US7470824B2 - Adamantane derivative and process for producing the same - Google Patents

Adamantane derivative and process for producing the same Download PDF

Info

Publication number
US7470824B2
US7470824B2 US10/540,547 US54054705A US7470824B2 US 7470824 B2 US7470824 B2 US 7470824B2 US 54054705 A US54054705 A US 54054705A US 7470824 B2 US7470824 B2 US 7470824B2
Authority
US
United States
Prior art keywords
formula
alkyl group
oxo
hydrogen
integer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime, expires
Application number
US10/540,547
Other languages
English (en)
Other versions
US20060149073A1 (en
Inventor
Shinji Tanaka
Hidetoshi Ono
Kouichi Kodoi
Naoyoshi Hatakeyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osaka Organic Chemical Industry Co Ltd
Original Assignee
Idemitsu Kosan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Idemitsu Kosan Co Ltd filed Critical Idemitsu Kosan Co Ltd
Assigned to IDEMITSU KOSAN CO., LTD. reassignment IDEMITSU KOSAN CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: HATAKEYAMA, NAOYOSHI, KODOI, KOUICHI, ONO, HIDETOSHI, TANAKA, SHINJI
Assigned to IDEMITSU KOSAN CO., LTD. reassignment IDEMITSU KOSAN CO., LTD. CORRECTIVE ASSIGNMENT TO CORRECT ASSIGNEE'S ADDRESS PREVIOUSLY RECORDED ON REEL 017355 FRAME 0004 Assignors: HATAKEYAMA, NAOYOSHI, KODOI, KOUICHI, ONO, HIDETOSHI, TANAKA, SHINJI
Publication of US20060149073A1 publication Critical patent/US20060149073A1/en
Application granted granted Critical
Publication of US7470824B2 publication Critical patent/US7470824B2/en
Assigned to OSAKA ORGANIC CHEMICAL INDUSTRY LTD. reassignment OSAKA ORGANIC CHEMICAL INDUSTRY LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: IDEMITSU KOSAN CO., LTD.
Assigned to OSAKA ORGANIC CHEMICAL INDUSTRY LTD. reassignment OSAKA ORGANIC CHEMICAL INDUSTRY LTD. CHANGE OF ADDRESS Assignors: OSAKA ORGANIC CHEMICAL INDUSTRY LTD.
Adjusted expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00Ethers; Compounds having groups, groups or groups
    • C07C43/02Ethers
    • C07C43/03Ethers having all ether-oxygen atoms bound to acyclic carbon atoms
    • C07C43/04Saturated ethers
    • C07C43/12Saturated ethers containing halogen
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00Ethers; Compounds having groups, groups or groups
    • C07C43/02Ethers
    • C07C43/18Ethers having an ether-oxygen atom bound to a carbon atom of a ring other than a six-membered aromatic ring
    • C07C43/192Ethers having an ether-oxygen atom bound to a carbon atom of a ring other than a six-membered aromatic ring containing halogen
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/385Saturated compounds containing a keto group being part of a ring
    • C07C49/517Saturated compounds containing a keto group being part of a ring containing ether groups, groups, groups, or groups
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00Systems containing at least three condensed rings
    • C07C2603/56Ring systems containing bridged rings
    • C07C2603/58Ring systems containing bridged rings containing three rings
    • C07C2603/70Ring systems containing bridged rings containing three rings containing only six-membered rings
    • C07C2603/74Adamantanes

