WO2009058747A1 - Système et procédés de détection de front d'onde de diversité de phase - Google Patents
Système et procédés de détection de front d'onde de diversité de phase Download PDFInfo
- Publication number
- WO2009058747A1 WO2009058747A1 PCT/US2008/081402 US2008081402W WO2009058747A1 WO 2009058747 A1 WO2009058747 A1 WO 2009058747A1 US 2008081402 W US2008081402 W US 2008081402W WO 2009058747 A1 WO2009058747 A1 WO 2009058747A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- optical element
- detector
- lens
- phase diversity
- wavefront sensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J2009/002—Wavefront phase distribution
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
- G01J2009/0203—Phased array of beams
Definitions
- This invention pertains to the field of wavefront measurements, and more particularly to systems and methods of measuring a wavefront of light using a phase diversity wavefront sensor. [0003] Description.
- a number of systems and methods have been developed for measuring a wavefront of light. Such wavefront measurements have been employed in a number of applications, including ophthalmic applications such as measuring aberrations of an eye, and measuring surfaces of objects such as contact lenses.
- SHWS Shack Hartmann wavefront sensor
- a SHWS includes an array of lenslets which image focal spots onto a detector array.
- SHWS 's have been employed in a variety of ophthalmic and metro logical applications.
- a SHWS has some limitations in certain applications.
- the wavefront is expected to produce a single local tilt.
- an SHWS has difficulty measuring wavefronts with discontinuities.
- the wavefront may have multiple tilts, which may produce multiple focal spots.
- such discontinuities can be produced by multi-focal optical devices, including multifocal contact lenses and multifocal intraocular lenses (IOL).
- IOL multifocal intraocular lenses
- W. Neil Charman et al., "Can we measure wave aberration inpatients with diffractive IOLs? " 33 JOURNAL OF CATARACT & REFRACTIVE SURGERY NO. 11, p. 1997 (Nov. 2007) discusses some problems in using a SHWS to make wave front measurements of a patient with a diffractive IOL. Charman notes that when a measurement is taken on an eye that has been implanted with a diffractive IOL, the lenslets of the SHWS will produce multiple images and the detector will record multiple overlapping spot patterns. So, it is difficult at best for a SHWS to measure wavefronts produced by multifocal optical elements, such as diffractive IOLs.
- Another limitation of the SHWS pertains to its limited dynamic range. For example, to measure ophthalmic aberrations of a human eye over the wide range presented by the human population, as a practical matter one needs to employ an adjustable optical system in conjunction with the SHWS so that operation of the SHWS can be maintained within its dynamic range. This can add to the complexity and cost of the measurement system, and requires alignment that can reduce the measurement precision of the instrument.
- Another type of wavefront sensor is a phase diversity wavefront sensor (PDWS), also sometimes referred to as a curvature sensor.
- PDWS phase diversity wavefront sensor
- a PDWS may be used to analyze wavefronts at two or more planes that are generally orthogonal to the direction of propagation of an optical beam.
- a PDWS measurement system makes measurements via an optical system that is capable of imaging two or more planes at once, to minimize or eliminate the effects of any time -varying changes in the optical beam.
- Graves et al. U.S. Patent 6,439,720 describes a measurement system that includes a PDWS.
- Early PDWS systems employed a relatively complex arrangement of beam splitters and/or optical delays to generate the necessary images.
- Blanchard, P. B and Greenaway, A.H. "Simultaneous Multi-plane Imaging with a Distorted Diffraction Grating"
- APPLIED OPTICS (1999) (“Blanchard") disclosed the use of a diffractive optical element (DOE) in a PDWS.
- DOE diffractive optical element
- the DOE uses local displacement of lines in a diffraction grating to introduce arbitrary phase shifts into wave fronts diffracted by the grating into the non-zero orders to create multiple images of the incident light.
- a diffraction grating having a quadratic displacement function is employed in conjunction with a collocated single lens to alter the optical transfer function associated with each diffraction order such that each order has a different degree of defocus.
