US3763821A - Vacuum deposition apparatus - Google Patents

Vacuum deposition apparatus Download PDF

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Publication number
US3763821A
US3763821A US00317307A US3763821DA US3763821A US 3763821 A US3763821 A US 3763821A US 00317307 A US00317307 A US 00317307A US 3763821D A US3763821D A US 3763821DA US 3763821 A US3763821 A US 3763821A
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US
United States
Prior art keywords
dome
receptacle
cranked lever
enclosure
bellows
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US00317307A
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English (en)
Inventor
G Gorinas
C Ernu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alcatel CIT SA
Nokia Inc
Original Assignee
Nokia Inc
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Filing date
Publication date
Application filed by Nokia Inc filed Critical Nokia Inc
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Publication of US3763821A publication Critical patent/US3763821A/en
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders

Definitions

  • VACUUM DEPOSITION APPARATUS inventors Guy Gorinas, St. Michel sur Orge;
  • ABSTRACT Vapor deposition apparatus includes a workholder formed as a shallow receptacle adapted to hold a disc type substrate. Receptacle sealing means is provided by a pivotally mounted cover member.
  • Known enclosures comprise depositing mechanisms, and more particularly a device in the shape of a dome bearing the substrates and more one or several sources for emitting substances.
  • the enclosure for depositing thin layers in a vacuum according to the invention which comprises at least one source for emitting a substance, arranged facing the concave face of a dome, is characterized inthat the said dome bears at least one substrate protection device, each of these devices comprising:
  • a cranked lever suspended in the vicinity of its elbow by an axe at the periphery of the said dome and consisting of a first arm supporting a cover and a second arm;
  • a control mechanism fixed to the convex face of the said dome transmitting a rotating movement to the second arm about the said axe, so that the cover supported by the first arm shades or exposes the substrates contained in the said trough.
  • a first advantage of the invention is therefore that it obtains substrates whose cleanliness is not altered by dust.
  • the present invention also enables the depositing of a particular substance on the substrates contained a single trough to be proceeded with, without depositing on the substrates contained in the other troughs.
  • the present invention moreover has the advantage of preventing irregular depositing of a substance charged with impurities at the outset of the depositing operation, when that substance is spread unequally within the enclosure. For that purpose, all that is needed is to keep the covers closed.
  • the present invention has moreover the advantage of enabling the depositing of a substance on the substrates to be stopped suddenly by turning down the covers as required to shade the said substrates.
  • the troughs and the corresponding covers may be detached from their support, this enabling the substrates to be conveyed out of the enclosure without contaminating them by contact.
  • a trough and the corresponding cover are, to great advantage, of the type such as described in my copending U.S. application Ser. No. 317,305, filed on Dec. 21, 1972, in the applicants name.
  • FIG. 1 shows a protection device mounted on the dome of the enclosure according to the invention.
  • FIG. 2 shows an evaporation vacuum enclosure according to the invention.
  • the protection device 1 comprises a trough 2 mounted on the concave face of a dome 3, a cranked lever 4 suspended in the vicinity of its elbow by an axle 5 at the periphery of the dome 3 and a control mechanism 6 fast with the convex face of the dome 3.
  • the trough 2 comprises a groove 7, formed in its periphery, in which is inserted an O-ring 8. That trough is provided with fixing means enabling one or several substrates 9 to be maintained therein.
  • the cranked lever 4 consists of a first arm 10 at whose end is fixed a cover 11, and a second arm 12 connected to the control mechanism 6.
  • This mechanism 6 comprises two bellows l3 and 14 placed on either side of a moving piston 15 and each comprising a fixed end l6, 17 fast with the dome 3, and a mobile end 18, 19 fast with the piston 15 whose rod 20 is connected to the end of the second arm 12.
  • Each of the bellows l3 and 14 is supplied by a compressed air inlet duct 21 and 22.
  • the cover 11 When the cover 11 is open (as shown in the figure), and it is required to be closed, fluid is sent under pressure into the bellows l3, and the piston 15 moves towards the right, making the second arm 12 rotate to the right about the axle 5, and bringing the first arm 10 into a position close to the horizontal.
