WO2013141478A1 - Substrat transparent ayant une fonction anti-réfléchissante - Google Patents

Substrat transparent ayant une fonction anti-réfléchissante Download PDF

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Publication number
WO2013141478A1
WO2013141478A1 PCT/KR2013/000758 KR2013000758W WO2013141478A1 WO 2013141478 A1 WO2013141478 A1 WO 2013141478A1 KR 2013000758 W KR2013000758 W KR 2013000758W WO 2013141478 A1 WO2013141478 A1 WO 2013141478A1
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Prior art keywords
layer
thin film
transparent substrate
refractive index
reflection
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Ceased
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PCT/KR2013/000758
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English (en)
Korean (ko)
Inventor
조상무
김윤택
양순석
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VACOS CO Ltd
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VACOS CO Ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02—Physical, chemical or physicochemical properties
    • B32B7/023—Optical properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films

Definitions

  • the present invention relates to a transparent substrate having an antireflection function, and more particularly, to improve transmittance and reflectivity through an antireflection layer including alternating high refractive index thin film layers and low refractive index thin film layers, and to improve mechanical strength and chemical properties.
  • the present invention relates to a transparent substrate capable of improving resistance performance.
  • Antireflective coatings typically consist of a multilayer comprising a thin layer of interference, with alternating layers of high refractive index dielectric material and low refractive index dielectric material.
  • the function of such a coating is to reduce the light reflection of the substrate and to increase the light transmission of the substrate. The ratio of transmitted / reflected light of the substrate so coated is thus increased, thereby improving the sharpness of the object located behind the substrate.
  • most antireflective coatings have a structure of four layers with a high refractive index layer / low refractive index layer / high refractive index layer / low refractive index layer, and the high refractive index layer is typically made of TiO2 having a very high refractive index of about 2.45,
  • the low refractive index layer is typically made of SiO2.
  • titanium oxide which is the preferred material for the high refractive index third layer, has a low deposition rate. Therefore, a considerable time and a large number of sputter cathodes are required for sputtering of the thick third layer.
  • TiO2 targets can operate at low power to avoid overheating, but at the expense of requiring a significantly slower coating or significant TiO 2 targets.
  • the antireflection layer is formed of four layers, the number of layers needs to be increased because the reflection is high in the vicinity of 400-420 nm of the short wavelength band of visible light and in the vicinity of 650-700 nm of the long wavelength band.
  • a transparent substrate having an anti-reflection function according to an embodiment of the present invention is a problem to significantly improve the anti-reflection function of the transparent substrate.
  • a transparent substrate having an anti-reflection function according to an embodiment of the present invention, to implement an anti-reflection layer having a high mechanical resistance and chemical resistance performance as a problem.
  • the transparent substrate with an anti-reflection function according to an embodiment of the present invention, it is a problem to significantly improve the speed of forming the anti-reflection layer.
  • the transparent substrate having an anti-reflection function improves the performance of anti-reflection, compared to the conventional transparent substrate having an anti-reflection layer formed on one surface thereof, and has functions other than anti-reflection. What can be added is the problem.
  • the transparent substrate having an anti-reflection function may further include an anti-fingerprint layer formed of a fluoropolymer on the surface, so that the anti-reflection function as well as the anti-fouling function may be realized. It is a problem.
  • a transparent substrate having an anti-reflection function a transparent substrate made of a transparent material; And an antireflection layer formed on one side of the transparent substrate, wherein the antireflection layer includes six thin film layers, wherein the six thin film layers are thin film layers in which a high refractive index thin film layer and a low refractive index thin film layer are alternately formed. It is done.
  • the transparent substrate with an antireflection function according to an embodiment of the present invention is characterized in that the high refractive index is 1.75 to 2.1.
  • the transparent substrate with an anti-reflection function according to an embodiment of the present invention is characterized in that the low refractive index is 1.35 to 1.55.
