WO2001096452A3 - Fabrication d'un article ou ajout de structures a cet article - Google Patents

Fabrication d'un article ou ajout de structures a cet article Download PDF

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Publication number
WO2001096452A3
WO2001096452A3 PCT/US2001/040988 US0140988W WO0196452A3 WO 2001096452 A3 WO2001096452 A3 WO 2001096452A3 US 0140988 W US0140988 W US 0140988W WO 0196452 A3 WO0196452 A3 WO 0196452A3
Authority
WO
WIPO (PCT)
Prior art keywords
article
making
multiphoton
adding structures
curable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2001/040988
Other languages
English (en)
Other versions
WO2001096452A2 (fr
Inventor
Robert J Devoe
Brook F Duerr
Patrick R Fleming
Harvey W Kalweit
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Priority to EP01948900A priority Critical patent/EP1295181A2/fr
Priority to JP2002510581A priority patent/JP4689936B2/ja
Priority to AU2001270321A priority patent/AU2001270321A1/en
Priority to KR1020027017027A priority patent/KR100811018B1/ko
Publication of WO2001096452A2 publication Critical patent/WO2001096452A2/fr
Publication of WO2001096452A3 publication Critical patent/WO2001096452A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/16—Chemical modification with polymerisable compounds
    • C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

L'invention concerne un procédé destiné à fabriquer une structure et consistant à appliquer une composition durcissable par photons multiples sur un article moulé, cette composition comprenant une espèce chimique durcissable ainsi qu'un système de photoamorceur à photons multiples, puis à durcir au moins partiellement ladite composition durcissable par photons multiples de manière à former une structure sur cet article.
PCT/US2001/040988 2000-06-15 2001-06-14 Fabrication d'un article ou ajout de structures a cet article Ceased WO2001096452A2 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP01948900A EP1295181A2 (fr) 2000-06-15 2001-06-14 Fabrication d'un article ou ajout de structures a cet article
JP2002510581A JP4689936B2 (ja) 2000-06-15 2001-06-14 構造を製作するか又は物品に構造を付加するための方法
AU2001270321A AU2001270321A1 (en) 2000-06-15 2001-06-14 Method for making or adding structures to an article
KR1020027017027A KR100811018B1 (ko) 2000-06-15 2001-06-14 물품에 구조를 형성 또는 추가하는 방법

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US21158800P 2000-06-15 2000-06-15
US21170600P 2000-06-15 2000-06-15
US60/211,588 2000-06-15
US60/211,706 2000-06-15

Publications (2)

Publication Number Publication Date
WO2001096452A2 WO2001096452A2 (fr) 2001-12-20
WO2001096452A3 true WO2001096452A3 (fr) 2002-04-25

Family

ID=26906269

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/040988 Ceased WO2001096452A2 (fr) 2000-06-15 2001-06-14 Fabrication d'un article ou ajout de structures a cet article

Country Status (5)

Country Link
EP (1) EP1295181A2 (fr)
JP (1) JP4689936B2 (fr)
KR (1) KR100811018B1 (fr)
AU (1) AU2001270321A1 (fr)
WO (1) WO2001096452A2 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9329326B2 (en) 2006-05-18 2016-05-03 3M Innovative Properties Company Process for making light guides with extraction structures and light guides produced thereby

