WO2012144798A3 - 고분자 및 이를 포함하는 감광성 수지 조성물 - Google Patents

고분자 및 이를 포함하는 감광성 수지 조성물 Download PDF

Info

Publication number
WO2012144798A3
WO2012144798A3 PCT/KR2012/002955 KR2012002955W WO2012144798A3 WO 2012144798 A3 WO2012144798 A3 WO 2012144798A3 KR 2012002955 W KR2012002955 W KR 2012002955W WO 2012144798 A3 WO2012144798 A3 WO 2012144798A3
Authority
WO
WIPO (PCT)
Prior art keywords
photosensitive resin
polymer
resin composition
composition containing
containing same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2012/002955
Other languages
English (en)
French (fr)
Other versions
WO2012144798A2 (ko
Inventor
김선화
지호찬
최동창
김한수
허윤희
조창호
정원진
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Chem Ltd
Original Assignee
LG Chem Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LG Chem Ltd filed Critical LG Chem Ltd
Priority to CN201280018799.6A priority Critical patent/CN103717626B/zh
Priority to JP2014503611A priority patent/JP5780618B2/ja
Publication of WO2012144798A2 publication Critical patent/WO2012144798A2/ko
Publication of WO2012144798A3 publication Critical patent/WO2012144798A3/ko
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/04—Acids, Metal salts or ammonium salts thereof
    • C08F20/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C08F22/04—Anhydrides, e.g. cyclic anhydrides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1807—C7-(meth)acrylate, e.g. heptyl (meth)acrylate or benzyl (meth)acrylate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1808—C8-(meth)acrylate, e.g. isooctyl (meth)acrylate or 2-ethylhexyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1811—C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1812—C12-(meth)acrylate, e.g. lauryl (meth)acrylate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

본 발명은 신규한 구조의 고분자 및 이를 포함하는 감광성 수지 조성물에 관한 것이다. 본 발명에 따른 고분자를 포함하는 감광성 수지 조성물은 테이퍼 각도가 높고 접착력이 우수한 특징이 있다. 따라서, 본 발명에 따른 고분자를 포함하는 감광성 수지 조성물은 다양한 감광재로 적용할 수 있으며, 특히 LCD용 컬러 필터 패턴의 제조시 바람직하게 적용할 수 있다.
PCT/KR2012/002955 2011-04-21 2012-04-18 고분자 및 이를 포함하는 감광성 수지 조성물 Ceased WO2012144798A2 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201280018799.6A CN103717626B (zh) 2011-04-21 2012-04-18 聚合物及含有所述聚合物的光敏树脂组合物
JP2014503611A JP5780618B2 (ja) 2011-04-21 2012-04-18 高分子およびそれを含む感光性樹脂組成物｛ｐｏｌｙｍｅｒａｎｄｐｈｏｔｏｓｅｎｓｉｔｉｖｅｒｅｓｉｎｃｏｍｐｏｓｉｔｉｏｎｃｏｍｐｒｉｓｉｎｇｔｈｅｓａｍｅ｝

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2011-0037474 2011-04-21
KR20110037474 2011-04-21

Publications (2)

Publication Number Publication Date
WO2012144798A2 WO2012144798A2 (ko) 2012-10-26
WO2012144798A3 true WO2012144798A3 (ko) 2013-01-10

Family

ID=47042040

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/002955 Ceased WO2012144798A2 (ko) 2011-04-21 2012-04-18 고분자 및 이를 포함하는 감광성 수지 조성물

Country Status (6)

