WO2002103702A3 - Digitale speicherzelleneinrichtung - Google Patents

Digitale speicherzelleneinrichtung Download PDF

Info

Publication number
WO2002103702A3
WO2002103702A3 PCT/DE2002/002187 DE0202187W WO02103702A3 WO 2002103702 A3 WO2002103702 A3 WO 2002103702A3 DE 0202187 W DE0202187 W DE 0202187W WO 02103702 A3 WO02103702 A3 WO 02103702A3
Authority
WO
WIPO (PCT)
Prior art keywords
layer
storage cell
cell device
magnetic
digital storage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE2002/002187
Other languages
English (en)
French (fr)
Other versions
WO2002103702A2 (de
Inventor
Roland Mattheis
Den Berg Hugo Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Infineon Technologies AG
Original Assignee
Infineon Technologies AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies AG filed Critical Infineon Technologies AG
Priority to US10/479,519 priority Critical patent/US7348647B2/en
Priority to KR1020037016205A priority patent/KR100583689B1/ko
Publication of WO2002103702A2 publication Critical patent/WO2002103702A2/de
Publication of WO2002103702A3 publication Critical patent/WO2002103702A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • G11C11/161Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/14Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements
    • G11C11/15Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements using multiple magnetic layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Mram Or Spin Memory Techniques (AREA)
  • Semiconductor Memories (AREA)
  • Hall/Mr Elements (AREA)
  • Magnetic Record Carriers (AREA)

Abstract

Digitale magnetische Speicherzelleneinrichtung für Lese- und/oder Schreiboperationen, mit einem weichmagnetischen Lese- und/oder Schreibschichtsystem und mindestens einem hartmagnetischen, als AAF-System ausgebildeten Referenzschichtsystem mit wenigstens einer Referenzschicht, wobei das Referenzschichtsystem einen Schichtabschnitt umfassend wenigstens ein Biasschichtsystem mit wenigstens einer ferrimagnetischen Schicht aufweist, wobei die magnetischen Momente des Biasschichtsystems und der Referenzschicht über eine Kopplungsschicht entgegengesetzt gekoppelt sind.
PCT/DE2002/002187 2001-06-15 2002-06-14 Digitale speicherzelleneinrichtung Ceased WO2002103702A2 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US10/479,519 US7348647B2 (en) 2001-06-15 2002-06-14 Digital memory cell device
KR1020037016205A KR100583689B1 (ko) 2001-06-15 2002-06-14 디지털 메모리 셀 디바이스

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10128964A DE10128964B4 (de) 2001-06-15 2001-06-15 Digitale magnetische Speicherzelleneinrichtung
DE10128964.2 2001-06-15

Publications (2)

Publication Number Publication Date
WO2002103702A2 WO2002103702A2 (de) 2002-12-27
WO2002103702A3 true WO2002103702A3 (de) 2003-06-26

Family

ID=7688334

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2002/002187 Ceased WO2002103702A2 (de) 2001-06-15 2002-06-14 Digitale speicherzelleneinrichtung

Country Status (5)

Country Link
US (1) US7348647B2 (de)
KR (1) KR100583689B1 (de)
DE (1) DE10128964B4 (de)
TW (1) TW560046B (de)
WO (1) WO2002103702A2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10301092B4 (de) * 2003-01-14 2006-06-29 Infineon Technologies Ag MRAM-Speicherzelle
US7167391B2 (en) * 2004-02-11 2007-01-23 Hewlett-Packard Development Company, L.P. Multilayer pinned reference layer for a magnetic storage device
US7102920B2 (en) * 2004-03-23 2006-09-05 Hewlett-Packard Development Company, L.P. Soft-reference three conductor magnetic memory storage device
US7611912B2 (en) * 2004-06-30 2009-11-03 Headway Technologies, Inc. Underlayer for high performance magnetic tunneling junction MRAM
US7643332B2 (en) 2006-06-23 2010-01-05 Infineon Technologies Ag MRAM cell using multiple axes magnetization and method of operation
US8608937B2 (en) 2009-03-30 2013-12-17 Roche Diagnostics Operations, Inc. Biosensor with predetermined dose response curve and method of manufacturing
US8648401B2 (en) * 2010-09-17 2014-02-11 Taiwan Semiconductor Manufacturing Company, Ltd. Domain wall assisted spin torque transfer magnetresistive random access memory structure
US9666215B2 (en) 2015-10-28 2017-05-30 International Business Machines Corporation Termination layer-compensated tunneling magnetoresistance in ferrimagnetic Heusler compounds with high perpendicular magnetic anisotropy
DE102022128167B4 (de) * 2022-10-25 2025-04-30 Infineon Technologies Ag Spin-ventil-bauelement und verfahren zum bilden eines spin-ventil-bauelements

