WO2006064428A1 - Method and apparatus for reducing probe wavelength in laser excited surface acoustic wave spectroscopy - Google Patents
Method and apparatus for reducing probe wavelength in laser excited surface acoustic wave spectroscopy Download PDFInfo
- Publication number
- WO2006064428A1 WO2006064428A1 PCT/IB2005/054142 IB2005054142W WO2006064428A1 WO 2006064428 A1 WO2006064428 A1 WO 2006064428A1 IB 2005054142 W IB2005054142 W IB 2005054142W WO 2006064428 A1 WO2006064428 A1 WO 2006064428A1
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- WO
- WIPO (PCT)
- Prior art keywords
- excitation
- wavelength
- optical system
- optical
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N21/49—Scattering, i.e. diffuse reflection within a body or fluid
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/1702—Systems in which incident light is modified in accordance with the properties of the material investigated with opto-acoustic detection, e.g. for gases or analysing solids
Definitions
- This invention relates to a method and apparatus for measuring properties (e.g., thickness) of thin layers (e.g., metal films) contained in a structure.
- thin films of metals and metal alloys are deposited on silicon wafers and used as electrical conductors, adhesion-promoting layers, and diffusion barriers. Thickness variations in these films can modify their electrical and mechanical properties, thereby affecting the performance of the integrated circuit.
- films are deposited to have a thickness of within a few percent of their target value. Because of these rigid tolerances, film thickness is often measured as a quality-control parameter during and/or after the integrated circuit's fabrication.
- Non-contact, nondestructive measurement techniques e.g., optical techniques
- Measurement of product samples accurately indicates errors in fabrication processes and additionally reduces costs associated with monitor samples.
- acoustic waves form a "transient grating" that includes an alternating series of peaks and nulls.
- a probe pulse irradiates the grating, and is diffracted to form a pair of signal beams (in addition to the directly reflected beam) .
- One or both of the signal beams are detected and analyzed to measure a property of the sample.
- Fig. 1 depicts a prior art optical system 1.
- Laser 10 generates an optical excitation pulse 11 which is split by a phase grating 12 into sub pulses 11', H''.
- Sub pulses 11', H'' pass through a lens 13.
- the collimated sub pulses 11', H'' are focused onto the surface of a sample 15 by a second lens 14.
- Probe laser 16 generates a probe beam 17 which is split into probe beam 17 and reference beam 17' by phase grating 12.
- Lens 13 collimates probe beam 17 and reference beam 17' .
- Flat glass plates 18' and 18 are a neutral density filter and a matching plate, respectively. Plates 18, 18' ensure that the transient grating is in phase with the pattern formed by the probe beam 17/reference beam 17' pair. Plates 18, 18' can be tilted to a single tilt position for a range of excitation wavelengths to adjust the phases of the probe beam 17 and/or the reference beam 17' to align the transient grating phase with the pattern formed by the probe beam 17/reference beam 17' pair.
- Lens 14 focuses the probe beam 17 and reference beam 17' onto the transient grating.
- the transient grating diffracts a portion of the probe beam 17 and reflects a portion of the probe beam 17.
- Detector 19 detects the diffracted and reflected portions of probe beam 17.
- a disadvantage of the prior art optical system is that the measurement wavelength (the period of the transient grating pattern excited by the excitation laser) is relatively long. The penetration depth of the surface acoustic wave scales with wavelength.
- Prior art optical systems have minimum measurement wavelength of 4 microns. Since each wiring level of a typical modern integrated circuit is on the order of 1 micron thick, it is advantageous to reduce the measurement wavelength to ⁇ 1 micron.
- the invention proposes to reduce the measurement wavelength, for
- an apparatus including: a first light source that generates an optical excitation pulse; an optical system aligned to receive the optical excitation pulse, separate it into at least two optical pulses and focus at least one pulse onto a surface of a sample to form an excitation pattern with at least one spatial phase and at least one spatial period; a second light source that generates a probe beam that diffracts off the sample; an optical detector that detects the diffracted portion of the probe beam to generate a signal; and a processor configured to process the signal from the optical detector to determine a property of the sample, and the optical system permits excitation patters with measurement wavelengths between 1.2 and 11 microns.
- the optical system includes an achromat doublet lens that includes a low refractive index element and a high refractive index element.
- the achromat doublet lens includes at least one element made out of gradient-index glass or at least one surface of the lens is aspheric.
- the achromat doublet lens is truncated with a plane cut parallel to the lens axis in order to allow better packaging of other device components (e.g. a vision system) .
- the one-cemented block design of the doublet lens simplifies its mounting and alignment.
- the optical system includes at least two plates, and wherein the tilt of one of the at least two plates can be adjusted in response to a particular excitation wavelength.
- At least one of the two plates is attached to a mount which is attached to an electromechanical assembly which adjusts the tilt of the plate to which it is attached.
- the optical system includes a phase grating which produces multiple diffraction order beams, and a beam block configured to block at least one excitation beam beyond the +lst and -1st diffraction orders.
