US3730899A - Powderless etching bath additive - Google Patents
Powderless etching bath additive Download PDFInfo
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- US3730899A US3730899A US00183660A US3730899DA US3730899A US 3730899 A US3730899 A US 3730899A US 00183660 A US00183660 A US 00183660A US 3730899D A US3730899D A US 3730899DA US 3730899 A US3730899 A US 3730899A
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- United States
- Prior art keywords
- etching
- acid
- bath
- etching bath
- water
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- 238000005530 etching Methods 0.000 title abstract description 73
- 239000000654 additive Substances 0.000 title description 12
- 230000000996 additive effect Effects 0.000 title description 10
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 abstract description 22
- 229910017604 nitric acid Inorganic materials 0.000 abstract description 22
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 abstract description 14
- 239000011777 magnesium Substances 0.000 abstract description 14
- 229910052749 magnesium Inorganic materials 0.000 abstract description 14
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 abstract description 8
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 abstract description 8
- 229910052725 zinc Inorganic materials 0.000 abstract description 8
- 239000011701 zinc Substances 0.000 abstract description 8
- 239000000956 alloy Substances 0.000 abstract description 7
- 229910045601 alloy Inorganic materials 0.000 abstract description 7
- 229910052799 carbon Inorganic materials 0.000 abstract description 7
- 150000002430 hydrocarbons Chemical group 0.000 abstract description 6
- 239000007864 aqueous solution Substances 0.000 abstract description 4
- 230000002209 hydrophobic effect Effects 0.000 abstract description 4
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 abstract description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- 150000001721 carbon Chemical class 0.000 abstract 1
- 239000002253 acid Substances 0.000 description 17
- 235000014113 dietary fatty acids Nutrition 0.000 description 13
- 229930195729 fatty acid Natural products 0.000 description 13
- 239000000194 fatty acid Substances 0.000 description 13
- 150000004665 fatty acids Chemical class 0.000 description 12
- 125000004432 carbon atom Chemical group C* 0.000 description 11
- 239000007788 liquid Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- -1 aliphatic alcohols Chemical class 0.000 description 8
- AKEJUJNQAAGONA-UHFFFAOYSA-N sulfur trioxide Chemical compound O=S(=O)=O AKEJUJNQAAGONA-UHFFFAOYSA-N 0.000 description 8
- 239000004359 castor oil Substances 0.000 description 7
- 229960001777 castor oil Drugs 0.000 description 7
- 235000019438 castor oil Nutrition 0.000 description 7
- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000003208 petroleum Substances 0.000 description 7
- 125000001183 hydrocarbyl group Chemical group 0.000 description 6
- 238000006277 sulfonation reaction Methods 0.000 description 6
- MWJUYGQNYQVTIP-KTKRTIGZSA-N (z)-2-sulfooctadec-9-enoic acid Chemical compound CCCCCCCC\C=C/CCCCCCC(C(O)=O)S(O)(=O)=O MWJUYGQNYQVTIP-KTKRTIGZSA-N 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- 239000004215 Carbon black (E152) Substances 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 150000001735 carboxylic acids Chemical class 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- UKMSUNONTOPOIO-UHFFFAOYSA-N docosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCC(O)=O UKMSUNONTOPOIO-UHFFFAOYSA-N 0.000 description 4
- 229930195733 hydrocarbon Natural products 0.000 description 4
- 229910052500 inorganic mineral Inorganic materials 0.000 description 4
- 239000011707 mineral Substances 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- IYPWAFHILHQUKL-UHFFFAOYSA-N 2-sulfooctanoic acid Chemical compound CCCCCCC(C(O)=O)S(O)(=O)=O IYPWAFHILHQUKL-UHFFFAOYSA-N 0.000 description 3
- 239000005642 Oleic acid Substances 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N acetic acid anhydride Natural products CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- 238000007792 addition Methods 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid group Chemical group C(CCCCCCC\C=C/CCCCCCCC)(=O)O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- SYJBSUCZJWZJDZ-UHFFFAOYSA-N 2-sulfodocosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCC(C(O)=O)S(O)(=O)=O SYJBSUCZJWZJDZ-UHFFFAOYSA-N 0.000 description 2
- SGMWKTNAISQTLA-UHFFFAOYSA-N 9,10-dibenzyloctadecanoic acid Chemical class C(C1=CC=CC=C1)C(CCCCCCCC(=O)O)C(CCCCCCCC)CC1=CC=CC=C1 SGMWKTNAISQTLA-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- 239000003925 fat Substances 0.000 description 2
