US3795446A - Lithography - Google Patents

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Publication number
US3795446A
US3795446A US00171286A US3795446DA US3795446A US 3795446 A US3795446 A US 3795446A US 00171286 A US00171286 A US 00171286A US 3795446D A US3795446D A US 3795446DA US 3795446 A US3795446 A US 3795446A
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Prior art keywords
prism
substrate
light
source
mask
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US00171286A
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English (en)
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J Houston
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Rank Organization Ltd
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Rank Organization Ltd
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Priority claimed from GB3880970A external-priority patent/GB1353739A/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

Definitions

  • This invention is concerned with shadow or contact printing as employed, for example in the photoetching of substrates.
  • An extended source of printing radiation either in theform of an effectively annular fixed source or an orbiting source, is used to illuminate the mask under conditions of transitionalfresnel- Fraunhofer diffraction, the effective illumination condition of the mask duringan exposure causing diffrac' tion patterns which tend to cancel each other, producing a sharply defined shadow of the mask.
  • SHEET 3 [IF 7 PATENTEI] R 5 SHEET 7 OF 7 1 LITHOGRAPHY
  • This invention -relates to micro-circuit printing techniques, and in particular to the so called shadow and contact" methods of printing micro-circuit components photolithographically on to prepared substrates, usually of semi-conductor material.
  • a mask having a pattern of image-forming surfaces is located in the path of the printing radiation incident on a photosensitive surface formed on the substrate. It is'important that the imprinted image be a well-defined and geometrically accurate reproduction of the image-forming surface of the mask, that is, that a sharply defined shadow of these surfaces be formed on the substrate surface.
  • the mask In the contact printing method the mask is placed directly on the substrate to be printed, while in the shadow printing or out-ofcontact printing method the mask is arranged close to but spaced from the substrate.
  • literal contact is not in practice made between the illuminated image-forming surface of the mask and the underlying substrate, so that both methods may be regarded as shadow printing methods in effect.
  • a problem which militates against the formation of a clearly defined image on the substrate, which is necessary for accurate circuit printing, is that of diffraction at the edges of the mask features.
  • the effect of the diffraction pattern produced on the substrate in the region of the shadow image of the mask can be reduced to some extent by control of the exposure of the treated substrate to the printing radiation. However, it is not possible by regulasome diffraction effects.
  • the present invention in one aspect accordingly provides illumination means for use in shadow or contact printing, comprising a source of finite predetermined area having an effective brightness distribution afford:
  • the invention represents a significant departure from conventional illumination means for shadow printing, in which stress has been laid upon the requirement for accurately collimating the printing radiation beam to a condition of minimal non-divergence: in the present invention the illuminating radiation provided by the source comprises a set of diverging waves.
  • the source may comprise in combination a single point source and a fixed multiple prism comprising a number of prism elements arranged in an annular array such that light from the point source passes through thesaid prism elements to provide the same number of component beams, and a collimator through which said component beams pass to produce the said effective illumination condition in a printing plane.
  • the prism conveniently may comprise a number of identical adjacent prism elements of sector shape, each prism element tapering a thickness from a maximum at its vertex to a minimum at its outer edge.
  • the outer edges of the prism elements may lie on a common circle.
  • Each prism element is preferably truncated at its vertex so that the multiple prism has a central portion with plane parallel outer faces.
  • each prism element is preferably both inclined to the radial plane of the multiple prism. These outer faces are preferably coated for opti mum transmission in a specific band of wavelengths.
  • the multiple prism is preferably formed in two parts
  • each ground to provide respective'parts of the prism elements, and each having a plane radial face, the two parts being cemented together back-to-back at said plane faces with the parts of the prism elements in register with each other.
  • the prism comprises six or more identical prism elements.
  • said brightness distribution being such that when a mask is illuminated by the source under conditions of transitional Fresnel-Fraunhofer diffraction as herein defined, the effective illumination condition produced by the light incident on any given part of the mask from different parts of the source produces diffraction patterns which tend to cancel each other over part of said patterns.
