WO2012161005A1 - Organic electroluminescence element - Google Patents

Organic electroluminescence element Download PDF

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Publication number
WO2012161005A1
WO2012161005A1 PCT/JP2012/062255 JP2012062255W WO2012161005A1 WO 2012161005 A1 WO2012161005 A1 WO 2012161005A1 JP 2012062255 W JP2012062255 W JP 2012062255W WO 2012161005 A1 WO2012161005 A1 WO 2012161005A1
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WIPO (PCT)
Prior art keywords
electrode
layer
organic electroluminescence
carrier
substrate
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PCT/JP2012/062255
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French (fr)
Japanese (ja)
Inventor
将啓 中村
正人 山名
充雄 矢口
健之 山木
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Panasonic Corp
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Panasonic Corp
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/10OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/18Carrier blocking layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/805Electrodes
    • H10K59/8051Anodes
    • H10K59/80515Anodes characterised by their shape
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/805Electrodes
    • H10K59/8051Anodes
    • H10K59/80516Anodes combined with auxiliary electrodes, e.g. ITO layer combined with metal lines
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/805Electrodes
    • H10K59/8052Cathodes
    • H10K59/80521Cathodes characterised by their shape
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/805Electrodes
    • H10K59/8052Cathodes
    • H10K59/80522Cathodes combined with auxiliary electrodes