- references are not generally directed to applications where there is speckle and/or discontinuities or large aberrations in the wavefront, such as may be the case in many ophthalmic applications, including the measurement of IOLs, multifocal contact lenses, etc., and eyes or optical systems that include such devices. Furthermore, these references do not provide a generalized design method for incorporating a PDWS into more complicated optical systems. [00013] It would be desirable to provide an ophthalmic measurement instrument that utilizes the benefits of a PDWS, alone or in conjunction with a SHWS. It would further be desirable to provide such an instrument that can measure wavefronts with speckle and/or discontinuities or large aberrations in the wavefront.
- a multifocal element such as an intraocular or contact lens that is either a refractive multifocal lens, a diffractive multifocal lens, or a diffractive monofocal lens. It would also be desirable to provide a generalized method of designing a measurement system including a PDWS.
- a phase diversity wavefront sensor comprises: an optical system including at least one optical element for receiving a light beam; a diffractive optical element having a diffractive pattern defining a filter function, the diffractive optical element being arranged to produce, in conjunction with the optical system, images from the light beam associated with at least two diffraction orders; and a detector for detecting the images and outputting image data corresponding to the detected images, wherein the optical system, diffractive optical element, and detector are arranged to provide telecentric, pupil plane images of the light beam.
- a method for measuring a wavefront of an optical system including a multifocal element comprises: providing a light beam to a lens, the lens being a refractive multifocal lens, a diffractive multifocal lens, or a diffractive monofocal lens; directing light from the lens to a phase diversity wavefront sensor, comprising an optical system including at least one optical element for receiving a light beam, and a diffractive optical element the shape of which is defined by a filter function, the diffractive optical element being arranged to produce in conjunction with the optical system images of the light beam associated with at least two diffraction orders; and a detector for detecting the images and outputting image data corresponding to the detected images; and measuring the wavefront of the light from the lens using the image data output by the detector.
- a method for measuring a wavefront of an object having first and second surfaces.
- the method comprises: providing a light beam to the object; directing light from the lens to a phase diversity wavefront sensor, the lens being a refractive multifocal lens, a diffractive multifocal lens, or a diffractive monofocal lens, the phase diversity wavefront sensor comprising an optical system including at least one optical element for receiving a light beam, and a diffractive optical element the shape of which is defined by a filter function, the diffractive optical element being arranged to produce in conjunction with the optical system images of the light beam associated with at least two diffraction orders; and a detector for detecting the images and outputting image data corresponding to the detected images; and simultaneously measuring the first and second surfaces of the object using the image data output by the detector.
- a method for designing a phase diversity wavefront sensor. The method comprises: providing one or more analytic solutions for paraxial equations that govern an optical configuration of the phase diversity wavefront sensor; providing a set of input design parameters for the phase diversity wavefront sensor; generating a set of output values from the analytical solutions and the input design parameters; and determining whether the output parameters meet a viability threshold.
- FIG. 1 illustrates the use of a diffractive optical element (DOE) in a phase diversity wavefront sensor (PDWS).
- DOE diffractive optical element
- FIG. 4 illustrates one embodiment of diffraction grating.
- FIG. 5 illustrates an intensity image produced by the PDWS of FIG. 3.
- FIG. 9 plots the number of iterations in a GS algorithm required to reduce the defocus error to less than 0.01 diopters versus pupil diameter.
- FIG. 10 plots the number of iterations in a GS algorithm required for convergence versus sample plane separation for a given beam diameter.
- FIG. 11 illustrates the numerically calculated defocus versus iteration number in a
- FIG. 12 plots the number of iterations required to reduce the defocus error to less than 0.01 diopters versus pupil diameter for a speckled beam, compared to a beam without speckle.
- FIGs. 13A-C illustrate basic ophthalmic aberrometer designs for SHWS and PDWS sensors.
- FIG. 14 illustrates a simplified design of a PDWS with a large dynamic range.
- FIG. 15 illustrates a process of designing a measurement system that includes a
- FIG. 17 illustrates how a PDWS can be used to measure both surfaces of a contact lens.
- FIGs. 18A-C illustrate the use of a PDWS in an ophthalmic measurement application.
- FIG. 19 illustrates a block diagram of one embodiment of an ophthalmic aberrometer that includes a PDWS.
- FIG. 1 illustrates the use of a diffractive optical element (DOE) in a phase diversity wavefront sensor (PDWS) 100.
