US4752957A - Apparatus and method for recognizing unknown patterns - Google Patents

Apparatus and method for recognizing unknown patterns Download PDF

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US4752957A
US4752957A US06/648,464 US64846484A US4752957A US 4752957 A US4752957 A US 4752957A US 64846484 A US64846484 A US 64846484A US 4752957 A US4752957 A US 4752957A
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patterns
matrix
pattern
category
bases
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Ken-ichi Maeda
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Toshiba Corp
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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/20—Image preprocessing
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F18/00—Pattern recognition
    • G06F18/20—Analysing
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/70—Arrangements for image or video recognition or understanding using pattern recognition or machine learning

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  • the present invention relates to the field of pattern recognition apparatus and, more particularly, is directed to a highly accurate pattern recognition method and apparatus which can reliably recognize malformed and distorted patterns.
  • Pattern recognition apparatus is commonly used to convert information patterns, such as speech and written characters, to a form suitable for processing and storage by computer systems.
  • Conventional pattern recognition methods are usually based on either a pattern matching scheme or a character extraction scheme.
  • pattern matching schemes the identity of a given input pattern is established according to the degree of its similarity to a specific reference pattern. Similarity methods are among the most effective pattern recognition techniques based on a pattern matching scheme. In these methods, a similarity value is calculated between an input pattern and one or more reference patterns for each category of a given pattern set. A category includes all the expected variations of a particular pattern. A comparison between similarity values is used to determine the category to which the input pattern belongs.
  • the simple similarity method is the most basic of the similarity methods. As shown in FIG. 1A, this method utilizes vectors to represent an input and a reference pattern. The similarity value is calculated as an angle ⁇ between an input pattern vector A and a reference pattern vector B. The closer angle ⁇ is to 0, the closer the input pattern matches the reference pattern. Thus, when angle ⁇ is 0, the input pattern is identical to the reference pattern. In actual practice, an input pattern is identified as belonging to a particular category when angle ⁇ is within a predetermined range.
  • the similarity value S which exist between an input pattern f and a reference pattern fo may be expressed as: ##EQU1## where (f,f o ) is the scalor product of vector f representing the input pattern and vector f o representing the reference pattern
  • ⁇ f ⁇ is the norm for input vector f
  • ⁇ fo ⁇ is the norm for reference vector f o .
  • Any pattern drawn on a plane can be expressed by an n-dimensional vector in the following manner.
  • the plane is divided into n picture elements or cells, each of which has a darkness or density ranging from white through gray to black as a function of its position on the plane. If the positions of the picture elements are expressed as x 1 , x 2 , . . . , X n , and the darkness of the picture elements are expressed as f(x 1 ), f(x 2 ), . . . , f(x n ), respectively, vector f can be uniquely defined in n-dimesional coordinates where f(x 1 ), (fx 2 ), . . . , f(x n ) correspond to the projections of vector f on the coordinate axis 1, 2, . . . , n.
  • Equation (1) The simple similarity defined by equation (1) means that S[f,f o ] takes maximum value 1 when vectors f and f o in n-dimensional coordinates are parallel and that S[f,f o ] takes minimum value 0 when the vectors are perpendicular.
  • S[f,f o ] varies from value 1 where two patterns on the plane are overlapped, to value 0 where two patterns are quite different from each other.
  • the simple similarity method has the advantage that the design of a dictionary of standard reference patterns can be created rather easily. This method is also not greatly affected by such local noise as stains or scratches in the patterns. The simple similarity method is affected adversely, however, by such overall changes in the patterns as occur in handwritten letters or voice sound patterns.
  • the similarity value is calculated as an angle ⁇ between vector A, representing an input pattern, and subspace C constructed from a plurality of vectors representing a particular category of patterns.
  • Subspace C is usually in m-dimensional space but is illustrated in FIG. 1B as a two-dimensional plane.
  • Each vector is associated with a deformation or variation of primary reference pattern B so that a range of malformed or distorted input patterns may be correctly recognized.
  • the multiple similarity method is useful for recognition of patterns which are subject to overall deformations, the range of deformation determination is limited. That is, only deformations representing small variations of the input patterns can be detected. With respect to handwritten characters and speech, however, there are many more possible variations for the same pattern as compared to printed characters. Because the multiple similarity method can only include a limited number of these variations, the method is not reliable for recognizing written characters and speech patterns which can have a multitude of pattern variations.
  • One such method is the combination of the multiple similarity method and another recognition method such as one based on a character extraction scheme.
  • Another recognition method such as one based on a character extraction scheme.
  • An example of a pattern recognition method based on a character extraction scheme is disclosed in U.S. Pat. No. 3,541,511.
  • this method various kinds of characters are extracted from various parts of the patterns and the unknown patterns are recognized by a combination of reference character patterns.
  • the problem in this method has been that complicated algorithmic processing is required. Moreover, a large amount of memory is required for storing the reference patterns. There is also the difficulty that this method cannot be easily automated and much labor is needed to use it.
  • a method combining the multiple similarity method and the character extraction method is disclosed in the preliminary report for the National Convention of the Electrocommunication Society, page 5-378, published by the Japan Electrocommunication Society. According to this method, the multiple similarity method is applied to the unknown patterns as a first step. In a second step, the character extraction method is applied to the result. While this combined method is useful for the recognition of complicated handwritten letters, the apparatus for realizing the method is, however, complicated and automatic design of the reference pattern dictionary is also difficult.
  • an unknown input pattern to be recognized is converted into electrical signals representing, for example, the darkness or density of the picture elements forming the input pattern.
  • the signals are stored in an input pattern memory.
  • a basis generating unit is provided for generating a plurality of orthonormalized vectors or bases from the input pattern stored in the input pattern memory. These vectors are used to construct an input subspace of the input pattern.