Definitions

  • the present invention relates to an organic electroluminescence element.
  • an organic electroluminescence element having the structure shown in FIG. 7 has been proposed (for example, Japanese Patent Publication No. 2006-331694; see Patent Document 1).
  • this organic electroluminescence element one electrode (cathode) 101 is laminated on the surface of the substrate 104, a light emitting layer 103 is laminated on the surface of the electrode 101 via an electron injection / transport layer 105, and on the light emitting layer 103.
  • the other electrode (anode) 102 is laminated via the hole injection / transport layer 106.
  • the organic electroluminescence element includes a sealing member 107 on the surface side of the substrate 104. Therefore, in this organic electroluminescence element, light emitted from the light emitting layer 103 is radiated through the electrode 102 formed as a light transmissive electrode and the sealing member 107 formed of a transparent body.
  • Examples of the material of the reflective electrode 101 include Al, Zr, Ti, Y, Sc, Ag, and In.
  • Examples of the material of the electrode 102 which is a light transmissive electrode include indium-tin oxide (ITO) and indium-zinc oxide (IZO).
  • the organic electroluminescence element In order to light the organic electroluminescence element with high brightness, it is necessary to pass a larger current.
  • the organic electroluminescence element generally has a higher sheet resistance of an anode made of an ITO film than that of a cathode made of a metal film, an alloy film, a metal compound film, etc., the potential gradient at the anode is high. As a result, the in-plane variation in luminance increases.
  • Patent Document 2 includes a first conductive layer 220, an electroluminescent material 230, a second conductive layer 240, and a substrate 245, and the first conductive layer 220 has a rectangular shape.
  • An electroluminescent lamp 210 composed of a rectangular grid electrode having openings 250 has been proposed.
  • Patent Document 2 describes that it is preferable to form the first conductive layer 220 and the second conductive layer 240 with conductive ink such as silver ink or carbon ink.
  • Patent Document 2 describes that the first conductive layer 220, the electroluminescent material 230, and the second conductive layer 240 are formed by a screen printing method, an offset printing method, or the like.
  • Patent Document 2 describes that when the electroluminescence lamp 210 having uniform brightness is required, the density of the openings 250 is made substantially constant over the surface of the lamp.
  • the first conductive layer 220 has the opening 250, and thus the first conductive layer 220 in the electroluminescent material 230 has the first conductive layer 220.
  • Carriers are injected only into the portion immediately below the layer 220. For this reason, in the electroluminescence lamp 210, there is a concern that the light emission efficiency at the portion corresponding to the opening 250 in the electroluminescence material 230 is lowered, and the external quantum efficiency is lowered.
  • the present invention has been made in view of the above reasons, and an object of the present invention is to provide an organic electroluminescence device capable of reducing luminance unevenness and improving external quantum efficiency. is there.
  • the organic electroluminescence device of the present invention includes a substrate, a first electrode provided on one surface side of the substrate, a second electrode facing the first electrode on the one surface side of the substrate, and the first electrode
  • An organic electroluminescence element comprising a functional layer including a light emitting layer between an electrode and the second electrode, wherein the resistivity of each of the first electrode and the second electrode is a transparent conductive oxide Lower than resistivity, the functional layer is the outermost layer on the second electrode side than the light emitting layer, and the first carrier injected from the first electrode to the functional layer is directed to the second electrode side.
  • a first carrier blocking layer that suppresses leakage; and the second electrode has an opening for extracting light from the functional layer, and the opening includes the second electrode and the functional layer.
  • Second carrier injection function A conductive layer having light transparency is provided, the conductive layer covers the second electrode, and the first carrier blocking layer is provided with a recess in a projection region of the opening. And
  • the distance from the projection region of the second electrode to the inner surface close to the projection region increases as the recess moves away from the second electrode in the thickness direction of the first carrier blocking layer. It is preferably formed in a shape.
  • the second electrode is preferably composed of an electrode containing a metal powder and an organic binder.
  • the conductive layer is preferably formed of a transparent conductive film including a conductive nanostructure and a transparent medium.
  • the first carrier blocking layer has a thickness of a projection region of the opening portion smaller than a thickness of a projection region of the second electrode.
  • the organic electroluminescence device of the present invention it is possible to reduce luminance unevenness and improve external quantum efficiency.
  • FIG. 1 is a schematic cross-sectional view of an organic electroluminescence element of Embodiment 1.
  • FIG. 3 is a schematic plan view of a second electrode in the organic electroluminescence element of Embodiment 1.
  • FIG. 2 is a schematic cross-sectional view of a main part of the organic electroluminescence element of Embodiment 1.
  • FIG. 6 is a schematic plan view of another configuration example of the second electrode in the organic electroluminescence element of Embodiment 1.
  • FIG. 6 is a schematic plan view of another configuration example of the second electrode in the organic electroluminescence element of Embodiment 1.
  • FIG. 1 is a schematic cross-sectional view of an organic electroluminescence element of Embodiment 1.
  • FIG. 3 is a schematic plan view of a second electrode in the organic electroluminescence element of Embodiment 1.
  • FIG. 2 is a schematic cross-sectional view of a main part of the organic electroluminescence element of Embodiment 1.
  • FIG. 6 is a
  • FIG. 5 is a schematic cross-sectional view of a main part of an organic electroluminescence element of Embodiment 2.
  • FIG. It is a schematic sectional drawing of the organic electroluminescent element of a prior art example. It is a see-through
  • the organic electroluminescence element includes a substrate 10, a first electrode 20 provided on one surface side (the upper side in FIG. 1) of the substrate 10, and a second electrode facing the first electrode 20 on the one surface side of the substrate 10. 40 and a functional layer 30 including the light emitting layer 32 between the first electrode 20 and the second electrode 40.
  • the electroluminescent element of the present embodiment includes the first electrode 20 and the second electrode 40 that are disposed to face each other, and the functional layer 30 that is disposed between the first electrode 20 and the second electrode 40. ing.
  • the organic electroluminescence element has a first terminal portion (not shown) electrically connected to the first electrode 20 via a first lead wiring (not shown), and a second lead to the second electrode 40. And a second terminal portion 47 electrically connected via the wiring 46.
  • the first lead wiring, the first terminal portion, the second lead wiring 46 and the second terminal portion 47 are provided on the one surface side of the substrate 10.
  • an insulating film 60 that electrically insulates the second lead wiring 46 from the functional layer 30, the first electrode 20, and the first lead wiring is provided on the one surface side of the substrate 10. .
  • the insulating film 60 is formed across the one surface of the substrate 10, the side surface of the first electrode 20, the side surface of the functional layer 30, and the outer peripheral portion of the surface of the functional layer 30 on the second electrode 40 side.
  • the organic electroluminescence element has a resistivity (electrical resistivity) of each of the first electrode 20 and the second electrode 40 that is higher than a resistivity (electrical resistivity) of a transparent conductive oxide (TCO). It is low.
  • the transparent conductive oxide include ITO, AZO, GZO, and IZO.
  • the resistivity of such a transparent conductive oxide is not particularly limited, but is exemplified as 1 ⁇ 10 ⁇ 4 to 1 ⁇ 10 ⁇ 3 ⁇ ⁇ cm.
  • the functional layer 30 is the outermost layer on the second electrode 40 side with respect to the light emitting layer 32, and the second carrier 40 side of the first carrier injected from the first electrode 20 into the functional layer 30.
  • the first carrier blocking layer 33 that suppresses leakage to the substrate is included.
  • the second electrode 40 is formed with an opening 41 for extracting light from the functional layer 30. That is, in the organic electroluminescence element, the second electrode 40 has an opening 41 (see FIGS. 2 and 3) for extracting light from the functional layer 30.
  • the organic electroluminescence element is provided with a conductive layer 50 which is in contact with the second electrode 40 and the functional layer 30 (first carrier blocking layer 33) and has a second carrier injection function and light transmittance. Thereby, the organic electroluminescence element can extract light from the second electrode 40 side.
  • the organic electroluminescence element of the present embodiment can be used as a top emission type organic electroluminescence element.
  • the conductive layer 50 covers the second electrode 40.
  • the conductive layer 50 of the present embodiment covers the second electrode 40 and the first carrier blocking layer 33.
  • the first carrier blocking layer 33 is provided with a recess 38 in the projection area of the opening 41.
  • the organic electroluminescence element has a cover substrate 70 that is disposed opposite to the one surface side of the substrate 10 and has translucency, and a frame shape (this embodiment) interposed between the peripheral portion of the substrate 10 and the peripheral portion of the cover substrate 70.
  • a frame portion 80 having a rectangular frame shape.
  • the organic electroluminescence element includes the element portion 1 including the first electrode 20, the functional layer 30, the second electrode 40, the conductive layer 50, and the like in a space surrounded by the substrate 10, the cover substrate 70, and the frame portion 80.
  • a sealing portion 90 made of a light-transmitting material (for example, a light-transmitting resin) to be sealed.
  • the substrate 10 has a rectangular shape in plan view.
  • the planar view shape of the substrate 10 is not limited to a rectangular shape, and may be, for example, a polygonal shape or a circular shape other than the rectangular shape.
  • the glass substrate is used as the substrate 10, but is not limited thereto, and for example, a plastic plate or a metal plate may be used.
  • a material for the glass substrate for example, soda lime glass, non-alkali glass, or the like can be employed.
  • a material of the plastic plate for example, polyethylene terephthalate, polyethylene naphthalate, polyethersulfone, polycarbonate, or the like can be employed.
  • a material of the metal plate for example, aluminum, copper, stainless steel, or the like can be employed.
  • the substrate 10 may be rigid or flexible.
  • the unevenness on the one surface of the substrate 10 may cause a leak current of the organic electroluminescence element (may cause deterioration of the organic electroluminescence element). .
  • the arithmetic average roughness Ra specified in JIS B 0601-2001 is preferably 10 nm or less, and preferably several nm or less. More preferable.
  • a plastic plate is used as the substrate 10, it is possible to obtain at low cost an arithmetic average roughness Ra of one surface or less of the above-mentioned surface without particularly high precision polishing. It is.
  • the glass substrate is used as the cover substrate 70, but is not limited thereto, and for example, a plastic plate or the like may be used.
  • a material for the glass substrate for example, soda lime glass, non-alkali glass, or the like can be employed.
  • a material of the plastic plate for example, polyethylene terephthalate, polyethylene naphthalate, polyethersulfone, polycarbonate, or the like can be employed.
  • a flat substrate is used as the cover substrate 70, but is not limited to this, and a substrate in which a storage recess for storing the above-described element unit 1 is formed on the surface facing the substrate 10 is used.
  • the peripheral portion of the storage recess on the facing surface may be joined to the substrate 10 side over the entire circumference.
  • a box-shaped cover substrate 70 having an open surface may be used, the element unit 1 may be accommodated inside the cover substrate 70, and the peripheral edge of the opening of the cover substrate 70 may be bonded to the substrate 10 side.
  • the frame part 80 which is a separate member.
  • a light extraction structure (not shown) that suppresses reflection of light emitted from the light emitting layer 32 on the outer surface.
  • Examples of such a light extraction structure part include an uneven structure part having a two-dimensional periodic structure.
  • the period of such a two-dimensional periodic structure is such that when the wavelength of light emitted from the light emitting layer 32 is in the range of 300 to 800 nm, for example, the wavelength in the medium is ⁇ (the wavelength in vacuum is divided by the refractive index of the medium). Value), it is desirable to set appropriately within the range of 1/4 to 10 times the wavelength ⁇ .
  • Such an uneven structure portion is formed in advance on the outer surface side of the cover substrate 70 by, for example, an imprint method such as a thermal imprint method (thermal nanoimprint method) or an optical imprint method (photo nanoimprint method). It is possible. Further, depending on the material of the cover substrate 70, the cover substrate 70 may be formed by injection molding, and the uneven structure portion may be directly formed on the cover substrate 70 by using an appropriate mold at the time of injection molding. Further, the concavo-convex structure portion can also be configured by a member different from the cover substrate 70, for example, a prism sheet (for example, a light diffusion film such as Lightup (registered trademark) GM3 manufactured by Kimoto Co., Ltd.). Can be configured.
  • an imprint method such as a thermal imprint method (thermal nanoimprint method) or an optical imprint method (photo nanoimprint method). It is possible.
  • the cover substrate 70 may be formed by injection molding, and the uneven structure portion may be directly formed on the cover substrate 70 by using an appropriate mold at the
  • the organic electroluminescence element of this embodiment by providing the above-described light extraction structure portion, it is possible to reduce the reflection loss of the light emitted from the light emitting layer 32 and reaching the outer surface side of the cover substrate 70, and to improve the light extraction efficiency. Can be achieved.
  • the first bonding material is not limited thereto, and for example, an acrylic resin may be used.
  • the epoxy resin or acrylic resin used as the first bonding material may be, for example, an ultraviolet curable type or a thermosetting type.
  • you may use what made the epoxy resin contain a filler (for example, a silica, an alumina, etc.) as a 1st joining material.
  • the frame portion 80 is airtightly bonded to the one surface side of the substrate 10 over the entire periphery of the surface of the frame portion 80 facing the substrate 10 side.
  • the frame portion 80 is airtightly bonded to the cover substrate 70 over the entire circumference of the surface of the frame portion 80 facing the cover substrate 70.
  • polyimide As a material of the insulating film 60, for example, polyimide, novolac resin, epoxy resin, or the like can be used.
  • the translucent material that is a material of the sealing portion 90 for example, a translucent resin such as an epoxy resin or a silicone resin can be used, but a material having a small refractive index difference from the functional layer 30 is more preferable.
  • the light transmissive material may be a light transmissive resin mixed with a light diffusing material made of glass or the like.
  • an organic / inorganic hybrid material in which an organic component and an inorganic component are mixed and bonded at the nm level or molecular level may be used.
  • the first electrode 20 constitutes a cathode and the second electrode 40 constitutes an anode.
  • the functional layer 30 includes a first carrier injection layer 31, a light emitting layer 32, and a first carrier blocking layer 33 in order from the first electrode 20 side.
  • a first carrier injection layer 31 is formed in contact with the first electrode 20.
  • a light emitting layer 32 is formed in contact with the first carrier injection layer 31.
  • a first carrier blocking layer 33 is formed in contact with the light emitting layer 32.
  • the second electrode 40 is formed in contact with the first carrier blocking layer 33.
  • the first carrier injected from the first electrode 20 into the functional layer 30 is an electron
  • the second carrier injected from the second electrode 40 into the functional layer 30 is a hole
  • the first carrier injection layer 31 on the first electrode 20 side in the light emitting layer 32 is an electron injection layer.
  • the 1st carrier blocking layer 33 is an interlayer and is comprised with an electronic blocking layer.
  • a hole injection layer is adopted as the first carrier injection layer 31 and the first carrier blocking layer 33 is formed as an interface. What is necessary is just to comprise a layer by a hole blocking layer.
  • the structure of the above-described functional layer 30 is not limited to the above-described example.
  • a first carrier transport layer here, an electron transport layer
  • a second carrier transport layer here, a hole transport layer
  • the functional layer 30 only needs to include the light emitting layer 32 and the first carrier blocking layer 33 (that is, the functional layer 30 may be only the light emitting layer 32 and the first carrier blocking layer 33).
  • the first carrier injection layer 31, the first carrier transport layer, the second carrier transport layer, and the like other than 32 and the first carrier blocking layer 33 may be provided as appropriate.
  • the light emitting layer 32 may have a single layer structure or a multilayer structure.
  • the emission layer may be doped with three types of dopant dyes of red, green, and blue, or the blue hole-transporting emission layer and the green electron-transporting property.
  • a laminated structure of a light emitting layer and a red electron transporting light emitting layer may be adopted, or a laminated structure of a blue electron transporting light emitting layer, a green electron transporting light emitting layer and a red electron transporting light emitting layer may be adopted. Good.
  • Examples of the material of the light emitting layer 32 include polyparaphenylene vinylene derivatives, polythiophene derivatives, polyparaphenylene derivatives, polysilane derivatives, polyacetylene derivatives, and the like, polyfluorene derivatives, polyvinylcarbazole derivatives, dye bodies, and metal complex light emitting materials.
  • the light emitting layer 32 is preferably formed by a wet process such as a coating method (for example, spin coating method, spray coating method, die coating method, gravure printing method, screen printing method, etc.).
  • a coating method for example, spin coating method, spray coating method, die coating method, gravure printing method, screen printing method, etc.
  • the method for forming the light emitting layer 32 is not limited to the coating method, and the light emitting layer 32 may be formed by a dry process such as a vacuum deposition method or a transfer method.
  • the material for the electron injection layer examples include metal fluorides such as lithium fluoride and magnesium fluoride, metal halides such as sodium chloride and magnesium chloride, titanium, zinc, magnesium, calcium, An oxide such as barium or strontium can be used.
  • the electron injection layer can be formed by a vacuum deposition method.
  • an organic semiconductor material mixed with a dopant (such as an alkali metal) that promotes electron injection can be used.
  • the electron injection layer can be formed by a coating method.
  • the material for the electron transport layer can be selected from the group of compounds having electron transport properties.
  • this type of compound include metal complexes known as electron transport materials such as Alq 3 and compounds having a heterocycle such as phenanthroline derivatives, pyridine derivatives, tetrazine derivatives, oxadiazole derivatives, etc. Instead, any generally known electron transport material can be used.
  • a low molecular material or a polymer material having a low LUMO (Lowest Unoccupied Molecular Molecular) level can be used.
  • examples thereof include polymers containing aromatic amines such as polyvinyl carbazole (PVCz), polyarylene derivatives such as polypyridine and polyaniline, and polyarylene derivatives having aromatic amines in the main chain, but are not limited thereto.
  • Examples of the material for the hole transport layer include 4,4′-bis [N- (naphthyl) -N-phenyl-amino] biphenyl ( ⁇ -NPD) and N, N′-bis (3-methylphenyl).
  • TPD -(1,1'-biphenyl) -4,4'-diamine
  • 2-TNATA 4,4 ', 4 "-tris (N- (3-methylphenyl) N-phenylamino) triphenylamine (MTDATA), 4,4′-N, N′-dicarbazole biphenyl (CBP), spiro-NPD, spiro-TPD, spiro-TAD, TNB, and the like can be used.
  • the first carrier blocking layer 33 is carrier blocking as a first carrier barrier (here, an electron barrier) that suppresses leakage of first carriers (here, electrons) from the light emitting layer 32 side to the second electrode 40 side. It has a function (here, an electronic blocking function).
  • the first carrier blocking layer 33 preferably has a function of transporting second carriers (here, holes) to the light emitting layer 32, a function of suppressing quenching of the excited state of the light emitting layer 32, and the like. .
  • the first carrier blocking layer 33 In the organic electroluminescence element, by providing the first carrier blocking layer 33, it is possible to improve the light emission efficiency and extend the life.
  • a material of the first carrier blocking layer 33 for example, polyarylamine or a derivative thereof, polyfluorene or a derivative thereof, polyvinylcarbazole or a derivative thereof, a triphenyldiamine derivative, or the like can be used.
  • Such a first carrier blocking layer 33 can be formed by a wet process such as a coating method (spin coating method, spray coating method, die coating method, gravure printing method, etc.) or a vacuum deposition method.
  • the first carrier blocking layer 33 has the recess 38 in the projection region of the opening 41.
  • the thickness of the projection region of the opening 41 is thinner than the thickness of the projection region of the second electrode 40.
  • the depth dimension of the recess 38 is smaller than the thickness dimension of the projection region of the second electrode 40 in the first carrier blocking layer 33 (that is, no through hole is formed in the first carrier blocking layer 33 by the recess 38. ) Is preferable, but the numerical values are not particularly limited.
  • Such a concave portion 38 can be formed by, for example, twice coating by a screen printing method, a gravure printing method, a spray coating method, or the like.
  • the cathode is an electrode for injecting electrons as the first charge into the functional layer 30.
  • the first electrode 20 injects electrons, which are first charges, into the functional layer 30 as first carriers.
  • the cathode material it is preferable to use an electrode material made of a metal, an alloy, an electrically conductive compound and a mixture thereof having a small work function, so that the difference from the LUMO (Lowest Unoccupied Molecular Orbital) level does not become too large. It is preferable to use a material having a work function of 1.9 eV or more and 5 eV or less.
  • the electrode material for the cathode examples include aluminum, silver, magnesium, gold, copper, chromium, molybdenum, palladium, tin, and alloys of these with other metals, such as magnesium-silver mixture, magnesium-indium mixture, aluminum -Lithium alloys can be mentioned as examples. Also, a metal, a metal oxide, etc., and a mixture of these and other metals, for example, an ultrathin film made of aluminum oxide (here, a thin film of 1 nm or less capable of flowing electrons by tunnel injection) and aluminum. A laminated film with a thin film can also be used.
  • the cathode material is preferably a metal having a high reflectance with respect to light emitted from the light emitting layer 32 and a low resistivity, and preferably aluminum or silver.
  • the material of the anode that is the first electrode 20 is: It is preferable to use a metal having a large work function, and it is preferable to use a metal having a work function of 4 eV or more and 6 eV or less so that the difference from the HOMO (Highest Occupied Molecular Orbital) level does not become too large.
  • HOMO Highest Occupied Molecular Orbital
  • the second electrode 40 is made of an electrode containing metal powder and an organic binder.
  • this type of metal for example, silver, gold, copper or the like can be employed.
  • the organic electroluminescence element can reduce the resistivity and sheet resistance of the second electrode 40 as compared with the case where the second electrode 40 is a thin film formed of a transparent conductive oxide. It is possible to reduce luminance unevenness by reducing the resistance of the two electrodes 40.
  • the conductive material of the second electrode 40 an alloy, carbon black, or the like can be used instead of a metal.
  • the second electrode 40 can be formed, for example, by printing a paste (printing ink) in which an organic binder and an organic solvent are mixed in a metal powder by, for example, a screen printing method or a gravure printing method.
  • the organic binder include acrylic resin, polyethylene, polypropylene, polyethylene terephthalate, polymethyl methacrylate, polystyrene, polyether sulfone, polyarylate, polycarbonate resin, polyurethane, polyacrylonitrile, polyvinyl acetal, polyamide, polyimide, and diacryl phthalate resin.
  • Cellulose resins Polyvinyl chloride, polyvinylidene chloride, polyvinyl acetate, other thermoplastic resins, and copolymers of two or more monomers constituting these resins, but are not limited thereto. It is not something.
  • the first electrode 20 has a thickness of 80 to 200 nm
  • the first carrier injection layer 31 has a thickness of 5 to 50 nm
  • the light emitting layer 32 has a thickness of 60 to 100 nm
  • the film thickness of the part which overlaps with the 2nd electrode 40 in 1 carrier blocking layer 33 is each set to 40 nm, these numerical values are examples and are not specifically limited.
  • the second electrode 40 is formed in a lattice shape (mesh shape) and has a plurality of openings (36 in the example shown in FIG. 2). That is, the second electrode 40 of the present embodiment includes a plurality of thin wire portions 44 extending in the first direction (vertical direction in FIG. 2), and a second direction (horizontal direction in FIG. 2) intersecting the first direction. And a plurality of thin line portions 44 extending in the direction. A space surrounded by the plurality of thin line portions 44 is an opening 41 for light extraction.
  • each opening 41 has a square shape.
  • the second electrode 40 shown in FIG. 2 is formed in a square lattice shape.
  • the second electrode 40 has, for example, a line width L1 (see FIG. 3) of 1 ⁇ m to 100 ⁇ m and a height H1 (see FIG. 3) regarding the dimensions of the square-lattice electrode pattern 40a constituting the second electrode 40. 50 nm to 100 ⁇ m and the pitch P 1 (see FIG. 3) may be set to 100 ⁇ m to 2000 ⁇ m. However, the numerical ranges of the line width L1, the height H1, and the pitch P1 of the electrode pattern 40a of the second electrode 40 are not particularly limited, and may be set as appropriate based on the planar size of the element portion 1.
  • the line width L1 of the electrode pattern 40a of the second electrode 40 is preferably narrow from the viewpoint of the utilization efficiency of the light emitted from the light emitting layer 32, and luminance unevenness is reduced by reducing the resistance of the second electrode 40. Therefore, it is preferable that the width is appropriately set based on the planar size of the organic electroluminescence element.
  • the height H1 of the second electrode 40 from the viewpoint of lowering the resistance of the second electrode 40, the use efficiency of the material of the second electrode 40 when the second electrode 40 is formed by a coating method such as a screen printing method. From the viewpoint of (material use efficiency), the viewpoint of the emission angle of light emitted from the functional layer 30, and the like, 100 nm or more and 10 ⁇ m or less are more preferable.
  • each opening 41 in the second electrode 40 has an opening shape in which the opening area gradually increases as the distance from the functional layer 30 increases, as shown in FIGS. 1 and 3. is there. That is, the thin wire portion 44 of the second electrode 40 is formed in a substantially trapezoidal shape in cross section, and thus, the opening shape of the opening portion 41 gradually increases as the distance from the functional layer 30 increases.
  • the organic electroluminescence element can increase the spread angle of the light emitted from the functional layer 30, and can further reduce the luminance unevenness.
  • the organic electroluminescence element can reduce reflection loss and absorption loss at the second electrode 40, and can further improve the external quantum efficiency.
  • each opening 41 is not limited to a square shape, and may be, for example, a rectangular shape, a regular triangle shape, or a regular hexagonal shape.
  • the second electrode 40 has a triangular lattice shape when each of the openings 41 has a regular triangular shape, and has a hexagonal lattice shape when each of the openings 41 has a regular hexagonal shape. .
  • the second electrode 40 is not limited to a lattice shape, and may be, for example, a comb shape or may be configured by two comb-shaped electrode patterns.
  • the number of the openings 41 is not particularly limited, and the number of the second electrodes 40 is not limited to a plurality, and may be one. For example, when the second electrode 40 has a comb shape or is configured by two comb-shaped electrode patterns, the number of openings 41 can be one.
  • the second electrode 40 may have a planar shape as shown in FIG. 4, for example. That is, in this example, the second electrode 40 has a constant line width of the linear thin line portion 44 in the electrode pattern 40a in plan view. As the center of the second electrode 40 is approached, the interval between the fine line portions 44 and 44 adjacent in the vertical direction and the interval between the fine line portions 44 and 44 adjacent in the horizontal direction are gradually reduced. That is, the second electrode 40 has a shape in which the opening area of the opening 41 becomes smaller as the distance from the peripheral part approaches the center part. In the organic electroluminescence element, the second electrode 40 has a planar shape as shown in FIG. 4, so that the second terminal portion 47 in the second electrode 40 is compared with the planar shape as shown in FIG. 2.
  • the organic electroluminescence element has the first terminal portion of the functional layer 30 as compared with the case where the planar shape as shown in FIG. 2 is obtained by making the planar shape of the second electrode 40 as shown in FIG.
  • the second electrode 40 may have a planar shape as shown in FIG. 5, for example.
  • the second electrode 40 has four first fine wire portions 42 that form the outer frame on the outermost periphery of the second electrode 40, and a first direction (FIG. 5) inside the outer frame. And a plurality of thin wire portions (third thin wire portions) extending in a second direction (the left-right direction in FIG. 5) intersecting the first direction inside the outer frame. 44).
  • the second electrode 40 has a line width of the first thin line portion 42 and a line width of one second thin line portion 43 at the center in the left-right direction in FIG. It is wider than the line width of the third thin line portion 44 between the two thin line portions 43.
  • the second electrode 40 has a planar shape as shown in FIG. 5, so that the second terminal portion 47 (see FIG. 1) of the second electrode 40 is compared with the planar shape as shown in FIG. 2. It is possible to improve the light emission efficiency in the central part far from the peripheral part, and it is possible to improve the external quantum efficiency.
  • the second electrode 40 has a planar shape as shown in FIG. 5, the height of the first thin wire portion 42 and the second thin wire portion 43 having a relatively wide line width is set higher than the height of the third thin wire portion 44. By increasing the height, the resistance of each of the first thin wire portion 42 and the second thin wire portion 43 can be further reduced.
  • the conductive layer 50 has a second carrier injection function (here, a hole injection function) and light transmittance.
  • a conductive layer 50 can be formed of, for example, a conductive nanostructure and a conductive polymer.
  • the conductive layer 50 is formed from, for example, a transparent conductive film including a conductive nanostructure and a transparent medium.
  • the conductive layer 50 having a hole injection function can be formed of a composite film in which a conductive nanostructure is mixed with the material of the hole injection layer.
  • the conductivity of the conductive layer 50 is lower than that of the second electrode 40.
  • the conductivity of the conductive layer 50 is higher than that of the second carrier injection layer 34.
  • the conductive layer 50 functions as a second carrier injection path from the second electrode 40 to the functional layer 30.
  • the second carrier is a hole when the second electrode 40 is an anode, and an electron when the second electrode 40 is a cathode.
  • the conductive layer 50 is not present, and the part immediately below the second electrode 40 is a part of the functional layer 30, and the opening 41 is buried by a part of the electrically insulating sealing part 90 instead of the conductive layer 50. In this case, it is assumed that the injection of the second carrier from the second electrode 40 to the functional layer 30 is performed only through the interface between the second electrode 40 and the functional layer 30.
  • the injection of the second carrier from the second electrode 40 to the functional layer 30 is performed by the first path passing through the interface between the second electrode 40 and the functional layer 30. This is performed both in the interface between the second electrode 40 and the conductive layer 50 and in the second path passing through the interface between the conductive layer 50 and the functional layer 30.
  • the thickness of the projection region of the opening 41 is the second electrode 40. It is thinner than the thickness of the projection area.
  • the organic electroluminescence element has higher conductivity and higher injectability of the second carrier with respect to the conductive layer 50 than the first carrier blocking layer 33.
  • the carrier injection through the second path has priority over the carrier injection through the first path.
  • the proportion of light blocked by the second electrode 40 in the light emitted from the light emitting layer 32 is reduced, so that the external quantum efficiency can be improved.
  • the second carrier moves from the second electrode 40 to the in-plane direction of the conductive layer 50 (in FIG. 1) when moving toward the light emitting layer 32. Left and right and front and rear direction). Therefore, in-plane variation of the current flowing through the light emitting layer 32 can be reduced.
  • the lower the resistivity of the conductive layer 50 the better the electrical conductivity from the second electrode 40 in the lateral direction (left and right and front and rear in FIG. 1), and the in-plane variation of the current flowing through the light emitting layer 32 is reduced. It is possible to reduce luminance unevenness.
  • conductive nanostructure conductive nanoparticles, conductive nanowires, or the like can be used.
  • the particle diameter of the conductive nanoparticles is preferably 1 to 100 nm.
  • the diameter of the conductive nanowire is preferably 1 to 100 nm.
  • the material for the conductive nanostructure for example, silver, gold, ITO, IZO and the like can be employed.
  • the binder that is a transparent medium include acrylic resin, polyethylene, polypropylene, polyethylene terephthalate, polymethyl methacrylate, polystyrene, polyethersulfone, polyarylate, polycarbonate resin, polyurethane, polyacrylonitrile, polyvinyl acetal, polyamide, polyimide, diethylene.
  • a conductive polymer such as polythiophene, polyaniline, polypyrrole, polyphenylene, polyphenylene vinylene, polyacetylene, polycarbazole as the binder. These may be used alone or in combination.
  • the conductive layer 50 can further improve conductivity by adopting a conductive polymer as a binder.
  • a binder in order to improve electroconductivity, you may employ
  • examples of the material for the hole injection layer include organic materials including thiophene, triphenylmethane, hydrazoline, amyramine, hydrazone, stilbene, triphenylamine, and the like.
  • organic materials including thiophene, triphenylmethane, hydrazoline, amyramine, hydrazone, stilbene, triphenylamine, and the like.
  • polyvinyl carbazole, polyethylenedioxythiophene: polystyrene sulfonate (PEDOT: PSS), aromatic amine derivatives such as TPD, etc. these materials may be used alone, or two or more kinds of materials. May be used in combination.
  • the conductive layer 50 described above can be formed by a wet process such as a coating method (spray coating method, die coating method, gravure printing method, screen printing method, etc.).
  • a coating method spray coating method, die coating method, gravure printing method, screen printing method, etc.
  • the conductive layer 50 may be configured by a stacked structure of a hole injection layer formed on the first carrier blocking layer 33 and a light-transmitting conductive layer formed on the hole injection layer. Good.
  • the thickness of the hole injection layer is preferably smaller than the depth dimension of the recess 38.
  • the resistivity of each of the first electrode 20 and the second electrode 40 is lower than the resistivity of the transparent conductive oxide, An opening 41 for extracting light from the functional layer 30 is formed.
  • the functional layer 30 is the outermost layer on the second electrode 40 side with respect to the light emitting layer 32, and the first carrier injected from the first electrode 20 into the functional layer 30 is the first layer.
  • the 1st carrier blocking layer 33 which suppresses the leak to the 2 electrode 40 side is included.
  • the organic electroluminescent element of this embodiment is provided with the conductive layer 50 that is in contact with the second electrode 40 and the functional layer 30 (first carrier blocking layer 33) and has the second carrier injection function and light transmittance. It has been.
  • the conductive layer 50 covers the second electrode 40, and the first carrier blocking layer 33 is provided with a recess 38 in the projection region of the opening 41. Therefore, in the organic electroluminescence element of this embodiment, it is possible to reduce luminance unevenness and to improve external quantum efficiency.
  • the organic electroluminescence element of the present embodiment since the conductive layer 50 covers the second electrode 40, the second carrier 40 can be more injected from the second electrode 40 to the conductive layer 50. It becomes possible to improve.
  • the height (first height) from the light emitting layer 32 to the surface of the conductive layer 50 in the recess 38 is the height (second height) from the light emitting layer 32 to the tip of the second electrode 40.
  • the height is lower than (height).
  • the first height is the thickness between the inner bottom surface of the recess 38 and the light emitting layer 32 in the first carrier blocking layer 33 and the conductive layer 50 on the inner bottom surface of the recess 38.
  • the second height is a total value of the film thickness of the projection region of the second electrode 40 in the first carrier blocking layer 50 and the height H1 of the second electrode 40.
  • the organic electroluminescence element has the first height lower than the second height, so that the optical loss in the conductive layer 50 can be reduced, and the external quantum efficiency can be improved. It becomes possible.
  • the magnitude relationship between the film thickness of the conductive layer 50 and the depth dimension of the recess 38 is not particularly limited.
  • the organic electroluminescence element of this embodiment is substantially the same as that of Embodiment 1, and only the shape of the recess 38 is different as shown in FIG.
  • symbol is attached
  • the concave portion 38 is formed in a shape in which the distance from the projection region of the second electrode 40 to the inner side surface 38a close to the projection region increases as the distance from the second electrode 40 increases in the thickness direction of the first carrier blocking layer 33. .
  • the concave portion 38 is formed in a rectangular cross section, whereas in the example shown in FIG. 6, the concave portion 38 is formed in an inverted trapezoidal shape.
  • the projection region of the second electrode 40 is closer to the projection region. It is formed in a shape that increases the distance to the inner side surface 38a.
  • the thickness of the first carrier blocking layer 33 in the projection region of the opening 41 becomes thinner as the distance from the second electrode 40 increases.
  • the film thickness is gradually increased in the region where the distance from the projection region of the second electrode 40 is changed with respect to the projection region of the opening 41 in the first carrier blocking layer 33.
  • the first carrier blocking layer 33 is more likely to pass the second carrier as it is closer to the second electrode 40, but the second carrier is less likely to pass as the film thickness is larger, so the opening 41 in the first carrier blocking layer 33. It is possible to improve the uniformity of the carrier injection amount into the projection area, and to further reduce the luminance unevenness.
  • the first carrier blocking layer 33 is shown to have a constant thickness at a location that is a predetermined distance or more away from the second electrode 40 in the width direction of the second electrode 40 (left-right direction in FIG. 6). Yes.
  • the first carrier blocking layer 33 may have a shape in which the thickness gradually decreases with the distance from the second electrode 40.
  • the shape of the inner side surface 38a of the concave portion 38 is not limited to the planar shape as shown in FIG. 6, and may be a curved surface shape.
  • the cross-sectional shape of the recess 38 may be a kamaboko shape.
  • the organic electroluminescence element described in the first and second embodiments can be suitably used as an organic electroluminescence element for illumination, for example, but is not limited to illumination and can be used for other purposes.
  • each figure demonstrated in Embodiment 1, 2 is typical, and the ratio of each magnitude

