US4953388A - Air gauge sensor - Google Patents

Air gauge sensor Download PDF

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Publication number
US4953388A
US4953388A US07/301,088 US30108889A US4953388A US 4953388 A US4953388 A US 4953388A US 30108889 A US30108889 A US 30108889A US 4953388 A US4953388 A US 4953388A
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United States
Prior art keywords
air
gap
air flow
measurement
channel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US07/301,088
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English (en)
Inventor
Andrew H. Barada
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ASML Holding NV
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Perkin Elmer Corp
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Publication date
Application filed by Perkin Elmer Corp filed Critical Perkin Elmer Corp
Assigned to PERKIN-ELMER CORPORATION, THE, A CORP. OF NY reassignment PERKIN-ELMER CORPORATION, THE, A CORP. OF NY ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: BARADA, ANDREW H.
Priority to US07/301,088 priority Critical patent/US4953388A/en
Priority to CA002006962A priority patent/CA2006962C/fr
Priority to EP90100945A priority patent/EP0380967B1/fr
Priority to DE90100945T priority patent/DE69004277T2/de
Priority to JP2011964A priority patent/JP2923567B2/ja
Assigned to SVG LITHOGRAPHY, INC., A CORP OF DE reassignment SVG LITHOGRAPHY, INC., A CORP OF DE ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: PERKIN-ELMER CORPORATION, THE,
Publication of US4953388A publication Critical patent/US4953388A/en
Application granted granted Critical
Assigned to ASML HOLDING N.V. reassignment ASML HOLDING N.V. CONFIRMATORY ASSIGNMENT Assignors: ASML US, INC.
Assigned to ASML US, LLC reassignment ASML US, LLC CONVERSION Assignors: ASML US, INC.
Assigned to ASML US, INC. reassignment ASML US, INC. MERGER (SEE DOCUMENT FOR DETAILS). Assignors: SVG LITHOGRAPHY SYSTEMS, INC.
Assigned to ASML US, INC. reassignment ASML US, INC. MERGER (SEE DOCUMENT FOR DETAILS). Assignors: ASM LITHOGRAPHY, INC. AND ASML US, LLC
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01DMEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/42Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using fluid means
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B13/00Measuring arrangements characterised by the use of fluids
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B13/00Measuring arrangements characterised by the use of fluids
    • G01B13/12Measuring arrangements characterised by the use of fluids for measuring distance or clearance between spaced objects or spaced apertures