  • a reference pattern memory is provided for storing a plurality of reference patterns for each category. These reference patterns also comprise a plurality of vectors which are used to construct a reference subspace.
  • a similarity value is defined as an angle ⁇ between the input subspace and the reference subspace. More specifically, a matrix generating unit and an eigenvalue calculating unit are provided for measuring the angle ⁇ .
  • the matrix generating unit produces a matrix from the orthonormalized vectors generated by the basis generating unit and the reference patterns stored in the reference pattern memory.
  • An eigenvalue calculating unit calculates eigenvalues for the matrix generated by the matrix generating unit.
  • the maximum eigenvalue of the matrix corresponds to angle ⁇ .
  • a decision unit is provided for determining the category to which the input pattern belongs by comparing the eigenvalues representing the category.
  • FIG. 1A illustrates an input pattern represented by vector A and a reference pattern represented by vector B.
  • FIG. 1B illustrates an input pattern represented by vector A and a plurality of reference patterns represented by subspace C;
  • FIG. 2 is a simplified example showing the concept of the present invention
  • FIG. 3 is a flow chart of the overall operation of the present invention.
  • FIG. 4 is a detailed flow chart of step 2 in FIG. 3 showing the basis generating method according to the invention.
  • FIG. 5 is a detailed flow chart of step 3 in FIG. 3 showing the similarity calculation method according to the invention.
  • FIG. 6 is a detailed flow chart of step 2 in FIG. 3 showing another similarity calculation method according to the invention.
  • FIG. 7 is a detailed flow chart of step 2 in FIG. 3 showing another basis generating method according to the invention.
  • FIG. 8 is a block diagram of the pattern recognition apparatus in accordance with one embodiment of the present invention.
  • FIG. 9 is a detailed block diagram of basis generating unit 5 shown in FIG. 8 performing the operations in FIG. 4;
  • FIG. 10 is a detailed block diagram of matrix generating unit 7 shown in FIG. 8 performing the operations shown in steps 1 and 2 of FIG. 5;
  • FIG. 11 is a detailed block diagram of eigenvalue calculating unit 10 shown in FIG. 8 performing the operation shown in step 3 of FIG. 5;
  • FIG. 12 is a detailed block diagram of decision unit 12 shown in FIG. 8;
  • FIG. 13A is an example of a blurring mask pattern to be stored in mask pattern memory 107 in FIG. 9;
  • FIG. 13B is an example of an x-direction differential pattern to be stored in mask pattern memory 108 in FIG. 9;
  • FIG. 13C is an example of a y-direction differential pattern to be stored in mask pattern memory 109 in FIG. 9;
  • FIG. 14 is another embodiment of matrix calculating unit 7 shown in FIG. 8;
  • FIG. 15 is another embodiment of basis generating unit 5 shown in FIG. 8;
  • FIG. 16A is an example of differentiated blurring mask 108' to be stored in the mask pattern memory shown in FIG. 15;
  • FIG. 16B is another example of a differentiated blurring mask 109' to be stored in the mask pattern memory in FIG. 15.
  • FIG. 2 illustrates in simplified form the principle concept of the present invention.
  • reference patterns are represented by subspace C.
  • Subspace C is constructed from a plurality of vectors representing a particular category of patterns.
  • Subspace C is usually in M-dimensional space but is illustrated in FIG. 2 in a two-dimensional plane.
  • Each vector is associated with a deformation or variation of primary reference pattern B.
  • the input pattern is represented by subspace D which is constructed from a plurality of vectors.
  • Subspace D is also usually in M-dimensional space but is illustrated in FIG. 2 in a two-dimensional plane.
  • Each vector forming subspace D is associated with a deformation or variation of primary input pattern A.
  • Angle ⁇ between subspace C and subspace D is used as the similarity value.
  • Angle ⁇ is defined as a minimun angle between one of the vectors included in subspace C and one of the vectors included in subspace D.
  • FIG. 3 is a flow chart showing the overall operation of the present invention.
  • An unknown input pattern f is provided in step 1.
  • bases U 0 , U 1 and U 2 are examples of bases U 0 , U 1 and U 2 .
  • step 3 angle ⁇ between the input subspace (U 0 , U 1 , U 2 ) and a second subspace constructed from a plurality of vectors representing a reference pattern for a certain category is calculated. In practice, it is convenient to calculate values that relate to angle ⁇ , for example cos 2 ⁇ . These values are calculated for every category. In step 4, a decision is made to determine the category to which input pattern f belongs by comparing the values calculated in step 3.
  • FIG. 4 shows a detailed flow chart of step 2 in FIG. 3.
  • input pattern f is normalized to adjust its size to the size of the reference patterns.
  • the normalized input pattern f is then blurred in step 2.
  • blurring is used for reducing the noise components of the input pattern.
  • blurring is also used for reducing the number of dimensional vectors.
  • the blurring operation is executed by the following equation:
  • f indicates the normalized input pattern
  • g indicates a blurred pattern
  • G is a Gaussian function.
  • the integral calculation included in equation (3) is replaced by a masking operation according to the present invention.
  • step 3 the amount of shift of blurred pattern g is approximated and a differential value g x to the x-direction and a differential value g y to the y-direction are calculated as follows: ##EQU3##
  • step 4 pattern g, gx and gy are orthonormalized to create bases (U 0 , U 1 , U 2 ) for the input subspace as follows: ##EQU4##
  • ⁇ g ⁇ indicates a norm or magnitude of the pattern (vector) g.
  • FIG. 5 shows a flow chart for calculating angle ⁇ between the input subspace and reference patterns.