  • the cover 11 is applied to the O-ring 8 of the trough 2, thus protecting the substrates 9 from contamination by the outside medium.
  • the trough 2 is provided with a hole 23 which may be blocked up, enabling a vacuum to be created in that trough covered by the cover 11.
  • FIG. 2 shows a vacuum enclosure 30 according to the invention, in which only the elements necessary for understanding this invention have been shown.
  • That enclosure 30 comprises a dome 3 provided with several protection devices 1, l the device 1 being shown open and the device 1 being shown closed.
  • That dome 3 is mobile about its vertical axis by means of a motor 31, through a gear train 32.
  • a measuring device having a piezoelectric quartz 33 is installed, showing the thicknesses of the deposit.
  • crucibles such as 35, 35 each containing a substance which, when they are heated, evaporate that substance within the enclosure, are arranged on the base 34 of the enclosure 30.
  • the assembling, outside the enclosure, of the substrates in the troughs 2, 2' is proceeded with, the covers 11, 11 are closed, and a vacuum is created in the troughs, so that each cover is applied hard against the seal of the corresponding trough.
  • the troughs 2, 2' are assembled on the dome 3 of the enclosure 30 and the covers 11, 11' at the end of the first arms 10, of the levers 4, 4', then a vacuum is created in that enclosure. During that operation, the substrates are protected from dust.
  • the cover 11 of the trough 2 may be opened.
  • the cover 11 When the measuring device 33 indicates that the required thickness of the deposit is reached, the cover 11 is closed, and although the vapor is still in suspension in the enclosure, it can no longer be deposited on the substrates. By making the dome turn, the required troughs may be brought successively above the crucible 35 and the same cover opening and closing operations may be begun again.
  • the rise of the vacuum enclosure according to the invention, provided with the protection devices, is a particular advantage for producing substrates which are not contaminated by dust, as well as regular thin layers having a well-defined thickness.
  • an apparatus for depositing thin layers of a substance on a substrate in a vacuum including a vacuum enclosure and at least one source in said enclosure for emitting a substance, the improvement comprising a dome supported in said enclosure facing said source, at least one substrate protection device secured to said dome including a disk-shaped receptacle carrying at least one substrate facing said source, a cranked lever pivotally mounted by an axle at the periphery of said dome, a cover for sealing said receptacle supported on one arm of said cranked lever, and operating means supported on said dome and connected to the other arm of said cranked lever for rotating said cranked lever to thereby translate said cover to and away from said receptacle for effecting sealing closure thereof.
  • said operating means includes first and second bellows disposed on respective sides of a control piston connected by way of a piston rod to said other arm of said cranked lever, one end of each of said first and second bellows being secured to said dome and the other end thereof being secured to said piston, and means for supplying fluid under pressure selectively to said bellows.
  • An apparatus as defined in claim 4 wherein a plurality of sources of substance to be deposited are provided in said enclosure and said dome is mounted for rotation to selectively position said receptacles with respect to said sources.
  • each receptacle has a cranked lever, a cover and operating means associated individually therewith.
  • said operating means includes first and second bellows disposed on respective sides of a control piston connected by way of a piston rod to said other arm of said cranked lever, one end of each of said first and second bellows being secured to said dome and the other end thereof being secured to said piston, and means for supplying fluid under pressure selectively to said bellows.
  • said substrate protection device comprises a disk-shaped receptacle having a rim with an annular channel disposed in the periphery thereof, an O-ring disposed in said channel so as to protrude therefrom, a hole formed in the body of the receptacle having a fluid conveying duct connected thereto capable of connection to a source of vacuum, valve means for selectively closing said duct, means for supporting at least one substrate in said receptacle, said cover being capable of closing said receptacle by contact with said O-ring.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
US00317307A 1971-12-21 1972-12-21 Vacuum deposition apparatus Expired - Lifetime US3763821A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7146010A FR2164474B1 (fr) 1971-12-21 1971-12-21

