WO2004017018A1 - Procede et installation pour etalonner un dispositif palpeur - Google Patents

Procede et installation pour etalonner un dispositif palpeur Download PDF

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Publication number
WO2004017018A1
WO2004017018A1 PCT/DE2003/002219 DE0302219W WO2004017018A1 WO 2004017018 A1 WO2004017018 A1 WO 2004017018A1 DE 0302219 W DE0302219 W DE 0302219W WO 2004017018 A1 WO2004017018 A1 WO 2004017018A1
Authority
WO
WIPO (PCT)
Prior art keywords
standard
normal
probe
scanning
calibration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE2003/002219
Other languages
German (de)
English (en)
Inventor
Joseph Lemoine
Andreas Beutler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Mahr Holding GmbH
Original Assignee
Carl Mahr Holding GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Mahr Holding GmbH filed Critical Carl Mahr Holding GmbH
Priority to AU2003247250A priority Critical patent/AU2003247250A1/en
Publication of WO2004017018A1 publication Critical patent/WO2004017018A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
    • G01B21/02—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
    • G01B21/04—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness by measuring coordinates of points
    • G01B21/042—Calibration or calibration artifacts

Definitions

  • the invention relates to methods for calibrating a probe and a corresponding calibration device.
  • touch probes are often used, which scan the workpiece surface along a line.
  • a touch device is known from EP 0404597 B1.
  • the scanning device has a guide device with which a carrier can be selectively moved in a scanning direction.
  • a probe arm is pivotally mounted on the carrier and carries a probe tip at its end. When the carrier is moved, the probe tip scans the workpiece surface, the probe arm pivoting accordingly.
  • the swivel movement is recorded with a sensor and an evaluation direction fed.
  • the evaluation device can calculate the coordinates of the probe tip from the detected angular positions of the probe arm with a known displacement position of the carrier.
  • the probe is usually to be calibrated before taking a measurement. From EP 0404597 B1 mentioned, it is known to scan a sphere with a known radius. This should serve, in particular, to record and compensate for non-linearities resulting from the inductive transducer used as a sensor. In addition, should w thus detected inaccuracies • Ground, as caused by the size of the probe tip.
  • the calibration of a probe is at least necessary when the probe arm has been replaced, because it must be assumed that each probe arm has individual dimensional deviations.
  • the calibration of a probe arm on a sphere requires a sphere serving as a normal, which is geometrically precise.
  • the surface of a standard is scanned twice, namely a first time when the standard is relative in a first position to the touch device and a second time when the normal is in a second position relative to the touch device that differs from the first position.
  • At least one of the positions is preferably set such that the scanning arm performs a pivoting movement when scanning. This is achieved by holding the normal inclined in the relevant position against the feed direction.
  • the other position is preferably determined in such a way that the scanning arm does not perform a swiveling movement when scanning (alignment of the normal in the XY direction).
  • a carrier on which the scanning arm is pivotally mounted is moved in the feed or scanning direction, with a displacement sensor detecting the positions along its guide (X positions).
  • the angle value supplied by the angle sensor of the probe arm is assigned to each of these individual X measurement positions.
  • the value pairs of the scanning process form a data record.
  • Each scanning process generates a data record, so that a first data record is created when the normal is scanned in its first position.
  • a second data record is created when the normal is scanned in its second position.
  • Both the length of the probe arm and the length or height of the probe tip can be calculated from both data sets. This applies in particular if the surface of the standard is provided with a structure that allows pairs of values of the respective data set to be individually assigned to surface points of the standard.
  • a simple calibration results if the two positions of the standard are fixed at a swivel distance from each other.
  • the pivot axis is preferably oriented transversely to the feed direction.
  • the way on from which the normal is scanned is preferably straight if essentially flat normals are used.
  • depressions are made in the surface of the standard, transverse to the scanning direction, the edges of which are clearly identifiable during scanning. These depressions and thus also the edges thereof are preferably arranged parallel to the pivot axis of the standard. Tipping errors of the standard (rotation around the X-axis or the Z-axis) have no effect.
  • the mutually parallel depressions are preferably arranged at random intervals. They can also have a random width and depth. This enables the surface points of the standard to be clearly recognized after repeated scanning.