  • tion is defined for the purpose of this specification as that typein diffraction which is observable at a distance from a coherently illuminated line or slit of the same order as the line or slit width. Under these conditions the Fresnel fringes observable on a screen located at said distance and parallel to the line or slit overlap the boundaries of the geometrical image of the line or slit on the screen.
  • the illumination means comprise a' single point source and a fixed composite reflector havinga number of reflector elements arranged in an annular array such that light from the-point source forms, by reflection in said reflector elements, the same number of component beams, and a collimator through which said component beams pass to produce the said illumination condition in a printing plane.
  • the said reflector elements are arranged so that they form virtual'imagesof the said point'of light source in a common plane containing said point source.
  • a stop may be arranged centrally of the annular array reflector elements to prevent the direct passage of light through said array without reflection by the reflector elements.
  • the component beams emerging from the multiple prism or from the composite reflector as the case may be are preferably deflected through substantially by a reflecting element before passing through the collimator.
  • the source may be moved orbitally around a circular path to provide an annular effcctive brightness distribution over the period of the cx posure.
  • the source provides a collimated light beam which is caused to scan a conical or cylindrical surface cyclically by rotation of a reflecting or refracting element mounted in the path of the said collimated light beam.
  • the rotatable element may comprise a rotatable wedge prism mounted in the path of said light beam between the source and a collimator, the resulting collimated beam performing a conical scan upon rotation of the wedge prism.
  • the rotatable wedge prism may be mounted in the path of the said light beam with a collimator interposed between the prism and the source, so that the collimated ,beam upon emerging from the prism performs a conical scan upon rotation of the prism.
  • the rotatable element comprises a plane mirror mounted for rotation about an axis which is inclined to the normal to the reflecting surface of the mirror, the mirror being positioned in the said light path between the light source and a collimator, so that the resulting collimated beam performs a conical scan upon rotation and more generally in other contexts where some degree of compensation for Fresnel-Fraunhofer diffrac tion is required.
  • the invention also provides according to another aspect a method of shadow printing in which radiation from an extended source is directed through a shadowmask on to a radiation-sensitive substrate tobe pr'inted,
  • the source illuminates any point on the mask with radiation which lies between two cones having a common apexat said point and a common axis normal to the plane of the maskh
  • FIG. 1 shows an elementary shadow printing arrangement, illustrating diagrammatically the Fresnel diffraction of a spherical wavefront impinging upon a rectangular aperture in a mask;
  • FIG. 2 is a diagrammatic representation of the resulting diffraction pattern produced upon s substrate spaced a distance of 12 microns from a slit in the mask of FIG. 1 having a width of 3 microns, together with the diffraction pattern produced by illuminating means in accordance with the invention;
  • FIGS. 3 to 6 are diagrams illustrating the optical arrangement of different embodimentsof illumination means in accordance with the invention utilising rotary optical elements to produce diffraction compensation in shadow printing;
  • FIG. 7 is an explanatory diagrammatic perspective view illustrating illumination means according to one embodiment of the invention utilising fixed optical elements
  • FIG. 8 is a diagrammatic side elevation of the illumination means shown in FIG. 7, illustrating typical ray paths; 1
  • FIG. 9 is a diagrammatic side elevation of illumina- 1 ment comprising a point source 1, an apertured mask the effective brightness distribution of the source affording a central dark area surrounded by a bright zone, and the mask and substrate being centrally positioned relative to said dark area, so that fringes produced 'on the substrate by transitional Fresnel- Fraunhofer diffraction, as herein defined, of light inci- I dent on anygiven part of the mask from different parts of the source substantially cancel each other over a part of the substrate area.
  • the source which preferably comprises illumination means as previously defined, emits radiation having a wavelength of substantially 0.4 microns, the mask being spaced from the substrate by substantially 9 microns.
  • the range of the shadow diffraction pattern imaged on the substrate which is effectively smoothed that is, compensated for defraction fringes extends over a range of 3 to 6 microns on the substrate.
  • the source is preferably arranged so that its effective brightness distribution is annular, for example, in the form of a square annulus or, preferably, a circular annulus.
  • the source has a circular annular form, or the source or its radiation is scanned over an annular path
  • FIG. 1 shows a spherical wavefront 4 originating from the point source I arriving at a rectangularslit in the mask 2.