Definitions

  • the present invention relates to a novel adamantane derivative and a process for producing the same. More specifically, the present invention relates to novel (monohalogen-substituted methyl) (adamantyl group-containing alkyl)ethers which are useful as a modifying agent for a resin for a photoresist and a dry etching resistance-improving agent in the photolithography field, agricultural and medical intermediates and other various industrial products and a process for efficiently producing the same.
  • adamantane is a highly symmetric and stable compound having a structure in which four cyclohexane rings are condensed in a cage form and that the derivatives thereof are useful as agricultural and medical raw materials and a raw material for high functional-industrial materials since it shows a specific function.
  • it has an optical characteristic and a heat resistance, so that it is tried to be used for an optical disc substrate, an optical fiber and a lens (refer to, for example, Japanese Patent Application Laid-Open No. 305044/1994 and Japanese Patent Application Laid-Open No. 302077/1997).
  • adamantane esters are tried to be used as a resin raw material for a photoresist making use of an acid sensitivity, a dry etching resistance and a UV ray transmittance thereof (refer to, for example, Japanese Patent Application Laid-Open No. 39665/1992).
  • the present invention has been made under the situations described above, and an object of the present invention is to provide a novel adamantane derivative which is useful as a modifying agent for a resin for a photoresist and a dry etching resistance-improving agent in the photolithography field, agricultural and medical intermediates and other various industrial products and a process for producing the same.
  • the present invention comprises the following scope.
  • X represents a halogen atom
  • Y represents an alkyl group having 1 to 10 carbon atoms, a halogenated alkyl group having 1 to 10 carbon atoms, a halogen atom or a hetero atom-containing group
  • R 1 to R 4 represent independently hydrogen, a halogen atom, an alkyl group having 1 to 10 carbon atoms or a halogenated alkyl group having 1 to 10 carbon atoms
  • m represents an integer of 0 to 15, and n represents an integer of 0 to 10; and excluded is a case where in Formula (I), m and n are 0 at the same time and R 3 and R 4 are a hydrogen atom at the same time.
  • R 3 and R 4 are the same as described above, and when m and n are 0 at the same time in Formula (III) described above, R 3 and R 4 are not a hydrogen atom at the same time) and hydrogen halide gas.
  • the adamantane derivatives of the present invention are the compound represented by Formula (I) (hereinafter referred to as the compound A) and the compound represented by Formula (II) (hereinafter referred to as the compound B), and both of them are novel compounds which are not described in documents.
  • the compound A, the compound B and the production processes for the same shall be explained below.
  • the compound A of the present invention is (monohalogen-substituted methyl) (adamantyl group-containing alkyl)ethers having a structure represented by Formula (I):
  • X represents a halogen atom
  • Y represents an alkyl group having 1 to 10 carbon atoms, a halogenated alkyl group having 1 to 10 carbon atoms, a halogen atom or a hetero atom-containing group
  • R 1 to R 4 represent independently hydrogen, a halogen atom, an alkyl group having 1 to 10 carbon atoms or a halogenated alkyl group having 1 to 10 carbon atoms
  • m represents an integer of 0 to 15
  • n represents an integer of 0 to 10. Excluded is a case where m and n are 0 at the same time and R 3 and R 4 are a hydrogen atom at the same time.
  • the halogen atom includes fluorine, chlorine, bromine and iodine.
  • the alkyl group having 1 to 10 carbon atoms may be either linear or branched.
  • the halogenated alkyl group having 1 to 10 carbon atoms may be a group in which the foregoing alkyl group having 1 to 10 carbon atoms is substituted with at least one halogen group in a suitable position thereof.
  • the hetero atom-containing group is a substituent containing O (oxygen), S (sulfur) or N (nitrogen). For example, it can be represented by the following formula:
  • R represents independently hydrogen, a halogen atom, an alkyl group having 1 to 10 carbon atoms or a halogenated alkyl group having 1 to 10 carbon atoms).
  • the hetero atom-containing group may be ⁇ O formed by allowing two Y's to be put together.
  • the compound A represented by Formula (I) described above includes, for example, the following compounds:
  • the compound B of the present invention is (monohalogen-substituted methyl) (adamantyl group-containing alkyl)ethers having a structure represented by Formula (II):
  • X, Y, R 1 to R 4 , m and n are the same as described above. In this case, included is a case where m and n are 0 at the same time and R 3 and R 4 are a hydrogen atom at the same time.
  • the compound B represented by Formula (II) described above includes, for example, the following compounds:
  • the production processes include the following two processes.
  • the raw material alcohol for the compound A includes the following compounds represented by Formula (III) described above:
  • the raw material alcohol for the compound B includes the following compounds represented by Formula (IV) described above:
  • the carbonyl compound described above includes formaldehyde (paraformaldehyde), acetaldehyde, acetone, propionaldehyde, n-butylaldehyde, isobutylaldehyde, ethyl methyl ketone, isopropyl methyl ketone, isobutyl methyl ketone and diethyl ketone.
  • An amount of the carbonyl compound is usually 1 to 5 moles per mole of the raw material alcohol.
  • desiccants can be used as the desiccant described above.
  • it includes anhydrous inorganic salts such as anhydrous magnesium sulfate, anhydrous iron chloride and anhydrous aluminum chloride, calcium chloride, molecular sieves, diphosphorus pentaoxide, sodium perchlorate, activated alumina, silica gel, calcium hydride and lithium aluminum hydride.
  • An amount of the desiccant is usually 0.5 to 5 moles per mole of the raw material alcohol.
  • Hydrogen halide gas is preferably dried. Capable of being adopted are a method in which it is supplied from a commercial bomb and a method in which hydrogen halide gas produced by reacting sodium halide with conc. sulfuric acid is supplied. An amount of the hydrogen halide gas is usually 1 to 20 moles per mole of the raw material alcohol. In general, hydrogen chloride gas is used as the hydrogen halide gas.
  • a solvent may not be used, but when it is used, a solvent having a solubility of 0.5 mass % or more, preferably 5 mass % or more for the raw material alcohol may be used.
  • it includes hydrocarbon base solvents such as hexane and heptane; ether base solvents such as diethyl ether and THF; and halogen base solvents such as dichloromethane and carbon tetrachloride.
  • An amount of the solvent is such an amount that a concentration of the raw material alcohol in the reaction mixture is usually 0.5 mass % or more, preferably 5 mass % or more.