  • the transparent substrate having an antireflection function is a thin film layer having a high refractive index having a thickness of 10 to 25 nm of the first layer forming the antireflection layer, and forming the antireflection layer.
  • the thin film layer of the second layer is a low refractive index thin film layer having a thickness of 20 to 50 nm
  • the thin film layer of the third layer forming the antireflection layer is a high refractive index thin film layer having a thickness of 35 to 75 nm and forms the antireflection layer.
  • the thin film layer of the fourth layer is a low refractive index thin film layer having a thickness of 1 to 5 nm
  • the thin film layer of the fifth layer forming the antireflection layer is a high refractive index thin film layer having a thickness of 70 to 110 nm, and forms the antireflection layer.
  • the thin film layer of the sixth layer is a low refractive index thin film layer having a thickness of 60 to 95 nm.
  • the transparent substrate with an anti-reflection function is characterized in that the high refractive index thin film layer includes tin oxide, silicon oxide or silicon oxynitride as a component.
  • the transparent substrate with an anti-reflection function is characterized in that the low refractive index thin film layer includes silicon oxide, silicon oxynitride or oxycarbide as a component.
  • the transparent substrate with an anti-reflection function is characterized in that the thin film layer of the first layer, the third layer or the fifth layer is a layer formed by overlapping a plurality of high refractive index thin films.
  • the thin film layer of the first layer, the third layer, or the fifth layer may be formed of two layers of SnO 2 (Tin Dioxide) and Si 3 N 4 (Silicon Nitride). It is characterized in that the thin film is formed by overlapping.
  • the transparent substrate with an anti-reflection function is characterized in that the anti-reflection layer is formed by sputtering.
  • the transparent substrate with an anti-reflection function according to an embodiment of the present invention, it is possible to form both the high refractive index thin film layer and the low refractive index thin film layer using a silicon target (target). do.
  • the transparent substrate with an anti-reflection function is characterized in that it further comprises an anti-fouling layer formed on the anti-reflection layer.
  • the transparent substrate having an antireflection function is characterized in that the antifouling layer is an anti-fingerprint layer formed of a fluoropolymer.
  • the transparent substrate with an anti-reflection function according to an embodiment of the present invention, characterized in that the anti-reflection layer is formed on both sides of the transparent substrate.
  • the transparent substrate with an anti-reflection function according to an embodiment of the present invention, the other surface of the transparent substrate on which the anti-reflection layer is not formed, a transparent conductive layer for touch input, a sun blocking layer, a pollution prevention layer or The anti-fog layer is formed.
  • the transparent substrate having an anti-reflection function is characterized in that the transparent substrate is a transparent substrate that can be used in the display of electronic products.
  • a transparent substrate having an antireflection function according to an embodiment of the present invention can significantly improve the antireflection function of the transparent substrate. Specifically, the light reflection can be made to be less than 1.5%, and under the best conditions, the light reflection can be lowered to less than 1.0%.
  • a transparent substrate having an anti-reflection function according to an embodiment of the present invention has a reflection having an intermediate color in transmission and an attractive appearance in reflection over a broad low-light-reflection band. Prevention effect can be obtained. In particular, a color which is usually almost intermediate upon reflection is obtained, and in the worst case green or blue color is obtained under normal incidence.
  • the transparent substrate with an anti-reflection function can implement an anti-reflection layer having high mechanical resistance and chemical resistance.
  • the antireflection layer formed on the transparent substrate may have high mechanical durability, and may also have excellent performance of saline resistance, UV resistance, and chemical resistance.
  • the transparent substrate having the anti-reflection function according to an embodiment of the present invention can significantly improve the speed of forming the anti-reflection layer.
  • tin oxide, silicon nitride, silicon oxynitride, etc. as a high refractive index material, it is possible to improve the speed of the deposition process, even using a single silicon target (target) of the high refractive index thin film layer and low refractive index A thin film layer can be formed, and the formation speed of an antireflection layer can be improved significantly.