  • the first position of the standard is defined in such a way that the scanning arm has an essentially constant deflection during the scanning process.
  • the normal therefore extends parallel to the feed direction or X-axis.
  • the second position the normal is then inclined so that the scanning arm changes its deflection when the surface is scanned.
  • the swivel angle at which the standard is in its second position may be unknown. Nevertheless, the length of the probe arm, the length of the probe tip and the can be obtained from the two data sets obtained Calculate swivel angle.
  • the structuring makes it possible to find surface points that were recorded before swiveling after swiveling.
  • the method according to the invention is simple to use and incorrect operation on the part of the user can be reduced or eliminated. This benefits the accuracy of subsequent measurements.
  • the process can be largely automated. Actions by the operator can be requested by appropriate signals from the calibration device, thereby eliminating errors and incorrect operation.
  • a corresponding device can be manufactured inexpensively.
  • the calibrating device has a holding device in which the normal is pivotally mounted, it being lockable in at least two pivoting positions.
  • the operator can be asked, for example by a suitable display or output of the measuring device, to transfer the standard from its first pivot position to its second pivot position. The operator does not have to make any further settings.
  • the normal is a single crystal or monocrystalline material.
  • a silicon strip is preferably used, which is cut or broken, for example, from a silicon wafer. Structures can be introduced into the surface of the silicon crystal as etches arranged transversely to the feed direction.
  • the silicon standard has a flatness of a few micrometers, which is completely sufficient. Etched recesses can be made very regularly with parallel edges become. In the calibration device according to the invention, such a standard allows the measuring device to be calibrated precisely and, at the same time, inexpensively and efficiently.
  • FIG. 1 shows a calibration device according to the invention in a schematic, perspective illustration (not to scale),
  • FIG. 2 shows a schematic representation of the touch probe on a standard when it is scanned in its first position
  • Figure 5 shows the control device of the probe in a simplified, partial representation.
  • a touch probe 1 is schematically illustrated during a calibration process.
  • the touch device 1 is held stationary, for example, via a tripod 2. It contains a guide device 3 on which a slide 4 or another frame or carrier is slidably mounted in a feed direction 5.
  • the feed direction 5 corresponds to the X direction of a measurement coordinate system X, Y, Z.
  • a probe arm 6 is held detachably.
  • the probe arm 6 is pivotally mounted about an axis of rotation 7.
  • the axis of rotation 7 is preferably oriented parallel to the Y direction.
  • the probe arm 6 carries a probe tip 8, which is used to scan a workpiece.
  • the pivotal movements of the probe arm ⁇ caused thereby, or the angular positions assumed by the probe arm 6, are detected by a sensor 9 which is connected to the probe arm and is schematically illustrated in FIG. 2, for example.
  • the sensor 9 can be an inductive sensor, an optical sensor or of another type.
  • a second sensor 11 is used to detect the X position of the carriage 4 and thus the probe tip 8.
  • the sensor 11 is attached to the carriage 4 and detects its X position with respect to a scale 12, which is fixed in the probe device 1 or a frame 14 is arranged, which carries the guide device 3 and a drive device for the carriage 4, not further illustrated.
  • the scale 12 and the sensor 11 can have any structure that provides sufficient accuracy.
  • an interference optical sensor can also be used. This can comprise a reflector arranged on the carriage 4, which reflects a light beam from an interferometer arranged in a fixed manner in the frame 14 reflected.
  • the sensors 9, 11 are connected to a processing device 15, which converts the measured values obtained for the X position of the slide 4 and the swivel position of the probe arm 6 into XY position values of the tip 8a resting on the workpiece and to one Output 16 outputs.
  • the processing device 15 requires data about the geometry of the probe arm 6 and the probe tip 8, which are kept ready in a memory 17.
  • the processing device 15 determines this data in a calibration process on a calibration device 18 shown in FIG. 1.
  • This includes a holder 19 on which a standard 21 is adjustable, preferably pivotably mounted about a pivot axis 22.
  • the pivot axis 22 is preferably oriented in the Y direction and thus set up parallel to the axis of rotation 7.
  • the holder 19 is also pivotally mounted on a carriage 23 about an axis 24 oriented in the X direction.
  • the pivot positions can be set, for example, by means of an adjusting screw, which is not further illustrated.
  • the carriage 23 is mounted on a guide 25, 26 which is preferably oriented in the Y direction and is adjustable in the Y direction via a manual actuator 27.
  • the guide 25, 26 is carried by a slide 28, which in turn can be adjusted in another way via a guide and adjusting device 29, for example in the X direction or in the Z direction or with respect to a rotation about the Z axis.