- 235000019197 fats Nutrition 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- WBHHMMIMDMUBKC-XLNAKTSKSA-N ricinelaidic acid Chemical compound CCCCCC[C@@H](O)C\C=C\CCCCCCCC(O)=O WBHHMMIMDMUBKC-XLNAKTSKSA-N 0.000 description 2
- 235000003441 saturated fatty acids Nutrition 0.000 description 2
- 150000004671 saturated fatty acids Chemical class 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L sulfate group Chemical group S(=O)(=O)([O-])[O-] QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- 235000010269 sulphur dioxide Nutrition 0.000 description 2
- VACHUYIREGFMSP-UHFFFAOYSA-N (+)-threo-9,10-Dihydroxy-octadecansaeure Natural products CCCCCCCCC(O)C(O)CCCCCCCC(O)=O VACHUYIREGFMSP-UHFFFAOYSA-N 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- JPFGKGZYCXLEGQ-UHFFFAOYSA-N 1-(4-methoxyphenyl)-5-methylpyrazole-4-carboxylic acid Chemical compound C1=CC(OC)=CC=C1N1C(C)=C(C(O)=O)C=N1 JPFGKGZYCXLEGQ-UHFFFAOYSA-N 0.000 description 1
- CWMYWRMDANXCSB-UHFFFAOYSA-N 1-oxoethanesulfonic acid Chemical compound CC(=O)S(O)(=O)=O CWMYWRMDANXCSB-UHFFFAOYSA-N 0.000 description 1
- ULQISTXYYBZJSJ-UHFFFAOYSA-N 12-hydroxyoctadecanoic acid Chemical compound CCCCCCC(O)CCCCCCCCCCC(O)=O ULQISTXYYBZJSJ-UHFFFAOYSA-N 0.000 description 1
- KIHBGTRZFAVZRV-UHFFFAOYSA-N 2-Hydroxyoctadecanoic acid Natural products CCCCCCCCCCCCCCCCC(O)C(O)=O KIHBGTRZFAVZRV-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- VACHUYIREGFMSP-SJORKVTESA-N 9,10-Dihydroxystearic acid Natural products CCCCCCCC[C@@H](O)[C@@H](O)CCCCCCCC(O)=O VACHUYIREGFMSP-SJORKVTESA-N 0.000 description 1
- IOVDLGFDMIRNLE-UHFFFAOYSA-N 9,10-dichloro-octadecanoic acid Chemical class CCCCCCCCC(Cl)C(Cl)CCCCCCCC(O)=O IOVDLGFDMIRNLE-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- 235000021357 Behenic acid Nutrition 0.000 description 1
- 235000021353 Lignoceric acid Nutrition 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- XCNSZMVJBIDHEM-UHFFFAOYSA-N S(=O)(=O)(O)C(C=C/CCCCCCCC(=O)O)CCCCCCC Chemical compound S(=O)(=O)(O)C(C=C/CCCCCCCC(=O)O)CCCCCCC XCNSZMVJBIDHEM-UHFFFAOYSA-N 0.000 description 1
- 238000007059 Strecker synthesis reaction Methods 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical class OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 1
- 229960000583 acetic acid Drugs 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 150000001243 acetic acids Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000008055 alkyl aryl sulfonates Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- YZXBAPSDXZZRGB-DOFZRALJSA-N arachidonic acid Chemical class CCCCC\C=C/C\C=C/C\C=C/C\C=C/CCCC(O)=O YZXBAPSDXZZRGB-DOFZRALJSA-N 0.000 description 1
- 235000021342 arachidonic acid Nutrition 0.000 description 1
- 229940116226 behenic acid Drugs 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000002802 bituminous coal Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000012362 glacial acetic acid Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 235000011167 hydrochloric acid Nutrition 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 150000002889 oleic acids Chemical class 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 235000020777 polyunsaturated fatty acids Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 229960003656 ricinoleic acid Drugs 0.000 description 1
- FEUQNCSVHBHROZ-UHFFFAOYSA-N ricinoleic acid Natural products CCCCCCC(O[Si](C)(C)C)CC=CCCCCCCCC(=O)OC FEUQNCSVHBHROZ-UHFFFAOYSA-N 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 229940006295 sulfonated oleic acid Drugs 0.000 description 1
- XTHPWXDJESJLNJ-UHFFFAOYSA-N sulfurochloridic acid Chemical compound OS(Cl)(=O)=O XTHPWXDJESJLNJ-UHFFFAOYSA-N 0.000 description 1
- 239000004291 sulphur dioxide Substances 0.000 description 1
- QZZGJDVWLFXDLK-UHFFFAOYSA-N tetracosanoic acid Chemical class CCCCCCCCCCCCCCCCCCCCCCCC(O)=O QZZGJDVWLFXDLK-UHFFFAOYSA-N 0.000 description 1
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 1
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 1
- 235000013311 vegetables Nutrition 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
Definitions
- ABSTRACT OF THE DISCLOSURE Etching bath for zinc and magnesium and alloys based thereon comprising an aqueous solution containing an etching amount of nitric acid, and a water-soluble or dispersible, anionic, aliphatic carboxylic acid containing at least one hydrophobic hydrocarbon group with about 8 to 24 carbon atoms and having a sulfonate group depending from a carbon atom in said hydrocarbon group.
