WO2004090950A3 - Räumlich hochauflelöstes erzeugen einer dauerhaften struktur - Google Patents

Räumlich hochauflelöstes erzeugen einer dauerhaften struktur Download PDF

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Publication number
WO2004090950A3
WO2004090950A3 PCT/EP2004/003768 EP2004003768W WO2004090950A3 WO 2004090950 A3 WO2004090950 A3 WO 2004090950A3 EP 2004003768 W EP2004003768 W EP 2004003768W WO 2004090950 A3 WO2004090950 A3 WO 2004090950A3
Authority
WO
WIPO (PCT)
Prior art keywords
optical signal
substance
partial area
dimensional resolution
permanent structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2004/003768
Other languages
English (en)
French (fr)
Other versions
WO2004090950A2 (de
Inventor
Stefan Hell
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Max Planck Gesellschaft zur Foerderung der Wissenschaften eV
Original Assignee
Max Planck Gesellschaft zur Foerderung der Wissenschaften eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/420,896 external-priority patent/US7064824B2/en
Priority claimed from DE10325459A external-priority patent/DE10325459A1/de
Application filed by Max Planck Gesellschaft zur Foerderung der Wissenschaften eV filed Critical Max Planck Gesellschaft zur Foerderung der Wissenschaften eV
Priority to JP2006505065A priority Critical patent/JP2006522989A/ja
Priority to EP04726458A priority patent/EP1616344B1/de
Priority to DE502004007840T priority patent/DE502004007840D1/de
Publication of WO2004090950A2 publication Critical patent/WO2004090950A2/de
Publication of WO2004090950A3 publication Critical patent/WO2004090950A3/de
Priority to US11/249,103 priority patent/US7539115B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/004—Recording, reproducing or erasing methods; Read, write or erase circuits therefor
    • G11B7/0045—Recording
    • G11B7/00455—Recording involving reflectivity, absorption or colour changes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
    • G11B7/246—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing dyes
    • G11B2007/24624—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing dyes fluorescent dyes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Recording Or Reproduction (AREA)

Abstract

Zum räumlich hochaufgelösten Erzeugen einer dauerhaften Struktur wird eine Substanz, die mit einem optischen Signal (5) veränderbar ist, in einem Schreibbereich (7) bereitgestellt, und das optische Signal (5) wird so auf den Schreibbereich (7) aufgebracht, dass es einen räumlich begrenzten Teilbereich gezielt auslässt, in dem dauerhaft ein anderer Zustand (C) der Substanz eingestellt wird, als in von dem optischen Signal (5) erfassten Teilbereichen des Schreibbereichs (7). Dabei ist der von dem optischen Signal (5) gezielt ausgelassene Teilbereich ein lokales Intensitätsminimum (9) des optischen Signals (5), und das optische Signal (5) wird außerhalb des gezielt ausgelassenen räumlich begrenzten Teilbereichs so aufgebracht, dass beim Verändern der Substanz mit dem optischen Signal (5) die Sättigung erreicht wird. Auf diese Weise kann die Beugungsgrenze bei der erzeugten Struktur unterschritten werden.
PCT/EP2004/003768 2003-04-13 2004-04-08 Räumlich hochauflelöstes erzeugen einer dauerhaften struktur Ceased WO2004090950A2 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006505065A JP2006522989A (ja) 2003-04-13 2004-04-08 高い空間分解能の一定の構造部の製造
EP04726458A EP1616344B1 (de) 2003-04-13 2004-04-08 Räumlich hochaufgelöstes erzeugen einer dauerhaften struktur
DE502004007840T DE502004007840D1 (de) 2003-04-13 2004-04-08 Räumlich hochaufgelöstes erzeugen einer dauerhaften struktur
US11/249,103 US7539115B2 (en) 2003-04-13 2005-10-12 Creating a permanent structure with high spatial resolution

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
DE10317613 2003-04-13
DE10317613.6 2003-04-13
US10/420,896 US7064824B2 (en) 2003-04-13 2003-04-22 High spatial resoulution imaging and modification of structures
US10/420,896 2003-04-22
DE10325459A DE10325459A1 (de) 2003-04-13 2003-06-05 Räumlich hochaufgelöstes Erzeugen einer dauerhaften Struktur
DE10325459.5 2003-06-05

