WO2010100599A1 - Batterie à film mince de grande capacité et son procédé de fabrication - Google Patents

Batterie à film mince de grande capacité et son procédé de fabrication Download PDF

Info

Publication number
WO2010100599A1
WO2010100599A1 PCT/IB2010/050881 IB2010050881W WO2010100599A1 WO 2010100599 A1 WO2010100599 A1 WO 2010100599A1 IB 2010050881 W IB2010050881 W IB 2010050881W WO 2010100599 A1 WO2010100599 A1 WO 2010100599A1
Authority
WO
WIPO (PCT)
Prior art keywords
wires
recited
battery
substrate
skeleton structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/IB2010/050881
Other languages
English (en)
Inventor
Erik Petrus Antonius Maria Bakkers
Rogier Adrianus Henrica Niessen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
US Philips Corp
Original Assignee
Koninklijke Philips Electronics NV
US Philips Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV, US Philips Corp filed Critical Koninklijke Philips Electronics NV
Publication of WO2010100599A1 publication Critical patent/WO2010100599A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/04Processes of manufacture in general
    • H01M4/0402Methods of deposition of the material
    • H01M4/0421Methods of deposition of the material involving vapour deposition
    • H01M4/0428Chemical vapour deposition
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00Secondary cells; Manufacture thereof
    • H01M10/05Accumulators with non-aqueous electrolyte
    • H01M10/052Li-accumulators
    • H01M10/0525Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00Secondary cells; Manufacture thereof
    • H01M10/05Accumulators with non-aqueous electrolyte
    • H01M10/056Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
    • H01M10/0561Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of inorganic materials only
    • H01M10/0562Solid materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/04Processes of manufacture in general
    • H01M4/0402Methods of deposition of the material
    • H01M4/0421Methods of deposition of the material involving vapour deposition
    • H01M4/0423Physical vapour deposition
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/13Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
    • H01M4/134Electrodes based on metals, Si or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/13Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
    • H01M4/139Processes of manufacture
    • H01M4/1395Processes of manufacture of electrodes based on metals, Si or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/36Selection of substances as active materials, active masses, active liquids
    • H01M4/38Selection of substances as active materials, active masses, active liquids of elements or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/64Carriers or collectors
    • H01M4/66Selection of materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

