WO1993014237A1 - Procede de traitement par passivation utilise dans la prevention de la corrosion de films en aluminium et d'alliages d'aluminium apres gravure au plasma - Google Patents

Procede de traitement par passivation utilise dans la prevention de la corrosion de films en aluminium et d'alliages d'aluminium apres gravure au plasma Download PDF

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Publication number
WO1993014237A1
WO1993014237A1 PCT/RU1992/000008 RU9200008W WO9314237A1 WO 1993014237 A1 WO1993014237 A1 WO 1993014237A1 RU 9200008 W RU9200008 W RU 9200008W WO 9314237 A1 WO9314237 A1 WO 9314237A1
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WIPO (PCT)
Prior art keywords
aluminum
gas
mixture
aluminium
radiation
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PCT/RU1992/000008
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English (en)
Russian (ru)
Inventor
Dmitry Jurievich Zaroslov
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Priority to PCT/RU1992/000008 priority Critical patent/WO1993014237A1/fr
Publication of WO1993014237A1 publication Critical patent/WO1993014237A1/fr
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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/20—Cleaning during device manufacture
    • H10P70/27—Cleaning during device manufacture during, before or after processing of conductive materials, e.g. polysilicon or amorphous silicon layers
    • H10P70/273—Cleaning during device manufacture during, before or after processing of conductive materials, e.g. polysilicon or amorphous silicon layers the processing being a delineation of conductive layers, e.g. by RIE
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00

