FR1536736A (fr) | 1968-08-16 |
| CH519581A (de) | 1972-02-29 |
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