- a method of measuring a sample includes the steps of: irradiating a portion of the sample with an excitation pattern having at least one spatial phase and spatial period; diffracting a portion of a probe beam off a surface of the sample; detecting the diffracted portion of the probe beam with an optical detector to generate a light- induced signal; processing the light-induced signal to determine a property of the sample, wherein the irradiating and diffracting steps further comprise reducing a minimum
- probing wavelength to between 1 and 1.2 ⁇ m.
- an achromat doublet lens with at least one gradient-index-glass element and/or with at least one aspheric surface, adjusting the tilt of at least one plate in response to a particular excitation wavelength, and/or employing a beam block configured to block at least one excitation beam beyond the +lst and -1st excitation order.
- the invention provides many advantages, some of which are elucidated with reference to the embodiments below.
- Fig. 1 depicts a prior art optical system
- Fig. 2 depicts a truncated high numerical aperture doublet lens
- Fig. 3 depicts an optical system with individually adjustable glass plates
- Fig. 4A depicts a fingered aperture beam block
- Fig. 4B depicts a moveable aperture beam block
- Fig. 5 depicts multiple diffraction order beams from a phase mask, some of them blocked by a beam block.
- Fig. 2 depicts a high numerical aperture lens 20 which can be used in place of lens 14 of Fig. 1.
- High numerical aperture lens 20 has, for example, two components: high- refraction index glass element 21 and low-refraction index glass element 22. Elements 21 and 22 are cemented together to form an achromat doublet lens.
- gradient-index glass i.e., glass in which index of refraction is not uniform but rather increases, typically along the lens axis; selecting the glass with a particular rate of index change allows increasing the numerical aperture of the lens without sacrificing its performance
- the low-refraction index element 22 is used to form the low- refraction index element 22.
- element 22 allows for approximately double gain in numerical aperture.
- Another approach is to make at least one surface of at least one element aspheric (i.e., non-spherical surface, typically described by some mathematical equation, optimized to achieve the best possible performance) .
- a single aspheric outside surface allows for a greater than three times gain in numerical aperture.
- the higher numerical aperture of lens 20 converges excitation sub beams 11', H'' and probe beam 17/reference beam 17' pair of Fig. 1 at wider angles than the prior art lens. This reduces the spacing of the projected excitation pattern that generates the transient grating. The spacing of the excitation pattern determines the wavelengths of the launched surface acoustic wave.
- lens 20 is truncated (for example, with a plane cut parallel to the lens axis and located within a few millimeters of it) . This allows better placement of a vision system (not shown) of the optical system 1 of Fig. 1.
- An additional method of reducing the probing wavelength is to include at least one automatically adjustable glass plate that can be adjusted at each excitation wavelength, as depicted in Fig. 3.
- Plates 18, 18' of Fig. 1 ensure that the transient grating is in phase with the pattern formed by the probe beam 17/reference beam 17' pair.
- plate 18' can be individually tilted to a single tilt position in order to adjust the phases of the probe beam 17 and/or the reference beam 17' . This aligns the transient grating phase with the pattern formed by the probe beam 17/reference beam 17' pair.
- the excitation pattern should be in phase with the pattern of interference formed by the probe beam 17/reference beam 17' pair for optical system 1 to work efficiently.
- plate 18' tilt is capable of being individually adjustable in any direction for each excitation wavelength.
- a mount 30 can enact individual adjustments at various wavelengths with an electric stepper motor or any other electro-mechanical assembly known to one of skill in the art. Plate 18, plate 18', or both can be affixed to such a mount. This enables individual adjustment at each excitation wavelength if so desired. This enables fine- tuning of the phase between the excitation pattern and the pattern of interference formed by the probe beam 17/reference beam 17' pair over a whole range of wavelengths. Although this does not reduce the measurement wavelength directly, the main effect is that the tolerances on optical components and assembly are greatly relaxed (otherwise the tolerances tend to be much tighter for shorter acoustic wavelengths) .
- An additional method of reducing the probing wavelength is to limit the number of diffraction order beams. Reducing the minimum probing wavelength while still keeping the long wavelength capability increases the total wavelength range of the system (consider, for example 4 ⁇ m - 10 ⁇ m range of the prior art system, or 2.5X min-to-max ratio, vs. 1.2 ⁇ m - 11 ⁇ m range of the new system, or 9X min-to-max ratio) . Extended wavelength range of the system results in large variation of angles between the excitation and probe sub-beams. Phase grating 12 of Fig. 1 produces multiple diffraction order beams.
- Fig. 4A depicts a fingered aperture beam block 40 which blocks undesirable excitation orders.
- the fingered aperture 41 relies on special ratios of the phase grating 12 periods.
- fingered beam block 40 slides into the appropriate position either between the phase grating 12 and the lens 13 or between the lenses 13 and 14. This only enables the transmission of the ⁇ l st excitation orders and blocks the 0 th , ⁇ 3 rd and all higher excitation orders.
- Fig. 4B depicts an additional example of a moveable aperture beam block 40.
