WO1999059191A3 - Procede et dispositif de sechage de couches photoresistantes - Google Patents

Procede et dispositif de sechage de couches photoresistantes Download PDF

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Publication number
WO1999059191A3
WO1999059191A3 PCT/DE1999/001485 DE9901485W WO9959191A3 WO 1999059191 A3 WO1999059191 A3 WO 1999059191A3 DE 9901485 W DE9901485 W DE 9901485W WO 9959191 A3 WO9959191 A3 WO 9959191A3
Authority
WO
WIPO (PCT)
Prior art keywords
temperature
infrared radiation
photoresist
drying
photoresist coatings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE1999/001485
Other languages
German (de)
English (en)
Other versions
WO1999059191A2 (fr
Inventor
Bernd Loechel
Andreas Maciossek
Gerhard Bleidiessel
Wilhelmus Wilbers
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer-Gesellschaft zur Förderung der Angewandten Forschung eV
Original Assignee
Fraunhofer-Gesellschaft zur Förderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer-Gesellschaft zur Förderung der Angewandten Forschung eV filed Critical Fraunhofer-Gesellschaft zur Förderung der Angewandten Forschung eV
Priority to JP2000548909A priority Critical patent/JP2002515646A/ja
Priority to EP99936266A priority patent/EP1145284A3/fr
Publication of WO1999059191A2 publication Critical patent/WO1999059191A2/fr
Anticipated expiration legal-status Critical
Publication of WO1999059191A3 publication Critical patent/WO1999059191A3/fr
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0602—Temperature monitoring
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0436—Apparatus for thermal treatment mainly by radiation

Landscapes

  • Drying Of Solid Materials (AREA)

Abstract

L'invention concerne un procédé et un dispositif de séchage de couches photorésistantes, selon lequel un substrat (12) doté de la couche photorésistante est exposé au rayonnement infrarouge d'une source de rayonnement infrarouge de puissance réglable. Pendant le séchage, la température à proximité de la couche photorésistante est mesurée et la puissance de la source de rayonnement infrarouge est commandée à l'aide de la température de façon à obtenir un cycle thermique actuel donné. Le dispositif selon l'invention comprend une unité de commande (8) et un dispositif de mesure de température (6, 7). Le procédé selon l'invention et le dispositif associé permettent de sécher de façon optimale et en un courts laps de temps notamment des couches photorésistantes épaisses (≥20 νm). Le masque photorésistant réalisé ensuite a ainsi une résolution élevée.
PCT/DE1999/001485 1998-05-12 1999-05-12 Procede et dispositif de sechage de couches photoresistantes Ceased WO1999059191A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2000548909A JP2002515646A (ja) 1998-05-12 1999-05-12 フォトレジスト層を乾燥するための方法及び装置
EP99936266A EP1145284A3 (fr) 1998-05-12 1999-05-12 Procede et dispositif de sechage de couches photoresistantes

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19821237.2 1998-05-12
DE19821237A DE19821237C1 (de) 1998-05-12 1998-05-12 Verfahren und Vorrichtung zur Trocknung von Photoresistschichten

Publications (2)

Publication Number Publication Date
WO1999059191A2 WO1999059191A2 (fr) 1999-11-18
WO1999059191A3 true WO1999059191A3 (fr) 2001-08-23

Family

ID=7867509

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE1999/001485 Ceased WO1999059191A2 (fr) 1998-05-12 1999-05-12 Procede et dispositif de sechage de couches photoresistantes

Country Status (4)

Country Link
EP (1) EP1145284A3 (fr)
JP (1) JP2002515646A (fr)
DE (1) DE19821237C1 (fr)
WO (1) WO1999059191A2 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118689038B (zh) * 2024-08-26 2025-01-28 西北工业大学 大幅面高深微纳结构制造方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6370940A (ja) * 1986-09-11 1988-03-31 Pioneer Electronic Corp レジスト原盤の熱処理装置
JPS63221618A (ja) * 1987-03-10 1988-09-14 Mitsubishi Electric Corp レジスト加熱装置
US4926567A (en) * 1985-07-04 1990-05-22 Fuji Photo Film Co., Ltd. Process and apparatus for drying coated web
US5166523A (en) * 1990-02-14 1992-11-24 Hoechst Aktiengesellschaft Device for burning in light-sensitive layers in the production of printing forms
JPH05251333A (ja) * 1992-03-06 1993-09-28 Fujitsu Ltd 半導体製造装置および処理方法
DE19516193A1 (de) * 1994-05-13 1995-11-16 Schaefer Hans Juergen Verfahren und Vorrichtung zum Beschichten von Leiterplatten, insbesondere zur Herstellung von Multi-Chip-Modulen
US5540782A (en) * 1992-10-15 1996-07-30 Tokyo Electron Kabushiki Kaisha Heat treating apparatus having heat transmission-preventing plates
US5705232A (en) * 1994-09-20 1998-01-06 Texas Instruments Incorporated In-situ coat, bake and cure of dielectric material processing system for semiconductor manufacturing

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0509962A1 (fr) * 1991-04-15 1992-10-21 Ciba-Geigy Ag Procédé et appareil pour produire un revêtement mince photosensible pour l'enregistrement de l'image sur un substrat revêtus de métal

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4926567A (en) * 1985-07-04 1990-05-22 Fuji Photo Film Co., Ltd. Process and apparatus for drying coated web
JPS6370940A (ja) * 1986-09-11 1988-03-31 Pioneer Electronic Corp レジスト原盤の熱処理装置
JPS63221618A (ja) * 1987-03-10 1988-09-14 Mitsubishi Electric Corp レジスト加熱装置
US5166523A (en) * 1990-02-14 1992-11-24 Hoechst Aktiengesellschaft Device for burning in light-sensitive layers in the production of printing forms
JPH05251333A (ja) * 1992-03-06 1993-09-28 Fujitsu Ltd 半導体製造装置および処理方法
US5540782A (en) * 1992-10-15 1996-07-30 Tokyo Electron Kabushiki Kaisha Heat treating apparatus having heat transmission-preventing plates
DE19516193A1 (de) * 1994-05-13 1995-11-16 Schaefer Hans Juergen Verfahren und Vorrichtung zum Beschichten von Leiterplatten, insbesondere zur Herstellung von Multi-Chip-Modulen
US5705232A (en) * 1994-09-20 1998-01-06 Texas Instruments Incorporated In-situ coat, bake and cure of dielectric material processing system for semiconductor manufacturing

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
BLEIDIESSEL G ET AL: "Dependence of the quality of thick resist structures on resist baking", MICROELECTRONIC ENGINEERING, vol. 41-42, 1 March 1998 (1998-03-01), pages 433-436, XP004111750, ISSN: 0167-9317 *
PATENT ABSTRACTS OF JAPAN vol. 012, no. 298 (P - 744) 15 August 1988 (1988-08-15) *
PATENT ABSTRACTS OF JAPAN vol. 013, no. 016 (E - 703) 13 January 1989 (1989-01-13) *
PATENT ABSTRACTS OF JAPAN vol. 018, no. 008 (E - 1486) 7 January 1994 (1994-01-07) *

Also Published As

Publication number Publication date
EP1145284A2 (fr) 2001-10-17
JP2002515646A (ja) 2002-05-28
WO1999059191A2 (fr) 1999-11-18
DE19821237C1 (de) 2000-03-02
EP1145284A3 (fr) 2002-09-11

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