US3778272A - Photographic transfer materials - Google Patents

Photographic transfer materials Download PDF

Info

Publication number
US3778272A
US3778272A US00172254A US3778272DA US3778272A US 3778272 A US3778272 A US 3778272A US 00172254 A US00172254 A US 00172254A US 3778272D A US3778272D A US 3778272DA US 3778272 A US3778272 A US 3778272A
Authority
US
United States
Prior art keywords
transfer material
defined according
photographic transfer
layer
polyamide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US00172254A
Other languages
English (en)
Inventor
M Hepher
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Norprint Ltd
Original Assignee
Norprint Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Norprint Ltd filed Critical Norprint Ltd
Application granted granted Critical
Publication of US3778272A publication Critical patent/US3778272A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Definitions

  • This invention relates to photographic resist transfer materials of the kind incorporating adhesive substratum layers, which are used in order to transfer the photosensitive layer from the transfer layer to another surface, either prior to or after formation of an image.
  • Such a transfer material consists for example of a sheet of film support coated with a thin substratum of rubber, on top of which there is a photosensitive colloid layer.
  • the material is exposed to light through a master positive transparency in contact with the film support side of the transfer material and it is then processed to form a negative stencil image in the photosensitive colloid layer.
  • the negative stencil image is held by the substratum layer, which itself remains adhered to the film support. While the colloid layer incorporating the stencil image is still wet, it is pressed against a stretched fabric such as nylon or silk or metal gauze and then allowed to dry and thus harden.
  • the primary film support is then stripped away, leaving the hardened colloid stencil adhering to the screen fabric, thus providing a printing screen from which multiple prints can be taken.
  • the primary film support is removed from the dried stencil, it usually carries with it a layer of substratum in the open areas of the stencil, while in the solid areas the substratum remains on the stencil.
  • a photographic transfer material consisting of a primary support and an imageforming photosensitive layer comprising a watersolublecolloid or polymer is provided, having an intermediate substratum layer which comprises a polyamide which is soluble in a mixture of an alcohol and water.
  • Suitable substratum layers are, for example, those based on polyamides which have first been methylolated and then etherified. These are commonly obtained by treatment of a linear polyamide with formaldehyde and alcohols.
  • the soluble polyamide substratum layer In order to obtain good wet adhesion of the photosensitive colloid or polymer layer during the processing of the relief or stencil image, the soluble polyamide substratum layer must be sufficiently hydrophilic in character. This property is indicated by the preferential solubility of the polyamide in a solvent-mixture which contains water, together with an organic solvent. This does not mean that the preferred polyamide is only soluble in a solvent mixture containing water, but at the same time in order for a polyamide to be suitable it should show distinctly good solubility in a solvent system in which water is present. Soluble polyamide resins which are inherently hydrophobic in nature will tolerate very little water in the coating solvent and such polymers used alone are not suitable for the invention.
  • the relief or stencil-forming photosensitive layer is preferably one based on a water-soluble colloid for polymeric material, for instance, gelatine, polyvinyl alcohol, hydroxyethyl cellulose, polyacrylamide or polyvinyl pyrrolidone.
  • the photosensitive system can be such that, after imagewise exposure and suitable processing, an insoluble crosslinked image is retained on the support, while the non-image areas are removed by washing in a suitable solvent or solvent mixture, usually water.
  • One well-known photosensitive system is that consisting of a water-soluble colloid sensitized with a dichromate salt. Exposure to short wavelength light causes the colloid to be, insolubilized, the unexposed areas then being removed by washing.
  • a dichromate sensitizer it is possible to use ferric salts coupled with a peroxide free-radical-producing agent, e. g., as described in British Pat. Specifications Nos. 665649 and 88381 1.
  • Other photo-crosslinking sensitizers wellknown in the art which can be used are the diazo resins and aromatic azides.
  • the polyamide substratum of the present invention is particularly suitable to use with the photo-polymerization process described in U. S. Pat. application Ser. No. 117138 filed on 19th Feb. 1971 in the joint names of I myself and John Arthur Sperry.
  • This process employs a water-soluble colloid as a carrier for an unsaturated monomeric compound.
  • Photo-polymerization of the monomer is effected by the aid of leuco sulphuric esters of indigo and thioindigo dyes and the carrier layer is thereby insolubilized by imagewise exposure to light.
  • Yet another well-known photo relief system which can be employed with the polyamide substratum is that based on a silver halide gelatine emulsion in which a tanning developer is used to insolubilize the gelatine surrounding the exposed silver halide.
  • the supports on which are applied the polyamide substratum, together with the photosensitive layer are sheet materials which are flexible and transparent, such as plastics foils or films of cellulose esters, polyesters or copolymers of polyvinyl chloride and acetate.
  • Such transparent films allow image-wise exposure to be effected through the support side of the photographic material.
  • the photosensitive layer is of limited thickness, for example not more than microns and preferably between 3 and 10 microns, it is possible to use opaque supports such as metal or paper and expose the material from the top side.
  • transfer materials based on polyamide-subbed film supports according to this invention are particularly useful for the production of screen printing stencils, they can also be employed, in modified form if necessary, for the production of images which can optiionally be transferred to supports other than screen fabrics, e.g., paper or metal surfaces, to serve as either etching resists or visible indicia or for other purposes.
  • supports other than screen fabrics e.g., paper or metal surfaces
  • etching resists or visible indicia or for other purposes e.g., paper or metal surfaces
  • the transfer materials can, if so desired, alternatively be employed for the production of images in which the photosensitive layer is not transferred from the primary support. While the polyamide substratum provides an anchor layer which allows subsequent release of the photosensitive layer, the adhesion of the layer to the primary support is sometimes sufficient for certain applications where the image is required on the original support.
  • EXAMPLE 1 A sheet of polyester film, e.g. the du Pont product known as Mylar" (Trademark), was coated with the following solution:
  • the photosensitive layer was coated to give a dry weight of approximately g/sq.m.
  • the resultant film was exposed with the support side in contact with a line positive for 4 minutes at 2ft from two l-watt mercury vapour lamps.
  • the gelatine coating was treated in a hardening solu' tion, consisting of 2-volume" hydrogen peroxide.
  • the film was then washed in warm water to remove the unexposed areas of gelatine, while the stencil of hardened gelatine was retained firmly adhering to the substrated film.
  • the stencil wa then pressed into contact with a stretched nylon fabric and allowed to dry. When dried, the primary support film was stripped away, leaving the gelatine stencil firmly adhering to the nylon fabric, thus providing a master for screen printing.
  • the substratum layer consisted of the following solution:
  • Ultramid IC is an alcohol-soluble polyamide supplied by Badische Anilin & Soda Fabrik AG.
  • Elvamide 8063 is a soluble polyamide supplied by du Pont (UK) Ltd Anthrasol is the Registered Trademark of Farbwerke Hoechst AG.
  • An elementuseful as a photographic transfer material which comprises in combination a primary support and an image-forming photosensitive layer composed of a water-soluble colloid or polymer, and an intermediate substratum layer composed of a linear methylolated and etherified polyamide which is soluble in a mixture of an alcohol and water.
  • methylolated polyamide ether is one obtained by treating a linear polyamide with formaldehyde and an alcohol.
  • watersoluble colloid or polymer is a member selected from the class consisting of gelatine, polyvinyl alcohol, bydroxyethyl cellulose, polyacrylamide and polyvinyl pyrrolidone.
  • photosensitive layer is a water soluble colloid or polymer which forms an insoluble cross-linked image upon exposure, characterized by solvent-removable non-image areas.
  • the intermediate substratum layer consists essentially of 1 part by weight of the polyamide which is soluble in water and alcohol is a methoxy methylated nylon polymer, 60 parts by weight of methylene chloride, and 40 parts by weight of methanol.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
US00172254A 1970-08-17 1971-08-16 Photographic transfer materials Expired - Lifetime US3778272A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB3949370A GB1366304A (en) 1970-08-17 1970-08-17 Photographic resist transfer materials