- PDWS 100 includes an optical element 110, a detector 120, and a processor 130.
- Optical element 110 includes a diffractive optical element (DOE) (e.g., a diffraction grating) 112 collocated with optical element 114 with positive focal power.
- DOE diffractive optical element
- optical element 110 may alternately be used in reflection where diffraction grating 114 is collocated with optical element 114 comprising a mirror.
- optical element 114 is a lens, and diffractive grating
- lens 112 is disposed on a surface of lens 114.
- diffractive grating 112 may be incorporated inside lens 114 or be formed from the material used to form lens 114.
- lens 114 and diffractive grating 112 form a single DOE, where lens 114 is itself a DOE, for example, disposed on a same surface or an opposite surface as diffractive grating 112.
- lens 114 and grating 112 are separate elements that touch one another or are separated by a relatively small distance. Element 114 could be refractive, diffractive or reflective.
- Detector 120 may be a charge coupled device (CCD).
- CCD charge coupled device
- diffraction grating 112 is distorted by a quadratic filter function so that optical element 110 introduces an optical power that depends upon the diffraction order.
- Optical element 110 produces angularly displaced beams with different focal power.
- the combination of diffraction grating 112 and lens 114 yields a net optical power given by:
- m is the diffraction order of diffraction grating 112
- R the aperture radius of diffraction grating 112
- W20 is a standard defocus term specifying the phase shift from center to edge of the optic. This is related to the quadratic distortion in the grating as specified by Blanchard. Note that the grating period in such distorted gratings is not constant, but can still be specified in terms of an average period at the DOE center. This grating period is the average distance between the lines in the grating and, together with the wavelength of the incident light, determines the diffraction angle of the diffracted beams, and hence their separation on the detector array.
- diffraction grating 112 is distorted by a filter function that is non-quadratic and has non-mixed symmetry.
- detector 120 is located at the focal plane for the 0 th order beam and is referred to as an "image plane PDWS.”
- FIG. 2 illustrates an intensity image produced by PDWS 100.
- This arrangement produces a real image at the +1 diffraction order, a virtual image at the -1 diffraction order, and a far field pattern at the 0 diffraction pattern. As can be seen in FIG. 2, this produces a bright spot 0 th order beam, and dimmer spots for the
- Data acquisition may be accomplished by two-dimensional digitization of the intensity image at detector 120.
- the image data is then supplied to processor 130 for further analysis to measure the wavefront of plane wave 10.
- FIG. 3 illustrates another configuration of a PDWS 300.
- PDWS 300 comprises an optical element (e.g., a lens) 310, a diffractive optical element (e.g., a diffraction grating)
- an optical element e.g., a lens
- a diffractive optical element e.g., a diffraction grating
- Detector 330 may comprise a charge coupled device (CCD).
- PDWS 300 possesses certain characteristics that may be beneficial for measuring wavefronts in ophthalmic applications, as will be discussed in greater detail below.
- memory 345 Associated with processor 340 is memory 345 containing instructions for executing a phase retrieval algorithm on data produced by detector 330.
- FIG. 4 illustrates one embodiment of diffraction grating 320.
- diffraction grating 320 In one embodiment of
- diffraction grating 320 is distorted by a filter function that is non-quadratic and has non-mixed symmetry.
- FIG. 5 illustrates an intensity image produced by PDWS 300.
- PDWS 300 In contrast to PDWS
- PDWS 300 forms real images of the beam at both sample planes and at the measurement plane (the Pupil Plane). Accordingly,
- PDWS 300 is referred to as a "Pupil Plane PDWS.”
- PDWS 300 forms images of the beam 350 at different sample locations, and these images are laterally displaced at camera 330 so that they can be simultaneously acquired.
- PDWS 300 can be thought of as producing multiple object planes (also referred to as "observation planes" or “sample planes') that are imaged onto camera 330.
- object plane u_i is imaged onto the -1 th order beam
- object plane uo is imaged onto the 0 th order beam
- object plane u + i is imaged onto the +l th order beam at camera.
- FIG. 3 illustrates an example with a converging beam
- a collimated beam or a diverging beam may be employed in a particular application.
- FIG. 3 illustrates three "observation planes" it should be understood that more observation planes corresponding to additional diffraction orders can be employed and that only two observation planes are necessary in many applications.
