WO1992015920A3 - Element photosensible epluchable - Google Patents

Element photosensible epluchable Download PDF

Info

Publication number
WO1992015920A3
WO1992015920A3 PCT/US1992/001409 US9201409W WO9215920A3 WO 1992015920 A3 WO1992015920 A3 WO 1992015920A3 US 9201409 W US9201409 W US 9201409W WO 9215920 A3 WO9215920 A3 WO 9215920A3
Authority
WO
WIPO (PCT)
Prior art keywords
photosensitive element
peel
layer
apart photosensitive
apart
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US1992/001409
Other languages
English (en)
Other versions
WO1992015920A2 (fr
Inventor
Charles D Lang
Scott Dixon Mccalmont
John Choi
Anchi Hou
Alan Shobert
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of WO1992015920A2 publication Critical patent/WO1992015920A2/fr
Publication of WO1992015920A3 publication Critical patent/WO1992015920A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F3/00—Colour separation; Correction of tonal value
    • G03F3/10—Checking the colour or tonal value of separation negatives or positives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Dicing (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Element Separation (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

Elément multicouche photosensible comprenant une couche de couverture, une couche photodurcissante, une couche contiguë, une couche d'isolation, une couche adhésive et un support. Cet élément sert à la reproduction d'images.
PCT/US1992/001409 1991-03-04 1992-03-04 Element photosensible epluchable Ceased WO1992015920A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US66399991A 1991-03-04 1991-03-04
US663,999 1991-03-04

Publications (2)

Publication Number Publication Date
WO1992015920A2 WO1992015920A2 (fr) 1992-09-17
WO1992015920A3 true WO1992015920A3 (fr) 1992-10-29

Family

ID=24664096

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1992/001409 Ceased WO1992015920A2 (fr) 1991-03-04 1992-03-04 Element photosensible epluchable

Country Status (3)

Country Link
EP (1) EP0574546A1 (fr)
AU (1) AU1787292A (fr)
WO (1) WO1992015920A2 (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9225687D0 (en) * 1992-12-09 1993-02-03 Minnesota Mining & Mfg Peel-apart proofing system
WO1996010214A1 (fr) * 1994-09-27 1996-04-04 Agfa-Gevaert Naamloze Vennootschap Systeme de tirage d'epreuve pour verification des couleurs en mode superposition a l'aide d'un procede negatif
WO1996010215A1 (fr) * 1994-09-27 1996-04-04 Agfa-Gevaert Naamloze Vennootschap Systeme de tirage d'epreuve pour verification des couleurs en mode surimpression a l'aide d'un procede negatif
WO1996010216A1 (fr) * 1994-09-27 1996-04-04 Agfa-Gevaert Naamloze Vennootschap Systeme de tirage d'epreuve pour verification des couleurs en mode surimpression a l'aide d'un procede negatif ou positif
US5939232A (en) * 1996-07-03 1999-08-17 E. I. Du Pont De Nemours And Company Photosensitive elements and their process of use
EP0890878A3 (fr) * 1997-07-08 1999-01-20 Agfa-Gevaert N.V. Matériau de développement et procédé pour réaliser une épreuve couleur négative ainsi qu'un procédé pour réaliser aussi bien une épreuve couleur négative qu'une épreuve positive sur un récepteur commun
US6001532A (en) * 1997-09-25 1999-12-14 E.I. Dupont De Nemours And Company Peel-apart photosensitive elements and their process of use
US5965321A (en) * 1997-09-25 1999-10-12 E. U. Du Pont De Nemours And Company Peel-apart photosensitive elements and their process of use
US6100006A (en) * 1999-08-19 2000-08-08 E. I. Du Pont De Nemours And Company Peel-apart photosensitive elements and their process of use

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
No relevant documents disclosed *

Also Published As

Publication number Publication date
EP0574546A1 (fr) 1993-12-22
WO1992015920A2 (fr) 1992-09-17
AU1787292A (en) 1992-10-06

Similar Documents

Publication Publication Date Title
GB2291357A (en) Wound dressing
AU698972C (en) Multilayer film
EP0385466A3 (fr) Elément photosensible pour la reproduction avec couche dépouillable photosensible
AU4524296A (en) Multilayered optical film
NO890636L (no) Fremgangsmaate for fremstilling av en metallisert polyolefinfilm og en saaledes fremstilt film.
AU8856991A (en) Photographic film cassette
AU656488B2 (en) Photographic light-sensitive elements
EP1152294A3 (fr) Matériau photosensible pour l'enregistrement d'images
AU1077097A (en) Multilayer hydrodisintegratable film
WO1992015920A3 (fr) Element photosensible epluchable
AU6709194A (en) Multilayer film structure
AU4291196A (en) Heat sealable multilayer film containing polyvinyl alcohol layer
EP0586040A3 (fr) Assemblage de film en feuille pour film auto-développable séparable pour arrachement.
DE69433757D1 (de) Photographischer Papierschichtträger
DE69610452D1 (de) Mehrschichtfolie
AU8380291A (en) Improved image reproduction process using a peel-apart photosensitive element
AU2721892A (en) Film cassette
EP0259853A3 (fr) Lamination d'un film photopolymérisable sur un substrat à l'aide d'une couche intermédiaire liquide photosensible
CA2320331A1 (fr) Matiere photographique moulable
AU1041592A (en) Film cassette
AU5595996A (en) Adhesive film for adhesive bandage and adhesive bandage using said adhesive film
JPS5933041U (ja) マスク層を有する製版用感光材料
DE69620950D1 (de) Filmkassette
AU3316595A (en) Photosensitive films having a thermally sensitive material containing layer and process for using the same
NO900519L (no) Fremgangsmaate ved belegning av en film.

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AU CA JP

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): AT BE CH DE DK ES FR GB GR IT LU MC NL SE

AK Designated states

Kind code of ref document: A3

Designated state(s): AU CA JP

AL Designated countries for regional patents

Kind code of ref document: A3

Designated state(s): AT BE CH DE DK ES FR GB GR IT LU MC NL SE

DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
WWE Wipo information: entry into national phase

Ref document number: 1992910541

Country of ref document: EP

WWP Wipo information: published in national office

Ref document number: 1992910541

Country of ref document: EP

NENP Non-entry into the national phase in:

Ref country code: CA

WWW Wipo information: withdrawn in national office

Ref document number: 1992910541

Country of ref document: EP