WO2003087945A3 - Interferometrische messvorrichtung und projektionsbelichtungsanlage mit derartiger messvorrichtung - Google Patents

Interferometrische messvorrichtung und projektionsbelichtungsanlage mit derartiger messvorrichtung Download PDF

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Publication number
WO2003087945A3
WO2003087945A3 PCT/EP2003/003566 EP0303566W WO03087945A3 WO 2003087945 A3 WO2003087945 A3 WO 2003087945A3 EP 0303566 W EP0303566 W EP 0303566W WO 03087945 A3 WO03087945 A3 WO 03087945A3
Authority
WO
WIPO (PCT)
Prior art keywords
measuring device
imaging system
wave front
interferometric
projection illumination
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2003/003566
Other languages
English (en)
French (fr)
Other versions
WO2003087945A2 (de
Inventor
Martin Schriever
Ulrich Wegmann
Helmut Haidner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to AU2003222799A priority Critical patent/AU2003222799A1/en
Priority to JP2003584827A priority patent/JP2005522871A/ja
Priority to EP03718735A priority patent/EP1495369A2/de
Publication of WO2003087945A2 publication Critical patent/WO2003087945A2/de
Publication of WO2003087945A3 publication Critical patent/WO2003087945A3/de
Priority to US10/964,868 priority patent/US7158237B2/en
Anticipated expiration legal-status Critical
Priority to US11/469,786 priority patent/US20070046912A1/en
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
    • G02B5/0221—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures the surface having an irregular structure
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/0252—Diffusing elements; Afocal elements characterised by the diffusing properties using holographic or diffractive means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)

Abstract

Eine Messvorrichtung zur interferometrischen Vermessung eines optischen Abbildungssystems, das zur Abbildung eines an einer Maske vorgesehenen Nutzmusters in die Bildebene des Abbildungssystems vorgesehen ist, hat eine Wellenfrontquelle zur Erzeugung mindestens einer das Abbildungssystem durchlaufenden Wellenfront, ein hinter dem Abbildungssystem anordenbares Beugungsgitter zur Wechselwirkung mit der vom dem Abbildungssystem umgeformten Wellenfront und einen dem Beugungsgitter zugeordneten, ortsauflösenden Detektor zur Erfassung von interferometrischer Information. Die Wellenfrontquelle umfasst mindestens ein Messmuster (34), das zusätzlich zu dem Nutzmuster (35) an der Maske (8) ausgebildet ist.
PCT/EP2003/003566 2002-04-15 2003-04-05 Interferometrische messvorrichtung und projektionsbelichtungsanlage mit derartiger messvorrichtung Ceased WO2003087945A2 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
AU2003222799A AU2003222799A1 (en) 2002-04-15 2003-04-05 Interferometric measuring device and projection illumination installation comprising one such measuring device
JP2003584827A JP2005522871A (ja) 2002-04-15 2003-04-05 干渉計測装置および該計測装置からなる投影露光装置
EP03718735A EP1495369A2 (de) 2002-04-15 2003-04-05 Interferometrische messvorrichtung und projektionsbelichtungsanlage mit derartiger messvorrichtung
US10/964,868 US7158237B2 (en) 2002-04-15 2004-10-15 Interferometric measuring device and projection exposure installation comprising such measuring device
US11/469,786 US20070046912A1 (en) 2002-04-15 2006-09-01 Interferometric measuring device and projection exposure installation comprising such measuring device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10217242 2002-04-15
DE10217242.0 2002-04-15

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/964,868 Continuation US7158237B2 (en) 2002-04-15 2004-10-15 Interferometric measuring device and projection exposure installation comprising such measuring device

Publications (2)

Publication Number Publication Date
WO2003087945A2 WO2003087945A2 (de) 2003-10-23
WO2003087945A3 true WO2003087945A3 (de) 2004-09-16

Family

ID=28798524

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/003566 Ceased WO2003087945A2 (de) 2002-04-15 2003-04-05 Interferometrische messvorrichtung und projektionsbelichtungsanlage mit derartiger messvorrichtung

Country Status (6)

Country Link
US (2) US7158237B2 (de)
EP (1) EP1495369A2 (de)
JP (1) JP2005522871A (de)
AU (1) AU2003222799A1 (de)
DE (1) DE10317278A1 (de)
WO (1) WO2003087945A2 (de)