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7005229B2 (en) 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
US7381516B2 (en) * 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
US7265161B2 (en) * 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
US7118845B2 (en) 2000-06-15 2006-10-10 3M Innovative Properties Company Multiphoton photochemical process and articles preparable thereby
US6750266B2 (en) * 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US7232650B2 (en) 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
US7030169B2 (en) * 2003-09-26 2006-04-18 3M Innovative Properties Company Arylsulfinate salts in initiator systems for polymeric reactions
US7723126B2 (en) * 2004-03-24 2010-05-25 Wisconsin Alumni Research Foundation Plasma-enhanced functionalization of inorganic oxide surfaces
US7583444B1 (en) 2005-12-21 2009-09-01 3M Innovative Properties Company Process for making microlens arrays and masterforms
US7893410B2 (en) 2005-12-21 2011-02-22 3M Innovative Properties Company Method and apparatus for processing multiphoton curable photoreactive compositions
US8029902B2 (en) 2006-12-11 2011-10-04 Wisconsin Alumni Research Foundation Plasma-enhanced functionalization of substrate surfaces with quaternary ammonium and quaternary phosphonium groups
ES2514520T3 (es) * 2009-12-04 2014-10-28 Slm Solutions Gmbh Unidad de irradiación óptica para una planta para la producción de piezas de trabajo mediante la irradiación de capas de polvo con radiación de láser
JP5659189B2 (ja) * 2011-05-13 2015-01-28 富士フイルム株式会社 非共鳴２光子吸収材料、非共鳴２光子吸収記録材料、記録媒体、記録再生方法及び非共鳴２光子吸収化合物
JP5703257B2 (ja) 2011-05-13 2015-04-15 富士フイルム株式会社 非共鳴２光子吸収記録材料及び非共鳴高分子２光子吸収光情報記録媒体及び記録再生方法
JP6748883B2 (ja) * 2015-04-03 2020-09-02 株式会社スリーボンド 光遅延硬化性樹脂組成物、接合体および接着方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999054784A1 (fr) * 1998-04-21 1999-10-28 University Of Connecticut Nanofabrication a structure libre utilisant une excitation multiphotonique

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2291216B (en) * 1994-06-30 1998-01-07 Matsushita Electric Works Ltd Method of manufacturing a printed circuit board
US6115339A (en) * 1998-06-17 2000-09-05 International Business Machines Corporation Method and system in an optical storage disc drive for conserving laser power
JP4965052B2 (ja) * 2000-06-15 2012-07-04 スリーエム イノベイティブ プロパティズ カンパニー ３次元光学素子の加工方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999054784A1 (fr) * 1998-04-21 1999-10-28 University Of Connecticut Nanofabrication a structure libre utilisant une excitation multiphotonique

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
CUMPSTON B H ET AL: "Two-photon polymerization initiators for three-dimensional optical data storage and microfabrication", NATURE, 4 MARCH 1999, MACMILLAN MAGAZINES, UK, vol. 398, no. 6722, pages 51 - 54, XP002189595, ISSN: 0028-0836 *
DIAMOND C ET AL: "TWO-PHOTON HOLOGRAPHY IN 3-D PHOTOPOLYMER HOST-GUEST MATRIX", OPTICS EXPRESS, OPTICAL SOCIETY OF AMERICA, WASHINGTON, DC,, US, vol. 6, no. 3, 31 January 2000 (2000-01-31), pages 64 - 68, XP001051871, ISSN: 1094-4087 *
MARUO S ET AL: "Movable microstructures made by two-photon three-dimensional microfabrication", MHS'99. PROCEEDINGS OF 1999 INTERNATIONAL SYMPOSIUM ON MICROMECHATRONICS AND HUMAN SCIENCE (CAT. NO.99TH8478), MHS'99. PROCEEDINGS OF THE 1999 INTERNATIONAL SYMPOSIUM ON MICROMECHANTRONICS AND HUMAN SCIENCE. TOWARDS THE NEW CENTURY, NAGOYA, JAPAN, 23, 1999, Piscataway, NJ, USA, IEEE, USA, pages 173 - 178, XP002189599, ISBN: 0-7803-5790-6 *
See also references of EP1295181A2 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9329326B2 (en) 2006-05-18 2016-05-03 3M Innovative Properties Company Process for making light guides with extraction structures and light guides produced thereby

Also Published As

Publication number Publication date
AU2001270321A1 (en) 2001-12-24
JP4689936B2 (ja) 2011-06-01
WO2001096452A2 (fr) 2001-12-20
EP1295181A2 (fr) 2003-03-26
KR20030012883A (ko) 2003-02-12
KR100811018B1 (ko) 2008-03-14
JP2004518154A (ja) 2004-06-17

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