Definitions

  • This invention relates generally to apparatus for detecting the distance from a surface, and more particularly to a balanced low flow pneumatic bridge for detecting small gaps with minimum influence on particulate contamination on the surface due to low volumetric air mass flow.
  • this distance or gap that is to be sensed or maintained is very small, in the order of microns or millionths of a meter.
  • One application where these gaps need to be detected or maintained is in lithographic systems such as those used in semiconductor manufacturing.
  • air gauges have been used applying the principles of a pressure difference between two balanced sides or legs.
  • the deflection of a flexible membrane between the two legs is used to measure or maintain a gap or distance between two surfaces.
  • One surface being a probe emitting the air and the other surface being the surface the distance from which is to be measured.
  • the present invention is directed to a pneumatic bridge device for quickly and accurately detecting a small gap.
  • a source of air under constant pressure is divided into two channels.
  • a measurement channel and a reference channel. Both channels have a restrictor placed therein to accurately control the mass air flow through the channels.
  • the air flow is again divided between a probe and a mass air flow sensor.
  • a measurement probe is attached permitting air to exit between the measurement probe and a surface to be detected.
  • a reference probe is attached to the distal end of the reference channel permitting air to escape between the reference probe and a reference surface.
  • the mass air flow sensor is connected between the measurement channel and the reference channel.
  • the pneumatic bridge When the gap between the measurement probe and the surface to be detected and the gap between the reference probe and the reference surface is equal the pneumatic bridge will be balanced and no mass air flow will be detected between the channels by the mass air flow sensor. If the gap between the measurement probe and the surface to be detected changes the pneumatic bridge will be unbalanced and air will flow between the two channels and be detected by the mass air flow sensor.
  • FIG. 1 is a mechanical schematic illustrating the invention
  • FIG. 2 is an electrical schematic illustrating a circuit for detecting the mass air flow.
  • FIG. 1 is a schematic illustrating the present invention.
  • An air supply 10 provides pressurized air to a regulator 20.
  • Filter 30 filters any impurities from the air before permitting it to enter air conduit 32.
  • the filtered and regulated air after entering air conduit 32 divides into a first or measurement channel 40 and a second or reference channel 42.
  • Each of the measurement and reference channels 40 and 42 have a first and second precision orifice or restrictor 44 and 46, respectively therein.
  • the two orifices or restrictors 44 and 46 control the mass air flow through the channels 40 and 42.
  • the restrictors 44 and 46 preferably restrict the mass air flow equally. This can be accomplished by a precision orifice of equal size being placed in each channel.
  • the air flow in the measurement channel 40 is further divided at the first mass air flow channel 48.
  • the remaining air flow precedes through the measurement probe channel 54 and out measurement probe 58. At this point the air is free to the ambient environment and fills the measured gap 62 between the measurement probe 58 and the surface 66.
  • the air flow in the reference channel 42 is divided between the reference mass air flow channel 52 and the reference probe channel 56. The air flow continues through reference probe channel 56 to reference probe 60. At reference probe 60 the air flow is free to the ambient environment. The air flow fills reference gap 64 between reference probe 60 and reference surface 68.
  • a mass air flow sensor 50 is positioned between the measurement leg 51 and the reference leg 53. Air is free to flow through mass air flow sensor 50.
  • the mass air flow sensor 50 detects and measures the transfer of air mass between the measurement leg 51 and reference leg 53.
  • One technique for measuring air flow is with a hot wire placed in the path of the air flow. This method uses the physical principle that the amount of heat transfer from a heated wire to the fluid surrounding it is proportional to the mass flow of the fluid across the wire. As the wire changes temperature due to the heat transfer, the resistance of the wire also changes and the resultant change in electrical current is measured through an electrical circuit.