  • Angle ⁇ between subspaces U and V is defined as follows: ##EQU5##
  • Equation (8) shows that the angle formed by subspaces U and V is defined as the smallest angle of many angles formed between one vector of subspace U and another vector of subspace V.
  • the calculation of equation (8) is obtained by utilizing projectors P and Q of subspaces U and V.
  • Projectors P and Q are calculated as follows: ##EQU6##
  • ⁇ > indicates a dyad operation.
  • equation (8) can be modified as follows: ##EQU9## where ⁇ QP ⁇ is defined as follows: ##EQU10## The following relationship, therefore, is satisfied.
  • This value represents the maximum eigenvalue of matrix PQP and is equal to the maximum eigenvalue of matrix QPQ. Therefore, it is possible to calculate cos 2 ⁇ between subspaces U and V by obtaining the maximum eigenvalue of matrix PQP or QPQ. For the purpose of obtaining eigenvalues, a power method may be used.
  • total space is a three-dimensional space whose coordinate system ⁇ consist of x, y and z, unit vectors i, j and k on the x-axis, y-axis and z-axis are indicated by: ##EQU11## It is assumed that subspace U is along the x-y plane of the three-dimensional space and subspace V is along the z-axis. Thus, projectors P and Q are as follows: ##EQU12## The maximum eigenvalue is determined as follows: ##EQU13## In this case, the maximum eigenvalue becomes "0" so that cos 2 ⁇ is 0. This means that angle ⁇ between subspaces U and V is 90°.
  • FIG. 6 shows another flow chart for calculating angle ⁇ between the input subspace and a reference subspace in which the required number of calculation steps are reduced in comparison to the flow chart shown in FIG. 5.
  • the eigenvalue relating to matrix QPQ can be considered as:
  • matrix X (equation 12) is generated in step 1 in FIG. 6.
  • the maximum eigenvalue of matrix X is calculated in step 2.
  • the dimension of matrix X is small compared to the dimension of matrix QPQ.
  • FIG. 7 is a flow chart of another example for obtaining bases.
  • the difference between FIGS. 4 and 7 is in the masking operation.
  • three mask patterns are prepared in advance.
  • the first mask pattern is that of the Graussion function as in FIG. 4.
  • the second mask pattern is obtained by x-directional partial-differentiation of the Graussian function and the third mask pattern is obtained by y-directional partial-differentiation of the Graussion function.
  • three vectors are given by: ##EQU27##
  • the orthonormalizing step 3 is the same as step 4 in FIG. 4.
  • an unknown input pattern is expressed by the input subspace being n-dimensional space and reference patterns are expressed by the reference subspace being m-dimensional space.
  • the angle between the input subspace and the reference subspace is calculated as a measure of similarity.
  • FIG. 8 is a block diagram of a preferred embodiment of the pattern recognition apparatus according to the invention.
  • the apparatus can serve as a handwritten character reader which recognizes character patterns such as Japanese kanji-characters, Japanese kama-characters and alphanumeric characteristis.
  • Character patterns are written on a sheet and the sheet is divided into n picture elements or cells. Each cell has a darkness or density ranging from white to black as a function of its position on the sheet.
  • the sheet is optically scanned by a scanner in block 1 which usually comprises CCD (charged Coupled Device) sensors for obtaining electrical signals which represent the darkness or density of each picture element on the sheet.
  • the output signals of scanner 1 are converted to digital signals by an A/D (Analog to Digital) converter in block 2.
  • the digital signals obtained from the A/D converter are supplied to a pre-processing unit in block 3.
  • the pre-processing is used to eliminate noise and to normalize the size of the input character pattern to adjust it to the size of the reference patterns hereinafter described
  • the normalized input pattern data in the form of digital signals associated with each of the picture elements on the sheet is stored in an input pattern memory in Block 4.
  • the input pattern data stored in the input pattern memory is hereinafter considered as being an input vector f where the position of the picture elements on the sheet are expressed as x 1 , x 2 , . . . , x n and the darkness of the picture elements are expressed as f(x 1 ) f(x) 2 ), . . . , f(x n ), respectively.
  • vector f may be uniquely defined in n-dimensional coordinates where f(x 1 ), f(x 2 ), . . . , f(x n ) correspond to the projections of vector f on the coordinate axis 1, 2, . . . , n.
  • a basis generating unit is provided in block 5 for generating three bases U 0 , U 1 , and U 2 relating to input vector f.
  • the functions of the basis generating unit are:
  • a matrix generating unit is provided in block 7 for generating a QPQ matrix.
  • the matrix unit generates a projection operator Q from the three bases vectors, and a projection operator P from the vectors representing the reference patterns which are stored in reference pattern memory 8.
  • the matrix unit then calculates the QPQ matrix and supplies it to a matrix memory in block 9.
  • the reference patterns stored in the reference pattern memory in block 8 are the same type of patterns disclosed in U.S. Pat. No. 3,906,446 and include a plurality of reference patterns for each category of pattern, each respective pattern being orthonormalized to the other patterns.
  • a reference pattern is indicated hereinafter by a vector ⁇ k m being the m-th reference pattern of the k-th category.
  • An eigenvalue calculating unit is provided in block 10 for obtaining eigenvalues for the QPQ matrix QPQ.
  • Eigenvalues are stored in an eigenvalue memory in block 11 and supplied to a decision unit in block 12.
  • the decision unit determines the maximum eigenvalue and identifies the category to which the input character pattern belongs.
  • FIG. 9 shows an example of the basis generating unit in block 5 in FIG. 8.
  • An address control circuit 100 supplies required addresses to the various memory units and selection signals to the various selector circuits in the basis generating unit. Lines for supplying selection signals are shown only by arrows to simplify the drawing.