Publications (1)

Publication Number Publication Date
US3778272A true US3778272A (en) 1973-12-11

Family

ID=10409846

Family Applications (1)

Application Number Title Priority Date Filing Date
US00172254A Expired - Lifetime US3778272A (en) 1970-08-17 1971-08-16 Photographic transfer materials

Country Status (3)

Country Link
US (1) US3778272A (fr)
BE (1) BE771420A (fr)
GB (1) GB1366304A (fr)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4123277A (en) * 1973-08-21 1978-10-31 Fuji Photo Film Co., Ltd. Copolymer subbing material for photographic elements
US4226927A (en) * 1978-05-10 1980-10-07 Minnesota Mining And Manufacturing Company Photographic speed transfer element with oxidized polyethylene stripping layer
US4268601A (en) * 1977-07-15 1981-05-19 Fuji Photo Film Co., Ltd. Photosensitive image forming material and an image forming method using same
US4307172A (en) * 1979-05-11 1981-12-22 Daicel Chemical Industries, Ltd. Imaging light-sensitive material with etchable opaque polyamide underlayer and light-sensitive resist overlayer
US4853316A (en) * 1987-11-18 1989-08-01 Minnesota Mining And Manufacturing Company Subbed supports for imaging materials
US5529879A (en) * 1992-09-25 1996-06-25 Nippon Paper Industries Co., Ltd. Photosensitive sheet comprising a substrate having a molecular orientation ratio in the range of from 1.0 to 1.4
US5989771A (en) * 1995-06-27 1999-11-23 Kimoto Co., Ltd. Ink jet recording materials
US20040202960A1 (en) * 2001-09-14 2004-10-14 Fine Arts Group Llc. Methods and materials for producing an image, and articles comprising materials for producing an image
US20100175555A1 (en) * 2008-09-12 2010-07-15 Ismael Ferrer Polyamide Fine Fibers
US20100178507A1 (en) * 2000-09-05 2010-07-15 Ismael Ferrer Polyamide Fine Fibers

