WO2003010802A1 - Appareil a etage, systeme et procede d'exposition et procede de production de dispositif - Google Patents

Appareil a etage, systeme et procede d'exposition et procede de production de dispositif Download PDF

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Publication number
WO2003010802A1
WO2003010802A1 PCT/JP2002/007555 JP0207555W WO03010802A1 WO 2003010802 A1 WO2003010802 A1 WO 2003010802A1 JP 0207555 W JP0207555 W JP 0207555W WO 03010802 A1 WO03010802 A1 WO 03010802A1
Authority
WO
WIPO (PCT)
Prior art keywords
stage
exposure
stage apparatus
device production
production method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2002/007555
Other languages
English (en)
Japanese (ja)
Inventor
Masahiko Okumura
Tetsuya Hirano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP2003516090A priority Critical patent/JPWO2003010802A1/ja
Publication of WO2003010802A1 publication Critical patent/WO2003010802A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

L'invention concerne un système de commande (19) à étage qui, tout en limitant la réduction d'une performance de commande dans un étage lorsqu'on effectue une opération d'exposition dans cet étage (WST1), exécute une opération d'alignement dans un autre étage (WST2), permettant ainsi de limiter la réduction de performance de commande dans une opération d'exposition exécutée dans un étage entraînée par une opération dans un autre étage. De ce fait, des traitements simultanés parallèles exécutés dans les deux étages peuvent atteindre la précision positive nécessaire à une opération exécutée dans chaque étage, tout en conservant un débit élevé dans le processus d'exposition.
PCT/JP2002/007555 2001-07-26 2002-07-25 Appareil a etage, systeme et procede d'exposition et procede de production de dispositif Ceased WO2003010802A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003516090A JPWO2003010802A1 (ja) 2001-07-26 2002-07-25 ステージ装置、露光装置及び露光方法、並びにデバイス製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001-225235 2001-07-26
JP2001225235 2001-07-26

Publications (1)

Publication Number Publication Date
WO2003010802A1 true WO2003010802A1 (fr) 2003-02-06

Family

ID=19058255

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/007555 Ceased WO2003010802A1 (fr) 2001-07-26 2002-07-25 Appareil a etage, systeme et procede d'exposition et procede de production de dispositif

Country Status (3)

Country Link
JP (1) JPWO2003010802A1 (fr)
TW (1) TW550668B (fr)
WO (1) WO2003010802A1 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006179920A (ja) * 2004-12-22 2006-07-06 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
KR20140098165A (ko) * 2004-02-02 2014-08-07 가부시키가이샤 니콘 스테이지 구동 방법 및 스테이지 장치, 노광 장치, 그리고 디바이스 제조 방법
CN115729051A (zh) * 2021-08-26 2023-03-03 株式会社斯库林集团 绘制装置以及绘制方法
JP2023178028A (ja) * 2022-06-03 2023-12-14 キヤノン株式会社 露光装置、露光装置の制御方法、および、物品製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998024115A1 (fr) * 1996-11-28 1998-06-04 Nikon Corporation Dispositif d'alignement et procede d'exposition
EP1052550A2 (fr) * 1999-04-19 2000-11-15 Asm Lithography B.V. Systèmes d' entraínement d' une pluralité de porte-objets et leur application dans appareils de projection lithographique
US20010004105A1 (en) * 1999-12-21 2001-06-21 Kwan Yim Bun P. Crash prevention in positioning apparatus for use in lithographic projection apparatus
JP2001203140A (ja) * 2000-01-20 2001-07-27 Nikon Corp ステージ装置、露光装置及びデバイス製造方法
JP2002246287A (ja) * 2001-02-16 2002-08-30 Nikon Corp 露光方法及び装置、並びにデバイス製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998024115A1 (fr) * 1996-11-28 1998-06-04 Nikon Corporation Dispositif d'alignement et procede d'exposition
EP1052550A2 (fr) * 1999-04-19 2000-11-15 Asm Lithography B.V. Systèmes d' entraínement d' une pluralité de porte-objets et leur application dans appareils de projection lithographique
US20010004105A1 (en) * 1999-12-21 2001-06-21 Kwan Yim Bun P. Crash prevention in positioning apparatus for use in lithographic projection apparatus
JP2001203140A (ja) * 2000-01-20 2001-07-27 Nikon Corp ステージ装置、露光装置及びデバイス製造方法
JP2002246287A (ja) * 2001-02-16 2002-08-30 Nikon Corp 露光方法及び装置、並びにデバイス製造方法

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140098165A (ko) * 2004-02-02 2014-08-07 가부시키가이샤 니콘 스테이지 구동 방법 및 스테이지 장치, 노광 장치, 그리고 디바이스 제조 방법
KR101590742B1 (ko) * 2004-02-02 2016-02-01 가부시키가이샤 니콘 스테이지 구동 방법 및 스테이지 장치, 노광 장치, 그리고 디바이스 제조 방법
JP2006179920A (ja) * 2004-12-22 2006-07-06 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
JP2010192905A (ja) * 2004-12-22 2010-09-02 Asml Netherlands Bv リソグラフィ装置、円形コンベヤ、及びデバイス製造方法
CN115729051A (zh) * 2021-08-26 2023-03-03 株式会社斯库林集团 绘制装置以及绘制方法
KR20230031140A (ko) * 2021-08-26 2023-03-07 가부시키가이샤 스크린 홀딩스 묘화 장치 및 묘화 방법
JP2023031962A (ja) * 2021-08-26 2023-03-09 株式会社Ｓｃｒｅｅｎホールディングス 描画装置および描画方法
TWI845977B (zh) 2021-08-26 2024-06-21 日商斯庫林集團股份有限公司 描繪裝置以及描繪方法
JP7631148B2 (ja) 2021-08-26 2025-02-18 株式会社Ｓｃｒｅｅｎホールディングス 描画装置および描画方法
KR102864890B1 (ko) * 2021-08-26 2025-09-25 가부시키가이샤 스크린 홀딩스 묘화 장치 및 묘화 방법
CN115729051B (zh) * 2021-08-26 2026-04-21 株式会社斯库林集团 绘制装置以及绘制方法
JP2023178028A (ja) * 2022-06-03 2023-12-14 キヤノン株式会社 露光装置、露光装置の制御方法、および、物品製造方法

Also Published As

Publication number Publication date
TW550668B (en) 2003-09-01
JPWO2003010802A1 (ja) 2004-11-18

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