- having a multitude of observation planes can provide a greater dynamic range, greater sensitivity, improved ability to discern waves with multiple wavefronts.
- the axial derivative is not known, it is approximated by the finite difference between the intensity measurements along the propagation direction as shown in EQN. 2 above. This approximation fails for beams with aberrations large enough to significantly change the beam size between the sample planes. As such properties may be found in beams in ophthalmic applications, the use of ITE-based phase retrieval methods is of limited utility, for example, for a PDWS employed in an ophthalmic aberrometer.
- FIG. 6 illustrates operation of one embodiment of the GS algorithm.
- processor 340 employs a Rayleigh-Sommerfeld propagation integral to propagate from one measurement plane to the next.
- FIG. 7 illustrates this propagation. Given the data ⁇ i( ⁇ , ⁇ ) at a first measurement plane ⁇ ls then the data is propagated to a second measurement plane, ⁇ i, to produce propagated data ⁇ 2 (x,y) as follows:
- FIG. 8 illustrates the numerically calculated defocus versus iteration number for different pupil diameters.
- FIG. 9 plots the number of iterations required to reduce the defocus error to less than 0.01 diopters versus pupil diameter.
- FIGs. 8 and 9 show that convergence is rapid for small diameter beams but is much slower as the beam diameter increases.
- the number of iterations required to achieve a specified level of defocus accuracy increases approximately exponentially with input pupil diameter for fixed sample spacing.
- FIG. 10 plots the number of iterations required for convergence versus sample plane separation for a given beam diameter. It can be seen in FIG. 10 that the convergence rate improves with sample plane separation.
- FIG. 11 illustrates the numerically calculated defocus versus iteration number for different pupil diameters in the case of an irradiance pattern where speckle is introduced.
- FIG. 12 plots the number of iterations required to reduce the defocus error to less than 0.01 diopters versus pupil diameter for a speckled beam (lower plot), compared to a beam without speckle (upper plot).
- the number of iterations required to achieve a specified level of defocus accuracy increases approximately quadratically with input pupil diameter for fixed sample spacing, rather than exponentially, as is the case with beams that do not include speckle.
- the dynamic range and sensitivity can be controlled by proper selection of the sample plane spacing and the number of bits of digitization of the CCD in camera 330.
- PDWS 300 provides a wide dynamic range so as to accommodate a wide range of aberrations in the input wavefront without the need to move or adjust any optical elements, thus simplifying the construction of an ophthalmic measurement instrument.
- PDWS 300 is capable of measuring the wavefronts of beams with at least + 3 diopters of defocus. Further beneficially, in one embodiment PDWS 300 is capable of measuring the wavefronts of beams with at least + 5 diopters of defocus. Even further beneficially, in one embodiment PDWS 300 is capable of measuring the wavefronts of beams with at least + 10 diopters of defocus.
- PDWS 300 includes a number of features that are desirable for an ophthalmic measurement system.
- Pupil plane imaging provides a real image of the pupil and accommodates variability in the location, size and shape of a human pupil when making aberrometer measurements, especially because the location of a patient's eye is generally not well controlled.
- Pupil Plane Imaging is also beneficial in resolving the phase of a speckled beam, or a wavefront having one or more discontinuities.
- PDWS 300 may employ telecentric imaging. Telecentric imaging provides equally spaced sample planes, and provides equal magnification for all images.
- Telecentric imaging simplifies the alignment, calibration, and data processing of PDWS 300.
- FIGs. 13A-C illustrate basic ophthalmic aberrometer designs for SHWS and PDWS sensors.
- the ophthalmic aberrometer will include a light projection system for creating the light beam and directing it to an eye or other object that is being measured.
- the wavefront u 0 may be an image of a wavefront at a pupil or corneal surface of an eye under examination.
- FIG. 13A illustrates an exemplary design for an ophthalmic aberrometer 1300A employing a SHWS 1310A.
- SHWS 1310A includes a lenslet array 1312A and a camera, or pixel array 1314A, also called a detector array.
- the design employs a Badal Relay Imager
- a processor 1350A processes data produced by camera 1314A.
- both the spatial resolution and the dynamic range are correlated to the dimension of the lens lets in lenslet array 1312A.