  • a commercially available mass air flow sensor is the microbridge AWM2000 distributed by Microswitch, a division of Honeywell Corp.
  • Any pneumatic noise in the system can be reduced by providing an initial air flow pressure sufficient to provide laminar and incompressible fluid flow. Additionally, channels having no irregularities, or sharp bends, or other obstructions help provide a smooth or laminar air flow further reducing the possibility of any pneumatic noise.
  • the measurement probe and the reference probe exhausting to the same pressure, in most cases atmospheric, results in a negligible effect upon an ambient pressure change. Likewise, acoustic sound pressure levels will cancel, to the first order, in much the same way provided phase differences between the measurement probe and the reference probe are not too great.
  • Higher orders of background noise can be reduced by common mode noise reduction. This is accomplished by providing a separate channel that is used to sample the background noise. The noise is then subtracted from the mixed noise and signal resulting in only the desired signal remaining.
  • the present invention relies on the mass air flow rather than a pressure measurement the amount of air that flows through the air gap changes in proportion to the deviation of the gap raised to the third power. Also, the change in flow is controlled by the speed of sound, the speed in which the change in flow resistance through the probe can be propagated upstream to the remainder of the pneumatic bridge. This is a faster response time than air gauges that measure pressure differential because in air pressure differential systems the pressure must integrate itself over the dead air volume of the system between the probes and the pressure sensor. Response times for the present invention are in the order of 10-15 msec whereas for a similar air gauge using a pressure differential system the response time will be in the order of 200-300 msec.
  • FIG. 2 illustrates a circuit that can be used to provide a voltage output representative of gap 62 between the measurement probe 58 and surface 66 shown in FIG. 1.
  • the mass air flow sensor 50 comprises a portion of a Wheatstone-like bridge. The bridge is formed by resistors 72, 74, 82, and 84. Resistors 82 and 84 are thermistors. A resistor made from material that has the property of changing electrical resistance as a function of temperature is a thermistor. When mass air flow represented by arrows 80 flows across the thermisters 82 and 84 the two thermisters 82 and 84 change resistance due to the heat transfer to the mass air flow.
  • the voltage between a first node 76 and a second node 78 changes as a result of the change in resistance of thermisters 82 and 84.
  • the output voltage of the bridge between the first and second nodes 76 and 78 can be offset slightly by the variable resistor 70.
  • the signal from first and second nodes 76 and 78 is amplified by amplifier 88.
  • the gain of amplifier 88 can be adjusted by variable resistor 86.
  • the output of the amplifier 88 can be conditioned by an optional electrical filter 90. The output can then be used to control other devices to take any desired action as a result of the changing gap distance 62 between the measurement probe 58 and the surface 66 illustrated in FIG. 1.
  • the desciption of air as a fluid used in the present invention is only the preferred fluid. It should be understood that any material can be used in the invention that has the properties of a fluid.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Measuring Volume Flow (AREA)
  • Measuring Arrangements Characterized By The Use Of Fluids (AREA)
US07/301,088 1989-01-25 1989-01-25 Air gauge sensor Expired - Lifetime US4953388A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
US07/301,088 US4953388A (en) 1989-01-25 1989-01-25 Air gauge sensor
CA002006962A CA2006962C (fr) 1989-01-25 1989-12-29 Sonde manometrique
EP90100945A EP0380967B1 (fr) 1989-01-25 1990-01-17 Capteur pneumatique
DE90100945T DE69004277T2 (de) 1989-01-25 1990-01-17 Pneumatischer Sensor.
JP2011964A JP2923567B2 (ja) 1989-01-25 1990-01-23 流体ゲージセンサ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/301,088 US4953388A (en) 1989-01-25 1989-01-25 Air gauge sensor