Citations (3)

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EP0783112A2 (de) * 1996-01-02 1997-07-09 Hewlett-Packard Company Ferrimagnetischer Magnetowiderstandsensor mit Tunneleffekt
EP0917161A1 (de) * 1997-11-17 1999-05-19 Matsushita Electronics Corporation Dünnschicht mit Wechselkupplung, magnetoresistives Element, magnetoresistiver Kopf und Herstellungsverfahren
US20010026471A1 (en) * 2000-03-23 2001-10-04 Masashi Michijima Magnetic memory element, magnetic memory and manufacturing method of magnetic memory

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US4780848A (en) * 1986-06-03 1988-10-25 Honeywell Inc. Magnetoresistive memory with multi-layer storage cells having layers of limited thickness
EP0565102A2 (de) * 1992-04-10 1993-10-13 Hitachi Maxell, Ltd. Magnetische Schichtungen und Magnetköpfe und magnetische Aufnahme-/Wiedergabegeräte, die solche Schichtungen benutzen
JP2938284B2 (ja) * 1992-10-06 1999-08-23 シャープ株式会社 光磁気記録媒体及びこれを用いた記録再生方法
DE4320514A1 (de) * 1993-06-22 1995-01-05 Forschungszentrum Juelich Gmbh Neues optisches Schreibverfahren und Schichtsystem für magnetooptische Datenspeicher
DE4427495C2 (de) * 1994-08-03 2000-04-13 Siemens Ag Sensoreinrichtung mit einem GMR-Sensorelement
US5583727A (en) * 1995-05-15 1996-12-10 International Business Machines Corporation Multiple data layer magnetic recording data storage system with digital magnetoresistive read sensor
US5585986A (en) * 1995-05-15 1996-12-17 International Business Machines Corporation Digital magnetoresistive sensor based on the giant magnetoresistance effect
DE19608730C2 (de) * 1996-03-06 1998-05-28 Siemens Ag Magnetfeldempfindlicher Sensor mit einem Dünnschichtaufbau und Verwendung des Sensors
US5764567A (en) * 1996-11-27 1998-06-09 International Business Machines Corporation Magnetic tunnel junction device with nonferromagnetic interface layer for improved magnetic field response
JP2001501309A (ja) * 1996-10-02 2001-01-30 シーメンス アクチエンゲゼルシヤフト トンネル障壁層を有する磁界感応薄膜センサ
JP2924819B2 (ja) * 1996-10-09 1999-07-26 日本電気株式会社 磁気抵抗効果膜及びその製造方法
JP3679593B2 (ja) * 1998-01-28 2005-08-03 キヤノン株式会社 磁性薄膜素子および磁性薄膜メモリ素子およびその記録再生方法
JPH11250427A (ja) * 1998-03-04 1999-09-17 Hitachi Metals Ltd 磁気抵抗効果型ヘッド
US6303218B1 (en) * 1998-03-20 2001-10-16 Kabushiki Kaisha Toshiba Multi-layered thin-film functional device and magnetoresistance effect element
JP3234814B2 (ja) * 1998-06-30 2001-12-04 株式会社東芝 磁気抵抗効果素子、磁気ヘッド、磁気ヘッドアセンブリ及び磁気記録装置
DE19830343C1 (de) * 1998-07-07 2000-04-06 Siemens Ag Verfahren zur Herstellung eines Schichtaufbaus umfassend ein AAF-System sowie magnetoresistive Sensorsysteme
DE19830344C2 (de) * 1998-07-07 2003-04-10 Ipht Jena Inst Fuer Physikalis Verfahren zum Einstellen der Magnetisierung der Biasschicht eines magneto-resistiven Sensorelements, demgemäß bearbeitetes Sensorelement sowie zur Durchführung des Verfahrens geeignetes Sensorsubstrat
