WO2001069320A3 - Belichtungsvorrichtung und verfahren zur kompensation von optischen fehlern - Google Patents

Belichtungsvorrichtung und verfahren zur kompensation von optischen fehlern Download PDF

Info

Publication number
WO2001069320A3
WO2001069320A3 PCT/EP2001/002591 EP0102591W WO0169320A3 WO 2001069320 A3 WO2001069320 A3 WO 2001069320A3 EP 0102591 W EP0102591 W EP 0102591W WO 0169320 A3 WO0169320 A3 WO 0169320A3
Authority
WO
WIPO (PCT)
Prior art keywords
exposure device
light modulator
image processing
processing electronics
compensating optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2001/002591
Other languages
English (en)
French (fr)
Other versions
WO2001069320A2 (de
Inventor
Friedrich Luellau
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Basys Print Systeme fuer die Drueckindustrie GmbH
Original Assignee
Basys Print Systeme fuer die Drueckindustrie GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basys Print Systeme fuer die Drueckindustrie GmbH filed Critical Basys Print Systeme fuer die Drueckindustrie GmbH
Priority to US10/149,298 priority Critical patent/US6844920B2/en
Priority to JP2001568136A priority patent/JP2003527641A/ja
Priority to EP01925392A priority patent/EP1269265A2/de
Priority to CA002391042A priority patent/CA2391042A1/en
Publication of WO2001069320A2 publication Critical patent/WO2001069320A2/de
Publication of WO2001069320A3 publication Critical patent/WO2001069320A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Projection-Type Copiers In General (AREA)
  • Liquid Crystal (AREA)

Abstract

Eine Belichtungsvorrichtung zur Belichtung eines Abbilds einer elektronisch gespeicherten Vorlage auf eine Unterlage, insbesondere Druckplatte (1), mit einer Bildverarbeitungselektronik (2), in der die Bilddaten speicherbar sind, mit einem durch die Bildverarbeitungselektronik (2) elektronisch ansteuerbaren Lichtmodulator (7), insbesondere einem LCD-Bildschirm (7) oder einer Mikrospiegelanordnung, mit einer Beleuchtungseinrichtung (8, 9) zur Beleuchtung des Lichtmodulators (7) und mit einer Abbildungsoptik (11) zur Abbildung des Lichtmodulators (7) auf die Unterlage (1) wird erfindungsgemäss dadurch verbessert, dass die Bildverarbeitungselektronik (2) eine Kompensationseinrichtung (4, 5) zur Kompensation von optischen Fehlern und/oder Toleranzen im Strahlengang der Belichtungsvorrichtung umfasst.
PCT/EP2001/002591 2000-03-11 2001-03-08 Belichtungsvorrichtung und verfahren zur kompensation von optischen fehlern Ceased WO2001069320A2 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US10/149,298 US6844920B2 (en) 2000-03-11 2001-03-08 Exposure device and method for compensating optical defects
JP2001568136A JP2003527641A (ja) 2000-03-11 2001-03-08 光学的エラーを補償する露光装置および方法
EP01925392A EP1269265A2 (de) 2000-03-11 2001-03-08 Belichtungsvorrichtung und verfahren zur kompensation von optischen fehlern
CA002391042A CA2391042A1 (en) 2000-03-11 2001-03-08 Exposure device and method for compensating optical defects

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10012017A DE10012017A1 (de) 2000-03-11 2000-03-11 Belichtungsvorrichtung und Verfahren zur Kompensation von optischen Fehlern
DE10012017.2 2000-03-11

Publications (2)

Publication Number Publication Date
WO2001069320A2 WO2001069320A2 (de) 2001-09-20
WO2001069320A3 true WO2001069320A3 (de) 2001-12-06

Family

ID=7634437

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2001/002591 Ceased WO2001069320A2 (de) 2000-03-11 2001-03-08 Belichtungsvorrichtung und verfahren zur kompensation von optischen fehlern

Country Status (6)