- This invention relates to powderless etching. It more particularly refers to an improved additive composition for use in powderless etching baths.
- a fiat or cylindrical plate of an acid-soluble metal such as magnesium, zinc or one of their alloys, is coated with a light sensitive coating or enamel.
- This coated surface is exposed to light through a negative having an image thereon so as to produce an image on the coating.
- the exposed coated surface is then developed to form an acid-resistant coating corresponding to the image produced by the exposure.
- This coating may be further hardened by heating and the final acid-resistant image is called the resist.
- the image bearing surface of the plate is subjected to etching by an acid to remove the metal which is not under the resist and thus to produce the image in relief.
- Powderless etching is now a well-known, widely practiced technique. It is used to etch photoengraving plates and other similar shaped articles. Zinc, magnesium and alloys based thereon are generally used as the photoengraving plate metals.
- etching baths made up of aqueous solutions of nitric acid and one or more surfactants are quite suitable for powderless etching of zinc and/ or magnesium.
- Many technological contributions have been made to this art, such as for example in US. Pats. 2,640,763; 2,640,764; and 2,640,766; according to which the aqueous nitric acid etching baths are modified by the incorporation therein of aliphatic acids, or esters of aliphatic acids with polyhydric aliphatic alcohols, or sulfonates of succinic acid diesters.
- the most commonly commercially used surfactant in the powderless etching art is a material which is usually referred to in the trade as sulfonated castor oil. This is a commercially available material which is chemically mis-named.
- the material referred to is actually a sulfated castor-oil, mainly the sulfate ester of n'cinoleic acid (the is the hydroxyl group of ricinoleic acid is esterified with sulfuric acid to add a sulfate group thereon).
- surfactants which have been recommended in the patent literature in combination with the water-immiscible organic liquid are sulfosuccinates, petroleum sulfonates, alkylaryl sulfonates, sulfated alcohols, sulfated fats and oils other than sulfated castor oil, phosphate esters, polyether non-ionic surfactants, and alkylaryl ether sulfonates.
- Another objects of this invention are to provide a novel etching bath capable of producing desired depths of etch in all kinds of image areas of combination plates, to porvide an etching bath capable of forming a stable protective film to prevent or retard lateral etching and chipping of relief side walls and a smooth, uniform side Wall permitting easy release from a matrix, besides having visual appeal.
- a still further object of this invention is to provide an improved etching bath for producing name plates, metal patterns, templates and the like.
- one important aspect of this invention resides in the use of a water-soluble or water-dispersible anionic aliphatic carboxylic acid or ester thereof containing at least one hydrophobic hydrocarbon group with about 8 to 24 carbon atoms attached to the carboxyl group and at least one sulfonate group attached to a carbon atom in said hydrophobic hydrocarbon group as the surfactant in an aqueous mineral acid etching bath.
- the mineral acid of an etching bath is generally nitric acid, although mixtures of nitric acid and small quantities of sulfuric, hydrochloric or acetic acids can be beneficial. Suitable amounts of mineral acid range from about 30 to 300 grams per liter of bath with a preferred range from about 70 to 250 grams per liter of bath. A most preferred range is about 80 to 200 grams per liter of bath.
- the mineral acid components of the powderless etching bath of this invention is per se known.
- the sulfonated carboxylic acids of this invention are true sulfonates as distinguished from the so called sulfonated oils like sulfonated caster oil which products are actually sulfates or esters of sulfuric acid.
- the true sulfonates of this invention differ from the sulfates by the fact that in the sulfonate, sulfur is directly linked to a carbon atom rather than through an intermediary oxygen atom as in the sulfate.
