WO2006090870A3 - Dispositif et procede de formation d'images - Google Patents

Dispositif et procede de formation d'images Download PDF

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Publication number
WO2006090870A3
WO2006090870A3 PCT/JP2006/303533 JP2006303533W WO2006090870A3 WO 2006090870 A3 WO2006090870 A3 WO 2006090870A3 JP 2006303533 W JP2006303533 W JP 2006303533W WO 2006090870 A3 WO2006090870 A3 WO 2006090870A3
Authority
WO
WIPO (PCT)
Prior art keywords
stage
work
standard
image forming
forming device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2006/303533
Other languages
English (en)
Other versions
WO2006090870A2 (fr
Inventor
Akihiro Hashiguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of WO2006090870A2 publication Critical patent/WO2006090870A2/fr
Anticipated expiration legal-status Critical
Publication of WO2006090870A3 publication Critical patent/WO2006090870A3/fr
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7096—Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Sustainable Development (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

Cette invention concerne un dispositif et un procédé de formation d'images au moyen desquels des images peuvent être formées avec une grande précision de positionnement. Le dispositif de formation d'images comprend un étage sur lequel une pièce de travail est montée et un dispositif de dessin chargé de détecter une marque standard sur la pièce de travail montée sur l'étage et de former une image sur la base de la position de la marque standard détectée comme image standard, lequel étage effectue un mouvement de va-et-vient par rapport au dispositif de dessin. Le dispositif de dessin obtient des données de position de la marque standard tandis que l'étage se déplace le long de l'itinéraire aller et forme une image sur la pièce de travail sur la base des données de position obtenues lorsque l'étage se déplace le long de l'itinéraire retour. Le dispositif comprend également un élément de positionnement standard chargé de positionner la pièce de travail en touchant le côté qui est le dernier à être exposé parmi une paire des côtés de la pièce de travail s'étendant dans les directions aller et retour de l'étage, lequel élément de positionnement standard est disposé sur l'étage.
PCT/JP2006/303533 2005-02-25 2006-02-21 Dispositif et procede de formation d'images Ceased WO2006090870A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005051610A JP4485381B2 (ja) 2005-02-25 2005-02-25 画像形成装置および画像形成方法
JP2005-051610 2005-02-25

Publications (2)

Publication Number Publication Date
WO2006090870A2 WO2006090870A2 (fr) 2006-08-31
WO2006090870A3 true WO2006090870A3 (fr) 2007-10-25

Family

ID=36927841

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2006/303533 Ceased WO2006090870A2 (fr) 2005-02-25 2006-02-21 Dispositif et procede de formation d'images

Country Status (4)

Country Link
JP (1) JP4485381B2 (fr)
KR (1) KR20070106620A (fr)
CN (1) CN101120286A (fr)
WO (1) WO2006090870A2 (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4485381B2 (ja) * 2005-02-25 2010-06-23 富士フイルム株式会社 画像形成装置および画像形成方法
CN100543587C (zh) * 2007-11-08 2009-09-23 友达光电股份有限公司 一种检测装置及其检测方法
NL2003414A (en) * 2008-10-07 2010-04-08 Asml Netherlands Bv Substrate measurement method and apparatus.
CN105424563A (zh) * 2014-09-18 2016-03-23 苏州汉如电子科技有限公司 一种基于局部压强差异的差分式粉尘传感器
CN105938621A (zh) * 2016-06-12 2016-09-14 深圳市海目星激光科技有限公司 一种拍照对位方法以及拍照对位装置
JP7045890B2 (ja) * 2018-03-20 2022-04-01 株式会社Ｓｃｒｅｅｎホールディングス パターン描画装置およびパターン描画方法
CN112925175A (zh) * 2021-01-29 2021-06-08 深圳市大族数控科技股份有限公司 一种曝光机
JP7795313B2 (ja) * 2021-09-14 2026-01-07 株式会社アドテックエンジニアリング 直描式露光装置及び直描式露光装置におけるステージクリーニング方法
CN117289556B (zh) * 2023-09-14 2025-11-21 深圳市海目芯微电子装备科技有限公司 显示面板边缘曝光设备

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000275863A (ja) * 1999-03-24 2000-10-06 Asahi Optical Co Ltd 走査式描画装置
US6552775B1 (en) * 1999-11-26 2003-04-22 Nikon Corporation Exposure method and apparatus
EP1450398A2 (fr) * 2003-02-20 2004-08-25 Applied Materials, Inc. Un procédé et un appareil pour placer un substrat relativement au support
EP1482373A1 (fr) * 2003-05-30 2004-12-01 ASML Netherlands B.V. Appareil lithographique et méthode de fabrication d'un dispositif
JP2006232477A (ja) * 2005-02-24 2006-09-07 Fuji Photo Film Co Ltd シート体位置決め治具及びそれを用いた描画装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3253226B2 (ja) * 1995-01-30 2002-02-04 東芝機械株式会社 被処理材の固定装置
JPH09134859A (ja) * 1995-11-08 1997-05-20 Sanee Giken Kk 露光における位置合わせ方法および装置
JPH09197682A (ja) * 1996-01-18 1997-07-31 Toyo Commun Equip Co Ltd 露光用治具
JPH09325309A (ja) * 1996-06-03 1997-12-16 Nikon Corp プリアライメント装置及びプリアライメント方法
JPH11124230A (ja) * 1997-10-23 1999-05-11 Nikon Corp 基板搬送方法及び基板搬送装置
JP2001356488A (ja) * 2000-06-14 2001-12-26 Asahi Optical Co Ltd レーザ描画装置
JP4279053B2 (ja) * 2002-06-07 2009-06-17 富士フイルム株式会社 露光ヘッド及び露光装置
JP2004031799A (ja) * 2002-06-27 2004-01-29 Orc Mfg Co Ltd ワークの仮位置決め機構及び仮位置決め方法
JP2004163798A (ja) * 2002-11-15 2004-06-10 Fuji Photo Film Co Ltd 露光装置
JP4485381B2 (ja) * 2005-02-25 2010-06-23 富士フイルム株式会社 画像形成装置および画像形成方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000275863A (ja) * 1999-03-24 2000-10-06 Asahi Optical Co Ltd 走査式描画装置
US6552775B1 (en) * 1999-11-26 2003-04-22 Nikon Corporation Exposure method and apparatus
EP1450398A2 (fr) * 2003-02-20 2004-08-25 Applied Materials, Inc. Un procédé et un appareil pour placer un substrat relativement au support
EP1482373A1 (fr) * 2003-05-30 2004-12-01 ASML Netherlands B.V. Appareil lithographique et méthode de fabrication d'un dispositif
JP2006232477A (ja) * 2005-02-24 2006-09-07 Fuji Photo Film Co Ltd シート体位置決め治具及びそれを用いた描画装置

Also Published As

Publication number Publication date
KR20070106620A (ko) 2007-11-02
JP4485381B2 (ja) 2010-06-23
JP2006235370A (ja) 2006-09-07
CN101120286A (zh) 2008-02-06
WO2006090870A2 (fr) 2006-08-31

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