  • the standard 21 can be adjusted in at least two different pivot positions. It does so with its Nem end lying away from the pivot axis 22 in a recess 31, each of which offers a defined stop with respect to the Z direction above and below, for example by means of a ball.
  • a suitable locking means for example a magnet 32 attached to the end of the standard 21, secures the standard in its stop positions.
  • the standard 21 is preferably a strip of monocrystalline silicon, which can, for example, be glued to a metal carrier. Its upward-facing surface 33 facing the probe tip 8 is essentially, i.e. except for a few micrometers. Individual depressions 34 are made in this flat surface, which, for example and preferably have a flat bottom. The depressions 34 are, for example, grooves each about one to two millimeters long in the X direction and a depth measured in the Z direction of two to ten, preferably five micrometers. Overall, the standard 21 has a length of, for example, 70 millimeters.
  • the required data namely the length of the probe arm 6 and the length or height of the probe tip 8 can be determined in a calibration process.
  • the calibration device 18, as illustrated in FIG. 1 is positioned in the area of the probe tip 8 of the probe device 1. The calibration process is then as follows:
  • the standard is first transferred to its position illustrated in FIG. 2, in which it is preferably oriented exactly in the X direction.
  • a test scan can be used to determine whether this is the case.
  • Adjustment means for example for adjusting a lower stop 35 of the holder 19, can be provided in order to bring the standard 21 into alignment with the X direction.
  • the standard 21 can be oriented in a similar manner with respect to the Y axis.
  • the probe tip 8 is placed on the surface 33 at any point.
  • An adjustment of the holder 19 in the Y direction by actuating the actuator 27 indicates whether the standard 21 is adjusted in the Y direction.
  • the normal 21 oriented in the X and Y directions, as illustrated in FIG. 2, is scanned in the feed direction 5, ie in the X direction.
  • the sensors 9, 11 supply pairs of values about the pivoting of the probe arm 6 at the respective X value to the processing device 15.
  • the pivot angles ⁇ t for each step have a first (constant) value when the tip 8a is outside the recesses 34 and they have a second (constant) value when the tip 8a is inside a recess 34.
  • the edges 36, 37 of the depressions 34 are each recorded with a few measured values.
  • the depressions 34 can be arranged exactly the same width and equidistant. However, an arrangement is preferred in which the depressions 34 and their spacings differ over the length of the standard 21.
  • the normal 21 is now scanned again.
  • the carriage 4, as illustrated in FIG. 3, is moved into the initial position, after which the probe arm 6 is placed on the standard 21 again.
  • Each step in turn is x.
  • an angle ⁇ 1 detected by the sensor 9 is assigned.
  • the data record received is saved.
  • Z k and X k mean the Cartesian coordinates of the tip 8a in a coordinate system.
  • the angle ⁇ of the probe arm is zero when the tip 8a has a Z coordinate of zero.
  • Z d and X d are the Cartesian coordinates of the axis of rotation 7.
  • the data from the scanning of the standard 21 in position II are now used with the aid of the two above I created a system of equations, the solution of which gives Ls and Hs.
  • the coordinates Z k and X k are calculated from the known pivot angle of the standard 21 and from the X positions of the edges 36, 37 of all the recesses 34 known from the first scan.
  • the system of equations acquires another unknown by expressing Z k and X k as a function of ⁇ . Due to the large over-determination of the system of equations (only three variables Hs, Ls and ß are sought and there is a pair of equations for each measuring point), such a system of equations can also be solved with a slightly higher mathematical effort.
  • the touch device 1 After removal of the calibration device 18, the touch device 1 is calibrated and ready for use.
  • the processing device 15 has corresponding correction tables in order to compensate for any non-linearities.
  • the above calibration procedure is only used to perform due recalibrations after changing the probe arm. If necessary, however, it can also be used to calibrate the sensors 9, 11 if necessary.
  • the depressions 34 in the standard 21 can be made at precisely known locations. It is also helpful if the depth of the recesses 34 is precisely known.
  • the pivoting movement of the standard 21 can also be replaced by a pivoting movement of the scanning device 1 - the decisive factor is the measurement in two different relative positions, which differ by a pivoting movement.
  • a calibration device 18 which, as normal 21, has a silicon strip with depressions 34.
  • the standard 21 is scanned in two different swivel positions.
  • the length Ls of the probe arm 6 and the height Hs of the probe tip 8 can be determined from the measured values which have been obtained in the two different pivot positions.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • A Measuring Device Byusing Mechanical Method (AREA)