  • the amplitude components of the diffraction pattern observable at a point' having coordinates x, y on the substrate 3 can be dedueedfrom distances s in the plane of the mask measured along the Cornu Spiral or vibration curve.
  • the components are represented by: 1
  • the diffraction pattern size is therefore proportional to the square root of the wavelength A.
  • the photosensitive resist deposited on the substrate 3 is sensitive to the three closely spaced wavelengths of the mercury spectrum, mnamely 365mm, 405nm and 436nm.
  • m the three closely spaced wavelengths of the mercury spectrum
  • the diffraction produced is proportional to the square root of the wavelength, it is a justifiable approximation in practice to prepresent these three wavelengths by a single wavelength, in this case 400nm.
  • FIG. 2 shows, not to scale, the diffraction pattern produced on a substrate 3 spaced 12 microns from the mask 2 from a slit 3 microns wide.
  • the intensity distribution in the diffraction pattern produced on the substrate 4 is effectively controlled by a' suitable choice of the source geometry, departing from the point source shown in FIG. 1.
  • a source 1 of annular configuration For example, it has been found that substantial smoothing of the diffraction pattern over a certain range of the pattern on the substrate can be achieved by employing a source 1 of annular configuration.
  • an optimum source geometry is an annular source, or a source producing a beam which scans a conical path, such that radiation is incident on any given point on the mask 2 along rays which form the generators of a family of cones the common apex of which lies at the said point and the common axis of which is perpendicular to the mask, the family of cones having half-angles between 341 and 4%".
  • FIG. 2 the typical diffraction pattern obtained on the substrate 3 using the point source 1 shown in FIG. 1, has superimposed on it, a corrected diffraction pat tern, shown in broken outline, using illumination means in accordance with the invention-of effectively annular brightness distribution produced by an orbiting source moving in a circular orbit of 0. I44 radian diameter, the mask-substrate separation in this case being 12 microns.
  • FIGS. 3 to 6 illustrate different practical arrangements for providing the requisite illumination for shadow printing in accordance with the invention, utilising rotary optical elements.
  • light from the source 1 is directed by an inclined mirror 5 through a rotatable wedge prism 6 in a direction perpendicular to one of. the faces of the prism, and thence through a collimating lens assembly 7 onto the mask-substrate combination 2, 3 to be illuminated.
  • the prism 6 is driven at a constant rotational speed by means of an electric motor 8 coupled to the prism housing through a belt drive 9, the axis of rotation of the prism 6 being coincident with the optical axis of the collimating lens assembly 7.
  • the rotation of the prism 6 at constant rotational speed during exposure of the substrate 3 through the mask 2 causes the collimated beam produced by the lens assembly 7 to perform a conical scan of the printing area, which is so arranged that the mask-substrate assembly 2, 3 is illuminated by an effectively annular source of kind previously specified.
  • FIG. 4 illustrates an alternative arrangement, similar to that of FIG. 3, in which the wedge prism 6 is mounted in a rotatable housing in the path of the collimated beam emerging from the collimating lens assembly 7.
  • a rotational mirror 10 is used to provide the conical scanning of the collimated light.
  • the mirror 10 is arranged for rotation about an axis which is inclined to the normal to the reflecting surface of the mirror,'so that light reflected by the mirror undergoes a conical scanning movement, the mirror being rotated at a constant speed about the aforesaid axis.
  • Light is directed onto the mirror 10 from the source 1 by means of a combination of lenses 11a and 11b and ah internally reflecting pentaprism' 12.
  • the light from the source is collimated by lens 11a for passage through a pentaprism 12 and re-focussed by lens 11b to an image before passing to the rotating mirror 10 from a wide field of acceptance of light emitted by the source 1.
  • the scanning light beam passes through the collimator 7 and thence onto the mask-substrate combination 2, 3.
  • FIG. 6 illustrates a yet further arrangement whereby the light emitted by the source 1 is directed by a means of a collecting lens assembly14 into a 'rhomb prism 15 which is located in a housing and rotated about an offset axis X-X perpendicular to the plane parallel entry and exit faces of the. prism 15.
  • the emergent light is directed by a mirror 16 into the collimator 7 and thence onto the mask-substrate combination 2, 3, to produce on the latter a scanning conical beam as aforesaid.
  • FIGS. 7 and 8 illustrate embodiments of the invention utilising fixed optical elements.
  • Theprinting radiation is derived from a single source 1, in this case a substantially point source, which is arranged, by means of the optical systemto be described, to illuminate a prepared substrate 3 having a photosensitive surface with radiation in a predetermined pattern.
  • the substrate 3 is disposed in a printing plane P (FIG. 8) and a mask 2 having a predetermined aperture pattern therein, shown in broken outline in FIG. 8, is positioned in front of the substrate '3.