  • a signal SO is received from the pre-processing unit in block 3 indicating the start of the operation.
  • Circuit 100 provides signal A to selector 101 for selecting terminal 1 of selector 101.
  • Circuit 100 also provides signal B to selector 102 and selector 103 for selecting their respective terminal 1.
  • Circuit 100 then successively supplies addresses to lines 104, 105, and 106, respectively.
  • the address on line 104 is supplied to the input pattern memory in block 4 so that it outputs the data for each of the picture elements of input vector f.
  • the address on line 105 is supplied to mask memories 107, 108 and 109 so that they output each data element for corresponding mask data.
  • the address on line 106 is supplied to blur pattern memory 110 and differential pattern memories 111, 112. Therefore, the data associated with each picture element of input vector f and each picture element of mask memory 107 are supplied to sum-of-product circuit 113 to produce a blurred vector g.
  • Circuit 113 executes a calculation between vector f and the mask data in a well-known manner such as by calculating the sum of the inner product of the vector f and the mask data. Accordingly, blurring of the input pattern is realized by the blurring mask data stored in mask memory 107.
  • a Gaussian function such as shown by the table in FIG. 13A, is suitable for the blurring mask data.
  • the outputs of sum-of-product circuit 113 is successively stored in blurred pattern memory 110 through selector 103.
  • address control circuit 100 provides signal A indicating the selection of terminal 2 of selector 101 and signal B indicating the selection of terminal 2 of selectors 102 and 103.
  • the next operation is to obtain a differentiated vector gx.
  • mask memory 108 contains x-direction differential mask data such as shown by the table in FIG. 13B.
  • Each data element of blurred vector g stored in blurred pattern memory 110 is successively read out according to the address on line 106 and is supplied to the sum-of-product circuit 113 through selector 101.
  • each data element of the x-direction differential mask data is supplied from mask memory 108 through selector 102.
  • the sum-of-product circuit 113 calculates each data element of partially differentiated vector gx and provides it to differential pattern memory 111 through selector 103.
  • address control circuit 100 After obtaining differentiated vector gx, address control circuit 100 outputs signal B indicating selection of terminal 3 of selectors 102 and 103 for the operation of y-directional partial differentiation of blurred vector g.
  • signal B indicating selection of terminal 3 of selectors 102 and 103 for the operation of y-directional partial differentiation of blurred vector g.
  • partial differentiated vector gy is obtainded using y-direction differential mask data such as shown in the table in FIG. 13C which is written into differential pattern memory 112.
  • the next step is to derive three bases U 0 , U 1 and U 2 .
  • Basis U 0 is obtained by normalizing vector g stored in blurred pattern memory 110.
  • Address control circuit 100 provides selection signal C for indicting the selection of input terminal 1 of selector 120 and a selection signal D for indicating selection output terminal 1 of selector 120. Circuit 100 then supplies addresses to blurred pattern memory 110.
  • Each data element of blurred vector g is successiveively supplied to norm circuit 121 through selector 120.
  • Norm circuit 121 calculates the norm or magnitude of the input vector and comprises a squaring circuit for squaring each data element, a summation circuit for adding the squared values and a square root circuit for taking the square root of the summed values.
  • Norm circuit 121 provides norm ⁇ g ⁇ of blurred vector g to buffer 122.
  • Address control circuit 100 then provides selection signal D indicating the selection of output terminal 2 of selector 120. Circuit 100 also provides selection signal E indicating the selection of terminal 5 of selector 125 and then provides addresses to lines 106 and 126. Accordingly, each data element of blurred vector g is supplied to divider 124 through selector 120. Another input of divider 124 is supplied with data from the output of buffer 122. Divider 124 divides each data element of blurred vector g by norm ⁇ g ⁇ . The output of divider 124 is written into first base memory 126 through selector 125. The contents of first base memory 126 is base vector U 0 .
  • vector gx and gy are normalized. This operation is similar to the operation discussed above with respect to first base vector U 0 . That is, input terminal 2 and output terminal 1 of selector 120 are selected and supplies each data element of vector gx stored in differential pattern memory 111 to norm circuit 121. The calculated norm value is stored in buffer memory 122. Next, each data element of vector gx is supplied to divider 124 by selecting output terminal 2 of selector 120. The output of divider 124 is written into a first work or scrath pad memory 129 by selecting terminal 1 of selector 125. Work memory 129 stores normalized vector g x/ ⁇ gx ⁇ . Similarly, normalized vector gy/ ⁇ gy ⁇ is stored in a second work memory 130 by the operation of selectors 120, 125 and address control of memory 112 and 130.
  • Address control circuit 100 then provides selection signal C indicating the selection of input terminal 4 and selection signal D indicating the selection of output terminal 1 of selector 120.
  • Work memories 129 and 130 successively output each data element of the normalized vectors according to addresses supplied from line 126.
  • Adder 131 adds these data elements and subtractor 132 subtract the data elements of work memory 130 from the data elements of work memory 129.
  • Input terminal 4 of selector 120 is then selected so that the output of adder 131 is supplied to norm circuit 121.
  • norm value ⁇ g x / ⁇ g x ⁇ +g y / ⁇ g y ⁇ is stored in memory buffer 122.
  • address control circuit 100 After the calculation of the norm value, address control circuit 100 provides selection signal D indicating the selection of output terminal 2 and supplies addresses to line 126 with selection signal E indicating the selection of terminal 4 of selector 125.
  • the output of adder 131 is supplied to divider 124 and the output of divider 124 is supplied to second memory 127.
  • Second memory 127 stores orthonormalized base U 1 .
  • third base U 2 is generated and stored in a third memory 128 using the output of subtractor 132.
  • FIG. 10 shows an example of the matrix generating unit of block 7 in FIG. 8.
