US3554739A - Alloys and processes for their manufacture - Google Patents

Alloys and processes for their manufacture Download PDF

Info

Publication number
US3554739A
US3554739A US665844A US3554739DA US3554739A US 3554739 A US3554739 A US 3554739A US 665844 A US665844 A US 665844A US 3554739D A US3554739D A US 3554739DA US 3554739 A US3554739 A US 3554739A
Authority
US
United States
Prior art keywords
collector
deposit
temperature
aluminum
alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US665844A
Other languages
English (en)
Inventor
Robert Lewis Bickerdike
Francis Julian Bradshaw
Garyth Hughes
William Norman Mair
Harry Christopher Ranson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TECHNOLOGY UK
Original Assignee
TECHNOLOGY UK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TECHNOLOGY UK filed Critical TECHNOLOGY UK
Application granted granted Critical
Publication of US3554739A publication Critical patent/US3554739A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0005—Separation of the coating from the substrate

Definitions

  • This invention relates to alloys and processes for their manufacture.
  • a common method of obtaining high strengths in metals is by dispersion hardening. A line enough dispersion of a suitable strong phase in the metal matrix raises the yield stress.
  • the dispersion is usually obtained by precipitation from a supersaturated solid solution, according to the well known precipitation hardening process. It can also be obtained by mechanical and/ or chemical methods followed by powder metallurgy, or by diffusion (internal oxidaton). These methods in general have limitations which have restricted the development of useful engineering alloys. For example chemical and diffusion methods are restricted to particular systems and mechanical methods tend to give irregular dispersions.
  • the precipitationfrom-solid-solution method is based on the phase diagram of the alloy system; only those elements which can dissolve in the matrix metal to a sufficient extent at the solution-forming temperature, and which have a solubility limit decreasing suiciently sharply with decreasing temperature, can be used (with or without the solvent metal) to form a useful amount of precipitated material.
  • An element which can be used to form precipitated material may be termed a hardening constituent.
  • the amounts and types of precipitates formed by this technique are therefore limited.
  • aluminum in the solid state is a relatively poor solvent for other metals and thus precipitation hardened aluminum alloys are relatively difficult to obtain.
  • the object of the present invention is to provide high strength alloys and processes for their manufacturein which the solubility restrictions referred to above are largely, if not wholly, avoided.
  • a bulk alloyed process for the production of a multi-phase alloy in the form of an engineering material comprises the deposition from vapour of the constituents on a collector within a low pressure or Vacuum system. Normally at least one of the constituents is evaporated from a source meanswithin the said vacuum system.
  • An engineering material produced in accordance with the present invention is a deposit having a thickness greater than 0.01 inch and capable of being removed from the collector and being worked into sheet, strip or other with the present invention conveniently comprises a vessel containing a controllably heated evaporative source means, a temperature controllable collector and means for controlling the pressure within the vessel.
  • the apparatus may also include a shutter between the collector and the source or sources and include measuring means for monitoring the background gas pressure in the vessel, heat input to and the temperature of the source means, evaporation and deposition rates.
  • All of the constituents of the eventually formed multiphase alloy may be evaporated or one or more constituents may be gaseous and trapped or absorbed and then trapped by the deposited material; for example oxygen or a volatile compound such as a metal carbonyl.
  • each constituent may be evaporated from one or more separate sources or a mixture of constituents may be evaporated from the same source or sources.
  • Multi-phase material may be produced by successive deposition of the constituents, or by simultaneous deposition from a vapour stream with fluctuating composition across the collector surface.
  • the evaporative source may comprise a larger volume of alloy which is heated to achieve a steady state at which the melt surface of the source assumes a composition such that the constituents evaporate from it in the desired proportions.
  • the composition of the melt surface and the evaporating stream will in this case be different.
  • the steady state may be achieved by feeding into the melt a 'feed stock of the same composition as the vapour stream.
  • Methods of heating the source means include radiation from a high frequency susceptor, eddy current heating of the charge itself either with or without levitation, radiation from a resistance heater (conveniently made from one of the refractory metals or other electrically conducting material), direct resistance heating of either the charge itself or its container, electron beam heating, plasma beam heating or arc heating.
