WO2006136352A3 - Objektiv mit relativer positionsbestimmung optischer elemente - Google Patents

Objektiv mit relativer positionsbestimmung optischer elemente Download PDF

Info

Publication number
WO2006136352A3
WO2006136352A3 PCT/EP2006/005855 EP2006005855W WO2006136352A3 WO 2006136352 A3 WO2006136352 A3 WO 2006136352A3 EP 2006005855 W EP2006005855 W EP 2006005855W WO 2006136352 A3 WO2006136352 A3 WO 2006136352A3
Authority
WO
WIPO (PCT)
Prior art keywords
relative position
lens
optical elements
determination
optical element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2006/005855
Other languages
English (en)
French (fr)
Other versions
WO2006136352A2 (de
Inventor
Yim-Bun Patrick Kwan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to US11/916,470 priority Critical patent/US8717534B2/en
Publication of WO2006136352A2 publication Critical patent/WO2006136352A2/de
Publication of WO2006136352A3 publication Critical patent/WO2006136352A3/de
Anticipated expiration legal-status Critical
Priority to US14/227,107 priority patent/US9097985B2/en
Priority to US14/796,661 priority patent/US9551940B2/en
Priority to US15/411,391 priority patent/US20170199465A1/en
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/003—Alignment of optical elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/12—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means
    • G01D5/14—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means influencing the magnitude of a current or voltage
    • G01D5/20—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means influencing the magnitude of a current or voltage by varying inductance, e.g. by a movable armature
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/12—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means
    • G01D5/14—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means influencing the magnitude of a current or voltage
    • G01D5/24—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means influencing the magnitude of a current or voltage by varying capacitance
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/62—Optical apparatus specially adapted for adjusting optical elements during the assembly of optical systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/021—Mountings, adjusting means, or light-tight connections, for optical elements for lenses for more than one lens
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/028—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/14—Mountings, adjusting means, or light-tight connections, for optical elements for lenses adapted to interchange lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lens Barrels (AREA)

Abstract

Die Erfindung betrifft ein Objektiv mit mehreren in einem Objektivgehäuse angeordneten optischen Elementen, wobei zur relativen Positionsbestimmung zwischen einem ersten optischen Element und einem zweiten optischen Element oder zwischen einem lasttragenden Strukturelement des Objektivs und einem zweiten optischen Element wenigstens eine Sensoranordnung mit wenigstens einer kapazitiven Sensoreinheit und/oder wenigstens einer induktiven Sensoreinheit vorgesehen ist.
PCT/EP2006/005855 2005-06-20 2006-06-19 Objektiv mit relativer positionsbestimmung optischer elemente Ceased WO2006136352A2 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US11/916,470 US8717534B2 (en) 2005-06-20 2006-06-19 Lens comprising a plurality of optical element disposed in a housing
US14/227,107 US9097985B2 (en) 2005-06-20 2014-03-27 Lens comprising a plurality of optical element disposed in a housing
US14/796,661 US9551940B2 (en) 2005-06-20 2015-07-10 Lens comprising a plurality of optical element disposed in a housing
US15/411,391 US20170199465A1 (en) 2005-06-20 2017-01-20 Lens comprising a plurality of optical element disposed in a housing

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US69208005P 2005-06-20 2005-06-20
US60/692,080 2005-06-20

Related Child Applications (3)

Application Number Title Priority Date Filing Date
US11/916,470 A-371-Of-International US8717534B2 (en) 2005-06-20 2006-06-19 Lens comprising a plurality of optical element disposed in a housing
US12/916,470 Continuation US8818000B2 (en) 2008-04-25 2010-10-29 System, device, and method utilizing an integrated stereo array microphone
US14/227,107 Continuation US9097985B2 (en) 2005-06-20 2014-03-27 Lens comprising a plurality of optical element disposed in a housing

Publications (2)

Publication Number Publication Date
WO2006136352A2 WO2006136352A2 (de) 2006-12-28
WO2006136352A3 true WO2006136352A3 (de) 2007-03-08

Family

ID=36933430

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2006/005855 Ceased WO2006136352A2 (de) 2005-06-20 2006-06-19 Objektiv mit relativer positionsbestimmung optischer elemente

Country Status (2)

Country Link
US (4) US8717534B2 (de)
WO (1) WO2006136352A2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006136352A2 (de) 2005-06-20 2006-12-28 Carl Zeiss Smt Ag Objektiv mit relativer positionsbestimmung optischer elemente
DE102008032853A1 (de) * 2008-07-14 2010-01-21 Carl Zeiss Smt Ag Optische Einrichtung mit einem deformierbaren optischen Element
CN102722016B (zh) * 2012-06-21 2014-08-20 中国科学院长春光学精密机械与物理研究所 光学元件Z、tip、tilt三自由度微动调整装置
DE102013204494A1 (de) * 2013-03-14 2014-10-02 Carl Zeiss Smt Gmbh Positionssensor, sensoranordnung und lithographieanlage mit positionssensor
CN106443936A (zh) * 2016-10-09 2017-02-22 中国科学院长春光学精密机械与物理研究所 一种光学元件的五自由度微动调整机构
CN107505684B (zh) * 2017-08-25 2020-04-28 南京理工大学 一种镜组的装调方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1245984A2 (de) * 2001-03-27 2002-10-02 Nikon Corporation Optisches Projektionssystem sowie Projektionsbelichtungsgerät und -verfahren
US20040239904A1 (en) * 2000-02-25 2004-12-02 Nikon Corporation Exposure apparatus and exposure method capable of controlling illumination distribution

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999049504A1 (fr) 1998-03-26 1999-09-30 Nikon Corporation Procede et systeme d'exposition par projection
JP3805323B2 (ja) * 2003-05-21 2006-08-02 キヤノン株式会社 露光装置、収差低減方法及び光学部材調整機構
WO2006136352A2 (de) 2005-06-20 2006-12-28 Carl Zeiss Smt Ag Objektiv mit relativer positionsbestimmung optischer elemente

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040239904A1 (en) * 2000-02-25 2004-12-02 Nikon Corporation Exposure apparatus and exposure method capable of controlling illumination distribution
EP1245984A2 (de) * 2001-03-27 2002-10-02 Nikon Corporation Optisches Projektionssystem sowie Projektionsbelichtungsgerät und -verfahren

Also Published As

Publication number Publication date
US8717534B2 (en) 2014-05-06
US20160041473A1 (en) 2016-02-11
US9551940B2 (en) 2017-01-24
US20110051110A1 (en) 2011-03-03
US20140293253A1 (en) 2014-10-02
WO2006136352A2 (de) 2006-12-28
US20170199465A1 (en) 2017-07-13
US9097985B2 (en) 2015-08-04

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