- fatty acids which in their sulfonated condition are useful in this invention are for example caprylic, lauric, stearic, isostearic, behenic, lignoceric acids, undecylenic, oleic, linoleic, linolenic, eleo, stearic, arachidonic acids and the like.
- Saturated and unsaturated fatty acids which have substituents on their hydrocarbon chains can also be sulfonated to add a sulfonate substituent bonded to a carbon atom thereof.
- esters, amides and nitriles, chlorides and/or anhydrides of these fatty acids can be sulfonated with ease, and the sulfonation products thus produced are applicable in this invention provided there is a sulfur-carbon bond an provided they hydrolyse in an aqueous acid etching baths into the corresponding sulfonated carboxylic acids.
- the sulfonated acids of this invention can be pure fatty acids or can be mixtures of fatty acids and/or esters or other derivates thereof such as occur naturally in vegetable, animal or marine oils, fats and waxes or in synthetic fatty acids derived from petroleum, bituminous coal and natural gas. Where mixtures of sulfonated fatty acids are to be used, sulfonation of the fatty acids can be accomplished before and after mixing.
- sulfonation of fatty carboxylic acids is a well established procedure and can be accomplished by different means as the occasion demands.
- Saturated fatty acids can be sulfonated directly in the alpha-position by reaction thereof with chlor-sulfonic acid or sulfur trioxide, which may be dissolved in sulphur dioxide, dioxane or chlorinated hydrocarbons.
- Alpha-sulfonations can also be accomplished less directly by the Strecker reaction of an alpha-bromo fatty acid with sodium sulfite.
- oleic acid yields predominately ll-sulfo-oleic and 9-hyhydroxy-lO-sulfostearic acids when reacted with a stoichiometric amount of sulfur trioxide.
- Truly sulfonated ricinoleic acid is obtained by sulfonation with acetyl sulfonic acid which is itself obtained by reacting sulfur trioxide with glacial acetic acid or acetic anhydride.
- etching baths having the following composition:
- etching with the baths of the present invention it has been found to be desirable to impinge the bath against the surface to be etched, as by splashing.
- the etching bath forms a partially acid-resistant film on the resist-free metal surfaces, and when the bath is impinged against the surface to be etched in a direction normal to that surface, the film is broken.
- the film is generally not broken because of insufiicient striking force and etching of the sides (or under-cutting) is substantially reduced.
- etching machine of the type disclosed in Pat. No. 2,669.048, issued Feb. 16, 1954, and entitled Etching Machine can be used.
- this machine elongated paddles dipping into the bath composition intermittently throw, by splashing, the etching bath composition in sheets upwardly against the image bearing side of the object being etched, e.g. a plate.
- Other types of etching machines known to the art are also applicable.
- etch factor ratio is defined as the ratio of (1) the depth of the etch adjacent to a line of resist divided by one half of the loss in width of metal immediately beneath the resist using a particular additive to (2) the depth of the etch adjacent to a line of resist divided by one half of the loss in width of metal immediately beneath the resist when only nitric acid is used in the exact concentration as was used with the particular additive:
- EXAMPLE I An etching bath was made up consisting of 8% by weight of 42 B. nitric acid, 0.45% by weight of 11- sulfo-oleic acid and the balance water. This bath was used to etch magnesium printing plates having a typical, representative resist image thereon. Etching was carried out for 3 minutes in a commercial paddle type etching machine of the type described in US. Pat. No. 2,669,048. The quality of the etched plates was good.
- the etch factor ratio (EFR) was 11:1.
- Example I was repeated but an identical weight of commercial sulfated castor oil was substituted for the sulfonated oleic acid. The result was a blanking out of the plate. No improvement was obtained by either decreasing or increasing the amounts of the sulfated castor oil used.
- EXAMPLE III EXAMPLE IV Example II was repeated with the addition of 0.5% by weight of the heavy aromatic naphtha. This large amount "of naphtha was necessary in order to obtain a barely acceptable plate. Due to partial blanking out of the plate the EFR is not measurable.
- Example IV was repeated using additions of 0.6% by weight of sulfated castor oil and 0.6% by weight of heavy aromatic naphtha. The resulting plate was acceptable. The etch factor ratio was 8:1.
- Example III was repeated using sulfated castor oil in place of the 11 sulfo oleic acid. No etching took place and the plate remained blanked out.