  • Methods which put heat directly into the charge, for example electron beam heating have the advantage of reducing the severity of problems arising from chemical interaction between the charge and its container.
  • the choice of heating method is determined by the material that is to be evaporated, the desired rate of evaporation, chemical interactions, the temperature and surface area of the charge and the thermal efficiency.
  • aluminum can be evaporated from a radiation heated vitreous carbon boat or crucible as described in detail below.
  • Higher aluminum evaporation rates can be obtained either by using an electrically heated bar of conducting refractory material (for example boron nitride or titanium diboride) or by electron beam heating of a charge supported by a thin layer of thermally insulating refractory material on a water cooled copper hearth.
  • Metals of high vapour pressure, for example, manganese may be evaporated or sublimed from the solid state.
  • Deposits may be under a stress, usually tensile in nature, and it is necessary to ensure that this does not result in the deposit being prematurally pulled away from the collector.
  • the built-in stress in a thick deposit tapered to zero thickness gradually at the edge is usually insufficient to pull it away from the collector, but a sharp change in thickness introduced by scratching or cutting the deposit causes a crack to run between the deposit and the collector under suitable conditions. It is more dicult however to start such a crack without damaging the collector if the deposit is hard, but a multiple collector, i.e. a collector to which there is a closely tting annulus may be used.
  • the deposit forms on the central region and on the annulus, and when a thick enough deposit has been obtained, the annulus can be moved forward relative to the rest of the collector pushing the deposit off the central region. Separation is assisted in both these cases if the central region of the collector is covered with a thin lm of oxide or carbon or some other material which will limit adhesion, leaving a clean annular region free for good adhesion.
  • Another technique is to solder a thin metal sheet to the collector surface with a solder of suita-ble melting point. Deposition takes place on the sheet. When it is complete, the solder is melted and the deposit and sheet are removed. After the remaining traces of solder have been removed, the sheet can if desired be dissolved in the deposit during subsequent heat treatment to provide additional alloying. For example this can be used in the aluminum-copper system.
  • collector-cum-deposit may be hot worked to the original collector thickness and the surplus material cut off.
  • the collector material is chosen in part for its heat transfer properties and for its thermal expansion.
  • aluminum-copper collectors have been used in the temperature range 196 to 220 C., and aluminum collectors in the range 65 to 350 C.
  • Deposited aluminum has also been collected on stainless steel up to 550 C. and on molybdenum.
  • a wide range of metals and alloys can be considered for collectors, adhesion to, or interaction with, the deposit being a relevant aspect. It may also be feasible and convenient to collect the deposit directly on a fusible or soluble layer on a metal surface, for example a thin deposit of an inorganic salt or compound.
  • the collector may be stationary but in order to even out irregularities caused by non uniform evaporation from the source or sources the collector and the source or sources may be moved with respect to one another during the deposition. Such motion may be translational or vibrational but in the preferred embodiment the collector comprises a cylinder which is rapidly rotated over an array of sources; for example the evaporating materials may be contained in heated troughs lying parallel to the axis of rotation of the drum and close to the drum surface.
  • a friable deposit suitable for powdering, containing multilayers of two or more phases may be obtained in this way. The thickness and separation of the phases is determined by the rates of deposition and the speed of rotation of the dlum.
  • Another possible variety of moving collector is a rotating plate collector, with evaporating troughs below it.
  • a deposit may also be obtained in which the compositional fluctuations are very slight and the multi-phase alloy produced has substantially the same composition throughout.
  • This technique is particularly useful when the source is a melt of metals having markedly different vapour pressures.
  • the hot area on the surface of a melt of aluminum and iron or titanium being heated by an electron beam will not all be at the same temperature and the ratio of the two metals evaporating will vary across the hot area.
  • high evaporation rates allow very little mixing in the vapour beam and a rotating cylindrical collector is the preferred method of obtaining uniform composition of the deposit.
  • Processes in accordance with this invention provides thick plate-like or slab deposits of 0.01 inch or more in thickness. These deposits may be removed from the collector and worked into sheet, strip or other wrought form and heat treated before, during or after working to produce desired mechanical properties. Alternatively the deposits may be produced for processing by powder metallurgy, either by powdering the deposit or arranging the deposition conditions, for example, the angle of incidence, so that the deposit is easily broken up.