  • Address control circuit 200 is operated in response to an end signal supplied from address control circuit 100 in FIG. 9 at the end of the generation of the three base vectors.
  • Circuit 200 clears projection memories 201, 202.
  • the matrix generating unit first generates a projector Q.
  • Circuit 200 provides selection signals F1 and F2 to selector 203, each indicating the selection of input terminal 1 and output terminal 2 of selector 203, respectively.
  • Circuit 200 then supplies addresses to first base memory 126 and work memory 204 through lines 210 and 211 so that every data element of first base U 0 are transformed to work memory 204 through selector 203.
  • circuit 200 supplies selection signal F2, indicating the selection of output terminal 1 of selector 203, and selection signal G, indicating the selection of terminal 1 of selectors 207 and 208.
  • First base memory 126 outputs a data element U 0 j in response to an address j from circuit 200.
  • circuit 206 selects input terminal 2 and output terminal 2 and transfers second base U 1 into work memory 204. Then circuit 200 controls the address of memories 127, 204 and 201, so that the multiplied value U 1 j U 1 i is accumulated into the (i,j) data elements of projector Q of projector memory 201. Referring to the third basis U 2 , each data element is transferred to work memory 204. Each multiplied value U 2 j U 2 i is then accumulated into the (i,j) element data of projector Q. Therefore, projector memory 201 is now storing projector Q corresponding to three bases U 0 , U 1 and U 2 .
  • the second stage of operation of the matrix generating unit is to generate a projector P from the reference pattern which is similar to the first stage of operation except that circuit 200 accesses reference pattern memory 8 and projection memory 202.
  • Pk hereafter indicates projector P of the k-th category.
  • Each element date of the projector Pk is given by: ##EQU28## wherein M is the number of reference patterns of k-th category.
  • circuit 200 After the selection of terminal 2 of selectors 207 and 208, circuit 200 supplies addresses to the memories, so that the output of multiplier 205 is accumulated into projector memory 202. Such operation is repeated m times for every reference pattern of the k-th category. The k-th projector Pk corresponding to the k-th category is created in projector memory 202.
  • the third step of matrix generating unit 7 generates a multiplied matrix QPkQ using projectors Q and Pk.
  • Circuit 200 supplies a driving signal H to matrix multiplier 209 which multiplies projector Pk by the projector Q and thereafter multiplies projector Q by the multiplied matrix QPk.
  • the result is written into matrix memory 9 according to addresses supplied from circuit 100 through line 214.
  • FIG. 11 shows an example of eigenvalue calculating unit 10 in FIG. 8.
  • Unit 10 finds the maximum eigenvalue of the matrix in the matrix memory 9 according to the power method.
  • maximum detector 306 searches for the maximum eigenvalue ⁇ M from buffer 305.
  • the eigenvalue is stored in maximum register 307.
  • Comparator 308 is provided for comparing output ⁇ M of maximum register 307 and output ⁇ O of last maximum register 302. If ⁇ O - ⁇ M ⁇ ( ⁇ is a threshold value), comparator 308 outputs a logic "1" on line 323. If ⁇ O - ⁇ M ⁇ , comparator 308 outputs a logic "O".
  • loop control circuit 400 When the signal on line 323 is "O", loop control circuit 400 outputs a recalculating signal S3 to address control circuit 300.
  • Circuit 300 provides a set signal to last maximum register 302 through line 323 for setting the maximum eigenvalue ⁇ M as the last maximum value ⁇ O .
  • Circuit 300 supplies the same addresses to buffers 301 and 305 through lines 320, 322.
  • Each eigenvalue of buffer 705 is read out and supplied to divider 309.
  • Divider 309 divides each eignevalue by maximum eigenvalue ⁇ M .
  • the output of divider 309 is stored in buffer 301. After this, recalculation of the eigenvalues is repeated. Recalculation is repeated until ⁇ O - ⁇ M ⁇ is satisfied.
  • loop control circuit 400 When the signal on line 323 is "1", loop control circuit 400 outputs address k to eigenvalue memory 11 in order to set the maximum eigenvalue ⁇ M as the maximum value of the k-th category. Circuit 400 increments k counter 401 which contents indicate the present category being calculated when the contents of the k counter is not K and outputs a repeating signal S4 to address control circuit 200 in FIG. 10. Address control circuit 200 controls calculating a new projector Pk and calculating a new matrix QPkQ.
  • Eigenvalue calculating unit 10 also calculates eigenvalues for the new matrix. Therefore, when the contents of k counter 401 becomes K, each maximum eigenvalue for each category is stored in eigenvalue memory 11. At that time, circuit 400 provides an end signal to decision unit 12.
  • FIG. 12 shows an example of decision unit 12 in FIG. 8 which responds to end signal S5.
  • a sorting circuit 500 compares the eigenvalues to each other in the eigenvalue memory 11 and provides the maximum eigenvalue ⁇ M with its address K M to register 501 and the secondary largest eigenvalue ⁇ N with its address K N to register 502. Eigenvalues ⁇ M and ⁇ N are supplied to comparing circuit 503.
  • Comparing circuit 503 provides an accept signal to line 504, where ⁇ M > ⁇ 1 and ⁇ M - ⁇ N > ⁇ 2 , wherein ⁇ 1 and ⁇ 2 are threshold values for decision operation. If ⁇ M ⁇ 1 , or ⁇ M - ⁇ N ⁇ O 2 , comparing circuit 503 provides a reject signal on line 505 indicating the apparatus cannot recognize the input pattern.
  • a character code generator 506 is activated comprising a Read Only Memory which generates a character code corresponding to the address data k m representing the category to which the input pattern belongs.
