WO2002013268A3 - Baugruppe, insbesondere wafer-baugruppe - Google Patents

Baugruppe, insbesondere wafer-baugruppe Download PDF

Info

Publication number
WO2002013268A3
WO2002013268A3 PCT/DE2001/002758 DE0102758W WO0213268A3 WO 2002013268 A3 WO2002013268 A3 WO 2002013268A3 DE 0102758 W DE0102758 W DE 0102758W WO 0213268 A3 WO0213268 A3 WO 0213268A3
Authority
WO
WIPO (PCT)
Prior art keywords
module
wafer
depression
functional
structured
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE2001/002758
Other languages
English (en)
French (fr)
Other versions
WO2002013268A2 (de
Inventor
Klaus Breitschwerdt
Hans Artmann
Wilhelm Frey
Karsten Funk
Juergen Neumann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Original Assignee
Robert Bosch GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch GmbH filed Critical Robert Bosch GmbH
Priority to EP01984504A priority Critical patent/EP1319249A2/de
Priority to JP2002518527A priority patent/JP2004506325A/ja
Priority to US10/343,820 priority patent/US20040084398A1/en
Publication of WO2002013268A2 publication Critical patent/WO2002013268A2/de
Publication of WO2002013268A3 publication Critical patent/WO2002013268A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/073—Connecting or disconnecting of die-attach connectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/117—Shapes of semiconductor bodies
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/30—Die-attach connectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/073—Connecting or disconnecting of die-attach connectors
    • H10W72/07321—Aligning
    • H10W72/07327—Aligning involving guiding structures, e.g. spacers or supporting members
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/073—Connecting or disconnecting of die-attach connectors
    • H10W72/07331—Connecting techniques
    • H10W72/07337—Connecting techniques using a polymer adhesive, e.g. an adhesive based on silicone or epoxy
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/073—Connecting or disconnecting of die-attach connectors
    • H10W72/07351—Connecting or disconnecting of die-attach connectors characterised by changes in properties of the die-attach connectors during connecting
    • H10W72/07353—Connecting or disconnecting of die-attach connectors characterised by changes in properties of the die-attach connectors during connecting changes in shapes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/30—Die-attach connectors
    • H10W72/331—Shapes of die-attach connectors
    • H10W72/334—Cross-sectional shape, i.e. in side view
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/90—Bond pads, in general
    • H10W72/931—Shapes of bond pads

Landscapes

  • Micromachines (AREA)
  • Wire Bonding (AREA)

Abstract

Die Baugruppe (10) ist insbesondere eine Wafer-Baugruppe und weist zwei gegenüberliegende Funktionselemente (11, 12) auf, die mittels einer zwischenangeordneten, druckverformbaren Verbindungsmittelschicht (13) miteinander wirkverbunden sind. Hierbei ist vorgesehen, dass wenigstens ein Funktionselement (11; 12; 11, 12) unter Ausbildung einer jeweiligen Vertiefung (14) oberflächenstrukturiert ist und die Wirkverbindung ausschliesslich im Bereich der Vertiefung (14) vorliegt.
PCT/DE2001/002758 2000-08-03 2001-07-20 Baugruppe, insbesondere wafer-baugruppe Ceased WO2002013268A2 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP01984504A EP1319249A2 (de) 2000-08-03 2001-07-20 Baugruppe, insbesondere wafer-baugruppe
JP2002518527A JP2004506325A (ja) 2000-08-03 2001-07-20 構造群、特にウェーハ構造群
US10/343,820 US20040084398A1 (en) 2000-08-03 2001-07-20 Module, especially a wafer module

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10037821.8 2000-08-03
DE10037821A DE10037821A1 (de) 2000-08-03 2000-08-03 Baugruppe, insbesondere Wafer-Baugruppe

Publications (2)

Publication Number Publication Date
WO2002013268A2 WO2002013268A2 (de) 2002-02-14
WO2002013268A3 true WO2002013268A3 (de) 2002-09-12

Family

ID=7651178

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2001/002758 Ceased WO2002013268A2 (de) 2000-08-03 2001-07-20 Baugruppe, insbesondere wafer-baugruppe

Country Status (5)

Country Link
US (1) US20040084398A1 (de)
EP (1) EP1319249A2 (de)
JP (1) JP2004506325A (de)
DE (1) DE10037821A1 (de)
WO (1) WO2002013268A2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AUPO902797A0 (en) * 1997-09-05 1997-10-02 Cortronix Pty Ltd A rotary blood pump with hydrodynamically suspended impeller
AUPP995999A0 (en) * 1999-04-23 1999-05-20 University Of Technology, Sydney Non-contact estimation and control system
AUPR514201A0 (en) * 2001-05-21 2001-06-14 Ventrassist Pty Ltd Staged implantation of ventricular assist devices
AU2003904032A0 (en) * 2003-08-04 2003-08-14 Ventracor Limited Improved Transcutaneous Power and Data Transceiver System
EP1670524A4 (de) * 2003-10-09 2012-12-26 Thoratec Corp Laufrad
US20060083642A1 (en) 2004-10-18 2006-04-20 Cook Martin C Rotor stability of a rotary pump
US8152035B2 (en) * 2005-07-12 2012-04-10 Thoratec Corporation Restraining device for a percutaneous lead assembly
US20070142696A1 (en) * 2005-12-08 2007-06-21 Ventrassist Pty Ltd Implantable medical devices
US20080133006A1 (en) * 2006-10-27 2008-06-05 Ventrassist Pty Ltd Blood Pump With An Ultrasonic Transducer
US20080200750A1 (en) * 2006-11-17 2008-08-21 Natalie James Polymer encapsulation for medical device
DE102007044806A1 (de) 2007-09-20 2009-04-02 Robert Bosch Gmbh Mikromechanisches Bauelement und Verfahren zur Herstellung eines mikromechanischen Bauelements
TW201217010A (en) 2010-06-22 2012-05-01 Thoratec Corp Apparatus and method for modifying pressure-flow characteristics of a pump
CA2802217A1 (en) 2010-06-22 2011-12-29 Thoratec Corporation Fluid delivery system and method for monitoring fluid delivery system
TW201225997A (en) 2010-08-20 2012-07-01 Thoratec Corp Assembly and method for stabilizing a percutaneous cable