  • the raw material alcohol may stay in a suspension state but is preferably dissolved. Moisture contained in the solvent is preferably removed before use.
  • the reaction temperature is usually ⁇ 200 to 200° C., preferably ⁇ 78 to 50° C. If the temperature is too low, the reaction rate is reduced, and the reaction time is extended. If the temperature is too high, side reactions are increased, and hydrogen chloride gas is reduced in a solubility in the solvent, which results in requiring a large amount of hydrogen chloride gas. Accordingly, both are not preferred.
  • the reaction pressure is usually 0.01 to 10 MPa, preferably atmospheric pressure to 1 MPa in terms of absolute pressure. If the pressure is too low, hydrogen chloride gas is reduced in a solubility, and the reaction time is extended. If the pressure is too high, a specific pressure proofing apparatus is required, and it is not economical.
  • the reaction time is usually 1 minute to 24 hours, preferably 30 minutes to 5 hours.
  • Distillation, crystallization and separation by a column can be adopted for refining the intended reaction product, and the refining method can be selected according to the properties of the product and the kind of impurities.
  • the raw material alcohol and dimethylsulfoxide are mixed and heated under the coexistence of acetic anhydride to produce a (methylthio)methyl ether compound (hereinabove, a front stage step), and the (methylthio)methyl ether compound thus obtained is reacted with sulfuryl chloride to obtain the intended chlorinated methyl ether compound (hereinabove, a rear stage step).
  • An amount of dimethylsulfoxide is usually 1 to 1,000 moles per mole of the raw material alcohol.
  • An amount of acetic anhydride is usually 1 to 1,000 moles, preferably 2 to 100 moles per mole of the raw material alcohol.
  • a solvent may not be used, but when it is used, it includes, to be specific, hydrocarbon base solvents such as hexane and heptane; ether base solvents such as diethyl ether and THF; and halogen base solvents such as dichloromethane and carbon tetrachloride.
  • An amount of the solvent may be such an amount that a concentration of the raw material alcohol is 1 to 50 mass %.
  • the reaction temperature is usually ⁇ 200 to 200° C., preferably ⁇ 78 to 50° C. If the temperature is too low, the reaction rate is reduced, and the reaction time is extended. If the temperature is too high, side reactions are increased. Accordingly, both are not preferred.
  • the reaction pressure is usually 0.01 to 10 MPa, preferably atmospheric pressure in terms of absolute pressure.
  • the reaction time is usually 6 hours to 14 days, preferably 1 to 7 days.
  • the reaction mixture is poured into a saturated sodium hydrogencarbonate aqueous solution. Solid sodium hydrogencarbonate is added thereto while stirring until foaming is not observed. Further, sodium hydroxide and diethyl ether are added thereto and stirred for 3 hours to 3 days. The diethyl ether layer is separated, and then the aqueous layer is further extracted with diethyl ether. Subsequently, the diethyl ether solution is mixed therewith, and after drying, diethyl ether is distilled off to obtain a crude product.
  • Distillation, crystallization and separation by a column can be adopted for refining the reaction product, and the refining method can be selected according to the properties of the product and the kind of impurities. Or, it can be used for reaction in the rear stage step without refining.
  • a solvent may not be used, but when it is used, it includes, to be specific, hydrocarbon base solvents such as hexane and heptane; ether base solvents such as diethyl ether and THF; and halogen base solvents such as dichloromethane and carbon tetrachloride.
  • An amount of the solvent may be such an amount that a concentration of the (methylthio)methyl ether compound is 1 to 50 mass %.
  • the reaction temperature is usually ⁇ 200 to 100° C., preferably ⁇ 78 to 30° C. If the temperature is too low, the reaction rate is reduced, and the reaction time is extended. If the temperature is too high, side reactions are increased. Accordingly, both are not preferred.
  • the reaction pressure is usually 0.01 to 10 MPa, preferably atmospheric pressure in terms of absolute pressure.
  • the reaction time is usually 1 minute to 24 hours, preferably 30 minutes to 5 hours.
  • the solvent and the light by-products can be removed by evaporation.
  • Distillation, crystallization and separation by a column can be adopted for refining the intended reaction product, and the refining method can be selected according to the properties of the product and the kind of impurities.
  • adamantane derivative [(monohalogen-substituted methyl) (adamantyl group-containing alkyl)ethers] of the present invention can efficiently be produced in the manner described above.
  • the compound thus obtained can be identified by means of gas chromatography (GC), liquid chromatography (LC), gas chromatography mass spectrometry (GC-MS), nuclear magnetic resonance spectrometry (NMR), infrared spectrometry (IR) and a melting point measuring apparatus.
  • GC gas chromatography
  • LC liquid chromatography
  • GC-MS gas chromatography mass spectrometry
  • NMR nuclear magnetic resonance spectrometry
  • IR infrared spectrometry
  • a Kjeldahl flask having a volume of 50 ml equipped with a nozzle for introducing hydrogen chloride gas was charged with 1.66 g (10 mmol) of 1-adamantylmethanol, 0.60 g (20 mmol) of paraformaldehyde, 1.20 g (10 mmol) of magnesium sulfate and 30 ml of dried dichloromethane, and it was cooled to 0° C. on an ice bath and stirred. Hydrogen chloride gas generated by mixing 10 g of sodium chloride with 50 ml of conc. sulfuric acid was blown thereinto through the nozzle for one hour.
  • a separable flask having a volume of one liter equipped with a nozzle for introducing hydrogen chloride gas was equipped with a stirring device and charged with 50.0 g (301 mmol) of 4-oxo-2-adamantanol, 13.6 g (450 mmol) of paraformaldehyde, 36.2 g (300 mmol) of magnesium sulfate and 650 ml of dried dichloromethane, and it was cooled to 0° C. on an ice bath and stirred.
  • Hydrogen chloride gas generated by mixing 300.7 g (5 mole) of sodium chloride with 700 ml of conc. sulfuric acid was blown thereinto through the nozzle for one hour.
  • the adamantane derivatives of the present invention are novel (monohalogen-substituted methyl) (adamantyl group-containing alkyl)ethers, and they are useful as a modifying agent for a resin for a photoresist and a dry etching resistance-improving agent in the photolithography field, agricultural and medical intermediates and other various industrial products.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
US10/540,547 2002-12-25 2003-12-18 Adamantane derivative and process for producing the same Expired - Lifetime US7470824B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002-374659 2002-12-25
JP2002374659 2002-12-25
PCT/JP2003/016258 WO2004058675A1 (fr) 2002-12-25 2003-12-18 Derive d'adamantane et son procede de production