  • a mask 2 having a predetermined aperture pattern therein, shown in broken outline in FIG. 8, is positioned in front of the substrate '3.
  • the mask 2 is spaced from the substrate 3 by a distance determined by analysis of typical image intensity distrimicron.
  • Effective cancellation of diffraction fringes in the printing plane P is obtained by illuminating the printing plane P with radiation emanating from a source with effective annular brightness distribution comprising a central dark area surrounded by a bright zone.
  • This effective brightness distribution is achieved with a fixed optical system comprising, in FIGS. 7 and 8, a multiple prism and a collimator indicated diagrammatically at 21.
  • the collimator 21 may comprise a single lens or a group of lenses, as known per se.
  • the source l is positioned on the' axis of symmetry of the prism 20, this axis being disposed horizontally, and the axis of the collimator 21 is arranged vertically, light being deflected from the prism 20 downwardly into the collimator 21 by a plane mirror 22 inclined at 45 to the horizontal.
  • the multiple prism 20 comprises a number of identi-' cal prism elements 23 spaced apart at equal angular intervals in an annular array.
  • the multiple prism 20 is made up of six prism elements
  • the multiple prism 20 has a circular outer edge, and each prism element 23 is sector shaped, its outer edge the prism elements 23, wouldbe coated for best transmission in the wavelength range O.36-O.44 micron.
  • the optical system herein described produces six collimatecl beams. Accordingly the illumination intensity afforded by this technique is substantially greater than that which is possible using a single orbiting source or light beam, and the same collimating len'ses.
  • Each mirror is inclined at an equal forming part of the circular outer edge of the prism 20.
  • Each prism element 23 tapers from a maximum thickness at its vertex to each prism element 23 being inclined to the radialplane'of the multiple prism 20, that is, the plane normal to the axis of symmetry of the prism 20.
  • the face 24 of each prism element 23 which faces towards the source l hasan inclination of 7879 to the axis of symmetry of the prism 20, while the opposite face, 25, of each prism element 23 is inclined, in the opposite direction, at an angle of substantially 63 -64 to the said axis of symmetry.
  • Each sector shaped prism element 23 is truncated at its vertex so that themultiple prism 20 has a central portion 26, with plane parallel outer faces, the central portion 26 being in'this case in the form of a hexagonal parallelipiped.
  • the respective prism elements 23 are conveniently formed in practice by grinding respective facets on two circular discs to form the respective faces 24, thereon. The two discs are then cemented together along their plane faces so that the surfaces 24, 25 face outwardly and are angularly aligned to form thereSpective prism element 23.
  • the radiation emitted by the source 1 and impinging on the multiple prism 20 is divided by the prism 20 into a number of component beams equal in number to the number of prism elements 23.
  • two of the prism elements 23, diametrically opposite each other, are shown, with associated rays passing therethrough.
  • the respective beams are reflected downwardly as divergent beams defining respective virtual images of the source 1, two of which 1, 1", are shown inFlG. 2.
  • These beams are brought together in the printing plane P by the collimator 21, as shown diagrammatically in FIG. 8.
  • the relative divergence of the collimated beams at the printing plane P is typically 0.14 radian.
  • the beams incident on the printing plane P have an effective intensity distribution such as to produce in the printing plane P an illuminating condition comprising a central dark zone surrounded by a number of (in this example six) bright zones distributed regularly in an annular pattern around the dark zone.
  • This approximates composite reflector 30 are deflected by theplane mirror 22, inclined at 45 to the axis 32, into the collimator 21 to form the desired distribution of illumination in the printing plane P, as previously described with refer- 7 time to FIGS. 7 and 8.
  • a light source assembly of finite predetermined area having an effective brightness distribution incorporating a dark central region surrounded by a bright V rim and producing substantially coherent light at a selected wavelength, 7 I i i a shadow mask bearing said pattern to be imaged on said substrate,
  • 1 means supporting said mask at a selected position between said substrate and said light source assembly in the path of the light therefrom, said selected position lying at a distance from said substrate of the 1 same order as the width of said transparent portions of said mask, whereby diffraction of light passing through said transparent regions in said mask results in diffraction fringes which substantially cancel each other out at least adjacent the edges of the pattern determined by said transparent regions, so that a sharp image of said shadow mask is obtained on said substrate when illuminated by said source assembly.
  • Illumination means' accordingingto claim 1, in .which said source assembly has an annular shape.
  • the source assembly comprises a source and means effecting orbital movement of said source around a circular path to provide an annular effective brightness distribution over the period of an exposure.