Definitions

  • ⁇ aib ⁇ lee e ⁇ e ⁇ ivn ⁇ nas ⁇ yaschee iz ⁇ b ⁇ e ⁇ enie m ⁇ zhe ⁇ by ⁇ 15 is ⁇ lz ⁇ van ⁇ in ⁇ izv ⁇ ds ⁇ ve ⁇ ve ⁇ d ⁇ elny ⁇ ⁇ lu ⁇ v ⁇ dni ⁇ - vy ⁇ ⁇ ib ⁇ v and in ⁇ eg ⁇ alny ⁇ s ⁇ em, ⁇ ns ⁇ u ⁇ tsiya.
  • the plasma which has the minimum size of the elements that are at the same time, is smaller and smaller, the plasma is used, which Particularly, plasma melting of films of aluminum and aluminum alloys is carried out with mixtures of combustible gases. Disposal of gases occurs as a result of chemical reactions of atoms or by-products of the process, which are formed in the plasma of these gases,
  • the other components obtained from this method are aluminum or aluminum alloys, which have a large degree of accessibility to the industrial environment. In fact, in addition to 15, it is possible to take into account the presence of metal and copper, in particular aluminum and copper, and it is not possible to remove the product.
  • ns ⁇ causes an active transition of aluminum.
  • the indicated disease is developed exceptionally and increases the resistance and the risk of damage to components, resulting in loss of life.
  • ⁇ case is ⁇ lz ⁇ vaniya 0 s ⁇ lav ⁇ v alshiniya copper ⁇ ziya ⁇ yavlyae ⁇ sya naib ⁇ lee siln ⁇ , ⁇ s ⁇ l ⁇ u ⁇ l ⁇ e ⁇ m in case ⁇ l ⁇ s ⁇ bi ⁇ ue ⁇ - ⁇ ve ⁇ n ⁇ s ⁇ yu me ⁇ alla Xia, and n ⁇ vned ⁇ yae ⁇ sya it ⁇ g ⁇ anitsam medny ⁇ v ⁇ lyucheny always ⁇ isu ⁇ s ⁇ vuyuschi ⁇ due neidealn ⁇ - s ⁇ i s ⁇ lava.
  • the passivation is carried out in the same chamber, the plasma pressure of the film of aluminum or aluminum alloy was increased. It is proposed that an atomic filter is used in a plasma that burns out - 5 - gas, and which is chemically more active than cold, replaces the oxygen atoms in the compounds connected to the supplied food. ⁇ ⁇ ⁇ ⁇ ,,,,, ⁇ ⁇ ⁇ ⁇ process
  • the wall 0 of the camera connections is non-configurable; Slish ⁇ m ⁇ d ⁇ lzhi ⁇ eln ⁇ e e ⁇ e ⁇ ni ⁇ vanie ⁇ dl ⁇ zh ⁇ i in ⁇ a ⁇ y sh ⁇ azme m ⁇ zhe ⁇ ⁇ ives ⁇ i not ⁇ l ⁇ ⁇ v ⁇ ezhdeniyu ⁇ , ⁇ and n ⁇ ⁇ l- 5 n ⁇ mu s ⁇ avlivaniyu diele ⁇ iches ⁇ g ⁇ sl ⁇ ya s ⁇ e ⁇ la IL ⁇ si- ⁇ emniya yes, ⁇ y ⁇ mi ⁇ uyu ⁇ on ⁇ ve ⁇ n ⁇ s ⁇ i ⁇ las ⁇ iny ⁇ e ⁇ ed na ⁇ yleni
  • a basic task has been posed for the creation of an efficient passive processing system for a dairy plant - ⁇ - ⁇ ed ⁇ z ⁇ ascheniya ⁇ zii ⁇ len ⁇ alyumin ⁇ ya and alshinievy ⁇ s ⁇ l v ⁇ z ⁇ sle ⁇ lazme ⁇ n ⁇ g ⁇ ⁇ avleniya with ⁇ imeneniem ⁇ a ⁇ i ⁇ ⁇ izi- ⁇ - ⁇ imiches ⁇ i ⁇ ⁇ tsess ⁇ v ⁇ b ⁇ ab ⁇ i ⁇ ve ⁇ n ⁇ s ⁇ i ⁇ dl ⁇ zh ⁇ i, ⁇ ye ⁇ iv ⁇ dya ⁇ ⁇ e ⁇ e ⁇ ivn ⁇ u removal and / ⁇ L ⁇ deza ⁇ iva- 5 tsi ⁇ s ⁇ bi ⁇ vanny ⁇ on ⁇ ze ⁇ n ⁇ s ⁇ i ⁇ dl ⁇ zh ⁇ i s ⁇ edineny ⁇ l ⁇ - ⁇ a, inschii ⁇
  • E ⁇ a task ⁇ eshena s ⁇ zdaniem s ⁇ s ⁇ ba ⁇ assivi ⁇ uyuschey0 ⁇ b ⁇ ab ⁇ i for ⁇ ed ⁇ v ⁇ ascheniya ⁇ zii ⁇ len ⁇ aluminum and alsh ⁇ ievn ⁇ s ⁇ lav ⁇ z ⁇ sle ⁇ lazgle ⁇ g ⁇ ⁇ avleniya, v ⁇ lyuchayu- scheg ⁇ s ⁇ zdanie ⁇ ea ⁇ tsi ⁇ nn ⁇ y z ⁇ ny, za ⁇ lnenn ⁇ y gaz ⁇ m not s ⁇ zhuli ⁇ uyuschim ⁇ ziyu ⁇ len ⁇ i alshiniya or alyuminiev ⁇ g ⁇ s ⁇ lava, ⁇ azmeschenie ⁇ b ⁇ aba ⁇ yvaem ⁇ y ⁇ dl ⁇ zh ⁇ i with ⁇ len ⁇ y alu-minum 5 or alshiniev ⁇ g ⁇ s ⁇ lava
  • the use, according to the invention, of the emission of radiation with the indicated long wavelength means that there is no direct loss of energy for the purpose of non-dispossessed disposal of energy. By doing so, the energy indicated is given in this form, which allows you to completely remove and / or deactivate all specified connections.
