WO2013122294A1 - Panneau à écran tactile ayant une couche de revêtement sous vide et procédé de revêtement sous vide d'un panneau à écran tactile - Google Patents

Panneau à écran tactile ayant une couche de revêtement sous vide et procédé de revêtement sous vide d'un panneau à écran tactile Download PDF

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Publication number
WO2013122294A1
WO2013122294A1 PCT/KR2012/004741 KR2012004741W WO2013122294A1 WO 2013122294 A1 WO2013122294 A1 WO 2013122294A1 KR 2012004741 W KR2012004741 W KR 2012004741W WO 2013122294 A1 WO2013122294 A1 WO 2013122294A1
Authority
WO
WIPO (PCT)
Prior art keywords
tio
coating layer
sio
touch screen
screen panel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2012/004741
Other languages
English (en)
Korean (ko)
Inventor
유흥상
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020120015176A external-priority patent/KR101207850B1/ko
Priority claimed from KR1020120015187A external-priority patent/KR101206347B1/ko
Application filed by Individual filed Critical Individual
Publication of WO2013122294A1 publication Critical patent/WO2013122294A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Definitions

  • the present invention has been made to solve the above problems, by forming a vacuum coating layer on the inside of the touch screen panel edge, the thickness of the edge portion can be made thin, the touch screen panel is durable, less vacuum coating layer is formed Is to provide.
  • FIG. 6 is an exploded schematic view of a vacuum coating apparatus installed with a sputter module, a linear ion source and a thermal evaporation source of the present invention.
  • FIG. 7 is a plan view schematically illustrating a vacuum coating apparatus in which a sputter module, a linear ion source, and a thermal evaporation source of the present invention are installed.
  • the present invention relates to a touch screen panel in which a vacuum coating layer is formed.
  • the touch screen panel is sequentially formed with a coating layer by a vacuum coating method on the back of the glass plate (10).
  • the center portion and the edge portion of the rear surface of the glass plate 10 are formed differently, and the center portion coating layer is formed of the SiO 2 coating layer 40 and the ITO coating layer 60 sequentially, and the edge portion coating layer is formed of TiO or TiO 2 coating layer 20.
  • the present invention relates to a vacuum coating method of a touch screen panel, the vacuum coating method of a touch screen panel for manufacturing a touch screen panel, the masking step of masking the central portion of the rear surface of the glass plate 10 for the touch screen panel; Forming a TiO or TiO 2 coating layer 20 for vacuum coating the rear edge of the glass plate 10 of the unmasked touch screen panel with TiO or TiO 2 ; On the TiO or TiO 2 coating layer (20) TiO + SiO or SiO 2 + TiO 2 vacuum coated TiO + SiO or SiO 2 + TiO TiO + SiO or SiO 2 + TiO 2 that the black coating to form a second coating layer 30 Coating layer forming step; Removing masking formed at the center portion; Forming a SiO 2 coating layer 40 by a vacuum coating method over the entire back side of the glass plate 10 including a TiO + SiO or SiO 2 + TiO 2 layer; Forming an ITO coating layer 60 on the SiO 2 coating layer 40 by a vacuum coating method.
  • FIG. 6 is a sputter of the present invention.
  • 7 is a schematic exploded view of a vacuum coating apparatus installed with a module, a linear ion source and a thermal evaporation source
  • FIG. 7 is a plan schematic view of a vacuum coating apparatus installed with a sputter module, a linear ion source and a thermal evaporation source of the present invention, and FIG. to be.
  • the sputtering method used in the present invention refers to conventional sputtering technology.
  • sputtering refers to an electric field applied to a cathode in which an ar cation (positive ion) formed in a plasma state is mounted on a sputter module. It accelerates toward the target on the cathode and collides with it, causing the atoms that make up the target to pop out.
  • the basic principle of the sputtering method and the resistance heating method is described in the registration number 20-0185068, which is a pre-applied application, the basic principle of the sputtering method and the resistance heating method.
  • the sputtered target is clamped to the cathode of the sputter module.
  • the evaporator is coated by melting and evaporating the coating material by resistance heating or electron beam method, and the sputtering target sputters and scatters the coating material to deposit the deposit.
  • the present invention forms a vacuum coating layer on the inside of the edge of the touch screen panel, so that the thickness of the edge portion can be made thin, so there is a remarkable effect of less defects and simple work process.
  • the middle portion coating layer is a SiO 2 coating layer 40 and the ITO coating layer 60 is formed sequentially, the edge portion coating layer is TiO or TiO 2 coating layer 20 is formed first, the black coating layer on the TiO or TiO 2 coating layer Phosphorus TiO + SiO or SiO 2 + TiO 2 coating layer 30 is formed, the SiO 2 coating layer 40 is formed on the TiO + SiO or SiO 2 + TiO 2 coating layer 30, and the ITO coating layer on the SiO 2 coating layer 60 is formed sequentially.
  • TiO + SiO or SiO 2 which black coating to form the TiO or TiO 2 coating layer 20 on the TiO + SiO or SiO 2 + to TiO 2 by the sputtering method TiO + SiO or SiO 2 + TiO 2 coating layer 30 + TiO 2 coating layer is formed.
  • the linear ion source of the present invention is installed on the chamber wall to perform pre-treatment and etching of the sample using Ar.
  • the sputtering method used in the present invention refers to conventional sputtering technology.
  • sputtering refers to an electric field applied to a cathode in which an ar cation (positive ion) formed in a plasma state is mounted on a sputter module. It accelerates toward the target on the cathode and collides with it, causing the atoms that make up the target to pop out.
  • the sputtering apparatus is composed of a simple two-pole electrode and causes a glow discharge while flowing argon (Ar) gas.
  • Ar argon
  • the basic principle of the sputtering method and the resistance heating method is described in the registration number 20-0185068, which is a pre-applied application, the basic principle of the sputtering method and the resistance heating method.
  • the sputtered target is clamped to the cathode of the sputter module.
  • the evaporator is coated by melting and evaporating the coating material by resistance heating or electron beam method, and the sputtering target sputters and scatters the coating material to deposit the deposit.
  • the plasma or glow discharge zone is formed by the spark of high pressure voltage supplied from the inert injection gas and the power supply device between the above discharge means.
  • the inner cylinder is rotated and the etching is performed while the discharge zone is applied to the coating portion of the coated body seated on the jig, and at the same time, the coating material melted by the sputtering target and the evaporator is scattered or sputtered. As a result, a multilayer thin film is formed on the deposit.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)
PCT/KR2012/004741 2012-02-15 2012-06-15 Panneau à écran tactile ayant une couche de revêtement sous vide et procédé de revêtement sous vide d'un panneau à écran tactile Ceased WO2013122294A1 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR10-2012-0015187 2012-02-15
KR1020120015176A KR101207850B1 (ko) 2012-02-15 2012-02-15 진공코팅층이 형성된 터치스크린 패널
KR10-2012-0015176 2012-02-15
KR1020120015187A KR101206347B1 (ko) 2012-02-15 2012-02-15 터치스크린 패널의 진공코팅방법

