WO2012123109A3 - Verfahren zum herstellen von flexiblen dünnschicht-solarzellen - Google Patents

Verfahren zum herstellen von flexiblen dünnschicht-solarzellen Download PDF

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Publication number
WO2012123109A3
WO2012123109A3 PCT/EP2012/001129 EP2012001129W WO2012123109A3 WO 2012123109 A3 WO2012123109 A3 WO 2012123109A3 EP 2012001129 W EP2012001129 W EP 2012001129W WO 2012123109 A3 WO2012123109 A3 WO 2012123109A3
Authority
WO
WIPO (PCT)
Prior art keywords
thin film
solar cells
film solar
flexible thin
producing flexible
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2012/001129
Other languages
English (en)
French (fr)
Other versions
WO2012123109A2 (de
Inventor
Kristin PLAT
Steffen Kürbitz
Thomas Rainer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BORAIDENT GmbH
Original Assignee
BORAIDENT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BORAIDENT GmbH filed Critical BORAIDENT GmbH
Publication of WO2012123109A2 publication Critical patent/WO2012123109A2/de
Publication of WO2012123109A3 publication Critical patent/WO2012123109A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • H10F77/169—Thin semiconductor films on metallic or insulating substrates
    • H10F77/1692—Thin semiconductor films on metallic or insulating substrates the films including only Group IV materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F19/00—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
    • H10F19/80—Encapsulations or containers for integrated devices, or assemblies of multiple devices, having photovoltaic cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/139—Manufacture or treatment of devices covered by this subclass using temporary substrates
    • H10F71/1395—Manufacture or treatment of devices covered by this subclass using temporary substrates for thin-film devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • H10F77/169—Thin semiconductor films on metallic or insulating substrates
    • H10F77/1698—Thin semiconductor films on metallic or insulating substrates the metallic or insulating substrates being flexible
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Photovoltaic Devices (AREA)

Abstract

Ein Verfahren zum Herstellen von flexiblen Dünnschicht- Solarzellen weist folgende Schritte auf: e. Aufbringen eines fotoaktiven Schichtaufbaus auf ein starres Substrat aus vorzugsweise Glas mit dessen Frontkontakt-Schicht voraus, f. Aufbringen einer flexiblen Folie auf die dem Substrat abgewandte Rückkontakt-Schicht des Schichtaufbaus, g. Ablösen des fotoaktiven Schichtaufbaus vom Substrat mittels Laserstrahl, h. Aufbringen einer flexiblen Folie auf die Frontkontakt-Schicht.
PCT/EP2012/001129 2011-03-15 2012-03-14 Verfahren zum herstellen von flexiblen dünnschicht-solarzellen Ceased WO2012123109A2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102011014795.0 2011-03-15
DE102011014795.0A DE102011014795B4 (de) 2011-03-15 2011-03-15 Verfahren zum Herstellen von flexiblen Dünnschicht-Solarzellen

Publications (2)

Publication Number Publication Date
WO2012123109A2 WO2012123109A2 (de) 2012-09-20
WO2012123109A3 true WO2012123109A3 (de) 2013-06-20

Family

ID=45954588

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2012/001129 Ceased WO2012123109A2 (de) 2011-03-15 2012-03-14 Verfahren zum herstellen von flexiblen dünnschicht-solarzellen

Country Status (2)

Country Link
DE (1) DE102011014795B4 (de)
WO (1) WO2012123109A2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014202985B4 (de) * 2014-02-19 2018-07-12 4Jet Microtech Gmbh & Co. Kg Herstellung von elektronischen Bauteilen auf einem Substrat
EP4561308A1 (de) 2023-11-21 2025-05-28 Dirk Dammers Dünnschicht-solarzelle, insbesondere perowskit-solarzelle, solarmodul mit solchen dünnschicht-solarzellen und verfahren zu deren herstellung

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0797258A2 (de) * 1996-03-18 1997-09-24 Sony Corporation Herstellungsverfahren von Dünnschichthalbleitern, Solarzellen und lichtemittierenden Dioden
US20030040164A1 (en) * 1997-07-03 2003-02-27 Seiko Epson Corporation Thin film device transfer method, thin film device, thin film integrated circuit device, active matrix board, liquid crystal display, and electronic apparatus
US20060076584A1 (en) * 2004-09-07 2006-04-13 Il-Doo Kim Fabrication of electronic and photonic systems on flexible substrates by layer transfer method
US20100255344A1 (en) * 2009-04-06 2010-10-07 Samsung Electro-Mechanics Co., Ltd. Method of manufacturing thin film device and thin film device manufactured using the same

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10006823C2 (de) 2000-02-08 2003-10-02 Cis Solartechnik Gmbh Verfahren zur Herstellung eines flexiblen metallischen Substrats für eine CIS-Solarzelle und CIS-Solarzelle
DE10005680B4 (de) 2000-02-07 2005-03-31 Cis Solartechnik Gmbh Trägermaterial für eine flexible, bandförmige CIS-Solarzelle
DE10127255A1 (de) * 2001-06-05 2003-01-16 Univ Stuttgart Konditionierung von Glasoberflächen für den Transfer von CIGS-Solarzellen auf flexible Kunstoffsubstrate
DE10239845C1 (de) 2002-08-29 2003-12-24 Day4 Energy Inc Elektrode für fotovoltaische Zellen, fotovoltaische Zelle und fotovoltaischer Modul
WO2007011742A2 (en) * 2005-07-14 2007-01-25 Konarka Technologies, Inc. Cigs photovoltaic cells
JP5352824B2 (ja) * 2007-07-20 2013-11-27 独立行政法人 宇宙航空研究開発機構 太陽電池の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0797258A2 (de) * 1996-03-18 1997-09-24 Sony Corporation Herstellungsverfahren von Dünnschichthalbleitern, Solarzellen und lichtemittierenden Dioden
US20030040164A1 (en) * 1997-07-03 2003-02-27 Seiko Epson Corporation Thin film device transfer method, thin film device, thin film integrated circuit device, active matrix board, liquid crystal display, and electronic apparatus
US20060076584A1 (en) * 2004-09-07 2006-04-13 Il-Doo Kim Fabrication of electronic and photonic systems on flexible substrates by layer transfer method
US20100255344A1 (en) * 2009-04-06 2010-10-07 Samsung Electro-Mechanics Co., Ltd. Method of manufacturing thin film device and thin film device manufactured using the same

Also Published As

Publication number Publication date
DE102011014795A1 (de) 2012-09-20
WO2012123109A2 (de) 2012-09-20
DE102011014795B4 (de) 2021-05-06

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