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO157971C (no) * 1977-09-12 1988-06-22 Standex Int Corp Fremgangsmaate for frembringelse av relieffmoenstre paa arbeidsoverflater.
US4602097A (en) * 1984-06-11 1986-07-22 Ulano Corporation Water soluble photoinitiator benzophenone and thioxanthenone ethoxy-ether derivatives

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2710820A (en) * 1952-09-18 1955-06-14 Eastman Kodak Co Formation of laminates using contact resins
US3210187A (en) * 1960-04-28 1965-10-05 Du Pont Photopolymerizable elements and processes
US3314793A (en) * 1962-12-27 1967-04-18 Eastman Kodak Co Non-diffusing inhibitors of formaldehyde hardening

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2710820A (en) * 1952-09-18 1955-06-14 Eastman Kodak Co Formation of laminates using contact resins
US3210187A (en) * 1960-04-28 1965-10-05 Du Pont Photopolymerizable elements and processes
US3314793A (en) * 1962-12-27 1967-04-18 Eastman Kodak Co Non-diffusing inhibitors of formaldehyde hardening

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4123277A (en) * 1973-08-21 1978-10-31 Fuji Photo Film Co., Ltd. Copolymer subbing material for photographic elements
US4268601A (en) * 1977-07-15 1981-05-19 Fuji Photo Film Co., Ltd. Photosensitive image forming material and an image forming method using same
US4226927A (en) * 1978-05-10 1980-10-07 Minnesota Mining And Manufacturing Company Photographic speed transfer element with oxidized polyethylene stripping layer
US4307172A (en) * 1979-05-11 1981-12-22 Daicel Chemical Industries, Ltd. Imaging light-sensitive material with etchable opaque polyamide underlayer and light-sensitive resist overlayer
US4853316A (en) * 1987-11-18 1989-08-01 Minnesota Mining And Manufacturing Company Subbed supports for imaging materials
US5529879A (en) * 1992-09-25 1996-06-25 Nippon Paper Industries Co., Ltd. Photosensitive sheet comprising a substrate having a molecular orientation ratio in the range of from 1.0 to 1.4
US5989771A (en) * 1995-06-27 1999-11-23 Kimoto Co., Ltd. Ink jet recording materials
US20100178507A1 (en) * 2000-09-05 2010-07-15 Ismael Ferrer Polyamide Fine Fibers
US20040202960A1 (en) * 2001-09-14 2004-10-14 Fine Arts Group Llc. Methods and materials for producing an image, and articles comprising materials for producing an image
US20100175555A1 (en) * 2008-09-12 2010-07-15 Ismael Ferrer Polyamide Fine Fibers

Also Published As

Publication number Publication date
BE771420A (fr) 1972-02-17
GB1366304A (en) 1974-09-11

Similar Documents

Publication Publication Date Title
US4193797A (en) Method for making photoresists
US4126466A (en) Composite, mask-forming, photohardenable elements
US2687958A (en) Light-sensitive layers for the printing industry
US3567445A (en) Presensitized lithographic plate with two differentially spectrally sensitized layers separated by a novolak resin
US4530896A (en) Photosensitive laminate
US3778272A (en) Photographic transfer materials
US3622320A (en) Thermographic processes and elements utilizing photocrosslinkable polyesters
US3173787A (en) Photosensitive element comprising a hydrophobic support, a hydrophilic layer thereonand a light-sensitive resin overcoat layer and photomechanical processes therewith
US4264708A (en) Radiation sensitive element having a thin photopolymerizable layer
JPS6020735B2 (ja) 剥離現像可能な感光材料を用いる画像形成方法
US4389473A (en) Production of transfer material
US3236647A (en) Photographic reproduction process using photopolymerizable resins and new images obtained
US3770435A (en) Production of gravure printing plates based on plastics materials
US2772160A (en) Light-detached resists or reliefs for printing plates
US2729562A (en) Process for producing images
US3467518A (en) Photochemical cross-linking of polymers
US3726677A (en) Photopolymerisation with leuco indigo dye derivatives
US3466172A (en) Method of using photographic vesicular and diazo films having diazo antihalation layers
US4226927A (en) Photographic speed transfer element with oxidized polyethylene stripping layer
US2943936A (en) Cartographic material
US3676128A (en) Complex film for obtaining silk screen stencils
US4388399A (en) Light-sensitive image-forming material
US3736138A (en) Process for transferring images from a surface to a temporary surface and to a final surface
US3682635A (en) Manufacture of coloured colloid patterns
US4296193A (en) Photosensitive positive diazo material with copolymer of acrylamide and diacetoneacrylamide and a process for developing to form color relief image