- the optical system typically demagnifies the pupil image to fit on SHWS 1310A and the distance between lenses 1322A and 1324A is adjusted to add defocus to compensate the incoming wavefront so that it lies within the dynamic range of SHWS 131OA.
- Preservation of the optical phase front is important with SHWS 1310A, and image quality is generally a secondary consideration in the optical design.
- the sensitivity of SHWS 1310A is set by the lenslet focal length and the pixel size in camera 1314A and is adjusted to give a predetermined sensitivity.
- the sensitivity and spatial resolution requirements typically limit the dynamic range of SHWS 130 IA to a few diopters.
- the system can be dynamically adjusted to produce a larger effective dynamic range by moving one or both of the lenses 1322A and l324A.
- FIG. 13B illustrates an exemplary design for an ophthalmic aberrometer 1300B where a PDWS 1330B replaces the SHWS 1310A of FIG. 13 A.
- PDWS 1330B includes lens 1332B, diffraction grating 1333B and camera, or pixel array 1334B, also called a detector array.
- a processor 1350B processes data produced by camera 1334B.
- the arrangement of aberrometer 1300B is unnecessarily complex.
- FIG. 13C illustrates an exemplary design for an ophthalmic aberrometer 1300C is tailored for PDWS 1330C.
- FIG. 14 illustrates a simplified design of a PDWS with a large dynamic range.
- FIG. 14 shows a first lens 1410, a second lens 1420, a diffraction grating 1430, a camera 1440, and a processor 1450.
- Analytic solutions with Pupil Plane and Telecentric Imaging and the use of static optical elements will be explained with respect to FIG. 14.
- an analytic solution is performed for the paraxial equations that govern the particular optical configuration of interest, using ray matrix analysis, to determine the proper arrangement to provide telecentric imaging.
- the telecentric solution can be found by imposing the appropriate constraints on the general imaging solution; these constraints select the subset of the general paraxial imaging solutions with magnification independent of grating order, or equivalently, object positions that depend purely linearly on grating order.
- the object plane locations for all images depend linearly on the grating order and the image magnifications are independent of the grating order for an optical configuration consisting of two lenses followed by a grating as shown in Figure 13C.
- the lens focal lengths are respectively / ⁇ and/ the grating focal length in first order isf g , m is the grating order, s is the distance between the second lens and the grating, t is the distance between the lenses and v is the space between the second lens and the detector array. Equation 5 shows the general solution for the telecentric pupil plane Lens-Lens-Grating PDWS.
- the general telecentric pupil plane imaging PDWS equations shown above describe a family of solutions in which s, v and t are related for a given set of lens and grating focal lengths.
- Table 1 below shows representative examples of the family of analytic paraxial solutions for the Lens-Lens-Grating configuration of FIG. 14, derived using a symbolic manipulator (e.g., MATHEMATICA®) as shown in Equation 5, that provide both telecentric and pupil plane imaging for static lens positions for specific values of t and v.
- a symbolic manipulator e.g., MATHEMATICA®
- the sample plane locations ⁇ M are linear in grating order, m, and the magnification is independent of grating order, characteristics of a telecentric imaging system.
- ⁇ M e.g., ⁇ _i , ⁇ o , ⁇ + i
- the solution with t is a telecentric pupil plane PDWS where the second lens and grating co- located; although this looks similar to the image plane sensor, the judicious positioning of each optical element provides the additional functionality of the pupil plane PDWS.
- FIG. 15 illustrates a process 1500 of designing a measurement system that includes a PDWS.
- a first step 1510 the analytical solutions are imported into a spreadsheet to explore the performance of the system versus input design parameters.
- input design parameters are provided.
- the inputs may include the optical configuration, the location of the pupil plane, the desired dynamic range.
- outputs are generated based on the analytical solutions and the input design parameters. Outputs may include sensitivity, system length, actual dynamic range, etc.
- a step 1540 it is determined whether a viable design has been produced. If not, then the process returns to step 1520 and new input parameters are provided. If a viable deign has been achieved, then a detailed analysis is performed in step 1550. [00083] FIG.
- FIG. 16 illustrates how the process of FIG. 15 establishes design tradeoffs by comparing design points.