  • alternate or successive deposition can be employed, either by altering the composition of the vapour stream, or interrupting it, or changing the pressure or composition of the permanent or residual gases or vapours in the system, or the substrate temperature, or some other deposition condition, so as to obtain layers with differing compositions or structures, or for some other purpose.
  • This can be combined with the formation of the main layer by codeposition. For example in some cases it has been found desirable Iwhen depositing aluminum alloys to start depositing with the substrate above 300 C. in order to obtain adequate adhesion to the collector, before depositing the main layer at a lower temperature in order to obtain the desired alloy structure. Other preliminary deposits can be used to regulate adhesion.
  • Some deposits are porous, and it can be desirable to put down an impermeable layer to seal this porosity before exposing the deposit to the atmosphere. Alternatively heating in vacuum at the sintering temperature may also reduce the porosity.
  • a further example is where it is found convenient to incorporate an alloying constituent not by co-deposition but by deposition before or after or at some stage in the formation of the main deposit, followed by a diffusion heat treatment.
  • Processes in accordance with the present invention are particularly useful for permitting the production of dispersion hardened alloys in which the strong dispersed phase constitutes a greater proportion of the final alloy than would be predicted on the basis of the phase diagram of the alloy system when the alloy is produced by the regular precipitation-from-solid-solution method.
  • a process for the production of a multi-phase alloy in the form of an engineering material comprises the deposition from vapour of the constituents on a collector within a vacuum or low pressure system, whereby the product is a dispersion hardened alloy in which the proportion of hardening constituent in the dispersion hardened alloy is greater than the proportion of hardening constituent in a solid solution with the matrix metal.
  • Other common alloying additions such as iron, nickel, manganese are only soluble to 0.05, 0.05 ⁇ and 1.82% respectively, and chromium to 0.77% in their binary systems 'with aluminum. Oxygen is not normally found Vin solid 'solution in aluminum and has taken no direct part in precipitation hardening according to known practice.
  • the element in the precipitated phasev that' impart the hardening may be termed the hardening constituent, and more than one hardening 'constituent may be included in the precipitated phase.
  • FIG. 1 is a schematic illustration" o'f ⁇ an apparatus suitable for carrying out processes in accordance-with the invention.
  • FIG; 2 illustrates a cross-section of a particular type of evaporative source
  • v ⁇ FIG. 3 is a graph" of the lattice parameter for aluminium plotted against 'proportions "'of iron, chromium, copper and oxygen that ,may be obtained in dispersion hardened aluminium alloys
  • Y "FIG, 4 shows'the 'change of-microhardness with time on -annealin'gan aluminum-oxygen alloy at 400 C.
  • FIG. '5Vsho'w ⁇ s' the-"change of 'microhardness with time 'on annealing an aluminum-chromium alloy at 350 C.
  • the sourceineans l' comprises a carbon boat supported on a thin graphite plate 11 above a tungsten rod hleateiml'lZ, this assembly being surrounded by a set oimolybde'numv radiatjion screens 13'. ⁇
  • a moveable shutter 14 isprovided between the source 1 and4 a collector 15.
  • the ycollector 15 forms part of the vacuum vessel 1 6, which is'evacuatedfbyv meansof a.. standard oil diffusion pump system ,17, while the pressure is monitored by an ionisationpress'ure gauge 18. Electrical power is supplied to the tungsten rod heater. 12L by electrical leads 19 through a seal 2 0 inthe vacuum envelope.
  • a spoon 21 operated through a seal A22.
  • the collector 15 mayI be hollow and 'c'ooled eithergby circulating cold water through it or by UI lling it ⁇ with a suitable cooling mixture for exampleacetonelsolid carbon dioxide. Alternatively 'the collector' may'fbe heated to a required temperature by any Suitblemeans; for vexample by playing a blow-pipe on theouter surface.
  • a needle valve 25v is providedV through which gases may be added to the system.
  • the tungsten heater 12 is raised to a high temperature in vacuo-,.with the lshutter 14 in position. After a short time the'power is reduced and when the pressure has reached about 10*rl torr the boat 10 is heated to about the melting point of the material to be evapo- 6 rated. Metal pellets are introduced, and after melting has occurred the boat 10 is heated to the required evaporation temperature.
  • the shutter 14 is opened and the deposit collected on the collector 15. The shutter 14 is closed when the required amount has been evaporated.
  • a vitreous carbon crucible 30 is supported upon three hollow molybdenum legs 3-1, one of which contains a tungsten-iridium thermocouple 32 to give an indication of the source temperature.
  • Heat is supplied by a tantalum sheet heater 33 inside molybdenum radiation screens 34.