  • the transparent substrate having an anti-reflection function can improve the performance of anti-reflection than the conventional transparent substrate having the anti-reflection layer formed on both sides, thereby forming the anti-reflection layer on one side. have.
  • the transparent substrate having an anti-reflection function may further include an anti-fingerprint layer formed on the surface of a fluoropolymer, thereby realizing anti-reflection function as well as anti-fouling function.
  • FIG. 1 is a view showing the configuration of a transparent substrate according to an embodiment of the present invention.
  • FIG. 2 is a diagram showing the configuration of a transparent substrate according to another embodiment of the present invention.
  • FIG 3 is a view showing the configuration of a transparent substrate according to another embodiment of the present invention.
  • thin film layer of first layer 220 thin film layer of second layer
  • the transparent substrate with an anti-reflection function according to an embodiment of the present invention, the transparent substrate 100 made of a transparent material; And an anti-reflection layer 200 formed on one surface of the transparent substrate.
  • the transparent substrate means a substrate made of a transparent material, and preferably means a transparent substrate that can be applied to a display of an electronic product.
  • the transparent substrate may be formed of various materials, specifically, glass, cellulose-based resin, polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyethylene resin, chloride Polyvinyl resin, polycarbonate (PC), polyethersulfone (PES), polyetherether ketone (PEEK), polyphenylene sulfide (PPS), polyimide (PI) Or polymethyl methacrylate (PMMA), or a combination thereof.
  • the anti-reflection layer 200 may be configured to literally prevent light reflection, and may include six thin film layers. Specifically, the six thin film layers alternate between a high refractive index thin film layer and a low refractive index thin film layer. It may be a thin film layer formed.
  • the high refractive index thin film layer may be formed of a material mainly containing tin oxide, silicon oxide, or silicon oxynitride, and the refractive index may have a value of 1.75 to 2.1. In addition, it is more preferably formed to have a value of 1.8 to 1.9 as the value of the high refractive index can further improve the performance.
  • This high refractive index thin film layer can realize an improved antireflection effect with excellent light reflection value (RL) at normal incidence, compared to the conventional titanium oxide layer (Ti02) having a refractive index of 2.45. It has the advantage that it can be formed at a higher deposition rate in the process.
  • the low refractive index thin film layer may be formed of a material mainly containing silicon oxide, silicon oxynitride, or oxycarbide, and the refractive index may have a value of 1.35 to 1.55.
  • materials of the high refractive index thin film layer or the low refractive index thin film layer may be selectively doped to improve chemical, mechanical, and electrical properties, and may be modified to have some conductivity.
  • the six anti-reflection layers 200 may include the anti-reflection layer 200.
  • the anti-reflection layer 200 may include the first layer thin film layer 210 and the second layer thin film layer 220.
  • the thin film layer 230 of the third layer, the thin film layer 240 of the fourth layer, the thin film layer 250 of the fifth layer, and the thin film layer 260 of the sixth layer may be included.
  • the thin film layer 210 of the first layer may be a thin film layer having a thickness of 10 to 25 nm formed on the transparent substrate.
  • the thin film layer 210 of the first layer may be formed of a thin film layer having a high refractive index.
  • the thin film layer 220 of the second layer may have a thickness of 20 to 50 nm, and the thin film layer 220 of the second layer may be formed of a low refractive index thin film layer.
  • the thin film layer 230 of the third layer may have a thickness of 35 to 75 nm, and the thin film layer 230 of the third layer may be formed of a thin film layer having a high refractive index.
  • the thin film layer 240 of the fourth layer may have a thickness of 1 to 5 nm, and the thin film layer 240 of the fourth layer may be formed of a thin film layer having a low refractive index.
  • the thin film layer 250 of the fifth layer may have a thickness of about 70 to 110 nm.
  • the thin film layer 250 of the fifth layer may be formed of a thin film layer having a high refractive index.