Abstract

L'invention concerne une installation d'étalonnage (18) utilisée pour étalonner un dispositif palpeur (1), laquelle comporte comme étalon (21) une bande de silicium présentant des creux (34). L'étalon (21) est palpé dans deux positions angulaires différentes. A partir des valeurs de mesure obtenues avec l'étalon se trouvant dans ces deux positions angulaires différentes, la longueur (Ls) du bras de palpeur (6) et la hauteur (Hs) de la pointe de palpeur (8) sont déterminées.
PCT/DE2003/002219 2002-07-23 2003-07-03 Procede et installation pour etalonner un dispositif palpeur Ceased WO2004017018A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2003247250A AU2003247250A1 (en) 2002-07-23 2003-07-03 Method and device for calibrating a feeler device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2002133369 DE10233369A1 (de) 2002-07-23 2002-07-23 Verfahren und Vorrichtung zum Kalibrieren eines Tastgeräts
DE10233369.6 2002-07-23

Publications (1)

Publication Number Publication Date
WO2004017018A1 true WO2004017018A1 (fr) 2004-02-26

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Application Number Title Priority Date Filing Date
PCT/DE2003/002219 Ceased WO2004017018A1 (fr) 2002-07-23 2003-07-03 Procede et installation pour etalonner un dispositif palpeur

Country Status (3)

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AU (1) AU2003247250A1 (fr)
DE (1) DE10233369A1 (fr)
WO (1) WO2004017018A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110196005A (zh) * 2019-06-14 2019-09-03 苏州热工研究院有限公司 核电有放射性游标量具的校准装置以及方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB202012104D0 (en) * 2020-08-04 2020-09-16 Renishaw Plc Measurement method
DE102021128281A1 (de) 2021-10-29 2023-05-04 Afm Technology Gmbh Kalibrierkörper und verfahren zum kalibrieren eines koordinatenmessgeräts

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE7603196U1 (fr) * 1900-01-01 Hommelwerke Gmbh, 7220 Schwenningen
US4888984A (en) * 1987-04-06 1989-12-26 Mitutoyo Corporation Levelling device of roughness measuring machine
EP0517270A1 (fr) * 1991-06-05 1992-12-09 Canon Kabushiki Kaisha Sonde-microscope de balayage
US5253429A (en) * 1991-03-07 1993-10-19 Mitutoyo Corporation Levelling method and apparatus
JPH08233836A (ja) * 1995-02-28 1996-09-13 Hitachi Constr Mach Co Ltd 走査型プローブ顕微鏡、並びにその高さ方向較正用基準器および較正方法
US6028008A (en) * 1996-12-09 2000-02-22 International Business Machines Corporation Calibration standard for profilometers and manufacturing procedure

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE7603196U1 (fr) * 1900-01-01 Hommelwerke Gmbh, 7220 Schwenningen
US4888984A (en) * 1987-04-06 1989-12-26 Mitutoyo Corporation Levelling device of roughness measuring machine
US5253429A (en) * 1991-03-07 1993-10-19 Mitutoyo Corporation Levelling method and apparatus
EP0517270A1 (fr) * 1991-06-05 1992-12-09 Canon Kabushiki Kaisha Sonde-microscope de balayage
JPH08233836A (ja) * 1995-02-28 1996-09-13 Hitachi Constr Mach Co Ltd 走査型プローブ顕微鏡、並びにその高さ方向較正用基準器および較正方法
US6028008A (en) * 1996-12-09 2000-02-22 International Business Machines Corporation Calibration standard for profilometers and manufacturing procedure

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 1997, no. 01 31 January 1997 (1997-01-31) *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110196005A (zh) * 2019-06-14 2019-09-03 苏州热工研究院有限公司 核电有放射性游标量具的校准装置以及方法

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Publication number Publication date
AU2003247250A1 (en) 2004-03-03
DE10233369A1 (de) 2004-02-12

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