  • two crucibles may be placed one inside the other to provide a source for the simultaneous evaporation of two separate constituents as is illustrated by the chain-dotted line 35 in FIG. l and FIG. 2.
  • FIG. 3 shows three straight line graphs showing the variation of aluminum lattice paramater with the concentration of solute copper 40.
  • chromium 41 and iron 42 The solid portion of each of them represents the solubility of the second phase. It should be noted that iron has such a low solubility; 0.05% that a sol-id portion cannot readily be shown for it.
  • the points 43, 44 and 45 represent respectively concentrations of copper, chromium and iron in aluminum that can be obtained by processes in accordance with the present invention.
  • the upper half of the graph shows the variation of aluminum lattice parameter with oxygen concentration in alloys produced in accordance with the present invention.
  • EXAMPLE 1 A double crucible source 35 was used with 112 g. of 99.99% pure aluminum in the inner crucible and l5 g. of pure electrolytic chromium flake in the annular space; the collector was of polished copper.
  • the apparatus was evacuated and the collector 15 heated to 210 C.
  • the source was heated to the evaporation temperature of 1550" C., the shutter 14 opened and the collector 15 cooled rapidly to 20 C. Deposition was continued for about 40 minutes during which time the pressure was about 10-5 mm. Hg and a deposit 0.012 thick collected.
  • the chromium content and lattice parameter of this deposit is shown as 44 on FIG. 3 and the change of microhardness on annealing at 350 C. in argon is shown in FIG. 5.
  • EXAM-PLE 2.-ALUMINIUMIRON An iron aluminum alloy containing 62% aluminum and 38% iron was heated in vacuo in a vitreous carbon boat 10 by a tungsten rod heater 12 as shown in FIG. l. When the metal had melted the shutter 14 was opened and the source heated to the evaporation temperature of 1360 C. A deposit weighing 0.12 g. was obtained on the collector at 20 C. The iron content and lattice parameter are shown as 45 in FIG. 3.
  • EXAMPLE 3 EXAMPLE 3 .-ALUMINIUM-COPPER Thiswas carried out as for Example 2 except that an aluminium-copper alloy containing about 50% copper was used and the evaporation temperature was 1400 C. The composition of the deposit and its lattice parameter are shown as 43 in FIG. 3.
  • the table bemeans, introducing at least one other constituent into the low gives details of the evaporating temperature recorded said vacuum or low pressure system in the form of a being that of the thermocouple in the leg of the crucible gas, depositing the vapour on a temperature controllable support.
  • the composition of the alloy produced was decollector means, the deposition being carried on for a termined by chemical analysis and also ⁇ by X-ray intensity length of time such that the alloy deposited attains a measurement in certain instances.
  • a plot of composition thickness of at least 0.01 inch and removing the alloy against lattice parameter is given on the top half of from the collector, in aform capable of sustaining normal FIG. 3. metallurgical working.
  • TABLEl 3 A bulk alloying process in accordance with claim Aluminum Conector 1 in which aluminum is introduced into the controllable evaporatim, Oxygen temper, Refcmme vacuum or low pressure system in solid form as the matelperatm-e, L )esture atprce. nurxeralor trix metal of the alloy and oxygen is also introduced X o gum therein, the pressure of oxygen in the vacuum or low pressure system being not greater than one fifth of the 1.0 20 46 3 0 20 47 vapour pressure of the aluminum at the temperature of leg gg g 40 the controllably heated source means. 15:0 20 50 4.
  • the symbol G) indicates a chemical deter- 5.
  • a bulk alloying process in accordance with claim mination and X indicates an X-ray intensity determina- 3 in which the temperature of the temperature controltion.
  • lable collector means is lbetween about 100 and 500 C.
  • the temperature of the temperature controllable source EXAMPLE 5,-AGE-HARDENED DEPOSITS means is between 1200 and 1600 C.
  • the deposit produced is annealed at a temperature -between about 500 and 630 Suitable heat treatment 0f aitlffllmim-Oxygeii deposits C., and hot rolled after separation from the collector. produce age hardened alloys.
  • Variables that affect age hardening irtl clude hhcotllectoi temperature, the anneal- References Cited ing empera ure an e ime o annea ing.
  • the apparatus and evaporation were carried out broadly UNITED STATES PATENTS as for Example 4.
  • the aluminum was 1,562,202 11/ 1925 BOViIlg 117-107X was evaporated at 1550" C. in a low pressure system with 1,982,774 12/ 1934 Winkler et al. 117-107X an oxygen pressure of 10.0 105 torr.
  • the collector was 2,353,612 7/ 1944 Gardner 75-122. at 35 C. and the original microhardness was 97 kg. 3,268,422 8/1965 E- -l- Smith et al, 204-39 mm.2.
  • the deposit, on chemical analysis contained 12% 3,307,936 3/1967 H- R- Smith, Jr.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
  • Manufacture Of Alloys Or Alloy Compounds (AREA)
US665844A 1966-09-07 1967-09-06 Alloys and processes for their manufacture Expired - Lifetime US3554739A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB39928/66A GB1206586A (en) 1966-09-07 1966-09-07 Vacuum deposition process of forming alloys