  • Illumination means in which the source assembly comprises a source providing a collimated light beam and means scanning said beam over a conical or cylindrical surface cyclically.
  • Illumination means in which said scanning means comprises a reflecting element mounted for rotation in the path of said collimated light beam, and means rotating said element to effect scanning of said beam.
  • Illumination means in which said scanning means comprises a refracting element mounted for rotation in the path of said collimated light beam, and means rotating said element to effect scanning of said beam.
  • the rotatable refracting element comprises a rotatable wedge prism mounted in the path of said light beam from said source, and a collimator through which said beam passes after traversing said prism, the resulting collimated beam performing a conical scan upon rotation of the wedge prism.
  • Illumination means in which the rotatable refracting element comprises a rotatable wedge prism mounted in the path of the said beam, and including a collimator interposed between the prism and the source, so that the collimated beam upon emerging from the prism performs a conical scan upon rotation of the prism.
  • Y n l 10.
  • Illumination means according to claim 7, in which the rotatable refracting element comprises a rhomb prism mounted for rotation about an axis perpendicular to two plane parallel faces through which said light beam passes.
  • Illumination means in which the source comprises in combination a single point source and a fixed multiple prism comprising a number of prism elements arranged in an annular array such that light from the point source passes through the said prism elements to provide the same number of component beams.
  • Illumination means including a collimator through which said component. beams pass to produce the said effective illumination condition in a printing plane.
  • Illumination means including a collimator through which said component beams pass to produce the same illumination condition in a printing plane.
  • a method according to claim 15 in-which the me a half-angle of the family of cones contained in the said envelope lies within the range 1 /2" to 5".
  • Illumination means in which the source comprises a single'point source and a fixed composite reflector having a number of reflector elements arranged in an annular array such that light from the point source forms, by reflection in said reflector elements, the same number of component beams.
  • Apparatus for illuminating a substrate with a pattern determined by a shadow mask having transparent regions and opaque regions collectively defining a patterm to be illuminated on said substrate comprising:
  • a fixed composite optical arrangement having a plurality of optical elements in an annular array inclined such that light from said point source impinges on said optical elements and is formed thereby into a plurality of component beams in a corresponding annular array
  • collimating lens means in the path of said plurality of component beams, a shadow mask having transparent regions and opaque regions collectively defining said pattern t be imaged on said substrate, and y means supporting said mask at a selected position between said substrate and said light source assembly -in the path of the light therefrom, said selected po sition lying at a distance from said substrate of the same order as the width of said transparent portions of said mask, whereby diffraction of light passing through said transparent regions in said mask results in diffraction fringes which substantially cancel each other out at least adjacent the edges of the pattern determined by said transparent regions, so that a sharp image of said shadow mask is obtained on said substrate when illuminated by said source assembly.
  • Illumination means in which said optical arrangement comprises a fixed multiple prism comprising a number of prism elements arranged in an annular array, light from said point source passing throughvthe said prism elements to provide the same number of component beams.
  • Illumination means according to claim 20 in which each prism element is truncated at its vertex, said multiple prism having a central portion with plane parallel outer faces.
  • Illumination means in which the multiple prism comprises two parts, each ground to provide respective parts of said prism elements, and each having a plane radial face, said two parts being cemented together back-to-back at said plane faces with the parts of the prism elements in register with each other.
  • Illumination means according to claim 18, in which said optical elements are reflectors and are so arranged that they form virtual images of the said point light source in a common plane containing said point source.
  • Illumination means including a stop arranged centrally of the annular array of reflector elements, preventing the direct passage of light through said array without reflection by the reflector:
  • Illumination means including a fixed reflector between said array of optical elements and said collimator, the component beams emerging from said composite optical arrangement being deflected through substantially 90 by said fixed reflector before passing through said collimator.
  • a method of shadow printing a pattern from a shadow mask onto a radiation sensitive substrate comprising the steps of:

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
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US00171286A 1970-08-12 1971-08-12 Lithography Expired - Lifetime US3795446A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB3880970A GB1353739A (en) 1970-08-12 1970-08-12 Light exposure means for shadow or contact printing
GB728871 1971-03-19

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US3795446A true US3795446A (en) 1974-03-05

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JP (1) JPS5143750B1 (2)
FR (1) FR2104273A5 (2)
IT (1) IT939738B (2)
NL (1) NL7111033A (2)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4683524A (en) * 1984-04-13 1987-07-28 Canon Kabushiki Kaisha Illumination apparatus
EP0526242A1 (en) * 1991-08-02 1993-02-03 Canon Kabushiki Kaisha Image projection method and semiconductor device manufacturing method using the same
EP0564264A1 (en) * 1992-03-31 1993-10-06 Canon Kabushiki Kaisha Illumination device for projection exposure apparatus
US5574492A (en) * 1992-03-27 1996-11-12 Canon Kabushiki Kaisha Imaging method and semiconductor device manufacturing method using the same
US5579240A (en) * 1992-05-26 1996-11-26 Dicon A/S Method and an apparatus for illuminating points on a medium
US5587834A (en) * 1992-01-31 1996-12-24 Canon Kabushiki Kaisha Semiconductor device manufacturing method and projection exposure apparatus using the same
US5715089A (en) * 1991-09-06 1998-02-03 Nikon Corporation Exposure method and apparatus therefor
WO2001014930A1 (en) * 1999-08-26 2001-03-01 Macdermid Graphic Arts, Inc. Methods for enhancing images on relief image printing plates

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2439208A1 (de) * 1974-08-16 1976-03-11 Ibm Deutschland Belichtungsvorrichtung
FR2356975A1 (fr) * 1976-06-30 1978-01-27 Ibm Procede d'impression photolithographique du type a contact permettant d'obtenir des profils a resolution elevee et appareil utilisant un tel procede
EP0500456B1 (en) * 1991-02-19 1998-05-06 Fujitsu Limited Projection exposure method and an optical mask for use in projection exposure