Definitions

  • This disclosure relates to thin- film batteries, and more particularly to methods and batteries so formed using surface enlargement to provide high capacity functionality.
  • Micro power sources such as all-solid-state thin film batteries (TFBs) are currently seen as the future power sources in many stand-alone and small-scale autonomous devices like sensor systems, RFID, medical implants and many more applications.
  • TFBs are of a planar nature (2D) and can thus only store a relatively small amount of energy per footprint area (-50 microAh/cm 2 per micron of cathode thickness).
  • Li can be intercalated into Si at a high concentration (4.4 Li atoms per Si atom), giving a theoretical energy capacity of about 4000 mAh/gr of Si.
  • the expansion of the Si layer upon Li intercalation results in a degradation of the layer, and limits the number of cycles.
  • diffusion through thick Si layers is slow and limits the operation performance (power output and charging speed) of the battery.
  • the surface enlargement (and thus energy/power output enhancement), which can be realized by means of providing the substrate with a plurality of cavities, is generally done by dry etching processes such as Reactive Ion Etching and Ion Beam Etching, which are expensive and slow. Further, the etch rate drops dramatically when very high aspect ratio structures (e.g., very deep cavities) need to be processed. Moreover, the tool costs and investment are also very high.
  • an all-solid-state thin film energy source with very high energy storage properties per footprint area is provided. This can be realized through 3D surface enlargement of a bottom substrate.
  • a highly-controllable nanowire structure is grown for creating a 3D backbone or skeleton structure on a planar substrate. This backbone can be covered by a complete thin film battery stack.
  • a battery comprising, e.g., LiMOx cathodes, solid-state electrolytes and Li-intercalation anodes (such as LiAl, LiSi, LiIn, LiZn, ...) may be employed.
  • planar battery systems result from surface area enlargement generated by selectively etching 3D features in standard planar substrates by means of reactive ion etching (RIE) for example.
  • RIE reactive ion etching
  • the present principles instead grow nanowires up from a substrate rather than etching structures into the substrate. Additionally, the surface coverage or wire density can be tuned accurately in a wide range (from 0.1% to over 50%).
  • One advantage is that by using a skeleton structure, the battery stack does not suffer from degradation upon cycling, as the active intercalation/storage electrodes can remain very thin. This implies that employing surface area enlargement results in a battery device in which the same amount of energy can be stored per footprint (as compared to planar geometries), using thinner active electrodes. This is combined with a very high storage capacity, stability and fast diffusion through the thin active layers.
  • Applications in which this power source can be utilized may include, for example, autonomous sensors for body area networks (BAN) and wireless sensor networks (WSN), lighting applications (presence detection), medical implants, etc.
  • a Vapor-Liquid-Solid (VLS) growth mechanism for semiconducting nanowires provides a mechanism for growing wires, e.g., from group IV, IH-V and II- VI compound semiconductor materials. Other materials such as conductive materials and even insulating materials may also be employed for wires.
  • the process controls impurity doping (p- and n-type), growth rate in the vertical and radial direction, and the fabrication of heterostructures.
  • p- and n-type impurity doping
  • the expansion of the crystal is accommodated by the geometry and diffusion is fast across short distances.
  • a storage capacity of, e.g., 3000 mAh/gr can be provided by such a system.
  • the wires may show degradation after several charge/discharge cycles due to a collapse of the wire structures. Therefore, protection structures and formation methods are provided in accordance with the present principles to provide a robust skeleton structure to support a high performance and reliable thin film battery.
  • a method for fabricating a battery includes growing wires on a substrate to form a three-dimensional skeleton structure to increase a surface area.
  • a battery stack is deposited on the skeleton structure and includes thinner active electrodes, which increases stability and a lifetime of the battery.
  • a method for fabricating a battery includes growing wires on a substrate to form a three-dimensional skeleton structure.
  • the skeleton structure resists degradation due to intercalation cycling and an active intercalation material is deposited on the skeleton structure.
  • a thin film battery (TFB) includes a substrate, and a plurality of vertical vapor- liquid-solid (VLS) grown nanowires attached to the substrate to form a three-dimensional skeleton structure. The skeleton structure resists degradation due to intercalation cycling.
  • a shell layer is formed over the wires and preferably forms an active electrode of a battery stack.
  • the battery stack is deposited on the skeleton structure.
  • the battery stack includes an active intercalation material.
  • the shell layer may be an anode or cathode of the battery.
  • the anode may be defined as a negative electrode of the battery (e.g., the active electrode of the battery having the most negative potential). This is because in a rechargeable battery system the word anode or cathode actually depends on the whether the battery is being charged or discharged.
