WO2009052815A3 - Mikrokanalwärmesenke zur kühlung von halbleiterbauelementen und verfahren zur oberflächenbehandlung derselben - Google Patents
Mikrokanalwärmesenke zur kühlung von halbleiterbauelementen und verfahren zur oberflächenbehandlung derselben Download PDFInfo
- Publication number
- WO2009052815A3 WO2009052815A3 PCT/DE2008/001771 DE2008001771W WO2009052815A3 WO 2009052815 A3 WO2009052815 A3 WO 2009052815A3 DE 2008001771 W DE2008001771 W DE 2008001771W WO 2009052815 A3 WO2009052815 A3 WO 2009052815A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- heat sink
- microchannel heat
- semiconductor elements
- cooling semiconductor
- treating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W40/00—Arrangements for thermal protection or thermal control
- H10W40/40—Arrangements for thermal protection or thermal control involving heat exchange by flowing fluids
- H10W40/47—Arrangements for thermal protection or thermal control involving heat exchange by flowing fluids by flowing liquids, e.g. forced water cooling
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W40/00—Arrangements for thermal protection or thermal control
- H10W40/20—Arrangements for cooling
- H10W40/25—Arrangements for cooling characterised by their materials
- H10W40/258—Metallic materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02407—Active cooling, e.g. the laser temperature is controlled by a thermo-electric cooler or water cooling
- H01S5/02423—Liquid cooling, e.g. a liquid cools a mount of the laser
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
Bei einer Mikrokanalwärmesenke zur Kühlung von Halbleiterbauelementen besteht die Aufgabe, bei Nutzung der Vorteile, die mit einer Oberflächenverbesserung durch eine Anschlussmetallisierung verbunden sind, korrosionsbedingte Undichtheiten zu verhindern, ohne dass die thermische Effizienz der Mikrokanalwärmesenke gemindert wird. Das wird dadurch erreicht, dass auf Dichtflächen für Dichtelemente, die Kühlmitteleinlass- und Kühlmittelauslassöffnungen umschließen und auf Innenoberflächen eines Kühlmitteleinlasses und eines Kühlmittelauslasses wenigstens eine elektrisch isolierende anorganische Schutzschicht oder wenigstens eine abschließende Schutzschicht aus wenigstens einem Refraktärmetall aufgebracht ist.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102007051798.1 | 2007-10-26 | ||
| DE102007051798A DE102007051798B3 (de) | 2007-10-26 | 2007-10-26 | Mikrokanalwärmesenke zur Kühlung von Halbleiterbauelementen und Verfahren zur Oberflächenbehandlung derselben |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2009052815A2 WO2009052815A2 (de) | 2009-04-30 |
| WO2009052815A3 true WO2009052815A3 (de) | 2009-08-27 |
Family
ID=40121764
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/DE2008/001771 Ceased WO2009052815A2 (de) | 2007-10-26 | 2008-10-26 | Mikrokanalwärmesenke zur kühlung von halbleiterbauelementen und verfahren zur oberflächenbehandlung derselben |
Country Status (2)
| Country | Link |
|---|---|
| DE (1) | DE102007051798B3 (de) |
| WO (1) | WO2009052815A2 (de) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009016953B4 (de) | 2009-04-08 | 2017-03-09 | Dirk Lorenzen | Konversionseinheit mit mehreren Konversionsmodulen, Inbetriebnahmeverfahren der Konversionseinheit und eine solche Konversionseinheit aufweisende optische Anordnung |
| CN104682189B (zh) * | 2015-02-12 | 2017-10-24 | 中国科学院半导体研究所 | 一种高功率密度半导体激光器热沉 |
