WO2013055150A3 - 컬러필터용 감광성 수지 조성물 및 이를 사용하여 제조된 컬러필터 - Google Patents

컬러필터용 감광성 수지 조성물 및 이를 사용하여 제조된 컬러필터 Download PDF

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Publication number
WO2013055150A3
WO2013055150A3 PCT/KR2012/008316 KR2012008316W WO2013055150A3 WO 2013055150 A3 WO2013055150 A3 WO 2013055150A3 KR 2012008316 W KR2012008316 W KR 2012008316W WO 2013055150 A3 WO2013055150 A3 WO 2013055150A3
Authority
WO
WIPO (PCT)
Prior art keywords
color filter
resin composition
photosensitive resin
same
manufactured
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2012/008316
Other languages
English (en)
French (fr)
Other versions
WO2013055150A2 (ko
Inventor
김길래
김경아
박정환
김병욱
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongjin Semichem Co Ltd
Original Assignee
Dongjin Semichem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongjin Semichem Co Ltd filed Critical Dongjin Semichem Co Ltd
Priority to CN201280050041.0A priority Critical patent/CN103890658B/zh
Publication of WO2013055150A2 publication Critical patent/WO2013055150A2/ko
Publication of WO2013055150A3 publication Critical patent/WO2013055150A3/ko
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)

Abstract

본 발명은 컬러필터용 감광성 수지 조성물 및 이를 사용하여 제조된 컬러필터에 관한 것이다. 본 발명에 따른 컬러필터용 감광성 수지 조성물은 안료와 함께 특정 분광특성을 갖는 염료를 포함함에 따라, 이를 사용하여 제조된 컬러필터는 투광율, 휘도, 콘트라스트, 및 색순도가 우수할 뿐 아니라, 향상된 내열 특성을 나타내는 장점이 있다.
PCT/KR2012/008316 2011-10-13 2012-10-12 컬러필터용 감광성 수지 조성물 및 이를 사용하여 제조된 컬러필터 Ceased WO2013055150A2 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201280050041.0A CN103890658B (zh) 2011-10-13 2012-10-12 用于彩色滤光片的感光性树脂组合物及使用该组合物制成的彩色滤光片

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020110104644A KR101952252B1 (ko) 2011-10-13 2011-10-13 컬러필터용 감광성 수지 조성물 및 이를 사용하여 제조된 컬러필터
KR10-2011-0104644 2011-10-13

Publications (2)

Publication Number Publication Date
WO2013055150A2 WO2013055150A2 (ko) 2013-04-18
WO2013055150A3 true WO2013055150A3 (ko) 2013-07-04

Family

ID=48082676

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/008316 Ceased WO2013055150A2 (ko) 2011-10-13 2012-10-12 컬러필터용 감광성 수지 조성물 및 이를 사용하여 제조된 컬러필터

Country Status (4)

Country Link
KR (1) KR101952252B1 (ko)
CN (1) CN103890658B (ko)
TW (1) TW201321802A (ko)
WO (1) WO2013055150A2 (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140076320A (ko) 2012-12-12 2014-06-20 제일모직주식회사 감광성 수지 조성물 및 이를 이용한 블랙 스페이서
KR20150083384A (ko) 2014-01-09 2015-07-17 제일모직주식회사 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101750462B1 (ko) 2014-05-12 2017-06-23 제일모직 주식회사 신규한 화합물, 신규한 혼합물, 감광성 수지 조성물, 및 컬러 필터
KR101819656B1 (ko) 2014-05-13 2018-01-17 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 컬러필터
KR20170010969A (ko) * 2015-07-20 2017-02-02 이리도스 주식회사 착색 화합물, 및 이를 포함하는 착색제 물질
KR102300331B1 (ko) * 2017-03-31 2021-09-09 동우 화인켐 주식회사 청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치
CN110007561B (zh) * 2018-01-04 2022-07-19 东友精细化工有限公司 绿色感光性树脂组合物、彩色滤光片和图像显示装置
KR102400637B1 (ko) * 2019-11-04 2022-05-23 주식회사 케이디파인켐 열전달 유체용 착색제 및 이를 포함하는 조성물
KR20210073277A (ko) * 2019-12-10 2021-06-18 극동제연공업 주식회사 열전달 유체용 착색제 및 이를 포함하는 조성물

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08302224A (ja) * 1995-04-28 1996-11-19 Yamamoto Chem Inc フタロシアニン化合物、その中間体、該フタロシアニン化合物の製造方法及びこれを用いるカラーフィルター、油性インク組成物
JP2002121412A (ja) * 2000-10-17 2002-04-23 Nippon Shokubai Co Ltd 銅フタロシアニン系改質顔料およびその製造方法
JP2003161821A (ja) * 2000-12-22 2003-06-06 Mitsubishi Chemicals Corp カラーフィルター用組成物及びカラーフィルター
JP2004157455A (ja) * 2002-11-08 2004-06-03 Fuji Photo Film Co Ltd 染料含有硬化性組成物、カラーフィルタ及びその製造方法
JP2006058700A (ja) * 2004-08-20 2006-03-02 Fuji Photo Film Co Ltd 着色硬化性組成物、カラーフィルタおよびその製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08302224A (ja) * 1995-04-28 1996-11-19 Yamamoto Chem Inc フタロシアニン化合物、その中間体、該フタロシアニン化合物の製造方法及びこれを用いるカラーフィルター、油性インク組成物
JP2002121412A (ja) * 2000-10-17 2002-04-23 Nippon Shokubai Co Ltd 銅フタロシアニン系改質顔料およびその製造方法
JP2003161821A (ja) * 2000-12-22 2003-06-06 Mitsubishi Chemicals Corp カラーフィルター用組成物及びカラーフィルター
JP2004157455A (ja) * 2002-11-08 2004-06-03 Fuji Photo Film Co Ltd 染料含有硬化性組成物、カラーフィルタ及びその製造方法
JP2006058700A (ja) * 2004-08-20 2006-03-02 Fuji Photo Film Co Ltd 着色硬化性組成物、カラーフィルタおよびその製造方法

Also Published As

Publication number Publication date
CN103890658B (zh) 2017-12-05
CN103890658A (zh) 2014-06-25
TW201321802A (zh) 2013-06-01
WO2013055150A2 (ko) 2013-04-18
KR20130039949A (ko) 2013-04-23
KR101952252B1 (ko) 2019-02-26

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