WO2003104897A3 - Objektiv, insbesondere projektionsobjektiv für die mikrolithographie - Google Patents

Objektiv, insbesondere projektionsobjektiv für die mikrolithographie Download PDF

Info

Publication number
WO2003104897A3
WO2003104897A3 PCT/EP2003/004772 EP0304772W WO03104897A3 WO 2003104897 A3 WO2003104897 A3 WO 2003104897A3 EP 0304772 W EP0304772 W EP 0304772W WO 03104897 A3 WO03104897 A3 WO 03104897A3
Authority
WO
WIPO (PCT)
Prior art keywords
objective
microlithographic projection
beam splitter
particular microlithographic
faces
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2003/004772
Other languages
English (en)
French (fr)
Other versions
WO2003104897A2 (de
Inventor
Ulrich Weber
Hubert Holderer
Alexander Kohl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to US10/517,265 priority Critical patent/US20050286121A1/en
Publication of WO2003104897A2 publication Critical patent/WO2003104897A2/de
Publication of WO2003104897A3 publication Critical patent/WO2003104897A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/144—Beam splitting or combining systems operating by reflection only using partially transparent surfaces without spectral selectivity
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/1805—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for prisms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

Ein Objektiv ist mit mehreren in einem Objektivgehäuse (1) eingesetzten Linsen, Spiegeln und wenigstens einem Strahlenteilerelement (20) versehen. Ein oder mehrere im Strahlengang liegende Flächen (26, 27, 28) des Strahlenteilerelements (20) sind als Korrekturasphären vorgesehen. Das Strahlenteilerelement (20) kann mit Manipulatoren (22) versehen sein, die auf einem Manipulatorträger (23) angeordnet sind, welcher feststehend mit dem Objektivgehäuse verbunden ist.
PCT/EP2003/004772 2002-06-07 2003-05-07 Objektiv, insbesondere projektionsobjektiv für die mikrolithographie Ceased WO2003104897A2 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US10/517,265 US20050286121A1 (en) 2002-06-07 2003-05-07 Objective, especially a projection objective for microlithography

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10225265.3 2002-06-07
DE10225265A DE10225265A1 (de) 2002-06-07 2002-06-07 Objektiv, insbesondere Projektionsobjektiv für die Mikrolithographie

Publications (2)

Publication Number Publication Date
WO2003104897A2 WO2003104897A2 (de) 2003-12-18
WO2003104897A3 true WO2003104897A3 (de) 2004-03-04

Family

ID=29557619

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/004772 Ceased WO2003104897A2 (de) 2002-06-07 2003-05-07 Objektiv, insbesondere projektionsobjektiv für die mikrolithographie

Country Status (4)

Country Link
US (1) US20050286121A1 (de)
DE (1) DE10225265A1 (de)
TW (1) TW200401120A (de)
WO (1) WO2003104897A2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006069785A1 (en) 2004-12-28 2006-07-06 Carl Zeiss Smt Ag Apparatus for mounting two or more optical elements and method for processing the surface of an optical element
TWI439815B (zh) 2006-07-03 2014-06-01 Zeiss Carl Smt Gmbh 校正／修復微影投影曝光裝置中之投影物鏡的方法與此投影物鏡
CN101548240B (zh) 2006-12-01 2014-09-17 卡尔蔡司Smt有限责任公司 具有用于减小像差的可替换、可操纵的校正布置的光学系统
DE102007009867A1 (de) * 2007-02-28 2008-09-11 Carl Zeiss Smt Ag Abbildungsvorrichtung mit auswechselbaren Blenden sowie Verfahren hierzu

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5771125A (en) * 1996-06-14 1998-06-23 Nikon Corporation Catadioptric system for photolithography
EP0869383A2 (de) * 1997-04-01 1998-10-07 Nikon Corporation Katadioptrisches optisches System
EP1122608A2 (de) * 2000-02-05 2001-08-08 Carl Zeiss Projektionsbelichtungsanlage mit reflektivem Retikel

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3893626B2 (ja) * 1995-01-25 2007-03-14 株式会社ニコン 投影光学装置の調整方法、投影光学装置、露光装置及び露光方法
JPH09167731A (ja) * 1995-12-14 1997-06-24 Mitsubishi Electric Corp 投影露光装置、収差評価用マスクパタン、収差量評価方法、収差除去フィルター及び半導体装置の製造方法
US6157498A (en) * 1996-06-19 2000-12-05 Nikon Corporation Dual-imaging optical system
US20040042094A1 (en) * 2000-12-28 2004-03-04 Tomoyuki Matsuyama Projection optical system and production method therefor, exposure system and production method therefor, and production method for microdevice

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5771125A (en) * 1996-06-14 1998-06-23 Nikon Corporation Catadioptric system for photolithography
EP0869383A2 (de) * 1997-04-01 1998-10-07 Nikon Corporation Katadioptrisches optisches System
EP1122608A2 (de) * 2000-02-05 2001-08-08 Carl Zeiss Projektionsbelichtungsanlage mit reflektivem Retikel

Also Published As

Publication number Publication date
WO2003104897A2 (de) 2003-12-18
DE10225265A1 (de) 2003-12-18
US20050286121A1 (en) 2005-12-29
TW200401120A (en) 2004-01-16

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