WO2001027964A3 - Elektronenstossionenquelle - Google Patents

Elektronenstossionenquelle Download PDF

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Publication number
WO2001027964A3
WO2001027964A3 PCT/DE2000/003525 DE0003525W WO0127964A3 WO 2001027964 A3 WO2001027964 A3 WO 2001027964A3 DE 0003525 W DE0003525 W DE 0003525W WO 0127964 A3 WO0127964 A3 WO 0127964A3
Authority
WO
WIPO (PCT)
Prior art keywords
electron beam
axial
symmetric
ion
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE2000/003525
Other languages
English (en)
French (fr)
Other versions
WO2001027964A2 (de
Inventor
Guenter Zschornack
Vladimir Petrovich Ovsyannikov
Frank Grossmann
Oleg Konstantinovi Koulthachev
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Technische Universitaet Dresden
Original Assignee
Technische Universitaet Dresden
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Technische Universitaet Dresden filed Critical Technische Universitaet Dresden
Priority to JP2001530888A priority Critical patent/JP4886138B2/ja
Priority to AT00982966T priority patent/ATE458260T1/de
Priority to EP00982966A priority patent/EP1222677B1/de
Priority to AU19927/01A priority patent/AU1992701A/en
Priority to DE50015866T priority patent/DE50015866D1/de
Priority to US10/110,261 priority patent/US6717155B1/en
Priority to DE10083121T priority patent/DE10083121D2/de
Publication of WO2001027964A2 publication Critical patent/WO2001027964A2/de
Publication of WO2001027964A3 publication Critical patent/WO2001027964A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Dental Preparations (AREA)
  • Luminescent Compositions (AREA)
  • Particle Accelerators (AREA)

Abstract

Die Erfindung betrifft eine Elektronenstoßionenquelle zur Erzeugung vielfach- oder höchstgeladener Ionen, bestehend aus einer Elektronenkanone mit Kathode und Anode zur Erzeugung und Beschleunigung von Elektronen, einer Einrichtung zur axialsymmetrischen Fokussierung des Elektronenstrahles, Mitteln zur Einbringung von ionisierbaren Substanzen in eine zu öffnende und zu schließende Ionenfalle im Bereich des axialsymmetrisch fokussierten Elektronenstrahles, einer Einrichtung zur Vernichtung der Elektronen nach dem Durchgang durch die Ionenfalle, sowie einer Einrichtung zur Erzeugung eines Vakuums um den axialsymmetrisch fokussierten Elektronenstrahl und die darin befindliche Ionenfalle, dadurch gekennzeichnet, daß die Einrichtung zur axialsymmetrischen Fokussierung des Elektronenstrahles aus wenigstens zwei gegenläufig radial magnetisierten Ringstrukturen (2) besteht und jede der Ringstrukturen (2) den Elektronenstrahl umfaßt, je zwei gegenläufig radial magnetisierte Ringe (2) zu einem einheitlichen Magnetsystem durch magnetische Leiter (7, 9) verbunden sind, wobei das sich schließende Magnetfeld den Aufenthaltsbereich der Ionen in der Ionenfalle durchdringt, die Kathode eine sehr hohe Emissivität von ≥ 25 A/cm2 bei kleinem Kathodendurchmesser aufweist, und ein Vakuum von 10?-7 bis 10-11¿ Torr im Aufenthaltsbereich der Ionen während des Betriebs der Elektronenstoßionenquelle einstellbar ist.
PCT/DE2000/003525 1999-10-08 2000-10-06 Elektronenstossionenquelle Ceased WO2001027964A2 (de)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2001530888A JP4886138B2 (ja) 1999-10-08 2000-10-06 電子衝撃イオン源
AT00982966T ATE458260T1 (de) 1999-10-08 2000-10-06 Elektronenstossionenquelle
EP00982966A EP1222677B1 (de) 1999-10-08 2000-10-06 Elektronenstossionenquelle
AU19927/01A AU1992701A (en) 1999-10-08 2000-10-06 Electron impact ion source
DE50015866T DE50015866D1 (de) 1999-10-08 2000-10-06 Elektronenstossionenquelle
US10/110,261 US6717155B1 (en) 1999-10-08 2000-10-06 Electron impact ion source
DE10083121T DE10083121D2 (de) 1999-10-08 2000-10-06 Elektronenstossionenquelle

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19949978A DE19949978A1 (de) 1999-10-08 1999-10-08 Elektronenstoßionenquelle
DE19949978.0 1999-10-08

Publications (2)

Publication Number Publication Date
WO2001027964A2 WO2001027964A2 (de) 2001-04-19
WO2001027964A3 true WO2001027964A3 (de) 2002-03-14

Family

ID=7925926

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2000/003525 Ceased WO2001027964A2 (de) 1999-10-08 2000-10-06 Elektronenstossionenquelle

Country Status (7)