Publications (2)

Publication Number Publication Date
US20060149073A1 US20060149073A1 (en) 2006-07-06
US7470824B2 true US7470824B2 (en) 2008-12-30

Family

ID=32677307

Family Applications (1)

Application Number Title Priority Date Filing Date
US10/540,547 Expired - Lifetime US7470824B2 (en) 2002-12-25 2003-12-18 Adamantane derivative and process for producing the same

Country Status (5)

Country Link
US (1) US7470824B2 (fr)
EP (1) EP1577285A4 (fr)
JP (1) JP5137982B2 (fr)
KR (1) KR20050090415A (fr)
WO (1) WO2004058675A1 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101114585B1 (ko) * 2004-02-05 2012-03-14 이데미쓰 고산 가부시키가이샤 아다만테인 유도체 및 그의 제조방법
WO2012078559A2 (fr) 2010-12-07 2012-06-14 Yale University Marquage hydrophobe de petites molécules de protéines de fusion et dégradation induite de celles-ci
GB201311888D0 (en) 2013-07-03 2013-08-14 Glaxosmithkline Ip Dev Ltd Novel compounds
GB201311891D0 (en) 2013-07-03 2013-08-14 Glaxosmithkline Ip Dev Ltd Novel compound
US20180228907A1 (en) 2014-04-14 2018-08-16 Arvinas, Inc. Cereblon ligands and bifunctional compounds comprising the same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE119008C (fr)
WO2002036533A1 (fr) 2000-10-31 2002-05-10 Daicel Chemical Industries, Ltd. Monomeres possedant des groupes suppresseurs d"electrons et leurs procedes de preparation
US20020115883A1 (en) 2001-02-22 2002-08-22 Toshiyuki Ogata Novel fluorine-containing monomeric ester compound for base resin in photoresist composition
US6440636B1 (en) 1999-11-02 2002-08-27 Kabushiki Kaisha Toshiba Polymeric compound and resin composition for photoresist

