WO2012165799A3 - 가스 채널을 구비한 수중 모세관 플라즈마 장치 - Google Patents

가스 채널을 구비한 수중 모세관 플라즈마 장치 Download PDF

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Publication number
WO2012165799A3
WO2012165799A3 PCT/KR2012/004073 KR2012004073W WO2012165799A3 WO 2012165799 A3 WO2012165799 A3 WO 2012165799A3 KR 2012004073 W KR2012004073 W KR 2012004073W WO 2012165799 A3 WO2012165799 A3 WO 2012165799A3
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WIPO (PCT)
Prior art keywords
gas
plasma
capillary tube
underwater
injected
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Ceased
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PCT/KR2012/004073
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English (en)
French (fr)
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WO2012165799A2 (ko
Inventor
홍용철
김예진
이상주
이봉주
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Korea Basic Science Institute KBSI
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Korea Basic Science Institute KBSI
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Publication date
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Priority to CN201280026758.1A priority Critical patent/CN103635434B/zh
Priority to EP12792771.3A priority patent/EP2716606B1/en
Priority to ES12792771T priority patent/ES2765052T3/es
Publication of WO2012165799A2 publication Critical patent/WO2012165799A2/ko
Publication of WO2012165799A3 publication Critical patent/WO2012165799A3/ko
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/467—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/4608—Treatment of water, waste water, or sewage by electrochemical methods using electrical discharges
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H05H1/486—Arrangements to provide capillary discharges
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/47—Generating plasma using corona discharges
    • H05H1/471—Pointed electrodes
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/04—Disinfection
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2305/00—Use of specific compounds during water treatment
    • C02F2305/02—Specific form of oxidant
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/30—Medical applications
    • H05H2245/36—Sterilisation of objects, liquids, volumes or surfaces

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  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

가스 채널을 구비한 수중 모세관 플라즈마 장치가 개시된다. 본 발명의 일 실시예에 따른 수중 모세관 플라즈마 장치는, 전원을 공급하는 전원 공급부; 상기 전원 공급부에서 공급된 전원을 인가받아 유체 내부에 모세관 플라즈마 방전을 일으키는 방전 전극; 및 상기 방전 전극에 보조 가스를 주입하는 가스 공급부를 포함한다. 본 발명의 실시예들에 따를 경우 수중 모세관 플라즈마 방전 전극에 가스 채널을 구비함으로써 플라즈마 방전으로 인한 물 분해로부터 생성되는 플라즈마 종들 뿐만 아니라, 주입한 가스에 따라 다양한 화학적 활성종를 생성함으로써 수중 오염물질을 효과적으로 제거할 수 있다. 또한, 본 발명과 같이 가스를 함께 주입할 경우 플라즈마 방전에 의하여 생성된 활성종들의 농도 및 유체 내 체류 시간을 증가시키게 되므로, 플라즈마에 의한 정화 효과가 극대화될 수 있다. 또한, 이와 같이 보조 가스를 공급할 경우 가스를 주입하지 않을 경우와 비교하여 더 낮은 전력 공급으로도 플라즈마 발생이 가능하므로, 유체 정화를 위한 에너지 소비를 감소시킬 수 있다.
PCT/KR2012/004073 2011-05-31 2012-05-23 가스 채널을 구비한 수중 모세관 플라즈마 장치 Ceased WO2012165799A2 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN201280026758.1A CN103635434B (zh) 2011-05-31 2012-05-23 具有气体通道的水下毛细管等离子体装置
EP12792771.3A EP2716606B1 (en) 2011-05-31 2012-05-23 Underwater capillary plasma device
ES12792771T ES2765052T3 (es) 2011-05-31 2012-05-23 Dispositivo de plasma capilar sumergible

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020110052089A KR101266157B1 (ko) 2011-05-31 2011-05-31 가스 채널을 구비한 수중 모세관 플라즈마 장치
KR10-2011-0052089 2011-05-31

Publications (2)

Publication Number Publication Date
WO2012165799A2 WO2012165799A2 (ko) 2012-12-06
WO2012165799A3 true WO2012165799A3 (ko) 2013-02-21

