WO2012044054A3 - Procédé de formation d'une nanostructure permettant l'obtention d'une surface hautement transparente et super-hydrophobe - Google Patents

Procédé de formation d'une nanostructure permettant l'obtention d'une surface hautement transparente et super-hydrophobe Download PDF

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Publication number
WO2012044054A3
WO2012044054A3 PCT/KR2011/007132 KR2011007132W WO2012044054A3 WO 2012044054 A3 WO2012044054 A3 WO 2012044054A3 KR 2011007132 W KR2011007132 W KR 2011007132W WO 2012044054 A3 WO2012044054 A3 WO 2012044054A3
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Prior art keywords
highly transparent
super water
nanostructure
forming
substrate
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Ceased
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PCT/KR2011/007132
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English (en)
Korean (ko)
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WO2012044054A2 (fr
Inventor
김윤택
양순석
조상무
김병찬
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VACOS CO Ltd
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VACOS CO Ltd
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Publication of WO2012044054A2 publication Critical patent/WO2012044054A2/fr
Publication of WO2012044054A3 publication Critical patent/WO2012044054A3/fr
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
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    • C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
    • C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
    • C09D127/12—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/20—Metallic material, boron or silicon on organic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment
    • C23C14/5853—Oxidation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment
    • C23C14/586—Nitriding
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Biophysics (AREA)
  • Laminated Bodies (AREA)
  • Wood Science & Technology (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

La présente invention concerne un procédé de formation d'une nanostructure permettant l'obtention d'une surface hautement transparente et super-hydrophobe et, plus précisément, un procédé de formation d'une surface nanostructurée hautement transparente et super-hydrophobe, comprenant les étapes consistant à former de fines particules métalliques en forme d'îlots à la surface d'un substrat ; à graver la surface du substrat en utilisant les fines particules métalliques en forme d'îlots en tant que masque protecteur ; et à éliminer les fines particules métalliques subsistant à la surface du substrat gravé. Grâce au procédé de formation d'une nanostructure de la présente invention, il est facile d'obtenir une mince surface inégale et aléatoire à la surface d'un substrat même sans utiliser un procédé coûteux et peu efficace tel que la lithographie et, ainsi, de produire une surface hautement transparente et super-hydrophobe sur laquelle est formée une nanostructure, et ce pour un coût faible et de manière très efficace.
PCT/KR2011/007132 2010-09-30 2011-09-28 Procédé de formation d'une nanostructure permettant l'obtention d'une surface hautement transparente et super-hydrophobe Ceased WO2012044054A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2010-0095523 2010-09-30
KR1020100095523A KR101283665B1 (ko) 2010-09-30 2010-09-30 고투광성, 초발수성 표면 구현을 위한 나노구조물 형성 방법

Publications (2)

Publication Number Publication Date
WO2012044054A2 WO2012044054A2 (fr) 2012-04-05
WO2012044054A3 true WO2012044054A3 (fr) 2012-06-21

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PCT/KR2011/007132 Ceased WO2012044054A2 (fr) 2010-09-30 2011-09-28 Procédé de formation d'une nanostructure permettant l'obtention d'une surface hautement transparente et super-hydrophobe

Country Status (2)

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KR (1) KR101283665B1 (fr)
WO (1) WO2012044054A2 (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140068289A (ko) * 2012-11-20 2014-06-09 (주)에스이피 광투과성 및 내구성이 향상된 반사방지 표면의 제조방법 및 반사방지 표면이 형성된 기판
KR101374095B1 (ko) * 2012-12-03 2014-03-13 한국기계연구원 초발수 및 초발유성 표면 구현을 위한 나노 구조물 제조 방법
US20170044340A1 (en) * 2014-05-27 2017-02-16 Sabic Global Technologies B.V. Self-cleansing super-hydrophobic polymeric materials for anti-soiling
DE102014113097A1 (de) * 2014-09-11 2016-03-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Reduzieren der Schmutzhaftung an einem Substrat
JP2019008028A (ja) * 2017-06-21 2019-01-17 ミツミ電機株式会社 撥水性反射防止構造体および撥水性反射防止構造体の製造方法
KR20190023771A (ko) 2017-08-30 2019-03-08 영남대학교 산학협력단 초 소수성 표면 제작 방법
JP2020038311A (ja) * 2018-09-05 2020-03-12 ミツミ電機株式会社 撥水性反射防止構造体
CN109534684A (zh) * 2018-12-27 2019-03-29 河南豫科玻璃技术股份有限公司 一种基于纳米级无闪点防眩光技术的蚀刻玻璃及其刻蚀工艺
KR20220055136A (ko) 2020-10-26 2022-05-03 영남대학교 산학협력단 초소수성 표면을 갖는 기판 제작 방법, 이를 이용하여 제조된 기판 및 기판을 갖춘 표면 구조물
CN114133611B (zh) * 2021-11-02 2023-02-07 北京大学 一种在聚合物材料表面制备纳米纤毛结构的方法
CN114682922B (zh) * 2022-03-08 2023-03-21 江苏大学 一种激光刻蚀制备铝合金超疏水表面应力与织构形貌调控方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008143162A (ja) * 2006-11-15 2008-06-26 National Institute Of Advanced Industrial & Technology 反射防止構造を有する光学素子用成形型、その製造方法および光学素子
JP2009128538A (ja) * 2007-11-21 2009-06-11 Panasonic Corp 反射防止構造体の製造方法
JP2009128543A (ja) * 2007-11-21 2009-06-11 Panasonic Corp 反射防止構造体の製造方法
KR20100070516A (ko) * 2008-12-18 2010-06-28 한국기계연구원 무반사 표면 및 초발수 표면의 제조방법

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008143162A (ja) * 2006-11-15 2008-06-26 National Institute Of Advanced Industrial & Technology 反射防止構造を有する光学素子用成形型、その製造方法および光学素子
JP2009128538A (ja) * 2007-11-21 2009-06-11 Panasonic Corp 反射防止構造体の製造方法
JP2009128543A (ja) * 2007-11-21 2009-06-11 Panasonic Corp 反射防止構造体の製造方法
KR20100070516A (ko) * 2008-12-18 2010-06-28 한국기계연구원 무반사 표면 및 초발수 표면의 제조방법

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KR101283665B1 (ko) 2013-07-08
WO2012044054A2 (fr) 2012-04-05
KR20120033805A (ko) 2012-04-09

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