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2652432A (en) * 1953-09-15 Method of making chlokomethyl
JP3353937B2 (ja) * 1993-03-31 2002-12-09 保土谷化学工業株式会社 クロロメチルアルキルエーテルの製造方法
KR100301062B1 (ko) * 1999-07-29 2001-09-22 윤종용 백본이 환상구조를 가지는 감광성 폴리머와 이를 포함하는 레지스트 조성물

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE119008C (fr)
US6440636B1 (en) 1999-11-02 2002-08-27 Kabushiki Kaisha Toshiba Polymeric compound and resin composition for photoresist
WO2002036533A1 (fr) 2000-10-31 2002-05-10 Daicel Chemical Industries, Ltd. Monomeres possedant des groupes suppresseurs d"electrons et leurs procedes de preparation
US20020115883A1 (en) 2001-02-22 2002-08-22 Toshiyuki Ogata Novel fluorine-containing monomeric ester compound for base resin in photoresist composition

Non-Patent Citations (11)

* Cited by examiner, † Cited by third party
Title
Ben-David et al. "A novel synthesis of trifluoromethyl ethers via xanthates, utilizing BrF3" Journal of Fluorine Chemistry, 1999, vol. 97, pp. 75-78. *
Ben-David, Iris et al., "A novel synthesis of trifluoromethyl ethers via xanthates, utilizing BrF3", Journal of Fluorine Chemistry, vol. 97, No. 1-2, pp. 75-78, 1999. 0009.
Database Crossfire Beilstein, Beilstein Institut zur Foerderung der Chemischen Wissenschaften, XP002367361, Palfray, Sabetay: Bull. Soc. Chim. Fr., <4> 43, p. 900, 1928.
Farren, J.W. et al., Chloro Ethers. II. Preparation of Some New Chloro Ethers and Alkoxymethyl Esters, J. AM. Chem. Soc., vol. 47, pp. 2419-2423, 1925.
Machula, A. A. et al., "Radiochemical alkylation of adamantane by perfluorovinyl ethers", Khimiya Vysokikh Energii, vol. 24, No. 2, pp. 117-121, 1990.
McMurry, John "Organic Chemistry-Fourth Edition" Brooks/Cole Publishing Company, 1996, pp. 816-818. *
Moss, Robert A. et al., "Absolute Kinetics of Alkoxychlorocarbene Fragmentation", Journal of the American Chemical Society, vol. 118, No. 40, pp. 9792 to 9793, 1996.
Okada et al. "Amino Acids and Peptides. L. Development of a Novel N-pi-Protecting Group for Histidine, N-pi-2-Adamantyloxymethylhistidine, and Its Application to Peptide Synthesis" Chem Pharm Bull, 1997, vol. 45, pp. 452-456. *
Okada, Yoshio et al., "Amino acids and peptides. L. Development of a Novel Npi-protecting group for histidine, Npi-adamantyloxymethylhistidine, and its application to peptide synthesis", Chemical and Pharmaceutical Bulletin, vol. 45, No. 3, pp. 452 to 456, 1997.
Pericas, Miquel A. et al., Efficient synthesis of tert-alkoxy ethynes, Tetrahedron, vol. 43, No. 10, 2311 to 2316.
Rykov, S.V. et al., Photochemical reactions of some mono- and diketo derivatives of adamantane in different solvents, Izvestiya Akademii Nauk, Seriya Kimicheskaya, No. 9, pp. 1833 to 1835. 0039.