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Abstract

In order to provide an organic electroluminescence element capable of reducing uneven brightness and capable of improving external quantum efficiency, this organic electroluminescence element is provided with a substrate (10), a first electrode (20), second electrodes (40), a functional layer (30) that exists between the first electrode (20) and the second electrodes (40) and includes a light-emitting layer (32), and a conductive layer (50). The resistivities of the first electrode (20) and the second electrodes (40) are less than the resistivity of a transparent conductive oxide. Openings for extracting light are formed on the second electrodes (40). The functional layer (30) includes, as the outermost layer on the second electrode (40) side, a first carrier-blocking layer (33) for suppressing leaks of a first carrier, which is injected in the functional layer (30) from the first electrode (20), to the second electrode (40) side. The conductive layer (50) is in contact with the second electrodes (40) and the functional layer (30), and has a second carrier injection function and optical transparency. The first carrier blocking layer (33) is provided with recesses (38) in a projection region of the openings.

Description

有機エレクトロルミネッセンス素子Organic electroluminescence device

 本発明は、有機エレクトロルミネッセンス素子に関するものである。 The present invention relates to an organic electroluminescence element.

 従来から、図7に示す構成の有機エレクトロルミネッセンス素子が提案されている(たとえば、日本国特許公開2006-331694号公報;特許文献1参照)。この有機エレクトロルミネッセンス素子は、一方の電極(陰極)101が基板104の表面に積層され、電極101の表面上に電子注入・輸送層105を介して発光層103が積層され、発光層103上に、ホール注入・輸送層106を介して他方の電極(陽極)102が積層されている。また、この有機エレクトロルミネッセンス素子は、基板104の上記表面側に封止部材107を備えている。したがって、この有機エレクトロルミネッセンス素子では、発光層103で発光した光が、光透過性電極として形成される電極102、透明体で形成される封止部材107を通して放射されるようになっている。 Conventionally, an organic electroluminescence element having the structure shown in FIG. 7 has been proposed (for example, Japanese Patent Publication No. 2006-331694; see Patent Document 1). In this organic electroluminescence element, one electrode (cathode) 101 is laminated on the surface of the substrate 104, a light emitting layer 103 is laminated on the surface of the electrode 101 via an electron injection / transport layer 105, and on the light emitting layer 103. The other electrode (anode) 102 is laminated via the hole injection / transport layer 106. In addition, the organic electroluminescence element includes a sealing member 107 on the surface side of the substrate 104. Therefore, in this organic electroluminescence element, light emitted from the light emitting layer 103 is radiated through the electrode 102 formed as a light transmissive electrode and the sealing member 107 formed of a transparent body.

 反射性の電極101の材料としては、例えば、Al、Zr、Ti、Y、Sc、Ag、Inなどが挙げられている。また、光透過性電極である電極102の材料としては、例えば、インジウム-錫酸化物(ITO)、インジウム-亜鉛酸化物(IZO)などが挙げられている。 Examples of the material of the reflective electrode 101 include Al, Zr, Ti, Y, Sc, Ag, and In. Examples of the material of the electrode 102 which is a light transmissive electrode include indium-tin oxide (ITO) and indium-zinc oxide (IZO).

 ところで、有機エレクトロルミネッセンス素子を高輝度で点灯させるためには、より大きな電流を流す必要がある。しかしながら、有機エレクトロルミネッセンス素子は、一般的に、ITO膜からなる陽極のシート抵抗が、金属膜、合金膜、金属化合物膜などからなる陰極のシート抵抗に比べて高いため、陽極での電位勾配が大きくなって、輝度の面内ばらつきが大きくなってしまう。 By the way, in order to light the organic electroluminescence element with high brightness, it is necessary to pass a larger current. However, since the organic electroluminescence element generally has a higher sheet resistance of an anode made of an ITO film than that of a cathode made of a metal film, an alloy film, a metal compound film, etc., the potential gradient at the anode is high. As a result, the in-plane variation in luminance increases.

 また、従来から、スパッタ法により形成されるITO膜からなる電極を備えた構成の問題点を解決するエレクトロルミネセンス・ランプとして、ITO膜からなる電極を用いずに構成されたエレクトロルミネセンス・ランプが提案されている(たとえば、日本国特許公表2002-502540号公報参照;以下、特許文献2と呼ぶ)。特許文献2には、例えば、図8に示すように、第1の導電層220、エレクトロルミネセンス物質230、第2の導電層240および基板245を備え、第1の導電層220が、矩形の開口250を有する矩形格子電極により構成されてなるエレクトロルミネセンス・ランプ210が提案されている。 In addition, as an electroluminescence lamp that solves the problems of the conventional structure including an electrode made of an ITO film formed by sputtering, an electroluminescence lamp constructed without using an electrode made of an ITO film Has been proposed (see, for example, Japanese Patent Publication No. 2002-502540; hereinafter referred to as Patent Document 2). For example, as shown in FIG. 8, Patent Document 2 includes a first conductive layer 220, an electroluminescent material 230, a second conductive layer 240, and a substrate 245, and the first conductive layer 220 has a rectangular shape. An electroluminescent lamp 210 composed of a rectangular grid electrode having openings 250 has been proposed.

 ここで、特許文献2には、第1の導電層220および第2の導電層240を、銀インク、炭素インクなどの導電性インクで形成することが好ましい旨が記載されている。また、特許文献2には、第1の導電層220、エレクトロルミネセンス物質230、第2の導電層240を、スクリーン印刷法やオフセット印刷法などにより形成することが記載されている。 Here, Patent Document 2 describes that it is preferable to form the first conductive layer 220 and the second conductive layer 240 with conductive ink such as silver ink or carbon ink. Patent Document 2 describes that the first conductive layer 220, the electroluminescent material 230, and the second conductive layer 240 are formed by a screen printing method, an offset printing method, or the like.

 なお、特許文献2には、均一な明るさのエレクトロルミネセンス・ランプ210が必要な場合は、ランプ表面にわたって開口250の密度を略一定とすることが記載されている。 Note that Patent Document 2 describes that when the electroluminescence lamp 210 having uniform brightness is required, the density of the openings 250 is made substantially constant over the surface of the lamp.

 ところで、図8に示した構成のエレクトロルミネセンス・ランプ210では、第1の導電層220が開口250を有しているので、第1の導電層220からエレクトロルミネセンス物質230における第1の導電層220直下の部位のみへキャリアが注入される。このため、エレクトロルミネセンス・ランプ210では、エレクトロルミネセンス物質230において開口250に対応する部位での発光効率が低下し、外部量子効率が低下してしまう懸念がある。 By the way, in the electroluminescent lamp 210 having the configuration shown in FIG. 8, the first conductive layer 220 has the opening 250, and thus the first conductive layer 220 in the electroluminescent material 230 has the first conductive layer 220. Carriers are injected only into the portion immediately below the layer 220. For this reason, in the electroluminescence lamp 210, there is a concern that the light emission efficiency at the portion corresponding to the opening 250 in the electroluminescence material 230 is lowered, and the external quantum efficiency is lowered.

 本発明は上記事由に鑑みて為されたものであり、その目的は、輝度むらの低減を図ることが可能で且つ外部量子効率の向上を図ることが可能な有機エレクトロルミネッセンス素子を提供することにある。 The present invention has been made in view of the above reasons, and an object of the present invention is to provide an organic electroluminescence device capable of reducing luminance unevenness and improving external quantum efficiency. is there.

 本発明の有機エレクトロルミネッセンス素子は、基板と、前記基板の一表面側に設けられた第1電極と、前記基板の前記一表面側で前記第1電極に対向した第2電極と、前記第1電極と前記第2電極との間にあり発光層を含む機能層とを備えた有機エレクトロルミネッセンス素子であって、前記第1電極および前記第2電極それぞれの抵抗率が、透明導電性酸化物の抵抗率よりも低く、前記機能層が、前記発光層よりも前記第2電極側にある最表層として、前記第1電極から前記機能層に注入される第1キャリアの前記第2電極側への漏れを抑制する第1キャリアブロッキング層を含み、前記第2電極には、前記機能層からの光取出し用の開口部が形成され、前記開口部には、前記第2電極と前記機能層とに接し且つ第2キャリア注入機能と光透過性とを有する導電性層が設けられ、前記導電性層が、前記第2電極を覆い、前記第1キャリアブロッキング層は、前記開口部の投影領域に凹部が設けられてなることを特徴とする。 The organic electroluminescence device of the present invention includes a substrate, a first electrode provided on one surface side of the substrate, a second electrode facing the first electrode on the one surface side of the substrate, and the first electrode An organic electroluminescence element comprising a functional layer including a light emitting layer between an electrode and the second electrode, wherein the resistivity of each of the first electrode and the second electrode is a transparent conductive oxide Lower than resistivity, the functional layer is the outermost layer on the second electrode side than the light emitting layer, and the first carrier injected from the first electrode to the functional layer is directed to the second electrode side. A first carrier blocking layer that suppresses leakage; and the second electrode has an opening for extracting light from the functional layer, and the opening includes the second electrode and the functional layer. Second carrier injection function A conductive layer having light transparency is provided, the conductive layer covers the second electrode, and the first carrier blocking layer is provided with a recess in a projection region of the opening. And

 この有機エレクトロルミネッセンス素子において、前記凹部は、前記第1キャリアブロッキング層の厚み方向において前記第2電極から離れるにつれて、前記第2電極の投影領域から前記投影領域に近い内側面までの距離が長くなる形状に形成されてなることが好ましい。 In this organic electroluminescent element, the distance from the projection region of the second electrode to the inner surface close to the projection region increases as the recess moves away from the second electrode in the thickness direction of the first carrier blocking layer. It is preferably formed in a shape.

 この有機エレクトロルミネッセンス素子において、前記第2電極は、金属の粉末と有機バインダとを含む電極からなることが好ましい。 In this organic electroluminescence element, the second electrode is preferably composed of an electrode containing a metal powder and an organic binder.

 この有機エレクトロルミネッセンス素子において、前記導電性層は、導電性ナノ構造体と透明媒体とを含む透明導電膜からなることが好ましい。 In this organic electroluminescence element, the conductive layer is preferably formed of a transparent conductive film including a conductive nanostructure and a transparent medium.

 この有機エレクトロルミネッセンス素子において、前記第1キャリアブロッキング層は、前記開口部の投影領域の厚みが、前記第2電極の投影領域の厚みよりも、薄いことが好ましい。 In this organic electroluminescence element, it is preferable that the first carrier blocking layer has a thickness of a projection region of the opening portion smaller than a thickness of a projection region of the second electrode.