  • the thin film layer 260 of the sixth layer may have a thickness of 60 to 95 nm, and the thin film layer 260 of the sixth layer may be formed of a low refractive index thin film layer.
  • the thickness of the thin film layer 210 of the first layer is formed of 12 to 20nm
  • the thickness of the thin film layer 220 of the second layer is formed of 25 to 40nm
  • of the third layer The thickness of the thin film layer 230 is formed to 45 to 65nm
  • the thickness of the thin film layer 240 of the fourth layer is formed to 2 to 4nm
  • the thickness of the thin film layer 250 of the fifth layer is formed to 80 to 100nm.
  • the thickness of the thin film layer 260 of the sixth layer may be 75 to 95 nm. If the anti-reflection layer 200 is formed in this state, the performance of the anti-reflection layer 200 may be maximized.
  • the thin film layer 210 of the first layer, the thin film layer 230 of the third layer, and the thin film layer 250 of the fifth layer which are formed of the thin film layer having the high refractive index, are themselves formed by overlapping a plurality of high refractive index thin films. It may be formed as a layer, through this structure can further improve the performance of the anti-reflection layer (200).
  • the thin film layer 210 of the first layer, the third thin film layer, and the thin film layer 250 of the fifth layer may have at least one layer of a two-layer structure of SnO 2 / Si 3 N 4 or a Si 3 N 4 / SnO 2 structure. It may be a two-layer structure.
  • the anti-reflection layer 200 may be formed on the transparent substrate by various methods, preferably by a sputtering method such as magnetron sputtering. have.
  • the anti-reflection layer 200 can significantly improve the speed of the deposition process compared with the prior art, TiO 2 having a slow deposition rate with a refractive index of 2.45 This is because tin oxides such as Si 3 N 4 and SnO 2, silicon oxides, silicon oxynitrides, and the like are used as the high refractive materials without using such materials.
  • the batch type sputtering equipment uses Si 3 N 3 as the material of the high refractive index of the anti-reflection layer 200
  • a silicon target in which the SiO 2 coating is used as the low refractive material may be used for the Si 3 N 4 coating of the high refractive material.
  • the transparent substrate having an anti-reflection function may further include an anti-fouling layer formed on the anti-reflection layer 200.
  • the antifouling material is a material that prevents contamination by fingerprints or scratches caused by the surrounding environment, which may occur on the surface of an object. Preferably, contamination may occur on the surface of the anti-reflection layer 200. Means to prevent the substance.
  • Such antifouling material may be formed of a material of a fluoropolymer, and preferably, may be composed of fluorosilnae.
  • FIG. 3 a transparent substrate having an anti-reflection function according to another embodiment of the present invention will be described.
  • the anti-reflection layer may be formed on both surfaces 200 and 300 of the transparent substrate.
  • the transparent substrate can further improve the anti-reflection performance.
  • the light reflection value RL is further reduced in the visible light range. (6% reduction).
  • the other functional layer 400 may be formed on the other side of the transparent substrate on which the anti-reflection layer 200 is formed.
  • the other functional layer 400 may be used to form a transparent substrate having various functions in addition to the anti-reflection function.
  • the other functional layer 400 is formed of a thin film layer having various functions such as a transparent conductive layer, a sun blocking layer, a low emissivity layer, an antifouling layer, an antifogging layer, and other functional layers of water repellent or heating type, and the transparent substrate.
  • Various functions can be given to.
  • the antireflective layers were successively deposited by magnetron sputtering, and the layers of SiO 2 and Si 3 N 4 were slightly doped with boron in the presence of oxygen (SiO 2) and in the presence of nitrogen (SiN 4) so as to have sufficient conductivity. Obtained by reactive sputtering of the target.
  • the structure of the multilayer thin film starts from the glass substrate for all examples as follows.
  • the transparent substrate was an ion-reinforced glass of Corning Glass gorilla glass.
  • An anti-reflection layer was formed on only one side of the transparent substrate.