Publications (1)

Publication Number Publication Date
US3554739A true US3554739A (en) 1971-01-12

Family

ID=10412255

Family Applications (1)

Application Number Title Priority Date Filing Date
US665844A Expired - Lifetime US3554739A (en) 1966-09-07 1967-09-06 Alloys and processes for their manufacture

Country Status (5)

Country Link
US (1) US3554739A (de)
JP (1) JPS4841123B1 (de)
AT (1) AT293033B (de)
DE (1) DE1608243C3 (de)
GB (1) GB1206586A (de)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3879840A (en) * 1969-01-15 1975-04-29 Ibm Copper doped aluminum conductive stripes and method therefor
US4093453A (en) * 1974-12-20 1978-06-06 Sony Corporation Method of making an ordered alloy
NL1020059C2 (nl) * 2002-02-21 2003-08-25 Corus Technology B V Werkwijze en inrichting voor het bekleden van een substraat.
CN109396422A (zh) * 2018-12-27 2019-03-01 吉林大学 一种小包内纳米颗粒预分散辅助熔体内均匀分散的方法

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0043248B1 (de) * 1980-07-01 1984-05-30 The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and Verfahren zur Massenherstellung von Legierungen und Vorrichtung hierfür
EP0055542A1 (de) * 1980-12-16 1982-07-07 The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and Verfahren zur Herstellung von Legierungsmengen durch Dampfphasenanbscheidung und Vorrichtung hierfür
EP0091734A1 (de) * 1982-04-06 1983-10-19 The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and Massenproduktion von Legierungen durch Abscheidung aus der Dampfphase und Vorrichtung hierfür
GB8328858D0 (en) * 1983-10-28 1983-11-30 Atomic Energy Authority Uk Metal vapour deposition
GB8327444D0 (en) * 1983-10-13 1983-11-16 Atomic Energy Authority Uk Rotary drum
GB8430509D0 (en) * 1984-12-04 1985-01-09 Secr Defence Alloy production
GB2230792A (en) * 1989-04-21 1990-10-31 Secr Defence Multiple source physical vapour deposition.
GB2248852A (en) * 1990-10-16 1992-04-22 Secr Defence Vapour deposition
GB2294272B (en) * 1994-07-28 1998-02-25 Honda Motor Co Ltd Method for producing metal-ceramic composite materials.
GB9516927D0 (en) * 1995-08-18 1995-10-18 Secr Defence Preparation of structural materials by nanoscale laminar pvd process