- Moveable aperture 44 can be slid in and out of the excitation beam's path along arrow 51.
- the position of the beam block is determined by the resulting measurement wavelength of the instrument and is such the only the needed beams pass through the aperture opening. This may require, for example, a translation slide and/or a motor.
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- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
Abstract
Description
Claims
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/721,645 US8184300B2 (en) | 2004-12-13 | 2005-12-08 | Method and apparatus for reducing probe wavelength in laser excited surface acoustic wave spectroscopy |
| EP05823208A EP1831640A1 (en) | 2004-12-13 | 2005-12-08 | Method and apparatus for reducing probe wavelength in laser excited surface acoustic wave spectroscopy |
| JP2007546250A JP2008523409A (en) | 2004-12-13 | 2005-12-08 | Method and apparatus for reducing probe wavelength in laser excited surface acoustic wave spectroscopy |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US63568004P | 2004-12-13 | 2004-12-13 | |
| US60/635,680 | 2004-12-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2006064428A1 true WO2006064428A1 (en) | 2006-06-22 |
Family
ID=35911190
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/IB2005/054142 Ceased WO2006064428A1 (en) | 2004-12-13 | 2005-12-08 | Method and apparatus for reducing probe wavelength in laser excited surface acoustic wave spectroscopy |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8184300B2 (en) |
| EP (1) | EP1831640A1 (en) |
| JP (1) | JP2008523409A (en) |
| WO (1) | WO2006064428A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8692977B2 (en) | 2010-05-13 | 2014-04-08 | Asml Holding N.V. | Optical system, inspection system and manufacturing method |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101806722B (en) * | 2010-03-11 | 2011-08-31 | 中山大学 | Transient saturated absorption spectrum test method of transient grating decay kinetics |
| CN114414658B (en) * | 2022-01-11 | 2024-04-09 | 南京大学 | A laser ultrasonic detection method for the depth of microcracks on metal surfaces |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5633711A (en) * | 1991-07-08 | 1997-05-27 | Massachusettes Institute Of Technology | Measurement of material properties with optically induced phonons |
| US6069703A (en) * | 1998-05-28 | 2000-05-30 | Active Impulse Systems, Inc. | Method and device for simultaneously measuring the thickness of multiple thin metal films in a multilayer structure |
| WO2003010518A2 (en) * | 2001-07-26 | 2003-02-06 | Koninklijke Philips Electronics N.V. | Opto-acoustic apparatus with optical heterodyning for measuring solid surfaces and thin films |
| US6795198B1 (en) * | 1998-05-28 | 2004-09-21 | Martin Fuchs | Method and device for measuring thin films and semiconductor substrates using reflection mode geometry |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6267913B1 (en) * | 1996-11-12 | 2001-07-31 | California Institute Of Technology | Two-photon or higher-order absorbing optical materials and methods of use |
| DE60128138T2 (en) * | 2000-11-02 | 2008-01-03 | Cornell Research Foundation, Inc. | IN VIVO MULTIPHOTON DIAGNOSTIC DETECTION AND IMAGE DISPLAY OF A NEURODEEGENERATIVE DISEASE |
| JP2003057027A (en) * | 2001-08-10 | 2003-02-26 | Ebara Corp | Measuring instrument |
-
2005
- 2005-12-08 EP EP05823208A patent/EP1831640A1/en not_active Withdrawn
- 2005-12-08 US US11/721,645 patent/US8184300B2/en not_active Expired - Fee Related
- 2005-12-08 JP JP2007546250A patent/JP2008523409A/en active Pending
- 2005-12-08 WO PCT/IB2005/054142 patent/WO2006064428A1/en not_active Ceased
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5633711A (en) * | 1991-07-08 | 1997-05-27 | Massachusettes Institute Of Technology | Measurement of material properties with optically induced phonons |
| US6069703A (en) * | 1998-05-28 | 2000-05-30 | Active Impulse Systems, Inc. | Method and device for simultaneously measuring the thickness of multiple thin metal films in a multilayer structure |
| US6795198B1 (en) * | 1998-05-28 | 2004-09-21 | Martin Fuchs | Method and device for measuring thin films and semiconductor substrates using reflection mode geometry |
| WO2003010518A2 (en) * | 2001-07-26 | 2003-02-06 | Koninklijke Philips Electronics N.V. | Opto-acoustic apparatus with optical heterodyning for measuring solid surfaces and thin films |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8692977B2 (en) | 2010-05-13 | 2014-04-08 | Asml Holding N.V. | Optical system, inspection system and manufacturing method |
| US9411244B2 (en) | 2010-05-13 | 2016-08-09 | Asml Holding N.V. | Optical system, inspection system and manufacturing method |
Also Published As
| Publication number | Publication date |
|---|---|
| US8184300B2 (en) | 2012-05-22 |
| EP1831640A1 (en) | 2007-09-12 |
| JP2008523409A (en) | 2008-07-03 |
| US20090303496A1 (en) | 2009-12-10 |
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