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3548713A (en) * 1967-10-10 1970-12-22 Gerber Scientific Instr Co Photo-exposure device using annular light beam
US3559546A (en) * 1967-11-01 1971-02-02 Sylvania Electric Prod Cathode ray tube screen exposure
US3582208A (en) * 1967-06-01 1971-06-01 Lester E Idler Method and means for producing multidensity tint screens
US3601018A (en) * 1968-08-26 1971-08-24 Zenith Radio Corp Method and apparatus for exposing curved substrates
US3610752A (en) * 1970-01-15 1971-10-05 Atomic Energy Commission Preparing printed circuit boards by refracted rays
US3615449A (en) * 1969-09-25 1971-10-26 Rca Corp Method of generating high area-density periodic arrays by diffraction imaging

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3582208A (en) * 1967-06-01 1971-06-01 Lester E Idler Method and means for producing multidensity tint screens
US3548713A (en) * 1967-10-10 1970-12-22 Gerber Scientific Instr Co Photo-exposure device using annular light beam
US3559546A (en) * 1967-11-01 1971-02-02 Sylvania Electric Prod Cathode ray tube screen exposure
US3601018A (en) * 1968-08-26 1971-08-24 Zenith Radio Corp Method and apparatus for exposing curved substrates
US3615449A (en) * 1969-09-25 1971-10-26 Rca Corp Method of generating high area-density periodic arrays by diffraction imaging
US3610752A (en) * 1970-01-15 1971-10-05 Atomic Energy Commission Preparing printed circuit boards by refracted rays

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4683524A (en) * 1984-04-13 1987-07-28 Canon Kabushiki Kaisha Illumination apparatus
US5631773A (en) * 1991-08-02 1997-05-20 Canon Kabushiki Kaisha Image projection method and semiconductor device manufacturing method using the same
EP0526242A1 (en) * 1991-08-02 1993-02-03 Canon Kabushiki Kaisha Image projection method and semiconductor device manufacturing method using the same
EP0614097A1 (en) * 1991-08-02 1994-09-07 Canon Kabushiki Kaisha Image projection method and semiconductor device manufacturing method using the same
US5608575A (en) * 1991-08-02 1997-03-04 Canon Kabushiki Kaisha Image projection method and semiconductor device manufacturing method using the same
US6094305A (en) * 1991-09-06 2000-07-25 Nikon Corporation Exposure method and apparatus therefor
US5715089A (en) * 1991-09-06 1998-02-03 Nikon Corporation Exposure method and apparatus therefor
US5587834A (en) * 1992-01-31 1996-12-24 Canon Kabushiki Kaisha Semiconductor device manufacturing method and projection exposure apparatus using the same
US5574492A (en) * 1992-03-27 1996-11-12 Canon Kabushiki Kaisha Imaging method and semiconductor device manufacturing method using the same
US5345292A (en) * 1992-03-31 1994-09-06 Canon Kabushiki Kaisha Illumination device for projection exposure apparatus
US5726740A (en) * 1992-03-31 1998-03-10 Canon Kabushiki Kaisha Projection exposure apparatus having illumination device with ring-like or spot-like light source
EP0564264A1 (en) * 1992-03-31 1993-10-06 Canon Kabushiki Kaisha Illumination device for projection exposure apparatus
US5579240A (en) * 1992-05-26 1996-11-26 Dicon A/S Method and an apparatus for illuminating points on a medium
WO2001014930A1 (en) * 1999-08-26 2001-03-01 Macdermid Graphic Arts, Inc. Methods for enhancing images on relief image printing plates
US6245487B1 (en) * 1999-08-26 2001-06-12 Polyfibron Technologies, Inc. Methods for enhancing images on relief image printing plates

Also Published As

Publication number Publication date
DE2140549B2 (de) 1976-01-02
NL7111033A (2) 1972-02-15
JPS5143750B1 (2) 1976-11-24
IT939738B (it) 1973-02-10
DE2140549A1 (de) 1972-02-17
FR2104273A5 (2) 1972-04-14

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