Also Published As

Publication number Publication date
JP5137982B2 (ja) 2013-02-06
JP2010095548A (ja) 2010-04-30
EP1577285A1 (fr) 2005-09-21
KR20050090415A (ko) 2005-09-13
US20060149073A1 (en) 2006-07-06
EP1577285A4 (fr) 2006-04-12
WO2004058675A1 (fr) 2004-07-15

Similar Documents

Publication Publication Date Title
US20220056008A1 (en) Process and intermediates for the synthesis of voxelotor
JP5137982B2 (ja) アダマンタン誘導体及びその製造方法
US5248832A (en) Chemical process for manufacturing trifluoroacetaldehyde hydrate or trifluoroacetalde hemiacetal
US7402712B2 (en) Adamantyl vinyl ether compound and production process for the same
JP4580165B2 (ja) アダマンタン誘導体及びその製造方法
US7312354B2 (en) Adamantane derivative and production process for the same
US10562834B2 (en) Process for preparing substituted crotonic acids
US7038091B2 (en) Process for producing acetylene compound
JP4659251B2 (ja) ヒドロキシ−4−オキサトリシクロ[4.3.1.13,8]ウンデカン−5−オン及びその(メタ)アクリル酸エステルの製造方法
US6894197B2 (en) Process for producing fluorinated alcohol
JP4002114B2 (ja) アリルアルコール類の製造方法
KR20030094370A (ko) 알킬-n-(3-디메틸아미노)알킬카르바메이트의 제조방법
US7193106B2 (en) Halogenoacetoxyadamantane derivatives and process for production thereof
JPWO2005058859A1 (ja) 3−(4−テトラヒドロピラニル)−3−オキソプロパン酸アルキル化合物及び4−アシルテトラヒドロピランの製法
EP0881207A1 (fr) Derives du 2,3-dihalogeno-6-trifluoromethylbenzene et leurs procedes de preparation
EP0019804A1 (fr) Bromuration de la chaîne latérale de m-phénoxytoluène
US6787673B2 (en) Process for producing 2-bromocyclopentanone
JP2708617B2 (ja) 4,4―ジアルキル置換チアゾリジンチオンの製造方法
JPH08151354A (ja) アミノアセトアミド誘導体の製造法
WO1996004229A1 (fr) Preparation de composes organiques
JPH04234333A (ja) β−フルオロアルコールの製造法
US20050222439A1 (en) Process for producing tetrahydropyran-4-ol, intermediate therefor, and process for producing the same
JPH1112253A (ja) 4−アミノ−5−クロロ−6−(1−フルオロエチル)ピリミジン誘導体の製法
JPH0672957A (ja) トランス−β置換アクリル酸エステル誘導体の製造方法
JP2008074756A (ja) 3,9−ビス(2−クロロエチル)−2,4,8,10−テトラオキサスピロ[5.5]ウンデカンの製造方法

Legal Events

Date Code Title Description
AS Assignment

Owner name: IDEMITSU KOSAN CO., LTD., JAPAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:TANAKA, SHINJI;ONO, HIDETOSHI;KODOI, KOUICHI;AND OTHERS;REEL/FRAME:017355/0004

Effective date: 20050616

AS Assignment

Owner name: IDEMITSU KOSAN CO., LTD., JAPAN

Free format text: CORRECTIVE ASSIGNMENT TO CORRECT ASSIGNEE'S ADDRESS PREVIOUSLY RECORDED ON REEL 017355 FRAME 0004;ASSIGNORS:TANAKA, SHINJI;ONO, HIDETOSHI;KODOI, KOUICHI;AND OTHERS;REEL/FRAME:017907/0437

Effective date: 20050616

FEPP Fee payment procedure

Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: SMALL ENTITY

STCF Information on status: patent grant

Free format text: PATENTED CASE

CC Certificate of correction
CC Certificate of correction
FPAY Fee payment

Year of fee payment: 4

AS Assignment

Owner name: OSAKA ORGANIC CHEMICAL INDUSTRY LTD., JAPAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:IDEMITSU KOSAN CO., LTD.;REEL/FRAME:033722/0526

Effective date: 20140819

FEPP Fee payment procedure

Free format text: PAT HOLDER CLAIMS SMALL ENTITY STATUS, ENTITY STATUS SET TO SMALL (ORIGINAL EVENT CODE: LTOS); ENTITY STATUS OF PATENT OWNER: SMALL ENTITY

FPAY Fee payment

Year of fee payment: 8

MAFP Maintenance fee payment

Free format text: PAYMENT OF MAINTENANCE FEE, 12TH YR, SMALL ENTITY (ORIGINAL EVENT CODE: M2553); ENTITY STATUS OF PATENT OWNER: SMALL ENTITY

Year of fee payment: 12

AS Assignment

Owner name: OSAKA ORGANIC CHEMICAL INDUSTRY LTD., JAPAN

Free format text: CHANGE OF ADDRESS;ASSIGNOR:OSAKA ORGANIC CHEMICAL INDUSTRY LTD.;REEL/FRAME:059721/0809

Effective date: 20211122