Publications (1)

Publication Number Publication Date
US4953388A true US4953388A (en) 1990-09-04

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Family Applications (1)

Application Number Title Priority Date Filing Date
US07/301,088 Expired - Lifetime US4953388A (en) 1989-01-25 1989-01-25 Air gauge sensor

Country Status (5)

Country Link
US (1) US4953388A (fr)
EP (1) EP0380967B1 (fr)
JP (1) JP2923567B2 (fr)
CA (1) CA2006962C (fr)
DE (1) DE69004277T2 (fr)

Cited By (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5022258A (en) * 1990-05-07 1991-06-11 Wilson Gardner P Gas gage with zero net gas flow
US5317898A (en) * 1992-09-21 1994-06-07 Scantech Electronics Inc. Method and apparatus for detecting thickness variation in sheet material
US5383357A (en) * 1993-12-20 1995-01-24 Doll; John A. Mass air flow sensor device
US5789661A (en) * 1997-02-14 1998-08-04 Sigmatech, Inc. Extended range and ultra-precision non-contact dimensional gauge
US6220080B1 (en) * 2000-05-12 2001-04-24 Sigma Tech, Inc. Extended range and ultra precision non contact dimensional gauge for ultra thin wafers and work pieces
US20030079525A1 (en) * 2001-10-12 2003-05-01 1 F M Electronic Gmbh Measurement apparatus and process for determining the position of an object relative to a reference surface
EP1431710A2 (fr) 2002-12-19 2004-06-23 ASML Holding N.V. Capteur de proximité avec flux de liquide pour la lithographie à immersion
US20040118184A1 (en) * 2002-12-19 2004-06-24 Asml Holding N.V. Liquid flow proximity sensor for use in immersion lithography
US20040218162A1 (en) * 2003-04-30 2004-11-04 Whitney Theodore R. Roll printer with decomposed raster scan and X-Y distortion correction
US20050044963A1 (en) * 2003-08-25 2005-03-03 Asml Holding N.V. High-resolution gas gauge proximity sensor
US20050217384A1 (en) * 2004-03-30 2005-10-06 Asml Holding N.V. Pressure sensor
US20050241371A1 (en) * 2004-04-28 2005-11-03 Asml Holding N.V. High resolution gas gauge proximity sensor
US20050274173A1 (en) * 2004-05-27 2005-12-15 Asml Holding N.V. Gas gauge proximity sensor with a modulated gas flow
US6978658B1 (en) 2004-12-20 2005-12-27 Asml Holding N.V. Proximity sensor with self compensation for mechanism instability
US20060016247A1 (en) * 2004-07-20 2006-01-26 Asml Holding N.V. Fluid gauge proximity sensor and method of operating same using a modulated fluid flow
US7017390B1 (en) 2004-12-07 2006-03-28 Asml Holding N.V. Proximity sensor nozzle shroud with flow curtain
US20070035714A1 (en) * 2005-08-11 2007-02-15 Asml Holding N.V. Lithographic apparatus and device manufacturing method utilizing a metrology system
US20070151327A1 (en) * 2005-12-29 2007-07-05 Asml Holding N.V. Gas gauge proximity sensor with internal gas flow control
US20070151328A1 (en) * 2005-12-30 2007-07-05 Asml Holding N.V. Vacuum driven proximity sensor
SG135007A1 (en) * 2002-12-19 2007-09-28 Asml Holding Nv High-resolution gas gauge proximity sensor
US20080000530A1 (en) * 2006-06-02 2008-01-03 Applied Materials, Inc. Gas flow control by differential pressure measurements
US7454959B2 (en) 2003-12-23 2008-11-25 Dionex Softron Gmbh Method and device for providing defined fluid flow, especially for use in liquid chromatography
US20090000353A1 (en) * 2007-06-27 2009-01-01 Asml Holding N.V. Increasing Gas Gauge Pressure Sensitivity Using Nozzle-Face Surface Roughness
US20090000354A1 (en) * 2004-12-15 2009-01-01 Asml Holding N.V. Method and System for Operating an Air Gauge at Programmable or Constant Standoff
US20090100908A1 (en) * 2007-10-23 2009-04-23 Michel Dechape Pneumatic gauging system a.k.a. air gaging system a.k.a. air electric converter
US20100033705A1 (en) * 2008-08-11 2010-02-11 Asml Holding N.V. Multi Nozzle Proximity Sensor Employing Common Sensing and Nozzle Shaping
US20100103399A1 (en) * 2008-10-23 2010-04-29 Asml Holding N.V. Fluid Assisted Gas Gauge Proximity Sensor
US20100110399A1 (en) * 2008-11-04 2010-05-06 Asml Holding N.V. Reverse Flow Gas Gauge Proximity Sensor
US20100139370A1 (en) * 2006-12-05 2010-06-10 Jonathan Fievez Apparatus and method for condition monitoring of a component or structure
EP2357444A1 (fr) * 2010-01-22 2011-08-17 IQ2 Patentverwaltung UG (haftungsbeschränkt) Procédé de mesure de la position relative de deux composants
WO2012174273A1 (fr) 2011-06-15 2012-12-20 Nikon Corporation Jauges de fluide à faible bruit
US20150198496A1 (en) * 2014-01-15 2015-07-16 Silicon Microstructures, Inc. Pressure testing with controlled applied fluid
US9358696B2 (en) 2009-07-31 2016-06-07 Asml Holding N.V. Low and high pressure proximity sensors
WO2016202621A1 (fr) * 2015-06-18 2016-12-22 Asml Holding N.V. Appareil comprenant une jauge de gaz et procédé de fonctionnement correspondant
US9529282B2 (en) 2013-04-25 2016-12-27 Nikon Corporation Position-measurement systems
US10466045B2 (en) 2012-01-31 2019-11-05 Nikon Corporation Fluid gauges comprising multiple differential pressure sensors
US10551182B2 (en) * 2015-11-10 2020-02-04 Asml Netherlands B.V. Proximity sensor, lithographic apparatus and device manufacturing method