  • ⁇ The result of such irradiation is that a film of aluminum and an alluvium alloy is affected, a material that is stimulated and impaired is impaired.
  • Type ⁇ passive- _ 7 - its general operations and its physical properties depend on the flow of gas filling the reactive zone.
  • ⁇ sli gas ⁇ aches ⁇ ve, za ⁇ lnyayuscheg ⁇ ⁇ ea ⁇ tsi ⁇ nnuyu z ⁇ nu, is ⁇ lz ⁇ van gas not vs ⁇ u ⁇ ayuschy ⁇ i ⁇ bluchenii in ⁇ imiches ⁇ e Yu vzaim ⁇ deys ⁇ vie with ma ⁇ e ⁇ ial ⁇ m ⁇ dl ⁇ zh ⁇ i and aluminum or ⁇ len ⁇ i alyuminiev ⁇ g ⁇ s ⁇ lava, ⁇ ⁇ assivi ⁇ uyuschee ⁇ y ⁇ ie ⁇ b ⁇ azue ⁇ - camping in ⁇ ezul ⁇ a ⁇ e ⁇ b ⁇ az ⁇ vaniya es ⁇ es ⁇ venn ⁇ g ⁇ ⁇ sida alshiniya ⁇ lschin ⁇ y ⁇ l ⁇ I nm.
  • refrigerant connections are assembled on a ready-to-use basis, they are provided as a general condition of the metal, however, 5%
  • the radiation used is absorbed by gas, filling the entire area, as well as by the compliant, which is made up of the used components.
  • the compliant which is made up of the used components.
  • the wavelength of the radiation used is not less than 105 nm. With a decrease in the wavelength of radiation, the radiation damage of the oxide or the glass, which is also in charge, is lost, the radiation is damaged.
  • the direct, practical implementation of the passivation method involves the input of radiation from its source into the waste zone. It is advisable that radiation be introduced - 10 - through an oppositely-designed, opaque, hermetic separating source of radiation from the gas, filling up the waste zone, in order to prevent the influence of the emitted gas from it.
  • 5 materials are known, but rather effective for radiation with a wavelength of less than 105 nm, which could have been used for shipping.
  • the invention is desirable in order to initiate the passivation of the temperature of the film of Alshin or Alshin alloy, the temperature was increased to 20-200 ° C and maintained at this level of improvement.
  • the process of desorption is not stimulated from the outside by the acceleration of 0 when the temperature is increased in the main due to the disconnection of the devices due to This effect begins to occur when the temperature is sufficiently high, and the material is subject to intense evaporation.
  • the aluminum alloy that is produced is a convenient compound and does not only cause aluminum in the next process, but, in general,
  • ⁇ sli length v ⁇ lny is ⁇ lzue- m ⁇ g ⁇ radiation less than 260 nm, ⁇ s ⁇ s ⁇ e ⁇ g ⁇ ⁇ tsessa uvelichivae ⁇ sya, ⁇ a ⁇ ⁇ a ⁇ ene ⁇ giya ⁇ na s ⁇ an ⁇ vi ⁇ sya d ⁇ s ⁇ a ⁇ ch- n ⁇ i for ⁇ diss ⁇ tsiatsii m ⁇ le ⁇ ulya ⁇ n ⁇ g ⁇ ⁇ isl ⁇ da and ⁇ b ⁇ a- binder ⁇ i e ⁇ m a ⁇ ma ⁇ ny ⁇ isl ⁇ d b ⁇ lee e ⁇ e ⁇ ivn ⁇
  • the surface of the plate may be slightly contaminated with the plugs
  • the optimal composition of the gas mixture that fills the reactive zone depends on the type of pollution of the atmosphere.
  • the most effective passivation is that you are at risk of suffering from mild illness, and that you have a little chance of fatal illness. - 13 - a passivating process. In the other case, the most effective is the passivation of the product, which is hazardous due to the risk of aluminum contamination due to acid-hazardous material.