Country Link
US (1) US6844920B2 (de)
EP (1) EP1269265A2 (de)
JP (1) JP2003527641A (de)
CA (1) CA2391042A1 (de)
DE (1) DE10012017A1 (de)
WO (1) WO2001069320A2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6976426B2 (en) * 2002-04-09 2005-12-20 Day International, Inc. Image replication element and method and system for producing the same
US7339148B2 (en) * 2002-12-16 2008-03-04 Olympus America Inc. Confocal microscope
US20040197672A1 (en) * 2003-04-01 2004-10-07 Numerical Technologies, Inc. Programmable aperture for lithographic imaging systems
US6831768B1 (en) 2003-07-31 2004-12-14 Asml Holding N.V. Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography
KR100796582B1 (ko) * 2003-12-26 2008-01-21 후지필름 가부시키가이샤 노광방법 및 장치
TWI389174B (zh) * 2004-02-06 2013-03-11 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
US7153616B2 (en) * 2004-03-31 2006-12-26 Asml Holding N.V. System and method for verifying and controlling the performance of a maskless lithography tool
US7259829B2 (en) * 2004-07-26 2007-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7102733B2 (en) * 2004-08-13 2006-09-05 Asml Holding N.V. System and method to compensate for static and dynamic misalignments and deformations in a maskless lithography tool
US7202939B2 (en) * 2004-12-22 2007-04-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7728956B2 (en) 2005-04-05 2010-06-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate using a data buffer that stores pattern variation data
US8076524B2 (en) * 2006-02-03 2011-12-13 Exxonmobil Chemical Patents Inc. Process for generating alpha olefin comonomers
US8003839B2 (en) * 2006-02-03 2011-08-23 Exxonmobil Chemical Patents Inc. Process for generating linear apha olefin comonomers
US7982085B2 (en) * 2006-02-03 2011-07-19 Exxonmobil Chemical Patents Inc. In-line process for generating comonomer
US8404915B2 (en) * 2006-08-30 2013-03-26 Exxonmobil Chemical Patents Inc. Phosphine ligand-metal compositions, complexes, and catalysts for ethylene trimerizations
JP5582287B2 (ja) * 2007-11-06 2014-09-03 株式会社ニコン 照明光学装置及び露光装置
US9561622B2 (en) 2008-05-05 2017-02-07 Georgia Tech Research Corporation Systems and methods for fabricating three-dimensional objects
US8636496B2 (en) 2008-05-05 2014-01-28 Georgia Tech Research Corporation Systems and methods for fabricating three-dimensional objects
KR102733775B1 (ko) * 2023-06-08 2024-11-26 주식회사 에스디에이 다중 노광 시스템에서의 노광 오차 보정을 위한 트리거 발생 장치
KR102733774B1 (ko) * 2023-06-08 2024-11-26 주식회사 에스디에이 트리거 기반의 노광 오차 보정을 위한 다중 노광 시스템 및 그 방법

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3813398A1 (de) * 1988-04-21 1989-11-02 Heidelberger Druckmasch Ag Verfahren und einrichtung zur erzeugung eines latenten bildes auf einer lichtempfindlichen beschichtung einer offset-druckplatte
US5369499A (en) * 1991-11-13 1994-11-29 Eastman Kodak Company Calibration method for video image reproduction with electronic printer and video monitor
DE19545821A1 (de) * 1995-12-08 1997-06-12 Friedrich Dipl Ing Luellau Vorrichtung zum Belichten von Druckplatten
DE19703063A1 (de) * 1997-01-29 1998-08-06 Agfa Gevaert Ag Verfahren zum Erzeugen eines Bildes von einer transparenten Vorlage
EP0875386A1 (de) * 1993-08-30 1998-11-04 Texas Instruments Incorporated Verbesserung in oder bezüglich des Druckens
EP0953877A1 (de) * 1998-04-29 1999-11-03 Deltron Computer Produkte GmbH Verfahren zur Herstellung von Siebdruckformen sowie eine Belichtungsvorrichtung hierfür

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3402127A1 (de) * 1984-01-23 1985-07-25 Harald 6070 Langen Küppers Verfahren zur gleichmaessigen ausleuchtung einer flaeche durch eine punktlichtquelle
US4675702A (en) * 1986-03-14 1987-06-23 Gerber Scientific Inc. Photoplotter using a light valve device and process for exposing graphics
US5122831A (en) * 1990-06-25 1992-06-16 Fuji Photo Film Co., Ltd. Photographic printer
US5473409A (en) * 1993-09-21 1995-12-05 Sony Corporation Semiconductor light exposure device
JPH09318891A (ja) * 1996-05-30 1997-12-12 Fuji Photo Film Co Ltd 画像露光装置
DE19752479A1 (de) * 1996-12-03 1998-06-04 Eastman Kodak Co Verfahren und Vorrichtung zum Korrigieren der Lichtungsgleichmäßigkeit in einem fotografischen Flüssigkristallprinter
DE19845821B4 (de) 1998-09-25 2005-01-20 Fahrzeugausrüstung Berlin GmbH Stromrichtereinheit in Modulbauweise, insbesondere für Schienenfahrzeuge
EP1141780B1 (de) * 1998-12-11 2004-02-25 Basys Print GmbH Systeme für die Druckindustrie Belichtungsvorrichtung