Publications (1)

Publication Number Publication Date
WO2013122294A1 true WO2013122294A1 (fr) 2013-08-22

Family

ID=48984391

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/004741 Ceased WO2013122294A1 (fr) 2012-02-15 2012-06-15 Panneau à écran tactile ayant une couche de revêtement sous vide et procédé de revêtement sous vide d'un panneau à écran tactile

Country Status (1)

Country Link
WO (1) WO2013122294A1 (fr)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100054673A (ko) * 2008-11-14 2010-05-25 엘지이노텍 주식회사 터치 스크린 및 그 제조방법
KR20110041821A (ko) * 2009-10-16 2011-04-22 엘지이노텍 주식회사 터치패널용 면상 부재 및 이의 제조 방법
KR20110104225A (ko) * 2010-03-16 2011-09-22 삼성모바일디스플레이주식회사 드라이 에칭 장치를 이용한 터치 스크린 패널의 제작방법
KR101074263B1 (ko) * 2011-05-06 2011-10-17 (주)에스아이티 터치패널글라스 베젤부의 블랙칼라 진공증착방법

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100054673A (ko) * 2008-11-14 2010-05-25 엘지이노텍 주식회사 터치 스크린 및 그 제조방법
KR20110041821A (ko) * 2009-10-16 2011-04-22 엘지이노텍 주식회사 터치패널용 면상 부재 및 이의 제조 방법
KR20110104225A (ko) * 2010-03-16 2011-09-22 삼성모바일디스플레이주식회사 드라이 에칭 장치를 이용한 터치 스크린 패널의 제작방법
KR101074263B1 (ko) * 2011-05-06 2011-10-17 (주)에스아이티 터치패널글라스 베젤부의 블랙칼라 진공증착방법

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