 本発明の有機エレクトロルミネッセンス素子においては、輝度むらの低減を図ることが可能で且つ外部量子効率の向上を図ることが可能となる。 In the organic electroluminescence device of the present invention, it is possible to reduce luminance unevenness and improve external quantum efficiency.

 本発明の好ましい実施形態をさらに詳細に記述する。本発明の他の特徴および利点は、以下の詳細な記述および添付図面に関連して一層良く理解されるものである。
実施形態1の有機エレクトロルミネッセンス素子の概略断面図である。 実施形態1の有機エレクトロルミネッセンス素子における第2電極の概略平面図である。 実施形態1の有機エレクトロルミネッセンス素子の要部概略断面図である。 実施形態1の有機エレクトロルミネッセンス素子における第2電極の他の構成例の概略平面図である。 実施形態1の有機エレクトロルミネッセンス素子における第2電極の別の構成例の概略平面図である。 実施形態2の有機エレクトロルミネッセンス素子の要部概略断面図である。 従来例の有機エレクトロルミネッセンス素子の概略断面図である。 従来例のエレクトロルミネセンス・ランプの透視上面および断面図である。
Preferred embodiments of the invention are described in further detail. Other features and advantages of the present invention will be better understood with reference to the following detailed description and accompanying drawings.
1 is a schematic cross-sectional view of an organic electroluminescence element of Embodiment 1. FIG. 3 is a schematic plan view of a second electrode in the organic electroluminescence element of Embodiment 1. FIG. 2 is a schematic cross-sectional view of a main part of the organic electroluminescence element of Embodiment 1. FIG. 6 is a schematic plan view of another configuration example of the second electrode in the organic electroluminescence element of Embodiment 1. FIG. 6 is a schematic plan view of another configuration example of the second electrode in the organic electroluminescence element of Embodiment 1. FIG. 5 is a schematic cross-sectional view of a main part of an organic electroluminescence element of Embodiment 2. FIG. It is a schematic sectional drawing of the organic electroluminescent element of a prior art example. It is a see-through | perspective upper surface and sectional drawing of the electroluminescent lamp of a prior art example.

 (実施形態1)
 以下、本実施形態の有機エレクトロルミネッセンス素子について図1~図5に基づいて説明する。
(Embodiment 1)
Hereinafter, the organic electroluminescence device of this embodiment will be described with reference to FIGS.

 有機エレクトロルミネッセンス素子は、基板10と、基板10の一表面側(図1の上側)に設けられた第1電極20と、基板10の上記一表面側で第1電極20に対向した第2電極40と、第1電極20と第2電極40との間にあり発光層32を含む機能層30とを備えている。 The organic electroluminescence element includes a substrate 10, a first electrode 20 provided on one surface side (the upper side in FIG. 1) of the substrate 10, and a second electrode facing the first electrode 20 on the one surface side of the substrate 10. 40 and a functional layer 30 including the light emitting layer 32 between the first electrode 20 and the second electrode 40.

 つまり本実施形態のエレクトロルミネッセンス素子は、対向して配置された第1電極20および第2電極40と、第1電極20と第2電極40との間に配置された機能層30と、を備えている。 That is, the electroluminescent element of the present embodiment includes the first electrode 20 and the second electrode 40 that are disposed to face each other, and the functional layer 30 that is disposed between the first electrode 20 and the second electrode 40. ing.

 また、有機エレクトロルミネッセンス素子は、第1電極20に第1引出し配線(図示せず)を介して電気的に接続された第1端子部(図示せず)と、第2電極40に第2引出し配線46を介して電気的に接続された第2端子部47とを備えている。第1引出し配線、第1端子部、第2引出し配線46および第2端子部47は、基板10の上記一表面側に設けられている。また、有機エレクトロルミネッセンス素子は、第2引出し配線46と機能層30、第1電極20、第1引出し配線とを電気的に絶縁する絶縁膜60が基板10の上記一表面側に設けられている。この絶縁膜60は、基板10の上記一表面と第1電極20の側面と機能層30の側面と、機能層30における第2電極40側の表面の外周部とに跨って形成されている。 The organic electroluminescence element has a first terminal portion (not shown) electrically connected to the first electrode 20 via a first lead wiring (not shown), and a second lead to the second electrode 40. And a second terminal portion 47 electrically connected via the wiring 46. The first lead wiring, the first terminal portion, the second lead wiring 46 and the second terminal portion 47 are provided on the one surface side of the substrate 10. In the organic electroluminescence element, an insulating film 60 that electrically insulates the second lead wiring 46 from the functional layer 30, the first electrode 20, and the first lead wiring is provided on the one surface side of the substrate 10. . The insulating film 60 is formed across the one surface of the substrate 10, the side surface of the first electrode 20, the side surface of the functional layer 30, and the outer peripheral portion of the surface of the functional layer 30 on the second electrode 40 side.

 また、有機エレクトロルミネッセンス素子は、第1電極20および第2電極40それぞれの抵抗率(電気抵抗率)を、透明導電性酸化物(Transparent Conducting Oxide:TCO)の抵抗率(電気抵抗率)よりも低くしてある。透明導電性酸化物としては、例えば、ITO、AZO、GZO、IZOなどがある。このような透明導電酸化物の抵抗率は、特に限定されないが、1×10-4~1×10-3Ω・cmとして例示される。 Further, the organic electroluminescence element has a resistivity (electrical resistivity) of each of the first electrode 20 and the second electrode 40 that is higher than a resistivity (electrical resistivity) of a transparent conductive oxide (TCO). It is low. Examples of the transparent conductive oxide include ITO, AZO, GZO, and IZO. The resistivity of such a transparent conductive oxide is not particularly limited, but is exemplified as 1 × 10 −4 to 1 × 10 −3 Ω · cm.

 また、有機エレクトロルミネッセンス素子は、機能層30が、発光層32よりも第2電極40側にある最表層として、第1電極20から機能層30に注入される第1キャリアの第2電極40側への漏れを抑制する第1キャリアブロッキング層33を含んでいる。 Further, in the organic electroluminescence element, the functional layer 30 is the outermost layer on the second electrode 40 side with respect to the light emitting layer 32, and the second carrier 40 side of the first carrier injected from the first electrode 20 into the functional layer 30. The first carrier blocking layer 33 that suppresses leakage to the substrate is included.

 また、第2電極40には、機能層30からの光取り出し用の開口部41が形成されている。すなわち、有機エレクトロルミネッセンス素子は、第2電極40が、機能層30からの光取出し用の開口部41(図2および図3参照)を有している。 Further, the second electrode 40 is formed with an opening 41 for extracting light from the functional layer 30. That is, in the organic electroluminescence element, the second electrode 40 has an opening 41 (see FIGS. 2 and 3) for extracting light from the functional layer 30.

 また、有機エレクトロルミネッセンス素子は、第2電極40と機能層30(第1キャリアブロッキング層33)とに接し且つ第2キャリア注入機能と光透過性とを有する導電性層50が設けられている。これにより、有機エレクトロルミネッセンス素子は、第2電極40側から光を取り出すことが可能となる。要するに、本実施形態の有機エレクトロルミネッセンス素子は、トップエミッション型の有機エレクトロルミネッセンス素子として用いることが可能となる。 In addition, the organic electroluminescence element is provided with a conductive layer 50 which is in contact with the second electrode 40 and the functional layer 30 (first carrier blocking layer 33) and has a second carrier injection function and light transmittance. Thereby, the organic electroluminescence element can extract light from the second electrode 40 side. In short, the organic electroluminescence element of the present embodiment can be used as a top emission type organic electroluminescence element.

 導電性層50は、第2電極40を覆っている。本実施形態の導電性層50は、第2電極40および第1キャリアブロッキング層33を覆っている。また、第1キャリアブロッキング層33は、開口部41の投影領域に凹部38が設けられている。 The conductive layer 50 covers the second electrode 40. The conductive layer 50 of the present embodiment covers the second electrode 40 and the first carrier blocking layer 33. The first carrier blocking layer 33 is provided with a recess 38 in the projection area of the opening 41.

 有機エレクトロルミネッセンス素子は、基板10の上記一表面側に対向配置され透光性を有するカバー基板70と、基板10の周部とカバー基板70の周部との間に介在する枠状(本実施形態では、矩形枠状)のフレーム部80とを備えていることが好ましい。また、有機エレクトロルミネッセンス素子は、基板10とカバー基板70とフレーム部80とで囲まれる空間に、第1電極20、機能層30、第2電極40、導電性層50などからなる素子部1を封止する透光性材料(例えば、透光性樹脂など)からなる封止部90を備えていることが好ましい。 The organic electroluminescence element has a cover substrate 70 that is disposed opposite to the one surface side of the substrate 10 and has translucency, and a frame shape (this embodiment) interposed between the peripheral portion of the substrate 10 and the peripheral portion of the cover substrate 70. In the embodiment, it is preferable to include a frame portion 80 having a rectangular frame shape. In addition, the organic electroluminescence element includes the element portion 1 including the first electrode 20, the functional layer 30, the second electrode 40, the conductive layer 50, and the like in a space surrounded by the substrate 10, the cover substrate 70, and the frame portion 80. It is preferable to include a sealing portion 90 made of a light-transmitting material (for example, a light-transmitting resin) to be sealed.

 以下、有機エレクトロルミネッセンス素子の各構成要素について詳細に説明する。 Hereinafter, each component of the organic electroluminescence element will be described in detail.

 基板10は、平面視形状を矩形状としてある。ここで、基板10の平面視形状は、矩形状に限らず、例えば、矩形状以外の多角形状、円形状などでもよい。 The substrate 10 has a rectangular shape in plan view. Here, the planar view shape of the substrate 10 is not limited to a rectangular shape, and may be, for example, a polygonal shape or a circular shape other than the rectangular shape.

 基板10としては、ガラス基板を用いているが、これに限らず、例えば、プラスチック板や、金属板などを用いてもよい。ガラス基板の材料としては、例えば、ソーダライムガラス、無アルカリガラスなどを採用することができる。また、プラスチック板の材料としては、例えば、ポリエチレンテレフタラート、ポリエチレンナフタレート、ポリエーテルサルフォン、ポリカーボネートなどを採用することができる。また、金属板の材料としては、例えば、アルミニウム、銅、ステンレス鋼などを採用することができる。プラスチック板を用いる場合は、プラスチック基板の表面にSiON膜、SiN膜などが成膜されたものを用いることで、水分の透過を抑えることが好ましい。なお、基板10は、リジッドなものでもよいし、フレキシブルなものでもよい。 The glass substrate is used as the substrate 10, but is not limited thereto, and for example, a plastic plate or a metal plate may be used. As a material for the glass substrate, for example, soda lime glass, non-alkali glass, or the like can be employed. Moreover, as a material of the plastic plate, for example, polyethylene terephthalate, polyethylene naphthalate, polyethersulfone, polycarbonate, or the like can be employed. Moreover, as a material of the metal plate, for example, aluminum, copper, stainless steel, or the like can be employed. In the case of using a plastic plate, it is preferable to suppress moisture permeation by using a plastic substrate having a SiON film, SiN film, or the like formed on the surface thereof. The substrate 10 may be rigid or flexible.

 基板10としてガラス基板を用いる場合には、基板10の上記一表面の凹凸が有機エレクトロルミネッセンス素子のリーク電流などの発生原因となることがある(有機エレクトロルミネッセンス素子の劣化原因となることがある)。このため、基板10としてガラス基板を用いる場合には、上記一表面の表面粗さが小さくなるように高精度に研磨された素子形成用のガラス基板を用意することが好ましい。基板10の上記一表面の表面粗さについては、JIS B 0601-2001(ISO 4287-1997)で規定されている算術平均粗さRaが10nm以下であることが好ましく、数nm以下であることが、より好ましい。これに対して、基板10としてプラスチック板を用いる場合には、特に高精度な研磨を行わなくても、上記一表面の算術平均粗さRaが数nm以下のものを低コストで得ることが可能である。 When a glass substrate is used as the substrate 10, the unevenness on the one surface of the substrate 10 may cause a leak current of the organic electroluminescence element (may cause deterioration of the organic electroluminescence element). . For this reason, when a glass substrate is used as the substrate 10, it is preferable to prepare a glass substrate for element formation that is polished with high accuracy so that the surface roughness of the one surface is reduced. Regarding the surface roughness of the one surface of the substrate 10, the arithmetic average roughness Ra specified in JIS B 0601-2001 (ISO 4287-1997) is preferably 10 nm or less, and preferably several nm or less. More preferable. On the other hand, when a plastic plate is used as the substrate 10, it is possible to obtain at low cost an arithmetic average roughness Ra of one surface or less of the above-mentioned surface without particularly high precision polishing. It is.

 カバー基板70としては、ガラス基板を用いているが、これに限らず、例えば、プラスチック板などを用いてもよい。ガラス基板の材料としては、例えば、ソーダライムガラス、無アルカリガラスなどを採用することができる。また、プラスチック板の材料としては、例えば、ポリエチレンテレフタラート、ポリエチレンナフタレート、ポリエーテルサルフォン、ポリカーボネートなどを採用することができる。 The glass substrate is used as the cover substrate 70, but is not limited thereto, and for example, a plastic plate or the like may be used. As a material for the glass substrate, for example, soda lime glass, non-alkali glass, or the like can be employed. Moreover, as a material of the plastic plate, for example, polyethylene terephthalate, polyethylene naphthalate, polyethersulfone, polycarbonate, or the like can be employed.

 本実施形態では、カバー基板70として、平板状のものを用いているが、これに限らず、基板10との対向面に、上述の素子部1を収納する収納凹所を形成したものを用い、上記対向面における収納凹所の周部を全周に亘って基板10側と接合するようにしてもよい。言い換えれば、一面が開口した箱状のカバー基板70を用い、カバー基板70の内部に素子部1を収容し、カバー基板70の開口の周縁部を基板10側と接合するようにしてもよい。この場合は、別部材のフレーム部80を用いる必要がなくなるという利点がある。一方、平板状のカバー基板70と枠状のフレーム部80とを別部材により構成している場合には、カバー基板70に要求される光学的な物性(光透過率、屈折率など)と、フレーム部80に要求される物性(ガスバリア性など)との両方の要求を各別に満たす材料を採用することが可能になるという利点がある。 In the present embodiment, a flat substrate is used as the cover substrate 70, but is not limited to this, and a substrate in which a storage recess for storing the above-described element unit 1 is formed on the surface facing the substrate 10 is used. The peripheral portion of the storage recess on the facing surface may be joined to the substrate 10 side over the entire circumference. In other words, a box-shaped cover substrate 70 having an open surface may be used, the element unit 1 may be accommodated inside the cover substrate 70, and the peripheral edge of the opening of the cover substrate 70 may be bonded to the substrate 10 side. In this case, there is an advantage that it is not necessary to use the frame part 80 which is a separate member. On the other hand, in the case where the flat cover substrate 70 and the frame-shaped frame portion 80 are configured by separate members, optical properties (light transmittance, refractive index, etc.) required for the cover substrate 70, There is an advantage that it is possible to employ a material that satisfies both the physical properties required for the frame portion 80 (such as gas barrier properties).