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DE19608879A1 (de) * 1996-03-07 1997-09-11 Bayerische Motoren Werke Ag Vorrichtung für eine pneumatische Auflagekontrolle insbesondere eines Werkstückes
DE10155135B4 (de) * 2001-10-12 2006-04-27 Ifm Electronic Gmbh Meßeinrichtung zur Bestimmung der Position eines Objektes relativ zu einer Bezugsfläche
US7333899B2 (en) * 2004-10-13 2008-02-19 Therm-O-Disc, Incorporated Fluid flow rate sensor and method of operation
JP5070061B2 (ja) * 2005-01-21 2012-11-07 ウオーターズ・テクノロジーズ・コーポレイシヨン 可変抵抗流体コントローラ
US20080151204A1 (en) 2006-12-21 2008-06-26 Asml Netherlands B.V. Method for positioning a target portion of a substrate with respect to a focal plane of a projection system
NL1036557A1 (nl) 2008-03-11 2009-09-14 Asml Netherlands Bv Method and lithographic apparatus for measuring and acquiring height data relating to a substrate surface.
DE102012211566A1 (de) * 2012-07-03 2014-01-09 Wobben Properties Gmbh Überwachte Bauteilverbindung, Windenergieanlage, Verfahren zur Überwachung einer Bauteilverbindung auf ein ungewolltes Lösen der Bauteilverbindung im verbundenen Zustand