- FIG. 16 plots sensitivity versus pupil plane location. So, for example, if the system requires a sensitivity of at least 0.01 diopters and a stand-off distance between 73 and 375 mm, as illustrated in FIG. 16, an acceptable performance range exists and final detailed ray matrix analysis of this system configuration is warranted as it is a viable design.
- This design method is beneficial in assisting in the early rejection of candidate configurations before significant investment is made in their detailed analysis; in contrast, traditional design methods do not permit the elimination of such unviable candidate configurations without the expense of a detailed ray matrix analysis. [00084]
- FIG. 16 plots sensitivity versus pupil plane location. So, for example, if the system requires a sensitivity of at least 0.01 diopters and a stand-off distance between 73 and 375 mm, as illustrated in FIG. 16, an acceptable performance range exists and final detailed ray matrix analysis of this system configuration is warranted
- a PDWS 1700 such as PDWS 300 or PDWS 1400, can be used to measure both surfaces of a lens 17, for example, a contact lens or an intraocular lens.
- Light from a light source 1710 is passed through a beamsplitter 1720 to lens 17. Reflections are produced from both surfaces of lens 17 and pass back through beamsplitter to the PDWS 1700 which has sample planes located about the focal positions of the light reflected from the two lens surfaces.
- the advantages of PDWS 1700 can be seen. For example, if a SHWS were employed in this application, the multiple reflections from the surfaces of lens 17 would generate multiple focal spots from its lenslet array that could confuse the processor associated with a SHWS.
- PDWS 1700 can easily distinguish between the two reflected wavefronts, and therefor both surfaces of lens 17 can be characterized.
- the wave reflected from each surface will focus at different distances from the lens; it is obvious that by suitably placing sufficient PDWS sample planes near these foci, sufficient data can be made available to a Gerchberg-Saxton phase retrieval algorithm to determine the wavefront from each surface and hence the optical effect of each surface. More than two sample planes may be required in such multi wavefront applications and their number and locations may be expected to affect the accuracy of the phase retrieval.
- FIGs. 18A-C illustrate the use of a PDWS in an ophthalmic measurement application.
- FIGs. 18A-C show ray trace results from a non-paraxial analysis.
- the PDWS configuration illustrated in FIGs. 18A-C has a 300 mm pupil plane (standoff) distance, and the camera has 300 pixels across a width of 6 mm.
- FIG. 18A illustrates a case where +10 diopters of ophthalmic correction are required
- FIG. 18B illustrates a case where 0 diopters of ophthalmic correction are required
- FIG. 18C illustrates a case where -10 diopters of ophthalmic correction are required.
- FIG. 18A-C shows that light rays are fully transmitted to the camera in this arrangement for beams within the range + 10 diopters of defocus; for this reason, this configuration is suitable to acquire the data necessary to analyze beams with this wide range of defocus. Indeed even larger ranges may be possible by increasing the diameter of the second lens.
- the detailed ray trace analysis of such a system employing realistic commercially available lenses shows that the non-paraxial behavior of the system magnification departs from ideal by only about 1.3% at the extremes of the dynamic range, well within the acceptable tolerance for an ophthalmic aberrometer.
- Ophthalmic aberrometer 1900 illustrates a block diagram of one embodiment of an ophthalmic aberrometer 1900 that includes a PDWS 1910, which for example can be PDWS 300 or PDWS 1400.
- Ophthalmic aberrometer 1900 also includes a light source 1920, an optical system 1930, and a processor 1950.