  • FIG. 1 is a diagram showing a formation of a catalyst particle and the growth of a nanowire in accordance with the present principles
  • FIG. 2 is a cross-sectional view of a nanowire having a shell layer and optional barrier layer formed thereon;
  • FIG. 3 is a cross-sectional view of a skeleton structure of grown nanowires in accordance with the present principles
  • FIG. 4 is a cross-sectional view of the skeleton structure of FIG. 3 with a battery stack formed thereon in accordance with the present principles
  • FIG. 5 is a diagram showing a formation of catalyst particles on sides of nanowires and grown to form branches in accordance with the present principles.
  • FIG. 6 is a flow diagram showing steps for fabricating a battery in accordance with an illustrative embodiment.
  • the present disclosure describes an all-solid-state thin film energy source with very high energy storage properties per footprint area realized through 3D surface enlargement of the (bottom) substrate.
  • Highly-controllable nanowire growth is employed for creating a 3D backbone or skeleton structure on a planar substrate.
  • the surface coverage or wire density can be tuned accurately in a wide range (from 0.1% to over 50%). Due to the inert nature of the skeleton material, the structure does not suffer from degradation upon cycling. This is combined with a very high storage capacity, stability and fast diffusion, which are achieved through the thin active layers.
  • FIG. 1 a diagram depicts stages of nanowire growth on a substrate 10.
  • Substrate 10 may include any suitable material that is compatible with the nanowires material selection.
  • the substrate 10 may include an isolation material a conductive material or a semiconductive material, e.g., Si, Ge, GaAs, etc.
  • VLS Vapor- Liquid-Solid
  • the temperature for growth may be, e.g., about 400 - 450 0 C (preferably about 420 0 C).
  • the VLS mechanism condenses a vapor to form catalyst particles 12 on substrate 10.
  • the droplets or particles 12 settle to become elliptical in shape 14 to provide a position for growing nanowires 18.
  • a deposition of the material for forming nanowires 18 causes the nanowires to grow below particles 14. As time 16 elapses, the nanowires 18 grow larger.
  • These nanowires 18 have a small diameter (preferably about 20- 50 nm) and grow to between about a hundred nm to several microns.
  • a doping type and density of the nanowires 18 is controlled, such that in one embodiment we have at least about 10 19 cm "3 free carriers to have a conductive system. Controlling the doping density and doping type is performed by adjusting in-situ processing parameters, such as the type of doping element and temperature of evaporation, etc.
  • the material of a first layer which forms the nanowires 18 may be from group IV, IH-V or II- VI.
  • group III- V materials may include, e.g., GaN or InP.
  • a group II- VI compound may include, e.g., ZnO. Growth of the nanowire skeleton (e.g. wires 18) is terminated by decreasing the temperature and discontinuing a precursor flow.
  • a shell layer 22 is formed around the vertical nanowires 18.
  • the temperature may be greater than 420 0 C, but depends on the material selected for the shell layer 22.
  • the thickness of layer 22 is controlled by the deposition time, and the layer 22 may include any semiconductor material, for example, Si, Ge, another group IV element, a II- VI material or III-V material may be employed.
  • a deposition of a Sb shell e.g., about 10 nm in thickness
  • Si core nanowire 18
  • the shell layer 22 preferably forms an active electrode of a TFB battery stack.
  • the shell layer 22 is not an active battery electrode may include a situation where a non-doped skeleton structure is employed with a doped shell layer that can be utilized as a current collector, or the shell layer may be employed as a barrier layer.
  • Table 1 Lithium Insertion and Extraction Voltages are shown for selected materials.
  • a Si core/skeleton structure is covered with a Sb shell, then operating this (anode) structure in a voltage range (vs. a Li/Li + reference couple) from 0.8V - 1.2V, one can reversibly store Li in the Sb shell, but not in the Si core (as this reversibly stores lithium in the 0.25 - 0.45V range).
  • the core/shell structure material can be selected to provide a desired response for a battery in a desired voltage range.
  • the shell layer 22 is used as an active electrode material that reversibly stores lithium, while the core material 18 is electronically conductive as it is used as a current collector.
  • any semiconductor material may be employed for the core material 18, and preferably a doped semiconductor material.
  • carbon nanotube/wires (which reversibly store Li between 0 - 0.3V) may be grown on a substrate using VLS growth.
  • the carbon nanotubes/wires can be covered with a shell material that reversibly interacts with Li at potentials higher than that of carbon.
  • the shell layer 22 protects the wires 18 from degradation and collapse during charge/discharge cycles of intercalation cycling. Protection is provided by shell layer 22 to provide a robust skeleton structure to support a high performance and reliable thin film battery.
  • an effective lithium barrier layer 24, such as Ta, Ti, TaN or TiN can be deposited on the core wires 18 (preferably before depositing the shell layer 22) to prevent Li diffusion into the wire structure (and the accompanying volume changes).
  • This TiN/Ta barrier layer 24 is impenetrable to, e.g., Li, but is an electronic conductor and therefore is a good current collector as well as a barrier layer.