Publications (1)

Publication Number Publication Date
US3763821A true US3763821A (en) 1973-10-09

Family

ID=9087817

Family Applications (1)

Application Number Title Priority Date Filing Date
US00317307A Expired - Lifetime US3763821A (en) 1971-12-21 1972-12-21 Vacuum deposition apparatus

Country Status (7)

Country Link
US (1) US3763821A (fr)
BE (1) BE792552A (fr)
DE (1) DE2261535A1 (fr)
FR (1) FR2164474B1 (fr)
GB (1) GB1366750A (fr)
IT (1) IT972585B (fr)
NL (1) NL7217316A (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6142097A (en) * 1998-01-20 2000-11-07 Nikon Corporation Optical membrane forming apparatus and optical device produced by the same
WO2005106072A3 (fr) * 2004-04-27 2006-06-01 Ardenne Anlagentech Gmbh Procede et dispositif pour le revetement thermique sous vide
US20070125303A1 (en) * 2005-12-02 2007-06-07 Ward Ruby High-throughput deposition system for oxide thin film growth by reactive coevaportation
US20150258561A1 (en) * 2014-03-11 2015-09-17 Nalux Co., Ltd. Deposition apparatus and tray holder
CN110878409A (zh) * 2018-09-05 2020-03-13 杭州纤纳光电科技有限公司 制备太阳能电池背电极的磁控溅射镀膜生产线及其方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2746420A (en) * 1951-11-05 1956-05-22 Steigerwald Karl Heinz Apparatus for evaporating and depositing a material
US3309221A (en) * 1963-03-25 1967-03-14 Minnesota Mining & Mfg Surface activation of passive polymers and articles produced thereby
US3694894A (en) * 1970-01-14 1972-10-03 Parker Hannifin Corp Method of inserting a seal in a face-cut groove

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2746420A (en) * 1951-11-05 1956-05-22 Steigerwald Karl Heinz Apparatus for evaporating and depositing a material
US3309221A (en) * 1963-03-25 1967-03-14 Minnesota Mining & Mfg Surface activation of passive polymers and articles produced thereby
US3694894A (en) * 1970-01-14 1972-10-03 Parker Hannifin Corp Method of inserting a seal in a face-cut groove

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6142097A (en) * 1998-01-20 2000-11-07 Nikon Corporation Optical membrane forming apparatus and optical device produced by the same
WO2005106072A3 (fr) * 2004-04-27 2006-06-01 Ardenne Anlagentech Gmbh Procede et dispositif pour le revetement thermique sous vide
US20070240636A1 (en) * 2004-04-27 2007-10-18 Von Ardenne Anlagentechnik Gmbh Thermal Vacuum Deposition Method and Device
CN1950535B (zh) * 2004-04-27 2010-05-26 冯·阿德纳设备有限公司 热真空沉积方法和装置
US20070125303A1 (en) * 2005-12-02 2007-06-07 Ward Ruby High-throughput deposition system for oxide thin film growth by reactive coevaportation
US9567661B2 (en) 2005-12-02 2017-02-14 Superconductor Technologies, Inc. Reactor device with removable deposition monitor
US20150258561A1 (en) * 2014-03-11 2015-09-17 Nalux Co., Ltd. Deposition apparatus and tray holder
US9861996B2 (en) * 2014-03-11 2018-01-09 Nalux Co., Ltd. Deposition apparatus and tray holder
CN110878409A (zh) * 2018-09-05 2020-03-13 杭州纤纳光电科技有限公司 制备太阳能电池背电极的磁控溅射镀膜生产线及其方法

Also Published As

Publication number Publication date
DE2261535A1 (de) 1973-06-28
BE792552A (fr) 1973-06-12
GB1366750A (en) 1974-09-11
FR2164474A1 (fr) 1973-08-03
NL7217316A (fr) 1973-06-25
FR2164474B1 (fr) 1974-08-23
IT972585B (it) 1974-05-31

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