  • the first layer, the third layer, and the fifth layer were coated with SiN4 in a nitrogen atmosphere.
  • the second, fourth, and sixth layers were coated with SiO 2 in an oxygen atmosphere.
  • the deposition time was reduced by more than 65%.
  • Table 1 below shows the thickness of each layer (nm), coating time (min), and transmittance and reflectance at 550 nm for the various multilayers.
  • the transmittance was measured as it was in the specimen, and the reflectance was measured by removing the reflection of one side by the diffuse reflection by sanding the opposite side.
  • Examples 1, 2, and 3 according to the present invention all had a transmittance of 95% or more and a reflectance of less than 1%, and the comparative examples did not achieve satisfactory levels in the industry.
  • the transparent substrate was a glass substrate
  • SnO 2 was used as a high refractive material
  • SiO 2 was used as a low refractive material.
  • the layers were successively deposited alternately by magnetron sputtering.
  • the layer of SiO 2 was obtained by reactive sputtering of a silicon target slightly doped with boron in the presence of oxygen for the SiO 2 layer to have sufficient conductivity.
  • the structure of the multilayer thin film is as follows starting from the glass substrate G for all examples:
  • the transparent substrate was a tempered glass obtained by ionizing the gorilla glass of Corning Glass.
  • An anti-reflection layer was formed on only one surface of the transparent substrate.
  • the first layer, the third layer, and the fifth layer are oxygen atmospheres.
  • SnO 2 was coated by sputtering tin at, and the second, fourth, and sixth layers were coated with SiO 2 by sputtering boron-doped silicon in an oxygen atmosphere.
  • Tables 2 and 3 below show the geometric thickness (nm), coating time (min) and transmittance and reflectance at 550 nm of each layer for the various multilayers.
  • the transmittance was measured as it was, and the reflectance was measured by removing the reflection of one side by diffuse reflection by sanding the opposite side.
  • Example 4 the transmittance was more than 95% and the reflectance was less than 1%.
  • the optical properties of Comparative Examples 10, 11, and 12 were satisfied, but the coating time was long because the deposition rate of the high refractive layer was low.
  • Constant temperature and humidity test Treatment was performed for 3 weeks in a chamber maintained at 50 ° C. 90% RH. This test is an accelerated endurance test that can compare and confirm long-term durability in a short time.
  • the change amount of the coated glass of Example 1-6 according to the present invention is less than 0.8, less than the change amount of Comparative Examples 11 and 12, all excellent in wear resistance, saline resistance and constant temperature and humidity Able to know.
  • Comparative Example 10 using ZrO 2 in the comparative example shows excellent properties with a variation similar to the variation of the present invention, but the disadvantage is that the deposition rate of ZrO 2 is low.
  • the transparent substrate with an antireflection function can significantly improve the antireflection function of the transparent substrate.
  • the light reflection can be made to be less than 1.5%, and under the best conditions, the light reflection can be lowered to less than 1.0%.
  • a transparent substrate having an anti-reflection function according to an embodiment of the present invention has a reflection having an intermediate color in transmission and an attractive appearance in reflection over a wide low-light-reflection band. Prevention effect can be obtained. In particular, a color which is usually almost intermediate upon reflection is obtained, and in the worst case green or blue color is obtained under normal incidence.
  • the transparent substrate having an anti-reflection function can implement an anti-reflection layer having high mechanical resistance and chemical resistance.
  • the antireflection layer formed on the transparent substrate may have high mechanical durability, and may also have excellent performances of saline resistance, UV resistance, and chemical resistance.
  • the transparent substrate having the anti-reflection function according to an embodiment of the present invention can significantly improve the speed of forming the anti-reflection layer.
  • the transparent substrate having the anti-reflection function can significantly improve the speed of forming the anti-reflection layer.
  • tin oxide, silicon nitride, silicon oxynitride, etc. as a high refractive index material, it is possible to improve the speed of the deposition process.