 カバー基板70における外面側(基板10側とは反対の面側;図1の上側)には、発光層32から放射された光の上記外面での反射を抑制する光取出し構造部(図示せず)を備えていることが好ましい。このような光取出し構造部としては、例えば、2次元周期構造を有した凹凸構造部が挙げられる。このような2次元周期構造の周期は、発光層32で発光する光の波長が例えば300~800nmの範囲内にある場合、媒質内の波長をλ(真空中の波長を媒質の屈折率で除した値)とすれば、波長λの1/4~10倍の範囲で適宜設定することが望ましい。このような凹凸構造部は、例えば、カバー基板70の上記外面側に、例えば、熱インプリント法(熱ナノインプリント法)、光インプリント法(光ナノインプリント法)などのインプリント法により、予め形成することが可能である。また、カバー基板70の材料によっては、カバー基板70を射出成形により形成するようにし、射出成形時に適宜の金型を用いて、カバー基板70に凹凸構造部を直接形成することも可能である。また、凹凸構造部は、カバー基板70とは別部材により構成することも可能であり、例えば、プリズムシート(例えば、株式会社きもと製のライトアップ(登録商標)GM3のような光拡散フィルムなど)により構成することができる。 On the outer surface side (the surface side opposite to the substrate 10 side; upper side in FIG. 1) of the cover substrate 70, a light extraction structure (not shown) that suppresses reflection of light emitted from the light emitting layer 32 on the outer surface. ). Examples of such a light extraction structure part include an uneven structure part having a two-dimensional periodic structure. The period of such a two-dimensional periodic structure is such that when the wavelength of light emitted from the light emitting layer 32 is in the range of 300 to 800 nm, for example, the wavelength in the medium is λ (the wavelength in vacuum is divided by the refractive index of the medium). Value), it is desirable to set appropriately within the range of 1/4 to 10 times the wavelength λ. Such an uneven structure portion is formed in advance on the outer surface side of the cover substrate 70 by, for example, an imprint method such as a thermal imprint method (thermal nanoimprint method) or an optical imprint method (photo nanoimprint method). It is possible. Further, depending on the material of the cover substrate 70, the cover substrate 70 may be formed by injection molding, and the uneven structure portion may be directly formed on the cover substrate 70 by using an appropriate mold at the time of injection molding. Further, the concavo-convex structure portion can also be configured by a member different from the cover substrate 70, for example, a prism sheet (for example, a light diffusion film such as Lightup (registered trademark) GM3 manufactured by Kimoto Co., Ltd.). Can be configured.

 本実施形態の有機エレクトロルミネッセンス素子では、上述の光取出し構造部を備えることにより、発光層32から放射されカバー基板70の上記外面側まで到達した光の反射ロスを低減でき、光取り出し効率の向上を図ることが可能となる。 In the organic electroluminescence element of this embodiment, by providing the above-described light extraction structure portion, it is possible to reduce the reflection loss of the light emitted from the light emitting layer 32 and reaching the outer surface side of the cover substrate 70, and to improve the light extraction efficiency. Can be achieved.

 フレーム部80と基板10の上記一表面側とを接合する第1接合材料としては、エポキシ樹脂を用いているが、これに限らず、例えば、アクリル樹脂などを採用してもよい。第1接合材料として用いるエポキシ樹脂やアクリル樹脂は、例えば、紫外線硬化型のものでもよいし、熱硬化型のものでもよい。また、第1接合材料として、エポキシ樹脂にフィラー(例えば、シリカ、アルミナなど)を含有させたものを用いてもよい。ここで、フレーム部80は、基板10の上記一表面側に対して、フレーム部80における基板10側との対向面を全周に亘って気密的に接合してある。また、フレーム部80とカバー基板70とを接合する第2接合材料としては、エポキシ樹脂を用いているが、これに限らず、例えば、アクリル樹脂、フリットガラスなどを採用してもよい。第2接合材料として用いるエポキシ樹脂やアクリル樹脂は、例えば、紫外線硬化型のものでもよいし、熱硬化型のものでもよい。また、第2接合材料として、エポキシ樹脂にフィラー(例えば、シリカ、アルミナなど)を含有させたものを用いてもよい。ここで、フレーム部80は、カバー基板70に対して、フレーム部80におけるカバー基板70との対向面を全周に亘って気密的に接合してある。 Although the epoxy resin is used as the first bonding material for bonding the frame portion 80 and the one surface side of the substrate 10, the first bonding material is not limited thereto, and for example, an acrylic resin may be used. The epoxy resin or acrylic resin used as the first bonding material may be, for example, an ultraviolet curable type or a thermosetting type. Moreover, you may use what made the epoxy resin contain a filler (for example, a silica, an alumina, etc.) as a 1st joining material. Here, the frame portion 80 is airtightly bonded to the one surface side of the substrate 10 over the entire periphery of the surface of the frame portion 80 facing the substrate 10 side. Moreover, as a 2nd joining material which joins the flame | frame part 80 and the cover board | substrate 70, although an epoxy resin is used, you may employ | adopt not only this but an acrylic resin, frit glass, etc., for example. The epoxy resin or acrylic resin used as the second bonding material may be, for example, an ultraviolet curable type or a thermosetting type. Moreover, you may use what made the epoxy resin contain a filler (for example, silica, alumina, etc.) as a 2nd joining material. Here, the frame portion 80 is airtightly bonded to the cover substrate 70 over the entire circumference of the surface of the frame portion 80 facing the cover substrate 70.

 絶縁膜60の材料としては、例えば、ポリイミド、ノボラック樹脂、エポキシ樹脂などを用いることができる。 As a material of the insulating film 60, for example, polyimide, novolac resin, epoxy resin, or the like can be used.

 封止部90の材料である透光性材料としては、例えば、エポキシ樹脂やシリコーン樹脂などの透光性樹脂を用いることができるが、機能層30との屈折率差の小さな材料が、より好ましい。また、透光性材料は、透光性樹脂にガラスなどからなる光拡散材を混合したものを用いてもよい。また、透光性材料は、有機成分と無機成分とがnmレベルもしくは分子レベルで混合、結合した有機・無機ハイブリッド材料を用いてもよい。 As the translucent material that is a material of the sealing portion 90, for example, a translucent resin such as an epoxy resin or a silicone resin can be used, but a material having a small refractive index difference from the functional layer 30 is more preferable. . The light transmissive material may be a light transmissive resin mixed with a light diffusing material made of glass or the like. Further, as the translucent material, an organic / inorganic hybrid material in which an organic component and an inorganic component are mixed and bonded at the nm level or molecular level may be used.

 本実施形態の有機エレクトロルミネッセンス素子では、第1電極20が陰極を構成し、第2電極40が陽極を構成している。そして、機能層30は、第1電極20側から順に、第1キャリア注入層31、発光層32、第1キャリアブロッキング層33を備えている。図1に示すように、本実施形態の機能層30は、第1電極20に接して第1キャリア注入層31が形成されている。また、第1キャリア注入層31に接して発光層32が形成されている。また、発光層32に接して第1キャリアブロッキング層33が形成されている。そして、第1キャリアブロッキング層33に接して第2電極40が形成されている。ここにおいて、第1電極20から機能層30へ注入する第1キャリアは電子であり、第2電極40から機能層30へ注入する第2キャリアは正孔である。発光層32における第1電極20側にある第1キャリア注入層31は、電子注入層である。また、第1キャリアブロッキング層33は、インターレイヤーであり、電子ブロッキング層により構成される。なお、第1電極20が陽極を構成し、第2電極40が陰極を構成する場合には、例えば、第1キャリア注入層31としてホール注入層を採用し、第1キャリアブロッキング層33であるインターレイヤーを正孔ブロッキング層により構成すればよい。 In the organic electroluminescence element of this embodiment, the first electrode 20 constitutes a cathode and the second electrode 40 constitutes an anode. The functional layer 30 includes a first carrier injection layer 31, a light emitting layer 32, and a first carrier blocking layer 33 in order from the first electrode 20 side. As shown in FIG. 1, in the functional layer 30 of this embodiment, a first carrier injection layer 31 is formed in contact with the first electrode 20. A light emitting layer 32 is formed in contact with the first carrier injection layer 31. A first carrier blocking layer 33 is formed in contact with the light emitting layer 32. The second electrode 40 is formed in contact with the first carrier blocking layer 33. Here, the first carrier injected from the first electrode 20 into the functional layer 30 is an electron, and the second carrier injected from the second electrode 40 into the functional layer 30 is a hole. The first carrier injection layer 31 on the first electrode 20 side in the light emitting layer 32 is an electron injection layer. Moreover, the 1st carrier blocking layer 33 is an interlayer and is comprised with an electronic blocking layer. In the case where the first electrode 20 constitutes an anode and the second electrode 40 constitutes a cathode, for example, a hole injection layer is adopted as the first carrier injection layer 31 and the first carrier blocking layer 33 is formed as an interface. What is necessary is just to comprise a layer by a hole blocking layer.

 上述の機能層30の構造は、上述の例に限らず、例えば、第1キャリア注入層31と発光層32との間に第1キャリア輸送層(ここでは電子輸送層)を設けたり、発光層32と第1キャリブロッキング層33との間に第2キャリア輸送層(ここではホール輸送層)を設けたりした構造でもよい。また、機能層30は、発光層32と第1キャリアブロッキング層33とを含んでいればよく(つまり、機能層30は、発光層32と第1キャリアブロッキング層33とだけでもよく)、発光層32および第1キャリアブロッキング層33以外の、第1キャリア注入層31、第1キャリア輸送層、第2キャリア輸送層などは適宜設ければよい。発光層32は、単層構造でも多層構造でもよい。例えば、所望の発光色が白色の場合には、発光層中に赤色、緑色、青色の3種類のドーパント色素をドーピングするようにしてもよいし、青色正孔輸送性発光層と緑色電子輸送性発光層と赤色電子輸送性発光層との積層構造を採用してもよいし、青色電子輸送性発光層と緑色電子輸送性発光層と赤色電子輸送性発光層との積層構造を採用してもよい。 The structure of the above-described functional layer 30 is not limited to the above-described example. For example, a first carrier transport layer (here, an electron transport layer) is provided between the first carrier injection layer 31 and the light emitting layer 32, or the light emitting layer. A structure in which a second carrier transport layer (here, a hole transport layer) is provided between the first carrier blocking layer 33 and the first carry blocking layer 33 may be used. The functional layer 30 only needs to include the light emitting layer 32 and the first carrier blocking layer 33 (that is, the functional layer 30 may be only the light emitting layer 32 and the first carrier blocking layer 33). The first carrier injection layer 31, the first carrier transport layer, the second carrier transport layer, and the like other than 32 and the first carrier blocking layer 33 may be provided as appropriate. The light emitting layer 32 may have a single layer structure or a multilayer structure. For example, when the desired emission color is white, the emission layer may be doped with three types of dopant dyes of red, green, and blue, or the blue hole-transporting emission layer and the green electron-transporting property. A laminated structure of a light emitting layer and a red electron transporting light emitting layer may be adopted, or a laminated structure of a blue electron transporting light emitting layer, a green electron transporting light emitting layer and a red electron transporting light emitting layer may be adopted. Good.

 発光層32の材料としては、例えば、ポリパラフェニレンビニレン誘導体、ポリチオフェン誘導体、ポリパラフェニレン誘導体、ポリシラン誘導体、ポリアセチレン誘導体など、ポリフルオレン誘導体、ポリビニルカルバゾール誘導体、色素体、金属錯体系発光材料を高分子化したものなどや、アントラセン、ナフタレン、ピレン、テトラセン、コロネン、ペリレン、フタロペリレン、ナフタロペリレン、ジフェニルブタジエン、テトラフェニルブタジエン、クマリン、オキサジアゾール、ビスベンゾキサゾリン、ビススチリル、シクロペンタジエン、キノリン金属錯体、トリス(8-ヒドロキシキノリナート)アルミニウム錯体、トリス(4-メチル-8-キノリナート)アルミニウム錯体、トリス(5-フェニル-8-キノリナート)アルミニウム錯体、アミノキノリン金属錯体、ベンゾキノリン金属錯体、トリ-(p-ターフェニル-4-イル)アミン、ピラン、キナクリドン、ルブレン、およびこれらの誘導体、あるいは、1-アリール-2,5-ジ(2-チエニル)ピロール誘導体、ジスチリルベンゼン誘導体、スチリルアリーレン誘導体、スチリルアミン誘導体、およびこれらの発光性化合物からなる基を分子の一部分に有する化合物などが挙げられる。また、上記化合物に代表される蛍光色素由来の化合物のみならず、いわゆる燐光発光材料、例えばイリジウム錯体、オスミウム錯体、白金錯体、ユーロピウム錯体などの発光材料、又はそれらを分子内に有する化合物若しくは高分子も好適に用いることができる。これらの材料は、必要に応じて、適宜選択して用いることができる。発光層32は、塗布法(例えば、スピンコート法、スプレーコート法、ダイコート法、グラビア印刷法、スクリーン印刷法など)のような湿式プロセスによって成膜することが好ましい。ただし、発光層32の成膜方法は、塗布法に限らず、例えば、真空蒸着法、転写法などの乾式プロセスによって発光層32を成膜してもよい。 Examples of the material of the light emitting layer 32 include polyparaphenylene vinylene derivatives, polythiophene derivatives, polyparaphenylene derivatives, polysilane derivatives, polyacetylene derivatives, and the like, polyfluorene derivatives, polyvinylcarbazole derivatives, dye bodies, and metal complex light emitting materials. Such as anthracene, naphthalene, pyrene, tetracene, coronene, perylene, phthaloperylene, naphthaloperylene, diphenylbutadiene, tetraphenylbutadiene, coumarin, oxadiazole, bisbenzoxazoline, bisstyryl, cyclopentadiene, quinoline metal complex, tris (8-hydroxyquinolinato) aluminum complex, tris (4-methyl-8-quinolinato) aluminum complex, tris (5-phenyl-8-quinolinato) Luminium complex, aminoquinoline metal complex, benzoquinoline metal complex, tri- (p-terphenyl-4-yl) amine, pyran, quinacridone, rubrene, and derivatives thereof, or 1-aryl-2,5-di ( 2-thienyl) pyrrole derivatives, distyrylbenzene derivatives, styrylarylene derivatives, styrylamine derivatives, and compounds having a group consisting of these luminescent compounds in a part of the molecule. In addition to fluorescent dye-derived compounds represented by the above compounds, so-called phosphorescent materials, for example, luminescent materials such as iridium complexes, osmium complexes, platinum complexes, and europium complexes, or compounds or polymers having these in the molecule Can also be suitably used. These materials can be appropriately selected and used as necessary. The light emitting layer 32 is preferably formed by a wet process such as a coating method (for example, spin coating method, spray coating method, die coating method, gravure printing method, screen printing method, etc.). However, the method for forming the light emitting layer 32 is not limited to the coating method, and the light emitting layer 32 may be formed by a dry process such as a vacuum deposition method or a transfer method.

 電子注入層の材料は、例えば、フッ化リチウムやフッ化マグネシウムなどの金属フッ化物、塩化ナトリウム、塩化マグネシウムなどに代表される金属塩化物などの金属ハロゲン化物や、チタン、亜鉛、マグネシウム、カルシウム、バリウム、ストロンチウムなどの酸化物、などを用いることができる。これらの材料の場合、電子注入層は、真空蒸着法により形成することができる。また、電子注入層の材料は、例えば、電子注入を促進させるドーパント(アルカリ金属など)を混合した有機半導体材料を用いることができる。このような材料の場合、電子注入層は、塗布法により形成することができる。 Examples of the material for the electron injection layer include metal fluorides such as lithium fluoride and magnesium fluoride, metal halides such as sodium chloride and magnesium chloride, titanium, zinc, magnesium, calcium, An oxide such as barium or strontium can be used. In the case of these materials, the electron injection layer can be formed by a vacuum deposition method. As the material for the electron injection layer, for example, an organic semiconductor material mixed with a dopant (such as an alkali metal) that promotes electron injection can be used. In the case of such a material, the electron injection layer can be formed by a coating method.

 また、電子輸送層の材料は、電子輸送性を有する化合物の群から選定することができる。この種の化合物としては、Alq3等の電子輸送性材料として知られる金属錯体や、フェナントロリン誘導体、ピリジン誘導体、テトラジン誘導体、オキサジアゾール誘導体などのヘテロ環を有する化合物などが挙げられるが、この限りではなく、一般に知られる任意の電子輸送材料を用いることが可能である。 The material for the electron transport layer can be selected from the group of compounds having electron transport properties. Examples of this type of compound include metal complexes known as electron transport materials such as Alq 3 and compounds having a heterocycle such as phenanthroline derivatives, pyridine derivatives, tetrazine derivatives, oxadiazole derivatives, etc. Instead, any generally known electron transport material can be used.