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Eye Examination Apparatus (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Abstract
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CA2713418A CA2713418C (fr) | 2007-10-30 | 2008-10-28 | Systeme et procedes de detection de front d'onde de diversite de phase |
| AU2008318889A AU2008318889B2 (en) | 2007-10-30 | 2008-10-28 | System and methods of phase diversity wavefront sensing |
| EP08844854.3A EP2243007A4 (fr) | 2007-10-30 | 2008-10-28 | Système et procédés de détection de front d'onde de diversité de phase |
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US98383007P | 2007-10-30 | 2007-10-30 | |
| US60/983,830 | 2007-10-30 | ||
| US2887708P | 2008-02-14 | 2008-02-14 | |
| US61/028,877 | 2008-02-14 | ||
| US4804208P | 2008-04-25 | 2008-04-25 | |
| US61/048,042 | 2008-04-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2009058747A1 true WO2009058747A1 (fr) | 2009-05-07 |
Family
ID=40591421
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US2008/081402 Ceased WO2009058747A1 (fr) | 2007-10-30 | 2008-10-28 | Système et procédés de détection de front d'onde de diversité de phase |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP2243007A4 (fr) |
| AU (1) | AU2008318889B2 (fr) |
| CA (2) | CA2912003C (fr) |
| WO (1) | WO2009058747A1 (fr) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102095503A (zh) * | 2010-11-30 | 2011-06-15 | 中国科学院国家天文台南京天文光学技术研究所 | 基于差分传感器的波前检测和重构方法 |
| US9494483B2 (en) | 2012-03-23 | 2016-11-15 | Carl Zeiss Smt Gmbh | Measuring system for measuring an imaging quality of an EUV lens |
| DE102015219330A1 (de) * | 2015-10-07 | 2017-04-13 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zur Strahlanalyse |
| DE102016211310B3 (de) * | 2016-06-23 | 2017-07-20 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung zur messung einer aberration, abbildungssysteme und verfahren zur messung einer aberration |
| CN116636956A (zh) * | 2018-09-13 | 2023-08-25 | 哈尼塔镜片公司 | 多焦点人工晶状体 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110879136A (zh) * | 2019-12-11 | 2020-03-13 | 中国科学院长春光学精密机械与物理研究所 | 一种光学系统畸变测量方法及设备 |
| CN113203485B (zh) * | 2021-04-27 | 2022-08-05 | 浙江大学 | 一种通过单次曝光实现轴向相位差波前重建的装置及方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5598261A (en) * | 1995-07-07 | 1997-01-28 | Lockheed Missiles & Space Company, Inc. | Wavefront sensor for a scanning imager |
| US6107617A (en) * | 1998-06-05 | 2000-08-22 | The United States Of America As Represented By The Secretary Of The Air Force | Liquid crystal active optics correction for large space based optical systems |
| WO2004113856A1 (fr) * | 2003-06-20 | 2004-12-29 | Heriot-Watt University | Capteur a front d'ondes a diversite de phase |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ES2177309T3 (es) * | 1998-03-10 | 2002-12-01 | Qinetiq Ltd | Sistema tridimensional de formacion de imagenes. |
| US7609388B2 (en) * | 2002-01-24 | 2009-10-27 | Icos Vision Systems Nv | Spatial wavefront analysis and 3D measurement |
| US7232999B1 (en) * | 2003-07-30 | 2007-06-19 | Kestrel Corporation | Laser wavefront characterization |
| CA2648305C (fr) * | 2006-04-07 | 2012-10-16 | Amo Wavefront Sciences, Llc | Systeme et procede de mesure geometrique d'une caracteristique geometrique d'un objet |
| TWI455326B (zh) * | 2007-09-13 | 2014-10-01 | Omnivision Tech Inc | 透射式偵測器、使用該偵測器之系統及其方法 |
-
2008
- 2008-10-28 WO PCT/US2008/081402 patent/WO2009058747A1/fr not_active Ceased
- 2008-10-28 AU AU2008318889A patent/AU2008318889B2/en not_active Ceased
- 2008-10-28 CA CA2912003A patent/CA2912003C/fr not_active Expired - Fee Related
- 2008-10-28 CA CA2713418A patent/CA2713418C/fr not_active Expired - Fee Related
- 2008-10-28 EP EP08844854.3A patent/EP2243007A4/fr not_active Withdrawn
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5598261A (en) * | 1995-07-07 | 1997-01-28 | Lockheed Missiles & Space Company, Inc. | Wavefront sensor for a scanning imager |
| US6107617A (en) * | 1998-06-05 | 2000-08-22 | The United States Of America As Represented By The Secretary Of The Air Force | Liquid crystal active optics correction for large space based optical systems |