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3879840A (en) * 1969-01-15 1975-04-29 Ibm Copper doped aluminum conductive stripes and method therefor
US4093453A (en) * 1974-12-20 1978-06-06 Sony Corporation Method of making an ordered alloy
NL1020059C2 (nl) * 2002-02-21 2003-08-25 Corus Technology B V Werkwijze en inrichting voor het bekleden van een substraat.
WO2003071000A1 (en) * 2002-02-21 2003-08-28 Corus Technology Bv Method and device for coating a substrate
US20050064110A1 (en) * 2002-02-21 2005-03-24 Corus Technology Bv Method and device for coating a substrate
US7323229B2 (en) 2002-02-21 2008-01-29 Corus Technology Bv Method and device for coating a substrate
RU2316611C2 (ru) * 2002-02-21 2008-02-10 Корус Текнолоджи Бв Способ и устройство для покрытия подложки
CN100545299C (zh) * 2002-02-21 2009-09-30 科鲁斯技术有限公司 衬底镀膜的方法和设备
CN109396422A (zh) * 2018-12-27 2019-03-01 吉林大学 一种小包内纳米颗粒预分散辅助熔体内均匀分散的方法

Also Published As

Publication number Publication date
JPS4841123B1 (de) 1973-12-05
DE1608243C3 (de) 1978-06-29
AT293033B (de) 1971-09-27
DE1608243A1 (de) 1970-12-03
GB1206586A (en) 1970-09-23
DE1608243B2 (de) 1977-11-10

Similar Documents

Publication Publication Date Title
US3554739A (en) Alloys and processes for their manufacture
US5348703A (en) Vapor deposition apparatus and method
EP0041395A1 (de) Herstellung von kubischem Bornitrid
CN1449452A (zh) 高纯度铌和含有该高纯度铌的产品及其制备方法
US3151971A (en) Vacuum vapor condensation process for producing fine metal powders
EP0573484B1 (de) Legierung auf titanbasis hergestellt nach dem dampfabschreckungsverfahren
Zhang et al. High-purity nickel prepared by electron beam melting: purification mechanism
JPWO2001068936A1 (ja) 複合材料の製造方法及びそれにより得られる複合材料
EP0178034B1 (de) Verfahren zum Herstellen amorpher Phasen intermetallischer Verbindungen durch eine chemische Reaktion
US4198449A (en) Method for the preparation of thin films of high-temperature-resistant metals such as tungsten, molybdenum, rhenium or osmium
RU2356964C1 (ru) Способ производства распыляемых мишеней из литых дисилицидов тугоплавких металлов и устройство для его реализации
CA2104012A1 (en) Titanium containing magnesium alloy produced by vapour quenching
US3804662A (en) Processes for the production of alloys
US5383981A (en) Reusable crucible for containing corrosive liquids
JPH09504831A (ja) 真空蒸着法による超塑性チタン合金
Majumder Synthesis and structural characterization of copper-alumina composites prepared by high rate physical vapor deposition
Sharma et al. Voids in thin silver films
Bozack et al. Wettability of transition metal boride eutectic alloys to graphite
JPH1161392A (ja) Ｒｕ薄膜形成用スパッタリングターゲットの製造方法
Bysakh et al. Microstructure evolution and metastable phase formation in laser-ablation-deposited films of Ti5Si3 intermetallic compound
SU823357A1 (ru) Шихта дл изготовлени огнеупорногоКЕРАМичЕСКОгО МАТЕРиАлА
KR100226891B1 (ko) 반응성 물질 증발용 저항 가열증 발원 및 그 제조방법
Nedelcu Deposition Methods, Classifications
Hrechaniuk et al. Dispersed and layered volumetric nanocrystalline materials based on copper and molybdenum condensed from the vapor phase.
RU2365673C2 (ru) Распыляемая мишень из молибдена высокой чистоты и способ ее производства