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2902002A1 (de) * 1979-01-19 1980-07-31 Gerhard Krause Dreidimensional integrierte elektronische schaltungen
EP0314437A1 (de) * 1987-10-28 1989-05-03 Laser Dynamics, Inc. Halbleiterkristallplättchen-Stapel
JPH04335566A (ja) * 1991-05-10 1992-11-24 Sony Corp 半導体メモリ装置
US5419806A (en) * 1993-02-11 1995-05-30 Siemens Aktiengesellschaft Method for manufacturing a three-dimensional circuit apparatus
EP0735530A1 (de) * 1995-03-31 1996-10-02 Toshiba-Emi Limited Verfahren und Gerät zur Herstellung von verklebten Platten
JPH11345900A (ja) * 1998-05-29 1999-12-14 Toshiba Corp 半導体装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2959493A (en) * 1956-08-23 1960-11-08 Owens Illinois Glass Co Treating sealing edges of glass parts
SE9100392D0 (sv) * 1991-02-08 1991-02-08 Pharmacia Biosensor Ab A method of producing a sealing means in a microfluidic structure and a microfluidic structure comprising such sealing means
FR2751467B1 (fr) * 1996-07-17 1998-10-02 Commissariat Energie Atomique Procede d'assemblage de deux structures et dispositif obtenu par le procede. applications aux microlasers
FR2785449B1 (fr) * 1998-10-29 2002-11-29 Commissariat Energie Atomique Systeme d'assemblage de substrats a zones d'accrochage pourvues de cavites
US6406636B1 (en) * 1999-06-02 2002-06-18 Megasense, Inc. Methods for wafer to wafer bonding using microstructures

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2902002A1 (de) * 1979-01-19 1980-07-31 Gerhard Krause Dreidimensional integrierte elektronische schaltungen
EP0314437A1 (de) * 1987-10-28 1989-05-03 Laser Dynamics, Inc. Halbleiterkristallplättchen-Stapel
JPH04335566A (ja) * 1991-05-10 1992-11-24 Sony Corp 半導体メモリ装置
US5419806A (en) * 1993-02-11 1995-05-30 Siemens Aktiengesellschaft Method for manufacturing a three-dimensional circuit apparatus
EP0735530A1 (de) * 1995-03-31 1996-10-02 Toshiba-Emi Limited Verfahren und Gerät zur Herstellung von verklebten Platten
JPH11345900A (ja) * 1998-05-29 1999-12-14 Toshiba Corp 半導体装置

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 017, no. 183 (E - 1348) 9 April 1993 (1993-04-09) *
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 03 30 March 2000 (2000-03-30) *

Also Published As

Publication number Publication date
JP2004506325A (ja) 2004-02-26
DE10037821A1 (de) 2002-02-21
EP1319249A2 (de) 2003-06-18
WO2002013268A2 (de) 2002-02-14
US20040084398A1 (en) 2004-05-06

Similar Documents

Publication Publication Date Title
WO2007040843A3 (en) Dry wiper with encapsulated agent for surface cleaning
WO2002063656A3 (en) Chemical monolayer and micro-electronic junctions and devices containing same
WO2002056809A3 (en) Controlled delamination of laminate structures having enclosed discrete regions of a material
WO2003050202A8 (en) A method of forming a composite
WO1999056954A8 (en) Methods of fabricating polymeric structures incorporating microscale fluidic elements
WO2004034028A3 (en) Microfluidic systems and components
WO2000076971A3 (en) Serine protease inhibitors
WO2003072803A3 (en) Nanostructures containing antibody assembly units
WO2005067848A3 (en) Method for bonding surfaces on a web
WO2001014080A8 (de) Wärmetauscher
WO2004082918A3 (en) Composite webs and closure systems
WO2003032456A3 (de) Vorrichtung und anordnung zur befestigung eines profilteils an einer tragschiene
WO2003038397A3 (en) Assay
WO2001080880A8 (de) Apoptotika
DE59814220D1 (de) Durch feldeffekt steuerbares halbleiterbauelement
WO2003021680A3 (de) Leistungshalbleitermodul
USD481805S1 (en) Garland light set section
WO2005109503A3 (en) A method of assembly and assembly thus made
EP1369485A4 (de) Glucose-dehydrogenase
WO2003102536A3 (en) Destructible surfactants and uses thereof
WO2002097868A3 (en) Integrated circuit having an energy-absorbing structure
AU2001292118A1 (en) Dye-labelled peptide and its diagnostic use
WO2003020767A3 (en) Antibodies against caspase-8, their preparation and use
USD511331S1 (en) Optoelectronic IC package
USD458227S1 (en) PCB connector

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): JP US

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
WWE Wipo information: entry into national phase

Ref document number: 2001984504

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 2002518527

Country of ref document: JP

WWP Wipo information: published in national office

Ref document number: 2001984504

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 10343820

Country of ref document: US