  • the apparatus can recognize more varieties of deformed input patterns than conventional apparatus which utilizes the multiple similarity method.
  • FIG. 14 shows another embodiment of matrix generating unit 7 in FIG. 8.
  • the unit calculates an X matrix instead of matrix QPQ.
  • Address control circuit 600 supplies addresses to base memories 126, 127, 128, reference pattern memory 8 and matrix memory 9.
  • a first inner product circuit comprising multiplier 601 and accumulator 602 calculates an inner product between one of the reference pattern ⁇ m k in the reference pattern memory 8 and base Ui selected by selector 605 in response to selection signal AI from address control circuit 600.
  • a second inner product circuit comprising multiplier 601 and accumulator 602 calculates an inner product between one of the reference patterns ⁇ m k and the base Uj selected by selector 606 in response to selection signal AJ from circuit 600.
  • the outputs of these inner product circuits are multiplied by multiplier 607.
  • multiplier 607 is added to the contents of matrix memory 9 by adder 608.
  • the result is written into matrix memory 9.
  • the advantage of the matrix generating unit shown in FIG. 4 is that the size of the X matrix is very small compared to the size of matrix QPQ so that the calculation time for generating the matrix and calculating the eigenvalues is reduced.
  • FIG. 15 shows another embodiment of basis generating unit 5 i FIG. 8.
  • each base is derived by a direct masking operation of the input vector.
  • mask memories 108' and 109' which store differential blurring masks.
  • the mask in memory 108' is derived by partial-differentiation of the Gaussian function to the x-direction such as shown in FIG. 16A.
  • the mask in memory 109' is derived by partial-diferentiation of the Gaussian function to the y-direction such as shown in FIG. 16B.
  • the first blurred pattern g is obtained by sum-of-product circuit 113 according to a calculation between input vector f and mask pattern data stored in mask memory 107.
  • the second blurred pattern gx and the third blurred pattern gy are obtained by the same operation and they are stored in blurred pattern memories 111' and 112', respectively.

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US4903306A (en) * 1986-10-03 1990-02-20 Ricoh Company, Ltd. Voice recognition using an eigenvector
US4926488A (en) * 1987-07-09 1990-05-15 International Business Machines Corporation Normalization of speech by adaptive labelling
US4942608A (en) * 1987-02-23 1990-07-17 Kabushiki Kaisha Toshiba Pattern recognition apparatus using a composite similarity method
WO1991002347A1 (fr) * 1989-07-28 1991-02-21 Guerreri Stephen J Procede et appareil d'identification d'une langue et de l'interlocuteur
WO1992008202A1 (fr) * 1990-11-01 1992-05-14 Massachusetts Institute Of Technology Procede de reconnaissance de visage
US5142593A (en) * 1986-06-16 1992-08-25 Kabushiki Kaisha Toshiba Apparatus and method for classifying feature data at a high speed
US5167004A (en) * 1991-02-28 1992-11-24 Texas Instruments Incorporated Temporal decorrelation method for robust speaker verification
US5187751A (en) * 1990-07-24 1993-02-16 Sharp Kabushiki Kaisha Clustering system for optical character reader
US5189727A (en) * 1989-07-28 1993-02-23 Electronic Warfare Associates, Inc. Method and apparatus for language and speaker recognition
US5197008A (en) * 1990-01-25 1993-03-23 Mitsubishi Jidosha Kokyo Kabushiki Kaisha System for controlling the output power of a motor vehicle
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US5428788A (en) * 1991-05-10 1995-06-27 Siemens Corporate Research, Inc. Feature ratio method for computing software similarity
US5438676A (en) * 1991-05-10 1995-08-01 Siemens Corporate Research, Inc. Method for adapting a similarity function for identifying misclassified software objects
US5440742A (en) * 1991-05-10 1995-08-08 Siemens Corporate Research, Inc. Two-neighborhood method for computing similarity between two groups of objects
US5461698A (en) * 1991-05-10 1995-10-24 Siemens Corporate Research, Inc. Method for modelling similarity function using neural network
US5485621A (en) * 1991-05-10 1996-01-16 Siemens Corporate Research, Inc. Interactive method of using a group similarity measure for providing a decision on which groups to combine
DE4430348A1 (de) * 1994-08-26 1996-02-29 Rohde & Schwarz Verfahren zum Trennen von Carrier-Signal und Interferer-Signal in einem Funksignal eines Mobilfunknetzes
US5710833A (en) * 1995-04-20 1998-01-20 Massachusetts Institute Of Technology Detection, recognition and coding of complex objects using probabilistic eigenspace analysis
US5819016A (en) * 1993-10-05 1998-10-06 Kabushiki Kaisha Toshiba Apparatus for modeling three dimensional information
US5920644A (en) * 1996-06-06 1999-07-06 Fujitsu Limited Apparatus and method of recognizing pattern through feature selection by projecting feature vector on partial eigenspace
US6185316B1 (en) 1997-11-12 2001-02-06 Unisys Corporation Self-authentication apparatus and method
US20010026634A1 (en) * 2000-03-17 2001-10-04 Osamu Yamaguchi Personal identification apparatus and method
US20030125946A1 (en) * 2002-01-03 2003-07-03 Wen-Hao Hsu Method and apparatus for recognizing animal species from an animal voice