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US2589251A (en) * 1945-08-24 1952-03-18 Reconstruction Finance Corp Fluid operated measuring or control apparatus
US2986924A (en) * 1955-09-16 1961-06-06 Becker Wilhelm Fritz Kurt Device for location of surfaces
US3482433A (en) * 1965-09-24 1969-12-09 Burchell J Gladwyn Fluid-operated sensing system
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Cited By (87)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5022258A (en) * 1990-05-07 1991-06-11 Wilson Gardner P Gas gage with zero net gas flow
US5317898A (en) * 1992-09-21 1994-06-07 Scantech Electronics Inc. Method and apparatus for detecting thickness variation in sheet material
US5383357A (en) * 1993-12-20 1995-01-24 Doll; John A. Mass air flow sensor device
US5789661A (en) * 1997-02-14 1998-08-04 Sigmatech, Inc. Extended range and ultra-precision non-contact dimensional gauge
US6220080B1 (en) * 2000-05-12 2001-04-24 Sigma Tech, Inc. Extended range and ultra precision non contact dimensional gauge for ultra thin wafers and work pieces
US6807845B2 (en) * 2001-10-12 2004-10-26 I F M Electronic Gmbh Measurement apparatus and process for determining the position of an object relative to a reference surface
US20030079525A1 (en) * 2001-10-12 2003-05-01 1 F M Electronic Gmbh Measurement apparatus and process for determining the position of an object relative to a reference surface
US7124624B2 (en) 2002-12-19 2006-10-24 Asml Holding N.V. High-resolution gas gauge proximity sensor
US20050268698A1 (en) * 2002-12-19 2005-12-08 Asml Holding N.V. High-resolution gas gauge proximity sensor
EP1431710A3 (fr) * 2002-12-19 2004-09-15 ASML Holding N.V. Capteur de proximité avec flux de liquide pour la lithographie à immersion
EP1431709A3 (fr) * 2002-12-19 2004-09-15 ASML Holding N.V. Capteur de proximité à haute resolution avec flux de gaz
US20040118184A1 (en) * 2002-12-19 2004-06-24 Asml Holding N.V. Liquid flow proximity sensor for use in immersion lithography
US20060137430A1 (en) * 2002-12-19 2006-06-29 Asml Holding N.V. Liquid flow proximity sensor for use in immersion lithography
SG107157A1 (en) * 2002-12-19 2004-11-29 Asml Holding Nv Liquid flow proximity sensor for use in immersion lithography
CN100427881C (zh) * 2002-12-19 2008-10-22 Asml控股股份有限公司 高分辨率气量计式接近传感器
US20040118183A1 (en) * 2002-12-19 2004-06-24 Gajdeczko Boguslaw F. High-resolution gas gauge proximity sensor
KR100754044B1 (ko) * 2002-12-19 2007-08-31 에이에스엠엘 홀딩 엔.브이. 액체 흐름 근접 센서 및 스탠드오프간 차이 감지 방법
SG135007A1 (en) * 2002-12-19 2007-09-28 Asml Holding Nv High-resolution gas gauge proximity sensor
KR100754043B1 (ko) * 2002-12-19 2007-08-31 에이에스엠엘 홀딩 엔.브이. 고해상도 가스 게이지 근접 센서
US7472579B2 (en) 2002-12-19 2009-01-06 Asml Holding N.V. Liquid flow proximity sensor for use in immersion lithography
CN1296678C (zh) * 2002-12-19 2007-01-24 Asml控股股份有限公司 用于浸入式光刻的液流接近探测器
EP1431710A2 (fr) 2002-12-19 2004-06-23 ASML Holding N.V. Capteur de proximité avec flux de liquide pour la lithographie à immersion
US7010958B2 (en) * 2002-12-19 2006-03-14 Asml Holding N.V. High-resolution gas gauge proximity sensor
EP2023080A2 (fr) 2002-12-19 2009-02-11 ASML Holding N.V. Capteur de proximité de flux liquide à utiliser dans une lithographie par immersion
US7021119B2 (en) 2002-12-19 2006-04-04 Asml Holding N.V. Liquid flow proximity sensor for use in immersion lithography
US20080055578A1 (en) * 2003-04-30 2008-03-06 Whitney Theodore R Roll printer with decomposed raster scan and X-Y distortion correction
US7130020B2 (en) 2003-04-30 2006-10-31 Whitney Theodore R Roll printer with decomposed raster scan and X-Y distortion correction
US7283203B2 (en) 2003-04-30 2007-10-16 Theodore Robert Whitney Roll printer with decomposed raster scan and X-Y distortion correction
US20040218162A1 (en) * 2003-04-30 2004-11-04 Whitney Theodore R. Roll printer with decomposed raster scan and X-Y distortion correction
US20060209277A1 (en) * 2003-04-30 2006-09-21 Whitney Theodore R Roll printer with decomposed raster scan and X-Y distortion correction
US20050044963A1 (en) * 2003-08-25 2005-03-03 Asml Holding N.V. High-resolution gas gauge proximity sensor
US20080034888A1 (en) * 2003-08-25 2008-02-14 Asml Holding N.V. High-Resolution Gas Gauge Proximity Sensor
WO2005022082A1 (fr) * 2003-08-25 2005-03-10 Asml Holding N.V. Capteur de proximite a haute resolution comportant un element de mesure de gaz
US7454959B2 (en) 2003-12-23 2008-11-25 Dionex Softron Gmbh Method and device for providing defined fluid flow, especially for use in liquid chromatography
US7272976B2 (en) * 2004-03-30 2007-09-25 Asml Holdings N.V. Pressure sensor
US20050217384A1 (en) * 2004-03-30 2005-10-06 Asml Holding N.V. Pressure sensor
US20060272394A1 (en) * 2004-04-28 2006-12-07 Asml Holding N.V. High resolution gas gauge proximity sensor
US7021120B2 (en) 2004-04-28 2006-04-04 Asml Holding N.V. High resolution gas gauge proximity sensor
US7500380B2 (en) 2004-04-28 2009-03-10 Asml Holding N.V. Measuring distance using gas gauge proximity sensor
US20050241371A1 (en) * 2004-04-28 2005-11-03 Asml Holding N.V. High resolution gas gauge proximity sensor
US7021121B2 (en) 2004-05-27 2006-04-04 Asml Holding N.V. Gas gauge proximity sensor with a modulated gas flow
US20050274173A1 (en) * 2004-05-27 2005-12-15 Asml Holding N.V. Gas gauge proximity sensor with a modulated gas flow
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CA2006962C (fr) 2000-03-28
JP2923567B2 (ja) 1999-07-26
CA2006962A1 (fr) 1990-07-25
DE69004277D1 (de) 1993-12-09
EP0380967A3 (fr) 1991-01-30
EP0380967A2 (fr) 1990-08-08
JPH02232507A (ja) 1990-09-14
EP0380967B1 (fr) 1993-11-03
DE69004277T2 (de) 1994-02-24

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