  • the 20th zone filled with a mixture of gases, consists of a quick change of gas, taken out of the group of gases consisting of nitrogen oxides. All nitrogen oxides, excluding nitrogen monoxide ( ⁇ ), when irradiated with a wavelength of 300 nm or less, are disposed of in
  • the incident and the irradiation are not weekly ⁇ carbohydrate- - 14 - ⁇ d ⁇ v ⁇ is ⁇ di ⁇ ⁇ b ⁇ az ⁇ vanye s ⁇ ve ⁇ s ⁇ vzgyuschi ⁇ bi ⁇ adi ⁇ al ⁇ v, sv ⁇ b ⁇ dyaye communication ⁇ y ⁇ ⁇ b ⁇ azuyu ⁇ sya ⁇ mes ⁇ u ⁇ as ⁇ l ⁇ zheniya dv ⁇ yn ⁇ y ferrari ⁇ yn ⁇ y zggle ⁇ d-ugle ⁇ dn ⁇ y connection.
  • the quantum efficiency of this process is one unit, even if the wavelength used is less than 190 nm.
  • the emission spectrum of this source was supplied in the main two times with an output of 254 nm and 185 nm, the total intensity of the output was 5 mt / cm.
  • the active zone which was set to 15 between the source and the processed one, was slightly less than 10, but it was slightly less. Because it does not stimulate alcine and is used for the use of radiation.
  • ⁇ ⁇ lichie ⁇ ⁇ ime ⁇ a I ⁇ b ⁇ aba ⁇ yvaemaya ⁇ dl ⁇ zh ⁇ a was za ⁇ e ⁇ lena in ⁇ ea ⁇ tsi ⁇ nn ⁇ y z ⁇ ne on s ⁇ le, ⁇ em ⁇ e ⁇ a ⁇ zg ⁇ a ⁇ - 10 ⁇ g ⁇ m ⁇ gla ⁇ dde ⁇ zhiva ⁇ sya dialaz ⁇ ne at 20-200 ° C and s ⁇ ve ⁇ - s ⁇ v ⁇ vala ⁇ em ⁇ e ⁇ a ⁇ u ⁇ e ⁇ avn ⁇ me ⁇ n ⁇ nag ⁇ e ⁇ y ⁇ dsch ⁇ zh ⁇ i.
  • the temperature of the device was increased to the required value and maintained for the duration of the test.
  • 15 equal to 20 ° C
  • a high temperature stability of the aluminum film was achieved, even if it was less than 5 minutes.
  • the required time for passivation was 1.5 minutes.
  • a film of 0 aluminum szhava was used, containing mass 0 : Si - 1.0; 8
  • ⁇ ⁇ lichie ⁇ ⁇ ime ⁇ a 2 ⁇ aches ⁇ ve is ⁇ chni ⁇ a izlzgcheniya was is ⁇ lz ⁇ vana v ⁇ d ⁇ ddaya.lam ⁇ a with ⁇ n ⁇ m, vy ⁇ lneshshm of m ⁇ n ⁇ is ⁇ alliches ⁇ g ⁇ ⁇ is ⁇ g ⁇ zh ⁇ iya, ⁇ v ⁇ ln ⁇ vaya g ⁇ anitsa ⁇ iches ⁇ y ⁇ z ⁇ achn ⁇ ch ⁇ i ⁇ g ⁇ ⁇ avna 105 nm with 5 ⁇ ⁇ ebuem ⁇ m dia ⁇ az ⁇ ne v ⁇ zh lengths 105-300 nm e ⁇ is ⁇ chni ⁇ izluchae ⁇ with in ⁇ ensivn ⁇ s ⁇ yu m ⁇ 2 / see continuous waveform, a strong resonance water line with a wavelength of 121.6 nm and an intense radiation wavelength of 160 nm are distinguished on
  • the residual thickness of the plasma after the introduction of plasma was equal to I ⁇ m.
  • Example 3 The best result of Example 3 with the use of aluminum after removal of aluminum has been removed by eliminating the pressure from the oxygen mask in the oxygen plasma.
  • the zone was
  • the processing unit 30 is filled with a mixture of gases consisting of nitrogen ( ⁇ ,) and oxygen ( ⁇ ), with a partial pressure of 0.85 kPa and 0.15% Pa (85 and 15%) (85 and 15%).
  • the processing unit is equipped with a flat plate for maintenance of equal réellecht00 ° C.
  • Example 5 is a mixture of gases, filling the 20 primary zone, consisted of acetylene (C ⁇ ⁇ ⁇ ) and nitrogen nitrate ( ⁇ ,). The high speed of the film was achieved, and Alshin was reached upon receipt of the service under the specified conditions for 1.5 minutes.
  • P ⁇ myshlennaya ⁇ imenim ⁇ s ⁇ ⁇ aib ⁇ lee e ⁇ e ⁇ ivn ⁇ nas ⁇ yaschee iz ⁇ b ⁇ e ⁇ enie m ⁇ zhe ⁇ by ⁇ 30 is ⁇ lz ⁇ vaya ⁇ in ⁇ izv ⁇ ds ⁇ ve ⁇ ve ⁇ d ⁇ elny ⁇ ⁇ lzg ⁇ v ⁇ dni ⁇ - vy ⁇ ⁇ ib ⁇ v and in ⁇ eg ⁇ alny ⁇ s ⁇ em, ⁇ ns ⁇ u ⁇ tsiya ⁇ y ⁇ s ⁇ de ⁇ zhi ⁇ ⁇ v ⁇ dyaschie ⁇ n ⁇ len ⁇ chnye elemen ⁇ y, izg ⁇ vleya- ⁇ ye of IL alshiniya alyuminiev ⁇ g ⁇ s ⁇ lava me ⁇ d ⁇ m ⁇ lazmen- n ⁇ g ⁇ ⁇ avleniya na ⁇ ylenn ⁇ y on ⁇ d