US20030161537A1 (en) * 2002-02-25 2003-08-28 Kenichi Maeda Three-dimensional object recognizing apparatus, method and computer program product
US20040008883A1 (en) * 2002-07-12 2004-01-15 Bingxue Shi VLSI neural fuzzy classifier for handwriting recognition
US20070009808A1 (en) * 2003-04-06 2007-01-11 Abrams Daniel S Systems, masks, and methods for manufacturable masks
US20070033010A1 (en) * 2005-08-05 2007-02-08 Jones Lawrence P Remote audio surveillance for detection & analysis of wildlife sounds
US20070136716A1 (en) * 2003-04-06 2007-06-14 Daniel Abrams Method for Time-Evolving Rectilinear Contours Representing Photo Masks
US20070177807A1 (en) * 2006-01-31 2007-08-02 Kabushiki Kaisha Toshiba Method and device for collating biometric information
US20070186208A1 (en) * 2005-10-03 2007-08-09 Abrams Daniel S Mask-Pattern Determination Using Topology Types
US20070184369A1 (en) * 2005-10-03 2007-08-09 Abrams Daniel S Lithography Verification Using Guard Bands
US20070184357A1 (en) * 2005-09-13 2007-08-09 Abrams Daniel S Systems, Masks, and Methods for Photolithography
US20070196742A1 (en) * 2005-10-04 2007-08-23 Abrams Daniel S Mask-Patterns Including Intentional Breaks
US20070258644A1 (en) * 2006-03-02 2007-11-08 Tomokazu Kawahara Pattern recognition apparatus and method therefor
US20080175446A1 (en) * 2006-08-28 2008-07-24 Colorado State University Research Foundation Set to set pattern recognition
US20090043547A1 (en) * 2006-09-05 2009-02-12 Colorado State University Research Foundation Nonlinear function approximation over high-dimensional domains
US7703049B2 (en) 2005-10-06 2010-04-20 Luminescent Technologies, Inc. System, masks, and methods for photomasks optimized with approximate and accurate merit functions
US7917540B2 (en) 2007-02-22 2011-03-29 Colorado State University Research Foundation Nonlinear set to set pattern recognition
US10912220B2 (en) 2010-02-02 2021-02-02 Apple Inc. Protection and assembly of outer glass surfaces of an electronic device housing

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DE102012222097A1 (de) 2012-12-03 2014-06-05 Robert Bosch Gmbh Verfahren zum Betreiben eines Kraftstoffeinspritzventils für eine Brennkraftmaschine

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Cited By (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5142593A (en) * 1986-06-16 1992-08-25 Kabushiki Kaisha Toshiba Apparatus and method for classifying feature data at a high speed
US4903306A (en) * 1986-10-03 1990-02-20 Ricoh Company, Ltd. Voice recognition using an eigenvector
US4942608A (en) * 1987-02-23 1990-07-17 Kabushiki Kaisha Toshiba Pattern recognition apparatus using a composite similarity method
US4926488A (en) * 1987-07-09 1990-05-15 International Business Machines Corporation Normalization of speech by adaptive labelling
WO1991002347A1 (fr) * 1989-07-28 1991-02-21 Guerreri Stephen J Procede et appareil d'identification d'une langue et de l'interlocuteur
US5189727A (en) * 1989-07-28 1993-02-23 Electronic Warfare Associates, Inc. Method and apparatus for language and speaker recognition
US5197008A (en) * 1990-01-25 1993-03-23 Mitsubishi Jidosha Kokyo Kabushiki Kaisha System for controlling the output power of a motor vehicle
US5187751A (en) * 1990-07-24 1993-02-16 Sharp Kabushiki Kaisha Clustering system for optical character reader
USRE36041E (en) * 1990-11-01 1999-01-12 Massachusetts Institute Of Technology Face recognition system
WO1992008202A1 (fr) * 1990-11-01 1992-05-14 Massachusetts Institute Of Technology Procede de reconnaissance de visage
US5164992A (en) * 1990-11-01 1992-11-17 Massachusetts Institute Of Technology Face recognition system
US5167004A (en) * 1991-02-28 1992-11-24 Texas Instruments Incorporated Temporal decorrelation method for robust speaker verification
US5428788A (en) * 1991-05-10 1995-06-27 Siemens Corporate Research, Inc. Feature ratio method for computing software similarity
US5438676A (en) * 1991-05-10 1995-08-01 Siemens Corporate Research, Inc. Method for adapting a similarity function for identifying misclassified software objects
US5440742A (en) * 1991-05-10 1995-08-08 Siemens Corporate Research, Inc. Two-neighborhood method for computing similarity between two groups of objects
US5461698A (en) * 1991-05-10 1995-10-24 Siemens Corporate Research, Inc. Method for modelling similarity function using neural network
US5485621A (en) * 1991-05-10 1996-01-16 Siemens Corporate Research, Inc. Interactive method of using a group similarity measure for providing a decision on which groups to combine
US5317741A (en) * 1991-05-10 1994-05-31 Siemens Corporate Research, Inc. Computer method for identifying a misclassified software object in a cluster of internally similar software objects
US5819016A (en) * 1993-10-05 1998-10-06 Kabushiki Kaisha Toshiba Apparatus for modeling three dimensional information
DE4430348C2 (de) * 1994-08-26 1998-04-02 Rohde & Schwarz Verfahren zum Trennen von Carrier-Signal und Interferer-Signal in einem Funksignal eines Mobilfunknetzes
DE4430348A1 (de) * 1994-08-26 1996-02-29 Rohde & Schwarz Verfahren zum Trennen von Carrier-Signal und Interferer-Signal in einem Funksignal eines Mobilfunknetzes
US5710833A (en) * 1995-04-20 1998-01-20 Massachusetts Institute Of Technology Detection, recognition and coding of complex objects using probabilistic eigenspace analysis
