WO2003010365A1 - Procede et appareil de placage - Google Patents

Procede et appareil de placage Download PDF

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Publication number
WO2003010365A1
WO2003010365A1 PCT/JP2002/007464 JP0207464W WO03010365A1 WO 2003010365 A1 WO2003010365 A1 WO 2003010365A1 JP 0207464 W JP0207464 W JP 0207464W WO 03010365 A1 WO03010365 A1 WO 03010365A1
Authority
WO
WIPO (PCT)
Prior art keywords
plating
semiconductor substrate
opening
thickness
plating apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2002/007464
Other languages
English (en)
Japanese (ja)
Inventor
Keiichi Sawai
Osamu Miyake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to KR10-2004-7000924A priority Critical patent/KR20040019345A/ko
Priority to US10/484,630 priority patent/US20040209464A1/en
Publication of WO2003010365A1 publication Critical patent/WO2003010365A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/40—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials
    • H10P14/46—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials using a liquid
    • H10P14/47—Electrolytic deposition, i.e. electroplating; Electroless plating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/008—Current shielding devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/12—Semiconductors
    • C25D7/123—Semiconductors first coated with a seed layer or a conductive layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/01—Manufacture or treatment
    • H10W72/012—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/251—Materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

L'invention concerne une plaque (7) à chicanes ayant une ouverture interposée entre un substrat semi-conducteur (4) (substrat à plaquer) et une anode (5). La périphérie de l'ouverture est inférieure à la bordure du substrat semi-conducteur (4) d'une longueur prédéterminée, la différence des dimensions du substrat semi-conducteur (4) et de l'ouverture convenant ainsi particulièrement pour uniformiser l'épaisseur de placage (électrode de point de soudure) sur la surface du substrat semi-conducteur (4). L'invention concerne donc un procédé et un appareil de placage qui permettent que l'épaisseur du placage soit quasiment invariable par dépôt d'une plaque à chicanes de forme simple, sans que cela entraîne une augmentation du coût de fabrication de l'appareil de placage.
PCT/JP2002/007464 2001-07-25 2002-07-24 Procede et appareil de placage Ceased WO2003010365A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR10-2004-7000924A KR20040019345A (ko) 2001-07-25 2002-07-24 도금 방법 및 도금 장치
US10/484,630 US20040209464A1 (en) 2001-07-25 2002-07-24 Plating method and plating apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001225127A JP4368543B2 (ja) 2001-07-25 2001-07-25 メッキ方法およびメッキ装置
JP2001-225127 2001-07-25

Publications (1)

Publication Number Publication Date
WO2003010365A1 true WO2003010365A1 (fr) 2003-02-06

Family

ID=19058171

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/007464 Ceased WO2003010365A1 (fr) 2001-07-25 2002-07-24 Procede et appareil de placage

Country Status (6)

Country Link
US (1) US20040209464A1 (fr)
JP (1) JP4368543B2 (fr)
KR (1) KR20040019345A (fr)
CN (1) CN1539030A (fr)
TW (1) TWI255866B (fr)
WO (1) WO2003010365A1 (fr)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101068625B1 (ko) * 2003-12-22 2011-09-28 재단법인 포항산업과학연구원 균일한 도금층 형성방법
JP2005314749A (ja) * 2004-04-28 2005-11-10 Shinei Hitec:Kk 電子部品及びその表面処理方法
JP3935479B2 (ja) * 2004-06-23 2007-06-20 キヤノン株式会社 カーボンファイバーの製造方法及びそれを使用した電子放出素子の製造方法、電子デバイスの製造方法、画像表示装置の製造方法および、該画像表示装置を用いた情報表示再生装置
KR100727270B1 (ko) * 2005-10-19 2007-06-13 대덕전자 주식회사 인쇄 회로 기판 제작을 위한 도금 전극 구조 및 이를 구비한 전해 도금 장치
CN101054701B (zh) * 2007-02-08 2010-12-08 上海美维科技有限公司 提高电镀均匀性的方法
KR20090049957A (ko) * 2007-11-14 2009-05-19 삼성전기주식회사 도금장치
JP5184308B2 (ja) * 2007-12-04 2013-04-17 株式会社荏原製作所 めっき装置及びめっき方法
JP2009141089A (ja) * 2007-12-06 2009-06-25 Renesas Technology Corp 半導体装置の製造方法
TWI398554B (zh) * 2010-07-29 2013-06-11 Zhen Ding Technology Co Ltd 電鍍裝置
CN102230207A (zh) * 2011-06-21 2011-11-02 华映光电股份有限公司 电泳沉积装置及电泳沉积方法
TWI569400B (zh) * 2012-06-11 2017-02-01 精材科技股份有限公司 晶片封裝體及其形成方法
CN102828211B (zh) * 2012-08-30 2016-05-04 东莞市五株电子科技有限公司 电镀方法
US10014170B2 (en) * 2015-05-14 2018-07-03 Lam Research Corporation Apparatus and method for electrodeposition of metals with the use of an ionically resistive ionically permeable element having spatially tailored resistivity
EP3719180A1 (fr) * 2019-04-04 2020-10-07 ATOTECH Deutschland GmbH Appareil et procédé d'isolation électrochimique d'une section d'un substrat
TWI843117B (zh) * 2022-06-02 2024-05-21 日商荏原製作所股份有限公司 用於鍍覆裝置之阻抗體、及鍍覆裝置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000087295A (ja) * 1998-09-09 2000-03-28 Matsushita Electronics Industry Corp 電解メッキ方法、電解メッキ装置及び半導体装置の製造方法
JP2000195823A (ja) * 1998-12-28 2000-07-14 Hitachi Ltd めっき方法およびめっき装置
JP2001329400A (ja) * 2000-05-17 2001-11-27 Hitachi Kyowa Engineering Co Ltd めっき装置およびめっき方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3352352B2 (ja) * 1997-03-31 2002-12-03 新光電気工業株式会社 めっき装置、めっき方法およびバンプの形成方法
US6402923B1 (en) * 2000-03-27 2002-06-11 Novellus Systems Inc Method and apparatus for uniform electroplating of integrated circuits using a variable field shaping element
US6534116B2 (en) * 2000-08-10 2003-03-18 Nutool, Inc. Plating method and apparatus that creates a differential between additive disposed on a top surface and a cavity surface of a workpiece using an external influence
JP3379755B2 (ja) * 2000-05-24 2003-02-24 インターナショナル・ビジネス・マシーンズ・コーポレーション 金属めっき装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000087295A (ja) * 1998-09-09 2000-03-28 Matsushita Electronics Industry Corp 電解メッキ方法、電解メッキ装置及び半導体装置の製造方法
JP2000195823A (ja) * 1998-12-28 2000-07-14 Hitachi Ltd めっき方法およびめっき装置
JP2001329400A (ja) * 2000-05-17 2001-11-27 Hitachi Kyowa Engineering Co Ltd めっき装置およびめっき方法

Also Published As

Publication number Publication date
CN1539030A (zh) 2004-10-20
JP4368543B2 (ja) 2009-11-18
TWI255866B (en) 2006-06-01
US20040209464A1 (en) 2004-10-21
KR20040019345A (ko) 2004-03-05
JP2003034893A (ja) 2003-02-07

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