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Junction Field-Effect Transistors (AREA)

Abstract

Le procédé de l'invention de traitement par passivation utilisé pour empêcher la corrosion de films en aluminium ou d'alliages d'aluminium après gravure au plasma consiste à préparer une zone de réaction remplie d'un gaz ne stimulant pas la corrosion de l'aluminium ou d'un alliage d'aluminium, à mettre dans la zone de réaction la sous-couche présentant l'aluminium ou l'alliage d'aluminium à traiter, et à stimuler la passivation du film d'aluminium ou d'alliage d'aluminium dans le milieu gazeux de la zone de réaction en soumettant la sous-couche à un rayonnement d'une longueur d'onde comprise entre 105 et 300 nm.
PCT/RU1992/000008 1992-01-16 1992-01-16 Procede de traitement par passivation utilise dans la prevention de la corrosion de films en aluminium et d'alliages d'aluminium apres gravure au plasma Ceased WO1993014237A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/RU1992/000008 WO1993014237A1 (fr) 1992-01-16 1992-01-16 Procede de traitement par passivation utilise dans la prevention de la corrosion de films en aluminium et d'alliages d'aluminium apres gravure au plasma

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/RU1992/000008 WO1993014237A1 (fr) 1992-01-16 1992-01-16 Procede de traitement par passivation utilise dans la prevention de la corrosion de films en aluminium et d'alliages d'aluminium apres gravure au plasma

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4351696A (en) * 1981-10-28 1982-09-28 Fairchild Camera & Instrument Corp. Corrosion inhibition of aluminum or aluminum alloy film utilizing bromine-containing plasma
EP0146115A2 (fr) * 1983-12-16 1985-06-26 Showa Aluminum Corporation Procédé pour produire une pièce en aluminium utilisable sous vide
DE3537584A1 (de) * 1984-11-02 1986-05-07 Oerlikon-Buhrle U.S.A. Inc., New York, N.Y. Verfahren zur verhinderung einer korrosion nach durchfuehrung einer aluminium-aetzung
US4687544A (en) * 1985-05-17 1987-08-18 Emergent Technologies Corporation Method and apparatus for dry processing of substrates

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4351696A (en) * 1981-10-28 1982-09-28 Fairchild Camera & Instrument Corp. Corrosion inhibition of aluminum or aluminum alloy film utilizing bromine-containing plasma
EP0146115A2 (fr) * 1983-12-16 1985-06-26 Showa Aluminum Corporation Procédé pour produire une pièce en aluminium utilisable sous vide
DE3537584A1 (de) * 1984-11-02 1986-05-07 Oerlikon-Buhrle U.S.A. Inc., New York, N.Y. Verfahren zur verhinderung einer korrosion nach durchfuehrung einer aluminium-aetzung
US4687544A (en) * 1985-05-17 1987-08-18 Emergent Technologies Corporation Method and apparatus for dry processing of substrates

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