 ホール輸送層の材料としては、LUMO(Lowest Unoccupied Molecular Orbital)準位が小さい低分子材料や高分子材料を用いることができる。例えば、ポリビニルカルバゾール(PVCz)や、ポリピリジン、ポリアニリンなどの側鎖や主鎖に芳香族アミンを有するポリアリーレン誘導体などの芳香族アミンを含むポリマーなどが挙げられるが、これらに限定されるものではない。なお、ホール輸送層の材料としては、例えば、4,4’-ビス[N-(ナフチル)-N-フェニル-アミノ]ビフェニル(α-NPD)、N,N’-ビス(3-メチルフェニル)-(1,1’-ビフェニル)-4,4’-ジアミン(TPD)、2-TNATA、4,4’,4”-トリス(N-(3-メチルフェニル)N-フェニルアミノ)トリフェニルアミン(MTDATA)、4,4’-N,N’-ジカルバゾールビフェニル(CBP)、スピロ-NPD、スピロ-TPD、スピロ-TAD、TNBなどを用いることが可能である。 As a material for the hole transport layer, a low molecular material or a polymer material having a low LUMO (Lowest Unoccupied Molecular Molecular) level can be used. Examples thereof include polymers containing aromatic amines such as polyvinyl carbazole (PVCz), polyarylene derivatives such as polypyridine and polyaniline, and polyarylene derivatives having aromatic amines in the main chain, but are not limited thereto. . Examples of the material for the hole transport layer include 4,4′-bis [N- (naphthyl) -N-phenyl-amino] biphenyl (α-NPD) and N, N′-bis (3-methylphenyl). -(1,1'-biphenyl) -4,4'-diamine (TPD), 2-TNATA, 4,4 ', 4 "-tris (N- (3-methylphenyl) N-phenylamino) triphenylamine (MTDATA), 4,4′-N, N′-dicarbazole biphenyl (CBP), spiro-NPD, spiro-TPD, spiro-TAD, TNB, and the like can be used.

 第1キャリアブロッキング層33は、発光層32側からの第2電極40側への第1キャリア(ここでは、電子)の漏れを抑制する第1キャリア障壁(ここでは、電子障壁)としてのキャリアブロッキング機能(ここでは、電子ブロッキング機能)を有する。また、第1キャリアブロッキング層33は、第2キャリア(ここでは、正孔)を発光層32へ輸送する機能、発光層32の励起状態の消光を抑制する機能などを有していることが好ましい。 The first carrier blocking layer 33 is carrier blocking as a first carrier barrier (here, an electron barrier) that suppresses leakage of first carriers (here, electrons) from the light emitting layer 32 side to the second electrode 40 side. It has a function (here, an electronic blocking function). The first carrier blocking layer 33 preferably has a function of transporting second carriers (here, holes) to the light emitting layer 32, a function of suppressing quenching of the excited state of the light emitting layer 32, and the like. .

 有機エレクトロルミネッセンス素子では、第1キャリアブロッキング層33を設けることにより、発光効率の向上および長寿命化を図ることが可能となる。第1キャリアブロッキング層33の材料としては、例えば、ポリアリールアミン若しくはその誘導体、ポリフルオレン若しくはその誘導体、ポリビニルカルバゾール若しくはその誘導体、トリフェニルジアミン誘導体などを用いることができる。このような第1キャリアブロッキング層33は、塗布法(スピンコート法、スプレーコート法、ダイコート法、グラビア印刷法など)のような湿式プロセスや、真空蒸着法によって成膜することができる。 In the organic electroluminescence element, by providing the first carrier blocking layer 33, it is possible to improve the light emission efficiency and extend the life. As a material of the first carrier blocking layer 33, for example, polyarylamine or a derivative thereof, polyfluorene or a derivative thereof, polyvinylcarbazole or a derivative thereof, a triphenyldiamine derivative, or the like can be used. Such a first carrier blocking layer 33 can be formed by a wet process such as a coating method (spin coating method, spray coating method, die coating method, gravure printing method, etc.) or a vacuum deposition method.

 第1キャリアブロッキング層33は、上述のように、開口部41の投影領域に凹部38が設けられている。これにより、第1キャリアブロッキング層33は、開口部41の投影領域の厚みが、第2電極40の投影領域の厚みよりも薄くなっている。なお、凹部38の深さ寸法は、第1キャリアブロッキング層33における第2電極40の投影領域の厚み寸法よりも小さいこと(すなわち、凹部38によって第1キャリアブロッキング層33に貫通孔が形成されないこと)が好ましいが、数値については特に限定するものではない。このような凹部38は、たとえば、スクリーン印刷法、グラビア印刷法、スプレーコート法などによる2度塗りで形成することができる。 As described above, the first carrier blocking layer 33 has the recess 38 in the projection region of the opening 41. Thereby, in the first carrier blocking layer 33, the thickness of the projection region of the opening 41 is thinner than the thickness of the projection region of the second electrode 40. The depth dimension of the recess 38 is smaller than the thickness dimension of the projection region of the second electrode 40 in the first carrier blocking layer 33 (that is, no through hole is formed in the first carrier blocking layer 33 by the recess 38. ) Is preferable, but the numerical values are not particularly limited. Such a concave portion 38 can be formed by, for example, twice coating by a screen printing method, a gravure printing method, a spray coating method, or the like.

 また、陰極は、機能層30中に第1電荷である電子を注入するための電極である。第1電極20が陰極の場合、第1電極20は、第1キャリアとして第1電荷である電子を機能層30中に注入する。陰極の材料としては、仕事関数の小さい金属、合金、電気伝導性化合物およびこれらの混合物からなる電極材料を用いることが好ましく、LUMO(Lowest Unoccupied Molecular Orbital)準位との差が大きくなりすぎないように仕事関数が1.9eV以上5eV以下のものを用いるのが好ましい。陰極の電極材料としては、例えば、アルミニウム、銀、マグネシウム、金、銅、クロム、モリブデン、パラジウム、錫など、およびこれらと他の金属との合金、例えばマグネシウム-銀混合物、マグネシウム-インジウム混合物、アルミニウム-リチウム合金を例として挙げることができる。また、金属、金属酸化物など、およびこれらと他の金属との混合物、例えば、酸化アルミニウムからなる極薄膜(ここでは、トンネル注入により電子を流すことが可能な1nm以下の薄膜)とアルミニウムからなる薄膜との積層膜なども使用可能である。第1電極20としての陰極を反射電極とする場合、陰極の材料としては、発光層32から放射される光に対する反射率が高く、且つ、抵抗率の低い金属が好ましく、アルミニウムや銀が好ましい。 The cathode is an electrode for injecting electrons as the first charge into the functional layer 30. When the first electrode 20 is a cathode, the first electrode 20 injects electrons, which are first charges, into the functional layer 30 as first carriers. As the cathode material, it is preferable to use an electrode material made of a metal, an alloy, an electrically conductive compound and a mixture thereof having a small work function, so that the difference from the LUMO (Lowest Unoccupied Molecular Orbital) level does not become too large. It is preferable to use a material having a work function of 1.9 eV or more and 5 eV or less. Examples of the electrode material for the cathode include aluminum, silver, magnesium, gold, copper, chromium, molybdenum, palladium, tin, and alloys of these with other metals, such as magnesium-silver mixture, magnesium-indium mixture, aluminum -Lithium alloys can be mentioned as examples. Also, a metal, a metal oxide, etc., and a mixture of these and other metals, for example, an ultrathin film made of aluminum oxide (here, a thin film of 1 nm or less capable of flowing electrons by tunnel injection) and aluminum. A laminated film with a thin film can also be used. When the cathode as the first electrode 20 is a reflective electrode, the cathode material is preferably a metal having a high reflectance with respect to light emitted from the light emitting layer 32 and a low resistivity, and preferably aluminum or silver.

 なお、第1電極20が、機能層30中に、第1キャリアとして第2電荷であるホールを注入するための電極である陽極を構成する場合、第1電極20である陽極の材料としては、仕事関数の大きい金属を用いることが好ましく、HOMO(Highest Occupied Molecular Orbital)準位との差が大きくなりすぎないように仕事関数が4eV以上6eV以下のものを用いるのが好ましい。 When the first electrode 20 constitutes an anode that is an electrode for injecting holes that are second charges as first carriers into the functional layer 30, the material of the anode that is the first electrode 20 is: It is preferable to use a metal having a large work function, and it is preferable to use a metal having a work function of 4 eV or more and 6 eV or less so that the difference from the HOMO (Highest Occupied Molecular Orbital) level does not become too large.

 第2電極40は、金属の粉末と有機バインダとを含む電極からなる。この種の金属としては、例えば、銀、金、銅などを採用することができる。これにより、有機エレクトロルミネッセンス素子は、第2電極40が、透明導電性酸化物により形成された薄膜の場合に比べて、第2電極40の抵抗率およびシート抵抗を小さくすることが可能となり、第2電極40の低抵抗化により輝度むらを低減することが可能となる。なお、第2電極40の導電性材料としては、金属の代わりに、合金や、カーボンブラックなどを用いることも可能である。 The second electrode 40 is made of an electrode containing metal powder and an organic binder. As this type of metal, for example, silver, gold, copper or the like can be employed. As a result, the organic electroluminescence element can reduce the resistivity and sheet resistance of the second electrode 40 as compared with the case where the second electrode 40 is a thin film formed of a transparent conductive oxide. It is possible to reduce luminance unevenness by reducing the resistance of the two electrodes 40. As the conductive material of the second electrode 40, an alloy, carbon black, or the like can be used instead of a metal.

 第2電極40は、例えば、金属の粉末に有機バインダおよび有機溶剤を混合させたペースト(印刷インク)を、例えばスクリーン印刷法、グラビア印刷法などにより印刷して形成することができる。有機バインダとしては、例えば、アクリル樹脂、ポリエチレン、ポリプロピレン、ポリエチレンテレフタレート、ポリメチルメタクリレート、ポリスチレン、ポリエーテルスルホン、ポリアリレート、ポリカーボネート樹脂、ポリウレタン、ポリアクリルニトリル、ポリビニルアセタール、ポリアミド、ポリイミド、ジアクリルフタレート樹脂、セルロース系樹脂、ポリ塩化ビニル、ポリ塩化ビニリデン、ポリ酢酸ビニル、その他の熱可塑性樹脂や、これらの樹脂を構成する単量体の2種以上の共重合体が挙げられるが、これらに限定されるものではない。 The second electrode 40 can be formed, for example, by printing a paste (printing ink) in which an organic binder and an organic solvent are mixed in a metal powder by, for example, a screen printing method or a gravure printing method. Examples of the organic binder include acrylic resin, polyethylene, polypropylene, polyethylene terephthalate, polymethyl methacrylate, polystyrene, polyether sulfone, polyarylate, polycarbonate resin, polyurethane, polyacrylonitrile, polyvinyl acetal, polyamide, polyimide, and diacryl phthalate resin. , Cellulose resins, polyvinyl chloride, polyvinylidene chloride, polyvinyl acetate, other thermoplastic resins, and copolymers of two or more monomers constituting these resins, but are not limited thereto. It is not something.

 なお、本実施形態の有機エレクトロルミネッセンス素子では、第1電極20の膜厚を80~200nm、第1キャリア注入層31の膜厚を5~50nm、発光層32の膜厚を60~100nm、第1キャリアブロッキング層33において第2電極40に重なる部位の膜厚を40nmにそれぞれ設定してあるが、これらの数値は一例であって、特に限定するものではない。 In the organic electroluminescence device of this embodiment, the first electrode 20 has a thickness of 80 to 200 nm, the first carrier injection layer 31 has a thickness of 5 to 50 nm, the light emitting layer 32 has a thickness of 60 to 100 nm, Although the film thickness of the part which overlaps with the 2nd electrode 40 in 1 carrier blocking layer 33 is each set to 40 nm, these numerical values are examples and are not specifically limited.

 第2電極40は、図1および図2に示すように、格子状(網状)に形成されており、複数(図2に示した例では、36)の開口部41を有している。すなわち、本実施形態の第2電極40は、第1の方向(図2の上下方向)に延びる複数の細線部44と、第1の方向と交差する第2の方向(図2の左右方向)に延びる複数の細線部44とを含む。複数の細線部44で囲まれた空間が、光取り出し用の開口部41である。ここで、図2に示した第2電極40は、各開口部41の各々の形状が正方形状である。要するに、図2に示した第2電極40は、正方格子状に形成されている。 As shown in FIGS. 1 and 2, the second electrode 40 is formed in a lattice shape (mesh shape) and has a plurality of openings (36 in the example shown in FIG. 2). That is, the second electrode 40 of the present embodiment includes a plurality of thin wire portions 44 extending in the first direction (vertical direction in FIG. 2), and a second direction (horizontal direction in FIG. 2) intersecting the first direction. And a plurality of thin line portions 44 extending in the direction. A space surrounded by the plurality of thin line portions 44 is an opening 41 for light extraction. Here, in the second electrode 40 shown in FIG. 2, each opening 41 has a square shape. In short, the second electrode 40 shown in FIG. 2 is formed in a square lattice shape.

 第2電極40は、第2電極40を構成している正方格子状の電極パターン40aの寸法に関して、例えば、線幅L1(図3参照)を1μm~100μm、高さH1(図3参照)を50nm~100μm、ピッチP1(図3参照)を100μm~2000μmとすればよい。ただし、第2電極40の電極パターン40aの線幅L1、高さH1およびピッチP1それぞれの数値範囲は、特に限定するものではなく、素子部1の平面サイズに基づいて適宜設定すればよい。ここにおいて、第2電極40の電極パターン40aの線幅L1については、発光層32で発光する光の利用効率の観点からは狭い方が好ましく、第2電極40の低抵抗化によって輝度むらを低減するという観点からは広い方が好ましいので、有機エレクトロルミネッセンス素子の平面サイズなどに基づいて適宜設定することが好ましい。また、第2電極40の高さH1については、第2電極40の低抵抗化の観点、第2電極40をスクリーン印刷法などの塗布法により形成する際の第2電極40の材料の使用効率(材料使用効率)の観点、機能層30から放射される光の放射角の観点などから、100nm以上10μm以下が、より好ましい。 The second electrode 40 has, for example, a line width L1 (see FIG. 3) of 1 μm to 100 μm and a height H1 (see FIG. 3) regarding the dimensions of the square-lattice electrode pattern 40a constituting the second electrode 40. 50 nm to 100 μm and the pitch P 1 (see FIG. 3) may be set to 100 μm to 2000 μm. However, the numerical ranges of the line width L1, the height H1, and the pitch P1 of the electrode pattern 40a of the second electrode 40 are not particularly limited, and may be set as appropriate based on the planar size of the element portion 1. Here, the line width L1 of the electrode pattern 40a of the second electrode 40 is preferably narrow from the viewpoint of the utilization efficiency of the light emitted from the light emitting layer 32, and luminance unevenness is reduced by reducing the resistance of the second electrode 40. Therefore, it is preferable that the width is appropriately set based on the planar size of the organic electroluminescence element. Regarding the height H1 of the second electrode 40, from the viewpoint of lowering the resistance of the second electrode 40, the use efficiency of the material of the second electrode 40 when the second electrode 40 is formed by a coating method such as a screen printing method. From the viewpoint of (material use efficiency), the viewpoint of the emission angle of light emitted from the functional layer 30, and the like, 100 nm or more and 10 μm or less are more preferable.

 また、本実施形態の有機エレクトロルミネッセンス素子では、第2電極40における各開口部41を、図1および図3に示したように、機能層30から離れるにつれて開口面積が徐々に大きくなる開口形状としてある。つまり、第2電極40の細線部44が断面視略台形状に形成されており、これによって、開口部41の開口面積が機能層30から離れるにつれて徐々に大きくなる開口形状となっている。これにより、有機エレクトロルミネッセンス素子は、機能層30から放射される光の広がり角を大きくすることが可能になり、輝度むらを、より低減することが可能となる。また、有機エレクトロルミネッセンス素子は、第2電極40での反射損失や吸収損失を低減することが可能となり、外部量子効率のより一層の向上を図ることが可能となる。 In the organic electroluminescence element of the present embodiment, each opening 41 in the second electrode 40 has an opening shape in which the opening area gradually increases as the distance from the functional layer 30 increases, as shown in FIGS. 1 and 3. is there. That is, the thin wire portion 44 of the second electrode 40 is formed in a substantially trapezoidal shape in cross section, and thus, the opening shape of the opening portion 41 gradually increases as the distance from the functional layer 30 increases. Thereby, the organic electroluminescence element can increase the spread angle of the light emitted from the functional layer 30, and can further reduce the luminance unevenness. In addition, the organic electroluminescence element can reduce reflection loss and absorption loss at the second electrode 40, and can further improve the external quantum efficiency.