Country Link
US (1) US8829068B2 (ko)
JP (1) JP5780618B2 (ko)
KR (1) KR101403791B1 (ko)
CN (1) CN103717626B (ko)
TW (1) TWI458742B (ko)
WO (1) WO2012144798A2 (ko)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101384457B1 (ko) * 2011-08-04 2014-04-14 주식회사 엘지화학 실란계 화합물 및 이를 포함하는 감광성 수지 조성물
JP6229256B2 (ja) * 2011-10-31 2017-11-15 日立化成株式会社 感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP6163876B2 (ja) * 2013-05-24 2017-07-19 株式会社村田製作所 感光性ペースト
JP6694230B2 (ja) * 2014-10-22 2020-05-13 株式会社日本触媒 アルカリ可溶性樹脂ならびにそれを含む硬化性樹脂組成物
KR101970724B1 (ko) 2016-06-14 2019-04-22 삼성에스디아이 주식회사 감광성 수지 조성물, 감광성 수지막 및 이를 이용한 컬러필터
TWI805617B (zh) 2017-09-15 2023-06-21 南韓商Ｌｇ化學股份有限公司 層壓板
KR102705672B1 (ko) * 2019-05-08 2024-09-12 스미또모 베이크라이트 가부시키가이샤 감광성 수지 조성물, 수지막 및 전자 장치
WO2020226052A1 (ja) * 2019-05-08 2020-11-12 住友ベークライト株式会社 感光性樹脂組成物、樹脂膜および電子装置
JP2021196596A (ja) * 2020-06-16 2021-12-27 住友ベークライト株式会社 ポリマー溶液
JP7563491B2 (ja) * 2021-01-08 2024-10-08 三菱ケミカル株式会社 ビニル系重合体、硬化性組成物、及び硬化物
WO2023022010A1 (ja) * 2021-08-17 2023-02-23 ダイキン工業株式会社 共重合体、及び樹脂組成物
JP7339576B2 (ja) * 2021-08-17 2023-09-06 ダイキン工業株式会社 共重合体、及び樹脂組成物
JP2024042443A (ja) * 2022-09-15 2024-03-28 株式会社大阪ソーダ （メタ）アクリル系重合体、（メタ）アクリル系重合体含有組成物及び（メタ）アクリル系重合体架橋物

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006184574A (ja) * 2004-12-27 2006-07-13 Tokyo Ohka Kogyo Co Ltd レジスト保護膜形成用材料およびこれを用いたレジストパターン形成方法
US20080145783A1 (en) * 2006-12-19 2008-06-19 Cheil Industries Inc. Photosensitive Resin Composition and Organic Insulating Film Produced Using the Same
KR100918691B1 (ko) * 2007-12-07 2009-09-22 제일모직주식회사 패드 보호막 형성용 감광성 수지 조성물, 및 이를 이용하는이미지 센서의 제조 방법
KR20100042173A (ko) * 2008-10-15 2010-04-23 주식회사 엘지화학 내열성이 우수한 감광성 수지, 및 이를 포함하는 감광성 조성물
US20100105793A1 (en) * 2007-01-15 2010-04-29 Keon-Woo Lee Polymer Resin Compounds And Photoresist Composition Including New Polymer Resin Compounds

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4241899B2 (ja) * 2006-07-25 2009-03-18 日立化成工業株式会社 光学材料用樹脂組成物、光学材料用樹脂フィルム及び光導波路
CN101583908B (zh) * 2007-11-20 2012-12-26 日立化成工业株式会社 感光性树脂组合物、感光性树脂固化物、感光性树脂膜、感光性树脂膜固化物和使用它们得到的光波导
KR101249681B1 (ko) * 2008-01-23 2013-04-05 주식회사 엘지화학 바인더 수지 및 이를 포함하는 감광성 수지조성물과, 이감광성 수지조성물에 의해 제조된 컬럼스페이서
JP2009244368A (ja) * 2008-03-28 2009-10-22 Sekisui Chem Co Ltd カラムスペーサ用硬化性樹脂組成物、カラムスペーサ、及び、液晶表示素子
JP5525782B2 (ja) * 2009-01-13 2014-06-18 東京応化工業株式会社 接着剤組成物および接着フィルム
KR101146179B1 (ko) * 2009-04-03 2012-05-24 주식회사 이그잭스 엘시디 스페이서 제조용 감광성 수지 조성물