Family

ID=47260028

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/004073 Ceased WO2012165799A2 (ko) 2011-05-31 2012-05-23 가스 채널을 구비한 수중 모세관 플라즈마 장치

Country Status (5)

Country Link
EP (1) EP2716606B1 (ko)
KR (1) KR101266157B1 (ko)
CN (1) CN103635434B (ko)
ES (1) ES2765052T3 (ko)
WO (1) WO2012165799A2 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111405739A (zh) * 2020-03-06 2020-07-10 大连理工大学 一种大气压毛细管内均匀放电微等离子体发生装置

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101428525B1 (ko) * 2012-12-27 2014-08-11 한국기초과학지원연구원 수중 종자 플라즈마 처리 방법
KR101575693B1 (ko) * 2014-01-29 2015-12-21 한국기초과학지원연구원 플라즈마 수처리 장치
CN105883966A (zh) * 2014-12-24 2016-08-24 苏州超等环保科技有限公司 一种水处理高效等离子负载
CN105884063A (zh) * 2015-06-04 2016-08-24 庞浩辉 一种废水再生纯净水系统装置
CN105565447B (zh) * 2015-11-06 2018-05-08 济宁普悦环保科技有限公司 节能灭菌水池
KR101709644B1 (ko) * 2015-12-21 2017-02-23 에스케이건설 주식회사 과산화수소를 생성하는 수처리 장치
CN106007046B (zh) * 2016-05-10 2019-06-11 上海电力学院 一种脱硫废水硬度离子资源化预处理工艺
CN105948300B (zh) * 2016-07-26 2019-01-11 上海能洲环保科技有限公司 储能即热式安全热饮机
US10822255B2 (en) 2017-07-14 2020-11-03 Doosan Heavy Industries & Construction Co., Ld Water treatment apparatus using underwater plasma discharge and water treatment system including same
KR101953691B1 (ko) 2018-05-29 2019-03-04 이석 수중 유전체 장벽 방전 플라즈마 발생 장치
KR101984437B1 (ko) 2018-12-26 2019-05-30 김숙 플라즈마 수처리장치
CN109761304B (zh) * 2019-03-05 2024-07-02 成都科衡环保技术有限公司 用于水处理的微波等离子体发生模块、反应器及其应用
KR102219915B1 (ko) * 2019-04-10 2021-02-23 부산대학교 산학협력단 가스-액체 계면 플라즈마 공정을 이용한 술폰화된 고체산 촉매의 제조방법
KR102106879B1 (ko) * 2019-06-07 2020-05-07 한국기초과학지원연구원 플라즈마 발생장치 및 이를 구비한 수처리 시스템
CN110418484B (zh) * 2019-08-30 2020-11-06 西安交通大学 一种空气射流放电产生装置
KR102479272B1 (ko) * 2020-03-26 2022-12-20 한국핵융합에너지연구원 플라즈마 방전수를 이용한 방역 시스템 및 플라즈마 방전수를 액적으로 분무하는 분무노즐
KR102458891B1 (ko) * 2020-10-19 2022-10-24 가톨릭대학교 산학협력단 내시경 채널 소독 장치
CN114513890A (zh) * 2022-04-19 2022-05-17 北京大学第三医院（北京大学第三临床医学院） 一种高能量利用率的等离子体杀菌装置和应用
KR20250116422A (ko) * 2024-01-25 2025-08-01 한국기계연구원 플라즈마 수처리 장치, 이를 포함하는 플라즈마를 이용한 폐수 정화 시스템, 및 플라즈마를 이용한 폐수 정화 방법

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111405739A (zh) * 2020-03-06 2020-07-10 大连理工大学 一种大气压毛细管内均匀放电微等离子体发生装置

Also Published As

Publication number Publication date
CN103635434A (zh) 2014-03-12
KR20120133454A (ko) 2012-12-11
WO2012165799A2 (ko) 2012-12-06
EP2716606A4 (en) 2014-11-05
ES2765052T3 (es) 2020-06-05
KR101266157B1 (ko) 2013-05-21
CN103635434B (zh) 2016-01-20
EP2716606B1 (en) 2019-12-04
EP2716606A2 (en) 2014-04-09

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