 第2電極40を格子状の形状とする場合、各開口部41の各々の形状は正方形状に限らず、例えば、長方形状や正三角形状や正六角形状の形状としてもよい。 When the second electrode 40 has a lattice shape, the shape of each opening 41 is not limited to a square shape, and may be, for example, a rectangular shape, a regular triangle shape, or a regular hexagonal shape.

 第2電極40は、各開口部41の各々の形状が正三角形状の場合、三角格子状の形状となり、各開口部41の各々の形状が正六角形状の場合、六角格子状の形状となる。なお、第2電極40は、格子状の形状に限らず、例えば、櫛形状の形状でもよいし、2つの櫛形状の電極パターンにより構成してもよい。また、第2電極40は、開口部41の数も特に限定するものではなく、複数に限らず、1つでもよい。例えば、第2電極40を櫛形状の形状としたり、2つの櫛形状の電極パターンにより構成とした場合などは、開口部41の数を1つとすることが可能である。 The second electrode 40 has a triangular lattice shape when each of the openings 41 has a regular triangular shape, and has a hexagonal lattice shape when each of the openings 41 has a regular hexagonal shape. . The second electrode 40 is not limited to a lattice shape, and may be, for example, a comb shape or may be configured by two comb-shaped electrode patterns. Further, the number of the openings 41 is not particularly limited, and the number of the second electrodes 40 is not limited to a plurality, and may be one. For example, when the second electrode 40 has a comb shape or is configured by two comb-shaped electrode patterns, the number of openings 41 can be one.

 また、第2電極40は、例えば、図4に示すような平面形状としてもよい。すなわちこの例では、第2電極40は、平面視において、電極パターン40aにおける直線状の細線部44の線幅が一定とされている。そして、第2電極40の中央に近づくにつれて、縦方向に隣り合う細線部44,44間の間隔および横方向に隣り合う細線部44,44間の間隔が、それぞれ徐々に狭くなっている。すなわち、第2電極40は、周部から中心部に近づくにつれて開口部41の開口面積が小さくなる形状となっている。有機エレクトロルミネッセンス素子は、第2電極40の平面形状を図4のような平面形状とすることにより、図2のような平面形状とした場合に比べて、第2電極40において第2端子部47(図1参照)からの距離が周部よりも遠い中央部での発光効率を向上させることが可能となり、外部量子効率の向上を図ることが可能となる。また、有機エレクトロルミネッセンス素子は、第2電極40の平面形状を図4のような形状とすることにより、図2のような平面形状とした場合に比べて、機能層30のうち第1端子部および第2端子部47からの距離が近い周部での電流集中を抑制することが可能となるから、長寿命化を図ることが可能となる。 Further, the second electrode 40 may have a planar shape as shown in FIG. 4, for example. That is, in this example, the second electrode 40 has a constant line width of the linear thin line portion 44 in the electrode pattern 40a in plan view. As the center of the second electrode 40 is approached, the interval between the fine line portions 44 and 44 adjacent in the vertical direction and the interval between the fine line portions 44 and 44 adjacent in the horizontal direction are gradually reduced. That is, the second electrode 40 has a shape in which the opening area of the opening 41 becomes smaller as the distance from the peripheral part approaches the center part. In the organic electroluminescence element, the second electrode 40 has a planar shape as shown in FIG. 4, so that the second terminal portion 47 in the second electrode 40 is compared with the planar shape as shown in FIG. 2. It becomes possible to improve the light emission efficiency in the central part far from the peripheral part (see FIG. 1), and to improve the external quantum efficiency. Further, the organic electroluminescence element has the first terminal portion of the functional layer 30 as compared with the case where the planar shape as shown in FIG. 2 is obtained by making the planar shape of the second electrode 40 as shown in FIG. In addition, since it is possible to suppress current concentration in the peripheral portion where the distance from the second terminal portion 47 is short, it is possible to extend the life.

 また、第2電極40は、例えば、図5に示すような平面形状としてもよい。すなわち、この図示例では、第2電極40は、第2電極40の最外周にあって外枠を形成する4つの第1細線部42と、上記外枠の内側において第1の方向(図5の上下方向)に延びる1つの第2細線部43と、上記外枠の内側において第1の方向と交差する第2の方向(図5の左右方向)に延びる複数の細線部(第3細線部)44とを備える。そして第2電極40は、平面視において、第1細線部42の線幅と、図5において左右方向の中央にある1つの第2細線部43の線幅とを、第1細線部42と第2細線部43との間にある第3細線部44の線幅よりも幅広としてある。有機エレクトロルミネッセンス素子は、第2電極40を図5のような平面形状とすることにより、図2のような平面形状の場合に比べて、第2電極40において第2端子部47(図1参照)からの距離が周部よりも遠い中央部での発光効率を向上させることが可能となり、外部量子効率の向上を図ることが可能となる。なお、第2電極40は、図5のような平面形状とする場合、相対的に線幅の広い第1細線部42および第2細線部43の高さを第3細線部44の高さよりも高くすることにより、第1細線部42および第2細線部43それぞれの、より一層の低抵抗化を図ることが可能となる。 Further, the second electrode 40 may have a planar shape as shown in FIG. 5, for example. In other words, in the illustrated example, the second electrode 40 has four first fine wire portions 42 that form the outer frame on the outermost periphery of the second electrode 40, and a first direction (FIG. 5) inside the outer frame. And a plurality of thin wire portions (third thin wire portions) extending in a second direction (the left-right direction in FIG. 5) intersecting the first direction inside the outer frame. 44). The second electrode 40 has a line width of the first thin line portion 42 and a line width of one second thin line portion 43 at the center in the left-right direction in FIG. It is wider than the line width of the third thin line portion 44 between the two thin line portions 43. In the organic electroluminescence element, the second electrode 40 has a planar shape as shown in FIG. 5, so that the second terminal portion 47 (see FIG. 1) of the second electrode 40 is compared with the planar shape as shown in FIG. 2. It is possible to improve the light emission efficiency in the central part far from the peripheral part, and it is possible to improve the external quantum efficiency. When the second electrode 40 has a planar shape as shown in FIG. 5, the height of the first thin wire portion 42 and the second thin wire portion 43 having a relatively wide line width is set higher than the height of the third thin wire portion 44. By increasing the height, the resistance of each of the first thin wire portion 42 and the second thin wire portion 43 can be further reduced.

 また、導電性層50は、上述のように、第2キャリア注入機能(ここでは、ホール注入機能)と光透過性とを有する。このような導電性層50は、例えば、導電性ナノ構造体と導電性高分子とにより形成することができる。導電性層50は、例えば、導電性ナノ構造体と透明媒体とを含む透明導電膜から形成される。また、ホール注入機能を備えた導電性層50は、ホール注入層の材料に導電性ナノ構造体を混合させた複合膜により構成することもできる。この導電性層50の導電性は、第2電極40のそれよりも低くしてある。また、この導電性層50の導電性は、第2キャリア注入層34のそれよりも高くしてある。 Further, as described above, the conductive layer 50 has a second carrier injection function (here, a hole injection function) and light transmittance. Such a conductive layer 50 can be formed of, for example, a conductive nanostructure and a conductive polymer. The conductive layer 50 is formed from, for example, a transparent conductive film including a conductive nanostructure and a transparent medium. In addition, the conductive layer 50 having a hole injection function can be formed of a composite film in which a conductive nanostructure is mixed with the material of the hole injection layer. The conductivity of the conductive layer 50 is lower than that of the second electrode 40. The conductivity of the conductive layer 50 is higher than that of the second carrier injection layer 34.

 この導電性層50は、第2電極40から機能層30への第2キャリアの注入経路としての機能を有している。第2キャリアは、第2電極40が陽極の場合、正孔であり、第2電極40が陰極の場合、電子である。ここで、導電性層50がなくて第2電極40直下が機能層30の一部であり、導電性層50の代わりに開口部41が電気絶縁性の封止部90の一部により埋め込まれている場合には、第2電極40から機能層30への第2キャリアの注入は、第2電極40と機能層30との接している界面のみを通して行われるものと推測される。これに対して、導電性層50を設けた場合には、第2電極40から機能層30への第2キャリアの注入は、第2電極40と機能層30との界面を通る第1経路と、第2電極40と導電性層50との界面および導電性層50と機能層30との界面を通る第2経路との両方で行われることとなる。 The conductive layer 50 functions as a second carrier injection path from the second electrode 40 to the functional layer 30. The second carrier is a hole when the second electrode 40 is an anode, and an electron when the second electrode 40 is a cathode. Here, the conductive layer 50 is not present, and the part immediately below the second electrode 40 is a part of the functional layer 30, and the opening 41 is buried by a part of the electrically insulating sealing part 90 instead of the conductive layer 50. In this case, it is assumed that the injection of the second carrier from the second electrode 40 to the functional layer 30 is performed only through the interface between the second electrode 40 and the functional layer 30. On the other hand, when the conductive layer 50 is provided, the injection of the second carrier from the second electrode 40 to the functional layer 30 is performed by the first path passing through the interface between the second electrode 40 and the functional layer 30. This is performed both in the interface between the second electrode 40 and the conductive layer 50 and in the second path passing through the interface between the conductive layer 50 and the functional layer 30.

 ここで、本実施形態の有機エレクトロルミネッセンス素子では、機能層30における第2電極40側の最表層である第1キャリアブロッキング層33に関して、開口部41の投影領域の厚みが、第2電極40の投影領域の厚みよりも薄くなっている。そのうえ、有機エレクトロルミネッセンス素子は、導電性層50に関して、第1キャリアブロッキング層33に比べて導電性を高く且つ第2キャリアの注入性を高くしてある。しかして、本実施形態の有機エレクトロルミネッセンス素子では、第2電極40から機能層30への第2キャリアの注入に関して、第2経路を通るキャリア注入が、第1経路を通るキャリア注入よりも優先的に行われるものと推測される。すなわち、第1キャリアブロッキング層33に凹部38を設けたことで、凹部38がない場合に比べて第2経路の抵抗率が低くなる。これにより第2キャリアは、第2経路を通って、発光層32へ注入されやすくなる。従って第2キャリアは、第2電極40の投影領域ではなく開口部41の投影領域で、発光層32側へ向かって流れやすくなる。このため、発光層32においても、第2電極40の投影領域ではなく開口部41の投影領域で発光しやすくなる。よって、本実施形態の有機エレクトロルミネッセンス素子では、発光層32から放射された光のうちで第2電極40によって遮られる光の割合が減少するので、外部量子効率を向上させることができる。また、第1キャリアブロッキング層33に凹部38を設けたことで、第2キャリアは、発光層32へ向かって移動する際に、第2電極40から導電性層50の面内方向(図1の左右および前後方向)へ移動しやすくなる。従って、発光層32に流れる電流の面内ばらつきを低減することができる。ここで、導電性層50の抵抗率が低いほど、第2電極40から横方向(図1の左右および前後方向)への通電性が向上し、発光層32に流れる電流の面内ばらつきを低減することが可能となり、輝度むらを低減することが可能となる。 Here, in the organic electroluminescence element of the present embodiment, with respect to the first carrier blocking layer 33 that is the outermost layer on the second electrode 40 side in the functional layer 30, the thickness of the projection region of the opening 41 is the second electrode 40. It is thinner than the thickness of the projection area. In addition, the organic electroluminescence element has higher conductivity and higher injectability of the second carrier with respect to the conductive layer 50 than the first carrier blocking layer 33. Thus, in the organic electroluminescence element of the present embodiment, with respect to the injection of the second carrier from the second electrode 40 to the functional layer 30, the carrier injection through the second path has priority over the carrier injection through the first path. It is estimated that That is, by providing the recess 38 in the first carrier blocking layer 33, the resistivity of the second path is lower than when there is no recess 38. Thereby, the second carriers are easily injected into the light emitting layer 32 through the second path. Therefore, the second carrier tends to flow toward the light emitting layer 32 in the projection region of the opening 41 rather than the projection region of the second electrode 40. For this reason, also in the light emitting layer 32, it becomes easy to light-emit in the projection area | region of the opening part 41 instead of the projection area | region of the 2nd electrode 40. FIG. Therefore, in the organic electroluminescence element of the present embodiment, the proportion of light blocked by the second electrode 40 in the light emitted from the light emitting layer 32 is reduced, so that the external quantum efficiency can be improved. Further, by providing the concave portion 38 in the first carrier blocking layer 33, the second carrier moves from the second electrode 40 to the in-plane direction of the conductive layer 50 (in FIG. 1) when moving toward the light emitting layer 32. Left and right and front and rear direction). Therefore, in-plane variation of the current flowing through the light emitting layer 32 can be reduced. Here, the lower the resistivity of the conductive layer 50, the better the electrical conductivity from the second electrode 40 in the lateral direction (left and right and front and rear in FIG. 1), and the in-plane variation of the current flowing through the light emitting layer 32 is reduced. It is possible to reduce luminance unevenness.

 導電性ナノ構造体としては、導電性ナノ粒子や、導電性ナノワイヤなどを用いることができる。なお、導電性ナノ粒子の粒子径は1~100nmであることが好ましい。また、導電性ナノワイヤの直径は1~100nmであることが好ましい。 As the conductive nanostructure, conductive nanoparticles, conductive nanowires, or the like can be used. The particle diameter of the conductive nanoparticles is preferably 1 to 100 nm. The diameter of the conductive nanowire is preferably 1 to 100 nm.

 導電性ナノ構造体の材料としては、例えば、銀、金、ITO、IZOなどを採用することができる。透明媒体であるバインダとしては、例えば、アクリル樹脂、ポリエチレン、ポリプロピレン、ポリエチレンテレフタレート、ポリメチルメタクリレート、ポリスチレン、ポリエーテルスルホン、ポリアリレート、ポリカーボネート樹脂、ポリウレタン、ポリアクリルニトリル、ポリビニルアセタール、ポリアミド、ポリイミド、ジアクリルフタレート樹脂、セルロース系樹脂、ポリ塩化ビニル、ポリ塩化ビニリデン、ポリ酢酸ビニル、その他の熱可塑性樹脂や、これらの樹脂を構成する単量体の2種以上の共重合体が挙げられるが、これらに限定されるものではない。ただし、バインダとしては、ポリチオフェン、ポリアニリン、ポリピロール、ポリフェニレン、ポリフェニレンビニレン、ポリアセチレン、ポリカルバゾールなどの導電性高分子を用いることが好ましい。これらは単独で用いてもよいし、組み合わせて用いてもよい。導電性層50は、バインダとして導電性高分子を採用することによって、導電性を、より向上させることが可能となる。また、バインダとしては、導電性を高めるために、例えば、スルホン酸、ルイス酸、プロトン酸、アルカリ金属、アルカリ土類金属などのドーパントをドーピングしたものを採用してもよい。 As the material for the conductive nanostructure, for example, silver, gold, ITO, IZO and the like can be employed. Examples of the binder that is a transparent medium include acrylic resin, polyethylene, polypropylene, polyethylene terephthalate, polymethyl methacrylate, polystyrene, polyethersulfone, polyarylate, polycarbonate resin, polyurethane, polyacrylonitrile, polyvinyl acetal, polyamide, polyimide, diethylene. Examples include acrylic phthalate resin, cellulose resin, polyvinyl chloride, polyvinylidene chloride, polyvinyl acetate, other thermoplastic resins, and copolymers of two or more monomers constituting these resins. It is not limited to. However, it is preferable to use a conductive polymer such as polythiophene, polyaniline, polypyrrole, polyphenylene, polyphenylene vinylene, polyacetylene, polycarbazole as the binder. These may be used alone or in combination. The conductive layer 50 can further improve conductivity by adopting a conductive polymer as a binder. Moreover, as a binder, in order to improve electroconductivity, you may employ | adopt what doped dopants, such as a sulfonic acid, a Lewis acid, a proton acid, an alkali metal, an alkaline-earth metal, for example.

