WO2011002247A3 - 300nm 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자 - Google Patents

300nm 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자 Download PDF

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Publication number
WO2011002247A3
WO2011002247A3 PCT/KR2010/004288 KR2010004288W WO2011002247A3 WO 2011002247 A3 WO2011002247 A3 WO 2011002247A3 KR 2010004288 W KR2010004288 W KR 2010004288W WO 2011002247 A3 WO2011002247 A3 WO 2011002247A3
Authority
WO
WIPO (PCT)
Prior art keywords
color filter
solid
sensing device
state image
image sensing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2010/004288
Other languages
English (en)
French (fr)
Other versions
WO2011002247A2 (ko
Inventor
이상행
이승노
온정훈
전지민
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongwoo Fine Chem Co Ltd
Original Assignee
Dongwoo Fine Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020090060148A external-priority patent/KR20110002607A/ko
Priority claimed from KR1020090060149A external-priority patent/KR20110002608A/ko
Priority claimed from KR1020090060147A external-priority patent/KR20110002606A/ko
Application filed by Dongwoo Fine Chem Co Ltd filed Critical Dongwoo Fine Chem Co Ltd
Priority to US13/381,289 priority Critical patent/US8902522B2/en
Priority to CN2010800384478A priority patent/CN102770809A/zh
Priority to JP2012517414A priority patent/JP2012532334A/ja
Publication of WO2011002247A2 publication Critical patent/WO2011002247A2/ko
Publication of WO2011002247A3 publication Critical patent/WO2011002247A3/ko
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Color Television Image Signal Generators (AREA)

Abstract

본 발명은 착색제, 바인더수지, 광중합성 화합물, 광중합개시제 및 용매를 포함하는 착색 감광성 수지 조성물에 있어서, 상기 광중합개시제가 300nm 이하에서 반응하는 화합물을 포함하는 것을 특징으로 하는 300nm 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물을 제공한다. 상기 착색 감광성 수지 조성물은 초미세화된 착색 패턴이 구현된 컬러 필터를 제조할 수 있으며, 따라서 상기 컬러필터는 고체 촬상 소자에 유용하게 적용될 수 있다.
PCT/KR2010/004288 2009-07-02 2010-07-01 300nm 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자 Ceased WO2011002247A2 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US13/381,289 US8902522B2 (en) 2009-07-02 2010-07-01 Colored photosensitive resin composition for preparation of color filter of solid-state image sensing device using 300 nm or less ultrashort wave exposure equipment, color filter using same, and solid-state image sensing device containing same
CN2010800384478A CN102770809A (zh) 2009-07-02 2010-07-01 用于制备利用300nm以下超短波长曝光器的固体摄像元件的彩色滤光片的着色感光性树脂组合物、利用其的彩色滤光片以及含有该彩色滤光片的固体摄像元件
JP2012517414A JP2012532334A (ja) 2009-07-02 2010-07-01 ３００ｎｍ以下の超短波長露光器を利用した固体撮像素子のカラーフィルター製造用着色感光性樹脂組成物、これを利用したカラーフィルターおよびこれを含む固体撮像素子

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
KR10-2009-0060148 2009-07-02
KR1020090060148A KR20110002607A (ko) 2009-07-02 2009-07-02 300ｎｍ 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자
KR10-2009-0060147 2009-07-02
KR1020090060149A KR20110002608A (ko) 2009-07-02 2009-07-02 300ｎｍ 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자
KR10-2009-0060149 2009-07-02
KR1020090060147A KR20110002606A (ko) 2009-07-02 2009-07-02 300ｎｍ 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자

Publications (2)

Publication Number Publication Date
WO2011002247A2 WO2011002247A2 (ko) 2011-01-06
WO2011002247A3 true WO2011002247A3 (ko) 2011-04-14

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2010/004288 Ceased WO2011002247A2 (ko) 2009-07-02 2010-07-01 300nm 이하의 초단파장 노광기를 이용한 고체 촬상 소자의 컬러 필터 제조용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 이를 포함하는 고체 촬상 소자

Country Status (4)

Country Link
US (1) US8902522B2 (ko)
JP (1) JP2012532334A (ko)
CN (1) CN102770809A (ko)
WO (1) WO2011002247A2 (ko)

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JP2013117645A (ja) * 2011-12-02 2013-06-13 Toppan Printing Co Ltd 固体撮像素子に用いられるカラーフィルタ用感光性着色組成物及びカラーフィルタ
KR101569333B1 (ko) * 2013-03-06 2015-11-13 세키스이가가쿠 고교가부시키가이샤 액정 적하 공법용 시일제, 상하 도통 재료, 및, 액정 표시 소자
JP6155772B2 (ja) * 2013-04-02 2017-07-05 東洋インキＳｃホールディングス株式会社 感光性着色組成物、着色膜及びカラーフィルタ
KR102468581B1 (ko) * 2013-10-21 2022-11-18 닛산 가가쿠 가부시키가이샤 네가티브형 감광성 수지 조성물
JP6233271B2 (ja) * 2013-12-27 2017-11-22 Jsr株式会社 感光性樹脂組成物およびレジストパターンの製造方法
JP6392549B2 (ja) * 2014-05-28 2018-09-19 株式会社タムラ製作所 アルカリ可溶性樹脂組成物及びアルカリ可溶性樹脂組成物の硬化膜を有するプリント配線板
US20170176856A1 (en) 2015-12-21 2017-06-22 Az Electronic Materials (Luxembourg) S.A.R.L. Negative-working photoresist compositions for laser ablation and use thereof
KR102143261B1 (ko) * 2016-04-01 2020-08-10 주식회사 엘지화학 잉크 조성물, 이로 제조된 경화 패턴, 이를 포함하는 발열체 및 이의 제조방법
JP6966546B2 (ja) 2017-07-04 2021-11-17 富士フイルム株式会社 デバイスの製造方法
KR102374880B1 (ko) 2017-09-29 2022-03-16 후지필름 가부시키가이샤 착색 감광성 조성물 및 광학 필터의 제조 방법
CN115166888A (zh) * 2017-09-29 2022-10-11 富士胶片株式会社 滤光器的制造方法
KR20200087265A (ko) 2018-02-16 2020-07-20 후지필름 가부시키가이샤 감광성 조성물
TWI787455B (zh) 2018-02-16 2022-12-21 日商富士軟片股份有限公司 感光性組成物
TWI857948B (zh) * 2018-02-28 2024-10-11 日商富士軟片股份有限公司 感光性組成物
WO2019172006A1 (ja) 2018-03-05 2019-09-12 富士フイルム株式会社 感光性組成物
KR102803975B1 (ko) 2018-03-26 2025-05-09 후지필름 가부시키가이샤 감광성 조성물
KR20200122349A (ko) 2018-03-26 2020-10-27 후지필름 가부시키가이샤 감광성 조성물
KR102612685B1 (ko) * 2018-04-19 2023-12-12 후지필름 가부시키가이샤 패턴의 제조 방법, 광학 필터의 제조 방법, 고체 촬상 소자의 제조 방법, 화상 표시 장치의 제조 방법, 광경화성 조성물 및 막
JP7632544B1 (ja) 2023-09-06 2025-02-19 ａｒｔｉｅｎｃｅ株式会社 感光性着色組成物、およびカラーフィルタ、液晶表示装置、固体撮像素子

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Also Published As

Publication number Publication date
JP2012532334A (ja) 2012-12-13
CN102770809A (zh) 2012-11-07
US8902522B2 (en) 2014-12-02
WO2011002247A2 (ko) 2011-01-06
US20120099214A1 (en) 2012-04-26

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