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006184574A (ja) * 2004-12-27 2006-07-13 Tokyo Ohka Kogyo Co Ltd レジスト保護膜形成用材料およびこれを用いたレジストパターン形成方法
US20080145783A1 (en) * 2006-12-19 2008-06-19 Cheil Industries Inc. Photosensitive Resin Composition and Organic Insulating Film Produced Using the Same
US20100105793A1 (en) * 2007-01-15 2010-04-29 Keon-Woo Lee Polymer Resin Compounds And Photoresist Composition Including New Polymer Resin Compounds
KR100918691B1 (ko) * 2007-12-07 2009-09-22 제일모직주식회사 패드 보호막 형성용 감광성 수지 조성물, 및 이를 이용하는이미지 센서의 제조 방법
KR20100042173A (ko) * 2008-10-15 2010-04-23 주식회사 엘지화학 내열성이 우수한 감광성 수지, 및 이를 포함하는 감광성 조성물

Also Published As

Publication number Publication date
WO2012144798A2 (ko) 2012-10-26
TW201305223A (zh) 2013-02-01
US8829068B2 (en) 2014-09-09
JP2014517087A (ja) 2014-07-17
TWI458742B (zh) 2014-11-01
CN103717626B (zh) 2016-01-20
CN103717626A (zh) 2014-04-09
KR101403791B1 (ko) 2014-06-03
JP5780618B2 (ja) 2015-09-16
US20130030077A1 (en) 2013-01-31
KR20120120033A (ko) 2012-11-01

Similar Documents

Publication Publication Date Title
WO2012144798A3 (ko) 고분자 및 이를 포함하는 감광성 수지 조성물
WO2014020072A3 (de) Flüssige härter zur härtung von epoxidharzen (ii)
WO2012077003A3 (en) Elastic film containing a renewable starch polymer
WO2012064071A3 (ko) 점착제 조성물
WO2007131699A3 (en) Novel stress-related microrna molecules and uses thereof
WO2014066041A3 (en) Controlled-release amine-catalyzed, sulfur-containing polymer and epoxy compositions
WO2010096444A3 (en) Photochemical cross-linkable polymers, methods of making photochemical cross-linkable polymers, and methods of using photochemical cross-linkable polymers
WO2010083192A3 (en) Epoxy resin composition
WO2013012666A3 (en) Compounds, methods of making, and methods of use
WO2012144838A3 (ko) 올레핀계 아이오노머 수지 조성물
WO2012015444A8 (en) Polyamide composite structures and processes for their preparation
WO2011107450A3 (de) Schlagzäher bei raumtemperatur härtender zweikomponentiger strukturklebstoff
WO2011111982A3 (ko) 폴리아릴렌 설파이드 및 이의 제조 방법
WO2012099366A3 (ko) 감광성 수지 조성물 및 이를 포함하는 감광재
WO2010041834A3 (ko) 광결정으로 이루어진 페인트 조성물용 안료 및 이의 제조 방법
WO2014049570A3 (en) Improved release polycarbonate compositions
WO2008113566A3 (en) Fibres, tapes or filaments comprising a polyethylene composition
WO2010079923A3 (ko) 나노 크기로 분산된 안료를 포함하는 유색 투명 코팅 도료 조성물, 코팅된 기재 및 그 제조방법
EP2565210A4 (en) FINE RESIN POWDER COMPOSED OF 4-METHYL-1-PENTENE POLYMER, COMPOSITION CONTAINING THE SAME, AND PROCESS FOR PRODUCING THE SAME
WO2011082067A3 (en) Perfluoropolyether-containing compounds with oxalylamino groups
FI20090127L (fi) Polymeerikoostumus, joka soveltuu pastöroitavien säilytysastioiden valmistamiseen
WO2012128594A3 (ko) 광학 필름용 점착제 조성물
EP2284205A4 (en) RESIN COMPOSITION FOR PREPARING AN OPTICAL COMPONENT AND ITS APPLICATION
WO2013151188A8 (ja) 樹脂組成物
GB2485089B (en) Acrylic resin composition, method of manufacturing the same, and architectural material, fashion accessory and optical material formed using the same

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 12773533

Country of ref document: EP

Kind code of ref document: A2

ENP Entry into the national phase

Ref document number: 2014503611

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 12773533

Country of ref document: EP

Kind code of ref document: A2