Country Link
US (1) US6717155B1 (de)
EP (1) EP1222677B1 (de)
JP (1) JP4886138B2 (de)
AT (1) ATE458260T1 (de)
AU (1) AU1992701A (de)
DE (3) DE19949978A1 (de)
WO (1) WO2001027964A2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10113064B4 (de) * 2001-03-15 2004-05-19 Lzh Laserzentrum Hannover E.V. Verfahren und Einrichtung zur Erzeugung von UV-Strahlung, insbesondere von EUV-Strahlung
US7081711B2 (en) * 2003-10-28 2006-07-25 Applied Pulsed Power, Inc. Inductively generated streaming plasma ion source
FR2874125B1 (fr) * 2004-08-05 2006-11-24 Centre Nat Rech Scient Cnrse Piege a ions a aimant longitudinal et spectrometre de masse utilisant un tel aimant
US8334506B2 (en) 2007-12-10 2012-12-18 1St Detect Corporation End cap voltage control of ion traps
US7973277B2 (en) 2008-05-27 2011-07-05 1St Detect Corporation Driving a mass spectrometer ion trap or mass filter
DE102010030372B4 (de) 2010-06-22 2012-02-16 Dreebit Gmbh Vorrichtung zur Strukturierung von Festkörperflächen mit Ionenstrahlen aus einem Ionenstrahlspektrum
DE202010009379U1 (de) 2010-06-22 2010-09-02 Dreebit Gmbh Vorrichtung zur Strukturierung von Festkörperflächen mit Ionenstrahlen aus einem Ionenstrahlspektrum
US9984847B2 (en) 2013-03-15 2018-05-29 Mars Tohken Solution Co., Ltd. Open-type X-ray tube comprising field emission type electron gun and X-ray inspection apparatus using the same
JP6218403B2 (ja) * 2013-03-15 2017-10-25 株式会社マーストーケンソリューション 電界放射型電子銃を備えたｘ線管及びそれを用いたｘ線検査装置
US10297413B2 (en) 2015-03-10 2019-05-21 North-Western International Cleaner Production Centre Method and device for the production of highly charged ions
DE102015104213A1 (de) 2015-03-20 2016-09-22 Dreebit Gmbh Vorrichtung und Verfahren zur Erzeugung und Aussendung eines ladungs- und massenseparierten Ionenstrahls variabler Energie
DE102016110495B4 (de) 2016-06-07 2018-03-29 Vacom Vakuum Komponenten & Messtechnik Gmbh Vorrichtung und Verfahren zum Erzeugen, Speichern und Freisetzen von Ionen aus einer umgebenden Restgasatmosphäre
DE102023001245A1 (de) * 2023-03-30 2024-10-02 Erfindergemeinschaft Röntgenlithographie GbR (vertretungsberechtigter Gesellschafter: Dieter Beste, 40593 Düsseldorf) Verfahren zur Herstellung von Atomstrahlen, um damit intensive Röntgenstrahlen zur Belichtung von Halbleiterwafern zu erzeugen
FR3157655A1 (fr) 2023-12-20 2025-06-27 Polygon Physics Source d’ions
WO2025132161A1 (fr) 2023-12-20 2025-06-26 Cameca Source d'ions

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2507652A (en) * 1940-10-04 1950-05-16 Cornell Res Foundation Inc Ion source
GB1237028A (en) * 1969-04-28 1971-06-30 Mullard Ltd Ion source
US4105916A (en) * 1977-02-28 1978-08-08 Extranuclear Laboratories, Inc. Methods and apparatus for simultaneously producing and electronically separating the chemical ionization mass spectrum and the electron impact ionization mass spectrum of the same sample material
US4247804A (en) * 1979-06-04 1981-01-27 Hughes Aircraft Company Cold cathode discharge device with grid control
US4579144A (en) * 1983-03-04 1986-04-01 Uti Instrument Company Electron impact ion source for trace analysis
US4707637A (en) * 1986-03-24 1987-11-17 Hughes Aircraft Company Plasma-anode electron gun
DE4324233C1 (de) * 1993-07-20 1995-01-19 Bruker Franzen Analytik Gmbh Verfahren zur Auswahl der Reaktionspfade in Ionenfallen
GB9409953D0 (en) * 1994-05-17 1994-07-06 Fisons Plc Mass spectrometer and electron impact ion source therefor
JP2642881B2 (ja) * 1994-09-28 1997-08-20 東京大学長 低速多価イオンによる超高感度水素検出法
JP3779373B2 (ja) * 1996-04-22 2006-05-24 株式会社ムサシノエンジニアリング 真空蒸着装置
US6115452A (en) * 1998-01-08 2000-09-05 The Regents Of The University Of California X-ray radiography with highly charged ions
US6291820B1 (en) * 1999-01-08 2001-09-18 The Regents Of The University Of California Highly charged ion secondary ion mass spectroscopy
US6288394B1 (en) * 1999-03-02 2001-09-11 The Regents Of The University Of California Highly charged ion based time of flight emission microscope
CA2305938C (en) * 2000-04-10 2007-07-03 Vladimir I. Gorokhovsky Filtered cathodic arc deposition method and apparatus

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
H KODJA ET AL.: "A warm electron beam ion trap: The Micro-EBIT", PHYSICA SCRIPTA T., vol. 71, 1997, ROYAL SWEDISH ACADEMY OF SCIENCE, STOCKHOLM., SE, pages 113 - 116, XP002174201, ISSN: 0281-1847 *
OVSYANNIKOV V P ET AL: "A novel room temperature electron beam ion trap for atomic physics and materials research", NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, SECTION - B: BEAM INTERACTIONS WITH MATERIALS AND ATOMS, NORTH-HOLLAND PUBLISHING COMPANY. AMSTERDAM, NL, vol. 161-163, March 2000 (2000-03-01), pages 1123 - 1127, XP004192394, ISSN: 0168-583X *

Also Published As

Publication number Publication date
US6717155B1 (en) 2004-04-06
EP1222677A2 (de) 2002-07-17
DE19949978A1 (de) 2001-05-10
ATE458260T1 (de) 2010-03-15
WO2001027964A2 (de) 2001-04-19
JP4886138B2 (ja) 2012-02-29
EP1222677B1 (de) 2010-02-17
DE50015866D1 (de) 2010-04-01
AU1992701A (en) 2001-04-23
JP2003511843A (ja) 2003-03-25
DE10083121D2 (de) 2002-04-25

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