WO2009140371A3 - Procédé et appareil de traitement au plasma pulsé faisant appel à un mécanisme de syntonisation à résolution temporelle pour la fourniture d'énergie rf - Google Patents

Procédé et appareil de traitement au plasma pulsé faisant appel à un mécanisme de syntonisation à résolution temporelle pour la fourniture d'énergie rf Download PDF

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Publication number
WO2009140371A3
WO2009140371A3 PCT/US2009/043771 US2009043771W WO2009140371A3 WO 2009140371 A3 WO2009140371 A3 WO 2009140371A3 US 2009043771 W US2009043771 W US 2009043771W WO 2009140371 A3 WO2009140371 A3 WO 2009140371A3
Authority
WO
WIPO (PCT)
Prior art keywords
power supply
plasma processing
pulsed plasma
power delivery
time resolved
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2009/043771
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English (en)
Other versions
WO2009140371A2 (fr
Inventor
Samer Banna
Valentin Todorow
Kartik Ramaswamy
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to KR1020157002580A priority Critical patent/KR20150017389A/ko
Priority to CN200980117820.6A priority patent/CN102027810B/zh
Priority to KR1020107028091A priority patent/KR101528528B1/ko
Priority to JP2011509647A priority patent/JP2011525682A/ja
Publication of WO2009140371A2 publication Critical patent/WO2009140371A2/fr
Publication of WO2009140371A3 publication Critical patent/WO2009140371A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32146—Amplitude modulation, includes pulsing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/24—Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials
    • H10P50/242—Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials of Group IV materials

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

Des modes de réalisation de l'invention concernent généralement des procédés et un appareil qui permettent de réaliser un traitement au plasma pulsé sur une large fenêtre de traitement. Dans certains modes de réalisation, l'appareil selon l'invention peut comprendre : une alimentation en énergie RF à syntonisation de fréquence; et un réseau d'accord couplé à l'alimentation en énergie RF, qui partagent un capteur commun permettant de lire l'énergie RF réfléchie qui est renvoyée vers l'alimentation en énergie RF. Dans certains modes de réalisation, l'appareil peut comprendre : une alimentation en énergie RF à syntonisation de fréquence; et un réseau d'accord couplé à l'alimentation en énergie RF, qui partagent un capteur commun permettant de lire l'énergie RF réfléchie qui est renvoyée vers l'alimentation en énergie RF, et un contrôleur commun permettant de syntoniser tant l'alimentation en énergie RF que le réseau d'accord.
PCT/US2009/043771 2008-05-14 2009-05-13 Procédé et appareil de traitement au plasma pulsé faisant appel à un mécanisme de syntonisation à résolution temporelle pour la fourniture d'énergie rf Ceased WO2009140371A2 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020157002580A KR20150017389A (ko) 2008-05-14 2009-05-13 Ｒｆ 전력 전달을 위한 시간 분해된 조정 방식을 이용하는 펄스화된 플라즈마 처리를 위한 방법 및 장치
CN200980117820.6A CN102027810B (zh) 2008-05-14 2009-05-13 使用rf功率传递的时间分解调频方案以用于脉冲等离子体工艺的方法及设备
KR1020107028091A KR101528528B1 (ko) 2008-05-14 2009-05-13 Ｒｆ 전력 전달을 위한 시간 분해된 조정 방식을 이용하는 펄스화된 플라즈마 처리를 위한 방법 및 장치
JP2011509647A JP2011525682A (ja) 2008-05-14 2009-05-13 Ｒｆ電力供給のための時間分解チューニングスキームを利用したパルス化プラズマ処理の方法及び装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12763408P 2008-05-14 2008-05-14
US61/127,634 2008-05-14

Publications (2)

Publication Number Publication Date
WO2009140371A2 WO2009140371A2 (fr) 2009-11-19
WO2009140371A3 true WO2009140371A3 (fr) 2010-04-01

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2009/043771 Ceased WO2009140371A2 (fr) 2008-05-14 2009-05-13 Procédé et appareil de traitement au plasma pulsé faisant appel à un mécanisme de syntonisation à résolution temporelle pour la fourniture d'énergie rf

Country Status (6)

Country Link
US (1) US8264154B2 (fr)
JP (2) JP2011525682A (fr)
KR (2) KR101528528B1 (fr)
CN (1) CN102027810B (fr)
TW (2) TWI519211B (fr)
WO (1) WO2009140371A2 (fr)

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CN102027810A (zh) 2011-04-20
TW201542042A (zh) 2015-11-01
TW201010524A (en) 2010-03-01
JP5877873B2 (ja) 2016-03-08
TWI586224B (zh) 2017-06-01
CN102027810B (zh) 2014-08-13
KR20150017389A (ko) 2015-02-16
JP2014222657A (ja) 2014-11-27
JP2011525682A (ja) 2011-09-22
KR101528528B1 (ko) 2015-06-12
US8264154B2 (en) 2012-09-11
US20090284156A1 (en) 2009-11-19
WO2009140371A2 (fr) 2009-11-19
KR20110019743A (ko) 2011-02-28

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