US5920644A (en) * 1996-06-06 1999-07-06 Fujitsu Limited Apparatus and method of recognizing pattern through feature selection by projecting feature vector on partial eigenspace
US6185316B1 (en) 1997-11-12 2001-02-06 Unisys Corporation Self-authentication apparatus and method
US20010026634A1 (en) * 2000-03-17 2001-10-04 Osamu Yamaguchi Personal identification apparatus and method
US7006671B2 (en) 2000-03-17 2006-02-28 Kabushiki Kaisha Toshiba Personal identification apparatus and method
US20030125946A1 (en) * 2002-01-03 2003-07-03 Wen-Hao Hsu Method and apparatus for recognizing animal species from an animal voice
US20030161537A1 (en) * 2002-02-25 2003-08-28 Kenichi Maeda Three-dimensional object recognizing apparatus, method and computer program product
US7224835B2 (en) 2002-02-25 2007-05-29 Kabushiki Kaisha Toshiba Three-dimensional object recognizing apparatus, method and computer program product
US20040008883A1 (en) * 2002-07-12 2004-01-15 Bingxue Shi VLSI neural fuzzy classifier for handwriting recognition
US7146037B2 (en) * 2002-07-12 2006-12-05 Winbond Electronics Corp. VLSI neural fuzzy classifier for handwriting recognition
US20070009808A1 (en) * 2003-04-06 2007-01-11 Abrams Daniel S Systems, masks, and methods for manufacturable masks
US7984391B2 (en) 2003-04-06 2011-07-19 Luminescent Technologies, Inc. Method for time-evolving rectilinear contours representing photo masks
US20070136716A1 (en) * 2003-04-06 2007-06-14 Daniel Abrams Method for Time-Evolving Rectilinear Contours Representing Photo Masks
US7757201B2 (en) 2003-04-06 2010-07-13 Luminescent Technologies, Inc. Method for time-evolving rectilinear contours representing photo masks
US8056021B2 (en) 2003-04-06 2011-11-08 Luminescent Technologies, Inc. Method for time-evolving rectilinear contours representing photo masks
US7992109B2 (en) 2003-04-06 2011-08-02 Luminescent Technologies, Inc. Method for time-evolving rectilinear contours representing photo masks
US7703068B2 (en) 2003-04-06 2010-04-20 Luminescent Technologies, Inc. Technique for determining a mask pattern corresponding to a photo-mask
US7698665B2 (en) 2003-04-06 2010-04-13 Luminescent Technologies, Inc. Systems, masks, and methods for manufacturable masks using a functional representation of polygon pattern
US20100275175A1 (en) * 2003-04-06 2010-10-28 Daniel Abrams Method for Time-Evolving Rectilinear Contours Representing Photo Masks
US20100275176A1 (en) * 2003-04-06 2010-10-28 Daniel Abrams Method for Time-Evolving Rectilinear Contours Representing Photo Masks
US20070033010A1 (en) * 2005-08-05 2007-02-08 Jones Lawrence P Remote audio surveillance for detection & analysis of wildlife sounds
US8457962B2 (en) * 2005-08-05 2013-06-04 Lawrence P. Jones Remote audio surveillance for detection and analysis of wildlife sounds
US7707541B2 (en) * 2005-09-13 2010-04-27 Luminescent Technologies, Inc. Systems, masks, and methods for photolithography
US20070184357A1 (en) * 2005-09-13 2007-08-09 Abrams Daniel S Systems, Masks, and Methods for Photolithography
US7921385B2 (en) 2005-10-03 2011-04-05 Luminescent Technologies Inc. Mask-pattern determination using topology types
US20070184369A1 (en) * 2005-10-03 2007-08-09 Abrams Daniel S Lithography Verification Using Guard Bands
US7788627B2 (en) 2005-10-03 2010-08-31 Luminescent Technologies, Inc. Lithography verification using guard bands
US20070186208A1 (en) * 2005-10-03 2007-08-09 Abrams Daniel S Mask-Pattern Determination Using Topology Types
US7793253B2 (en) 2005-10-04 2010-09-07 Luminescent Technologies, Inc. Mask-patterns including intentional breaks
US20070196742A1 (en) * 2005-10-04 2007-08-23 Abrams Daniel S Mask-Patterns Including Intentional Breaks
US7703049B2 (en) 2005-10-06 2010-04-20 Luminescent Technologies, Inc. System, masks, and methods for photomasks optimized with approximate and accurate merit functions
US20070177807A1 (en) * 2006-01-31 2007-08-02 Kabushiki Kaisha Toshiba Method and device for collating biometric information
US7856122B2 (en) 2006-01-31 2010-12-21 Kabushiki Kaisha Toshiba Method and device for collating biometric information
US20070258644A1 (en) * 2006-03-02 2007-11-08 Tomokazu Kawahara Pattern recognition apparatus and method therefor
US20080175446A1 (en) * 2006-08-28 2008-07-24 Colorado State University Research Foundation Set to set pattern recognition
US8116566B2 (en) 2006-08-28 2012-02-14 Colorado State University Research Foundation Unknown pattern set recognition
US8046200B2 (en) 2006-09-05 2011-10-25 Colorado State University Research Foundation Nonlinear function approximation over high-dimensional domains
US20090043547A1 (en) * 2006-09-05 2009-02-12 Colorado State University Research Foundation Nonlinear function approximation over high-dimensional domains
US8521488B2 (en) 2006-09-05 2013-08-27 National Science Foundation Nonlinear function approximation over high-dimensional domains
US7917540B2 (en) 2007-02-22 2011-03-29 Colorado State University Research Foundation Nonlinear set to set pattern recognition
US10912220B2 (en) 2010-02-02 2021-02-02 Apple Inc. Protection and assembly of outer glass surfaces of an electronic device housing

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JPS6057475A (ja) 1985-04-03
EP0139446A3 (en) 1986-10-08
EP0139446B1 (fr) 1990-07-04
DE3482637D1 (de) 1990-08-09

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