| CN109121282A (zh) * | 2018-08-06 | 2019-01-01 | 华进半导体封装先导技术研发中心有限公司 | 一种板体散热结构及其制作方法 |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4687053A (en) * | 1982-11-26 | 1987-08-18 | Fr. Kammerer Gmbh | Heat exchanger panel and manufacturing method thereof |
| DE3835767A1 (de) * | 1987-10-21 | 1989-05-03 | Hitachi Ltd | Kuehlvorrichtung fuer halbleitermodul |
| US5239200A (en) * | 1991-08-21 | 1993-08-24 | International Business Machines Corporation | Apparatus for cooling integrated circuit chips |
| JP2003273441A (ja) * | 2002-03-15 | 2003-09-26 | Hamamatsu Photonics Kk | ヒートシンク並びにこれを用いた半導体レーザ装置及び半導体レーザスタック装置 |
| US20050063161A1 (en) * | 2003-09-18 | 2005-03-24 | Fuji Electric Systems Co., Ltd. | Heat sink and method for its production |
| DE112004000204T5 (de) * | 2003-01-31 | 2006-06-01 | Cooligy, Inc., Mountain View | Verfahren und Vorrichtung zur Herstellung von preisgünstigen elektrokinetischen Pumpen |
| EP1696526A1 (de) * | 2003-12-16 | 2006-08-30 | Hamamatsu Photonics K. K. | Halbleiterlaserbauelement und herstellungsverfahren dafür |
| US20070017658A1 (en) * | 2005-07-19 | 2007-01-25 | International Business Machines Corporation | Cold plate apparatus and method of fabrication thereof with a controlled heat transfer characteristic between a metallurgically bonded tube and heat sink for facilitating cooling of an electronics component |
| DE112005001479T5 (de) * | 2004-07-08 | 2007-06-06 | Hamamatsu Photonics K.K., Hamamatsu | Halbleiter-Laser-Vorrichtung |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5105429A (en) * | 1990-07-06 | 1992-04-14 | The United States Of America As Represented By The Department Of Energy | Modular package for cooling a laser diode array |
-
2007
- 2007-10-26 DE DE102007051798A patent/DE102007051798B3/de not_active Expired - Fee Related
-
2008
- 2008-10-26 WO PCT/DE2008/001771 patent/WO2009052815A2/de not_active Ceased
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4687053A (en) * | 1982-11-26 | 1987-08-18 | Fr. Kammerer Gmbh | Heat exchanger panel and manufacturing method thereof |
| DE3835767A1 (de) * | 1987-10-21 | 1989-05-03 | Hitachi Ltd | Kuehlvorrichtung fuer halbleitermodul |
| US5239200A (en) * | 1991-08-21 | 1993-08-24 | International Business Machines Corporation | Apparatus for cooling integrated circuit chips |
| JP2003273441A (ja) * | 2002-03-15 | 2003-09-26 | Hamamatsu Photonics Kk | ヒートシンク並びにこれを用いた半導体レーザ装置及び半導体レーザスタック装置 |
| DE112004000204T5 (de) * | 2003-01-31 | 2006-06-01 | Cooligy, Inc., Mountain View | Verfahren und Vorrichtung zur Herstellung von preisgünstigen elektrokinetischen Pumpen |
| US20050063161A1 (en) * | 2003-09-18 | 2005-03-24 | Fuji Electric Systems Co., Ltd. | Heat sink and method for its production |
| EP1696526A1 (de) * | 2003-12-16 | 2006-08-30 | Hamamatsu Photonics K. K. | Halbleiterlaserbauelement und herstellungsverfahren dafür |
| DE112005001479T5 (de) * | 2004-07-08 | 2007-06-06 | Hamamatsu Photonics K.K., Hamamatsu | Halbleiter-Laser-Vorrichtung |
| US20070017658A1 (en) * | 2005-07-19 | 2007-01-25 | International Business Machines Corporation | Cold plate apparatus and method of fabrication thereof with a controlled heat transfer characteristic between a metallurgically bonded tube and heat sink for facilitating cooling of an electronics component |
Also Published As
| Publication number | Publication date |
|---|---|
| DE102007051798B3 (de) | 2009-01-15 |
| WO2009052815A2 (de) | 2009-04-30 |
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| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
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