  • barrier layer 24 to chemically separate the core 18 and the shell 22 (or active electrode layers), a wide range of material combinations becomes possible, even those materials where the thermodynamics dictates that reversible Li storage of shell layer materials will occur at potentials more negative than those related to Li storage potentials of the core material.
  • Catalyst 14 may remain embedded in the structure.
  • the catalyst 14 can be removed, e.g., using a wet chemical etch based on, e.g., cyanide (CN " ) or iodide (I3 ).
  • the surface-enhanced substrate 30 is ready for the next step.
  • the surface- enhanced substrate 30 can subsequently be used to deposit a full battery stack 40 thereupon.
  • the battery stack 40 comprises formation of battery stack components, such as back-to-back layer depositions of an anode, a solid electrolyte and a cathode (or vise versa).
  • One of active electrodes (a cathode or an anode) of a battery stack may be formed as the shell layer 22.
  • a low pressure deposition technique may be employed.
  • This technique may include, e.g., a Low Pressure Chemical Vapor Deposition (LPCVD), an Atomic Layer Deposition (ALD) or special types of Physical Vapor Deposition (PVD), such as, biased sputtering.
  • the battery stack 40 may include, e.g., LiMOx cathodes, solid-state electrolytes and Li-intercalation anodes (such as LiAl, LiSi, LiIn, LiZn, ).
  • step conformal anodes silicon
  • solid electrolytes LIsPO 4
  • cathodes LiCo ⁇ 2
  • Other materials and processes may also be employed.
  • the present principles employ highly-controllable nanowire growth for creating a 3D backbone or skeleton structure on a planar substrate, which can additionally be covered by a layer of active (Lithium intercalation) material, e.g., solid electrolytes (LiSPO 4 ) and cathodes (LiCo ⁇ 2 ) of a battery stack.
  • active (Lithium intercalation) material e.g., solid electrolytes (LiSPO 4 ) and cathodes (LiCo ⁇ 2 ) of a battery stack.
  • the surface coverage or wire density can be tuned accurately in a wide range (from about 0.1% to over 50%).
  • the tuning of the wire density may be controlled by chamber temperature and pressure during catalyst deposition/formation (12, 14). Further, the wire density may be controlled by creating conditions for forming a 3D skeleton. This may include depositing a second generation of catalyst particles on side walls of the nanowires and growing branches.
  • Catalysts used for either or both of the first and second generations may include Au, Ag, Cu, Ni, Fe, Co (transition metals), etc., preferably metals with a low melting temperature.
  • catalyst materials may comprise the same element(s) as the nanowires 18 to be grown, such as, e.g., Ga, In, Zn, Al, etc.
  • branches 54 are grown outward from the nanowire 18. This provides a greater topography and may increase the surface area of the skeleton employed for forming a thin- film battery.
  • the structure which may be employed in batteries, does not suffer from degradation upon intercalation cycling, and provides a very high storage capacity, stability and fast diffusion through the thin active layers.
  • FIG. 6 a method for fabricating a battery in accordance with an illustrative embodiment is depicted.
  • a substrate is provided.
  • wires are grown on the substrate to form a three-dimensional skeleton structure.
  • the skeleton structure resists degradation due to intercalation cycling through material selection.
  • a vapor- liquid-solid (VLS) mechanism is employed to grow the wires from the substrate.
  • the VLS mechanism includes depositing catalyst particles on the substrate and growing the wires in a substantially vertical form at the sites of the catalyst particles.
  • the wires are preferably nanowires and have a diameter of between about 20nm and 50 nm.
  • the wires include at least one of a group IV material, a II-IV material, a III-V material, and/or suitable combinations thereof.
  • the wires may include at least one of GaN, InP and ZnO.
  • the wires on the substrate are formed at a first temperature, which is preferably less than or equal to 420 degrees Celsius.
  • a density of the wires is tunable in accordance with process parameters. The density can be adjusted from between about 0.1% to about 50%.
  • a second deposition of catalyst particles may be formed on sides of the wires and the VLS mechanism is again applied to form branches from the sides of the wires.
  • doping type and density of the wires is controlled to ensure conductivity in the wires.
  • a barrier layer is optionally formed over the wires that ensures that no electrochemically active species (which may include Li(O) or Li+ in the case of lithium-ion batteries) can diffuse from active intercalation material which would be subsequently formed onto the underlying skeleton structure (e.g., a shell layer).
  • a battery stack is formed over the wires of the skeleton structure.
  • the battery stack layer includes a shell layer.
  • the shell layer is formed in contact with the barrier layer or the wires of the skeleton structure.
  • the shell layer may include at least one of Si, Ge, and a III- V material if the wires are formed from II-IV material or a III -V material.
  • the shell layer includes an active intercalation material deposited on the barrier layer/skeleton structure.
  • the active intercalation material may include a lithium compound, and is preferably part of a battery stack formed over the skeleton structure.
  • the shell layer preferably forms a first active electrode, followed by an electrolyte and a second active electrode to form the battery stack.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Battery Electrode And Active Subsutance (AREA)