EP1048026A1 (de) * 1998-08-25 2000-11-02 Koninklijke Philips Electronics N.V. Dunnfilm-abgeschirmte magnetische lesekopfvorrichtung
US6348274B1 (en) * 1998-12-28 2002-02-19 Kabushiki Kaisha Toshiba Magnetoresistive element and magnetic recording apparatus
US6567246B1 (en) * 1999-03-02 2003-05-20 Matsushita Electric Industrial Co., Ltd. Magnetoresistance effect element and method for producing the same, and magnetoresistance effect type head, magnetic recording apparatus, and magnetoresistance effect memory element
DE10017374B4 (de) * 1999-05-25 2007-05-10 Siemens Ag Magnetische Koppeleinrichtung und deren Verwendung
US6436526B1 (en) * 1999-06-17 2002-08-20 Matsushita Electric Industrial Co., Ltd. Magneto-resistance effect element, magneto-resistance effect memory cell, MRAM and method for performing information write to or read from the magneto-resistance effect memory cell
US6292389B1 (en) * 1999-07-19 2001-09-18 Motorola, Inc. Magnetic element with improved field response and fabricating method thereof
US6205052B1 (en) * 1999-10-21 2001-03-20 Motorola, Inc. Magnetic element with improved field response and fabricating method thereof
JP3891540B2 (ja) * 1999-10-25 2007-03-14 キヤノン株式会社 磁気抵抗効果メモリ、磁気抵抗効果メモリに記録される情報の記録再生方法、およびmram
US6233172B1 (en) * 1999-12-17 2001-05-15 Motorola, Inc. Magnetic element with dual magnetic states and fabrication method thereof
US7035138B2 (en) * 2000-09-27 2006-04-25 Canon Kabushiki Kaisha Magnetic random access memory having perpendicular magnetic films switched by magnetic fields from a plurality of directions
US6538919B1 (en) * 2000-11-08 2003-03-25 International Business Machines Corporation Magnetic tunnel junctions using ferrimagnetic materials
US6385082B1 (en) * 2000-11-08 2002-05-07 International Business Machines Corp. Thermally-assisted magnetic random access memory (MRAM)
US6721144B2 (en) * 2001-01-04 2004-04-13 International Business Machines Corporation Spin valves with co-ferrite pinning layer
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Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0783112A2 (de) * 1996-01-02 1997-07-09 Hewlett-Packard Company Ferrimagnetischer Magnetowiderstandsensor mit Tunneleffekt
EP0917161A1 (de) * 1997-11-17 1999-05-19 Matsushita Electronics Corporation Dünnschicht mit Wechselkupplung, magnetoresistives Element, magnetoresistiver Kopf und Herstellungsverfahren
US20010026471A1 (en) * 2000-03-23 2001-10-04 Masashi Michijima Magnetic memory element, magnetic memory and manufacturing method of magnetic memory

Also Published As

Publication number Publication date
KR100583689B1 (ko) 2006-05-25
US20040170054A1 (en) 2004-09-02
DE10128964A1 (de) 2002-12-19
TW560046B (en) 2003-11-01
DE10128964B4 (de) 2012-02-09
KR20040007689A (ko) 2004-01-24
US7348647B2 (en) 2008-03-25
WO2002103702A2 (de) 2002-12-27

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