 また、上述のホール注入層の材料としては、例えば、チオフェン、トリフェニルメタン、ヒドラゾリン、アミールアミン、ヒドラゾン、スチルベン、トリフェニルアミンなどを含む有機材料が挙げられる。具体的には、たとえば、ポリビニルカルバゾール、ポリエチレンジオキシチオフェン:ポリスチレンスルホネート(PEDOT:PSS)、TPDなどの芳香族アミン誘導体などで、これらの材料を単独で用いてもよいし、2種類以上の材料を組み合わせて用いてもよい。 Further, examples of the material for the hole injection layer include organic materials including thiophene, triphenylmethane, hydrazoline, amyramine, hydrazone, stilbene, triphenylamine, and the like. Specifically, for example, polyvinyl carbazole, polyethylenedioxythiophene: polystyrene sulfonate (PEDOT: PSS), aromatic amine derivatives such as TPD, etc., these materials may be used alone, or two or more kinds of materials. May be used in combination.

 上述の導電性層50は、塗布法(スプレーコート法、ダイコート法、グラビア印刷法、スクリーン印刷法など)のような湿式プロセスによって成膜することができる。 The conductive layer 50 described above can be formed by a wet process such as a coating method (spray coating method, die coating method, gravure printing method, screen printing method, etc.).

 また、導電性層50は、第1キャリアブロッキング層33上に形成されたホール注入層と、ホール注入層上に形成された光透過性を有する導電性層と、の積層構造から構成されてもよい。この場合、ホール注入層の厚みは、凹部38の深さ寸法よりも小さいことが好ましい。 Further, the conductive layer 50 may be configured by a stacked structure of a hole injection layer formed on the first carrier blocking layer 33 and a light-transmitting conductive layer formed on the hole injection layer. Good. In this case, the thickness of the hole injection layer is preferably smaller than the depth dimension of the recess 38.

 以上説明したように、本実施形態の有機エレクトロルミネッセンス素子では、第1電極20および第2電極40それぞれの抵抗率が、透明導電性酸化物の抵抗率よりも低く、第2電極40には、機能層30からの光取出し用の開口部41が形成されている。さらに、本実施形態の有機エレクトロルミネッセンス素子は、機能層30が、発光層32よりも第2電極40側にある最表層として、第1電極20から機能層30に注入される第1キャリアの第2電極40側への漏れを抑制する第1キャリアブロッキング層33を含んでいる。また、本実施形態の有機エレクトロルミネッセンス素子は、第2電極40と機能層30(第1キャリアブロッキング層33)とに接し且つ第2キャリア注入機能と光透過性とを有する導電性層50が設けられている。また、本実施形態の有機エレクトロルミネッセンス素子では、導電性層50が、第2電極40を覆い、第1キャリアブロッキング層33には、開口部41の投影領域に凹部38が設けられている。しかして、本実施形態の有機エレクトロルミネッセンス素子では、輝度むらの低減を図ることが可能で且つ外部量子効率の向上を図ることが可能となる。ここで、本実施形態の有機エレクトロルミネッセンス素子では、導電性層50が、第2電極40を覆っていることにより、第2電極40から導電性層50への第2キャリアの注入性を、より向上させることが可能となる。 As described above, in the organic electroluminescence element of this embodiment, the resistivity of each of the first electrode 20 and the second electrode 40 is lower than the resistivity of the transparent conductive oxide, An opening 41 for extracting light from the functional layer 30 is formed. Furthermore, in the organic electroluminescence element of the present embodiment, the functional layer 30 is the outermost layer on the second electrode 40 side with respect to the light emitting layer 32, and the first carrier injected from the first electrode 20 into the functional layer 30 is the first layer. The 1st carrier blocking layer 33 which suppresses the leak to the 2 electrode 40 side is included. Moreover, the organic electroluminescent element of this embodiment is provided with the conductive layer 50 that is in contact with the second electrode 40 and the functional layer 30 (first carrier blocking layer 33) and has the second carrier injection function and light transmittance. It has been. In the organic electroluminescence element of this embodiment, the conductive layer 50 covers the second electrode 40, and the first carrier blocking layer 33 is provided with a recess 38 in the projection region of the opening 41. Therefore, in the organic electroluminescence element of this embodiment, it is possible to reduce luminance unevenness and to improve external quantum efficiency. Here, in the organic electroluminescence element of the present embodiment, since the conductive layer 50 covers the second electrode 40, the second carrier 40 can be more injected from the second electrode 40 to the conductive layer 50. It becomes possible to improve.

 この有機エレクトロルミネッセンス素子においては、凹部38における発光層32から導電性層50の表面までの高さ(第1高さ)が、発光層32から第2電極40の先端までの高さ(第2高さ)よりも低いことが好ましい。ここで、図3の例について説明すれば、第1高さは、第1キャリアブロッキング層33における凹部38の内底面・発光層32間の膜厚と凹部38の内底面上の導電性層50の膜厚との合計値である。また、第2高さは、第1キャリアブロッキング層50における第2電極40の投影領域の膜厚と第2電極40の高さH1との合計値である。有機エレクトロルミネッセンス素子は、上述のように第1高さが第2高さよりも低いことにより、導電性層50内での光損失を低減することが可能となり、外部量子効率の向上を図ることが可能となる。なお、導電性層50の膜厚と凹部38の深さ寸法との大小関係は特に限定するものではない。 In this organic electroluminescence element, the height (first height) from the light emitting layer 32 to the surface of the conductive layer 50 in the recess 38 is the height (second height) from the light emitting layer 32 to the tip of the second electrode 40. Preferably, the height is lower than (height). Here, the example of FIG. 3 will be described. The first height is the thickness between the inner bottom surface of the recess 38 and the light emitting layer 32 in the first carrier blocking layer 33 and the conductive layer 50 on the inner bottom surface of the recess 38. The total value with the film thickness. The second height is a total value of the film thickness of the projection region of the second electrode 40 in the first carrier blocking layer 50 and the height H1 of the second electrode 40. As described above, the organic electroluminescence element has the first height lower than the second height, so that the optical loss in the conductive layer 50 can be reduced, and the external quantum efficiency can be improved. It becomes possible. The magnitude relationship between the film thickness of the conductive layer 50 and the depth dimension of the recess 38 is not particularly limited.

 (実施形態2)
 本実施形態の有機エレクトロルミネッセンス素子は、実施形態1と略同じであり、図6に示すように、凹部38の形状が相違するだけである。なお、実施形態1と同様の構成要素には同一の符号を付して説明を適宜省略する。
(Embodiment 2)
The organic electroluminescence element of this embodiment is substantially the same as that of Embodiment 1, and only the shape of the recess 38 is different as shown in FIG. In addition, the same code | symbol is attached | subjected to the component similar to Embodiment 1, and description is abbreviate | omitted suitably.

 凹部38は、第1キャリアブロッキング層33の厚み方向において第2電極40から離れるにつれて、第2電極40の投影領域から当該投影領域に近い内側面38aまでの距離が長くなる形状に形成されてなる。図3に示した例では、凹部38が、断面矩形状に形成されているのに対し、図6に示した例では、凹部38が、断面逆台形状に形成されている。 The concave portion 38 is formed in a shape in which the distance from the projection region of the second electrode 40 to the inner side surface 38a close to the projection region increases as the distance from the second electrode 40 increases in the thickness direction of the first carrier blocking layer 33. . In the example shown in FIG. 3, the concave portion 38 is formed in a rectangular cross section, whereas in the example shown in FIG. 6, the concave portion 38 is formed in an inverted trapezoidal shape.

 本実施形態の有機エレクトロルミネッセンス素子では、上述のように、凹部38が、第1キャリアブロッキング層33の厚み方向において第2電極40から離れるにつれて、第2電極40の投影領域から当該投影領域に近い内側面38aまでの距離が長くなる形状に形成されている。言い換えれば、本実施形態の有機エレクトロルミネッセンス素子では、開口部41の投影領域における第1キャリアブロッキング層33の厚みが、第2電極40から離れるにつれて薄くなっている。これにより、本実施形態の有機エレクトロルミネッセンス素子では、第1キャリアブロッキング層33における開口部41の投影領域に関して、第2電極40の投影領域からの距離が変化している領域を、膜厚が徐々に薄くなる膜厚変化部として設けていることになる。ここにおいて、第1キャリアブロッキング層33は、第2電極40に近いほど第2キャリアを通しやすいが、膜厚が大きいほど第2キャリアを通しにくくなるので、第1キャリアブロッキング層33における開口部41の投影領域へのキャリア注入量の均一性を向上させることが可能となり、輝度むらを、より低減することが可能となる。 In the organic electroluminescence element of the present embodiment, as described above, as the concave portion 38 moves away from the second electrode 40 in the thickness direction of the first carrier blocking layer 33, the projection region of the second electrode 40 is closer to the projection region. It is formed in a shape that increases the distance to the inner side surface 38a. In other words, in the organic electroluminescence element of this embodiment, the thickness of the first carrier blocking layer 33 in the projection region of the opening 41 becomes thinner as the distance from the second electrode 40 increases. Thereby, in the organic electroluminescent element of this embodiment, the film thickness is gradually increased in the region where the distance from the projection region of the second electrode 40 is changed with respect to the projection region of the opening 41 in the first carrier blocking layer 33. Therefore, it is provided as a film thickness changing portion that becomes thinner. Here, the first carrier blocking layer 33 is more likely to pass the second carrier as it is closer to the second electrode 40, but the second carrier is less likely to pass as the film thickness is larger, so the opening 41 in the first carrier blocking layer 33. It is possible to improve the uniformity of the carrier injection amount into the projection area, and to further reduce the luminance unevenness.

 なお図6では、第1キャリアブロッキング層33は、第2電極40の幅方向(図6の左右方向)において第2電極40から所定距離以上離れた場所では、厚みが一定となるよう図示されている。しかし、第1キャリアブロッキング層33は、第2電極40からの距離とともにその厚みが徐々に薄くなる形状であってもよい。また、凹部38の内側面38aの形状は、図6に示すような平面状に限られず、曲面状であってもよい。たとえば、凹部38の断面形状が、かまぼこ形などであってもよい。 In FIG. 6, the first carrier blocking layer 33 is shown to have a constant thickness at a location that is a predetermined distance or more away from the second electrode 40 in the width direction of the second electrode 40 (left-right direction in FIG. 6). Yes. However, the first carrier blocking layer 33 may have a shape in which the thickness gradually decreases with the distance from the second electrode 40. Further, the shape of the inner side surface 38a of the concave portion 38 is not limited to the planar shape as shown in FIG. 6, and may be a curved surface shape. For example, the cross-sectional shape of the recess 38 may be a kamaboko shape.

 実施形態1,2で説明した有機エレクトロルミネッセンス素子は、例えば、照明用の有機エレクトロルミネッセンス素子として好適に用いることができるが、照明用に限らず、他の用途に用いることも可能である。 The organic electroluminescence element described in the first and second embodiments can be suitably used as an organic electroluminescence element for illumination, for example, but is not limited to illumination and can be used for other purposes.

 なお、実施形態1,2において説明した各図は、模式的なものであり、各構成要素の大きさや厚さそれぞれの比が、必ずしも実際のものの寸法比を反映しているとは限らない。 In addition, each figure demonstrated in Embodiment 1, 2 is typical, and the ratio of each magnitude | size and thickness of each component does not necessarily reflect the dimensional ratio of an actual thing.

 本発明を幾つかの好ましい実施形態について記述したが、この発明の本来の精神および範囲、即ち請求の範囲を逸脱することなく、当業者によって様々な修正および変形が可能である。


                                                                                
                                 
While the invention has been described in terms of several preferred embodiments, various modifications and variations can be made by those skilled in the art without departing from the true spirit and scope of the invention, ie, the claims.



Claims (5)

 基板と、前記基板の一表面側に設けられた第1電極と、前記基板の前記一表面側で前記第1電極に対向した第2電極と、前記第1電極と前記第2電極との間にあり発光層を含む機能層とを備えた有機エレクトロルミネッセンス素子であって、
 前記第1電極および前記第2電極それぞれの抵抗率が、透明導電性酸化物の抵抗率よりも低く、
 前記機能層が、前記発光層よりも前記第2電極側にある最表層として、前記第1電極から前記機能層に注入される第1キャリアの前記第2電極側への漏れを抑制する第1キャリアブロッキング層を含み、
 前記第2電極には、前記機能層からの光取出し用の開口部が形成され、前記開口部には、前記第2電極と前記機能層とに接し且つ第2キャリア注入機能と光透過性とを有する導電性層が設けられ、
 前記導電性層が、前記第2電極を覆い、
 前記第1キャリアブロッキング層は、前記開口部の投影領域に凹部が設けられてなることを特徴とする有機エレクトロルミネッセンス素子。
A substrate, a first electrode provided on one surface side of the substrate, a second electrode facing the first electrode on the one surface side of the substrate, and between the first electrode and the second electrode And an organic electroluminescence device comprising a functional layer including a light emitting layer,
Resistivity of each of the first electrode and the second electrode is lower than the resistivity of the transparent conductive oxide,
As the outermost layer on the second electrode side of the light emitting layer, the functional layer is a first layer that suppresses leakage of the first carriers injected from the first electrode into the functional layer toward the second electrode side. Including a carrier blocking layer,
An opening for extracting light from the functional layer is formed in the second electrode. The opening is in contact with the second electrode and the functional layer, and has a second carrier injection function and light transmittance. A conductive layer is provided,
The conductive layer covers the second electrode;
The organic electroluminescence device according to claim 1, wherein the first carrier blocking layer is provided with a recess in a projection region of the opening.
 前記凹部は、前記第1キャリアブロッキング層の厚み方向において前記第2電極から離れるにつれて、前記第2電極の投影領域から前記投影領域に近い内側面までの距離が長くなる形状に形成されてなることを特徴とする請求項1記載の有機エレクトロルミネッセンス素子。 The recess is formed in a shape in which the distance from the projection region of the second electrode to the inner surface near the projection region becomes longer as the distance from the second electrode increases in the thickness direction of the first carrier blocking layer. The organic electroluminescent element according to claim 1.  前記第2電極は、金属の粉末と有機バインダとを含む電極からなることを特徴とする請求項1または請求項2記載の有機エレクトロルミネッセンス素子。 3. The organic electroluminescence device according to claim 1, wherein the second electrode is made of an electrode containing a metal powder and an organic binder.  前記導電性層は、導電性ナノ構造体と透明媒体とを含む透明導電膜からなることを特徴とする請求項1ないし請求項3のいずれか1項に記載の有機エレクトロルミネッセンス素子。 The organic electroluminescent element according to any one of claims 1 to 3, wherein the conductive layer is made of a transparent conductive film including a conductive nanostructure and a transparent medium.  前記第1キャリアブロッキング層は、前記開口部の投影領域の厚みが、前記第2電極の投影領域の厚みよりも、薄いことを特徴とする請求項1記載の有機エレクトロルミネッセンス素子。 The organic electroluminescence device according to claim 1, wherein the first carrier blocking layer has a thickness of a projection region of the opening that is thinner than a thickness of a projection region of the second electrode.
PCT/JP2012/062255 2011-05-20 2012-05-14 Organic electroluminescence element Ceased WO2012161005A1 (en)

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JP2008135259A (en) * 2006-11-28 2008-06-12 Toppan Printing Co Ltd Organic EL display panel and manufacturing method thereof
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JP2010033936A (en) * 2008-07-30 2010-02-12 Toshiba Corp Self-luminous element and method of manufacturing the same
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JP2003092191A (en) * 2001-07-11 2003-03-28 Semiconductor Energy Lab Co Ltd Light emitting device and manufacturing method thereof
JP2008153237A (en) * 2004-07-22 2008-07-03 Sharp Corp ORGANIC LIGHT EMITTING ELEMENT AND DISPLAY DEVICE INCLUDING THE SAME
JP2006331920A (en) * 2005-05-27 2006-12-07 Fujifilm Holdings Corp Vapor deposition mask, organic electroluminescence display device, and manufacturing method thereof
JP2008135259A (en) * 2006-11-28 2008-06-12 Toppan Printing Co Ltd Organic EL display panel and manufacturing method thereof
JP2010033936A (en) * 2008-07-30 2010-02-12 Toshiba Corp Self-luminous element and method of manufacturing the same
JP2010153071A (en) * 2008-12-24 2010-07-08 Seiko Epson Corp El device and method of manufacturing the same

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