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3813398A1 (de) * 1988-04-21 1989-11-02 Heidelberger Druckmasch Ag Verfahren und einrichtung zur erzeugung eines latenten bildes auf einer lichtempfindlichen beschichtung einer offset-druckplatte
US5369499A (en) * 1991-11-13 1994-11-29 Eastman Kodak Company Calibration method for video image reproduction with electronic printer and video monitor
EP0875386A1 (de) * 1993-08-30 1998-11-04 Texas Instruments Incorporated Verbesserung in oder bezüglich des Druckens
DE19545821A1 (de) * 1995-12-08 1997-06-12 Friedrich Dipl Ing Luellau Vorrichtung zum Belichten von Druckplatten
DE19703063A1 (de) * 1997-01-29 1998-08-06 Agfa Gevaert Ag Verfahren zum Erzeugen eines Bildes von einer transparenten Vorlage
EP0953877A1 (de) * 1998-04-29 1999-11-03 Deltron Computer Produkte GmbH Verfahren zur Herstellung von Siebdruckformen sowie eine Belichtungsvorrichtung hierfür

Also Published As

Publication number Publication date
JP2003527641A (ja) 2003-09-16
US20030077089A1 (en) 2003-04-24
US6844920B2 (en) 2005-01-18
DE10012017A1 (de) 2001-09-13
CA2391042A1 (en) 2001-09-20
WO2001069320A2 (de) 2001-09-20
EP1269265A2 (de) 2003-01-02

Similar Documents

Publication Publication Date Title
WO2001069320A3 (de) Belichtungsvorrichtung und verfahren zur kompensation von optischen fehlern
KR980003671A (ko) Slm에 기초한 이미지 디스플레이 시스템용 자동 초점 시스템
KR960042227A (ko) 투영노광장치
WO2004019128A3 (en) Projection optical system and method for photolithography and exposure apparatus and method using same
JP2000272170A (ja) 反射型液晶変調器を用いたプリンタ
KR920013052A (ko) 제로그래픽 프린팅 시스템 하우징 및 그 제조 방법
US20030197835A1 (en) Method for imaging a continuously moving object
WO2005116719A3 (en) Transmissive, optically addressed, photosensitive spatial light modulators and color display systems incorporating same
EP1585344A3 (de) Projektionsanzeigevorrichtung
US6359676B1 (en) Method and apparatus for printing photographs from developed film onto light-sensitive photoprint material
WO2005015315A3 (de) Mikrolithographische projektionsbelichtungsanlage sowie verfahren zum einbringen einer immersionsflüssigkeit in einem immersionsraum
EP0825473A3 (de) Projektionsvorrichtung
TW343357B (en) Projection exposure device, projection exposure method, mask pattern for amplitude aberration evaluation, amplitude aberration evaluation method
EP1150155A3 (de) Bildanzeigevorrichtung und optisches System
WO2002017018A3 (de) Projektionsanordnung zum projizieren eines bildes auf eine projektionsfläche und projektionseinheit zum ankoppeln an einen projektor
WO1999056166A3 (de) Projektionseinrichtung
EP1158772A3 (de) Fotografischer Drucker
WO2004111723A3 (en) Image projector with means for changing direction and/or magnification of image beam
WO2002048797A3 (en) Exposure apparatus and method using active tiling
ATE203867T1 (de) Kontrastverbesserung bei bildprojektoren mit flüssigkristalllichtventil
EP1717639A3 (de) Belichtungsgerät
EP1154635A3 (de) Optisches Abtastgerät, Bildabtastverfahren und photographisches Verarbeitungsgerät
EP1118910A3 (de) Mikrolithographischer Projektionsapparat
JP3336701B2 (ja) 書画入力装置およびその方法
SG74165A1 (en) Device for converting pictures or images into electronic signals

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): CA JP US

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
AK Designated states

Kind code of ref document: A3

Designated state(s): CA JP US

AL Designated countries for regional patents

Kind code of ref document: A3

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR

ENP Entry into the national phase

Ref country code: JP

Ref document number: 2001 568136

Kind code of ref document: A

Format of ref document f/p: F

WWE Wipo information: entry into national phase

Ref document number: 2391042

Country of ref document: CA

WWE Wipo information: entry into national phase

Ref document number: 2001925392

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 10149298

Country of ref document: US

WWP Wipo information: published in national office

Ref document number: 2001925392

Country of ref document: EP

WWW Wipo information: withdrawn in national office

Ref document number: 2001925392

Country of ref document: EP