Abstract

L'invention porte sur un procédé de fabrication d'une batterie qui comprend la croissance (104) de fils sur un substrat afin de former une structure de squelette tridimensionnelle pour augmenter une surface utile. Un empilement de batteries est déposé (116) sur la structure de squelette et peut être plus mince pour augmenter la stabilité et la durée de vie de la batterie.
PCT/IB2010/050881 2009-03-04 2010-03-01 Batterie à film mince de grande capacité et son procédé de fabrication Ceased WO2010100599A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15725709P 2009-03-04 2009-03-04
US61/157,257 2009-03-04

Publications (1)

Publication Number Publication Date
WO2010100599A1 true WO2010100599A1 (fr) 2010-09-10

Family

ID=42173800

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2010/050881 Ceased WO2010100599A1 (fr) 2009-03-04 2010-03-01 Batterie à film mince de grande capacité et son procédé de fabrication

Country Status (1)

Country Link
WO (1) WO2010100599A1 (fr)

Cited By (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8257866B2 (en) 2009-05-07 2012-09-04 Amprius, Inc. Template electrode structures for depositing active materials
US8450012B2 (en) 2009-05-27 2013-05-28 Amprius, Inc. Interconnected hollow nanostructures containing high capacity active materials for use in rechargeable batteries
US9142864B2 (en) 2010-11-15 2015-09-22 Amprius, Inc. Electrolytes for rechargeable batteries
US9172088B2 (en) 2010-05-24 2015-10-27 Amprius, Inc. Multidimensional electrochemically active structures for battery electrodes
US9349544B2 (en) 2009-02-25 2016-05-24 Ronald A Rojeski Hybrid energy storage devices including support filaments
US9362549B2 (en) 2011-12-21 2016-06-07 Cpt Ip Holdings, Llc Lithium-ion battery anode including core-shell heterostructure of silicon coated vertically aligned carbon nanofibers
US9412998B2 (en) 2009-02-25 2016-08-09 Ronald A. Rojeski Energy storage devices
US9431181B2 (en) 2009-02-25 2016-08-30 Catalyst Power Technologies Energy storage devices including silicon and graphite
US9698410B2 (en) 2010-10-22 2017-07-04 Amprius, Inc. Composite structures containing high capacity porous active materials constrained in shells
US9705136B2 (en) 2008-02-25 2017-07-11 Traverse Technologies Corp. High capacity energy storage
US9780365B2 (en) 2010-03-03 2017-10-03 Amprius, Inc. High-capacity electrodes with active material coatings on multilayered nanostructured templates
US9917300B2 (en) 2009-02-25 2018-03-13 Cf Traverse Llc Hybrid energy storage devices including surface effect dominant sites
US9923201B2 (en) 2014-05-12 2018-03-20 Amprius, Inc. Structurally controlled deposition of silicon onto nanowires
US9941709B2 (en) 2009-02-25 2018-04-10 Cf Traverse Llc Hybrid energy storage device charging
US9966197B2 (en) 2009-02-25 2018-05-08 Cf Traverse Llc Energy storage devices including support filaments
US9979017B2 (en) 2009-02-25 2018-05-22 Cf Traverse Llc Energy storage devices
US10056602B2 (en) 2009-02-25 2018-08-21 Cf Traverse Llc Hybrid energy storage device production
US10090512B2 (en) 2009-05-07 2018-10-02 Amprius, Inc. Electrode including nanostructures for rechargeable cells
US10096817B2 (en) 2009-05-07 2018-10-09 Amprius, Inc. Template electrode structures with enhanced adhesion characteristics
US10193142B2 (en) 2008-02-25 2019-01-29 Cf Traverse Llc Lithium-ion battery anode including preloaded lithium
US10665858B2 (en) 2009-02-25 2020-05-26 Cf Traverse Llc Energy storage devices
US11075378B2 (en) 2008-02-25 2021-07-27 Cf Traverse Llc Energy storage devices including stabilized silicon
EP3855530A1 (fr) * 2020-01-24 2021-07-28 Epinovatech AB Batterie à semi-conducteurs
US11211638B2 (en) 2017-08-10 2021-12-28 International Business Machines Corporation Large capacity solid state battery
US11233234B2 (en) 2008-02-25 2022-01-25 Cf Traverse Llc Energy storage devices
US11469300B2 (en) 2018-04-22 2022-10-11 Epinovatech Ab Reinforced thin-film semiconductor device and methods of making same
US11634824B2 (en) 2021-06-09 2023-04-25 Epinovatech Ab Device for performing electrolysis of water, and a system thereof
US11652454B2 (en) 2020-02-14 2023-05-16 Epinovatech Ab Monolithic microwave integrated circuit front-end module
US11695066B2 (en) 2019-12-11 2023-07-04 Epinovatech Ab Semiconductor layer structure
US11876233B2 (en) 2020-02-20 2024-01-16 International Business Machines Corporation Thin film battery stacking
US11955972B2 (en) 2020-03-13 2024-04-09 Epinovatech Ab Field-programmable gate array device
US11996550B2 (en) 2009-05-07 2024-05-28 Amprius Technologies, Inc. Template electrode structures for depositing active materials
US12027989B2 (en) 2019-10-25 2024-07-02 Epinovatech Ab AC-DC converter circuit
US12176526B2 (en) 2019-02-22 2024-12-24 Amprius Technologies, Inc. Compositionally modified silicon coatings for use in a lithium ion battery anode
US12395027B2 (en) 2020-05-07 2025-08-19 Epinovatech Ab Induction machine
US12557325B2 (en) 2020-05-29 2026-02-17 Epinovatech Ab Vertical HEMT and a method to produce a vertical HEMT
US12563670B2 (en) 2021-05-10 2026-02-24 Epinovatech Ab Power converter device and a system comprising the same