| WO2004113856A1 (fr) * | 2003-06-20 | 2004-12-29 | Heriot-Watt University | Capteur a front d'ondes a diversite de phase |
Non-Patent Citations (1)
| Title |
|---|
| See also references of EP2243007A4 * |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102095503A (zh) * | 2010-11-30 | 2011-06-15 | 中国科学院国家天文台南京天文光学技术研究所 | 基于差分传感器的波前检测和重构方法 |
| CN102095503B (zh) * | 2010-11-30 | 2012-07-04 | 中国科学院国家天文台南京天文光学技术研究所 | 基于差分传感器的波前检测和重构方法 |
| US9494483B2 (en) | 2012-03-23 | 2016-11-15 | Carl Zeiss Smt Gmbh | Measuring system for measuring an imaging quality of an EUV lens |
| DE102015219330A1 (de) * | 2015-10-07 | 2017-04-13 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zur Strahlanalyse |
| US10605654B2 (en) | 2015-10-07 | 2020-03-31 | Carl Zeiss Smt Gmbh | Method and device for beam analysis |
| US11054305B2 (en) | 2015-10-07 | 2021-07-06 | Carl Zeiss Smt Gmbh | Method and device for beam analysis |
| DE102016211310B3 (de) * | 2016-06-23 | 2017-07-20 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung zur messung einer aberration, abbildungssysteme und verfahren zur messung einer aberration |
| EP3260829A1 (fr) | 2016-06-23 | 2017-12-27 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Dispositif de mesure d'une aberration, système d'imagerie et procédé de mesure d'une aberration |
| US10324306B2 (en) | 2016-06-23 | 2019-06-18 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. | Device for measuring an aberration, imaging systems and methods for measuring an aberration |
| CN116636956A (zh) * | 2018-09-13 | 2023-08-25 | 哈尼塔镜片公司 | 多焦点人工晶状体 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2243007A1 (fr) | 2010-10-27 |
| CA2912003C (fr) | 2017-07-18 |
| EP2243007A4 (fr) | 2017-03-01 |
| AU2008318889A1 (en) | 2009-05-07 |
| CA2912003A1 (fr) | 2009-05-07 |
| CA2713418A1 (fr) | 2009-05-07 |
| AU2008318889B2 (en) | 2014-01-23 |
| CA2713418C (fr) | 2016-01-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8517535B2 (en) | Systems and methods of phase diversity wavefront sensing | |
| JP4017400B2 (ja) | ハルトマン−シャック画像を改善するための空間フィルターとその方法 | |
| AU2008318889B2 (en) | System and methods of phase diversity wavefront sensing | |
| AU780898B2 (en) | Wavefront sensor for objective measurement of an optical system and associated methods | |
| JP2001524662A (ja) | 波面分析を用いた光学系の客観測定と補正 | |
| JP2004507306A (ja) | 眼の光学的結像品質についての非接触測定システム | |
| EP2718684B1 (fr) | Procédé de localisation de spots lumineux valides pour effectuer une mesure optique et instrument de mesure optique utilisant ce procédé | |
| EP1223850A1 (fr) | Refracteur a fronts d'ondes enregistrant simultanement deux images de hartmann-shack | |
| AU2012268101A1 (en) | Method of locating valid light spots for optical measurement and optical measurement instrument employing method of locating valid light spots | |
| EP1593945A1 (fr) | Capteur de front d'onde et relais pour une mesure optique et méthodes associées. | |
| AU2019219296B2 (en) | Multi-wavelength wavefront system and method for measuring diffractive lenses | |
| US6382793B1 (en) | Method and apparatus for measuring a wavefront | |
| AU2019219238B2 (en) | Wavefront based characterization of lens surfaces based on reflections | |
| WO2010052497A1 (fr) | Correction d'aberrations | |
| US12349971B2 (en) | Method and system for making optical measurement of eye | |
| Cuevas et al. | Distorted grating wavefront sensor and ophthalmic applications | |
| Harrison et al. | Comparative Results from Shack-Hartmann and Distorted Grating Wavefront Sensors in Ophthalmic Applications |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 08844854 Country of ref document: EP Kind code of ref document: A1 |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2008318889 Country of ref document: AU |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2713418 Country of ref document: CA |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2008844854 Country of ref document: EP |
|
| ENP | Entry into the national phase |
Ref document number: 2008318889 Country of ref document: AU Date of ref document: 20081028 Kind code of ref document: A |