WO2013192560A3 - Dépôt de couches d'oxyde inorganiques ultra fines sur un emballage - Google Patents
Dépôt de couches d'oxyde inorganiques ultra fines sur un emballage Download PDFInfo
- Publication number
- WO2013192560A3 WO2013192560A3 PCT/US2013/047128 US2013047128W WO2013192560A3 WO 2013192560 A3 WO2013192560 A3 WO 2013192560A3 US 2013047128 W US2013047128 W US 2013047128W WO 2013192560 A3 WO2013192560 A3 WO 2013192560A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- ultra
- packaging
- deposition
- inorganic oxide
- thin inorganic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D65/00—Wrappers or flexible covers; Packaging materials of special type or form
- B65D65/38—Packaging materials of special type or form
- B65D65/42—Applications of coated or impregnated materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
- Wrappers (AREA)
Abstract
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201380033270.6A CN104379805A (zh) | 2012-06-23 | 2013-06-21 | 超薄无机氧化物涂层在包装上的沉积 |
| EP13806757.4A EP2864521A4 (fr) | 2012-06-23 | 2013-06-21 | Dépôt de couches d'oxyde inorganiques ultra fines sur un emballage |
| MX2014015675A MX2014015675A (es) | 2012-06-23 | 2013-06-21 | Deposicion de revestimientos de oxido inorganico ultra-delgados sobre empaque. |
| BR112014029940A BR112014029940A2 (pt) | 2012-06-23 | 2013-06-21 | deposição de revestimentos de óxido inorgânico ultrafinos sobre embalagem |
| CA 2872318 CA2872318A1 (fr) | 2012-06-23 | 2013-06-21 | Depot de couches d'oxyde inorganiques ultra fines sur un emballage |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261663555P | 2012-06-23 | 2012-06-23 | |
| US61/663,555 | 2012-06-23 | ||
| US13/924,042 | 2013-06-21 | ||
| US13/924,042 US20130340673A1 (en) | 2012-06-23 | 2013-06-21 | Deposition of ultra-thin inorganic oxide coatings on packaging |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2013192560A2 WO2013192560A2 (fr) | 2013-12-27 |
| WO2013192560A3 true WO2013192560A3 (fr) | 2014-05-01 |
Family
ID=49769728
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US2013/047128 Ceased WO2013192560A2 (fr) | 2012-06-23 | 2013-06-21 | Dépôt de couches d'oxyde inorganiques ultra fines sur un emballage |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20130340673A1 (fr) |
| CN (1) | CN104379805A (fr) |
| BR (1) | BR112014029940A2 (fr) |
| CA (1) | CA2872318A1 (fr) |
| MX (1) | MX2014015675A (fr) |
| WO (1) | WO2013192560A2 (fr) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107241907A (zh) * | 2014-12-12 | 2017-10-10 | Sabic环球技术有限责任公司 | 用于自粘合膜的线型低密度聚乙烯材料 |
| US11745484B2 (en) * | 2020-10-08 | 2023-09-05 | Polymeric Film & Bags, Inc. | Pet sandwich layer |
| US11850785B2 (en) | 2020-10-14 | 2023-12-26 | SAM North America, LLC | Polymer extruded, extrusion method, and extruded material |
| CN114434927A (zh) * | 2021-12-30 | 2022-05-06 | 毕玛时软包装(苏州)有限公司 | 一种带干燥功能的易揭膜及制备方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0058571A1 (fr) * | 1981-02-18 | 1982-08-25 | National Research Development Corporation | Procédé et appareillage pour fournir un flux de réactif en quantité controlée dans une installation de dépôt par voie chimique en phase gazeuse |
| US6193911B1 (en) * | 1998-04-29 | 2001-02-27 | Morton International Incorporated | Precursor solution compositions for electronic devices using CCVD |
| US20060207295A1 (en) * | 2005-03-15 | 2006-09-21 | Heraeus Tenevo Gmbh | Method and apparatus for producing a glass body |
| US7351449B2 (en) * | 2000-09-22 | 2008-04-01 | N Gimat Co. | Chemical vapor deposition methods for making powders and coatings, and coatings made using these methods |
| US20090199964A1 (en) * | 2005-11-03 | 2009-08-13 | Tetra Laval Holdings & Finance S.A. | Method and device for coating a polymer film with an oxide layer |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE233327T1 (de) | 1993-03-24 | 2003-03-15 | Georgia Tech Res Inst | Verfahren und vorrichtung zur verbrennungs cvd von filmen und beschichtungen |
| US5997996A (en) | 1996-03-27 | 1999-12-07 | A-Plus Corporation | Sheet-like pressure-sensitive resistance member having electrodes, method of making the same, and sheet-like pressure-sensitive resistance member |
| CA2267492C (fr) * | 1998-04-29 | 2003-09-23 | Morton International, Inc. | Formation de resistances pelliculaires minces |
| CN1217787C (zh) * | 2000-06-30 | 2005-09-07 | 微涂技术股份有限公司 | 聚合物涂层 |
-
2013
- 2013-06-21 WO PCT/US2013/047128 patent/WO2013192560A2/fr not_active Ceased
- 2013-06-21 US US13/924,042 patent/US20130340673A1/en not_active Abandoned
- 2013-06-21 MX MX2014015675A patent/MX2014015675A/es unknown
- 2013-06-21 CA CA 2872318 patent/CA2872318A1/fr not_active Abandoned
- 2013-06-21 BR BR112014029940A patent/BR112014029940A2/pt not_active IP Right Cessation
- 2013-06-21 CN CN201380033270.6A patent/CN104379805A/zh active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0058571A1 (fr) * | 1981-02-18 | 1982-08-25 | National Research Development Corporation | Procédé et appareillage pour fournir un flux de réactif en quantité controlée dans une installation de dépôt par voie chimique en phase gazeuse |
| US6193911B1 (en) * | 1998-04-29 | 2001-02-27 | Morton International Incorporated | Precursor solution compositions for electronic devices using CCVD |
| US7351449B2 (en) * | 2000-09-22 | 2008-04-01 | N Gimat Co. | Chemical vapor deposition methods for making powders and coatings, and coatings made using these methods |
| US20060207295A1 (en) * | 2005-03-15 | 2006-09-21 | Heraeus Tenevo Gmbh | Method and apparatus for producing a glass body |
| US20090199964A1 (en) * | 2005-11-03 | 2009-08-13 | Tetra Laval Holdings & Finance S.A. | Method and device for coating a polymer film with an oxide layer |
Also Published As
| Publication number | Publication date |
|---|---|
| MX2014015675A (es) | 2015-03-13 |
| CA2872318A1 (fr) | 2013-12-27 |
| CN104379805A (zh) | 2015-02-25 |
| BR112014029940A2 (pt) | 2017-06-27 |
| WO2013192560A2 (fr) | 2013-12-27 |
| US20130340673A1 (en) | 2013-12-26 |
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