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001096847A1 (fr) * 2000-06-15 2001-12-20 The University Of North Carolina - Chapel Hill Materiau comprenant une nanostructure a capacite energetique elevee
WO2008023312A1 (fr) * 2006-08-21 2008-02-28 Koninklijke Philips Electronics N.V. Substrat destiné à l'application de fines couches et procédé de production correspondant
WO2008116694A1 (fr) * 2007-03-26 2008-10-02 Nv Bekaert Sa Substrat pour une batterie à couches minces au lithium
US20090042102A1 (en) * 2007-08-10 2009-02-12 Yi Cui Nanowire Battery Methods and Arrangements
WO2009108731A2 (fr) * 2008-02-25 2009-09-03 Ronald Anthony Rojeski Electrodes à grande capacité

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001096847A1 (fr) * 2000-06-15 2001-12-20 The University Of North Carolina - Chapel Hill Materiau comprenant une nanostructure a capacite energetique elevee
WO2008023312A1 (fr) * 2006-08-21 2008-02-28 Koninklijke Philips Electronics N.V. Substrat destiné à l'application de fines couches et procédé de production correspondant
WO2008116694A1 (fr) * 2007-03-26 2008-10-02 Nv Bekaert Sa Substrat pour une batterie à couches minces au lithium
US20090042102A1 (en) * 2007-08-10 2009-02-12 Yi Cui Nanowire Battery Methods and Arrangements
WO2009108731A2 (fr) * 2008-02-25 2009-09-03 Ronald Anthony Rojeski Electrodes à grande capacité

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
GENTILE P ET AL: "The growth of small diameter silicon nanowires to nanotrees", NANOTECHNOLOGY, IOP, BRISTOL, GB LNKD- DOI:10.1088/0957-4484/19/12/125608, vol. 19, no. 12, 26 March 2008 (2008-03-26), pages 1 - 5, XP002522636, ISSN: 0957-4484, [retrieved on 20080221] *
LI-FENG CUI ET AL: "Crystalline-Amorphous Core-Shell Silicon Nanowires for High Capacity and High Current Battery Electrodes", NANO LETTERS, ACS, WASHINGTON, DC, US LNKD- DOI:10.1021/NL8036323, vol. 9, no. 1, 1 January 2009 (2009-01-01), pages 491 - 495, XP007913274, ISSN: 1530-6984, [retrieved on 20081223] *