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AU2003281995A1 (en) * 2003-04-11 2004-11-01 Carl Zeiss Smt Ag Diffuser, wavefront source, wavefront sensor and projection lighting facility
WO2004099877A1 (de) * 2003-05-12 2004-11-18 Carl Zeiss Smt Ag Optische messvorrichtung und betriebsverfahren für ein optisches abbildungssystem
WO2005003862A1 (de) 2003-07-05 2005-01-13 Carl Zeiss Smt Ag Vorrichtung zur polarisationsspezifischen untersuchung eines optischen systems
US7119910B1 (en) 2003-10-31 2006-10-10 Carl Zeiss Smt Ag Phase shifting wavefront interference method
US8004690B2 (en) * 2004-01-16 2011-08-23 Carl Zeiss Smt Gmbh Device and method for the optical measurement of an optical system, measurement structure support, and microlithographic projection exposure apparatus
JP4545155B2 (ja) 2004-01-16 2010-09-15 カール・ツァイス・エスエムティー・アーゲー 光結像系の波面測定装置及び方法、及びマイクロリソグラフィ投影露光装置
WO2005078522A2 (en) * 2004-02-17 2005-08-25 Carl Zeiss Smt Ag Illumination system for a microlithographic projection exposure apparatus
JP4464166B2 (ja) 2004-02-27 2010-05-19 キヤノン株式会社 測定装置を搭載した露光装置
DE102004020983A1 (de) * 2004-04-23 2005-11-17 Carl Zeiss Smt Ag Verfahren zur Strukturbelichtung einer lichtempfindlichen Schicht
US20050259269A1 (en) * 2004-05-19 2005-11-24 Asml Holding N.V. Shearing interferometer with dynamic pupil fill
DE102005026628A1 (de) * 2004-06-04 2005-12-29 Carl Zeiss Smt Ag Verfahren und Vorrichtung zur Telezentriebestimmung und Mikrolithographie-Projektionsbelichtungsanlage
JP4095598B2 (ja) * 2004-09-16 2008-06-04 キヤノン株式会社 二次元波面収差の算出方法
US7375799B2 (en) * 2005-02-25 2008-05-20 Asml Netherlands B.V. Lithographic apparatus
JP4887989B2 (ja) * 2005-12-02 2012-02-29 ナノフォトン株式会社 光学顕微鏡及びスペクトル測定方法
DE102008003916A1 (de) * 2007-01-23 2008-07-24 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie mit Messvorrichtung sowie Verfahren zum Messen einer Bestrahlungsstärkeverteilung
DE102007022895B9 (de) * 2007-05-14 2013-11-21 Erich Thallner Vorrichtung zum Übertragen von in einer Maske vorgesehenen Strukturen auf ein Substrat
NL1036279A1 (nl) * 2007-12-13 2009-06-16 Asml Netherlands Bv A device for transmission image detection for use in a lithographic projection apparatus and a method for determining third order distortions of a patterning device and/or a projection system of such a lithographic apparatus.
WO2010077675A2 (en) * 2008-12-09 2010-07-08 Zygo Corporation Two grating lateral shearing wavefront sensor
DE102013204443A1 (de) 2013-03-14 2014-10-02 Carl Zeiss Smt Gmbh Optische Baugruppe zur Lichtleitwerterhöhung
JP6147924B2 (ja) * 2013-09-14 2017-06-14 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影装置を作動させる方法
DE102014226269A1 (de) * 2014-12-17 2016-06-23 Carl Zeiss Smt Gmbh Wellenfrontmesseinrichtung, Projektionsobjektiv mit einer solchen Messeinrichtung und mit einer solchen Messeinrichtung zusammenwirkender optischer Wellenfrontmanipulator
DE102016212477A1 (de) * 2016-07-08 2018-01-11 Carl Zeiss Smt Gmbh Messverfahren und Messsystem zur interferometrischen Vermessung der Abbildungsqualität eines optischen Abbildungssystems
FR3057064B1 (fr) * 2016-09-30 2021-04-23 Phasics Procede et dispositif d'analyse d'une onde electromagnetique en haute definition
DE102017203376B3 (de) * 2017-03-02 2018-05-24 Carl Zeiss Smt Gmbh Messvorrichtung und Verfahren zur Vermessung eines Wellenfrontfehlers eines abbildenden optischen Systems sowie Projektionsbelichtungsanlage für die Mikrolithographie
DE102018221647B3 (de) * 2018-12-13 2020-06-04 Carl Zeiss Smt Gmbh Detektionseinrichtung zur Erfassung einer Struktur auf einem Flächenabschnitt einer Lithografiemaske sowie Vorrichtung und Verfahren mit einer derartigen Detektionseinrichtung
DE102021205203A1 (de) 2021-05-21 2022-08-04 Carl Zeiss Smt Gmbh Computer-generiertes Hologramm (CGH)
US11824667B2 (en) * 2022-09-06 2023-11-21 Ultralogic 6G Llc Waveform indicators for fault localization in 5G and 6G messages
CN120491403B (zh) * 2025-07-18 2025-09-16 新毅东(北京)科技有限公司 光刻机的曝光剂量计算方法

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US6278514B1 (en) * 1998-12-28 2001-08-21 Canon Kabushiki Kaisha Exposure apparatus
DE10109929A1 (de) * 2000-02-23 2001-11-22 Zeiss Carl Vorrichtung zur Wellenfronterfassung

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US4415262A (en) * 1981-01-21 1983-11-15 Hitachi, Ltd. Photomask
US5468577A (en) * 1993-06-12 1995-11-21 Hyundai Electronics Industries Co., Ltd. Photomask having patterns to reduce power of a stepper
US5686984A (en) * 1995-09-12 1997-11-11 Canon Kabushiki Kaisha Projection exposure method and apparatus to determine optical performance of reticle
US5851707A (en) * 1996-07-24 1998-12-22 Nikon Corporation Microlithography projection-exposure masks, and methods and apparatus employing same
US6278514B1 (en) * 1998-12-28 2001-08-21 Canon Kabushiki Kaisha Exposure apparatus
DE10109929A1 (de) * 2000-02-23 2001-11-22 Zeiss Carl Vorrichtung zur Wellenfronterfassung

Also Published As

Publication number Publication date
US20050264827A1 (en) 2005-12-01
JP2005522871A (ja) 2005-07-28
US7158237B2 (en) 2007-01-02
DE10317278A1 (de) 2003-11-06
AU2003222799A8 (en) 2003-10-27
EP1495369A2 (de) 2005-01-12
AU2003222799A1 (en) 2003-10-27
WO2003087945A2 (de) 2003-10-23
US20070046912A1 (en) 2007-03-01

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