  • a thin film layer can be formed, and the formation speed of an antireflection layer can be improved significantly.
  • the transparent substrate having an anti-reflection function can improve the performance of anti-reflection than the conventional transparent substrate having the anti-reflection layer formed on both sides, thereby forming the anti-reflection layer on one side. have.

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
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  • Surface Treatment Of Optical Elements (AREA)
  • Surface Treatment Of Glass (AREA)
PCT/KR2013/000758 2012-03-19 2013-01-30 Substrat transparent ayant une fonction anti-réfléchissante Ceased WO2013141478A1 (fr)

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KR10-2012-0027904 2012-03-19
KR1020120027904A KR101200724B1 (ko) 2012-03-19 2012-03-19 반사방지 기능을 구비한 투명기판

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WO2015085283A1 (fr) * 2013-12-06 2015-06-11 General Plasma Inc. Substrats durables comprenant un revêtement antireflet destinés à être utilisés dans des unités d'affichage de dispositifs électroniques et d'autres technologies associées
WO2016122059A1 (fr) * 2015-01-26 2016-08-04 주식회사 맥스젠테크놀로지 Structure en verre comportant une couche de dureté élevée et résistant aux empreintes, et son procédé de revêtement
EP3196678A1 (fr) * 2016-01-19 2017-07-26 Seiko Epson Corporation Élément transmettant la lumière, pièce d'horlogerie et procédé de production d'un élément transmettant la lumière
US20200408954A1 (en) * 2018-03-02 2020-12-31 Corning Incorporated Anti-reflective coatings and articles and methods of forming the same
CN113597179A (zh) * 2021-07-29 2021-11-02 富士新材(深圳)有限公司 一种透明盖板及其制备方法、电子设备
CN114395340A (zh) * 2021-11-28 2022-04-26 凯盛科技股份有限公司蚌埠华益分公司 车载显示屏用减反射功能膜及其制备方法

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KR101463956B1 (ko) * 2013-05-21 2014-11-26 (주)소모옵티칼 청색광 차단 렌즈
KR102221907B1 (ko) * 2013-07-11 2021-03-04 삼성디스플레이 주식회사 광학필름 어셈블리, 이를 갖는 표시장치 및 그 제조방법
KR102114072B1 (ko) * 2015-03-31 2020-05-25 삼성전자주식회사 실외 디스플레이 장치
US11293088B2 (en) 2015-12-07 2022-04-05 Lg Chem, Ltd. Conductive structure, method for manufacturing same, and electrode comprising conductive structure

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015085283A1 (fr) * 2013-12-06 2015-06-11 General Plasma Inc. Substrats durables comprenant un revêtement antireflet destinés à être utilisés dans des unités d'affichage de dispositifs électroniques et d'autres technologies associées
WO2016122059A1 (fr) * 2015-01-26 2016-08-04 주식회사 맥스젠테크놀로지 Structure en verre comportant une couche de dureté élevée et résistant aux empreintes, et son procédé de revêtement
EP3196678A1 (fr) * 2016-01-19 2017-07-26 Seiko Epson Corporation Élément transmettant la lumière, pièce d'horlogerie et procédé de production d'un élément transmettant la lumière
US10408976B2 (en) 2016-01-19 2019-09-10 Seiko Epson Corporation Light transmissive member, timepiece, and light transmissive member production method
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US12140732B2 (en) * 2018-03-02 2024-11-12 Corning Incorporated Anti-reflective coatings and articles and methods of forming the same
CN113597179A (zh) * 2021-07-29 2021-11-02 富士新材(深圳)有限公司 一种透明盖板及其制备方法、电子设备
CN113597179B (zh) * 2021-07-29 2025-03-07 富士新材(深圳)有限公司 一种透明盖板及其制备方法、电子设备
CN114395340A (zh) * 2021-11-28 2022-04-26 凯盛科技股份有限公司蚌埠华益分公司 车载显示屏用减反射功能膜及其制备方法

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