Cited By (75)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9705136B2 (en) 2008-02-25 2017-07-11 Traverse Technologies Corp. High capacity energy storage
US11502292B2 (en) 2008-02-25 2022-11-15 Cf Traverse Llc Lithium-ion battery anode including preloaded lithium
US11233234B2 (en) 2008-02-25 2022-01-25 Cf Traverse Llc Energy storage devices
US11152612B2 (en) 2008-02-25 2021-10-19 Cf Traverse Llc Energy storage devices
US11127948B2 (en) 2008-02-25 2021-09-21 Cf Traverse Llc Energy storage devices
US11075378B2 (en) 2008-02-25 2021-07-27 Cf Traverse Llc Energy storage devices including stabilized silicon
US10978702B2 (en) 2008-02-25 2021-04-13 Cf Traverse Llc Energy storage devices
US10964938B2 (en) 2008-02-25 2021-03-30 Cf Traverse Llc Lithium-ion battery anode including preloaded lithium
US10193142B2 (en) 2008-02-25 2019-01-29 Cf Traverse Llc Lithium-ion battery anode including preloaded lithium
US9979017B2 (en) 2009-02-25 2018-05-22 Cf Traverse Llc Energy storage devices
US10714267B2 (en) 2009-02-25 2020-07-14 Cf Traverse Llc Energy storage devices including support filaments
US9349544B2 (en) 2009-02-25 2016-05-24 Ronald A Rojeski Hybrid energy storage devices including support filaments
US9412998B2 (en) 2009-02-25 2016-08-09 Ronald A. Rojeski Energy storage devices
US10741825B2 (en) 2009-02-25 2020-08-11 Cf Traverse Llc Hybrid energy storage device production
US9917300B2 (en) 2009-02-25 2018-03-13 Cf Traverse Llc Hybrid energy storage devices including surface effect dominant sites
US10727481B2 (en) 2009-02-25 2020-07-28 Cf Traverse Llc Energy storage devices
US9941709B2 (en) 2009-02-25 2018-04-10 Cf Traverse Llc Hybrid energy storage device charging
US9966197B2 (en) 2009-02-25 2018-05-08 Cf Traverse Llc Energy storage devices including support filaments
US10727482B2 (en) 2009-02-25 2020-07-28 Cf Traverse Llc Energy storage devices
US9431181B2 (en) 2009-02-25 2016-08-30 Catalyst Power Technologies Energy storage devices including silicon and graphite
US10056602B2 (en) 2009-02-25 2018-08-21 Cf Traverse Llc Hybrid energy storage device production
US10673250B2 (en) 2009-02-25 2020-06-02 Cf Traverse Llc Hybrid energy storage device charging
US10665858B2 (en) 2009-02-25 2020-05-26 Cf Traverse Llc Energy storage devices
US10622622B2 (en) 2009-02-25 2020-04-14 Cf Traverse Llc Hybrid energy storage devices including surface effect dominant sites
US10461324B2 (en) 2009-02-25 2019-10-29 Cf Traverse Llc Energy storage devices
US9172094B2 (en) 2009-05-07 2015-10-27 Amprius, Inc. Template electrode structures for depositing active materials
US10811675B2 (en) 2009-05-07 2020-10-20 Amprius, Inc. Electrode including nanostructures for rechargeable cells
US8556996B2 (en) 2009-05-07 2013-10-15 Amprius, Inc. Template electrode structures for depositing active materials
US10096817B2 (en) 2009-05-07 2018-10-09 Amprius, Inc. Template electrode structures with enhanced adhesion characteristics
US10090512B2 (en) 2009-05-07 2018-10-02 Amprius, Inc. Electrode including nanostructures for rechargeable cells
US11024841B2 (en) 2009-05-07 2021-06-01 Amprius, Inc. Template electrode structures for depositing active materials
US8257866B2 (en) 2009-05-07 2012-09-04 Amprius, Inc. Template electrode structures for depositing active materials
US11996550B2 (en) 2009-05-07 2024-05-28 Amprius Technologies, Inc. Template electrode structures for depositing active materials
US10230101B2 (en) 2009-05-07 2019-03-12 Amprius, Inc. Template electrode structures for depositing active materials
US10461359B2 (en) 2009-05-27 2019-10-29 Amprius, Inc. Interconnected hollow nanostructures containing high capacity active materials for use in rechargeable batteries
US9231243B2 (en) 2009-05-27 2016-01-05 Amprius, Inc. Interconnected hollow nanostructures containing high capacity active materials for use in rechargeable batteries
US8450012B2 (en) 2009-05-27 2013-05-28 Amprius, Inc. Interconnected hollow nanostructures containing high capacity active materials for use in rechargeable batteries
US9780365B2 (en) 2010-03-03 2017-10-03 Amprius, Inc. High-capacity electrodes with active material coatings on multilayered nanostructured templates
US9172088B2 (en) 2010-05-24 2015-10-27 Amprius, Inc. Multidimensional electrochemically active structures for battery electrodes
US9698410B2 (en) 2010-10-22 2017-07-04 Amprius, Inc. Composite structures containing high capacity porous active materials constrained in shells
US9142864B2 (en) 2010-11-15 2015-09-22 Amprius, Inc. Electrolytes for rechargeable batteries
US10038219B2 (en) 2010-11-15 2018-07-31 Amprius, Inc. Electrolytes for rechargeable batteries
US9362549B2 (en) 2011-12-21 2016-06-07 Cpt Ip Holdings, Llc Lithium-ion battery anode including core-shell heterostructure of silicon coated vertically aligned carbon nanofibers
US11855279B2 (en) 2014-05-12 2023-12-26 Amprius Technologies, Inc. Structurally controlled deposition of silicon onto nanowires
US10707484B2 (en) 2014-05-12 2020-07-07 Amprius, Inc. Structurally controlled deposition of silicon onto nanowires
US9923201B2 (en) 2014-05-12 2018-03-20 Amprius, Inc. Structurally controlled deposition of silicon onto nanowires
US11289701B2 (en) 2014-05-12 2022-03-29 Amprius, Inc. Structurally controlled deposition of silicon onto nanowires
US11637325B2 (en) 2017-08-10 2023-04-25 International Business Machines Corporation Large capacity solid state battery
US11211638B2 (en) 2017-08-10 2021-12-28 International Business Machines Corporation Large capacity solid state battery
US12609360B2 (en) 2017-08-10 2026-04-21 International Business Machines Corporation Large capacity solid state battery
US11469300B2 (en) 2018-04-22 2022-10-11 Epinovatech Ab Reinforced thin-film semiconductor device and methods of making same
US12382656B2 (en) 2018-04-22 2025-08-05 Epinovatech Ab Reinforced thin-film device
US12009431B2 (en) 2018-04-22 2024-06-11 Epinovatech Ab Reinforced thin-film device
US12176526B2 (en) 2019-02-22 2024-12-24 Amprius Technologies, Inc. Compositionally modified silicon coatings for use in a lithium ion battery anode
US12027989B2 (en) 2019-10-25 2024-07-02 Epinovatech Ab AC-DC converter circuit
US12148821B2 (en) 2019-12-11 2024-11-19 Epinovatech Ab Semiconductor layer structure
US11695066B2 (en) 2019-12-11 2023-07-04 Epinovatech Ab Semiconductor layer structure
CN115066763B (zh) * 2020-01-24 2025-01-21 艾普诺瓦泰克公司 固态电池层结构及其生产方法
JP7725479B2 (ja) 2020-01-24 2025-08-19 エピノバテック、アクチボラグ 固体電池の層構造およびその製造方法
EP3855530A1 (fr) * 2020-01-24 2021-07-28 Epinovatech AB Batterie à semi-conducteurs
US12456734B2 (en) 2020-01-24 2025-10-28 Epinovatech Ab Solid-state battery layer structure and method for producing the same
US11316165B2 (en) 2020-01-24 2022-04-26 Epinovatech Ab Solid-state battery layer structure and method for producing the same
EP4521491A3 (fr) * 2020-01-24 2025-03-26 Epinovatech AB Structure de couche de batterie à semi-conducteurs et son procédé de production
JP2023510949A (ja) * 2020-01-24 2023-03-15 エピノバテック、アクチボラグ 固体電池の層構造およびその製造方法
CN115066763A (zh) * 2020-01-24 2022-09-16 艾普诺瓦泰克公司 固态电池层结构及其生产方法
WO2021148587A1 (fr) * 2020-01-24 2021-07-29 Epinovatech Ab Structure de couche de batterie à semi-conducteur et son procédé de production
US12068726B2 (en) 2020-02-14 2024-08-20 Epinovatech Ab Monolithic microwave integrated circuit front-end module
US11652454B2 (en) 2020-02-14 2023-05-16 Epinovatech Ab Monolithic microwave integrated circuit front-end module
US11876233B2 (en) 2020-02-20 2024-01-16 International Business Machines Corporation Thin film battery stacking
US12355442B2 (en) 2020-03-13 2025-07-08 Epinovatech Ab Field-programmable gate array device
US11955972B2 (en) 2020-03-13 2024-04-09 Epinovatech Ab Field-programmable gate array device
US12395027B2 (en) 2020-05-07 2025-08-19 Epinovatech Ab Induction machine
US12557325B2 (en) 2020-05-29 2026-02-17 Epinovatech Ab Vertical HEMT and a method to produce a vertical HEMT
US12563670B2 (en) 2021-05-10 2026-02-24 Epinovatech Ab Power converter device and a system comprising the same
US11634824B2 (en) 2021-06-09 2023-04-25 Epinovatech Ab Device for performing electrolysis of water, and a system thereof