- EXAMPLE VII An etching bath was made up by mixing dilute nitric acid and sulfocaprylic acid in the following proportions:
- the bath was maintained at 38 C. while being constantly agitated. A paddle speed of 500 r.p.m. was used to etch the plate for 3 minutes. The relief portions of the plate were found to have good sidewall formation and an EFR of 6:1.
- Example VII was repeated with the addition of 0.02% by weight of a heavy aromatic naphtha (HAN, Humble Oil Co.) to the etching bath.
- HAN Heavy aromatic naphtha
- the etched magnesium plates had good quality and an EFR of 6: 1. Concentrations of HAN higher then 0.05% lead to plate degradation.
- An etching bath for photoengraving plates based on zinc, magnesium or alloys thereof comprising:
- an etching bath as claimed in claim 1 wherein the acid moiety of said sulrfonated fatty acid is a member selected from the group consisting of caprylic, lauric, stearic, isostearic, behenic, lignoceric, undecylenic, oleic, linoleic linolenic, eleostearic, arachidonic, ricinoleic, 9,10- dihydroxystearic, 10-chlorostearic, 9,10-dichlorostearic, beta-phenylpropionic, 10-phenylundecanoic, and 9,10- dibenzylstearic.
- An etching bath as claimed in claim 1 comprising water, nitric acid and sulfo-caprylic acid.
- An etching bath as claimed in claim 1 comprising water, nitric acid, and sulfo-undecylenic acid.
- An etching bath as claimed in claim 1 comprising water, nitric acid and sulfo-behenic acid.
- Method of etching a magnesium photoengraving plate comprising contacting the plate surface with an etching bath comprising:
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- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US18366071A | 1971-09-24 | 1971-09-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3730899A true US3730899A (en) | 1973-05-01 |
Family
ID=22673780
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US00183660A Expired - Lifetime US3730899A (en) | 1971-09-24 | 1971-09-24 | Powderless etching bath additive |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US3730899A (fr) |
| JP (1) | JPS4841804A (fr) |
| BE (1) | BE788942A (fr) |
| CA (1) | CA977252A (fr) |
| DE (1) | DE2243790A1 (fr) |
| FR (1) | FR2157795B1 (fr) |
| GB (1) | GB1394688A (fr) |
| IT (1) | IT965334B (fr) |
| NL (1) | NL7211952A (fr) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3992234A (en) * | 1973-11-12 | 1976-11-16 | The Dow Chemical Company | Powderless etching method for magnesium printing plates |
| US4855198A (en) * | 1986-08-21 | 1989-08-08 | The Dow Chemical Company | Photoengraving articles of zinc-free magnesium-based alloys |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1276669A (fr) * | 1960-06-09 | 1961-11-24 | Dow Chemical Co | Procédé de gravure et solution de morsure perfectionnés |
-
0
- BE BE788942D patent/BE788942A/fr unknown
-
1971
- 1971-09-24 US US00183660A patent/US3730899A/en not_active Expired - Lifetime
-
1972
- 1972-08-18 JP JP47082248A patent/JPS4841804A/ja active Pending
- 1972-09-01 GB GB4067772A patent/GB1394688A/en not_active Expired
- 1972-09-01 NL NL7211952A patent/NL7211952A/xx not_active Application Discontinuation
- 1972-09-04 FR FR7231235A patent/FR2157795B1/fr not_active Expired
- 1972-09-06 DE DE2243790A patent/DE2243790A1/de active Pending
- 1972-09-13 IT IT52722/72A patent/IT965334B/it active
- 1972-09-20 CA CA152,205A patent/CA977252A/en not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3992234A (en) * | 1973-11-12 | 1976-11-16 | The Dow Chemical Company | Powderless etching method for magnesium printing plates |
| US4855198A (en) * | 1986-08-21 | 1989-08-08 | The Dow Chemical Company | Photoengraving articles of zinc-free magnesium-based alloys |
Also Published As
| Publication number | Publication date |
|---|---|
| IT965334B (it) | 1974-01-31 |
| BE788942A (fr) | 1973-01-15 |
| FR2157795B1 (fr) | 1975-06-13 |
| GB1394688A (en) | 1975-05-21 |
| AU4567972A (en) | 1974-01-24 |
| CA977252A (en) | 1975-11-04 |
| DE2243790A1 (de) | 1973-03-29 |
| JPS4841804A (fr) | 1973-06-19 |
| NL7211952A (fr) | 1973-03-27 |
| FR2157795A1 (fr) | 1973-06-08 |
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