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US10/420,896 Continuation-In-Part US7064824B2 (en) 2003-04-13 2003-04-22 High spatial resoulution imaging and modification of structures

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US11/249,103 Continuation US7539115B2 (en) 2003-04-13 2005-10-12 Creating a permanent structure with high spatial resolution

Publications (2)

Publication Number Publication Date
WO2004090950A2 WO2004090950A2 (de) 2004-10-21
WO2004090950A3 true WO2004090950A3 (de) 2005-03-03

Family

ID=33162571

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2004/003768 Ceased WO2004090950A2 (de) 2003-04-13 2004-04-08 Räumlich hochauflelöstes erzeugen einer dauerhaften struktur

Country Status (3)

Country Link
EP (1) EP1616344B1 (de)
JP (1) JP2006522989A (de)
WO (1) WO2004090950A2 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7772569B2 (en) 2008-04-01 2010-08-10 The Jackson Laboratory 3D biplane microscopy
US8217992B2 (en) 2007-01-11 2012-07-10 The Jackson Laboratory Microscopic imaging techniques

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2453238B1 (de) 2005-05-23 2016-12-21 Harald F. Hess Optische Mikroskopie mit phototransformierbaren optischen Markern
ATE441103T1 (de) † 2005-07-22 2009-09-15 Zeiss Carl Microimaging Gmbh Auflísungsgesteigerte lumineszenz-mikroskopie
DE102005040671B4 (de) * 2005-08-26 2008-04-30 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Verfahren und Vorrichtungen zum Speichern einer dreidimensionalen Anordnung von Datenbits in einem Festkörper
DE102008019957B4 (de) 2008-04-21 2015-04-30 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Verfahren zum Bestrahlen einer Probe mit Licht und Fluoreszenzlichtmikroskop mit einer Beleuchtungseinheit zum Bestrahlen einer Probe mit Licht
DE202011111072U1 (de) 2011-02-25 2019-03-27 Nanoscribe Gmbh Vorrichtung zum ortsaufgelösten Einbringen eines Intensitätsmusters aus elektromagnetischer Strahlung in eine photosensitive Substanz
DE102011081247A1 (de) * 2011-08-19 2013-02-21 Carl Zeiss Smt Gmbh Belichtungsanlage und Verfahren zur strukturierten Belichtung einer lichtempfindlichen Schicht
DE102016007736B4 (de) 2016-06-27 2020-07-02 Laser-Laboratorium Göttingen e.V. Verfahren zur lokalen Modifikation eines Substrats
DE102021101164B4 (de) 2021-01-20 2024-06-27 Xolo Gmbh Verfahren und Vorrichtung zum Herstellen eines dreidimensionalen Objekts in einem optisch reaktiven Ausgangsmaterial

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3712813A (en) * 1969-12-19 1973-01-23 Siemens Ag Production of semiconductor modules by a photo-resist technique with holographic projection of etching patterns
US4104070A (en) * 1975-06-30 1978-08-01 International Business Machines Corporation Method of making a negative photoresist image
US5403435A (en) * 1992-01-23 1995-04-04 Micron Technology, Inc. Process for selectively etching integrated circuit devices having deep trenches or troughs or elevated features with re-entrant profiles

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3712813A (en) * 1969-12-19 1973-01-23 Siemens Ag Production of semiconductor modules by a photo-resist technique with holographic projection of etching patterns
US4104070A (en) * 1975-06-30 1978-08-01 International Business Machines Corporation Method of making a negative photoresist image
US5403435A (en) * 1992-01-23 1995-04-04 Micron Technology, Inc. Process for selectively etching integrated circuit devices having deep trenches or troughs or elevated features with re-entrant profiles

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8217992B2 (en) 2007-01-11 2012-07-10 The Jackson Laboratory Microscopic imaging techniques
US7772569B2 (en) 2008-04-01 2010-08-10 The Jackson Laboratory 3D biplane microscopy
US7880149B2 (en) 2008-04-01 2011-02-01 The Jackson Laboratory 3D biplane microscopy

Also Published As

Publication number Publication date
EP1616344B1 (de) 2008-08-13
WO2004090950A2 (de) 2004-10-21
EP1616344A2 (de) 2006-01-18
JP2006522989A (ja) 2006-10-05

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