Similar Documents

Publication Publication Date Title
WO2010100599A1 (fr) Batterie à film mince de grande capacité et son procédé de fabrication
JP6389127B2 (ja) 微細構造電極構造
JP7725479B2 (ja) 固体電池の層構造およびその製造方法
CN112400245B (zh) 具有包含多孔区域的阳极结构的可再充电锂离子电池
JP6875043B2 (ja) 再充電可能電池及びその製造方法
US12300811B2 (en) Lithium-ion battery with thin crystalline anode and methods of making same
US20100190057A1 (en) Method
US20090170001A1 (en) Electrochemical energy source, electronic module, electronic device, and method for manufacturing of said energy source
US20120115026A1 (en) Negative electrode structure for non-aqueous lithium secondary battery
EP2308120A1 (fr) Batterie tridimensionnelle à l'état solide
EP1675207A1 (fr) Electrolyte structuré pour microbatterie
WO2012105901A1 (fr) Batterie au lithium-ion comportant des nanofils
JP4573594B2 (ja) 二次電池
US20200014018A1 (en) Method of making an anode structure containing a porous region
US9484576B2 (en) Particle-based silicon electrodes for energy storage devices
US20180337391A1 (en) Pressing process of creating a patterned surface on battery electrodes
US20240102201A1 (en) LITHIATION OF POROUS-Si FOR HIGH PERFORMANCE ANODE
US20230420664A1 (en) Doped silicon anode for lithium-ion batteries
KR101882396B1 (ko) 리튬 전지 및 리튬 전지의 전극 제조방법
Faramarzi et al. Fabrication of Silicon nanowires suitable for lithium ion battery anode material

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 10712155

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 10712155

Country of ref document: EP

Kind code of ref document: A1