WO2009000242A3 - Vorrichtung zur kontaktbelichtung einer druckschablone - Google Patents

Vorrichtung zur kontaktbelichtung einer druckschablone Download PDF

Info

Publication number
WO2009000242A3
WO2009000242A3 PCT/DE2008/001001 DE2008001001W WO2009000242A3 WO 2009000242 A3 WO2009000242 A3 WO 2009000242A3 DE 2008001001 W DE2008001001 W DE 2008001001W WO 2009000242 A3 WO2009000242 A3 WO 2009000242A3
Authority
WO
WIPO (PCT)
Prior art keywords
light
emitting diodes
printing
printing screen
exposure device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE2008/001001
Other languages
English (en)
French (fr)
Other versions
WO2009000242A2 (de
Inventor
Josef Lindthaler
Hans-Herbert Frintrup
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to EP08773267A priority Critical patent/EP2160652A2/de
Publication of WO2009000242A2 publication Critical patent/WO2009000242A2/de
Publication of WO2009000242A3 publication Critical patent/WO2009000242A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

Gegenstand der Erfindung ist eine Vorrichtung zur Kontaktbelichtung einer Druckschablone (202), vorzugsweise zur Verwendung im Siebdruck, Offsetdruck, Tampondruck, Flexodruck oder dergleichen, mit Mitteln zur Aufnahme einer lichtempfindlichen Druckschablone (202), mit Mitteln zur Aufnahme eines das Motiv tragenden Films, und mit einer aus Leuchtdioden gebildeten Lichtquelle, wobei die Lichtquelle (206) ein im Wesentlichen linienförmiges Licht ausstrahlt und wobei die Lichtquelle (206) entlang der Druckschablone (202) bewegbar ist. Eine Vorrichtung zur Kontaktbelichtung zu schaffen, die trotz energieärmerer Leuchtdioden (116) die lichtempfindliche Emulsion auf der Druckschablone ausreichend belichtet, wird dadurch erreicht, dass in der Lichtquelle (206) eine Anzahl von Lichtfeldern ausgebildet sind, wobei jedes Lichtfeld eine Anzahl Leuchtdioden aufweist und wobei die Lichtfelder in einer Reihe nebeneinander angeordnet sind und dass in einem Lichtfeld (110) zwei bis sechs, vorzugsweise vier, verschiedene Leuchtdiodengruppen vorgesehen sind, wobei in jeder Leuchtdiodengruppe annähernd monochromes Licht ausstrahlende Leuchtdioden derselben Wellenlänge vorgesehen sind.
PCT/DE2008/001001 2007-06-22 2008-06-21 Vorrichtung zur kontaktbelichtung einer druckschablone Ceased WO2009000242A2 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP08773267A EP2160652A2 (de) 2007-06-22 2008-06-21 Vorrichtung zur kontaktbelichtung einer druckschablone

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007028860A DE102007028860A1 (de) 2007-06-22 2007-06-22 Vorrichtung zur Kontaktbelichtung einer Druckschablone
DE102007028860.5 2007-06-22

Publications (2)

Publication Number Publication Date
WO2009000242A2 WO2009000242A2 (de) 2008-12-31
WO2009000242A3 true WO2009000242A3 (de) 2009-03-05

Family

ID=40030787

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2008/001001 Ceased WO2009000242A2 (de) 2007-06-22 2008-06-21 Vorrichtung zur kontaktbelichtung einer druckschablone

Country Status (3)

Country Link
EP (1) EP2160652A2 (de)
DE (1) DE102007028860A1 (de)
WO (1) WO2009000242A2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2845732B1 (de) 2010-09-24 2017-03-22 KBA-NotaSys SA Bogendruckmaschine und Verfahren zur Ausrichtung von Magnetspänen in einer Tinte oder einem Lackmedium zum Auftragen auf ein bogenähnliches Substrat
FR2977947B1 (fr) * 2011-07-11 2013-07-05 Photomeca France Exposeuse uv pour plaques d'impression
US20150336372A1 (en) * 2013-05-28 2015-11-26 Claude Louis Van Ness Screen Printing Device and Method
DE102017103624A1 (de) 2017-02-22 2018-08-23 Manz Ag Belichtungsanlage

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6369845B1 (en) * 2000-03-14 2002-04-09 Kubota Research Associates Inc. Exposure system for recording media
WO2002093265A1 (en) * 2001-05-15 2002-11-21 The Chromaline Corporation Devices and methods for exposure of photoreactive compositions with light emitting diodes
DE20316241U1 (de) * 2003-10-20 2004-02-26 Geburek, Frank, Dipl.-Ing. (TH) Belichtungsvorrichtung für eine Schaltungsplatte
US20040164325A1 (en) * 2003-01-09 2004-08-26 Con-Trol-Cure, Inc. UV curing for ink jet printer
US20050152146A1 (en) * 2002-05-08 2005-07-14 Owen Mark D. High efficiency solid-state light source and methods of use and manufacture
US20060164614A1 (en) * 2005-01-21 2006-07-27 Hua-Kuo Chen Exposing machine for a printed circuit board

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1697681A2 (de) * 2003-12-02 2006-09-06 3M Innovative Properties Company Bestrahlungsvorrichtungen
DE202004017044U1 (de) 2004-11-02 2005-01-13 Technigraf Gmbh Leuchte zur Belichtung von Siebdruckschablonen, Offsetdruckplatten, Flexodruckplatten, Inkjet-Beschichtungen o.dgl. sowie Vorrichtung zur Belichtung
DE202005017044U1 (de) 2005-11-02 2006-01-05 Lau, Tung Yan, Fotan Leicht zu positionierender Einfach-Locher

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6369845B1 (en) * 2000-03-14 2002-04-09 Kubota Research Associates Inc. Exposure system for recording media
WO2002093265A1 (en) * 2001-05-15 2002-11-21 The Chromaline Corporation Devices and methods for exposure of photoreactive compositions with light emitting diodes
US20050152146A1 (en) * 2002-05-08 2005-07-14 Owen Mark D. High efficiency solid-state light source and methods of use and manufacture
US20040164325A1 (en) * 2003-01-09 2004-08-26 Con-Trol-Cure, Inc. UV curing for ink jet printer
DE20316241U1 (de) * 2003-10-20 2004-02-26 Geburek, Frank, Dipl.-Ing. (TH) Belichtungsvorrichtung für eine Schaltungsplatte
US20060164614A1 (en) * 2005-01-21 2006-07-27 Hua-Kuo Chen Exposing machine for a printed circuit board

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2160652A2 *

Also Published As

Publication number Publication date
EP2160652A2 (de) 2010-03-10
DE102007028860A1 (de) 2008-12-24
WO2009000242A2 (de) 2008-12-31

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